CN112987380A - Liquid crystal display substrate and forming method thereof, liquid crystal display panel and forming method thereof - Google Patents
Liquid crystal display substrate and forming method thereof, liquid crystal display panel and forming method thereof Download PDFInfo
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- CN112987380A CN112987380A CN201911303464.9A CN201911303464A CN112987380A CN 112987380 A CN112987380 A CN 112987380A CN 201911303464 A CN201911303464 A CN 201911303464A CN 112987380 A CN112987380 A CN 112987380A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
Abstract
A liquid crystal display substrate and a forming method thereof, a liquid crystal display panel and a forming method thereof are provided, wherein the forming method of the liquid crystal display substrate comprises the following steps: providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of transparent areas and a plurality of light shielding areas, and the light shielding areas are positioned between adjacent light transmitting areas; forming a light-shielding material film on the display area and the non-display area, the light-shielding material film having a first optical density; and carrying out graphical processing on the shading material film, and forming a shading layer on the shading area, wherein the shading layer has a second optical density, and the second optical density is greater than the first optical density. The method is beneficial to improving the accuracy of alignment, so that the performance of the formed liquid crystal display substrate and the formed liquid crystal display panel is better.
Description
Technical Field
The invention relates to the technical field of display, in particular to a liquid crystal display substrate and a forming method thereof, and a liquid crystal display panel and a forming method thereof.
Background
The lcd substrate is one of the most widely used flat panel displays due to its advantages of high display quality, low price, portability, etc., and has gradually become a display with a high resolution color screen widely used in various electronic devices such as mobile phones, Personal Digital Assistants (PDAs), digital cameras, computer screens, or notebook computer screens.
Most of the lcd panels in the market today are backlight lcd panels, which include an lcd substrate and a backlight module (backlight module). Generally, a Liquid Crystal display Substrate is composed of a Color Filter (CF) Substrate, a Thin Film Transistor Array (TFT) Substrate, and a Liquid Crystal Layer (Liquid Crystal Layer) disposed between the two substrates, and the Liquid Crystal display Substrate has an operation principle that a driving voltage is applied to the two substrates to control rotation of Liquid Crystal molecules of the Liquid Crystal Layer, so as to refract light of a backlight module to generate a picture.
In order to improve the aperture opening ratio of the liquid crystal display substrate and reduce the parasitic capacitance effect, a COA (color Filter On array) technology is adopted, and a color film can be integrally manufactured On one side of the TFT array substrate in the process of preparing the liquid crystal display substrate.
However, the performance of the liquid crystal display substrate formed by the COA technology is poor.
Disclosure of Invention
The invention aims to provide a liquid crystal display substrate and a forming method thereof, and a liquid crystal display panel and a forming method thereof, so as to improve the accuracy of alignment and ensure that the formed liquid crystal display substrate and the formed liquid crystal display panel have higher performance.
In order to solve the above technical problems, a technical solution of the present invention provides a method for forming a liquid crystal display substrate, including: providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of transparent areas and a plurality of light shielding areas, and the light shielding areas are positioned between adjacent light transmitting areas; forming a light-shielding material film on the display area and the non-display area, the light-shielding material film having a first optical density; and carrying out graphical processing on the shading material film, and forming a shading layer on the shading area, wherein the shading layer has a second optical density, and the second optical density is greater than the first optical density.
Optionally, the first optical density ranges from (0, 1.5).
Optionally, the second optical density ranges from (3.5, ∞).
Optionally, the material of the light-shielding material film includes: a photochromic material.
Optionally, the photochromic material comprises: one or a combination of more of spiropyran derivatives, diarylethene derivatives and fulgide derivatives.
Optionally, the graphical processing includes: an exposure process and a development process.
Optionally, the wavelength range of the light processed by the exposure process is 200 nm to 400 nm.
Optionally, the method further includes: before forming the light-shielding material film, a mark structure is formed on the non-display region.
Optionally, the method further includes: before the light shading material film is formed, a light filtering structure is formed on the light transmitting areas, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
Optionally, the method further includes: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
Optionally, the method further includes: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
Optionally, the method further includes: after the light shading layer is formed, a light filtering structure is formed on the light transmitting area, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
Optionally, the method further includes: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
Optionally, the method further includes: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
Optionally, the method further includes: and before the second pixel electrode layer is formed, a flat protective layer is formed on the display area, and the flat protective layer is positioned at the bottom of the second pixel electrode layer.
