CN112959298B - Large-stroke five-degree-of-freedom nanometer manipulator - Google Patents

Large-stroke five-degree-of-freedom nanometer manipulator Download PDF

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CN112959298B
CN112959298B CN202110149639.6A CN202110149639A CN112959298B CN 112959298 B CN112959298 B CN 112959298B CN 202110149639 A CN202110149639 A CN 202110149639A CN 112959298 B CN112959298 B CN 112959298B
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amplification
freedom
degree
rigid
rod
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CN112959298A (en
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吴高华
杨依领
宋帅官
李存尧
吴豫席
王帅
张申廷
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Ningbo University
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Ningbo University
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/0009Constructional details, e.g. manipulator supports, bases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/02Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
    • B25J9/04Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/10Programme-controlled manipulators characterised by positioning means for manipulator elements
    • B25J9/12Programme-controlled manipulators characterised by positioning means for manipulator elements electric

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  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Manipulator (AREA)

Abstract

A large-stroke five-degree-of-freedom nanometer manipulator comprises a three-degree-of-freedom compliant amplification micro-motion platform, a base, a two-degree-of-freedom compliant amplification micro-motion platform, a gasket, a support and a compliant amplification micro-gripper; the three-degree-of-freedom compliant amplification micro-motion platform is arranged on the base, the two-degree-of-freedom compliant amplification micro-motion platform is connected with the output end of the three-degree-of-freedom compliant amplification micro-motion platform, and the compliant amplification micro-gripper is connected with the output end of the two-degree-of-freedom compliant amplification micro-motion platform through a support; the three-degree-of-freedom compliant amplification micro-motion platform has the freedom degrees of outputting horizontal translation, longitudinal translation and rotation around a vertical line, the two-degree-of-freedom compliant amplification micro-motion platform has the freedom degrees of outputting rotation around a horizontal line and vertical translation, and the compliant amplification micro-clamp can realize large-stroke translational clamping. The invention has compact structure, can realize large stroke and low coupling displacement output, and can realize multiple driving modes.

Description

Large-stroke five-degree-of-freedom nanometer manipulator
Technical Field
The invention relates to a precision driver, in particular to a large-stroke five-degree-of-freedom nanometer manipulator.
Background
With the development of science and technology and the continuous refinement of research objects, the nanometer manipulator plays an increasingly important role in the precise micro-manipulation task and is widely applied to the precise micro-manipulation field, such as micro-part assembly, optical fiber butt joint, bio-pharmaceuticals, minimally invasive surgery, microscopic imaging, data storage and the like.
At present, the number of the two-degree-of-freedom and three-degree-of-freedom nanometer operators is large, the number of the nanometer operators larger than the three-degree-of-freedom is small, a displacement amplification mechanism is not provided, the working stroke is small, and the motion flexibility is poor. The efficiency and quality of the precision micro-operation task can not be ensured, even the work task can not be completed, and the operated object is damaged. In addition, in order to ensure stable translational motion and easy control of the nano-manipulator, the nano-manipulator needs to have low output coupling displacement. In order to improve the working quality and efficiency, the nano manipulator needs to have the characteristics of large stroke, high precision, low displacement coupling, compact structure and multiple degrees of freedom. The requirements of the nano manipulator on high precision, multiple degrees of freedom and low output coupling ratio performance are met, meanwhile, many technical problems still exist in how to effectively amplify output displacement, and further analysis and solution are needed, and the method is of great importance in order to guarantee the quality and efficiency of a precision micro-operation task and further improve the performance of the flexible nano manipulator.
Disclosure of Invention
The invention provides a large-stroke five-degree-of-freedom nanometer manipulator for overcoming the defects of the prior art. The nanometer manipulator has the advantage of large stroke, can complete a large-range precise micro-operation task, and has high operation precision.
A large-stroke five-degree-of-freedom nanometer manipulator comprises a three-degree-of-freedom compliant amplification micro-motion platform, a base, a two-degree-of-freedom compliant amplification micro-motion platform, a gasket, a support and a compliant amplification micro-gripper; the two-degree-of-freedom compliant amplification micro-motion platform is connected with the output end of the two-degree-of-freedom compliant amplification micro-motion platform and is separated by a gasket, and the compliant amplification micro-gripper is connected with the output end of the two-degree-of-freedom compliant amplification micro-motion platform through a support; the three-degree-of-freedom compliant amplification micro-motion platform has the freedom degrees of outputting horizontal translation, longitudinal translation and rotation around a vertical line, the two-degree-of-freedom compliant amplification micro-motion platform has the freedom degrees of outputting rotation around a horizontal line and vertical translation, and the compliant amplification micro-clamp can realize large-stroke translational clamping.
Furthermore, the three-degree-of-freedom compliant amplification micro-motion platform comprises a first fixed rack, a first working platform, a first four flexible parallelogram mechanisms, a first four piezoelectric stack drivers and eight double-rocker amplification mechanisms; the first fixed rack is installed on the base, a first working platform is arranged in the middle of the first fixed rack, four corners of the first working platform are respectively provided with a first flexible parallelogram mechanism, the four first flexible parallelogram mechanisms are arranged in an array mode, two double-rocker amplification mechanisms are arranged between every two adjacent first flexible parallelogram mechanisms in a mirror image mode, each double-rocker amplification mechanism is respectively connected with the first fixed rack and the first flexible parallelogram mechanism, a fixing groove capable of containing a first piezoelectric stack driver is formed between the first fixed rack and each double-rocker amplification mechanism, the input displacement of the first piezoelectric stack driver is amplified and stacked through the double-rocker amplification mechanisms, the first piezoelectric stack drivers are transmitted to the first working platform through the first flexible parallelogram mechanisms, and the four first piezoelectric stack drivers are installed in the four fixing grooves on the adjacent opposite sides to achieve three-degree-of freedom movement.
Further, the two-degree-of-freedom compliant amplification micro-motion platform comprises a second fixed rack, a second working platform, a second leaf-shaped flexible hinge, a bridge amplification mechanism, a compliant rotation mechanism and four second piezoelectric stack drivers; the middle part of the second fixed rack is provided with a second working platform, two sides of the second working platform are respectively connected with the second leaf-type flexible hinges through a bridge type amplifying mechanism, the other two sides of the second working platform are respectively connected with the second leaf-type flexible hinges through a rotating compliant mechanism, all the second leaf-type flexible hinges are connected with the second fixed rack, a second piezoelectric stacking driver is arranged between the bridge type amplifying mechanism and the second fixed rack, the bridge type amplifying mechanism amplifies and transmits the input displacement of the first piezoelectric stacking driver to the second working platform and drives the second working platform to translate up and down, the rotating compliant mechanism transmits the input displacement of the first piezoelectric stacking driver to the second working platform and drives the second working platform to twist, the second fixed rack is fixed on the first working platform through screws and gaskets, the lower part of the support is fixed on the second working platform, and the micro-gripper is fixed on the upper part of the support.
