CN112781781B - Disturbance force measuring device of immersion control unit - Google Patents
Disturbance force measuring device of immersion control unit Download PDFInfo
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- CN112781781B CN112781781B CN202011598053.XA CN202011598053A CN112781781B CN 112781781 B CN112781781 B CN 112781781B CN 202011598053 A CN202011598053 A CN 202011598053A CN 112781781 B CN112781781 B CN 112781781B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L11/00—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a disturbance force measuring device of an immersion control unit, which comprises a base, a simulated objective mechanism, a simulated substrate mechanism and a force measuring mechanism, wherein the simulated objective mechanism comprises a simulated objective and an objective connecting piece; the simulated substrate mechanism comprises a substrate and a substrate table for bearing the substrate, wherein a sequential immersion control unit and a force measuring mechanism are arranged above the substrate, the upper end of the force measuring mechanism is connected with the base, the force measuring mechanism is provided with a force measurer and a displacement adjusting structure, and the force measurer is arranged above the simulated objective lens; the immersion control unit is positioned to surround the dummy objective lens radially outward and above the substrate, and maintains a gap with the dummy objective lens and the substrate, respectively. The disturbance force from the immersion flow field received by the immersion control unit is effectively measured and evaluated, so that the positioning reliability of the immersion control unit under the disturbance of the immersion flow field force is better ensured, the stability of the spatial shape of the immersion flow field is ensured, and the effective reliability of the disturbance force measurement is ensured.
Description
Technical Field
The invention relates to the technical field of immersion lithography, in particular to a measuring device for measuring force disturbance applied to an immersion control unit.
Background
A photolithography machine, which is one of the core equipments for manufacturing a very large scale integrated circuit, precisely projects a circuit pattern on a reticle onto a photoresist-coated substrate using an optical system and modifies the photoresist exposure, thereby leaving circuit pattern information on the substrate. It includes laser light source, projection objective system, projection mask containing circuit pattern and substrate coated with photosensitive photoresist.
With respect to dry Lithography machines in which the intermediate medium is a gas, Immersion Lithography (Immersion Lithography) apparatuses increase the resolution and depth of focus of the lithographic apparatus by increasing the refractive index (n) of the interstitial liquid medium by filling some high refractive index liquid (referred to as Immersion liquid or Immersion liquid) between the final projection objective and the substrate. In the mainstream lithography technology, immersion lithography is widely used because of its good inheritance relative to the early dry lithography. For immersion liquid filling, a solution which is widely used at present is partial immersion, i.e. the use of an immersion liquid supply and recovery device for confining liquid in a local region between the lower surface of the final projection objective and the upper surface of the substrate. Maintaining the optical consistency and transparency of the immersion liquid in the exposure area is a key to ensuring the quality of immersion lithography exposure. Therefore, in the prior art, the immersion control unit is often arranged to inject and recover the immersion liquid to continuously update the immersion liquid, photochemical pollutants, local heat, micro-nano bubbles and the like are timely taken away from the core exposure area, and the high purity and uniformity of the immersion liquid are ensured. The immersion control unit is arranged around the radial outer side of the end projection objective and is positioned above the substrate; the immersion control unit has an immersion liquid supply opening through which immersion liquid is supplied to the gap between the objective lens and the substrate, and an immersion liquid recovery opening through which immersion liquid is recovered from the gap between the objective lens and the substrate, the immersion liquid flowing continuously in the gap between the objective lens and the substrate forming an immersion flow field.
However, the continuous updating of the immersion flow field by liquid injection and recovery causes fluctuation of the immersion flow field, and causes force disturbance to the immersion control unit for limiting the flow field, which adversely affects the positioning of the immersion control unit, even damages the immersion control unit and its affiliated mechanisms, and also affects the shape of the immersion flow field, thereby adversely affecting the control of the immersion liquid flow. Therefore, it is necessary to measure and test the force disturbance from the immersion flow field received by the immersion control unit, to check the design structures and parameters of the immersion control unit and the immersion flow field, to ensure reliable positioning of the immersion control unit during the exposure process of the lithography machine, and to ensure stable spatial shape of the immersion flow field. The immersion control unit is usually a flat-shaped part surrounding the periphery of the objective lens, and the general connection mounting method is not suitable for connecting the force measuring device with the immersion control unit; and the force disturbance value of the immersion flow field to the immersion control unit is very small, the typical force disturbance amplitude is less than 1N, and the force measuring device is required to have higher measuring precision.