Correspondingly, the technical scheme of the invention also provides a liquid crystal display substrate formed by adopting any one of the methods, which comprises the following steps: the display device comprises a first substrate, a second substrate and a third substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of transparent areas and a plurality of shading areas, and the shading areas are positioned between adjacent light-transmitting areas; and the light shielding layer is positioned on the light shielding area and has a second optical density, the second optical density is greater than the first optical density, and the first optical density is the optical density of the light shielding layer before the light shielding layer is subjected to graphical processing.
The technical scheme of the invention also provides a method for forming the liquid crystal display panel, which comprises the following steps: providing the liquid crystal display substrate; providing a second substrate; attaching the second substrate to the liquid crystal display substrate to form a cavity; and filling liquid crystal in the cavity.
Correspondingly, the technical scheme of the invention also provides the liquid crystal display panel formed by adopting the forming method.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects:
in the method for forming the liquid crystal display substrate provided by the technical scheme of the invention, the shading material film has a first optical density, the material is changed after the shading material film is subjected to graphical processing to form the shading layer, the shading layer has a second optical density, the second optical density is greater than the first optical density, and the shading material film with the smaller optical density is in a semitransparent or transparent state to light, so that accurate alignment is facilitated, and the accuracy of the graphical processing is facilitated. Meanwhile, the optical density of the initial photoresist material layer is high, so that the light shielding layer on the light shielding area is ensured to be in an opaque state to light, namely, the light shielding layer has a light shielding effect and can meet the process requirements. In conclusion, the method is beneficial to improving the performance of the formed liquid crystal display substrate.
Further, the graphical processing comprises: an exposure process and a development process. The exposure process changes the material properties of the light-shielding material film to increase the optical density of the formed light-shielding layer, so that the light-shielding layer has light-shielding properties. Meanwhile, the exposure process can also enable the materials of the part, which is not irradiated, of the shading material film to be different from the part, which is irradiated, so that the material of the part, which is not irradiated, of the shading material film is removed through a subsequent developing process, the part, which is irradiated, of the shading material film is still remained after the developing process, the pattern transfer is realized, and finally the shading layer is formed on the shading area. In conclusion, the method is beneficial to reducing process steps, easy to operate and low in cost.
Drawings
FIGS. 1 to 4 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate;
fig. 5 to 13 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate according to an embodiment of the invention.
Detailed Description
As described in the background, the conventional liquid crystal display substrate has poor performance.
The reason why the performance of the liquid crystal display substrate is poor will be described in detail below with reference to the accompanying drawings, and fig. 1 to 4 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate.
Referring to fig. 1, a first substrate 100 is provided, where the first substrate 100 includes: the display area A and the non-display area B, and a plurality of transparent areas I and a plurality of shading areas II, and the shading areas I are located between adjacent transparent areas II.
Referring to fig. 2, a pixel electrode layer 110 is formed on the display area a and a portion of the non-display area B.
Referring to fig. 3, a color photoresist layer 120 is formed on the transmissive region I.
Referring to fig. 4, after the color photoresist layer 120 and the pixel electrode layer 110 are formed, a light-shielding layer 130 is formed on the light-shielding region II.
In the above method, the color photoresist layer 120 and the pixel electrode layer 110 are both formed on the same side surface of the first substrate 100, which is beneficial to reducing the parasitic capacitance effect and realizing a curved or fixed curvature liquid crystal display substrate. Meanwhile, the pixel electrode layer 110 on a part of the non-display region B may be used as a mark, thereby facilitating accurate alignment during subsequent film formation.
Since the light-shielding layer 130 is formed, alignment processing is required. The alignment treatment process comprises the following steps: the mark formed on the non-display area B and the mark in the mask plate are aligned, and the pattern in the mask plate is accurately transferred to the light shielding layer 130. However, since the material of the light-shielding layer 130 is usually opaque, the lens cannot identify the mark located at the bottom of the light-shielding layer 130 to achieve alignment, which results in poor accuracy of the alignment process and poor performance of the formed liquid crystal display substrate.
In order to solve the above technical problems, a technical solution of the present invention provides a liquid crystal display substrate, including a first substrate, the first substrate including a display area and a non-display area, the display area including a plurality of transparent areas and a plurality of light-shielding areas, and the light-shielding areas being located between adjacent transparent areas; forming a light-shielding material film on the display area and the non-display area, the light-shielding material film having a first optical density; and carrying out graphical processing on the shading material film, and forming a shading layer on the shading area, wherein the shading layer has a second optical density, and the second optical density is greater than the first optical density. The method is beneficial to accurate alignment, so that the performance of the formed liquid crystal display substrate is higher.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
Fig. 5 to 13 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate according to an embodiment of the invention.
