CN113670448A - Reaction chamber temperature measuring system, method and device and temperature adjusting method - Google Patents
Reaction chamber temperature measuring system, method and device and temperature adjusting method Download PDFInfo
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- CN113670448A CN113670448A CN202110938495.2A CN202110938495A CN113670448A CN 113670448 A CN113670448 A CN 113670448A CN 202110938495 A CN202110938495 A CN 202110938495A CN 113670448 A CN113670448 A CN 113670448A
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- 238000009529 body temperature measurement Methods 0.000 abstract description 42
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0275—Control or determination of height or distance or angle information for sensors or receivers
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- G—PHYSICS
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- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Abstract
The invention relates to the technical field of temperature measurement, and particularly discloses a system, a method and a device for measuring the temperature of a reaction chamber and a temperature adjusting method, wherein the system is used for measuring the temperature distribution condition in the reaction chamber under the high-temperature working condition and comprises the following steps: the outer wall of the reaction chamber is provided with a temperature measuring port; the temperature detector is used for measuring the temperature condition in the reaction chamber and is connected with the temperature measuring port in a swinging way; the swinging driver is used for driving the temperature measurer to swing in the temperature measuring port; and the controller is used for controlling the swinging driver to operate so that the temperature measurer swings in the temperature measuring port to obtain the temperature information of different positions in the reaction chamber, and the controller draws a thermal field curve according to the temperature information of different positions. According to the system, the regional temperature measurement can be carried out only by arranging a temperature measuring port on the outer wall of the reaction chamber and installing a temperature measuring device, so that heat loss in the reaction chamber caused by too many temperature measuring holes formed in the reaction chamber is avoided, a thermal field curve can be drawn based on temperature information, and a data basis is provided for the analysis and adjustment of the temperature working condition in the reaction chamber.
Description
Technical Field
The application relates to the technical field of temperature measurement, in particular to a system, a method and a device for measuring the temperature of a reaction chamber and a temperature adjusting method.
Background
Many manufacturing processes involve high temperature vacuum or high temperature high pressure reaction environments, which are typically provided by a particular reaction chamber, and these process conditions are typically high and, therefore, require measurement of the temperature within the reaction chamber.
In the prior art, a reaction chamber generally adopts a single infrared pyrometer for temperature measurement, but temperature information of a certain point can be obtained, the condition of nonuniform thermal field often exists in the reaction chamber, single-point temperature measurement cannot ensure that the thermal field in the reaction chamber meets process conditions, and defects of epitaxial growth products are increased due to nonuniform thermal field in epitaxial equipment; the thermal field measurement in the reaction chamber is also performed by setting a multi-point temperature measurement mode, but the multi-point temperature measurement requires adding a plurality of detection positions in the reaction chamber, and the detection is generally performed by setting detection hole positions, but the structure of the reaction chamber is damaged by increasing the number of the detection holes, so that the uniformity of the thermal field in the reaction chamber is more difficult to realize, and particularly in the reaction chamber of the epitaxial equipment, the thermal field is uneven, so that the epitaxial product contains various defects.
In view of the above problems, no effective technical solution exists at present.
Disclosure of Invention
An object of the embodiments of the present application is to provide a system, a method, a device and a method for measuring a temperature of a reaction chamber, so as to achieve regional temperature measurement of a single temperature detector in the reaction chamber.
In a first aspect, an embodiment of the present application provides a temperature measurement system for a reaction chamber, where the temperature distribution of the reaction chamber under a high-temperature working condition is measured, and the system includes:
the outer wall of the reaction chamber is provided with a temperature measuring port;
the temperature detector is used for measuring the temperature condition in the reaction chamber and is connected with the temperature measuring port in a swinging way;
the swinging driver is used for driving the temperature measurer to swing in the temperature measuring port;
and the controller is used for controlling the swing driver to operate so as to enable the temperature detector to swing in the temperature measuring port to obtain temperature information of different positions in the reaction chamber, and is used for drawing a thermal field curve according to the temperature information of the different positions.
The reaction chamber temperature measuring system is used for measuring temperature information of different positions in a reaction chamber to establish a thermal field curve, reflecting the temperature distribution condition in the reaction chamber by using the thermal field curve, serving as a data base for analyzing and adjusting the temperature working condition in the reaction chamber, and quickly searching and determining the position of an area with abnormal temperature in the reaction chamber from an abnormal temperature point on the thermal field curve; the reaction chamber temperature measurement system of this application embodiment only need set up a temperature measurement mouth installation thermoscope at the reaction chamber outer wall alright carry out the regional temperature measurement in the reaction chamber, need not to set up a plurality of temperature check points on the reaction chamber, avoids the reaction chamber to set up too much temperature measurement hole and leads to the uneven problem in the thermal field that the heat loss arouses in the reaction chamber, ensures that the reaction chamber can normal use.
