CN114002768B - Optical element, projection module and electronic equipment - Google Patents
Optical element, projection module and electronic equipment Download PDFInfo
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- CN114002768B CN114002768B CN202111266936.5A CN202111266936A CN114002768B CN 114002768 B CN114002768 B CN 114002768B CN 202111266936 A CN202111266936 A CN 202111266936A CN 114002768 B CN114002768 B CN 114002768B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
- G02B5/1871—Transmissive phase gratings
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/206—Control of light source other than position or intensity
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Abstract
The invention discloses an optical element, a projection module and electronic equipment. The optical element comprises a substrate and a plurality of microstructures, the microstructures are formed on the substrate, and the microstructures satisfy the following relational expression: cos (phi) 1 )＝cos(Φ 2 +Φ 3 ) Thereby enabling the plurality of microstructures to achieve the design purpose of collimating and diffracting light rays entering the optical element. The microstructure provided by the invention has the effect of collimating and diffracting light rays entering the optical element, so that the light rays entering the optical element are converted into collimated light rays without adding a collimating mirror to the optical element, the use of parts is reduced, the volume of the optical element is reduced, the design purpose of miniaturization of the optical element is favorably realized, and the production cost is reduced. The optical element provided by the invention can meet the design requirement of miniaturization of the optical element and reduce the production cost of the optical element while ensuring the diffraction effect of the optical element.
Description
Technical Field
The present invention relates to the field of optoelectronic technologies, and in particular, to an optical device, a projection module, and an electronic apparatus.
Background
The diffractive optical element is a main optical element of an imaging device such as a projection module, and in the related art, a method of adding a collimating mirror is usually adopted to achieve a diffraction effect of the diffractive optical element. However, in this method, the distance between the collimator lens and the diffractive optical element is often large, which results in a large height of the entire projection module and makes it difficult to achieve a compact design. In addition, the addition of the collimator increases the device cost and the processing cost of the projection module.
Disclosure of Invention
The embodiment of the invention discloses an optical element, a projection module and electronic equipment, which can meet the design requirement of miniaturization of the optical element and reduce the production cost of the optical element while ensuring the diffraction effect of the optical element.
In order to achieve the above object, in a first aspect, the present invention discloses an optical element comprising
A substrate, which is a light-transmitting substrate; and
the microstructures are formed on the substrate in a protruding mode and used for collimating and diffracting light rays entering the optical element;
the microstructure satisfies the following relation:
cos(Φ 1 )＝cos(Φ 2 +Φ 3 )，
and
wherein phi 1 The phase of light after passing through the microstructure, phi 2 Is the phase position phi of light after passing through a preset virtual collimation microstructure at the position corresponding to the microstructure 3 Is the phase position of light after passing through a preset virtual diffraction microstructure at a position corresponding to the microstructure, lambda is the wavelength of the light, n is the refractive indexes of the microstructure, the preset virtual collimation microstructure and the preset virtual diffraction microstructure, d 1 Height of said predetermined virtual alignment microstructure at a position corresponding to said microstructure, d 2 Height of said predetermined virtual diffractive microstructure in a position corresponding to said microstructure, d 3 Is the height of the microstructure.
Microstructure refers to a heterogeneous structure in a crystal structure that can be observed only by means of an optical microscope or an electron microscope. The phase refers to a numerical value representing the state of the light at a certain moment when the light is cosine-changed. E.g. phi 1 Indicating the phase, phi, of the light at that moment after it has passed through the microstructure 2 The phase position phi of the light ray at the moment after the light ray passes through the preset virtual collimation microstructure at the position corresponding to the microstructure 3 And the phase of the light ray at the moment state is shown after the light ray passes through the preset virtual diffraction microstructure at the position corresponding to the microstructure. When the above relation is satisfied, the bookThe microstructure provided by the invention has the effect of collimating and diffracting light rays entering the optical element, so that the light rays entering the optical element are converted into collimated light rays without adding a collimating mirror in the optical element, the use of parts is reduced, the volume of the optical element is reduced, and the design purpose of miniaturization of the optical element is favorably realized. Because the collimating mirror component does not need to be additionally arranged, devices required by the optical element are reduced, and the production cost of the optical element is favorably reduced. In addition, the projection height of the microstructure is calculated through the formula, so that a model of the optical element can be accurately established, each microstructure can be accurately prepared according to the calculation result in the process of preparing the optical element, and the design purpose of collimating and diffracting the light rays entering the optical element is further achieved.
As an optional implementation manner, in the embodiment of the present invention, the phase Φ of the light after passing through the microstructure 1 And the phase phi of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure 2 And the phase phi of light rays passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 All are 0-pi.
Defining the phase phi of light after passing through the microstructure 1 And the phase phi of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure 2 And the phase phi of light after passing through a preset virtual diffraction microstructure at the position corresponding to the microstructure 3 The range is satisfied, the collimation and diffraction of the light rays entering the optical element can be realized by the microstructure, and the phase phi of the light rays passing through the microstructure is controlled 1 Phase phi of light after passing through a preset virtual collimation microstructure at a position corresponding to the microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 In a smaller range, thereby controlling the protrusion height d of each microstructure 3 And the optical element is in a smaller range, so that the overall height of the optical element is proper, and the design requirement of miniaturization of the optical element is favorably realized.
As a kind ofOptionally, in an embodiment of the present invention, the protrusion height of the microstructure has multiple steps, and the step number of the protrusion height of the microstructure is 2 n Wherein n is a positive integer. When the projection heights of the microstructures are in different orders, the diffraction effects of the optical elements are different. Therefore, the optical element can be suitable for various different use scenes by controlling the order of the projection height of the microstructure, and the application range of the optical element is further improved.
As an optional implementation manner, in the embodiment of the present invention, when the order of the protrusion height of the microstructure is second order, the phase of the light after entering the microstructure is 0 or pi.
As an optional implementation manner, in the embodiment of the present invention, when the order of the protrusion height of the microstructure is four, the phase of the light after entering the microstructure is 0, pi/3, 2 pi/3, or pi.
As an optional implementation manner, in the embodiment of the present invention, when the order of the protrusion height of the microstructure is eighth, the phase of the light after entering the microstructure is 0, pi/7, 2 pi/7, 3 pi/7, 4 pi/7, 5 pi/7, 6 pi/7, or pi.
