CN113805333A - Grating structure design method for double pattern encryption - Google Patents
Grating structure design method for double pattern encryption Download PDFInfo
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- CN113805333A CN113805333A CN202110969735.5A CN202110969735A CN113805333A CN 113805333 A CN113805333 A CN 113805333A CN 202110969735 A CN202110969735 A CN 202110969735A CN 113805333 A CN113805333 A CN 113805333A
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- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000013461 design Methods 0.000 title claims abstract description 18
- 230000009977 dual effect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000003086 colorant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
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Abstract
The invention provides a grating structure design method for double pattern encryption, wherein an encrypted pattern constructed by a two-dimensional grating structure is positioned in a background picture constructed by a one-dimensional grating, and different encrypted information can be displayed and hidden under different observation angles by utilizing grating structures with different dimensions.
Description
Technical Field
The invention relates to the field of grating-shaped encrypted pattern design, in particular to a grating structure design method for double pattern encryption.
Background
The grating manufacturing technology at the present stage is already mature, the grating structure can show gorgeous structural colors under white light and is widely used for constructing anti-counterfeiting patterns, but the structural colors obtained by diffraction of a pure one-dimensional grating structure can only be observed in the direction perpendicular to the arrangement direction of the grating structure, so that when the one-dimensional grating structure is utilized to construct the encrypted anti-counterfeiting patterns, the one-dimensional grating structure is usually combined with a well-designed coding structure design to achieve a relatively ideal actual effect, and the design of the grating-shaped anti-counterfeiting patterns popular in the current market is often too simple, so that the anti-counterfeiting effect is not fully satisfactory. The one-dimensional grating and the two-dimensional grating are combined through design, and the encrypted pattern formed by the two-dimensional grating is hidden in the background encrypted pattern formed by the one-dimensional grating by utilizing the property of different diffraction light field distributions on different dimension grating structures, so that the rotation interpretation switching of the encrypted pattern is realized under the condition of no interpretation crosstalk.
One patent of korea institute for electronic communication: an apparatus for multiplexing multi-view images and a method (201710229131.0) using the same, the apparatus for multiplexing multi-view images comprising: an upgrade unit for upgrading the view image using an interpolation method; a pixel multiplexing unit for multiplexing the pixels of the upgraded view image on a sub-pixel basis; and a pixel mixing unit for mixing the sub-pixels based on a mapping table including a mixing ratio of the sub-pixels. This patent can solve the problem of image distortion occurring when the PTC method is applied to a multi-view image. This patent can solve the problem of image quality degradation that occurs because view images overlap in adjacent viewing zones; a high-quality multi-view image based on an interpolation method and a blending method can be provided. However, this patent does not relate to any technical solution for increasing the encryption level of the raster-like pattern while increasing the density of encrypted information per unit area.
Disclosure of Invention
The invention provides a grating structure design method for double pattern encryption, which enriches grating type encryption pattern design methods and improves grating type encryption pattern identification degree and reading interestingness.
In order to achieve the technical effects, the technical scheme of the invention is as follows:
a grating structure design method for double pattern encryption is provided, wherein a double pattern is composed of grating structures with different dimensions.
Further, the double patterns are overlapped with each other, and the outline size of the pattern contained in the inner part is smaller than that of the outer pattern.
Further, the pattern at the inside is constituted by a two-dimensional grating structure, and the pattern at the outside is constituted by a one-dimensional grating structure.
Further, the one-dimensional grating and the two-dimensional grating constituting the double pattern have the same amplitude, and have the same period and line width in the same direction.
Further, the amplitude of the grating is 5-500 nm; the grating period is 0.1-100 microns; the width of the grating lines is 0.01-99.9 microns.
Furthermore, the period of the one-dimensional grating is 4 microns, the width of the grating lines is 2 microns, the depth of the grating lines is 100 nanometers, and the grating lines are arranged and expanded along the Y-axis direction; the period of the two-dimensional grating is 4 micrometers in the X-axis direction and the Y-axis direction, the cross section size of each two-dimensional grating unit is 2 multiplied by 2 micrometers, and the height of each two-dimensional grating unit is 100 nanometers; in the X-axis direction, the two-dimensional grating units with the heights are aligned with the one-dimensional grating lines with the heights when being arranged.
Compared with the prior art, the technical scheme of the invention has the beneficial effects that:
the invention provides a grating structure design method for double pattern encryption, wherein an encrypted pattern constructed by a two-dimensional grating structure is positioned in a background picture constructed by a one-dimensional grating, and different encrypted information can be displayed and hidden under different observation angles by utilizing grating structures with different dimensions.
