CN114448376B - Impedance matching adjusting method and device, radio frequency power supply system and storage medium - Google Patents
Impedance matching adjusting method and device, radio frequency power supply system and storage medium Download PDFInfo
- Publication number
- CN114448376B CN114448376B CN202111618347.9A CN202111618347A CN114448376B CN 114448376 B CN114448376 B CN 114448376B CN 202111618347 A CN202111618347 A CN 202111618347A CN 114448376 B CN114448376 B CN 114448376B
- Authority
- CN
- China
- Prior art keywords
- impedance matching
- matching network
- capacitor
- adjustable
- capacitance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 57
- 239000003990 capacitor Substances 0.000 claims abstract description 177
- 239000002184 metal Substances 0.000 claims description 72
- 238000005259 measurement Methods 0.000 claims description 16
- 238000004590 computer program Methods 0.000 claims description 14
- 230000001939 inductive effect Effects 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 9
- 230000008569 process Effects 0.000 abstract description 9
- 230000005540 biological transmission Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
The application relates to an impedance matching adjusting method, an impedance matching adjusting device, a radio frequency power supply system and a storage medium, wherein incident waves and reflected waves between an impedance matching network and a load in the radio frequency power supply system are collected, amplitude difference signals and phase angle difference signals between the incident waves and the reflected waves are obtained, capacitance control signals are generated according to the amplitude difference signals and the amplitude difference signals, and the capacitance value of at least one adjustable capacitor in the impedance matching network is adjusted through the capacitance control signals; the impedance matching network is a midpoint connection type X-type impedance matching network, and the impedance of the impedance matching network is adjusted based on the adjusted at least one adjustable capacitor; by adopting the X-type impedance matching network and adopting a variable capacitance method to change the impedance, the adjusting process is smooth, the adjusting speed is high, and the load change range is large, so that the total impedance of the load and the impedance matching network is consistent with the input impedance, the aim of impedance matching is fulfilled, and the accuracy and the reliability of impedance adjustment are further improved.
Description
Technical Field
The present application relates to the field of radio frequency technologies, and in particular, to an impedance matching adjustment method and apparatus, a radio frequency power supply system, and a storage medium.
Background
With the development of wireless communication systems, rf integrated circuits have become a focus of attention, and impedance matching is increasingly emphasized as one of the key constraints on the transmission efficiency and quality of rf signals. The radio frequency power supply system is used as an important component of a radio frequency integrated circuit, comprises a radio frequency power supply, is a matched power supply of a plasma cavity, and is applied to the fields of radio frequency sputtering, PECVD chemical vapor deposition, reactive ion etching and the like. Generally, the impedance of the nonlinear load in the plasma chamber is not equal to the constant output impedance of the rf power source, so there is a severe impedance mismatch between the rf power source and the plasma chamber, resulting in a large reflected power on the transmission line, and the power generated by the rf power source cannot be completely transmitted to the plasma chamber, resulting in a large power loss.
Disclosure of Invention
In view of the above, it is necessary to provide an impedance matching adjusting method, an impedance matching adjusting apparatus, a radio frequency power supply system, and a storage medium, which can solve the problem of large power loss of a radio frequency power supply.
An impedance matching adjusting method comprises the steps of collecting incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system;
acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal, wherein the impedance matching network is a midpoint connection type X-type impedance matching network;
adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitance.
In one embodiment, the method further comprises the following steps: the X-type impedance matching network comprises a first adjustable capacitor, a second adjustable capacitor, a third adjustable capacitor, a fourth adjustable capacitor, a first adjustable inductor and a second adjustable inductor,
the first end of the first adjustable inductor is connected with the first end of the first adjustable capacitor, the second end of the first adjustable inductor is connected with the first end of the second adjustable capacitor, the first end of the second adjustable inductor is connected with the first end of the third adjustable capacitor, the second end of the second adjustable inductor is connected with the first end of the fourth adjustable capacitor, and the second end of the first adjustable capacitor, the second end of the second adjustable capacitor, the second end of the third adjustable capacitor and the second end of the fourth adjustable capacitor are respectively coupled to the connection midpoint.
In one embodiment, the method further comprises the following steps: adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitor, comprising:
based on the adjusted first adjustable capacitor, second adjustable capacitor, third adjustable capacitor and fourth adjustable capacitor, a first formula is adopted:
wherein the content of the first and second substances,
to adjust the impedance of the impedance matching network.
In one embodiment, the method further comprises the following steps: the adjustable capacitor comprises a first metal layer, a second metal layer and a third metal layer, a first capacitor interval is formed between the first metal layer and the third metal layer, a second capacitor interval is formed between the second metal layer and the third metal layer, a dielectric medium with a first dielectric constant is arranged in the first capacitor interval, a dielectric medium with a second dielectric constant is arranged in the second capacitor interval, and the second dielectric constant is larger than the first dielectric constant; capacitance value C = C of the adjustable capacitor AB //C BC ，C AB Is the capacitance of the first capacitance interval, C BC The capacitance is the capacitance of the second capacitance interval. In one embodiment, the method further comprises the following steps: the capacitance control signal is a capacitance control voltage, and the capacitance value of at least one adjustable capacitor in the impedance matching network is adjusted by the capacitance control signal, including: based on a second formula: and C = Q/U, and the capacitance control signal is adopted to adjust the capacitance value of at least one adjustable capacitor in the impedance matching network, wherein U is the capacitor control voltage, and Q is the charged quantity of the adjustable capacitor.