The order of the protrusion height of the microstructure can be various, for example, the protrusion height of the microstructure can be second order, fourth order, eighth order, sixteenth order or thirty-second order. When the orders of the projection heights of the microstructures are in different values, the diffraction effects of the microstructures are different, and therefore the microstructures can be suitable for different scenes, such as a projector, a display screen, a stage effect or electronic equipment. In addition, because the protruding high rank order of micro-structure is multistage, in order to realize that micro-structure diffraction effect can evenly pass through, the protruding height of micro-structure is even change gradient, and then the phase place that light passed through the micro-structure also is even change gradient. For example, when the protrusion height of the microstructure is of the fourth order, the protrusion height of the microstructure is 0, h/3, 2h/3 or h, where h is the protrusion height of the microstructure when the phase of the light passing through the microstructure is pi. Height d of protrusion through microstructure 3 Phase phi of light after being injected into the microstructure 1 BetweenThe phase of the light after entering the microstructure is 0, pi/3, 2 pi/3 or pi.
As an alternative, in the embodiment of the present invention, the height of the protrusions of the microstructure is changed stepwise or not stepwise.
When the projection heights of the microstructures are in different change modes, the diffraction effects of the optical elements are different. Therefore, the height of the protrusions of the microstructure is controlled to change in a stepped manner or in a non-stepped manner, so that the optical element can be suitable for various different use scenes, and the application range of the optical element is further improved.
As an optional implementation manner, in an embodiment of the present invention, the optical element further includes a substrate, and the substrate is disposed on a side of the base facing away from the microstructure. It is understood that, on the one hand, the substrate is used for bearing a base to realize the formation of a plurality of microstructures on the base; on the other hand, the substrate can prevent the substrate from moving in the process of forming the microstructure on the substrate to influence the formation of the microstructure, and further influence the production yield of the optical element.
As an alternative implementation, in the embodiment of the present invention, the substrate is transparent glass or transparent plastic. The transparent glass is adopted as the material of the substrate, which is beneficial to improving the optical performance of the optical element, and the transparent plastic is adopted, which can reduce the mass of the optical element and is beneficial to realizing the portability of the optical element.
In a second aspect, the present disclosure provides a projection module, which includes a light source emitter and the optical element of the first aspect, wherein the light source emitter is disposed on a side of the substrate facing away from the microstructure. The projection module with the optical element of the first aspect can not only realize a good diffraction effect, but also meet the design requirement of miniaturization of the projection module and reduce the production cost of the projection module.
As an alternative implementation, in an embodiment of the invention, the optical element comprises
A substrate, which is a light-transmitting substrate; and
a plurality of microstructures formed on the substrate, wherein the projection height of the microstructures is in multiple stages, and the order of the projection height of the microstructures is 2 n Wherein n is a positive integer.
When the projection heights of the microstructures are in different orders, the diffraction effects of the optical elements are different. Therefore, the projection module can be suitable for various different use scenes by controlling the order of the projection height of the microstructure, and the application range of the projection module is further widened.
In a third aspect, the invention discloses an electronic device, which includes a housing and the projection module set in the second aspect, wherein the projection module set is disposed in the housing. The electronic equipment with the projection module of the second aspect can not only realize good diffraction effect, but also realize the design requirement of miniaturization of the electronic equipment and reduce the production cost of the electronic equipment.
In a fourth aspect, the present invention discloses a method for producing an optical element, which is the optical element according to the first aspect, the method comprising
Providing a substrate;
the substrate surface is treated to form a plurality of microstructures on the surface of the substrate.
By adopting the preparation method, the optical element of the first aspect can be conveniently, efficiently and massively produced and prepared.
As an alternative implementation, in the embodiment of the present invention, the microstructure satisfies the following relation: cos (phi) 1 )＝cos(Φ 2 +Φ 3 )；
Wherein phi 1 The phase of the light after passing through the microstructure, Φ 2 Is the phase position phi of light after passing through a preset virtual collimation microstructure at the position corresponding to the microstructure z The phase position of the light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure is shown.
The phase of the light after passing through the microstructure is determined through the relational expression, and the purpose of accurately preparing the optical element can be achieved.
As an alternative implementation manner, in the embodiment of the present invention, the microstructure is formed on the substrate by etching, imprinting or radium etching.
Due to the mature technology of the preparation method, the optical element of the first aspect can be accurately, conveniently, efficiently and massively produced and prepared by the preparation method.
Compared with the prior art, the invention has the beneficial effects that:
the embodiment of the invention provides an optical element, a projection module and electronic equipment, wherein the optical element comprises a substrate and a plurality of microstructures, the microstructures are formed on the substrate, and the microstructures meet the following relational expression: cos (phi) 1 )＝cos(Φ 2 +Φ 3 ) So as to realize the design purpose that the microstructure collimates and diffracts the light rays entering the optical element. That is to say, the microstructure provided by the invention has the effect of collimating and diffracting light rays entering the optical element, so that the light rays entering the optical element are converted into collimated light rays without adding a collimating mirror on the optical element, the use of parts is reduced, the volume of the optical element is reduced, and the design purpose of miniaturization of the optical element is favorably realized. Because the collimating mirror component does not need to be additionally arranged, devices required by the optical element are reduced, and the production cost of the optical element is favorably reduced. In addition, the invention provides a microstructure with a protrusion height d 3 Can be represented by formula
And (4) calculating. That is, the projection height of the microstructure can be calculated by the formula, so that each microstructure can be accurately prepared according to the calculation result in the process of preparing the microstructure, and the design purpose of collimating and diffracting the light rays entering the optical element is realized.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural view of an optical element in the related art;
FIG. 2 is a schematic structural diagram of an optical device according to an embodiment of the present disclosure;
FIG. 3 is a schematic diagram of a method for determining a protrusion height of a microstructure according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of microstructures with different orders according to an embodiment of the present invention;
FIG. 5 is a schematic structural diagram of an optical device with a substrate according to an embodiment of the disclosure;
FIG. 6 is a schematic diagram of the diffraction effect of an optical element according to an embodiment of the disclosure;
FIG. 7 is a schematic structural diagram of a projection module according to an embodiment of the disclosure;
FIG. 8 is a schematic structural diagram of an electronic device according to an embodiment of the disclosure;
fig. 9 is a flowchart of a method for manufacturing an optical element according to an embodiment of the present disclosure.