The system for measuring temperature of a reaction chamber, wherein the swing driver comprises:
the longitudinal driving mechanism is used for driving the temperature measurer to longitudinally swing in the temperature measuring port;
and the transverse driving mechanism is used for driving the temperature measurer to transversely swing in the temperature measuring port.
The reaction chamber temperature measuring system is characterized in that the longitudinal driving mechanism is connected with the temperature detector to drive the temperature detector to swing longitudinally, and the transverse driving mechanism is connected with the longitudinal driving mechanism to drive the longitudinal driving mechanism to swing.
The reaction chamber temperature measuring system is characterized in that the longitudinal driving mechanism is connected with the temperature measurer through a telescopic rod.
The reaction chamber temperature measuring system is characterized in that the temperature measuring port is a conical shrinkage hole.
In a second aspect, an embodiment of the present application further provides a method for measuring a temperature of a reaction chamber, which is applied to the system for measuring a temperature distribution in the reaction chamber under a high temperature condition, and the method includes the following steps:
controlling the swing driver to operate so that the temperature detector swings in the temperature measuring port to measure temperature information of different positions in the reaction chamber;
acquiring temperature information measured by the temperature measurer during swinging, and acquiring pose information or time information corresponding to the temperature measurer;
and drawing a thermal field curve according to the temperature information and the pose information, or drawing the thermal field curve according to the temperature information and the time information.
According to the method for measuring the temperature of the reaction chamber, the temperature information of different positions in the reaction chamber can be obtained based on the swing of the single temperature measuring device installed in the temperature measuring port, the thermal field curve can be drawn based on the temperature information, a data base is provided for the analysis and adjustment of the temperature working condition in the reaction chamber, a plurality of temperature detection points do not need to be arranged on the reaction chamber, the method has the advantages of being accurate and convenient to measure, and the problem of uneven thermal field caused by multi-point temperature measurement can be solved.
The method for measuring the temperature of the reaction chamber comprises the following steps of controlling the swing driver to operate so as to enable the temperature detector to swing in the temperature measuring port to measure the temperature information of different positions in the reaction chamber:
acquiring information of a region to be detected in a reaction chamber;
formulating a temperature measuring route according to the information of the area to be measured;
and controlling the swing driver to operate according to the temperature measuring route so that the temperature measurer swings in the temperature measuring port to measure the temperature information of different positions in the reaction chamber.
In a third aspect, an embodiment of the present application further provides a device for measuring a temperature of a reaction chamber, which is applied to the system for measuring a temperature of a reaction chamber according to the first aspect, and the device is configured to measure a temperature distribution condition in the reaction chamber under a high-temperature working condition, and includes:
the driving module is used for controlling the swing driver to operate so that the temperature detector swings in the temperature measuring port to measure temperature information of different positions in the reaction chamber;
the acquisition module is used for acquiring temperature information measured by the temperature measurer during swinging and acquiring pose information or time information corresponding to the temperature measurer;
and the drawing module is used for drawing a thermal field curve according to the temperature information and the pose information or drawing the thermal field curve according to the temperature information and the time information.
The utility model provides a reaction chamber temperature measuring device, based on drive module, the thermoscope swing of installing in the temperature measurement mouth alone through control swing driver operation drive can realize the acquisition of different position temperature information in the reaction chamber, and can be based on the temperature information that acquisition module acquireed, utilize the drawing module to draw out the thermal field curve, for the analysis of reaction chamber temperature operating mode, adjust and provide the data basis, a plurality of temperature detection point need not to be seted up on the reaction chamber to this method, have the characteristics accurate, convenient, and can avoid the inhomogeneous problem of thermal field that multiple spot temperature measurement arouses.
In a fourth aspect, embodiments of the present application further provide a method for adjusting a temperature of a reaction chamber, which is applied to the system for measuring a temperature of a reaction chamber according to the first aspect, and is used for adjusting a temperature in the reaction chamber, where the reaction chamber is inductively heated by a plurality of coils, and the method includes:
acquiring a thermal field curve of the reaction chamber, and constructing a temperature distribution map of the reaction chamber according to the thermal field curve;
analyzing the temperature distribution diagram to obtain a temperature abnormal area with abnormal temperature;
and adjusting coil parameter information of the coil in the temperature abnormal region to eliminate the abnormal temperature.
According to the temperature adjusting method for the reaction chamber, the temperature distribution diagram is constructed according to the thermal field curve, the temperature abnormal area in the reaction chamber can be rapidly known according to the temperature distribution diagram, then the coil for supplying heat in the temperature abnormal area can be correspondingly adjusted in a targeted manner, the temperature of the temperature abnormal area is adjusted to be in a normal state, namely the temperature of the temperature abnormal area is consistent with that of the surrounding area, and therefore the temperature distribution of the temperature measuring area in the whole reaction chamber is uniform.