Further, the compliant amplifying micro-gripper comprises a fixed rack III and two micro-gripper arms arranged in a mirror image mode, wherein each micro-gripper arm comprises a piezoelectric stack driver III, a chuck, a guide rod, a flexible parallelogram mechanism II and a double-bridge type-lever amplifying mechanism; the fixed rack III is fixedly connected with the upper part of the support, the flexible parallelogram mechanism II and the double-bridge type lever amplification mechanism are arranged on the fixed rack III, the chuck is flexibly connected with the guide rod through the flexible parallelogram mechanism II, the guide rod is flexibly connected with the double-bridge type lever amplification mechanism, the piezoelectric stack driver III is arranged in the double-bridge type lever amplification mechanism, the input displacement of the piezoelectric stack driver III is amplified and transmitted to the flexible parallelogram mechanism II in the double-bridge type lever amplification mechanism, the translational clamping of the chuck is realized, and the fixed rack III is fixed on the upper part of the support.
Compared with the prior art, the invention has the beneficial effects that:
the five-freedom-degree nanometer manipulator constructed by the three-freedom-degree compliant amplification micro-motion platform, the two-freedom-degree compliant amplification micro-motion platform and the compliant amplification micro-gripper has the advantages of large stroke, capability of finishing a large-range precise micro-manipulation task, capability of realizing large stroke and low coupling displacement output, capability of realizing a multi-drive mode, five degrees of freedom, compact structure and long service life; assembling the three-degree-of-freedom compliant amplification micro-motion platform and the two-degree-of-freedom compliant amplification micro-motion platform to realize five-degree-of-freedom motion; the structure is compact, the output coupling displacement is low, the translational clamping can be realized, and the operation precision is improved. The invention has light weight and convenient operation, and is suitable for micro-operation robot systems and micro-electro-mechanical systems.
The three-degree-of-freedom compliant amplification micro-motion platform, the two-degree-of-freedom compliant amplification micro-motion platform and the compliant amplification micro-gripper are respectively formed by wire cutting and machining, and are integrated after assembly, so that the three-degree-of-freedom compliant amplification micro-motion platform has the advantages of small volume, no mechanical friction, high guide precision, easiness in ensuring of machining precision and no need of assembly.
The technical scheme of the invention is further explained by combining the drawings and the embodiment:
drawings
FIG. 1 is a schematic view of a large-stroke five-degree-of-freedom nano manipulator assembly;
FIG. 2 is a schematic view of the assembly of the three-degree-of-freedom compliant amplified micro-motion platform and the base;
FIG. 3 is a schematic view of a mechanical structure of a three-degree-of-freedom compliant amplification micro-motion platform;
FIG. 4 is a schematic view of a base;
FIG. 5 is a schematic view of the assembly of a two-degree-of-freedom compliant amplified micro-motion stage;
FIG. 6 is a schematic view of a gasket;
FIG. 7 is a schematic view of a two-degree-of-freedom compliant amplified micro-motion stage mechanical structure;
FIG. 8 is an enlarged view of a portion of FIG. 7 at A;
FIG. 9 is a schematic view of a stent structure;
FIG. 10 is a schematic perspective view of a compliant enlarged micro-gripper;
FIG. 11 is a schematic view of a compliant enlarged micro-gripper structure.
Detailed Description
As shown in fig. 1, the long-stroke five-degree-of-freedom nano manipulator of the present embodiment includes a three-degree-of-freedom compliant amplified micro-motion platform 1, a base 2, a two-degree-of-freedom compliant amplified micro-motion platform 3, a spacer 4, a support 5, and a compliant amplified micro-gripper 6; the three-degree-of-freedom compliant amplification micro-motion platform 1 is arranged on the base 2, the two-degree-of-freedom compliant amplification micro-motion platform 3 is connected with the output end of the three-degree-of-freedom compliant amplification micro-motion platform 1 and is separated by a gasket 4, and the compliant amplification micro-gripper 6 is connected with the output end of the two-degree-of-freedom compliant amplification micro-motion platform 3 through a support 5;
the three-degree-of-freedom compliant amplification micro-motion platform 1 has the degrees of freedom for outputting horizontal translation, longitudinal translation and rotation around a vertical line, the two-degree-of-freedom compliant amplification micro-motion platform 3 has the degrees of freedom for outputting rotation around a horizontal line and vertical translation, and the compliant amplification micro-gripper 6 can realize large-stroke translation gripping. The nanometer manipulator of the embodiment has compact structure, can realize large stroke and low coupling displacement output, and can realize multiple driving modes.
Further, as shown in fig. 2 to 4, the three-degree-of-freedom compliant amplification micro-motion platform 1 of the present embodiment has a completely symmetrical structure, and the three-degree-of-freedom compliant amplification micro-motion platform 1 includes a first fixed frame 11, a first working platform 16, four first flexible parallelogram mechanisms F, four first piezoelectric stack drivers D1, and eight double-rocker amplification mechanisms 10;
the fixed frame I11 is arranged on the base 2, the middle part of the fixed frame I11 is provided with a working platform I16, four corners of the working platform I16 are respectively provided with a flexible parallelogram mechanism I F, the four flexible parallelogram mechanisms I F are arranged in an array, two double-rocker amplification mechanisms 10 are arranged between every two adjacent flexible parallelogram mechanisms I F in a mirror image mode, each double-rocker amplification mechanism 10 is respectively connected with the fixed frame I11 and the flexible parallelogram mechanism I F, a fixed groove P1 capable of placing a piezoelectric stack driver I D1 is arranged between the fixed frame I11 and each double-rocker amplification mechanism 10, the double-rocker amplification mechanisms 10 amplify the input displacement of the piezoelectric stack driver I D1 and transmit the input displacement to the working platform I16 through the flexible parallelogram mechanism I F, the four piezoelectric stack drivers I D1 are arranged in four fixed grooves P1 on adjacent opposite sides, three degrees of freedom motion is realized.
In the above embodiment, the first fixing screw L1 fixes the first fixing frame 11 of the three-degree-of-freedom compliant amplified fine motion platform 1 on the base 2, the first fixing screw L1 penetrates through the small hole 21 and is fastened, and the second fixing screw G1 fixes the three-degree-of-freedom compliant amplified fine motion platform 1 and the base 2 on a work place. Set screw two G1 is tightened through large hole 22. As shown in fig. 4, the middle portion of the base 2 is hollow, and the hollow portion faces the moving portions of the three-degree-of-freedom compliant amplification micro-motion platform 1 (the working platform i 16, the four flexible parallelogram mechanisms i F, the four piezoelectric stack drivers i D1, and the eight double-rocker amplification mechanisms 10), and functions to prevent the base 2 from contacting the moving portions of the three-degree-of-freedom compliant amplification micro-motion platform 1, and avoid motion friction. The first piezoelectric stack driver D1 is pre-tightened by a pre-tightening screw V11 to realize fixation, and by utilizing a piezoelectric reverse effect, the first piezoelectric stack driver D1 converts electric energy into mechanical energy, can extend and do linear motion when voltage is applied, and the extension amount changes along with the change of the voltage.