Icon: 10. an optical element; 11. a substrate; 12. a microstructure; 13. presetting a virtual collimation microstructure; 14. presetting a virtual diffraction microstructure; 15. a substrate; 20. a light source emitter; 100. a projection module; 200. a housing; 1000. an electronic device.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
In the present invention, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "center", "vertical", "horizontal", "lateral", "longitudinal", and the like indicate an orientation or positional relationship based on the orientation or positional relationship shown in the drawings. These terms are used primarily to better describe the invention and its embodiments and are not intended to limit the indicated devices, elements or components to a particular orientation or to be constructed and operated in a particular orientation.
Moreover, some of the above terms may be used to indicate other meanings besides the orientation or positional relationship, for example, the term "on" may also be used to indicate some kind of attachment or connection relationship in some cases. The specific meanings of these terms in the present invention can be understood by those skilled in the art as appropriate.
Furthermore, the terms "mounted," "disposed," "provided," "connected," and "connected" are to be construed broadly. For example, it may be a fixed connection, a removable connection, or a unitary construction; can be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements or components. The specific meanings of the above terms in the present invention can be understood according to specific situations by those of ordinary skill in the art.
Furthermore, the terms "first," "second," and the like, are used primarily to distinguish one device, element, or component from another (the specific nature and configuration may be the same or different), and are not used to indicate or imply the relative importance or number of the indicated devices, elements, or components. "plurality" means two or more unless otherwise specified.
The technical solution of the present invention will be further described with reference to the following embodiments and the accompanying drawings.
Referring to fig. 1, in the optical element 1 of the related art, in order to achieve a better diffraction effect, a collimating lens 1a is usually added to the optical element 1 to achieve the purpose of collimating light, so that the diffraction effect of the diffractive optical element 1 is better. That is, as shown in fig. 1, the optical element 1 includes a collimator lens 1a and a diffraction lens 1b, the collimator lens 1a is disposed on the light entering side of the diffraction lens 1b and is spaced from the diffraction lens 1b, the collimator lens 1a is configured to convert light entering the optical element 1 into collimated light, and the diffraction lens 1b is configured to convert light collimated by the collimator lens into structured light, so as to realize the diffraction effect of the optical element 1.
Although the addition of the collimator lens 1a can collimate light and improve the diffraction effect of the optical element 1, the collimator lens 1a and the diffraction lens 1b are separated and spaced from each other, so that the volume of the optical element 1 is increased, which is not favorable for the design requirement of miniaturization of the optical element 1, and in addition, the addition of the collimator lens 1a also improves the production cost of the optical element 1.
Based on this, the present embodiment provides an optical element 10, where the optical element 10 includes a substrate 11 and a plurality of microstructures 12 formed on the substrate 11, and the plurality of microstructures 12 can collimate and diffract light entering the optical element 10. In other words, the embodiment of the present application mainly realizes the integration of the collimating function and the diffracting function through the microstructures 12, so that the requirement of miniaturization design of the optical element 10 can be met without additionally adding a collimating mirror, and meanwhile, the production cost of the optical element 10 can be reduced.
The optical element 10 according to the embodiment of the present application will be described in detail below with reference to the drawings.
Referring to fig. 2, a first aspect of the present application discloses an optical element 10, where the optical element 10 includes a substrate 11 and a plurality of microstructures 12. The substrate 11 is a light-transmitting substrate 11, the plurality of microstructures 12 are formed on the substrate 11 in a protruding manner, and the microstructures 12 are used for collimating and diffracting light rays entering the optical element 10.
It is understood that microstructure 12 refers to any of a variety of non-uniform structures in the crystal structure that need to be observed by light microscopy or electron microscopy. When the microstructure 12 is formed on the substrate 11, the microstructure 12 is formed mainly by processing the surface of the substrate 11. Specifically, the microstructures 12 may be formed on the substrate 11 by etching, imprinting, or laser etching, and specifically, the microstructures 12 may be formed on the substrate by an exposure method, a screen printing method, a nanoimprinting, or a laser etching.
The microstructure 12 provided by the embodiment has the effect of collimating and diffracting the light entering the optical element 10, so that the light entering the optical element 10 is converted into collimated light without adding a collimating mirror in the optical element 10, the use of components is reduced, the volume of the optical element 10 is reduced, and the design purpose of miniaturization of the optical element 10 is facilitated. In addition, since no collimating mirror component is required to be additionally arranged, the number of devices required for the optical element 10 is reduced, which is beneficial to reducing the production cost of the optical element 10.
Further, as can be seen from the foregoing, the microstructure 12 is formed on the substrate 11 in a protruding manner, and the microstructure 12 is a set of a collimating function and a diffracting function, so that the microstructure 12 satisfies the following relation: cos (phi) 1 )＝cos(Φ 2 +Φ 3 ). Wherein phi 1 The phase, phi, of light after passing through the microstructure 12 2 The phase position phi of the light after passing through the preset virtual collimating microstructure 13 at the position corresponding to the microstructure 12 3 The phase of the light after passing through the predetermined virtual diffraction microstructure 14 at the position corresponding to the microstructure 12.
The phase refers to a numerical value representing the state of the light at a certain moment when the light is cosine-changed. E.g. phi 1 Indicating the phase, phi, of the light at that moment after it has passed through the microstructure 12 2 The phase, Φ, of the light at the moment after it has passed through the predetermined virtual collimating microstructure 13 at the position corresponding to the microstructure 12 3 Which represents the phase of the light at the moment after the light passes through the predetermined virtual diffractive microstructure 14 at the position corresponding to the microstructure 12. When the above relational expression is satisfied, the microstructure 12 provided by the present invention has an effect of collimating and diffracting light incident on the optical element 10.