The method for adjusting the temperature of the reaction chamber, wherein the coil parameter information includes at least one of a coil distance, an adjacent coil distance and a number of coil turns.
Therefore, the embodiment of the application provides a temperature measuring system, a temperature measuring method, a temperature measuring device and a temperature adjusting method for a reaction chamber, wherein the system can perform regional temperature measurement in the reaction chamber only by arranging a temperature measuring port on the outer wall of the reaction chamber and installing a temperature measuring device, a plurality of temperature detecting points are not required to be arranged on the reaction chamber, the problem of uneven thermal field caused by heat dissipation in the reaction chamber due to too many temperature measuring holes arranged in the reaction chamber is avoided, the normal use of the reaction chamber is ensured, a thermal field curve can be drawn based on temperature information, and a data basis is provided for the analysis and adjustment of the temperature working condition in the reaction chamber.
Drawings
Fig. 1 is a schematic structural diagram of a temperature measurement system of a reaction chamber according to an embodiment of the present disclosure.
Fig. 2 is an enlarged view of a portion a in fig. 1.
Fig. 3 is a schematic structural diagram of the swing actuator.
Fig. 4 is a flowchart of a method for measuring a temperature of a reaction chamber according to an embodiment of the present disclosure.
Fig. 5 is a schematic structural diagram of a temperature measuring device for a reaction chamber according to an embodiment of the present disclosure.
Fig. 6 is a flowchart of a method for adjusting a temperature of a reaction chamber according to an embodiment of the present disclosure.
Reference numerals: 1. a reaction chamber; 2. a temperature detector; 3. a swing driver; 4. a longitudinal drive mechanism; 5. a lateral drive mechanism; 6. a telescopic rod; 11. a temperature measuring port; 12. a special infrared glass plate; 41. a first servo motor; 42. a first ball screw pair; 45. a limit switch; 51. a second servo motor; 52. a second ball screw pair; 71. a drive module; 72. an acquisition module; 73. and a drawing module.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures. Meanwhile, in the description of the present application, the terms "first", "second", and the like are used only for distinguishing the description, and are not to be construed as indicating or implying relative importance.
Referring to fig. 1-3, in a first aspect, fig. 1-3 illustrate a system for measuring temperature distribution in a reaction chamber 1 in a high temperature environment, according to some embodiments of the present disclosure, the system includes:
the outer wall of the reaction chamber 1 is provided with a temperature measuring port 11;
the temperature detector 2 is used for measuring the temperature condition in the reaction chamber 1 and is connected with the temperature measuring port 11 in a swinging way;
the swinging driver 3 is used for driving the temperature detector 2 to swing in the temperature measuring port 11;
and the controller (not shown) is used for controlling the swing driver 3 to operate, so that the temperature detector swings in the temperature measuring port 11 to obtain temperature information of different positions in the reaction chamber 1, and is used for drawing a thermal field curve according to the temperature information of the different positions.
The reaction chamber temperature measuring system provided by the embodiment of the application is used for measuring temperature information of different positions in the reaction chamber 1 to establish a thermal field curve, reflecting the temperature distribution condition in the reaction chamber 1 by using the thermal field curve and providing a data basis for analyzing and adjusting the temperature working condition in the reaction chamber 1.
In the process of acquiring the thermal field curve, the controller controls the swing driver 3 to move to enable the temperature detector 2 to swing in the temperature measuring port 11 so as to change the temperature measuring point of the temperature detector 2, so that temperature information about a continuous measuring route is acquired, the controller draws the thermal field curve according to the temperature information about the measuring route, so that the point on the thermal field curve and the area in the reaction chamber 1 have a corresponding relation, namely, the position of the area with abnormal temperature in the reaction chamber 1 can be quickly searched and determined from the abnormal temperature point on the thermal field curve; in addition, according to the use requirement, different temperature measuring routes are drawn up through the controller, so that the temperature measuring device 2 can measure the temperature information of different areas, namely the temperature measuring area can be adjusted according to a specific heating area in the reaction chamber 1, the thermal field curve of the temperature measuring area can be accurately obtained, and the time for measuring the temperature is saved.
Specifically, the temperature measuring area is set to be in a specific shape according to the process requirements, such as a circle, an ellipse, a trapezoid, a rectangle, a parallelogram and the like, the temperature measuring route covering the corresponding specific shape is drawn according to the size of the temperature measuring point of the temperature measurer 2 (the temperature measuring point is generally planned to be a circular area with a certain radius), and then swing temperature measurement is carried out, so that temperature information of the corresponding temperature measuring area is obtained to draw a thermal field curve capable of reflecting the temperature distribution condition, and accurate temperature data is provided for external equipment analysis and/or heating equipment to carry out thermal field adjustment.