Disclosure of Invention
The disturbance force measuring device of the immersion control unit can effectively measure and evaluate disturbance force from the immersion flow field received by the immersion control unit, better ensure the positioning reliability of the immersion control unit under the disturbance of the immersion flow field force, ensure the stability of the space shape of the immersion flow field and ensure the effective reliability of the measurement of the disturbance force.
The invention adopts the following specific technical scheme for solving the technical problems: a disturbance force measuring device of an immersion control unit is characterized in that: the device comprises a base, a simulated objective lens mechanism, a simulated substrate mechanism and a force measuring mechanism, wherein the simulated objective lens mechanism comprises a simulated objective lens and an objective lens connecting piece, and the simulated objective lens and the objective lens connecting piece are fixedly connected with the base; the simulated substrate mechanism comprises a substrate and a substrate table for bearing the substrate, an immersion control unit is arranged above the substrate, the upper part of the immersion control unit is connected with a force measuring mechanism, the upper end of the force measuring mechanism is connected with the base, the force measuring mechanism is provided with a force measurer and a displacement adjusting structure for adjusting the displacement of the force measurer, and the force measurer is arranged in a space above the simulated objective lens; the immersion control unit is positioned to surround the dummy objective lens radially outward and above the substrate, and maintains a gap with the dummy objective lens and the substrate, respectively. The disturbance force from the immersion flow field received by the immersion control unit can be effectively measured and evaluated, the positioning reliability of the immersion control unit under the disturbance of the immersion flow field force can be better ensured, the stability of the spatial shape of the immersion flow field can be ensured, and the effective reliability of the disturbance force measurement can be ensured; the service life of the immersion control unit and its accessories is improved.
Preferably, the force measuring mechanism comprises a positioning frame, a connecting frame, a force measurer, a connecting seat and a mounting seat, the upper end of the mounting seat is connected with the base, the bottom end of the mounting seat is connected with the connecting seat, the bottom end of the connecting seat is connected with the force measurer, the connecting frame is arranged on the bottom end face of the force measurer, the bottom end of the connecting frame is connected with the immersion control unit through the positioning frame, the positioning frame and the immersion control unit are connected through an adjusting piece, the adjusting piece can drive the immersion control unit to displace, and therefore the position and the posture of the immersion control unit are adjusted. Through the connection and adjustment of the connecting seat and the mounting seat, the interference of the moment generated by the force measurer which is not arranged on the central axis of the immersion control unit on the measurement precision is reduced or eliminated as much as possible, and the effectiveness of the measurement precision is improved.
Preferably, a displacement adjusting structure is arranged between the connecting seat and the mounting seat, wherein the displacement adjusting structure is used for adjusting the transverse or longitudinal displacement of the connecting seat relative to the mounting seat, and is used for adjusting the displacement position change of the force measurer. The connecting seat can take place the displacement of small amplitude for the mount pad, is more convenient for adjust the measuring position of power caliber, improves analog measurement precision validity.
Preferably, the force measurer and the immersion control unit have a coaxial positional relationship. The disturbance of the moment generated by the force measuring instrument which is not installed on the central axis of the immersion control unit to the measuring precision is restrained.
Preferably, the force measuring device is a triaxial force sensor. The reliability and effectiveness of the force measurer capable of simultaneously measuring the forces on three mutually perpendicular shafts in one sensor are improved.
Preferably, the positioning frame is connected with the immersion control unit through 3 adjusting pieces which are uniformly arranged in the circumferential direction. The positioning connection reliability and effectiveness between the positioning frame and the immersion control unit are improved, and the installation, simulation and use reliability and effectiveness of the simulation objective lens are improved.