Drawings
FIG. 1 is a schematic diagram of a grating structure design including a double encryption pattern;
fig. 2 is a diagram illustrating an actual effect of a dual encryption pattern switchable with a rotation angle under illumination according to the first embodiment;
fig. 3 is a partial optical micrograph of the double encrypted pattern of fig. 2.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the patent;
for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product;
it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The technical solution of the present invention is further described below with reference to the accompanying drawings and examples.
A grating structure design method for double pattern encryption is provided, wherein a double pattern is composed of grating structures with different dimensions.
The double patterns are overlapped with each other, and the outline size of the pattern contained in the inner part is smaller than that of the outer pattern.
The inner pattern is constituted by a two-dimensional grating structure and the outer pattern is constituted by a one-dimensional grating structure.
The one-dimensional grating and the two-dimensional grating which form the double pattern have the same amplitude and the same period and line width in the same direction.
The amplitude of the grating is 5-500 nm; the grating period is 0.1-100 microns; the width of the grating lines is 0.01-99.9 microns.
The period of the one-dimensional grating is 4 microns, the width of the grating lines is 2 microns, the depth is 100 nanometers, and the grating lines are arranged and spread along the Y-axis direction; the period of the two-dimensional grating is 4 micrometers in the X-axis direction and the Y-axis direction, the cross section size of each two-dimensional grating unit is 2 multiplied by 2 micrometers, and the height of each two-dimensional grating unit is 100 nanometers; in the X-axis direction, the two-dimensional grating units with the heights are aligned with the one-dimensional grating lines with the heights when being arranged.
The specific design process comprises the following steps:
taking a mold imprinting method for preparing a corresponding encrypted pattern as an example, correspondingly rasterizing two different images to be encrypted, firstly patterning a special pattern 1 with a larger size and positioned outside by using a one-dimensional grating and setting the special pattern 1 as a layer 1, then patterning a special pattern 2 with a smaller size by using a two-dimensional grating and setting the special pattern 2 as a layer 2, then placing the layer 2 on the layer 1, and only displaying a two-dimensional grating structure in the layer 2 at an overlapped part. The specific structural design is shown in fig. 1, the grating structure for double pattern encryption is formed by a one-dimensional grating and a two-dimensional grating together, the two-dimensional grating is surrounded by the one-dimensional grating, wherein the one-dimensional grating structure is used for constructing a pattern 1, and the two-dimensional grating structure is used for constructing a pattern 2. The period of the one-dimensional grating is 4 microns, the width of the grating lines is 2 microns, the depth is 100 nanometers, and the grating lines are arranged and spread along the Y-axis direction. Meanwhile, the period of the two-dimensional grating is 4 micrometers in the X-axis direction and the Y-axis direction, the cross section size of a single two-dimensional grating unit is 2 multiplied by 2 micrometers, and the height of the single two-dimensional grating unit is 100 nanometers. And in the X-axis direction, the two-dimensional grating units with the heights are aligned with the one-dimensional grating lines with the heights. Finally, the designed encrypted pattern is made into a mother board through photoetching, and the encrypted pattern is imprinted on the polycarbonate film through mould pressing transfer printing. As shown in fig. 2, under illumination, when a square pattern 1 formed by a one-dimensional grating is interpreted, the two-dimensional grating structure with the same period on the Y axis shows the same diffraction color, so that the pattern 2 in the inner part cannot be interpreted and is hidden; when the label is horizontally rotated by 90 degrees, the arrangement direction of the one-dimensional grating structure is changed to be vertical to the observation direction, the structural color generated by the one-dimensional grating disappears, the two-dimensional grating can still show the corresponding structural color, and the pattern 2 can be read while the pattern 1 disappears. Fig. 3 is an optical microscope image of the junction between the one-dimensional grating structure and the two-dimensional grating structure of the double encryption pattern in fig. 2.
The same or similar reference numerals correspond to the same or similar parts;
the positional relationships depicted in the drawings are for illustrative purposes only and are not to be construed as limiting the present patent;
it should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A grating structure design method for double pattern encryption is characterized in that a double pattern is composed of grating structures with different dimensions.
2. The method as claimed in claim 1, wherein the dual patterns are overlapped with each other, and the pattern profile size contained in the inner portion is smaller than the outer pattern profile size.
3. The grating structure design method for double pattern encryption according to claim 2, characterized in that the pattern at the inside is constituted by a two-dimensional grating structure and the pattern at the outside is constituted by a one-dimensional grating structure.
4. The method of claim 3, wherein the one-dimensional grating and the two-dimensional grating have the same amplitude and the same period and line width in the same direction.