In addition, the reaction chamber temperature measurement system of the embodiment of the present application only needs to set a temperature measurement port 11 on the outer wall of the reaction chamber 1 to install the temperature detector 2, so as to perform the regional temperature measurement in the reaction chamber 1, and it is not necessary to set a plurality of temperature detection points on the reaction chamber 1, thereby avoiding the problem of uneven thermal field caused by heat dissipation in the reaction chamber 1 due to too many temperature measurement holes set in the reaction chamber 1, and ensuring the normal use of the reaction chamber 1.
The reaction chamber temperature measuring system is suitable for a high-temperature reaction chamber 1 with an outer heat-insulating wall, and is particularly suitable for a reaction chamber 1 of a CVD epitaxial device, the CVD epitaxial device is generally provided with the reaction chamber 1 as an epitaxial growth chamber, and reaction gas is led into the reaction chamber 1 to react and deposit in a substrate in the high-temperature reaction chamber 1 for epitaxial growth, the requirements of the device on heat-insulating capacity and thermal field uniformity are high, if the temperature distribution in the reaction chamber 1 is not uniform, the epitaxial growth is defective, and therefore the temperature distribution condition in the reaction chamber 1 needs to be accurately obtained; the reaction chamber temperature measuring system provided by the embodiment of the application can accurately measure the temperature distribution in the reaction chamber 1 of the epitaxial equipment only by additionally arranging the temperature measuring port 11 in the reaction chamber 1, and can effectively avoid the problem of nonuniform thermal field in the reaction chamber 1 caused by structural damage to the reaction chamber 1 due to the additionally arranged temperature measuring instrument.
Specifically, the temperature detector 2 swings under the driving action of the swing driver 3 to acquire temperature information of different positions, the temperature detector 2 is an infrared temperature meter, preferably an infrared temperature measuring probe, and the temperature information is the temperature of the junction position of an outgoing line of a measuring end of the temperature detector 2 and the inside of the reaction chamber 1; the reaction chamber temperature measuring system of the embodiment of the application changes the incident angle of the outgoing line of the measuring end of the temperature measuring device 2 in the reaction chamber 1 by swinging the temperature measuring device 2 so as to change the position of the intersection point of the outgoing line of the temperature measuring device 2 and the reaction chamber 1, and further obtains the temperature information of different positions.
More specifically, the outer wall of the reaction chamber 1 of the epitaxial device is generally an insulating layer, the insulating layer is generally made of quartz, and an internal heater and a substrate for epitaxial growth are arranged in the insulating layer, so that the temperature measuring port 11 is arranged in the insulating layer made of quartz, so that the temperature measurer 2 can obtain the temperature information of the internal heater or the temperature information of the substrate in the reaction chamber 1.
In some preferred embodiments, the swing actuator 3 comprises:
the longitudinal driving mechanism 4 is used for driving the temperature detector 2 to longitudinally swing in the temperature measuring port 11;
and the transverse driving mechanism 5 is used for driving the temperature detector 2 to transversely swing in the temperature measuring port 11.
Specifically, the controller controls the longitudinal driving mechanism 4 to operate so as to enable the temperature detector 2 to longitudinally swing in the temperature measuring port 11, and controls the transverse driving mechanism 5 to operate so as to enable the temperature detector 2 to transversely swing in the temperature measuring port 11, so that the controller can enable the temperature detector 2 to measure temperature information of all positions in a specific area by controlling the swing driver 3 to operate.
In some preferred embodiments, the longitudinal driving mechanism 4 is connected with the temperature detector 2 to drive the temperature detector 2 to swing longitudinally, and the transverse driving mechanism 5 is connected with the longitudinal driving mechanism 4 to drive the longitudinal driving mechanism 4 to swing.
Specifically, the transverse driving mechanism 5 drives the longitudinal driving mechanism 4 to perform transverse displacement so that the longitudinal driving mechanism 4 drives the temperature detector 2 to perform transverse displacement.
In some preferred embodiments, the longitudinal drive mechanism 4 is connected to the temperature probe 2 via a telescopic rod 6.
Specifically, the transverse driving mechanism 5 and the longitudinal driving mechanism 4 are driven by linear displacement, so that the telescopic rod 6 is arranged to connect the longitudinal driving mechanism 4 and the temperature detector 2, and the temperature detector 2 can be prevented from being locked in the swinging process; wherein, the telescopic link 6 is a sleeve type telescopic link, one end of which is fixedly connected with the tail end of the temperature detector 2, and the other end is in universal connection with the longitudinal driving mechanism 4.
Specifically, the transverse driving mechanism 5 and the longitudinal driving mechanism 4 are electric linear driving mechanisms, such as an air cylinder, an electric slide rail, an electric screw pair, and the like.