In one embodiment, the method further comprises the following steps: judging whether the amplitude and the phase angle of the incident wave and the reflected wave are the same by adopting an amplitude-phase measurement chip;
if the amplitudes and the phase angles of the incident wave and the reflected wave are different, acquiring an amplitude difference value and a phase angle difference value between the incident wave and the reflected wave;
and if the amplitude and the phase angle of the incident wave and the reflected wave are the same, returning to execute the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system.
An impedance matching adjustment apparatus comprising:
the acquisition module is used for acquiring incident waves and reflected waves between an impedance matching network and a load in the radio frequency power supply system;
the first acquisition module is used for acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
the generating module is used for generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
the adjusting module is used for adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal; the impedance matching network is a midpoint connection type X-type impedance matching network.
And the adjusting module is used for adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitor.
A radio frequency power supply system comprising a memory and a processor, the memory storing a computer program, the processor implementing the following steps when executing the computer program:
a computer-readable storage medium, on which a computer program is stored which, when executed by a processor, carries out the steps of:
the impedance matching adjusting method is applied to a radio frequency power supply system, incident waves and reflected waves between an impedance matching network and a load in the radio frequency power supply system are collected, amplitude difference signals and phase angle difference signals between the incident waves and the reflected waves are obtained, capacitance control signals are generated according to the amplitude difference signals and the amplitude difference signals, and the capacitance value of at least one adjustable capacitor in the impedance matching network is adjusted through the capacitance control signals; the impedance matching network is a midpoint connection type X-type impedance matching network, and the impedance of the impedance matching network is adjusted based on the adjusted at least one adjustable capacitor; according to the impedance matching method, the X-type impedance matching network is adopted, the impedance is changed by adopting the variable capacitance method, the adjusting process is smooth, the adjusting speed is high, the load variation range is large, the total impedance of the load and the impedance matching network is consistent with the input impedance, the purpose of impedance matching is achieved, the accuracy and the reliability of impedance adjustment are improved, the adjusting range is expanded, and the cost is reduced.
Drawings
Fig. 1 is an application environment diagram of an impedance matching adjusting method in the embodiment of the present application.
Fig. 2 is an internal structural diagram of a radio frequency power supply system in the embodiment of the present application.
Fig. 3 is a schematic diagram of an impedance matching adjustment method in the embodiment of the present application.
Fig. 4 is a schematic diagram of an impedance matching adjustment method in the embodiment of the present application.
Fig. 5 is a schematic flowchart of an impedance matching adjustment method in the embodiment of the present application.
Fig. 6 is a schematic flowchart of an impedance matching adjustment method in the embodiment of the present application.
Fig. 7 is a schematic flowchart of an impedance matching adjusting apparatus in an embodiment of the present application.
Fig. 8 is a schematic flowchart of an impedance matching adjusting apparatus in an embodiment of the present application.
Fig. 9 is an internal structural diagram of the rf power supply system in the embodiment of the present application.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
The impedance matching adjusting method applied to the radio frequency power supply can be applied to the application environments shown in fig. 1 and fig. 2. Wherein, the radio frequency power supply system 102 communicates with the server 104 through a network; the method is used for solving the problem that the power loss of the radio frequency power supply is large. The radio frequency power supply system 102 includes an impedance matching network, a load, a directional coupler, an amplitude-phase measurement chip, and a control module. The server 104 may be implemented as a stand-alone server or as a server cluster comprised of multiple servers.
In one embodiment, as shown in fig. 2, an impedance matching adjusting method applied to a radio frequency power supply is provided, which is described by taking as an example that the method is applied to the radio frequency power supply system 102 in fig. 1, where the radio frequency power supply system 102 includes an impedance matching network, a load, a directional coupler, an amplitude and phase measurement chip, and a control module. The impedance matching network, the load, the directional coupler, the amplitude and phase measuring chip and the control module are electrically connected, as shown in fig. 5, the impedance matching adjusting method applied to the radio frequency power supply specifically comprises the following steps:
s10: incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system are collected.
Since the transmission of radio frequency power is a wave process, when the impedances at the two ends of the line are not equal, the radio frequency wave will be reflected, thereby reducing the transmission efficiency. In the prior art, a servo stepper motor is mainly used to change the capacitance value of a capacitor or the inductance value of an inductor in an impedance matching network. Specifically, on one hand, the capacitance value of the capacitor in the impedance matching network is changed by mainly changing the distance between two polar plates of the capacitor, but the adjustment method has extremely high precision requirement on the servo stepping motor, and has high cost, small adjustable range and low adjustment speed; or, the value of the capacitor is changed by controlling the number of the parallel capacitors, but the adjusting process of the method is not smooth enough, the design requirement on the capacitance value is high, and the complicated and variable load conditions are difficult to deal with. On the other hand, the method for changing the inductance value of the inductor in the impedance matching network mainly determines the number of the inductors connected in series through the on and off of the switching tubes, but the adjusting method also has the problem that the adjusting process is not smooth, and the peak problem may occur in the switching-on and switching-off process of the switch because the inductor current cannot change suddenly.
In view of the above, the present application adopts an X-type impedance matching network and a variable capacitance method to change the impedance of the impedance matching network, so that the total impedance of the load and the impedance matching network is consistent with the input impedance, thereby achieving the purpose of impedance matching.
Specifically, the incident wave and the reflected wave between the impedance matching network and the load are first collected by two directional couplers. Preferably, the directional coupler is a three-winding transformer structure. Illustratively, the directional coupler may collect the incident wave and the reflected wave by collecting the transmission signal and the reflected signal on a transmission line between the impedance matching network and the load.