The three-degree-of-freedom compliant amplification micro-motion platform 1 of the embodiment is provided with 8 double-rocker amplification mechanisms, so that the three-degree-of-freedom compliant amplification micro-motion platform has a larger motion stroke; the three-degree-of-freedom flexible amplification micro-motion platform 1 has a completely symmetrical structure, so that when the platform translates in the X-axis direction or the Y-axis direction, the structures on the two sides are completely the same, so that the two sides have the same decoupling rigidity, and when the platform translates, low coupling displacement is generated, so that the control precision and the operation quality are improved, and meanwhile, three-degree-of-freedom motion can be realized, and the working flexibility is improved; the three-degree-of-freedom compliant amplification micro-motion platform 1 is provided with mounting positions of 8 first piezoelectric stack drivers, and the four piezoelectric stacks are mounted at different mounting positions, so that different driving modes can be realized, different forms of motion freedom degrees can be realized, the operation is more flexible, and the three-degree-of-freedom compliant amplification micro-motion platform is suitable for various types of work tasks.
As an embodiment, as shown in fig. 3, each of the above-mentioned dual-rocker amplification mechanisms 10 includes a first input block 12, a first rigid rod 13, a second rigid rod 14, a third rigid rod 15, and a plurality of first right-circular flexible hinges C1; the first piezoelectric stack driver D1 is arranged between the fixed frame 11 and the first input block 12, the first input block 12 and the first rigid rod 13, the first rigid rod 13 and the third rigid rod 15, the second rigid rod 14 and the third rigid rod 15, the first rigid rod 13 and the first fixed frame 11, and the second rigid rod 14 and the fixed frame 11 are connected through a first right circular flexible hinge C1, and the third rigid rod 15 is connected with a first flexible parallelogram mechanism F. Generally, the first right circular flexible hinge C1 is a single-axis circular-section double-notch flexible hinge, two semicircular notches are arranged on two sides of the first right circular flexible hinge C1, the middle of the first right circular flexible hinge C1 is extremely thin, transmission motion is carried out through rotation elastic deformation, the double-rocker amplification mechanism 10 amplifies input displacement of the piezoelectric stack driver one D1, and then the input displacement is transmitted to the working platform 16 through the flexible parallelogram mechanism one F.
Preferably, as shown in fig. 3, each of said flexible parallelogram mechanisms F is constituted by two pairs of mutually parallel first leaf-shaped flexible hinges F1. The blade-shaped flexible hinge is used for transmitting motion, increasing rigidity and decoupling motion in different directions. The first leaf-shaped flexible hinge I F11 to the first leaf-shaped flexible hinge IV 14 with the same structure are thin metal sheets, the rigidity along the leaf-shaped flexible hinge direction is large, the rigidity in the vertical direction is small, the movement is transmitted through elastic deformation, and the movement precision is greatly improved by introducing different flexible hinges.
As shown in fig. 2 and 3, the three-degree-of-freedom compliant amplification micro-motion platform 1 is directly formed by wire cutting processing, assembly is not needed, and assembly errors are avoided. Since the mechanical structure of the three-degree-of-freedom compliant amplification micro-motion platform 1 is fully symmetrical, the cutting gap only needs to be introduced to about 1/4 parts of the whole structure.
The area enclosed by the first fixed rack 11, the first input block 12, the first rigid rod 13, the second rigid rod 14, the third rigid rod 15 and the first straight circular flexible hinge C11, the second straight circular flexible hinge C12, the third straight circular flexible hinge C13, the fourth straight circular flexible hinge C14 and the fifth straight circular flexible hinge C15 for connecting the first and second rigid rods is a first cutting gap.
The area enclosed by the first fixed frame 11, the second rigid rod 14, the third rigid rod 15, the second first leaf-shaped flexible hinge F12 and the fourth first straight-circular flexible hinge C14 and the fifth first straight-circular flexible hinge C15 connecting the first fixed frame and the second rigid rod is a second cutting gap.
And the area enclosed by the fixed frame I11, the two rigid rods I13, the two rigid rods III 15, the plurality of first right circular flexible hinges C1 connecting the fixed frame I, the two rigid rods I13, the two rigid rods III, the working platform I16 and the two first leaf-shaped flexible hinges F11 is a third cutting gap.
The area enclosed by the first flexible hinge leaf i 11 to the first flexible hinge leaf i F14 is a fourth cutting slit.
The area in the middle of the first working platform 16 is a fifth cutting gap. The three-degree-of-freedom compliant amplification micro-motion platform 1 is completely symmetrical in mechanical structure, and other cutting gaps are the same as the five cutting gaps.
For convenience of description, the horizontal rightward direction is defined as an X-axis direction, the direction perpendicular to the X-axis is defined as a Y-axis direction, the coplanar plane perpendicular to the X and Y is defined as a Z-axis direction, and the arrow indicates the positive direction in fig. 1-3 and 1. The coordinates shown in fig. 5, 7 and 11 are all adapted view placements.
The working mechanism of the three-degree-of-freedom compliant amplified micro-motion platform 1 is described below, and since the three-degree-of-freedom compliant amplified micro-motion platform 1 is a fully symmetric structure, only one eighth of the motion part needs to be analyzed during motion analysis. As shown in fig. 2 and 3, for convenience of description, the four piezoelectric stack drivers-D1 are respectively denoted as a first piezoelectric stack driver-D11, a second piezoelectric stack driver-D12, a third piezoelectric stack driver-D13, and a fourth piezoelectric stack driver-D14;
the voltage amplified by the power amplifier is applied to the first piezoelectric stack driver D11, the first piezoelectric stack driver D11 extends to push the first input block 12 to move, the first straight circular flexible hinge I C11 acts on the first rigid rod 13, the first rigid rod 13 rotates clockwise around the second straight circular flexible hinge I C12 to complete first amplification of input displacement, and then the first rigid rod 13 drives the second rigid rod 14 and the third rigid rod 15 to rotate through the third straight circular flexible hinge III C13 to complete second amplification of displacement. According to the instant center principle, the double-rocker amplification mechanism can perform linear displacement output towards the Y axis in the positive direction along the first leaf-shaped flexible hinge F11, acts on the first working platform 16 through the first leaf-shaped flexible hinge F11, and pulls the first working platform 16 to move towards the Y axis in the positive direction. Meanwhile, the second first-leaf flexible hinge F12 and the fourth first-leaf flexible hinge F14 elastically deform and rotate, and the first-leaf flexible hinge F11 has extremely high rigidity in the moving direction, so that the first-leaf flexible hinge performs translation. When the voltage of the piezoelectric stack driver is removed, each motion mechanism is restored to the original state under the action of the elastic force of the flexible hinge.