More specifically, as shown in fig. 1, the longitudinal driving mechanism 4 includes a first servo motor 41, a first ball screw pair 42 driven by the first servo motor 41, a screw nut of the first ball screw pair 42 is hinged with one end of the telescopic rod 6 through a universal joint or a universal bearing; the controller controls the first servo motor 41 to rotate, so that the screw nut of the first ball screw pair 42 can be driven to longitudinally move, the telescopic rod 6 is further driven to longitudinally swing, the other end of the telescopic rod 6 is fixedly connected with the outer end of the temperature measurer 2, and the telescopic rod 6 longitudinally swings to drive the temperature measurer 2 to longitudinally swing in the temperature measuring port 11.
More specifically, as shown in fig. 3, the transverse driving mechanism 5 includes a second servo motor 51, a second ball screw pair 52 driven by the second servo motor 51, a sliding bracket rotatably connected to the screw of the first ball screw pair 42, and a screw nut of the second ball screw pair 52 fixedly connected to the sliding bracket; the controller controls the second servo motor 51 to rotate, so that the screw nut of the second ball screw pair 52 can be driven to transversely move, and then the longitudinal driving mechanism 4 is driven to transversely move, so that the telescopic rod 6 transversely swings, and the telescopic rod 6 transversely swings to drive the temperature detector 2 to transversely swing in the temperature measuring port 11.
More specifically, the controller sets the operation modes of the transverse driving mechanism 5 and the longitudinal driving mechanism 4 according to the temperature measuring route, that is, a control command is formulated to control the first servo motor 41 and the second servo motor 51 to rotate, so that the temperature measuring device 2 can measure the temperature along the temperature measuring path, for example, a temperature measuring area is rectangular, a continuous S-shaped route covering rectangular area is set according to the size of a temperature measuring point to be used as a temperature measuring route, the controller firstly controls the longitudinal driving mechanism 4 to operate based on the temperature measuring route so that the temperature measurer 2 longitudinally moves from one end of the rectangular area to the other end along the starting point of the temperature measuring route, then the transverse driving mechanism 5 is controlled to operate to make the temperature detector 2 transversely move a small distance along the temperature measuring route, then the longitudinal driving mechanism 4 is controlled to operate to make the temperature detector 2 reversely and longitudinally move, and so on, the temperature detector 2 measures the temperature information of the whole rectangular area along the continuous S-shaped temperature measuring route.
More specifically, in order to prevent the temperature detector 2 from being damaged due to excessive swing and collision with the temperature measuring port 11, the transverse driving mechanism 5 and the longitudinal driving mechanism 4 are both provided with limit switches 45, when the controller controls the first servo motor 41 or the second servo motor 51 to operate, if a lead screw nut on the first ball screw pair 42 or the second ball screw pair 52 touches the limit switch 45, it indicates that the temperature detector 2 reaches the edge of the swing range, the controller controls the corresponding servo motor to stop rotating continuously in the same direction, and the temperature detector 2 is prevented from swinging beyond the swing range.
More specifically, the first ball screw pair 42 is provided with two limit switches 45 which are arranged on two sides of a screw nut thereof, so that the longitudinal swing range of the temperature detector 2 is limited; the second ball screw pair 52 is provided with two limit switches 45 which are arranged on two sides of the screw nut thereof, thereby limiting the transverse swing range of the temperature detector 2.
In some preferred embodiments, the temperature measuring port 11 is a tapered constricting orifice.
Specifically, the temperature measuring port 11 is a tapered shrinkage hole, and a small end of the temperature measuring port is located at the outer end of the reaction chamber 1 and is in sealing connection with the temperature measuring device 2, so that the temperature measuring device 2 can swing in the temperature measuring port 11 and the heat preservation effect of the outer wall of the reaction chamber 1 is ensured.
In some preferred embodiments, the temperature detector 2 is connected with the reaction chamber 1 in a universal manner through a universal bearing, and the small end of the temperature measuring port 11 is sealed by the universal bearing, so that the temperature detector 2 can smoothly swing in the temperature measuring port 11 to complete temperature measurement in a specific temperature measuring area.
In some preferred embodiments, the taper of the temperature measuring port 11 is set based on the temperature measuring region of the reaction chamber 1, and the taper of the temperature measuring port 11 defines the swing range of the temperature measuring device 2, so that the taper of the temperature measuring port 11 needs to be designed according to the temperature region to be measured in the reaction chamber 1.
In some preferred embodiments, the temperature measuring port 11 is a conical or pyramidal orifice.