S20: and acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave.
After collecting incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system, a directional coupler inputs the collected incident waves and reflected waves into an amplitude-phase measurement chip, judges whether the collected incident waves and the collected reflected waves are the same or not by adopting the amplitude-phase measurement chip, if the collected incident waves and the collected reflected waves are different, acquires an amplitude difference value and a phase angle difference value between the incident waves and the reflected waves, and converts the amplitude difference value and the phase angle difference value into an amplitude difference value signal V MAG And phase angle difference signal V PHS . In one embodiment, the calculation formula of the amplitude difference signal and the phase angle difference signal is as follows:
wherein, V SLP And V Φ As a slope, V can be obtained from FIG. 3 INA And V INB The power of incident wave and reflected wave, respectively, needs to be converted into dBm unit, phi (V) INA ) Is the phase angle of the incident wave, phi (V) INB ) Is the phase angle of the reflected wave, if the incident wave and the reflected wave are the same, then V MAG ＝0，V PHS =0; if the incident wave and the reflected wave are different, V MAG Is not equal to 0 and V PHS Not equal to 0. The amplitude and phase measuring chip has various options, and the AD8302 is preferably adopted in the embodiment of the application. Because the amplitude-phase measuring chip has a certain range limit to the intensity of the input signal, the directional coupling is realizedAn attenuation network is connected between the device and the amplitude and phase measuring chip and used for reducing the signal intensity, for example, the amplitude and phase measuring chip AD8302 requires the range of input signals to be-60-0 dBm, the input signal intensity is controlled in the range by the attenuation network, and the attenuation network has forms of T type, pi type and the like
S30: and generating a capacitance control signal according to the amplitude difference signal and the amplitude difference signal.
The capacitance control signal is a signal capable of controlling and changing the capacitance value of the capacitor. In the present embodiment, the capacitance control signal is preferably a capacitance control voltage. After obtaining an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave, the amplitude-phase measurement chip sends the amplitude difference signal and the phase angle difference signal to the control module, and the control module calculates and generates a capacitance control signal according to the amplitude difference signal and the amplitude difference signal after receiving the amplitude difference signal and the amplitude difference signal. Preferably, the control module is a single chip microcomputer module, and the selectable models of the single chip microcomputer module include but are not limited to a 51 single chip microcomputer, an STM32 single chip microcomputer, an MSP430 single chip microcomputer, a TMS single chip microcomputer and the like.
S40: adjusting a capacitance value of at least one adjustable capacitor in the impedance matching network by the capacitance control signal; the impedance matching network is a midpoint connection type X-type impedance matching network.
After the capacitance control signal is determined, the capacitance control signal is applied to at least one adjustable capacitance in the impedance matching network to adjust a capacitance value of the at least one adjustable capacitance in the impedance matching network. In this embodiment, the impedance matching network is a midpoint connection type X-type impedance matching network, and the impedance matching network includes at least one adjustable capacitor, and each adjustable capacitor can be adjusted as needed. The impedance matching network in the application can be understood by adopting the middle-point connection type X-type impedance matching network, the number of adjustable capacitors in the X-type impedance matching network is increased, compared with the traditional pi-type impedance matching network, L-type impedance matching network or gamma-type impedance matching network, the number of adjustable inductors and adjustable capacitors in the middle-point connection type X-type impedance matching network is more, when impedance matching is realized, when the capacitance value of one adjustable capacitor is not enough to realize impedance matching, the capacitance values of other adjustable capacitors can be adjusted, so that the requirement of impedance matching is met, and the adjustment range of impedance is expanded.
S50: adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitance.
Because the impedance matching network mainly comprises the adjustable inductor and the adjustable capacitor, and the impedance of the impedance matching network mainly depends on the inductance value of the adjustable inductor and the capacitance value of the adjustable capacitor, after the capacitance value of at least one adjustable capacitor in the impedance matching network is adjusted through the capacitance control signal, the impedance of the impedance matching network can be changed along with the adjustment, so that the total impedance of the load and the matching network is consistent with the input impedance, and the purpose of impedance matching is further achieved.
In the embodiment, an incident wave and a reflected wave between an impedance matching network and a load in a radio frequency power supply system are collected, an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave are obtained, a capacitance control signal is generated according to the amplitude difference signal and the amplitude difference signal, and a capacitance value of at least one adjustable capacitor in the impedance matching network is adjusted through the capacitance control signal; the impedance matching network is a midpoint connection type X-type impedance matching network, and the impedance of the impedance matching network is adjusted based on the adjusted at least one adjustable capacitor; according to the impedance matching method, the X-type impedance matching network is adopted, the impedance is changed by adopting a variable capacitor method, the adjusting process is smooth, the adjusting speed is high, the load change range is large, the total impedance of the load and the impedance matching network is consistent with the input impedance, the purpose of impedance matching is achieved, the accuracy and the reliability of impedance adjustment are improved, the adjusting range is enlarged, and the cost is reduced.
In one embodiment, referring to fig. 2, the X-type impedance matching network includes a first tunable capacitor C 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 A fourth adjustable capacitor C 4 A first adjustable inductor L 1 And a second adjustable inductance L 2 。
The first adjustable inductor L 1 And the first end of the first adjustable capacitor C 1 Is connected to the first end of the first adjustable inductor L 1 And the second end of the second adjustable capacitor C 2 Is connected to the first terminal of the second adjustable inductor L 2 And the third adjustable capacitor C 3 Is connected to the first terminal of the first adjustable inductor L, the second adjustable inductor L 2 And the second end of the fourth tunable capacitor C 4 Is connected to the first end of the first tunable capacitor C 1 Second terminal, said second adjustable capacitance C 2 Second terminal, the third adjustable capacitor C 3 And said fourth tunable capacitor C 4 Are coupled to the connection midpoints, respectively.
