CN112630884A - Waveguide grating antenna array for optical phased array and preparation method thereof - Google Patents
Waveguide grating antenna array for optical phased array and preparation method thereof Download PDFInfo
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
- G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
- G02B6/12011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by the arrayed waveguides, e.g. comprising a filled groove in the array section
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
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- G—PHYSICS
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G02B2006/12038—Glass (SiO2 based materials)
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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Abstract
The invention provides a waveguide grating antenna array for an optical phased array and a preparation method thereof, wherein the waveguide grating antenna array comprises the following steps: a substrate; the waveguide grating antenna array is positioned on the substrate, and each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth; and the covering layer is covered on the waveguide grating antenna array and the substrate, is positioned on the waveguide grating antenna array and is in a space curved surface shape, and the refractive index of the covering layer is between that of the waveguide grating antenna and that of air. By covering the covering layer on the waveguide grating antenna and enabling the covering layer on the waveguide grating antenna to be in a spatial curved surface shape, when light beams emitted from the waveguide grating antenna pass through the curved surface part and the interface of air, the light beam emergence angle is enlarged according to the law of refraction of light, so that the light power emitted from the waveguide grating antenna is distributed to a larger angle range, the optical phased array still has larger emergence power when scanning to a large angle, and the performance of the optical phased array when the light beams are turned to the large angle for working is improved.
Description
Technical Field
The invention relates to the technical field of photoelectricity, in particular to a waveguide grating antenna array for an optical phased array and a preparation method thereof.
Background
Optical Phased Arrays (OPAs) based on waveguide technology are one of the important components of photonic integrated circuits. The solid-state beam forming and steering capabilities provided by optical phased arrays play a crucial role in free space applications, including optical communications, holographic displays, optical detection and ranging (LiDAR), and the like. Thanks to the advances in silicon photonic technology, optical phased array technology has gained widespread attention and rapid development in recent years. Due to the fact that integration density of the emitting units in the array is low, a large amount of high-order diffraction exists in the two-dimensional optical phased array, and meanwhile due to the fact that the number of the required emitting units is large, phase control requirements are complex. Although recent studies have utilized non-uniform distribution of transmit elements and pulse width modulation based control schemes to alleviate this constraint, the parameters of current two-dimensional optical phased arrays are still not suitable for practical applications. One-dimensional optical phased arrays are a more viable solution than others.
For a one-dimensional array optical phased array, Waveguide Grating (WAG) antennas are arranged in parallel along the transverse direction to form the phased array, and two-dimensional steering of an emergent light beam in space is realized by tuning the optical phase and the laser wavelength of each channel in the phased array. However, in the prior art, most of the light power emitted by the single waveguide grating antenna is concentrated in a small angle range in the transverse direction, and the light power is greatly reduced along with the increase of the transverse emission angle, when the light beam of the optical phased array is turned to a large angle, the light power is greatly reduced, so that the emission efficiency of the optical phased array antenna in the large angle is greatly reduced, and the performance of the optical phased array in ranging and imaging applications is affected.
Disclosure of Invention
In view of the above drawbacks of the prior art, an object of the present invention is to provide a waveguide grating antenna array for an optical phased array and a method for manufacturing the same, which are used to solve the problem that the performance of the optical phased array in ranging and imaging applications is affected by low optical power when a single waveguide grating antenna in a one-dimensional array of the prior art is emitted at a large angle in the lateral direction.
To achieve the above and other related objects, the present invention provides a waveguide grating antenna array for an optical phased array, the waveguide grating antenna array comprising:
a substrate;
the waveguide grating antennas are arranged in a one-dimensional array along the transverse direction and are positioned on the substrate, and each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth;
the covering layer covers the waveguide grating antennas and the substrate, is positioned on the waveguide grating antennas and is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antennas and the refractive index of air.