Preferably, the connecting frame is provided with 3 connecting arms which extend from the central part and are uniformly arranged in the circumferential direction, and the force measurer is connected to the central part of the connecting frame. The reliability, stability and effectiveness of positioning, mounting and connecting between the connecting frame and the positioning frame are improved.
Preferably, the locating frame has a ring-shaped structure. The positioning connection reliability and effectiveness between the positioning frame and the immersion control unit and between the positioning frame and the connecting frame are improved, and the installation, simulation and use reliability and effectiveness of the simulation objective lens are improved.
Preferably, the immersion control unit is used for measuring the disturbance force applied to the immersion control unit with immersion liquid supply and recovery functions; the immersion control unit comprises an immersion liquid supply opening, an immersion liquid recovery opening and a sealed pumping opening facing the substrate; immersion liquid is supplied through the immersion liquid supply opening, and the immersion liquid is recovered through the immersion liquid recovery opening and the sealed pumping opening, so that an immersion flow field is formed between the analog objective lens and the substrate. The immersion control unit is positioned in the same configuration mode relative to the simulated objective lens and the substrate as the actual immersion lithography machine, so that an immersion flow field formed in the disturbance force measurement test process can most closely reflect the working environment and parameters in the actual immersion lithography machine, and the disturbance force from the immersion flow field, which is received by the immersion control unit, can be more effectively obtained through simulation measurement.
Preferably, the substrate table is movable in a plane carrying the substrate. The simulation reality effectiveness of the force disturbance from the immersion flow field of the immersion control unit is improved.
The invention has the beneficial effects that: the disturbance force measuring device of the immersion control unit can simulate the working environment and parameters of the immersion control unit in an immersion lithography machine, measure the disturbance force applied to the immersion control unit, and test and verify the design structure and design parameters of the immersion unit, the immersion flow field and the associated components; the invention solves the technical problem of difficult measurement of small-amplitude disturbance force; the connecting mechanism in the device effectively and reliably positions components such as an immersion control unit and the like, so that the working environment of the immersion unit in the device is close to the actual working environment in the immersion lithography machine to the maximum extent, and the effective and reliable measurement of the disturbance force is ensured; the force measuring mechanism in the device ensures the full utilization of the measuring range of the force measurer and ensures the measuring precision of the disturbance force.
Description of the drawings:
the invention is described in further detail below with reference to the figures and the detailed description.
Fig. 1 is a schematic structural diagram of a disturbance force measuring device of an immersion control unit according to the present invention.
Fig. 2 is a schematic structural diagram of an immersion control unit in a disturbance force measuring device of the immersion control unit according to the present invention.
Fig. 3 is a schematic structural diagram of a simulated objective lens and a connecting mechanism thereof in the disturbance force measuring device of the immersion control unit according to the present invention.
Fig. 4 is a schematic top view of an immersion control unit in a disturbance force measuring apparatus of the immersion control unit according to the present invention.
Fig. 5 is a schematic view of the structure in the direction of a-a in fig. 1.
Detailed Description
In the embodiment shown in fig. 1, 2, 3, 4 and 5, the disturbance force measuring device of the immersion control unit comprises a base 26, a simulated objective lens mechanism, a simulated substrate mechanism and a force measuring mechanism, wherein the base 26 has larger mass and rigidity to ensure that the force disturbance from the measuring environment is isolated, the simulated objective lens mechanism comprises a simulated objective lens 2 and an objective lens connecting piece 25, and the simulated objective lens 2 is fixedly connected with the base 26 through the objective lens connecting piece 25; the simulated substrate mechanism comprises a substrate 3 and a substrate table 31 for bearing the substrate, an immersion control unit 1 is arranged above the substrate 3, a force measuring mechanism