5. The method of claim 4, wherein the grating amplitude is 5-500 nm.
6. The method of claim 5, wherein the grating period is 0.1-100 μm.
7. The method of claim 6, wherein the grating line width is 0.01-99.9 μm.
8. The method according to claim 7, wherein the period of the one-dimensional grating is 4 μm, the width of the grating lines is 2 μm, the depth is 100 nm, and the grating lines are arranged and spread along the Y-axis direction.
9. The method of claim 8, wherein the period of the two-dimensional grating is 4 μm in both the X-axis and the Y-axis, the cross-sectional dimension of the single two-dimensional grating unit is 2X 2 μm, and the height of the single two-dimensional grating unit is 100 nm.
10. The grating structure design method for double pattern encryption of claim 9, wherein the two-dimensional grating units with height are arranged in alignment with the one-dimensional grating lines with height in the X-axis direction.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110969735.5A CN113805333A (en) | 2021-08-23 | 2021-08-23 | Grating structure design method for double pattern encryption |
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| CN202110969735.5A CN113805333A (en) | 2021-08-23 | 2021-08-23 | Grating structure design method for double pattern encryption |
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Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995002200A1 (en) * | 1993-07-09 | 1995-01-19 | Commonwealth Scientific And Industrial Research Organisation | Multiple image diffractive device |
| US20080035735A1 (en) * | 2006-08-11 | 2008-02-14 | Industrial Technology Research Institute | Identification device |
| JP2013033127A (en) * | 2011-08-02 | 2013-02-14 | Toppan Printing Co Ltd | Display body, labeled article and authenticity determination method thereof |
| CN103370206A (en) * | 2010-11-02 | 2013-10-23 | Ovd基尼格拉姆股份公司 | Security element and method for producing a security element |
| CN103764403A (en) * | 2011-06-30 | 2014-04-30 | 联邦国营企业"Goznak" | Valuable document with an optically variable structure (variants) |
| WO2015033552A1 (en) * | 2013-09-04 | 2015-03-12 | Canon Kabushiki Kaisha | Absorption grating and talbot interferometer |
| US20160001585A1 (en) * | 2012-04-25 | 2016-01-07 | Dai Nippon Printing Co., Ltd. | Diffraction grating recording medium |
| US20170235228A1 (en) * | 2014-09-22 | 2017-08-17 | Intel Corporation | Multi-pass patterning using nonreflecting radiation lithography on an underlying grating |
| TW201910816A (en) * | 2017-08-16 | 2019-03-16 | 美商盧曼頓運作有限公司 | Multilayer film stack for diffractive optical components |
| CN111210714A (en) * | 2020-02-21 | 2020-05-29 | 中山大学 | Method for manufacturing holographic anti-counterfeit label with multi-angle variable pattern |
| CN111239878A (en) * | 2018-11-09 | 2020-06-05 | 英属开曼群岛商音飞光电科技股份有限公司 | Grating plate device |
-
2021
- 2021-08-23 CN CN202110969735.5A patent/CN113805333A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995002200A1 (en) * | 1993-07-09 | 1995-01-19 | Commonwealth Scientific And Industrial Research Organisation | Multiple image diffractive device |
| US20080035735A1 (en) * | 2006-08-11 | 2008-02-14 | Industrial Technology Research Institute | Identification device |
| CN103370206A (en) * | 2010-11-02 | 2013-10-23 | Ovd基尼格拉姆股份公司 | Security element and method for producing a security element |
| CN103764403A (en) * | 2011-06-30 | 2014-04-30 | 联邦国营企业"Goznak" | Valuable document with an optically variable structure (variants) |
| JP2013033127A (en) * | 2011-08-02 | 2013-02-14 | Toppan Printing Co Ltd | Display body, labeled article and authenticity determination method thereof |
| US20160001585A1 (en) * | 2012-04-25 | 2016-01-07 | Dai Nippon Printing Co., Ltd. | Diffraction grating recording medium |
| WO2015033552A1 (en) * | 2013-09-04 | 2015-03-12 | Canon Kabushiki Kaisha | Absorption grating and talbot interferometer |
| US20170235228A1 (en) * | 2014-09-22 | 2017-08-17 | Intel Corporation | Multi-pass patterning using nonreflecting radiation lithography on an underlying grating |
| TW201910816A (en) * | 2017-08-16 | 2019-03-16 | 美商盧曼頓運作有限公司 | Multilayer film stack for diffractive optical components |
| CN111239878A (en) * | 2018-11-09 | 2020-06-05 | 英属开曼群岛商音飞光电科技股份有限公司 | Grating plate device |
| CN111210714A (en) * | 2020-02-21 | 2020-05-29 | 中山大学 | Method for manufacturing holographic anti-counterfeit label with multi-angle variable pattern |
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Application publication date: 20211217 |