Specifically, the preset virtual collimating microstructure 13 and the preset virtual diffractive microstructure 14 refer to a collimating mirror and a diffractive mirror employed in the related art to achieve a desired diffractive effect of the optical element 10. I.e. presetting virtual collimating microstructure 13And the predetermined virtual diffractive microstructure 14 are cited only to meet the design requirements and do not exist in the optical element 10 provided in the present embodiment. For example, as shown in fig. 1, fig. 1 shows a collimating mirror 1a and a diffracting mirror 1b, when the collimating function and the diffracting function are integrated into the microstructure 12, the phase of the light entering the microstructure 12 can be determined by the phase of the light entering the collimating mirror 1a and the diffracting mirror 1b at the position corresponding to the microstructure 12. For example, when the expected diffraction effect to be achieved by the optical element 10 is speckle effect, the phase Φ of the light after passing through the predetermined virtual collimating microstructure 13 corresponding to the microstructure 12 is determined 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 The phase phi of the light after passing through the microstructure 12 1 The above relation is satisfied. Phase phi after light rays are incident on the microstructure 12 1 When the above relational expression is satisfied, the microstructures 12 can achieve the design purpose of collimating and diffracting the light entering the optical element 10, that is, the optical element 10 can achieve the design requirement of collimating and diffracting the light entering the optical element 10, and at the same time, reduce the use of the collimating mirror 1a, further reduce the volume of the optical element 10, and is beneficial to achieving the design requirement of miniaturization of the optical element 10 and reducing the cost required for producing the optical element 10.
Further, the phase of the light after passing through the predetermined virtual collimating microstructure 13 at the position corresponding to the microstructure 12
Where λ is the wavelength of the light, n is the refractive index of the predetermined virtual collimating microstructure 13, d 1 The height of a pre-defined virtual collimating microstructure 13, which is the position corresponding to microstructure 12, is 1, the refractive index of air. Phase of light after passing through a preset virtual diffraction microstructure 14 at a position corresponding to the microstructure 12
Wherein λ is the wavelength of light, n is the refractive index of the predetermined virtual diffraction microstructure 14, d 2 Is opposite to the microstructure 12The height of the virtual diffractive microstructure 14 at the corresponding location is predetermined, 1 being the refractive index of air.
From the above, the phase Φ of the light passing through the predetermined virtual collimating microstructure 13 at the position corresponding to the microstructure 12 is known 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 Calculated according to the above relation, i.e. the phase phi of the light passing through the predetermined virtual collimating microstructure 13 at the position corresponding to the microstructure 12 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 The wavelength of light rays entering the preset virtual collimating microstructure 13 and the preset virtual diffracting microstructure 14, the refractive indexes of the preset virtual collimating microstructure 13 and the preset virtual diffracting microstructure 14, and the heights of the corresponding positions of the preset virtual collimating microstructure 13 and the preset virtual diffracting microstructure 14 and the microstructure 12. Wherein, λ, n, d 1 And d 2 The specific value of (a) is determined by the design requirement of the optical element 10, and the embodiment is not particularly limited. The phase phi of the light after passing through the preset virtual collimating microstructure 13 at the position corresponding to the microstructure 12 can be obtained by the above relation 2 And the phase phi of the light after passing through the preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 Further calculating the phase phi of the light passing through the microstructure 12 1 。
Optionally, the microstructure 12, the predetermined virtual collimating microstructure 13, and the predetermined virtual diffracting microstructure 14 may be fresnel microstructures, light shaping structures, or bessel ring structures, which may be specifically selected according to design requirements of the optical element 10, and this embodiment is not specifically limited.
Referring to fig. 3, fig. 3 (a) shows a predetermined virtual collimating microstructure 13 provided in this embodiment, fig. 3 (B) shows a predetermined virtual diffractive microstructure 14 provided in this embodiment, and fig. 3 (C) shows a schematic structural diagram of an optical element 10 provided in this embodiment. The phase of the light after passing through the virtual collimating microstructure 13, the virtual diffractive microstructure 14, and the microstructure 12 of the optical element 10 in this embodiment is shown in table 1 below. Wherein the micro-nodeThe reference numerals denote a plurality of microstructures 12 from left to right in fig. 3 (C), for example, 12a, 12b, and 12C denote a first microstructure, a second microstructure, and a third microstructure, respectively, and so on. The phase of the collimating mirror represents the phase phi of light after passing through the preset virtual collimating microstructure 13 at the corresponding position of the microstructure 12 2 The diffraction mirror phase represents the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the corresponding position of the microstructure 12 3 The microstructure phase means the phase Φ of the light passing through each microstructure 12 of the optical element 10 provided in the present embodiment 1 . For example, the phase of the collimating mirror on the row of the microstructure number 12a represents the phase of the light after passing through the preset virtual collimating microstructure 13 at the position corresponding to the microstructure 12 a; the phase of the diffraction mirror in the row of the microstructure number 12a represents the phase of the light after passing through the preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 a; the microstructure phase in the row of microstructure number 12a represents the phase of the light after passing through microstructure 12 a. The relational expression represents the calculation process of the phase of the light after passing through the microstructure 12.
TABLE 1
| Microstructure numbering | Phase of collimating mirror | Phase of diffraction mirror | Microstructure phase | Relation formula |
| 12a | π | 0 | π | cos(π+0)＝cos(π) |
| 12b | π | π | 0 | cos(π+π)＝cos(2π)＝cos(0) |
| 12c | π | 0 | π | cos(π+0)＝cos(π) |
| 12d | π | π | 0 | cos(π+π)＝cos(2π)＝cos(0) |
| 12e | π | 0 | π | cos(π+0)＝cos(π) |
| 12f | 0 | 0 | 0 | cos(0+0)＝cos(0) |
| 12g | 0 | π | π | cos(0+π)＝cos(π) |
| 12h | 0 | 0 | 0 | cos(0+0)＝cos(0) |
| 12i | 0 | π | π | cos(0+π)＝cos(π) |
| 12j | 0 | 0 | 0 | cos(0+0)＝cos(0) |
| 12k | π | 0 | π | cos(π+0)＝cos(π) |
| 12l | π | π | 0 | cos(π+π)＝cos(2π)＝cos(0) |
| 12m | π | 0 | π | cos(π+0)＝cos(π) |
| 12n | π | π | 0 | cos(π+π)＝cos(2π)＝cos(0) |
| 12o | π | 0 | π | cos(π+0)＝cos(π) |
Further, the projection height d of the microstructure 12 3 The following relation is satisfied:
where λ is the wavelength of light entering the microstructure 12, n is the refractive index of the microstructure 12, and 1 is the refractive index of air. The projection height of each microstructure 12 can be calculated through the relational expression, which is beneficial to accurately preparing each microstructure 12 according to the calculation result in the process of preparing the microstructures 12, and further realizes the design purpose of collimating and diffracting the light rays emitted into the optical element 10.