In some preferred embodiments, an infrared special glass plate 12 is further arranged in the temperature measurement port 11 to seal the large opening end of the temperature measurement port, the infrared special glass plate 12 does not affect the measurement effect of the temperature detector 2, the temperature measurement port 11 can be further sealed, and the condition of heat leakage of the temperature measurement port 11 is reduced, so that the thermal field in the reaction chamber 1 is ensured to be normal.
In some preferred embodiments, the reaction chamber 1 is a reaction chamber 1 of a horizontal epitaxial apparatus, which has a hollow cylindrical shape and is provided with a horizontally arranged heating region therein, and the temperature measuring port 11 is radially opened in the cylindrical reaction chamber 1, so that the temperature measuring device 2 can smoothly measure the temperature information of the heating region.
In a second aspect, please refer to fig. 4, fig. 4 is a method for measuring a temperature of a reaction chamber, which is applied to the above-mentioned system for measuring a temperature distribution of the reaction chamber under a high temperature condition, according to some embodiments of the present application, and the method includes the following steps:
controlling the swing driver 3 to operate so that the temperature detector 2 swings in the temperature measuring port 11 to measure temperature information of different positions in the reaction chamber 1;
acquiring temperature information measured by the temperature detector 2 during swinging, and acquiring pose information or time information corresponding to the temperature detector 2;
and drawing a thermal field curve according to the temperature information and the pose information, or drawing the thermal field curve according to the temperature information and the time information.
According to the method for measuring the temperature of the reaction chamber, the temperature information of different positions in the reaction chamber 1 can be obtained based on the swing of the single temperature measuring device 2 installed in the temperature measuring port 11, the thermal field curve can be drawn based on the temperature information, and a data basis is provided for the analysis and adjustment of the temperature working condition in the reaction chamber 1.
Specifically, the time information is the time when the temperature information of a certain position is measured by the corresponding temperature measuring device 2, and the relationship between the temperature measurement time and the temperature information is reflected on the basis of a thermal field curve drawn by the time information and the temperature information, so that the corresponding measurement time can be obtained on the basis of the temperature point on the thermal field curve, and the position corresponding to the temperature point in the reaction chamber 1 can be reversely deduced by combining the swing condition of the temperature measuring device 2.
Specifically, the pose information of the temperature detector 2 includes the orientation of the temperature detector 2 in the temperature measurement port 11, and the measurement position corresponding to the reaction chamber 1 can be known by analyzing the orientation of the temperature detector 2, so that a thermal field curve is drawn based on the temperature information and the pose information, and the relationship between the temperature measurement position and the temperature information is reflected, and therefore, the pose of the corresponding temperature detector 2 can be obtained based on the temperature point on the thermal field curve, and the position corresponding to the temperature point in the reaction chamber 1 can be obtained.
Specifically, the thermal field curve is a temperature change curve with respect to time information or posture information of the temperature detector 2.
More specifically, the posture information of the temperature detector 2 is acquired by analyzing the swing posture of the swing actuator 3.
More specifically, the posture information of the temperature detector 2 is acquired by the controller analyzing the screw nut positions on the first and second ball screw pairs 42 and 52.
Therefore, according to the method for measuring the temperature of the reaction chamber, a thermal field curve can be drawn based on the temperature information and the pose information, or the thermal field curve can be drawn based on the temperature information and the time information, and both drawing modes can be used for carrying out position tracing, so that the position of the temperature point, which is generated correspondingly by the reaction chamber 1, can be obtained according to the temperature point in the thermal field curve, and a data basis is provided for analyzing and adjusting the temperature working condition in the reaction chamber 1.
In some preferred embodiments, the step of controlling the operation of the swing driver 3 to make the temperature detector 2 swing in the temperature measuring port 11 to measure the temperature information of different positions in the reaction chamber 1 comprises:
acquiring information of a region to be detected of the reaction chamber 1;
formulating a temperature measuring route according to the information of the area to be measured;
and controlling the swing driver 3 to operate according to the temperature measuring route so that the temperature detector 2 swings in the temperature measuring port 11 to measure the temperature information of different positions in the reaction chamber 1.
Specifically, the measurement position of the temperature detector 2 is moved along the temperature measurement route.
Specifically, the information of the region to be measured is the region range in which the temperature needs to be measured, and if a rectangular region of a plane in the reaction chamber 1 needs to be measured, the rectangular region is the information of the region to be measured.
More specifically, a continuous temperature measurement route is designed according to the shape, size and the like of the information of the area to be measured, and then an operation instruction of the swing driver 3 is made based on the temperature measurement route, if the information of the area to be measured is a rectangular area, the temperature measurement route can be set to be a continuous S-shaped route which has a certain width and can cover the whole rectangular area, so that the temperature measurer 2 can measure the temperature information of the whole rectangular area along the continuous S-shaped route to draw a corresponding thermal field curve; if the information of the area to be measured is a circular area, the temperature measuring route can be set to be a spiral route with a certain width and capable of covering the whole circular area, so that the temperature measurer 2 can measure the temperature information of the whole circular area along the spiral route to make a corresponding thermal field curve.