Preferably, as shown in fig. 2 and 3, the arrangement of the first piezoelectric stack drivers D1 in the four fixing grooves is as follows: in an equivalent quadrilateral of the eight fixing grooves P1, four fixing grooves P1 on any adjacent sides are respectively provided with a piezoelectric stack driver D1; or, two fixing grooves P1 on any one side are used for placing a first piezoelectric stack driver D1, and the other two opposite sides are used for placing a first piezoelectric stack driver D1 in each fixing groove P1, and the two opposite sides of the first piezoelectric stack driver D1 are arranged diagonally; alternatively, one piezoelectric stack driver D1 is placed in one of the fixing grooves P1 on each side, and the four piezoelectric stack drivers D1 placed therein are alternately arranged with the remaining four fixing grooves P1 left unused.
For the sake of convenience of description, the three-degree-of-freedom micro-motion platform 1 has eight identical fixing grooves P1, and the fixing groove P1 is also denoted by a first fixing groove P11, a second fixing groove P12, a third fixing groove P13, a fourth fixing groove P14, a fifth fixing groove P15, a sixth fixing groove P16, a seventh fixing groove P17 and an eighth fixing groove P18, respectively. The four first piezoelectric stack drivers D1 are installed at different installation positions to form different driving modes, so that different driving modes are realized.
When the first piezoelectric stack driver one D11, the second piezoelectric stack driver one D12, the third piezoelectric stack driver one D13 and the fourth piezoelectric stack driver one D14 are respectively installed in the first fixing groove P11, the second fixing groove P12, the third fixing groove P13 and the fourth fixing groove P14. When the first piezoelectric stack driver D11 and the second piezoelectric stack driver D12 apply the same voltage to work at the same time, the first working platform 16 of the three-degree-of-freedom compliant amplification micro-motion platform 1 realizes positive translation of the Y axis; when the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 apply the same voltage to work at the same time, the first working platform 16 realizes X-axis positive translation; when the first piezoelectric stack driver D11 and the third piezoelectric stack driver D13 apply the same voltage to work at the same time, the three-degree-of-freedom micro-motion platform 1 rotates anticlockwise around the three O3 at the upper right vertex of the working platform 16; when the same voltage is applied to the second piezoelectric stack driver D12 and the fourth piezoelectric stack driver D14 simultaneously, the three-degree-of-freedom micro-motion platform 1 rotates clockwise around the lower left vertex O1 of the working platform 16.
When the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 are respectively installed in the fifth fixing groove P15, the sixth fixing groove P16, the seventh fixing groove P17 and the eighth fixing groove P18, three degrees of freedom motions in opposite directions can be realized as compared with the case where the first piezoelectric stack driver D11, the second piezoelectric stack driver D12 and the fourth piezoelectric stack driver D14 are installed in the positions P11, P12, P13 and P14. In summary, four piezoelectric stack drivers D11 are mounted at four positions (the first fixing groove P11, the second fixing groove P12, the third fixing groove P13, and the fourth fixing groove P14), (the third fixing groove P13, the fourth fixing groove P14, the fifth fixing groove P15, and the sixth fixing groove P16), (the fifth fixing groove P15, the sixth fixing groove P16, the seventh fixing groove P17, and the eighth fixing groove P18), and (the seventh fixing groove P17, the eighth fixing groove P18, the first fixing groove P11, and the second fixing groove P12) adjacent to opposite sides, and can implement three-degree-of-freedom motions in different directions.
When the first piezoelectric stack driver one D11, the second piezoelectric stack driver one D12, the third piezoelectric stack driver one D13 and the fourth piezoelectric stack driver one D14 are mounted in the first fixing groove P11 and the second fixing groove P12, the third fixing groove P13 and the seventh fixing groove P17, respectively. When the first piezoelectric stack driver D11 and the second piezoelectric stack driver D12 apply the same voltage to work at the same time, the three-degree-of-freedom micro-motion platform 1 realizes positive translation of the Y axis; when the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 apply the same voltage to work at the same time, the three-degree-of-freedom micro-motion platform 1 rotates counterclockwise around the center of the working platform 16.
When the first piezoelectric stack driver one D11, the second piezoelectric stack driver one D12, the third piezoelectric stack driver one D13 and the fourth piezoelectric stack driver one D14 are mounted at the first fixing groove P11, the second fixing groove P12, the fourth fixing groove P14 and the eighth fixing groove P18, respectively. When the first piezoelectric stack driver D11 and the second piezoelectric stack driver D12 apply the same voltage to work at the same time, the three-degree-of-freedom micro-motion platform 1 realizes positive translation of the Y axis; when the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 apply the same voltage to work at the same time, the three-degree-of-freedom micro-motion platform 1 rotates clockwise around the center of the working platform 16.
In addition, when the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 are respectively installed at the fifth fixing groove P15, the sixth fixing groove P16, the third fixing groove P13 and the seventh fixing groove P17, the positive translation of the Y-axis and the counterclockwise rotation around the center of the working platform 16 are realized. When the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 are respectively installed at the fifth fixing groove P15, the sixth fixing groove P16, the fourth fixing groove P14 and the eighth fixing groove P18, the positive translation of the Y-axis and the clockwise rotation around the center of the working platform 16 are realized.
Similarly, when the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 are respectively installed at different positions of the fixing grooves (the third fixing groove P13, the fourth fixing groove P14, the fifth fixing groove P15 and the first fixing groove P11), (the third fixing groove P13, the fourth fixing groove P14, the sixth fixing groove P16 and the second fixing groove P12), (the sixth fixing groove P16, the eighth fixing groove P18, the first fixing groove P11 and the fifth fixing groove P15) and (the seventh fixing groove P17, the eighth fixing groove P18, the second fixing groove P12 and the sixth fixing groove P16), the first piezoelectric stack drivers of different groups are controlled to be powered on, so that the X-axis positive or negative translation and the work are realized to rotate around the center of the platform 16 or clockwise.