Further, the wavelength of the light entering the predetermined virtual collimating microstructure 13, the wavelength of the light entering the predetermined virtual diffractive microstructure 14, and the wavelength of the light entering the microstructure 12 are equal. It can be understood that, in the embodiment, the related parameters of the microstructure 12 of the optical element 10 are obtained by calculating the related parameters of the preset virtual collimating microstructure 13 and the preset virtual diffracting microstructure 14, and in order to ensure the diffraction effect of the optical element 10, the wavelength of the light entering the preset virtual collimating microstructure 13, the wavelength of the light entering the preset virtual diffracting microstructure 14, and the wavelength of the light entering the microstructure 12 need to be controlled to be equal, so as to achieve that the diffraction effect of the optical element 10 is the same as the expected diffraction effect.
Further, the phase Φ of the light after passing through the microstructure 12 1 Phase phi of light after passing through a preset virtual collimation microstructure 13 at a position corresponding to the microstructure 12 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 All are 0-pi. For example, the phase Φ of the light after passing through the microstructure 12 1 And the phase phi of the light after passing through the preset virtual collimation microstructure 13 at the position corresponding to the microstructure 12 2 And the phase phi of the light after passing through the preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 Can be 0, pi/7, pi/3, 2 pi/7, 3 pi/7, 4 pi/7, 2 pi/3, 5 pi/7, 6 pi/7, pi, etc. Defining the phase phi of light after passing through the microstructure 12 1 Phase phi of light after passing through a preset virtual collimation microstructure 13 at a position corresponding to the microstructure 12 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 Satisfying the above range is advantageous for collimating and diffracting the light entering the optical element 10 by the microstructures 12, and controlling the phase Φ of the light passing through the microstructures 12 1 And in a smaller range, the protrusion height of the microstructure 12 is controlled to be in a smaller range, which is favorable for realizing the design requirement of miniaturization of the microstructure 12. In other words, the phase Φ of the light after passing through the microstructure 12 1 Phase phi of light after passing through a preset virtual collimation microstructure 13 at a position corresponding to the microstructure 12 2 And the phase phi of light after passing through a preset virtual diffraction microstructure 14 at the position corresponding to the microstructure 12 3 When the height of the protrusions of the microstructures 12 is controlled within the above range, the design requirement for miniaturization of the optical element 10 can be advantageously achieved. In addition, since the protrusion height of the microstructure 12 is in a small range, which means that the depth of the depression between the adjacent microstructures 12 is shallow, it is possible to avoid a situation that the optical element 10 is easily damaged because the substrate 11 at the depression is thin due to the deep depth of the depression in the process of forming the microstructure 12 on the substrate 11.
Referring to fig. 2 and 4, in some embodiments, microstructures 12 have a raised heightThe degree is multi-order, and the order of the projection height of the microstructure 12 is 2 n Where n is a positive integer, that is, n can be 1, 2, 3, 4, or 5, etc. Since the physical properties of a single semiconductor can only represent two states, it is convenient to represent the semiconductor states by a binary method. Since the microstructure 12 is a semiconductor element, when the state of the microstructure 12 is expressed by a binary method, the order of the projection height of the microstructure is 2 n . When the projection heights of the microstructures 12 are in different orders, the diffraction effect of the optical element 10 is different. Therefore, by controlling the order of the protrusion height of the microstructure 12, the optical element 10 can be applied to various different use scenes, and the application range of the optical element 10 is further improved.
The order of the protrusion height of the microstructure 12 can be calculated to be second order, fourth order, eighth order, sixteenth order, or thirty-second order. As shown in fig. 2 and 4, fig. 2 shows a case where the order of the projection height of the microstructure 12 is second order, fig. 4 (a) and (B) show a case where the order of the projection height of the microstructure 12 is fourth order, and fig. 4 (C) and (D) show a case where the order of the projection height of the microstructure 12 is eighth order. When the orders of the projection heights of the microstructures 12 are in different values, the diffraction effects of the microstructures 12 are different, so that the microstructures 12 can be suitable for different scenes, such as a projector, a display screen, a stage effect or an electronic device.
Since the order of the protrusion height of the microstructure 12 is multi-order, the protrusion height of the microstructure 12 has a uniform gradient in order to achieve uniform transition of the diffraction effect of the microstructure 12. For example, as shown in fig. 2, when the order of the protrusion height of the microstructure 12 is two, the protrusion height of the microstructure 12 is 0 or h, where h is the protrusion height of the microstructure 12 when the phase of the light passing through the microstructure 12 is pi, i.e., h = λ/2 (n-1). As shown in fig. 4 (a), when the order of the protrusion height of the microstructure 12 is fourth, the protrusion height of the microstructure 12 is 0, h/3, 2h/3, or h, where h is the protrusion height of the microstructure 12 when the phase of the light passing through the microstructure 12 is pi, i.e., h = λ/2 (n-1). As shown in fig. 4 (C), when the order of the protrusion height of the microstructure 12 is eight, the protrusion height of the microstructure 12 is 0, h/7, 2h/7, 3h/7, 4h/7, 5h/7, 6h/7, or h, where h is the protrusion height of the microstructure 12 when the phase of the light passing through the microstructure 12 is pi, i.e., h = λ/2 (n-1). When the order of the protrusion height of the microstructure 12 is sixteen order, thirty-second order or other higher orders, the protrusion height of the microstructure 12 can be obtained by referring to the above rule, and will not be described herein again.