Optionally, the substrate is an SOI substrate including a bottom single crystal silicon layer, a buried oxide layer, and a top single crystal silicon layer; the waveguide grating antenna is formed in the top monocrystalline silicon layer; or the base waveguide of the waveguide-grating antenna is formed in the top monocrystalline silicon layer, and the grating teeth of the waveguide-grating antenna are formed above the top monocrystalline silicon layer.
Further, the material of the covering layer is a silicon dioxide material.
Optionally, the curvature of the cover layer on the waveguide grating antenna is between 9.9 × 105m-1～4.4×106m-1In the meantime.
Optionally, the curvature of the cover layer on the waveguide grating antenna is between 2.4 × 106m-1～4.4×106m-1In the meantime.
The invention also provides a preparation method of the waveguide grating antenna array for the optical phased array, which comprises the following steps:
providing a substrate;
forming a plurality of waveguide grating antennas which are arranged in a one-dimensional array along the transverse direction on the substrate, wherein each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth;
and forming a covering layer on the waveguide grating antenna and the substrate, wherein the covering layer positioned on the waveguide grating antenna is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antenna and the refractive index of air.
Optionally, the substrate is an SOI substrate including a bottom single crystal silicon layer, a buried oxide layer, and a top single crystal silicon layer; the waveguide grating antenna is formed in the top monocrystalline silicon layer; or the base waveguide of the waveguide-grating antenna is formed in the top monocrystalline silicon layer, and the grating teeth of the waveguide-grating antenna are formed above the top monocrystalline silicon layer.
Further, the material of the covering layer is a silicon dioxide material.
Optionally, the covering layer is formed by a chemical vapor deposition process, and the covering layer on the waveguide-grating antenna is in a spatial curved shape due to a height difference between the substrate and the waveguide-grating antenna.
Optionally, the curvature of the cover layer on the waveguide grating antenna is between 9.9 × 105m-1～4.4×106m-1In the meantime.
As described above, the waveguide grating antenna array for an optical phased array and the method for manufacturing the same of the present invention include: a substrate; the waveguide grating antennas are arranged in a one-dimensional array along the transverse direction and are positioned on the substrate, and each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth; the covering layer covers the waveguide grating antennas and the substrate, is positioned on the waveguide grating antennas and is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antennas and the refractive index of air. The covering layer is covered on the waveguide grating antenna, the covering layer positioned on the waveguide grating antenna is in a spatial curved surface shape, the covering layer is similar to a lens structure, when a light beam emitted from the waveguide grating antenna passes through the curved surface part and the interface of air, the light beam emergent angle is enlarged according to the refraction law of light, the light power emitted from the waveguide grating antenna is distributed to a larger angle range, the optical phased array still has larger emergent power when scanning to a large angle, and the performance of the optical phased array when the light beam is turned to the large angle for working is improved.
Drawings
Fig. 1 shows a schematic diagram of an optical phased array for a waveguide grating antenna array for an optical phased array according to the present invention.
Fig. 2 is a schematic plane structure diagram of one waveguide grating antenna in the waveguide grating antenna array for the optical phased array according to the present invention, wherein the waveguide grating antenna is a lateral fully etched structure.
Fig. 3 is a schematic perspective view of a waveguide grating antenna of fig. 2.
Fig. 4 is a schematic perspective view of one of the waveguide grating antennas in the waveguide grating antenna array for an optical phased array according to the present invention, wherein the waveguide grating antenna is a shallow etched structure above the substrate waveguide.
Fig. 5 is a schematic perspective view of a waveguide grating antenna in the waveguide grating antenna array for an optical phased array according to the present invention, wherein the waveguide grating antenna is a perturbation structure above a substrate waveguide.
Fig. 6 shows a transverse cross-sectional view of the waveguide grating antenna array for an optical phased array along direction AA in fig. 1.
Fig. 7 is a schematic cross-sectional view of the divergence angle of the output beam from each of the waveguide grating antennas in the waveguide grating antenna array for an optical phased array of the present invention.