Illustratively, the X-type impedance matching network is connected to the load through a first transmission line and a second transmission line, respectively, and the first adjustable inductor L 1 And the first end of the first adjustable capacitor C 1 The first connection node of the first terminal of (a) is connected to a first transmission line, the first adjustable inductance L 1 And the second end of the second adjustable capacitor C 2 The second connection node of the first terminal of (a) is connected to the first transmission line, and the second adjustable inductor L 2 And the third adjustable capacitor C 3 Is connected to a second transmission line, the second adjustable inductor L 2 And the second end of the fourth tunable capacitor C 4 Is connected to the second transmission line. First adjustable inductor L in this embodiment 1 And a second adjustable inductance L 2 Is preferably a predetermined fixed value, selected as a band, mainly by applying a capacitance control signal to the first tunable capacitor C 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 And a fourth tunable capacitor C 4 So that the first tunable capacitor C 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 And a firstFour adjustable capacitors C 4 Is adjustable to change the impedance of the X-type impedance matching network.
In one embodiment, adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitor comprises: based on the first adjustable capacitor, the second adjustable capacitor, the third adjustable capacitor and the fourth adjustable capacitor, a first formula is adopted:
wherein the content of the first and second substances,
adjusting an impedance of the impedance matching network. In this embodiment, L 1 Is the inductance value of the first adjustable inductor, L 2 Is the inductance value of the second adjustable inductor. C 1 Is the capacitance value, C, of the first tunable capacitor 2 Is the capacitance value, C, of the second tunable capacitor 3 Capacitance value sum C of third tunable capacitor 4 Is the capacitance value of the fourth tunable capacitor. In practical application, the first adjustable capacitor C 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 And a fourth adjustable capacitor C 4 When one adjustable capacitor is not enough to realize impedance matching, the other one or more adjustable capacitance values can be adjusted until the impedance matching requirement is met. The present embodiment applies the capacitance control signal to the first tunable capacitor C 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 And a fourth adjustable capacitor C 4 Thereby realizing the change of the impedance of the X-type impedance matching network and expanding the adjustment range of the impedance.
It should be noted that, in this embodiment, the X-type impedance matching network includes four adjustable capacitors as an exemplary description, and the X-type impedance matching network in the present application may further include more adjustable capacitors, so as to expand an adjustment range of impedance and achieve an impedance matching requirement by adjusting capacitance values of the multiple adjustable capacitors.
In an embodiment, referring to fig. 4 below, the tunable capacitor includes a first metal layer, a second metal layer, and a third metal layer, a first capacitor region is formed between the first metal layer and the third metal layer, a second capacitor region is formed between the second metal layer and the third metal layer, the first capacitor region is provided with a dielectric medium with a first dielectric constant, the second capacitor region is provided with a dielectric medium with a second dielectric constant, and the second dielectric constant is greater than the first dielectric constant; capacitance value, C, of the tunable capacitor AB Is the capacitance size of the first capacitance interval, C BC The capacitance is the capacitance of the second capacitance interval.
The first capacitor interval is formed by matching a first metal layer and a second metal layer which are at least partially overlapped in projection in the longitudinal direction, when voltage is applied between the first metal layer and the second metal layer, charges can be stored between the first metal layer and the second metal layer, and the amount of charges which can be stored between the first metal layer and the second metal layer is the capacitance value C of the first capacitor interval AB . Similarly, the second capacitor region is formed by the cooperation of a second metal layer and a third metal layer, the projections of which in the longitudinal direction at least partially overlap, and when a voltage is applied between the second metal layer and the third metal layer, charges are stored between the second metal layer and the third metal layer, and the amount of charges that can be stored between the second metal layer and the third metal layer is the capacitance value C of the second capacitor region BC 。
Illustratively, the capacitance value of the adjustable capacitor is proportional to the projected overlapping area of the two metal layers in the longitudinal direction, and the larger the projected overlapping area of the two metal layers in the longitudinal direction is, the larger the capacitance value is; conversely, the smaller the projection overlap of the two metal layers in the longitudinal direction, the smaller the capacitance value. For example: the larger the projection overlapping area of the first metal layer and the second metal layer in the longitudinal direction is, the larger the capacitance value C of the first capacitance interval is AB The larger. The larger the projection overlapping area of the second metal layer and the third metal layer in the longitudinal direction is, the larger the capacitance value C of the second capacitance interval is BC The larger. Conversely, if the projection overlap of the two metal layers in the longitudinal direction is smallerThe smaller the capacitance value.
Illustratively, the capacitance value of the tunable capacitor is inversely proportional to the relative distance between the two metal layers, and the larger the relative distance between the two metal layers is, the smaller the capacitance value is; conversely, the smaller the relative distance between two metal layers, the larger the capacitance value. For example: the larger the relative distance between the first metal layer and the second metal layer is, the larger the capacitance value C between the first capacitor regions is AB The smaller the relative distance between the second metal layer and the third metal layer is, the smaller the capacitance value C of the second capacitance interval is BC The larger.
Therefore, the capacitance value C of the first capacitance interval can be adjusted by adjusting the projection overlapping area of the first metal layer and the second metal layer in the longitudinal direction and/or the relative distance between the first metal layer and the second metal layer AB And further changing the capacitance value of the adjustable capacitor. Additionally, the capacitance value C of the second capacitance interval can be adjusted by adjusting the projection overlapping area of the second metal layer and the third metal layer in the longitudinal direction and/or the relative distance between the second metal layer and the third metal layer BC And further changing the capacitance value of the adjustable capacitor.