Referring to fig. 5, a first substrate 200 is provided, where the first substrate 200 includes a display area a and a non-display area B, the display area a includes a plurality of transparent areas I and a plurality of light-shielding areas II, and the light-shielding areas I are located between adjacent light-transmitting areas II.
The display area A is used for forming a pixel structure subsequently, and the non-display area B is used for forming a mark subsequently.
The material of the first substrate 200 includes silicon oxide, Polyimide (PI), polyethylene terephthalate (PET), or Triacetylcellulose (TAC).
In this embodiment, the material of the first substrate 200 is silicon oxide.
In this embodiment, before the light-shielding material film is formed subsequently, a filter structure is formed on the light-transmitting area I, where the filter structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
In other embodiments, after the light-shielding material film is subsequently formed, a light-filtering structure is formed on the light-transmitting areas I, the light-filtering structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
In this embodiment, the method for forming the liquid crystal display panel further includes: forming a first pixel electrode layer on the display area A before forming the light filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area A; and forming a spacer on the light shielding region II.
In other embodiments, after the filtering structure is formed, a first pixel electrode layer may be formed on the display region; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
Referring to fig. 6, a first pixel electrode material film 210 is formed on the display area a and the non-display area B.
The first pixel electrode material film 210 is used for providing a material for a first pixel electrode layer to be formed later.
In this embodiment, the first pixel electrode film 210 is also located on the surface of the non-display region B, and the first pixel electrode film 210 located on the surface of the non-display region B is used to form a part of the mark structure.
The material of the first pixel electrode material film 210 includes: a metal oxide comprising indium tin oxide, fluorine doped tin oxide or aluminum doped zinc oxide.
The formation process of the first pixel electrode material film 210 includes: a sputtering process, a deposition process, or a coating process.
In the present embodiment, the process of forming the first pixel electrode material film 210 is a sputtering process.
In this embodiment, the material of the first pixel electrode material film 210 is indium tin oxide.
In other embodiments, the material of the first pixel electrode material film may also be a metal, such as chromium.
Referring to fig. 7, a first patterning process is performed on the first pixel electrode material film 210 to form a first pixel electrode layer 211 on a portion of the display area a and the non-display area B.
The first pixel electrode layer 211 on the surface of the non-display region B is used to provide alignment marks for the subsequent formation of the filtering structure, the second pixel electrode layer, the flat protection layer and the spacer.
The method of the first patterning layer comprises: forming a first patterned layer (not shown) on the surface of the first pixel electrode material film 210; the first pixel electrode material film 210 is etched using the first patterning layer as a mask until the surface of the first substrate 200 is exposed, thereby forming the first pixel electrode layer 211.
The first pixel electrode layer 211 on the surface of the display area a is used to provide a conductive structure for forming an electrical path.
The shape of the first pixel electrode layer 211 on the surface of the non-display region B includes: one or more of a positive direction, a rectangle, a cross and a rhombus.
The first pixel electrode layer 211 on the surface of the non-display area B corresponds to the position and size of a mark on an adopted mask plate, and the mask plate is used for an exposure process to realize pattern transfer.
Referring to fig. 8, a filter structure (not shown) is formed on the light-transmitting area a, wherein the filter structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layers are a red filter layer 2221, a green filter layer 2222, or a blue filter layer 2223.
The light filtering structure enables light rays to be changed into monochromatic light after passing through the light filtering structure, so that the requirements of the device are met.
In this embodiment, after the first pixel electrode layer 211 is formed, the filter structure is formed. In other embodiments, the filtering structure is formed before the first pixel electrode layer is formed.
The first pixel electrode layer 211 located on the non-display area B is used as a mark for forming the filtering structure, and in the process of an exposure process, accurate alignment is realized by comparing the position and the size of the mark in the mask with the position and the size of the first pixel electrode layer 211 on the non-display area B.
In this embodiment, the filter structure is not on the non-display region B. In other embodiments, the filter structure is also located on a portion of the non-display area, thereby serving as a part of the indicia structure.
In this embodiment, the filtering structure includes: a red filter layer 2221, a green-green sheet 2222, and a blue filter layer 2223.