When the first piezoelectric stack driver one D11, the second piezoelectric stack driver one D12, the third piezoelectric stack driver one D13 and the fourth piezoelectric stack driver one D14 are respectively mounted on the first fixing groove P11, the third fixing groove P13, the fifth fixing groove P15 and the seventh fixing groove P17. When the same voltage is applied to the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 simultaneously to work, the three-degree-of-freedom compliant amplification micro-motion platform 1 rotates counterclockwise around the center of the working platform 16. When the first piezoelectric stack driver one D11, the second piezoelectric stack driver one D12, the third piezoelectric stack driver one D13 and the fourth piezoelectric stack driver one D14 are mounted at the second fixing groove P12, the fourth fixing groove P14, the sixth fixing groove P16 and the eighth fixing groove P18, respectively. When the same voltage is applied to the first piezoelectric stack driver D11, the second piezoelectric stack driver D12, the third piezoelectric stack driver D13 and the fourth piezoelectric stack driver D14 simultaneously to work, the three-degree-of-freedom compliant amplification micro-motion platform 1 rotates clockwise around the center of the working platform 16.
Therefore, the three-degree-of-freedom compliant amplification micro-motion platform 1 has multiple driving modes, realizes multiple motion forms and is more flexible. In addition, as shown in fig. 2 and fig. 3, the directions of the first straight circular flexible hinge four C14, the first straight circular flexible hinge five C15 and the like are arranged in consideration of the motion stress direction of the three-degree-of-freedom compliant amplification micro-motion platform 1, and compared with the traditional flexible hinge which is only vertically or horizontally arranged, the motion performance can be improved, such as the working stroke and the natural frequency are improved, the maximum working stress is reduced, and the service life is prolonged.
Further, as shown in fig. 5 to 9, the two-degree-of-freedom compliant amplification micro-motion platform 3 includes a second fixed frame 31, a second working platform 36, a second leaf-shaped flexible hinge F3, a second bridge amplification mechanism E, a second rotation compliant mechanism H, and four second piezoelectric stack drivers D3; the middle part of the second fixed rack 31 is provided with a second working platform 36, two sides of the second working platform 36 are respectively connected with a second leaf-type flexible hinge F3 through a bridge type amplification mechanism E, the other two sides of the second working platform 36 are respectively connected with a second leaf-type flexible hinge F3 through a rotation compliant mechanism H, all second leaf-type flexible hinges F3 are connected with the second fixed rack 31, a second piezoelectric stack driver D3 is arranged between the bridge type amplification mechanism E and the second fixed rack 31 respectively, the bridge type amplification mechanism E amplifies and transmits the input displacement of the first piezoelectric stack driver D1 to the second working platform 36 and drives the second working platform 36 to move up and down, the rotation compliant mechanism H transmits the input displacement of the first piezoelectric stack driver D1 to the second working platform 36 and drives the second working platform 36 to twist, the second fixed rack 31 is fixed on the first working platform 16 through a screw and a gasket 4, the lower part of the bracket 5 is fixed on the second working platform 36, and the flexible amplifying micro-gripper 6 is fixed on the upper part of the bracket 5. In the above embodiment, the four second piezoelectric stack drivers D3 are respectively installed at the U-shaped opening positions on the second fixed frame 31, and are respectively pre-tightened by the second pre-tightening screws V31.
The two-degree-of-freedom compliant amplification micro-motion platform 2 of the embodiment is provided with a bridge amplification mechanism, so that the displacement amplification of the translation in the Z-axis direction is realized, and the platform has a large stroke characteristic; the rigidity of two sides of the same axis of the working platform is the same, so that the working platform has the advantage of lower displacement coupling ratio; the two-degree-of-freedom compliant amplification micro-motion platform 2 has two degrees of freedom of Z-direction translation and rotation around an X-axis. The two degrees of freedom are not the same as the degree of freedom of the three-degree-of-freedom micro-motion platform, and the two degrees of freedom are assembled to realize five-degree-of-freedom motion.
In particular, as shown in fig. 7 and 8, each of said bridge amplification mechanisms E comprises an input block two 37, a rigid rod four 38 and a second right-circular flexible hinge C35, and each of said rotation compliance mechanisms H comprises an input block three 32, a rigid rod five 33 and a third right-circular flexible hinge C34; the second input block 37 is connected with the second fixed rack 31 through two second leaf-type flexible hinges F3, the second input block 37 is connected with the fourth rigid rod 38 through a second right-circular flexible hinge C35, the fourth rigid rod 38 is connected with the second working platform 36 through a second right-circular flexible hinge C35, and the two second right-circular flexible hinges C35 are arranged in a vertically staggered mode; the third input block 32 is connected with the second fixed rack 31 through a second blade-shaped flexible hinge F3, the third input block 32 is connected with a fifth rigid rod 33 through a third right-circular flexible hinge C34, the fifth rigid rod 33 is connected with a second working platform 36 through a third right-circular flexible hinge C34, two third right-circular flexible hinges C34 in one rotating compliant mechanism H and two third right-circular flexible hinges C34 in the other rotating compliant mechanism H are arranged in a vertically staggered mode, and the two third right-circular flexible hinges C34 in the same rotating compliant mechanism H are arranged in a flush mode. Preferably, the third right-circular flexible hinge C34 is a single-axis circular cross-section single-slit flexible hinge, and the second right-circular flexible hinge C35 is a single-axis circular cross-section double-slit flexible hinge.
As shown in fig. 7 and 8, the mechanical structure of the two-degree-of-freedom compliant amplified micro-motion platform 3 is also directly processed by wire cutting, assembly is not required, and assembly errors are avoided, and the cutting gap is not introduced much here.
The following description will be made on the working mechanism of the two-degree-of-freedom compliant amplification micro-motion platform 3, and as shown in fig. 7 and fig. 8, for convenience of description, the four piezoelectric stack drivers two D3 are respectively represented as a first piezoelectric stack driver two D31, a second piezoelectric stack driver two D32, a third piezoelectric stack driver two D33, and a fourth piezoelectric stack driver two D34; the first U-shaped port P31, the second U-shaped port P32, the third U-shaped port P33 and the fourth U-shaped port P34 are respectively arranged on the corresponding first U-shaped port P31, the second U-shaped port P32, the third U-shaped port P33 and the fourth U-shaped port P34 and are respectively pre-tightened through a second pre-tightening screw V31.
When the same voltage is applied to the second piezoelectric stack driver D32 and the second piezoelectric stack driver D34 simultaneously, the second input block 37 is pushed to translate, the fourth rigid rod 38 rotates upwards around the second right-circular flexible hinge C35 at the lower part, the second working platform 36 is pushed to translate forwards along the Z axis through the second right-circular flexible hinge C35 at the upper part, and meanwhile, the input displacement is amplified through the bridge type amplification mechanism. When the same voltage is applied to the first piezoelectric stack driver two D31 and the third piezoelectric stack driver two D33 to work simultaneously, the input block three 32 and the rigid rod five 33 are pushed to translate, and the third right-circular flexible hinge C34 (arranged at the bottom of the rigid rod five 33) at the lower part and the third right-circular flexible hinge C34 (arranged at the top of the rigid rod five 33) at the upper part act on the upper part and the lower part of the two opposite sides of the working platform two 36 to form torque, so that the working platform two 36 is driven to rotate around the X axis. When the voltage of the second piezoelectric stack driver is removed, the motion mechanisms are restored to the original state under the action of the elastic force of the flexible hinges.