is arranged above the immersion control unit 1, the upper end of the force measuring mechanism is fixedly connected with a base 26, the force measuring mechanism is provided with a force measurer 7 and a displacement adjusting structure for adjusting the displacement of the force measurer, and the force measurer 7 is arranged in a space above the simulated objective lens 2; the immersion control unit 1 is positioned to surround the dummy objective lens 2 at a position radially outside and above the substrate 3, and maintains a gap height with the dummy objective lens 2 and the substrate 3, respectively. Force measuring mechanism includes locating rack 5, link 6, power measurement ware 7, connecting seat 8 and mount pad 9, mount pad 9 upper end connection base 26, the 9 bottom of mount pad is connected with connecting seat 8, the 8 bottom of connecting seat is connected with power measurement ware 7, link 6 is established to power measurement ware 7 bottom face, 6 bottoms of link are passed through locating rack 5 and are connected with submergence the control unit 1, realize being connected through setting up regulating part 11 between locating rack 5 and submergence the control unit 1, regulating part 11 can drive submergence the control unit 1 and take place the displacement, thereby adjust submergence the position and the gesture of the control unit 1. A displacement adjusting structure for adjusting the transverse or longitudinal displacement of the connecting seat 8 relative to the mounting seat 9 is arranged between the connecting seat 8 and the mounting seat 9 and is used for adjusting the displacement position change of the force measurer. The force measurer 7 and the immersion control unit 1 have a coaxial positional relationship. The force measurer 7 adopts a three-axis force sensor. The positioning frame is connected with the immersion control unit 1 through 3 adjusting pieces 11 which are uniformly arranged in the circumferential direction. The connecting frame 6 has 3 connecting arms 62 extending from a central portion 61 and arranged uniformly in the circumferential direction, and the force measuring device 7 is connected to the central portion 61 of the connecting frame 6. The spacer 5 has a ring-shaped configuration. The immersion control unit 1 has immersion liquid supply and recovery functions, and the immersion control unit 1 is disturbed by force from an immersion flow field; the immersion control unit 1 comprises an immersion liquid supply opening 12, an immersion liquid recovery opening 13 and a sealed pumping opening 14 towards the substrate 3; immersion liquid is supplied through the immersion liquid supply opening 12 and is recovered through the immersion liquid recovery opening 13 and the sealed extraction opening 14, forming an immersion flow field 4 between the mock objective 2 and the substrate 3. The substrate table 31 can carry the substrate 3 in a plane.
More specific embodiments are as follows:
as shown in fig. 1, 3, 4 and 5, the disturbance force measuring device of the immersion control unit according to the present invention includes a base 26, a simulated objective mechanism, a simulated substrate mechanism and a force measuring mechanism; the base 26 has a large mass and stiffness to ensure isolation of force disturbances from the environment; the simulated objective mechanism comprises a simulated objective 2 and an objective connecting piece 25, wherein the objective connecting piece 25 fixedly connects the simulated objective 2 to a base 26; the substrate simulating mechanism comprises a substrate 3 and a substrate table 31 for bearing the substrate, the substrate 3 can be a silicon wafer or a silicon wafer coated with photoresist to simulate the characteristics of the surface of the substrate contacted with an immersion flow field in a real photoetching machine, and the substrate table 31 can be fixed or a motion table which can move in a plane in the real photoetching machine; the force measuring mechanism is connected with the immersion control unit 1 and comprises a positioning frame 5, a connecting frame 6, a force measurer 7, a connecting seat 8 and a mounting seat 9; the mounting seat 9 is connected with the base 26 and the connecting seat 8, the connecting seat 8 is connected with the force measurer 7, and the connecting seat 8 can be displaced in a small amplitude relative to the mounting seat 9 so as to adjust the position of the force measurer 7; the force measurer 7 is connected with the connecting frame 6, the connecting frame 6 is connected with the positioning frame 5, and the positioning frame 5 is connected with the immersion control unit 1; the positioning frame 5 is connected with the immersion control unit 1 through the adjusting piece 11, and the adjusting piece 11 can drive the immersion control unit 1 to displace, so that the position and the posture of the immersion control unit 1 are adjusted, and the positioning function is realized on the immersion control unit 1.