In some embodiments, the protrusion height of each microstructure 12 may be changed stepwise or not, for example, fig. 4 (a) shows that when the step number of the protrusion height of the microstructure 12 is four, the protrusion height of the microstructure 12 is changed stepwise, and the protrusion height of the microstructure 12 is changed by 0, h/3, 2h/3, and h; fig. 4 (B) shows that when the order of the protrusion height of the microstructure 12 is four, the protrusion height of the microstructure 12 changes in a non-step manner, and the protrusion height of the microstructure 12 changes in 0, h/3, h, 2 h/3; fig. 4 (C) shows that when the order of the protrusion height of the microstructure 12 is eight, the protrusion height of the microstructure 12 changes in a stepwise manner, and the protrusion height of the microstructure 12 changes in 0, h/7, 2h/7, 3h/7, 4h/7, 5h/7, 6h/7, and h; fig. 4 (D) shows that when the order of the protrusion height of the microstructure 12 is eight, the protrusion height of the microstructure 12 changes in a non-stepwise manner, and the protrusion height of the microstructure 12 changes in h/7, 2h/7, 3h/7, 0, 5h/7, 4h/7, 6h/7, and h. The variation mode of the protrusion height of the microstructure 12 may be determined according to the expected diffraction effect of the optical element 10, for example, when the order of the protrusion height of the microstructure 12 is eight, the protrusion height of the microstructure 12 may also be varied by 0, h/7, 2h/7, 5h/7, 4h/7, 3h/7, 6h/7, and h, that is, the variation mode of the protrusion height of the microstructure 12 may be determined according to the actual design requirement, which is not specifically limited in this embodiment.
The height d of the projection of the microstructure 12 3 Phase phi of light after passing through microstructure 12 1 The transformation of (a) shows the protrusion height d of the microstructure 12 3 Phase phi of light after passing through microstructure 12 1 Proportional relation, so that when the height of the protrusions of the microstructure 12 is in a uniform gradient, the phase phi of the light passing through the microstructure 12 is uniform 1 Is also presentedA uniform gradient of change. That is, when the order of the protrusion height of the microstructure 12 is second order, the phase of the light passing through the microstructure 12 is 0 or pi. When the order of the projection height of the microstructure 12 is fourth, the phase of the light passing through the microstructure 12 is 0, pi/3, 2 pi/3 or pi. When the order of the projection height of the microstructure 12 is eighth, the phase of the light passing through the microstructure 12 is 0, pi/7, 2 pi/7, 3 pi/7, 4 pi/7, 5 pi/7, 6 pi/7 or pi. When the order of the protrusion height of the microstructure 12 is sixteen, thirty-second, or other higher orders, the phase of the light passing through the microstructure 12 can be obtained by referring to the above rule, which is not described herein again.
Referring to fig. 5, in some embodiments, the optical device 10 further includes a substrate 15, and the substrate 15 is disposed on a side of the base 11 away from the microstructure 12. On the one hand, the substrate 15 can be used to support the base 11, so as to form a plurality of microstructures 12 on the base 11; on the other hand, the substrate 15 can prevent the substrate 11 from moving during the process of forming the microstructures 12 on the substrate 11 to affect the formation of the microstructures 12, and further affect the production yield of the optical element 10.
Alternatively, the material of the substrate 15 may be transparent glass or transparent plastic, and the transparent glass is used as the material of the substrate to improve the optical performance of the optical element 10, while the transparent plastic can reduce the mass of the optical element 10 to facilitate the portability of the optical element 10. The light transmittance of the optical element 10 and the portability can be selected according to the requirement, and the embodiment is not particularly limited.
The optical element 10 disclosed in the embodiment of the present application includes a substrate 11 and a plurality of microstructures 12, wherein the plurality of microstructures 12 are formed on the substrate 11. In the embodiment, the preset virtual collimating microstructure 13 and the preset virtual diffracting microstructure 14 required for realizing the diffracting effect of the optical element 10 in the prior art are selected, the protrusion heights of the microstructures 12 of the optical element 10 are obtained through calculation, and then the microstructures 12 of the optical element 10 are prepared according to the calculation result, so that the microstructure 12 prepared in this way can realize the design purpose of collimating and diffracting the light entering the optical element 10.
Referring to fig. 6, fig. 6 shows the diffraction effect of the optical element 10 provided by the present embodiment, and as can be seen from fig. 6, the diffraction effect of the optical element 10 provided by the present embodiment is better. That is to say, the microstructure 12 provided in the embodiment of the present application has an effect of collimating and diffracting light entering the optical element 10, so that the light entering the optical element 10 is converted into collimated light without adding a collimating mirror to the optical element 10, the use of components is reduced, the volume of the optical element 10 is also reduced, and the design purpose of miniaturizing the optical element 10 is facilitated. In addition, since no collimating mirror component is additionally arranged, the number of devices required by the optical element 10 is reduced, which is beneficial to reducing the production cost of the optical element 10.
In a second aspect, referring to fig. 7, the present invention further discloses a projection module 100, where the projection module 100 includes a light source emitter 20 and the optical element 10 described in the first aspect, and the light source emitter 20 is disposed on a side of the substrate 11 away from the microstructure 12. It is understood that the light source emitter 20 may be a laser emitter or an LED emitter, as long as it can emit light to the substrate 11 and then emit the light through the microstructures 12, which is not limited in this embodiment.
In addition, the projection module 100 having the optical element 10 according to the first aspect can not only achieve a good diffraction effect, but also meet the design requirement for downsizing the projection module 100 and reduce the production cost of the projection module 100.
Further, the optical element 10 includes a substrate 11 and a plurality of microstructures 12, where the substrate 11 is a light-transmitting substrate 11, the plurality of microstructures 12 are formed on the substrate 11 in a protruding manner, and the microstructures 12 are used for collimating and diffracting light entering the optical element 10.
It is understood that microstructure 12 refers to any of a variety of non-uniform structures in the crystal structure that need to be observed by light microscopy or electron microscopy. When the microstructure 12 is formed on the substrate 11, the microstructure 12 is formed mainly by processing the surface of the substrate 11. Specifically, the microstructures 12 may be formed on the substrate 11 by etching, imprinting, or laser etching, and specifically, the microstructures 12 may be formed on the substrate by an exposure method, a screen printing method, a nanoimprinting, or a laser etching.