As shown in fig. 1, 5 and 6, the spacer 4 is circular and is located between the second fixed frame 31 of the two-degree-of-freedom compliant amplified micro-motion platform 3 and the first working platform 16 of the three-degree-of-freedom compliant amplified micro-motion platform 1 to prevent the two-degree-of-freedom compliant amplified micro-motion platform 3 and the three-degree-of-freedom compliant amplified micro-motion platform 1 from generating contact friction during motion.
As shown in fig. 1, 5 and 9, the bracket 5 has two kinds of bosses integrally formed, a cylindrical boss 51, a large rectangular boss 52 and a small rectangular boss 53. The cylindrical boss 51 is connected with the second working platform 36 of the two-degree-of-freedom compliant amplification micro-motion platform 3, the large cuboid boss 52 and the small cuboid boss 53 are both connected with the compliant amplification micro-clamp 6, and the support 5 is used for preventing the two-degree-of-freedom compliant amplification micro-motion platform 3 and the compliant amplification micro-clamp 6 from generating contact friction during motion.
Further, as shown in fig. 10 and 11, the compliant magnifying micro-gripper 6 comprises a fixed frame three 60 and two micro-gripper arms arranged in a mirror image, each micro-gripper arm comprising a piezoelectric stack driver three D6, a collet 621, a guide bar 616, a flexible parallelogram mechanism two 61 and a double bridge lever magnifying mechanism K; the fixed rack III 60 is fixedly connected with the upper portion of the support 5, the flexible parallelogram mechanism II 61 and the double-bridge type lever amplification mechanism K are arranged on the fixed rack III 60, the chuck 621 is flexibly connected with the guide rod 616 through the flexible parallelogram mechanism II 61, the guide rod 616 is flexibly connected with the double-bridge type lever amplification mechanism K, the piezoelectric stack driver III D6 is arranged in the double-bridge type lever amplification mechanism K, the input displacement of the piezoelectric stack driver III D6 in the double-bridge type lever amplification mechanism K is amplified and transmitted to the flexible parallelogram mechanism II 61, the translational clamping of the chuck 621 is achieved, and the fixed rack III 60 is fixed on the upper portion of the support 5. The two piezoelectric stack drivers three D6 are mounted on the fixed frame three 60 by two pre-tightening screws three V61. Specifically, the fixed frame three 60 is fixed to the large rectangular parallelepiped boss 52 and the small rectangular parallelepiped boss 53 by bolts L6.
In the embodiment, the flexible amplification micro-gripper 6 is provided with a double-bridge type-lever amplification mechanism and a flexible parallelogram mechanism II 61 (equivalent to a second lever amplification mechanism) at the same time, so that four-stage amplification of input displacement is realized, and the gripping range is greatly increased. The micro-clamping arm adopts a second flexible parallelogram mechanism 61, so that translational clamping is realized, clamping is more stable, and an operation object is not easy to damage. The micro-gripper is symmetrical about an X axis, and the two micro-gripper arms can be independently controlled by the two piezoelectric stack drivers, so that the gripping is more flexible and stable.
Preferably, as shown in fig. 11, each of the double-bridge type lever amplification mechanisms K includes a first bridge type amplification mechanism, a second bridge type amplification mechanism, and a first lever amplification mechanism; the first bridge type amplification mechanism and the first lever amplification mechanism are arranged in the second bridge type amplification mechanism, and two adjacent sides of the first bridge type amplification mechanism are provided with two first lever amplification mechanisms; the first bridge type amplification mechanism and the first lever amplification mechanism are arranged inside the second bridge type amplification mechanism, so that the displacement amplification factor is greatly increased, the space is greatly saved, the structure is more compact, and the overall size of the micro-holder is reduced.
The fixed rack III 60, the rigid connecting rod 65 and the two first rigid amplifying rod groups form a first bridge type amplifying mechanism, the fixed rack III 60 is connected with the two first rigid amplifying rod groups through a fourth straight-circular flexible hinge C6, rods in the first rigid amplifying rod groups are connected through a fourth straight-circular flexible hinge C6, the two opposite first rigid amplifying rod groups are connected with the rigid connecting rod 65 through a fourth straight-circular flexible hinge C6, and a piezoelectric stack driver III D6 is arranged between the rigid connecting rod 65 and the fixed rack III 60; a third fixed rack 60, a sixth rigid rod 611 and a seventh rigid rod 612 form a first lever amplification mechanism, and fourth right-circular flexible hinges C6 are respectively connected between the third fixed rack 60 and the seventh rigid rod 612 and between the sixth rigid rod 611 and the seventh rigid rod 612 and the first rigid amplification rod group; the fixed rack three 60, the second rigid amplification rod group and the two rigid rods seven 612 form a second bridge amplification mechanism, the fixed rack three 60 is respectively connected with the two rigid rods seven 612 through a fourth straight-round flexible hinge C6, the two rigid rods seven 612 are respectively connected with the second rigid amplification rod group through a fourth straight-round flexible hinge C6, and the second rigid amplification rod group is connected with the guide rod 616.
The two first rigid amplifying rod groups comprise a first connecting rod 62, a second connecting rod 63, a third connecting rod 64, a fourth connecting rod 66, a fifth connecting rod 67, a sixth connecting rod 68 and a fourth straight-circular flexible hinge C6 for connecting the first connecting rod 62 and the sixth connecting rod 68, the first connecting rod 62 and the sixth connecting rod 68 are connected with a third fixed rack 60 through a fourth straight-circular flexible hinge C6, and the third connecting rod 64 and the fourth connecting rod 66 are respectively connected with a rigid connecting rod 65 through a fourth straight-circular flexible hinge C6. The second rigid amplifying rod group consists of a first connecting rod 613, a second connecting rod 615, a third connecting rod 614 and a fourth right-circular flexible hinge C6 for connecting the first connecting rod 613, the second connecting rod 615 and the third connecting rod 614, wherein the first connecting rod 613 and the third connecting rod 614 are respectively connected with a seventh rigid rod 612 through a fourth right-circular flexible hinge C6, and the second connecting rod 615 is connected with the guide rod 616 through a fourth right-circular flexible hinge C6.