The method for forming the red filter layer 2221 includes: forming a red filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the red filter layer material is exposed and developed, and the red filter layer 2221 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.
The method for forming the green filter layer 2222 includes: forming a green filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the green filter layer material is exposed and developed, and a green filter layer 2222 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.
The method for forming the blue filter layer 2223 includes: forming a blue filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the blue filter layer material is exposed and developed, and the blue filter layer 2223 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.
It should be noted that the forming order of the red filter layer 2221, the green filter layer 2222, and the blue filter layer 2223 is not sequentially distinguished.
In this embodiment, the red filter layer 2221 is formed only on the light-transmitting area I, and the red filter layer 2221 is not formed on the non-display area B; forming a green filter layer 2222 only on the light-transmitting area I, without forming the green filter layer 2222 on the non-display area B; the blue filter layer 2223 is formed only on the light-transmitting area I, and the blue filter layer 2223 is not formed on the non-display area B.
In other embodiments, a red filter layer is formed on the light-transmitting area, and the red filter layer is also formed on the non-display area.
In other embodiments, a green filter layer is formed on the light-transmitting area, and the green filter layer is also formed on the non-display area.
In other embodiments, a blue filter layer is formed on the light-transmitting area, and the blue filter layer is also formed on the non-display area.
Referring to fig. 9, after the filter structure is formed, a flat protection layer 231 is formed on the display area a.
In this embodiment, the flat protection layer 231 is further located on the portion of the non-display area B, and the position and the size of the flat protection layer 231 located on the non-display area B correspond to the position and the size of the first pixel electrode layer 211 one to one, as a part of the mark structure.
The flat protection layer 231 on the display region B plays a role of insulation protection, and on the other hand, the top surface of the flat protection layer 231 is flat, so that the heights of the subsequently formed spacers are consistent.
The material of the flat protective layer 231 includes: a transparent photosensitive resin.
The method for forming the flat protection layer 231 comprises the following steps: forming a flat material film (not shown) on the display area a and the non-display area B using a coating process; the flat material film is subjected to an exposure process and a development process to form the flat protection layer 231.
The first pixel electrode layer 211 on the non-display area B is used as a mark for forming the flat protection layer 231, so that in the process of an exposure process, accurate alignment is realized by comparing the position and the size of the mark in the mask and the first pixel electrode layer 211.
In other embodiments, the flat protection layer may also be formed before forming the filtering structure.
After the formation of the flat protection layer 231, a second pixel electrode layer is formed on the display region a, and the flat protection layer 231 is located at the bottom of the second pixel electrode layer, as shown in fig. 10 to 11.
Referring to fig. 10, a second pixel electrode material film 240 is formed on the display area a and the non-display area B.
The second pixel electrode material film 240 is used for providing a material for a second pixel electrode layer to be formed later.
The material of the second pixel electrode material film 240 includes: a metal oxide comprising indium tin oxide, fluorine doped tin oxide or aluminum doped zinc oxide.
In this embodiment, the material of the second pixel electrode material film 240 is indium tin oxide.
The formation process of the second pixel electrode material film 240 includes: a sputtering process, a deposition process, or a coating process.
In this embodiment, the forming process of the second pixel electrode material film 240 includes: and (4) sputtering.
In other embodiments, the material of the second pixel electrode material film may also be a metal, such as chromium.
Referring to fig. 11, an exposure process and a development process are performed on the second pixel electrode material film 240 to form a second pixel electrode layer 241 on the surface of the display region a.
In this embodiment, the second pixel electrode layer 241 is further located on a portion of the non-display region B, and the position and size of the second pixel electrode layer 241 located on the portion of the non-display region B are in one-to-one correspondence with the position and size of the first pixel electrode layer 211, and are used as a part of the mark structure.
In other embodiments, the second pixel electrode layer is not located on the non-display region.
The second pixel electrode layer 241 is used to provide a conductive structure for forming an electrical path.
In this embodiment, the first pixel electrode layer 211 located on the non-display region B and the flat protective layer 231 located on the surface of the first pixel electrode layer 211 are used as marks for forming the second pixel electrode layer 241, so that in the process of the exposure process, by comparing the marks in the mask with the positions and sizes of the first pixel electrode layer 211 and the flat protective layer 231, accurate alignment is realized.