Further, the dielectric of a first permittivity within the first capacitance interval in the present application is larger than the dielectric of a second permittivity within the second capacitance interval. According to the formula of capacitance calculation
Wherein C is a capacitance value, e is a dielectric constant of a medium between the capacitor plates, S is a projected overlapping area of the two metal layers in the longitudinal direction, and d is a relative distance between the two metal layers, and under the premise that the relative distance between the first metal layer and the second metal layer is the same as the relative distance between the second metal layer and the third metal layer, and the projected overlapping area of the first metal layer and the second metal layer in the longitudinal direction is the same as the projected overlapping area of the second metal layer and the third metal layer in the longitudinal direction, the capacitance value of the tunable capacitor mainly depends on the dielectric constant e of the medium between the capacitor platesA dielectric having a dielectric constant greater than a second dielectric constant in the second capacitance region, i.e. C AB Than C BC Much larger and C = C AB //C BC Therefore, the capacitance of the tunable capacitor C is mainly determined by the capacitance C of the second capacitor interval BC Therefore, the capacitance control signal is mainly applied to the second capacitance section to control the capacitance value C of the second capacitance section BC Adjustment is performed to change the value of the variable capacitance.
In an embodiment, the adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network by the capacitance control signal is a capacitance control voltage, and includes: based on the capacitance control voltage, a second formula is adopted: c = Q/U adjusts the capacitance value of at least one adjustable capacitor in the impedance matching network, wherein U is the capacitor control voltage, and Q is the charged quantity of the adjustable capacitor.
According to, the following;
wherein the content of the first and second substances,
after the capacitance value of each adjustable capacitor meeting the impedance matching requirement is determined, the capacitance value of each adjustable capacitor is changed by adjusting the dielectric constant epsilon of a medium between capacitor plates of each adjustable capacitor, and/or the projection overlapping area S of two metal layers in the longitudinal direction, and/or the relative distance d between the two metal layers. Under the premise that the capacitance value C of the adjustable capacitor is determined and the charge quantity of the adjustable capacitor is determined, the capacitor control voltage acting on each adjustable capacitor can be determined.
Illustratively, if the impedance matching network has a Z of 50 ohms, then at the first tunable inductance L 1 And a second inductance L 2 In the case of a determination, the first adjustable capacitance C can be determined 1 A second adjustable capacitor C 2 A third adjustable capacitor C 3 And a fourth tunable capacitor C 4 According to each of the capacitance valuesThe power adjusting Rong Shangde can determine the capacitance control voltage acting on each adjustable capacitor by the aid of the electric quantity, and the capacitance control voltage acts on each adjustable capacitor, so that total impedance of the load and the impedance matching network is consistent with input impedance, and impedance matching requirements are met.
In an embodiment, as shown in fig. 6, after the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system are collected, and before the amplitude difference signal and the phase angle difference signal between the incident wave and the reflected wave are obtained, the impedance matching adjusting method applied to the radio frequency power supply further includes the following steps:
s11: and judging whether the amplitude and the phase angle of the incident wave and the reflected wave are the same by adopting an amplitude-phase measurement chip.
Illustratively, when the total impedance of the load and the impedance matching network is consistent with the input impedance and the impedance is completely matched, there is no reflected wave on the transmission line, and the incident wave and the reflected wave collected by the directional coupler are the same, that is, only the incident wave is collected by the directional coupler at this time. The method and the device input incident waves and reflected waves collected by the directional coupler into the amplitude-phase measurement chip, and judge whether the amplitudes and the phase angles of the incident waves and the reflected waves are the same or not by using the amplitude-phase measurement chip. Specifically, the amplitude-phase measurement chip calculates the amplitudes and phase angles of the incident wave and the reflected wave to determine whether the amplitudes and phase angles of the incident wave and the reflected wave are the same.
S12: and if the amplitudes and the phase angles of the incident wave and the reflected wave are different, acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave.
The amplitude difference signal is preferably an amplitude difference voltage, and the phase angle difference signal is preferably a phase angle difference voltage. Illustratively, if the difference between the amplitude and the phase angle of the incident wave and the reflected wave calculated by the amplitude and phase measurement chip is not 0, that is, when the amplitude difference signal V is MAG And phase angle difference signal V PHS If the amplitudes and phase angles of the incident wave and the reflected wave are not 0, the difference value signal V between the amplitudes and the phase angles of the incident wave and the reflected wave is obtained MAG Sum phase angle difference signalNumber V PHS . The total impedance of the load and the impedance matching network is inconsistent with the input impedance, and the impedance is not matched.
S13: and if the amplitudes and the phase angles of the incident wave and the reflected wave are the same, returning to the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system.
Exemplarily, if the difference between the amplitude and the phase angle of the incident wave and the reflected wave calculated by the amplitude-phase measurement chip is 0, that is, when the amplitude difference signal V is MAG And phase angle difference signal V PHS And if the amplitudes and the phase angles of the incident wave and the reflected wave are both 0, indicating that the total impedance of the load and the impedance matching network is consistent with the input impedance, and returning to the step of acquiring the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system to continuously acquire the incident wave and the reflected wave after impedance matching.