Fig. 8 is a schematic diagram showing the optical phased array implementation beam steering for the waveguide grating antenna array of the optical phased array according to the present invention.
Fig. 9 and 10 are schematic cross-sectional views illustrating a manufacturing process of a waveguide grating antenna array for an optical phased array according to an embodiment of the present invention.
Description of the element reference numerals
10 substrate
101 bottom single crystal silicon layer
102 buried oxide layer
103 top monocrystalline silicon layer
11 waveguide grating antenna
111 matrix waveguide
112 grating tooth
12 cover layer
121 curved surface part
13 tunable laser
14 optical phased array chip
15-cascade optical beam splitter
16 phase shifter array
17 waveguide grating antenna array
Detailed Description
The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention.
Please refer to fig. 1 to 10. It should be noted that the drawings provided in the present embodiment are only for illustrating the basic idea of the present invention, and the drawings only show the components related to the present invention rather than being drawn according to the number, shape and size of the components in actual implementation, and the type, quantity and proportion of each component in actual implementation may be changed arbitrarily, and the layout of the components may be more complicated. In addition, for convenience of direction understanding in this embodiment, the extending direction along the length of the substrate waveguide is defined as a longitudinal direction Y, and the arrangement direction of the adjacent waveguide grating antennas is defined as a transverse direction X.
As shown in fig. 1 to 8, the present embodiment provides a waveguide grating antenna array for an optical phased array, the waveguide grating antenna array including:
a substrate 10;
a plurality of waveguide grating antennas 11 arranged in a one-dimensional array along a transverse direction X are located on the substrate 10 (as shown in fig. 6 and 7), and each waveguide grating antenna 11 includes a base waveguide 111 and a plurality of grating teeth 112 (as shown in fig. 2);
a covering layer 12 covering the plurality of waveguide-grating antennas 11 and the substrate 10, wherein the covering layer 12 on the waveguide-grating antennas 11 is in a spatial curved shape, that is, a curved surface portion 121 in fig. 3, and a refractive index of the covering layer 12 is between a refractive index of the waveguide-grating antennas 11 and a refractive index of air.
As shown in fig. 1, the working principle of the optical phased array for the waveguide grating antenna array of the optical phased array according to the present embodiment is as follows: the tunable laser 13 emits a beam of narrow linewidth laser, and then injects the laser into the optical phased array chip 14; the laser light incident on the optical phased array chip 14 first enters the cascade optical beam splitter 15 and is divided into a plurality of channels (for example, in fig. 1, a 2-stage 1 × 2 coupler is used to divide the laser light into 4 channels); the laser of each channel respectively enters the phase shifter of the phase shifter array 16 connected with the laser of each channel to be subjected to phase modulation, so that the phase of the laser of each channel reaches a preset value; the phase-shifted laser of each channel is finally emitted into space through the waveguide grating antenna array 17, and the emergent beam is emitted to a specific angle according to the phase relation of the laser of each channel (as shown in fig. 8). It is known that the optical power of a light beam emitted to a specific angle is related to the shape of the light field emitted from a single waveguide grating antenna, and the light power is generally smaller at a position with a larger exit angle, which is determined by the material and the geometric structure of the waveguide grating antenna, and the optical power of the light field emitted from the single waveguide grating antenna is mainly concentrated at a position with a smaller exit angle. In this embodiment, the covering layer 12 is covered on the waveguide grating antenna, and the covering layer 12 located on the waveguide grating antenna 11 is in a spatial curved surface shape, that is, the curved surface portion 121 in fig. 6 is similar to a lens structure, when a light beam emitted from the waveguide grating antenna 11 passes through an interface between the curved surface portion 121 and air, according to a refraction law of light, an exit angle of the light beam is increased, so that optical power emitted from the waveguide grating antenna 11 is distributed to a larger angle range, so that the optical phased array still has larger exit power when scanning to a large angle, and performance of the optical phased array when the light beam is turned to a large angle to work is improved.