Second flexible parallelogram mechanism 61, specifically, as shown in fig. 11, a second flexible parallelogram mechanism 61 is formed by a third fixed frame 60, a eighth rigid rod 618, a ninth rigid rod 619 and a third flat rod 620, the eighth rigid rod 618 is connected with the guide rod 616 through a fourth right-circular flexible hinge C6, the flat rod 620 and the third fixed frame 60 are connected with the eighth rigid rod 618 and the ninth rigid rod 619 arranged in parallel through a fourth right-circular flexible hinge C6, and the flat rod 620 is connected with the clamping head 621. Wherein, the rigid rod eight 618 of the L-shape and the fixed frame three 60 are connected by a fourth straight round flexible hinge C6 to form a lever amplification mechanism, which is called as a second lever amplification mechanism. The clamping head 621 is connected with the translation rod 620, and translation clamping is realized under the action of the second flexible parallelogram mechanism 61.
The mechanical structure of the compliant magnifying micro-gripper 6 is also machined directly by wire cutting, eliminating the need for assembly and avoiding assembly errors, as shown in FIG. 10, which is a little described in the context of cutting slits.
As shown in fig. 10 and 11, the compliant magnifying micro-gripper 6 is symmetrical about the X-axis, and only the left half may be analyzed for motion analysis. For ease of description, the two piezoelectric stack drivers three D6 are denoted as first piezoelectric stack driver three D61 and second piezoelectric stack driver three D62.
When voltage is applied to the first piezoelectric stack driver three D61 to work, the rigid connecting rod 65 is pushed to translate along the X axis in the negative direction, the rotating point of the fourth right-circular flexible hinge C6 in the first bridge type amplification mechanism is connected to form a bow line, and under the action of pulling force of the rigid connecting rod 65, the connecting rod two 63 and the connecting rod five 67 move towards the direction close to the first piezoelectric stack driver three D61, so that the first displacement amplification is completed. The two rigid rods seven 612 are then pulled to rotate by the two rigid rods six 611 and the fourth right circular flexible hinge C6, at which time a second displacement amplification is completed. The rigid rod seven 612 pushes the rigid connecting rod 615 to translate and output along the X direction through rotation, and then the third displacement amplification is completed, and the double-bridge type-lever amplification mechanism completes the third displacement amplification. The rigid connecting rod 615 pushes the L-shaped rigid rod eight 618 to rotate through the guiding rod 616 and the fourth right-circular flexible hinge C6, and at this time, the fourth displacement amplification is completed, that is, the displacement amplification is completed by the second lever amplification mechanism. Finally, the two chucks 621 perform translational clamping through the second flexible parallelogram mechanism 61. The two micro-clamping arms can be independently controlled by two piezoelectric stack drivers three D6, and clamping is more flexible and stable. When the voltage of the third piezoelectric stack driver is removed, all the motion mechanisms are restored to the original state under the action of the elastic force of the flexible hinges.
The present invention is not limited to the above embodiments, and those skilled in the art can make various changes and modifications without departing from the scope of the invention.

Claims (8)

1. A large-stroke five-degree-of-freedom nanometer manipulator is characterized in that: the device comprises a three-degree-of-freedom compliant amplification micro-motion platform (1), a base (2), a two-degree-of-freedom compliant amplification micro-motion platform (3), a gasket (4), a support (5) and a compliant amplification micro-clamp holder (6); the three-degree-of-freedom compliant amplification micro-motion platform (1) is arranged on the base (2), the two-degree-of-freedom compliant amplification micro-motion platform (3) is connected with the output end of the three-degree-of-freedom compliant amplification micro-motion platform (1) and is separated by a gasket (4), and the compliant amplification micro-gripper (6) is connected with the output end of the two-degree-of-freedom compliant amplification micro-motion platform (3) through a support (5); the three-degree-of-freedom compliant amplification micro-motion platform (1) has the degrees of freedom for outputting horizontal translation, longitudinal translation and rotation around a vertical line, the two-degree-of-freedom compliant amplification micro-motion platform (3) has the degrees of freedom for outputting rotation around a horizontal line and vertical translation, and the compliant amplification micro-gripper (6) can realize large-stroke translational clamping;
the three-degree-of-freedom compliant amplification micro-motion platform (1) comprises a first fixed rack (11), a first working platform (16), four first flexible parallelogram mechanisms (F), four first piezoelectric stack drivers (D1) and eight double-rocker amplification mechanisms (10); the fixed rack I (11) is installed on the base (2), the middle of the fixed rack I (11) is provided with a working platform I (16), four corners of the working platform I (16) are respectively provided with a flexible parallelogram mechanism I (F), the four flexible parallelogram mechanisms I (F) are arranged in an array mode, two double-rocker amplification mechanisms (10) are arranged between every two adjacent flexible parallelogram mechanisms I (F) in a mirror image mode, each double-rocker amplification mechanism (10) is respectively connected with the fixed rack I (11) and the flexible parallelogram mechanism I (F), a fixing groove (P1) capable of containing a piezoelectric stacking driver I (D1) is arranged between the fixed rack I (11) and each double-rocker amplification mechanism (10), the double-rocker amplification mechanisms (10) amplify input displacement of the piezoelectric stacking driver I (D1) and transmit the input displacement to the working platform I (16) through the flexible parallelogram mechanisms I (F), the four piezoelectric stack drivers I (D1) are arranged in four fixing grooves (P1) on adjacent opposite sides, so that three-degree-of-freedom motion is realized;
the two-degree-of-freedom compliant amplification micro-motion platform (3) comprises a second fixed rack (31), a second working platform (36), a second leaf-type flexible hinge (F3), a bridge type amplification mechanism (E), a rotation compliant mechanism (H) and four second piezoelectric stack drivers (D3); a second working platform (36) is arranged in the middle of the second fixed rack (31), two sides of the second working platform (36) are respectively connected with a second leaf-type flexible hinge (F3) through a bridge type amplification mechanism (E), the other two sides of the second working platform (36) are respectively connected with a second leaf-type flexible hinge (F3) through a flexible rotation mechanism (H), all second leaf-type flexible hinges (F3) are connected with the second fixed rack (31), a second piezoelectric stack driver (D3) is arranged between the bridge type amplification mechanism (E) and the second fixed rack (31) and between the bridge type amplification mechanism (E) and the second rotation mechanism (H) respectively, the bridge type amplification mechanism (E) amplifies and transmits the input displacement of the first piezoelectric stack driver (D1) to the second working platform (36) and drives the second working platform (36) to move up and down, the flexible rotation mechanism (H) transmits the input displacement of the first piezoelectric stack driver (D1) to the second working platform (36) and drives the second working platform (36) to twist and twist, the second fixed frame (31) is fixed on the first working platform (16) through a screw and a gasket (4), the lower part of the bracket (5) is fixed on the second working platform (36), and the flexible amplifying micro-gripper (6) is fixed on the upper part of the bracket (5).