Since the second pixel electrode material film 240 is made of indium tin oxide and the second pixel electrode material film 240 made of the material is transparent, a lens of an apparatus performing an exposure process can accurately capture a mark located at the bottom of the second pixel electrode material film 240, that is, the first pixel electrode layer 211 and the flat protective layer 231, so that accurate alignment can be performed according to the mark on the mask and the positions and sizes of the first pixel electrode layer 211 and the flat protective layer 231.
Referring to fig. 11, in the present embodiment, the first pixel electrode layer 211 on the surface of the partial non-display region B, the flat protection layer 231 on the surface of the first pixel electrode layer 211, and the second pixel electrode layer 241 on the surface of the flat protection layer 231 form a mark structure 250.
Before the light-shielding material film is formed, the order of formation of the first pixel electrode layer 211, the filter structure, the planarization protective layer 231, and the second pixel electrode layer 241 is not limited.
Referring to fig. 12, a light-shielding material film 260 is formed on the display area a and the non-display area B, the light-shielding material film 260 having a first optical density.
The light shielding material film 260 covers the surface of the marker structure 250.
The first optical density ranges from (0, 1.5).
The material of the light shielding material film 260 includes: a photochromic material.
The photochromic material includes: one or a combination of more of spiropyran derivatives, diarylethene derivatives and fulgide derivatives.
In this embodiment, the material of the light-shielding material film 260 is diarylethene, and the first optical density of the light-shielding material film 260 formed of the diarylethene-based material is (0, 1.5).
In this embodiment, the marking structure 250 includes: the display device comprises a first pixel electrode layer 211 positioned on a part of the non-display area B, a flat protective layer 231 positioned on the surface of the first pixel electrode layer 211, and a second pixel electrode layer 241 positioned on the surface of the flat protective layer 231.
Because the light shielding material film 260 has the first optical density, and the light shielding material film 260 is transparent, a lens on an apparatus performing an exposure process can accurately capture the mark structure 250 positioned at the bottom of the light shielding material film 260, so that accurate alignment can be performed according to the position and size of the mark on the mask and the position and size of the mark structure 250.
Referring to fig. 13, the light-shielding material film 260 is patterned to form a light-shielding layer 270 having a second optical density, wherein the second optical density is greater than the first optical density.
The light shielding layer 270 is used to prevent optical crosstalk between the filter structures formed on the adjacent light-transmitting regions a.
The graphical processing comprises the following steps: an exposure process and a development process.
The wavelength range of light for exposing the light-shielding material film 260 is 200 nm to 400 nm.
The light-shielding material film 260 has a first optical density, the material of the light-shielding material film 260 is changed after exposure to form the light-shielding layer 270, the light-shielding layer 270 has a second optical density, the second optical density is greater than the first optical density, and the light-shielding material film 260 with the smaller optical density is in a semitransparent or transparent state to light, so that the mark structure 250 at the bottom of the light-shielding material film 260 can be identified, accurate alignment is facilitated, and accuracy of patterning processing is facilitated. Meanwhile, the optical density of the light shielding layer 270 is relatively high, so that the light shielding layer 270 is in an opaque state to light, namely, the light shielding effect is achieved, and the process requirements can be met. In conclusion, the method is beneficial to the function of the formed liquid crystal display substrate.
The graphical processing comprises the following steps: an exposure process and a development process. The exposure process changes the material properties of the light-shielding material film 260, so that the optical density of the formed light-shielding layer 270 is increased, and the light-shielding layer 270 has light-shielding properties. Meanwhile, the exposure process can also make the material of the part of the light-shielding material film 260 which is not irradiated with light different from that of the part of the light-shielding material film 260 which is not irradiated with light, and through the subsequent development process, the material of the part of the light-shielding material film 260 which is not irradiated with light is removed, the part of the light-shielding material film 260 which is irradiated with light is remained through the development process, so that the pattern transfer is realized, and finally, the light-shielding layer 270 is formed on the part of the. In conclusion, the method is beneficial to fewer process steps, easy to operate and low in cost.
In the present embodiment, after the light-shielding layer 270 is formed, a spacer (not shown) is formed on the light-shielding region II.
The spacer is used for providing support between the first substrate 200 and a second substrate formed subsequently, so that the cavity between the first substrate and the second substrate is reduced to deform greatly, the stability of the thickness of the cavity is kept, and the display effect of the liquid crystal display panel is improved.