As shown in fig. 1, 3 and 5, the objective lens attachment 25 fixedly attaches the dummy objective lens 2 to the base 26, and leaves a space above the dummy objective lens 2 for disposing the force measurer 7; the position of the immersion control unit 1 is adjusted to surround the radial outer side of the simulated objective lens 2 by connecting and adjusting mechanisms such as a positioning frame 5, a connecting frame 6, a force measurer 7, a connecting seat 8 and a mounting seat 9, the coaxial arrangement with the simulated objective lens 2 is kept, and the gap height between the immersion control unit 1 and the substrate is adjusted to the actual height in the immersion lithography machine; the immersion control unit 1 is positioned in the same configuration relative to the mock objective 2 and the substrate 3 as the actual immersion lithography machine so that the immersion flow field formed during the test most closely reflects the operating environment and parameters in the actual immersion lithography machine. Through the connection and adjustment of the connecting seat 8 and the mounting seat 9, the force measurer 7 is basically arranged coaxially with the analog objective lens 2 and the immersion control unit 1, and the interference of the moment generated by the force measurer 7 which is not arranged on the central axis of the immersion control unit 1 on the measurement precision is reduced or eliminated as much as possible.
The typical value of the mass of the positioning frame 5, the connecting frame 6 and the immersion control unit 1 which are connected with the force measurer 7 is 2-8 kg, the typical value of the amplitude of disturbance force generated by the immersion flow field to the immersion control unit 1 is about 1N, the measuring range of the force measurer 7 needs to meet the mass of the connected components and is enough to detect the disturbance force with small amplitude, and the force measurer 7 meeting the requirements is few in types and high in price. In order to fully utilize the range and the precision of the force measurer, in the invention, only one force measurer 7 is used for measuring the disturbing force, and a scheme of a plurality of small-range force measurers is not adopted, so that the disturbing force with small amplitude can be prevented from being decomposed into smaller disturbing force, and the detection of the disturbing force is more difficult. The force measurer 7 may be a triaxial force sensor of the german ME-measuring system brand, capable of measuring forces in three mutually perpendicular axes simultaneously in one sensor.
As shown in fig. 1 and 2, when the present invention is used to measure the disturbance force received by the immersion control unit, the connecting frame 6 and the connecting base 8 are first adjusted so that the immersion control unit 1, the mock objective 2 and the force measurer 7 are arranged substantially coaxially, and the gap between the immersion control unit 1 and the mock objective 2 and the gap between the mock objective and the substrate 3 are the same as the widths of the corresponding gaps in the immersion lithography machine, respectively. The immersion liquid is supplied through an immersion liquid supply opening 12 on the immersion control unit 1, recovered through an immersion liquid recovery opening 13 on the immersion control unit 1, and pumped out through a sealed pumping-out opening 14 on the bottom surface of the immersion control unit 1 toward the substrate 3, so that the immersion liquid flows uniformly and stably in the gap between the immersion control unit 1, the simulated objective lens 2 and the substrate 3, and an immersion flow field 4 is formed. In the process, the force measurer 7 monitors the change condition of the applied force along with time, and the fluctuation amplitude of the force along with time, which is applied by the force measurer 7, is the disturbance force applied by the immersion flow field 4 to the immersion control unit 1.
As shown in fig. 4 and 5, the positioning frame 5 is connected to the immersion control unit 1 through 3 connecting members 11, the 3 connecting members 11 are circumferentially and uniformly distributed on the immersion control unit 1, and by adjusting the telescopic lengths of the 3 connecting members 11, the positions of the immersion control unit 1 in 3 mutually perpendicular directions and the inclination postures around the 3 mutually perpendicular directions can be adjusted, so that the immersion control unit 1 maintains the relative positions with the simulated objective lens 2 and the substrate 3. The connecting frame 6 consists of a central part 61 and connecting arms 62, the central part 61 is used for connecting the force measurer 7, 3 connecting arms 62 which are uniformly arranged in the circumferential direction extend from the central part 61, and the connecting arms 62 are connected with the positioning frame 5; the positioning frame 5 is of an annular structure, so that the positioning rigidity of the immersion control unit 1 can be improved, and the phenomenon that the displacement amplitude of the immersion control unit 1 is too large due to too large local disturbance force and disturbance force distortion is caused due to the influence on the shape of an immersion flow field is avoided. By adopting the connection mode of the positioning frame 5, the connecting frame 6 and the immersion control unit 1, the position and the posture of the immersion control unit 1 can be stably and reliably adjusted and maintained, the effective transmission of force disturbance is realized, the mass is smaller, the measuring range of the force measurer 7 is favorably and fully used for measuring the small-amplitude disturbance force, and the measuring precision of the disturbance force is favorably improved.