2. The large-stroke five-degree-of-freedom nanomanipulator of claim 1, wherein: each double-rocker amplification mechanism (10) comprises a first input block (12), a first rigid rod (13), a second rigid rod (14), a third rigid rod (15) and a plurality of first right-circular flexible hinges (C1); the piezoelectric stack driver I (D1) is arranged between the first fixed rack I (11) and the first input block I (12), the first input block I (12) and the first rigid rod I (13), the first rigid rod I (13) and the third rigid rod (15), the second rigid rod (14) and the third rigid rod (15), the first rigid rod I (13) and the first fixed rack I (11) and the second rigid rod (14) and the first fixed rack I (11) are connected through a first right circular flexible hinge (C1), and the third rigid rod (15) is connected with the first flexible parallelogram mechanism I (F).
3. The large-stroke five-degree-of-freedom nanomanipulator of claim 2, wherein: each flexible parallelogram mechanism I (F) is composed of first leaf-shaped flexible hinges (F1) which are parallel to each other in pairs.
4. The large-stroke five-degree-of-freedom nanomanipulator as claimed in claim 1, 2 or 3, wherein: the arrangement mode of the first piezoelectric stack drivers (D1) in the four fixing grooves is as follows: in a quadrilateral equivalent to the eight fixing grooves (P1), four fixing grooves (P1) on any adjacent sides are respectively provided with a piezoelectric stack driver I (D1);
or two fixing grooves (P1) on any one side are provided with the first piezoelectric stack driver (D1), one first piezoelectric stack driver (D1) is arranged in each fixing groove (P1) on the other two opposite sides, and the two first piezoelectric stack drivers (D1) on the two opposite sides are arranged diagonally;
alternatively, one piezoelectric stack driver one (D1) is placed in one fixing groove (P1) of each side, and the four piezoelectric stack drivers one (D1) and the rest four fixing grooves (P1) which are left unused are arranged at intervals.
5. The large-stroke five-degree-of-freedom nanomanipulator of claim 1, wherein: each bridge amplification mechanism (E) comprises a second input block (37), a fourth rigid rod (38) and a second right-circular flexible hinge (C35), and each rotation compliance mechanism (H) comprises a third input block (32), a fifth rigid rod (33) and a third right-circular flexible hinge (C34); the second input block (37) is connected with the second fixed rack (31) through two second leaf-shaped flexible hinges (F3), the second input block (37) is connected with the fourth rigid rod (38) through a second right-circular flexible hinge (C35), the fourth rigid rod (38) is connected with the second working platform (36) through a second right-circular flexible hinge (C35), and the two second right-circular flexible hinges (C35) are arranged in a vertically staggered mode; the third input block (32) is connected with the second fixed rack (31) through a second leaf-shaped flexible hinge (F3), the third input block (32) is connected with the fifth rigid rod (33) through a third straight-circular flexible hinge (C34), the fifth rigid rod (33) is connected with the second working platform (36) through a third straight-circular flexible hinge (C34), two third straight-circular flexible hinges (C34) in one rotating compliant mechanism (H) and two third straight-circular flexible hinges (C34) in the other rotating compliant mechanism (H) are arranged in a vertically staggered mode, and the two third straight-circular flexible hinges (C34) in the same rotating compliant mechanism (H) are arranged in a flush mode.
6. The large-stroke five-degree-of-freedom nanomanipulator as claimed in claim 1, 2, 3 or 5, wherein: the flexible amplifying micro-gripper (6) comprises a fixed rack III (60) and two micro-gripper arms arranged in a mirror image mode, wherein each micro-gripper arm comprises a piezoelectric stack driver III (D6), a gripper head (621), a guide rod (616), a flexible parallelogram mechanism II (61) and a double-bridge type lever amplifying mechanism K; the fixed rack III (60) is fixedly connected with the upper portion of the support (5), a flexible parallelogram mechanism II (61) and a double-bridge type lever amplification mechanism K are arranged on the fixed rack III (60), the chuck (621) is flexibly connected with the guide rod (616) through the flexible parallelogram mechanism II (61), the guide rod (616) is flexibly connected with the double-bridge type lever amplification mechanism K, the piezoelectric stack driver III (D6) is arranged in the double-bridge type lever amplification mechanism K, the input displacement of the piezoelectric stack driver III (D6) is amplified and transmitted to the flexible parallelogram mechanism II (61) in the double-bridge type lever amplification mechanism K, the translational clamping of the chuck (621) is achieved, and the fixed rack III (60) is fixed on the upper portion of the support (5).
7. The large-stroke five-degree-of-freedom nanomanipulator of claim 6, wherein: each double-bridge type lever amplification mechanism (K) comprises a first bridge type amplification mechanism, a second bridge type amplification mechanism and a first lever amplification mechanism; the first bridge type amplification mechanism and the first lever amplification mechanism are arranged in the second bridge type amplification mechanism, and two adjacent sides of the first bridge type amplification mechanism are provided with two first lever amplification mechanisms; the fixed rack III (60), the rigid connecting rod (65) and the two first rigid amplifying rod groups form a first bridge type amplifying mechanism, the fixed rack III (60) is connected with the two first rigid amplifying rod groups through a fourth straight-circular flexible hinge (C6), rods in the first rigid amplifying rod groups are connected through a fourth straight-circular flexible hinge (C6), the two opposite first rigid amplifying rod groups are connected with the rigid connecting rod (65) through a fourth straight-circular flexible hinge (C6), and a piezoelectric stack driver III (D6) is arranged between the rigid connecting rod (65) and the fixed rack III (60);
a third fixed rack (60), a sixth rigid rod (611) and a seventh rigid rod (612) form a first lever amplification mechanism, and fourth right-circular flexible hinges (C6) are respectively connected between the third fixed rack (60) and the seventh rigid rod (612) and between the sixth rigid rod (611) and the seventh rigid rod (612) and the first rigid amplification rod group; the fixed rack three (60), the second rigid amplification rod group and the two rigid rods seven (612) form a second bridge amplification mechanism, the fixed rack three (60) is respectively connected with the two rigid rods seven (612) through a fourth straight-round flexible hinge (C6), the two rigid rods seven (612) are respectively connected with the second rigid amplification rod group through a fourth straight-round flexible hinge (C6), and the second rigid amplification rod group is connected with the guide rod (616).
8. The large-stroke five-degree-of-freedom nanomanipulator of claim 7, wherein: the fixed rack III (60), the rigid rod eight (618), the rigid rod nine (619) and the translational rod (620) form a flexible parallelogram mechanism II (61), the rigid rod eight (618) is connected with the guide rod (616) through a fourth right-circular flexible hinge (C6), the translational rod (620) and the fixed rack III (60) are connected with the rigid rod eight (618) and the rigid rod nine (619) which are arranged in parallel through a fourth right-circular flexible hinge (C6), and the translational rod (620) is connected with the chuck (621).
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