In this embodiment, the specific form of the waveguide grating antenna is not limited, that is, any existing waveguide grating antenna form suitable for an optical phased array may be selected. As shown in fig. 2 and 3, a lateral full-etching structure may be adopted, specifically: etching all the materials on the two sides of the substrate waveguide 111, and only reserving the material in the area of the grating teeth 112 to form a plurality of grating teeth 112 in the length direction, namely the longitudinal direction Y, of the substrate waveguide 111, wherein the material of the substrate waveguide 111 is the same as that of the grating teeth 112; as shown in fig. 4, a shallow etching structure above the substrate waveguide may also be adopted, specifically: shallow etching is performed on the upper surface of the substrate waveguide 111, and the substrate waveguide 111 cannot be etched through, so that a plurality of grating teeth 112 are formed in the length direction, namely the longitudinal direction Y, of the substrate waveguide 111, and at this time, the substrate waveguide 111 and the grating teeth 112 are made of the same material; as shown in fig. 5, a perturbation structure above the substrate waveguide may also be adopted, specifically: depositing a grating tooth material layer on the upper surface of the substrate waveguide 111, and patterning the grating tooth material layer to form a plurality of grating teeth 112 in the length direction, i.e. the longitudinal direction Y, of the substrate waveguide 111, where the substrate waveguide 111 and the grating teeth 112 may be made of the same or different materials. As shown in fig. 6 and 7, as an example, any material suitable for an optical phased array may be selected as the material of the waveguide grating antenna 11, for example, a single crystal silicon material and/or a silicon nitride material, and in this embodiment, the material of the waveguide grating antenna 11 is preferably a single crystal silicon material.
As shown in fig. 6 and fig. 9, as an example, the material of the substrate 10 may be any material suitable for an optical phased array, and is not limited herein, in this embodiment, the substrate 10 is preferably an SOI substrate, and includes a bottom single crystal silicon layer 101, a buried oxide layer 102, and a top single crystal silicon layer 103, and more preferably, the buried oxide layer 102 is a silicon dioxide buried oxide layer; the waveguide grating antenna 11 is formed in the top single crystal silicon layer 103, such as a lateral fully etched structure or a shallow etched structure above the bulk waveguide in fig. 2 to 4. As a further preferred scheme, the material of the covering layer 12 is selected to be a silicon dioxide material, the refractive index of the silicon dioxide material is between that of the single crystal silicon material and that of air, so that the optical power emitted from the waveguide grating antenna can be distributed to a larger and more appropriate angle range, and in addition, the silicon dioxide material hardly absorbs light, so that the outgoing power of the light is not affected.
As shown in fig. 7, the curvature of the cover layer 12, i.e., the curved portion 121, on the waveguide-grating antenna 11 is between 9.9 × 10 as an example5m-1～4.4×106m-1In the meantime. Preferably, the curvature of the curved portion 121 is between 2.4 × 106m-1～4.4×106m-1In the meantime. The range values herein include both endpoints.
The present embodiment also provides a method for manufacturing a waveguide grating antenna array for an optical phased array, which is used for manufacturing the waveguide grating antenna array for an optical phased array. The preparation method of this embodiment is described by taking the substrate 10 as an SOI substrate as an example, but this does not limit that the substrate material of the present invention is only SOI, and other materials suitable for preparing waveguide grating antenna arrays of optical phased arrays are all suitable for use in the preparation method of the present invention.
The preparation method comprises the following steps:
as shown in fig. 9, step S1 is performed to provide an SOI substrate 10, where the SOI substrate 10 includes a bottom single crystal silicon layer 101, a buried oxide layer 102, and a top single crystal silicon layer 103. Preferably, the buried oxide layer 102 is a silicon dioxide buried oxide layer.
It should be noted that the size of the SOI substrate 10 is set according to the requirements of a specific optical phased-array chip 14, and is not limited herein.