Accordingly, an embodiment of the present invention further provides a liquid crystal display substrate formed by the above method, with reference to fig. 13, including: the display panel comprises a first substrate 200, wherein the first substrate 200 comprises a display area A and a non-display area B, the display area A comprises a plurality of transparent areas I and a plurality of shading areas II, and the shading areas II are positioned between adjacent transparent areas I; and the light shielding layer 270 is located on the light shielding region I, and the light shielding layer 270 has a second optical density which is greater than a first optical density, where the first optical density is an optical density of the light shielding layer 270 before patterning.
Correspondingly, the embodiment of the invention also provides a method for forming the liquid crystal display panel, which comprises the following steps: providing the liquid crystal display substrate; providing a second substrate; attaching the second substrate to the liquid crystal display substrate to form a cavity; and filling liquid crystal in the cavity.
Correspondingly, the embodiment of the invention also provides the liquid crystal display panel formed by adopting the method.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (18)
1. A method for forming a liquid crystal display substrate, comprising:
providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of transparent areas and a plurality of light shielding areas, and the light shielding areas are positioned between adjacent light transmitting areas;
forming a light-shielding material film on the display area and the non-display area, the light-shielding material film having a first optical density;
and carrying out graphical processing on the shading material film, and forming a shading layer on the shading area, wherein the shading layer has a second optical density, and the second optical density is greater than the first optical density.
2. The method of claim 1, wherein the first optical density is in a range of (0, 1.5).
3. The method of forming a liquid crystal display substrate according to claim 1, wherein the second optical density is in a range of (3.5, ∞).
4. The method of forming a liquid crystal display substrate according to claim 1, wherein a material of the light-shielding material film comprises: a photochromic material.
5. The method of forming a liquid crystal display substrate according to claim 4, wherein the photochromic material comprises: one or a combination of more of spiropyran derivatives, diarylethene derivatives and fulgide derivatives.
6. The method of forming a liquid crystal display substrate according to claim 1, wherein the patterning process includes: an exposure process and a development process.
7. The method of claim 6, wherein the exposure process is performed with a light wavelength ranging from 200 nm to 400 nm.
8. The method of forming a liquid crystal display substrate according to claim 1, further comprising: before forming the light-shielding material film, a mark structure is formed on the non-display region.
9. The method of forming a liquid crystal display substrate according to claim 1, further comprising: before the light shading material film is formed, a light filtering structure is formed on the light transmitting areas, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
10. The method of forming a liquid crystal display substrate according to claim 9, further comprising: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
11. The method of forming a liquid crystal display substrate according to claim 9, further comprising: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
12. The method of forming a liquid crystal display substrate according to claim 1, further comprising: after the light shading layer is formed, a light filtering structure is formed on the light transmitting area, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.
13. The method of forming a liquid crystal display substrate according to claim 12, further comprising: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
14. The method of forming a liquid crystal display substrate according to claim 12, further comprising: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.
15. The method of forming a liquid crystal display substrate according to any one of claims 10, 11, 13, and 14, further comprising: and before the second pixel electrode layer is formed, a flat protective layer is formed on the display area, and the flat protective layer is positioned at the bottom of the second pixel electrode layer.
16. A liquid crystal display substrate formed by the method of any of claims 1 to 15, comprising:
the display device comprises a first substrate, a second substrate and a third substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of transparent areas and a plurality of shading areas, and the shading areas are positioned between adjacent light-transmitting areas;
and the light shielding layer is positioned on the light shielding area and has a second optical density, the second optical density is greater than the first optical density, and the first optical density is the optical density of the light shielding layer before the light shielding layer is subjected to graphical processing.
17. A method for forming a liquid crystal display panel, comprising:
providing a liquid crystal display substrate according to claim 16;
providing a second substrate;
attaching the second substrate to the liquid crystal display substrate to form a cavity;
and filling liquid crystal in the cavity.
18. A liquid crystal display panel formed by the forming method of claim 17.
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| CN105448825A (en) * | 2016-01-07 | 2016-03-30 | 京东方科技集团股份有限公司 | Preparation method of display substrate, display substrate and display device |
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| US5695690A (en) * | 1996-09-09 | 1997-12-09 | Motorola, Inc. | Color filter for a liquid crystal display |
| CN103926809A (en) * | 2014-03-24 | 2014-07-16 | 京东方科技集团股份有限公司 | Preparation method of substrate |
| CN104267846A (en) * | 2014-08-06 | 2015-01-07 | 友达光电股份有限公司 | Display structure |
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