In the embodiment, an amplitude-phase measurement chip is adopted to judge whether the amplitude and the phase angle of the incident wave and the reflected wave are the same; if the amplitudes and the phase angles of the incident wave and the reflected wave are different, acquiring an amplitude difference value and a phase angle difference value between the incident wave and the reflected wave; if the amplitude and the phase angle of the incident wave and the reflected wave are the same, returning to the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system; whether the amplitude and the phase angle of the incident wave and the reflected wave are the same or not is judged by adopting the amplitude-phase measurement chip so as to determine whether the impedance of the impedance matching network needs to be adjusted or not, and therefore the accuracy of adjusting the impedance of the impedance matching network is improved.
It should be understood that although the various steps in the flowcharts of fig. 5 and 6 are shown in order as indicated by the arrows, the steps are not necessarily performed in order as indicated by the arrows. The steps are not limited to being performed in the exact order illustrated and, unless explicitly stated herein, may be performed in other orders. Moreover, at least some of the steps in fig. 5-6 may include multiple sub-steps or multiple stages that are not necessarily performed at the same time, but may be performed at different times, and the order of performance of the sub-steps or stages is not necessarily sequential, but may be performed in turn or alternating with other steps or at least some of the sub-steps or stages of other steps.
In one embodiment, as shown in fig. 7, there is provided an impedance matching adjusting apparatus including: the system comprises an acquisition module 10, a first acquisition module 20, a generation module 30, an adjustment module 40 and an adjustment module 50, wherein:
the acquisition module 10 is used for acquiring incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system;
a first obtaining module 20, configured to obtain an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
a generating module 30, configured to generate a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
an adjusting module 40, configured to adjust a capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal; the impedance matching network is a midpoint connection type X-type impedance matching network;
an adjusting module 50, configured to adjust an impedance of the impedance matching network based on the adjusted at least one adjustable capacitor.
Further, as shown in fig. 8, the impedance matching adjusting apparatus further includes:
the judging module 11 is configured to judge whether the amplitudes and the phase angles of the incident wave and the reflected wave are the same by using an amplitude-phase measurement chip;
a second obtaining module 12, configured to obtain an amplitude difference value and a phase angle difference value between the incident wave and the reflected wave when the amplitudes and the phase angles of the incident wave and the reflected wave are different;
and a return execution module 13, configured to return to execute the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system when the amplitudes and the phase angles of the incident wave and the reflected wave are the same.
For the specific definition of the impedance matching adjusting device, reference may be made to the above definition of the impedance matching adjusting method, which is not described herein again. The modules in the impedance matching adjusting apparatus may be implemented in whole or in part by software, hardware, or a combination thereof. The modules can be embedded in a processor in a hardware form or in an independent radio frequency power supply system, and can also be stored in a memory in the radio frequency power supply system in a software form, so that the processor can call and execute the corresponding operation of each module.
In one embodiment, a radio frequency power supply system is provided, the internal structure of which can be as shown in fig. 9. The radio frequency power supply system comprises a processor, a memory, a network interface, a display screen and an input device which are connected through a system bus. Wherein the processor of the radio frequency power supply system is configured to provide computing and control capabilities. The memory of the radio frequency power supply system comprises a nonvolatile storage medium and an internal memory. The non-volatile storage medium stores an operating system and a computer program. The internal memory provides an environment for the operation of an operating system and computer programs in the non-volatile storage medium. The network interface of the radio frequency power supply system is used for connecting and communicating with an external radio frequency power supply system through a network. The computer program is executed by a processor to implement an impedance matching adjustment method. The display screen of the radio frequency power supply system can be a liquid crystal display screen or an electronic ink display screen, and the input device of the radio frequency power supply system can be a touch layer covered on the display screen, a key, a track ball or a touch pad arranged on the shell of the radio frequency power supply system, an external keyboard, a touch pad or a mouse and the like.
It will be understood by those skilled in the art that the structure shown in fig. 9 is a block diagram of only a portion of the structure relevant to the present application, and does not constitute a limitation on the impedance matching adjustment method to which the present application is applied, and a particular rf power supply system may include more or less components than those shown in the figure, or combine some components, or have a different arrangement of components.
In one embodiment, there is provided a radio frequency power supply system comprising a memory and a processor, the memory having stored therein a computer program, the processor implementing the following steps when executing the computer program:
acquiring incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system;
acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal, wherein the impedance matching network is a midpoint connection type X-type impedance matching network;
adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitance.
In one embodiment, a computer-readable storage medium is provided, having a computer program stored thereon, which when executed by a processor, performs the steps of:
acquiring incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system;
acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal, wherein the impedance matching network is a midpoint connection type X-type impedance matching network;
adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitance.
It will be understood by those skilled in the art that all or part of the processes of the methods of the embodiments described above can be implemented by hardware instructions of a computer program, which can be stored in a non-volatile computer-readable storage medium, and when executed, can include the processes of the embodiments of the methods described above. Any reference to memory, storage, database, or other medium used in the embodiments provided herein may include non-volatile and/or volatile memory, among others. Non-volatile memory can include read-only memory (ROM), programmable ROM (PROM), electrically Programmable ROM (EPROM), electrically Erasable Programmable ROM (EEPROM), or flash memory. Volatile memory can include Random Access Memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in a variety of forms such as Static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double Data Rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous Link DRAM (SLDRAM), rambus (Rambus) direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM).