Further, the protrusion height of the microstructure 12 has multiple steps, and the step number of the protrusion height of the microstructure 12 is 2 n Wherein n is a positive integer. That is, n can be 1, 2, 3, 4, or 5, etc. Since the physical properties of a single semiconductor can only represent two states, it is convenient to represent the semiconductor states by a binary method. Since the microstructure 12 is a semiconductor element, when the state of the microstructure 12 is expressed by a binary method, the order of the projection height of the microstructure is 2 n . When the projection heights of the microstructures 12 are in different orders, the diffraction effect of the optical element 10 is different. Therefore, by controlling the order of the protrusion height of the microstructure 12, the projection module 100 can be applied to various different use scenes, and the application range of the projection module 100 is further improved.
The order of the protrusion height of the microstructure 12 can be calculated to be second order, fourth order, eighth order, sixteenth order, thirty second order, or the like. Since the first aspect has the protruding heights of the microstructures 12 of the optical element in different orders, the protruding heights of the microstructures 12 are changed, and the phase Φ of the light after passing through the microstructures 12 is changed 1 Etc., and will not be described herein again for the sake of detail.
In a third aspect, referring to fig. 8, the invention further discloses an electronic device 1000, where the electronic device 1000 includes a housing 200 and the projection module 100 according to the second aspect, and the projection module 100 is disposed in the housing 200. It is understood that the electronic device 1000 may include, but is not limited to, a display screen, a cell phone, a computer, a tablet, and the like.
The electronic device 1000 having the projection module 100 of the second aspect can not only achieve a good diffraction effect, but also meet the design requirement for miniaturization of the electronic device 1000 and reduce the production cost of the electronic device 1000.
In a fourth aspect, referring to fig. 9, the present invention further discloses a method for manufacturing an optical element, which is used for manufacturing the optical element according to the first aspect.
Specifically, the preparation method of the optical element comprises the following steps:
step 101: the protrusion height of the microstructure is calculated.
Since the microstructures are protruded on the substrate, the protrusion height of each microstructure needs to be calculated before the optical element is prepared, so as to rapidly and accurately prepare the optical element. Specifically, the microstructure is a structure in which a collimating function and a diffracting function are integrated, and therefore, the microstructure satisfies the following relationship: cos (phi) 1 )＝cos(Φ 2 +Φ 3 ). Wherein phi 1 The phase, phi, of light after passing through the microstructure 2 The phase position phi of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure 3 The phase position of the light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure is shown.
The phase refers to a numerical value representing the state of the light at a certain moment when the light is cosine-changed. E.g. phi 1 Indicating the phase, phi, of the light at that moment after it has passed through the microstructure 2 The phase position phi of the light ray at the moment after the light ray passes through the preset virtual collimation microstructure at the position corresponding to the microstructure 3 And the phase of the light ray at the moment state after the light ray passes through the preset virtual diffraction microstructure at the position corresponding to the microstructure is represented. When the above relational expression is satisfied, the microstructure provided by the present invention has an effect of collimating and diffracting light incident on the optical element.
Specifically, the preset virtual collimating microstructure and the preset virtual diffractive microstructure refer to a collimating mirror and a diffractive mirror used in the related art to realize the intended diffraction of the optical element. That is, the virtual collimating microstructure and the virtual diffractive microstructure are cited only to meet the design requirement, and are not present in the optical element provided in the embodiment. For example, as shown in fig. 1, fig. 1 shows a collimating mirror and a diffraction mirror, when the collimating function and the diffraction function need to be integrated into a microstructure, the phase of a light ray passing through the microstructure can be determined by the phase of the light ray passing through the collimating mirror and the diffraction mirror at the position corresponding to the microstructure. By way of example toIn other words, when the expected diffraction effect to be achieved by the optical element is the speckle effect, the phase Φ of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure is determined 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 The phase phi of the light passing through the microstructure 1 The above relation is satisfied. When the phase position of the light after passing through the microstructure meets the relational expression, the microstructure can achieve the design purpose of collimating and diffracting the light entering the optical element, namely the optical element can achieve the design requirement of collimating and diffracting the light entering the optical element, and meanwhile, the use of a collimating mirror is reduced, so that the size of the optical element is reduced, the design requirement of miniaturization of the optical element is facilitated, and the cost required for producing the optical element is reduced.
Furthermore, the phase of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure
Wherein λ is the wavelength of the light incident into the virtual collimating microstructure, n is the refractive index of the virtual collimating microstructure, and d 1 The height of the pre-set virtual collimating microstructure is the position corresponding to the microstructure, and 1 is the refractive index of air. Phase position of light after passing through preset virtual diffraction microstructure at position corresponding to microstructure
Wherein λ is the wavelength of the light incident into the predetermined virtual diffraction microstructure, n is the refractive index of the predetermined virtual diffraction microstructure, and d 2 The height of the predetermined virtual diffraction microstructure at the position corresponding to the microstructure is 1, which is the refractive index of air.
From the above, the phase Φ of the light passing through the predetermined virtual collimating microstructure at the position corresponding to the microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 Calculated from the above relation, that is, the light passes through the predetermined virtual position corresponding to the microstructurePhase phi after collimation of microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 The light source is determined by the wavelength of light rays which enter the preset virtual collimation microstructure and the preset virtual diffraction microstructure, the refractive indexes of the preset virtual collimation microstructure and the preset virtual diffraction microstructure, and the heights of the corresponding positions of the preset virtual collimation microstructure, the preset virtual diffraction microstructure and the microstructure. Wherein, λ, n, d 1 And d 2 The specific value of (d) can be determined according to the design requirement of the optical element, and the embodiment is not particularly limited.
Since the method for calculating the phase of the light beam after passing through the microstructure is the same as the method for calculating the phase of the light beam after passing through the microstructure of the optical element in the first aspect, and the first aspect has been described in detail, the method for calculating the phase of the light beam after entering the microstructure can be specifically referred to the first aspect, and is not repeated herein.
Further, the projection height d of the microstructure 3 The following relation is satisfied:
wherein λ is the wavelength of light entering the microstructure, n is the refractive index of the microstructure, and 1 is the refractive index of air. The projection height of each microstructure can be calculated through the relational expression, so that each microstructure can be accurately prepared according to the calculation result in the process of preparing the microstructure, and the design purpose of collimating and converting the light rays entering the microstructure into diffraction light rays and emitting the diffraction light rays is further realized.