In a third aspect, please refer to fig. 5, fig. 5 is a device for measuring a temperature distribution of a reaction chamber under a high temperature condition in a reaction chamber, which is applied to the above-mentioned system for measuring a temperature of the reaction chamber according to some embodiments of the present application, and the device includes:
the driving module 71 is used for controlling the swing driver 3 to operate so that the temperature detector 2 swings in the temperature measuring port 11 to measure the temperature information of different positions in the reaction chamber 1;
the acquisition module 72 is configured to acquire temperature information measured by the temperature detector 2 during swinging, and acquire pose information or time information corresponding to the temperature detector 2;
and the drawing module 73 is used for drawing a thermal field curve according to the temperature information and the pose information, or drawing a thermal field curve according to the temperature information and the time information.
The utility model provides a reaction chamber temperature measuring device, based on drive module 71, drive the swing of the single thermoscope 2 of installing in temperature measurement mouth 11 through control swing driver 3 operation and can realize the acquisition of different position temperature information in the reaction chamber 1, and can be based on the temperature information that acquisition module 72 acquireed, utilize drawing module 73 to draw out the thermal field curve, for temperature condition analysis in the reaction chamber 1, adjust and provide the data basis, this method need not to set up a plurality of temperature detection points on the reaction chamber 1, have the characteristics accurate, convenient, and can avoid the inhomogeneous problem of thermal field that multiple spot temperature measurement arouses.
In a fourth aspect, please refer to fig. 6, fig. 6 is a method for adjusting a temperature of a reaction chamber, which is applied to the above-mentioned system for measuring a temperature of a reaction chamber 1, wherein the reaction chamber 1 is inductively heated by a plurality of coils, the method comprising:
acquiring a thermal field curve of the reaction chamber 1, and constructing a temperature distribution diagram of the reaction chamber 1 according to the thermal field curve;
analyzing the temperature distribution diagram to obtain a temperature abnormal area with abnormal temperature;
and adjusting coil parameter information of the coil in the temperature abnormal region to eliminate the abnormal temperature.
According to the method for adjusting the temperature of the reaction chamber, the temperature distribution diagram is constructed according to the thermal field curve, the existence of the abnormal temperature region (the region with too high temperature or too low temperature) in the reaction chamber 1 can be quickly known according to the temperature distribution diagram, then the coil for supplying heat in the abnormal temperature region can be correspondingly adjusted in a targeted manner, and the temperature of the abnormal temperature region is adjusted to be in a normal state, namely, the temperature of the abnormal temperature region is consistent with the temperature of the surrounding region, so that the temperature distribution of the temperature measurement region in the whole reaction chamber 1 is uniform.
Specifically, the thermal field curve is a temperature change curve related to time information or pose information of the temperature detector 2, so that a measured position in the reaction chamber 1 corresponding to a temperature point on the thermal field curve can be acquired based on the time information or the pose information of the temperature detector 2, and a temperature distribution map related to the temperature measurement area can be drawn in combination with the temperature measurement area in the reaction chamber 1, and the temperature distribution map can intuitively reflect the temperature distribution condition in the reaction chamber 1.
In some preferred embodiments, the coil parameter information includes at least one of coil spacing, adjacent coil distance, and number of coil turns.
Specifically, after the temperature abnormal area is obtained, the coil parameter information needs to be adjusted to adjust the temperature of the corresponding area position, wherein the coil distance is the distance between copper wires wound on the coil, and the smaller the distance is, the higher the heating temperature is, namely the smaller the coil distance is, the temperature of the corresponding area position can be increased; the distance between the adjacent coils is the distance between the axial leads of one coil and the other coil, the heating temperature is higher when the distance between the adjacent coils is smaller, namely the distance between the adjacent coils is reduced, and the temperature of the corresponding area position can be increased; the heating temperature is higher when the number of coil turns is more, namely, the temperature of the corresponding area position can be increased by increasing the number of coil turns.
In some preferred embodiments, the adjustment priority of the coil parameter information is sequentially coil distance, and number of coil turns, if there is an abnormal temperature region, the coil distance is adjusted first to adjust the abnormal temperature region, and if the coil distance is adjusted to a limit value, the abnormal temperature region is not adjusted to a normal state, the adjustment of the distance between adjacent coils is started.
To sum up, the embodiment of the present application provides a system, a method, a device and a method for measuring temperature of a reaction chamber, wherein the system can perform regional temperature measurement in the reaction chamber 1 only by arranging a temperature measuring port 11 on the outer wall of the reaction chamber 1 and installing a temperature measuring device 2, and does not need to arrange a plurality of temperature detection points on the reaction chamber 1, thereby avoiding the problem of uneven thermal field caused by heat dissipation in the reaction chamber 1 due to too many temperature measurement holes arranged in the reaction chamber 1, ensuring normal use of the reaction chamber 1, and drawing a thermal field curve based on temperature information, and providing a data base for analysis and adjustment of temperature working conditions in the reaction chamber 1.