The technical features of the above embodiments can be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the above embodiments are not described, but should be considered as the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the claims. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. An impedance matching adjustment method is applied to a radio frequency power supply system, and comprises the following steps:
acquiring incident waves and reflected waves between an impedance matching network and a load in a radio frequency power supply system;
acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
adjusting a capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal, wherein the impedance matching network is a midpoint connection type X-type impedance matching network, the X-type impedance matching network comprises a plurality of adjustable capacitors, and the impedance matching network is configured to adjust one or more other adjustable capacitance values when one of the adjustable capacitors is not enough to realize impedance matching until an impedance matching requirement is met;
adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitance.
2. The impedance matching method of claim 1, wherein the X-type impedance matching network comprises a first tunable capacitor, a second tunable capacitor, a third tunable capacitor, a fourth tunable capacitor, a first tunable inductor, and a second tunable inductor,
the first end of the first adjustable inductor is connected with the first end of the first adjustable capacitor, the second end of the first adjustable inductor is connected with the first end of the second adjustable capacitor, the first end of the second adjustable inductor is connected with the first end of the third adjustable capacitor, the second end of the second adjustable inductor is connected with the first end of the fourth adjustable capacitor, and the second end of the first adjustable capacitor, the second end of the second adjustable capacitor, the second end of the third adjustable capacitor and the second end of the fourth adjustable capacitor are respectively coupled to the connection midpoint.
3. The impedance matching adjustment method of claim 2, wherein adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitor comprises:
based on the adjusted first adjustable capacitor, second adjustable capacitor, third adjustable capacitor and fourth adjustable capacitor, a first formula is adopted:
wherein j is an imaginary part symbol of the complex impedance, ω is an angular frequency, ω L is an inductive reactance of the inductor, j ω L is a complex impedance of the inductor, ω C is a capacitive reactance of the capacitor, j ω C is a complex impedance of the capacitor, L1 is an inductance value of the first tunable inductor, L2 is an inductance value of the second tunable inductor, C1 is a capacitance value of the first tunable capacitor, C2 is a capacitance value of the second tunable capacitor, C3 is a capacitance value of the third tunable capacitor, and C4 is a capacitance value of the fourth tunable capacitor, Z L Is the load impedance of the impedance matching network and Z is the impedance of the impedance matching network to adjust the impedance of the impedance matching network.
4. The impedance matching adjustment method according to claim 1, wherein the tunable capacitor comprises a first metal layer, a second metal layer and a third metal layer, a first capacitor region is formed between the first metal layer and the third metal layer, a second capacitor region is formed between the second metal layer and the third metal layer, the first capacitor region is provided with a dielectric medium with a first dielectric constant, the second capacitor region is provided with a dielectric medium with a second dielectric constant, and the second dielectric constant is greater than the first dielectric constant; capacitance value C = C of the adjustable capacitor AB / /C BC ，C AB Is the capacitance of the first capacitance interval, C BC The capacitance is the capacitance of the second capacitance interval.
5. The impedance matching adjustment method according to claim 1, wherein the capacitance control signal is a capacitance control voltage, and the adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network by the capacitance control signal comprises:
based on a second formula: c =
And adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network by adopting the capacitance control signal, wherein U is capacitance control voltage, and Q is the charged quantity of the adjustable capacitor.
6. The impedance matching adjusting method according to claim 1, after collecting an incident wave and a reflected wave between an impedance matching network and a load in a radio frequency power supply system and before acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave, the impedance matching adjusting method applied to a radio frequency power supply further comprising:
judging whether the amplitude and the phase angle of the incident wave and the reflected wave are the same by adopting an amplitude-phase measurement chip;
if the amplitude and the phase angle of the incident wave and the reflected wave are different, obtaining an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
and if the amplitude and the phase angle of the incident wave and the reflected wave are the same, returning to execute the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system.
7. An impedance matching adjusting apparatus, comprising:
the acquisition module is used for acquiring incident waves and reflected waves between an impedance matching network and a load in the radio frequency power supply system;
the first acquisition module is used for acquiring an amplitude difference signal and a phase angle difference signal between the incident wave and the reflected wave;
the generating module is used for generating a capacitance control signal according to the amplitude difference signal and the phase angle difference signal;
the adjusting module is used for adjusting the capacitance value of at least one adjustable capacitor in the impedance matching network through the capacitance control signal; the impedance matching network is a midpoint connection type X-type impedance matching network, the X-type impedance matching network comprises a plurality of adjustable capacitors, and the impedance matching network is configured to adjust one or more other adjustable capacitance values when one adjustable capacitor is not enough to realize impedance matching until the impedance matching requirement is met;
and the adjusting module is used for adjusting the impedance of the impedance matching network based on the adjusted at least one adjustable capacitor.
8. The impedance matching adjustment apparatus according to claim 7, further comprising:
the judging module is used for judging whether the amplitude and the phase angle of the incident wave and the reflected wave are the same by adopting an amplitude-phase measuring chip;
the second acquisition module is used for acquiring an amplitude difference value and a phase angle difference value between the incident wave and the reflected wave when the amplitudes and the phase angles of the incident wave and the reflected wave are different;
and the return execution module is used for returning to execute the step of collecting the incident wave and the reflected wave between the impedance matching network and the load in the radio frequency power supply system when the amplitude and the phase angle of the incident wave and the reflected wave are the same.
9. A radio frequency power supply system comprising a memory and a processor, the memory storing a computer program, wherein the processor implements the steps of the impedance matching adjusting method according to any one of claims 1 to 6 when executing the computer program.