Further, the phase phi of the light after passing through the microstructure 1 And the phase phi of the light after passing through the preset virtual collimation microstructure at the position corresponding to the microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 All are 0-pi. For example, the phase Φ of light after passing through the microstructure 1 Phase phi of light after passing through a preset virtual collimation microstructure at a position corresponding to the microstructure 2 And the phase position of the light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructureΦ 3 Can be 0, pi/7, pi/3, 2 pi/7, 3 pi/7, 4 pi/7, 2 pi/3, 5 pi/7, 6 pi/7, pi, etc. Defining the phase phi of light after passing through the microstructure 1 Phase phi of light after passing through a preset virtual collimation microstructure at a position corresponding to the microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 The light collimation device meets the range, is favorable for ensuring that the microstructure can realize the light collimation of the light rays entering the optical element and convert the light rays into diffraction light rays to be emitted, and simultaneously controls the phase phi of the light rays after passing through the microstructure 1 And the height of the protrusions of the microstructure is controlled to be within a small range, so that the design requirement of miniaturization of the microstructure is favorably met. In other words, the phase phi of light after passing through the microstructure 1 Phase phi of light after passing through a preset virtual collimation microstructure at a position corresponding to the microstructure 2 And the phase phi of light after passing through the preset virtual diffraction microstructure at the position corresponding to the microstructure 3 When the height of the protrusions of the microstructure is controlled within the above range, the design requirement for miniaturization of the optical element can be met. In addition, the protruding height of the microstructure is in a small range, which means that the depth of the depression between the adjacent microstructures is shallow, so that the situation that the optical element is easily damaged due to the fact that the substrate at the depression is thin because the depth of the depression is deep in the process of forming the microstructure on the substrate can be avoided.
Step 102: a substrate is provided.
Step 103: providing a base, and fixedly laminating the base on the substrate.
The substrate provided in the step is used for forming the microstructure of the optical element, and the substrate is fixedly superposed on the substrate, on one hand, the substrate can be used for bearing the substrate so as to realize the formation of a plurality of microstructures of the optical element on the substrate; on the other hand, the substrate can prevent the substrate from moving in the process of forming the microstructure of the optical element on the substrate to influence the formation of the microstructure of the optical element, thereby influencing the production yield of the optical element.
Step 104: the surface of the substrate is treated to form a plurality of microstructures on the surface of the substrate.
The plurality of microstructures formed in the step can achieve the design purpose of collimating and diffracting the light rays entering the optical element, so that the optical element has a good diffraction effect.
Therefore, the preparation method of the optical element has simple steps, and the optical element in the first aspect can be conveniently, efficiently and massively produced and prepared.
In some embodiments, the microstructure is formed on the substrate by etching, imprinting, or laser etching, and particularly, the microstructure may be formed on the substrate by an exposure method, a screen printing method, a nanoimprinting, or a laser etching method. Due to the fact that the etching, impressing and laser etching technologies are mature, the speed of forming the microstructure on the substrate through the three modes is high, the precision of the prepared microstructure is high, and the optical element can be accurately, conveniently, efficiently and massively produced and prepared. In addition, the microstructure may also be formed on the substrate by other manners, for example, the microstructure is formed on the substrate by engraving, as long as the adopted manner can accurately form the microstructure on the substrate, and the embodiment is not particularly limited.
The optical element, the projection module and the electronic device disclosed in the embodiments of the present invention are described in detail above, and specific examples are applied herein to explain the principle and the embodiments of the present invention, and the description of the embodiments above is only used to help understanding the optical element, the projection module and the electronic device and their core ideas of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (9)
1. An optical element, characterized in that the optical element comprises
A substrate, the substrate being a light transmissive substrate; and
the microstructures are formed on the substrate in a protruding mode and used for collimating and diffracting light rays entering the optical element;
the microstructure satisfies the following relation:
cos(Φ 1 )＝cos(Φ 2 +Φ 3 )，
and
Φ 1 、Φ 2 and phi 3 All are 0 to pi;
wherein phi is 1 The phase of light after passing through the microstructure, phi 2 Is the phase position phi of light after passing through a preset virtual collimation microstructure at the position corresponding to the microstructure 3 Is the phase position of light after passing through a preset virtual diffraction microstructure at a position corresponding to the microstructure, lambda is the wavelength of the light, n is the refractive indexes of the microstructure, the preset virtual collimation microstructure and the preset virtual diffraction microstructure, d 1 Height of the predetermined virtual alignment microstructure in a position corresponding to the microstructure, d 2 Height of said predetermined virtual diffractive microstructure at a position corresponding to said microstructure, d 3 Is the height of the microstructure.
2. The optical element of claim 1, wherein the protrusions of the microstructures have a plurality of steps, and the steps of the protrusions of the microstructures are 2 n Wherein n is a positive integer.
3. The optical element according to claim 2, wherein when the order of the protrusion height of the microstructure is second order, the phase of the light after entering the microstructure is 0 or pi.
4. The optical element of claim 2, wherein when the order of the protrusion height of the microstructure is four, the phase of the light after entering the microstructure is 0, pi/3, 2 pi/3 or pi.
5. The optical element according to claim 2, wherein when the order of the protrusion height of the microstructure is eight, the phase of the light after entering the microstructure is 0, pi/7, 2 pi/7, 3 pi/7, 4 pi/7, 5 pi/7, 6 pi/7 or pi.
6. The optical element according to claim 2, wherein the height of the protrusions of the microstructures varies stepwise or non-stepwise.
7. A projection module comprising a light source emitter and an optical element according to any one of claims 1-6, wherein the light source emitter is disposed on a side of the substrate facing away from the microstructure.
8. The projection module of claim 7 wherein the optical element comprises
A substrate, which is a light-transmitting substrate; and
a plurality of microstructures formed on the substrate, wherein the projection height of the microstructures is in multiple stages, and the order of the projection height of the microstructures is 2 n Wherein n is a positive integer.
9. An electronic device, comprising a housing and the projection module of claim 7 or 8, wherein the projection module is disposed on the housing.
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