In the embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other ways. The above-described embodiments of the apparatus are merely illustrative, and for example, the division of the units is only one logical division, and there may be other divisions when actually implemented, and for example, a plurality of units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection of devices or units through some communication interfaces, and may be in an electrical, mechanical or other form.
In addition, units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.
Furthermore, the functional modules in the embodiments of the present application may be integrated together to form an independent part, or each module may exist separately, or two or more modules may be integrated to form an independent part.
In this document, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions.
The above description is only an example of the present application and is not intended to limit the scope of the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A temperature measuring system for a reaction chamber, which is used for measuring the temperature distribution in the reaction chamber under the high-temperature working condition, and is characterized in that the system comprises:
the outer wall of the reaction chamber is provided with a temperature measuring port;
the temperature detector is used for measuring the temperature condition in the reaction chamber and is connected with the temperature measuring port in a swinging way;
the swinging driver is used for driving the temperature measurer to swing in the temperature measuring port;
and the controller is used for controlling the swing driver to operate so as to enable the temperature detector to swing in the temperature measuring port to obtain temperature information of different positions in the reaction chamber, and is used for drawing a thermal field curve according to the temperature information of the different positions.
2. A system as claimed in claim 1, wherein said wobble drive comprises:
the longitudinal driving mechanism is used for driving the temperature measurer to longitudinally swing in the temperature measuring port;
and the transverse driving mechanism is used for driving the temperature measurer to transversely swing in the temperature measuring port.
3. The system as claimed in claim 2, wherein the longitudinal driving mechanism is connected to the temperature detector to drive the temperature detector to swing longitudinally, and the lateral driving mechanism is connected to the longitudinal driving mechanism to drive the longitudinal driving mechanism to swing.
4. A system as claimed in claim 3, wherein the longitudinal drive mechanism is connected to the temperature detector by a telescopic rod.
5. The system of claim 1, wherein the temperature measuring port is a tapered constriction.
6. A method for measuring the temperature of a reaction chamber, which is applied to a system for measuring the temperature of a reaction chamber according to any one of claims 1 to 5, and is used for measuring the temperature distribution in the reaction chamber under the high-temperature working condition, wherein the method comprises the following steps:
controlling the swing driver to operate so that the temperature detector swings in the temperature measuring port to measure temperature information of different positions in the reaction chamber;
acquiring temperature information measured by the temperature measurer during swinging, and acquiring pose information or time information corresponding to the temperature measurer;
and drawing a thermal field curve according to the temperature information and the pose information, or drawing the thermal field curve according to the temperature information and the time information.
7. The method as claimed in claim 6, wherein the step of controlling the operation of the swing driver to swing the temperature detector in the temperature measuring port to measure the temperature information at different positions in the reaction chamber comprises:
acquiring information of a region to be detected in a reaction chamber;
formulating a temperature measuring route according to the information of the area to be measured;
and controlling the swing driver to operate according to the temperature measuring route so that the temperature measurer swings in the temperature measuring port to measure the temperature information of different positions in the reaction chamber.
8. A temperature measuring device for a reaction chamber, which is applied to a temperature measuring system for a reaction chamber according to any one of claims 1 to 5, and is used for measuring the temperature distribution in the reaction chamber under the high-temperature working condition, wherein the device comprises:
the driving module is used for controlling the swing driver to operate so that the temperature detector swings in the temperature measuring port to measure temperature information of different positions in the reaction chamber;
the acquisition module is used for acquiring temperature information measured by the temperature measurer during swinging and acquiring pose information or time information corresponding to the temperature measurer;
and the drawing module is used for drawing a thermal field curve according to the temperature information and the pose information or drawing the thermal field curve according to the temperature information and the time information.
9. A method for adjusting a temperature of a reaction chamber, which is applied to a system for measuring a temperature of a reaction chamber according to any one of claims 1 to 5, for adjusting a temperature of a reaction chamber, the reaction chamber being inductively heated by a plurality of coils, the method comprising:
acquiring a thermal field curve of the reaction chamber, and constructing a temperature distribution map of the reaction chamber according to the thermal field curve;
analyzing the temperature distribution diagram to obtain a temperature abnormal area with abnormal temperature;
and adjusting coil parameter information of the coil in the temperature abnormal region to eliminate the abnormal temperature.
10. The method of claim 9, wherein the coil parameter information comprises at least one of a coil pitch, an adjacent coil distance, and a number of coil turns.
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