10. A computer-readable storage medium on which a computer program is stored, the computer program, when being executed by a processor, implementing the impedance matching adjusting method according to any one of claims 1 to 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111618347.9A CN114448376B (en) | 2021-12-27 | 2021-12-27 | Impedance matching adjusting method and device, radio frequency power supply system and storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111618347.9A CN114448376B (en) | 2021-12-27 | 2021-12-27 | Impedance matching adjusting method and device, radio frequency power supply system and storage medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114448376A CN114448376A (en) | 2022-05-06 |
| CN114448376B true CN114448376B (en) | 2023-03-24 |
Family
ID=81365803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111618347.9A Active CN114448376B (en) | 2021-12-27 | 2021-12-27 | Impedance matching adjusting method and device, radio frequency power supply system and storage medium |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114448376B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115622377B (en) * | 2022-12-21 | 2023-03-07 | 深圳市恒运昌真空技术有限公司 | Impedance matching method and system based on fractional order element |
| CN116190190B (en) * | 2023-04-25 | 2023-07-25 | 季华实验室 | Automatic impedance matching method, device, system, electronic equipment and storage medium |
| CN117517777A (en) * | 2024-01-05 | 2024-02-06 | 季华实验室 | Amplitude and phase detection circuit and impedance matcher |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113437810A (en) * | 2021-08-02 | 2021-09-24 | 无锡职业技术学院 | WPT system impedance matching method based on GA-BP algorithm |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7711337B2 (en) * | 2006-01-14 | 2010-05-04 | Paratek Microwave, Inc. | Adaptive impedance matching module (AIMM) control architectures |
| JP5327785B2 (en) * | 2008-08-07 | 2013-10-30 | 株式会社京三製作所 | Impedance matching device and impedance matching method |
| CN102347745A (en) * | 2010-08-04 | 2012-02-08 | 国基电子（上海）有限公司 | Adaptive impedance matching circuit |
| CN103107793B (en) * | 2011-11-09 | 2016-06-01 | 中国科学院微电子研究所 | A kind of transmission line automatic impedance matching system |
| CN108878240B (en) * | 2017-05-10 | 2020-08-21 | 北京北方华创微电子装备有限公司 | Impedance matching device and semiconductor processing equipment |
| CN112929002A (en) * | 2021-02-05 | 2021-06-08 | 广东工业大学 | Impedance matching adjusting method and device applied to radio frequency power supply |
-
2021
- 2021-12-27 CN CN202111618347.9A patent/CN114448376B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113437810A (en) * | 2021-08-02 | 2021-09-24 | 无锡职业技术学院 | WPT system impedance matching method based on GA-BP algorithm |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114448376A (en) | 2022-05-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114448376B (en) | Impedance matching adjusting method and device, radio frequency power supply system and storage medium | |
| CN108718199B (en) | Antenna self-adaptive impedance matcher and matching method | |
| US9041611B2 (en) | Impedance matching method for a multiband antenna, and transmission or receiver channel having automatic matching | |
| US9698758B2 (en) | Methods for tuning an adaptive impedance matching network with a look-up table | |
| Van Bezooijen et al. | Adaptive impedance-matching techniques for controlling L networks | |
| US4859972A (en) | Continuous phase shifter for a phased array hyperthermia system | |
| CN101741337B (en) | Impedance adjusting device and impedance matching system comprising same | |
| CN216774729U (en) | Radio frequency power supply system | |
| CN101374381A (en) | Method and system for matching radio frequency impedance | |
| KR101967046B1 (en) | Communication device and method for determining a load impedance | |
| CN103562736A (en) | Simple and minimally invasive methods and systems for sensing and computing load impedance | |
| CN114866096A (en) | Antenna impedance tuning method, antenna impedance tuning device, terminal equipment and storage medium | |
| US8067858B2 (en) | Low-distortion voltage variable capacitor assemblies | |
| Oh et al. | A self-matching rectifier based on an artificial transmission line for enhanced dynamic range | |
| WO2021129777A1 (en) | Ultra-wideband phase shift circuit | |
| CN115622377B (en) | Impedance matching method and system based on fractional order element | |
| CN110536534B (en) | Impedance adjusting method and device of matching box and radio frequency power supply system | |
| KR102494085B1 (en) | Circuits for impedance matching between generators and loads at multiple frequencies, assemblies containing such circuits, and related uses | |
| CN114499435A (en) | Impedance matching network adjusting method | |
| RU2649050C1 (en) | Microwave analogue phase shifter and the system containing it | |
| CN108681626B (en) | Method for quickly adjusting plasma discharge impedance matching | |
| Albuquerque et al. | Implementation of beam-steering front-ends at 2.45 GHz using modified Wilkinson power dividers, reflexion type phase shifters and C-shape monopole antennas: First results | |
| Arabi et al. | Analysis of the coverage of tunable matching networks for the imperfect matching case | |
| Zheng et al. | Constraints on efficient control of tunable impedance matching network based on barium-strontium-titanate thick-film varactors | |
| CN117459011B (en) | Radio frequency circuit, radio frequency power supply equipment and reactance compensation method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: Yue Weiping Inventor after: Lin Weiqun Inventor before: Yue Weiping Inventor before: Lin Weiqun Inventor before: Zhang Guidong |
|
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 518000 functional supporting area B, Taohuayuan Zhichuang Town, Tiegang community, Xixiang street, Bao'an District, Shenzhen, Guangdong 101201301 Patentee after: Shenzhen Hengyunchang Vacuum Technology Co.,Ltd. Country or region after: China Address before: 518000 functional supporting area B, Taohuayuan Zhichuang Town, Tiegang community, Xixiang street, Bao'an District, Shenzhen, Guangdong 101201301 Patentee before: SHENZHEN HENGYUNCHANG VACUUM TECHNOLOGY CO.,LTD. Country or region before: China |