The disturbance force measuring device of the immersion control unit can simulate the working environment and parameters of the immersion control unit in an immersion lithography machine, measure the disturbance force applied to the immersion control unit, and test and verify the design structure and design parameters of the immersion unit, the immersion flow field and related components.
In the positional relationship description of the present invention, the appearance of terms such as "inner", "outer", "upper", "lower", "left", "right", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the drawings is merely for convenience of describing the embodiments and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation and operation, and thus, is not to be construed as limiting the present invention.
The foregoing summary and structure are provided to explain the principles, general features, and advantages of the product and to enable others skilled in the art to understand the invention. The foregoing examples and description have been presented to illustrate the principles of the invention and are intended to provide various changes and modifications within the spirit and scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (8)
1. A disturbance force measuring device of an immersion control unit is characterized in that: the device comprises a base, a simulated objective mechanism, a simulated substrate mechanism and a force measuring mechanism, wherein the simulated objective mechanism comprises a simulated objective and an objective connecting piece, and the simulated objective is fixedly connected with the base through the objective connecting piece; the simulated substrate mechanism comprises a substrate and a substrate table for bearing the substrate, an immersion control unit is arranged above the substrate, the upper part of the immersion control unit is connected with a force measuring mechanism, the upper end of the force measuring mechanism is connected with the base, the force measuring mechanism is provided with a force measurer and a displacement adjusting structure for adjusting the displacement of the force measurer, and the force measurer is arranged in a space above the simulated objective lens; positioning an immersion control unit to a position radially outside around the dummy objective lens and above the substrate while maintaining gaps with the dummy objective lens and the substrate, respectively; the force measuring mechanism comprises a positioning frame, a connecting frame, a force measurer, a connecting seat and a mounting seat, wherein the upper end of the mounting seat is connected with a base, the bottom end of the mounting seat is connected with the connecting seat, the bottom end of the connecting seat is connected with the force measurer, the connecting frame is arranged on the bottom end surface of the force measurer, the bottom end of the connecting frame is connected with the immersion control unit through the positioning frame, the positioning frame is connected with the immersion control unit through an adjusting piece, and the adjusting piece can drive the immersion control unit to move so as to adjust the position and the posture of the immersion control unit; the immersion control device is used for measuring disturbance force applied to an immersion control unit with immersion liquid supply and recovery functions; the immersion control unit comprises an immersion liquid supply opening, an immersion liquid recovery opening and a sealed pumping opening facing the substrate; immersion liquid is supplied through the immersion liquid supply opening, and the immersion liquid is recovered through the immersion liquid recovery opening and the sealed pumping opening, so that an immersion flow field is formed between the analog objective lens and the substrate.
2. A disturbance force measuring device of an immersion control unit according to claim 1, wherein: and a displacement adjusting structure for adjusting the transverse or longitudinal displacement of the connecting seat relative to the mounting seat is arranged between the connecting seat and the mounting seat and is used for adjusting the displacement position change of the force measurer.
3. A disturbance force measuring device of an immersion control unit according to claim 1, wherein: the force measurer and the immersion control unit have a coaxial position relation.
4. A disturbance force measuring device of an immersion control unit according to claim 1 or 3, wherein: the force measurer adopts a triaxial force sensor.
5. A disturbance force measuring device of an immersion control unit according to claim 1, wherein: the locating rack is connected with the immersion control unit through 3 adjusting pieces which are uniformly arranged in the circumferential direction.
6. A disturbance force measuring device of an immersion control unit according to claim 1, wherein: the connecting frame is provided with 3 connecting arms which extend from the central part and are uniformly arranged in the circumferential direction, and the central part of the connecting frame is connected with the force measurer.
7. A disturbance force measuring device of an immersion control unit according to claim 1 or 5, wherein: the locating rack is of an annular structure.
8. A disturbance force measuring device of an immersion control unit according to claim 1, wherein: the substrate table may carry a substrate in a plane.
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