As shown in fig. 2 to fig. 5, step S2 is performed to form a plurality of waveguide-grating antennas 11 arranged in a one-dimensional array along the lateral direction X on the top single crystal silicon layer 103 of the SOI substrate 10, where each waveguide-grating antenna 11 includes a base waveguide 111 and a plurality of grating teeth 112.
As shown in fig. 2, fig. 3 and fig. 10, as an example, the waveguide grating antenna 11 is formed in a lateral full-etching structure, and specifically includes the following steps: firstly, a patterned photoresist layer is formed on the top monocrystalline silicon layer 103 by adopting a photoetching process, then the top monocrystalline silicon layer 103 is etched on the basis of the patterned photoresist layer to form a plurality of waveguide grating antennas 11 which are arranged in a one-dimensional array along the X direction, and finally the patterned photoresist layer is removed, wherein the formed substrate waveguide 111 extends along the Y direction, and the grating teeth 112 extend along the X direction. As shown in fig. 4, as another example, the waveguide grating antenna 11 is formed by a shallow etching structure above the substrate waveguide, and the specific steps are as follows: firstly, a patterned photoresist layer is formed on the top monocrystalline silicon layer 103 by adopting a photoetching process, then the top monocrystalline silicon layer 103 is etched on the basis of the patterned photoresist layer to form a plurality of substrate waveguides 111 of the waveguide grating antenna 11 which are arranged in a one-dimensional array along the X direction, then the patterned photoresist layer is removed, then a patterned photoresist layer is formed on the substrate waveguides 111 by adopting the photoetching process, then the substrate waveguides 111 are etched on the basis of the patterned photoresist layer to form a plurality of grating teeth 112 protruding out of the surface of the substrate waveguides, and finally the patterned photoresist layer is removed. As shown in fig. 5, as another example, the waveguide grating antenna 11 is formed as a perturbation structure above the substrate waveguide, and the specific steps are as follows: firstly, a patterned photoresist layer is formed on the top monocrystalline silicon layer 103 by adopting a photoetching process, then the top monocrystalline silicon layer 103 is etched on the basis of the patterned photoresist layer to form a plurality of substrate waveguides 111 of the waveguide grating antenna 11 which are arranged in a one-dimensional array along the X direction, then the patterned photoresist layer is removed, and then a grating tooth material layer is deposited on the substrate waveguides 111 and patterned to form a plurality of grating teeth 112.
As shown in fig. 6, step S3 is finally performed to form a cover layer 12 on the waveguide-grating antenna 11 and the substrate 10, where the cover layer 12 on the waveguide-grating antenna 11 is spatially curved, that is, the curved portion 121 is spatially curved, and the refractive index of the cover layer 12 is between the refractive index of the waveguide-grating antenna 11 and the refractive index of air.
As an example, the material of the cover layer 12 is selected to be a silicon dioxide material.
As an example, the covering layer 12 is formed by using a chemical vapor deposition process, and since there is a height difference between the waveguide grating antenna 11 and the buried oxide layer 102 after etching, when the chemical vapor deposition process is used, the covering layer 12 having a curved surface structure with a radian can be naturally formed on the waveguide grating antenna 11 by the height difference, and the process is simple and easy to implement.
As an example, the curvature of the curved surface part 121 is between 9.9 × 105m-1～4.4×106m-1In the meantime. Preferably, the curvature of the curved portion 121 is between 2.4 × 106m-1～4.4×106m-1In the meantime. The range values herein include both endpoints.
In summary, the present invention provides a waveguide grating antenna array for an optical phased array and a method for manufacturing the same, including: a substrate; the waveguide grating antennas are arranged in a one-dimensional array along the transverse direction and are positioned on the substrate, and each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth; the covering layer covers the waveguide grating antennas and the substrate, is positioned on the waveguide grating antennas and is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antennas and the refractive index of air. The covering layer is covered on the waveguide grating antenna, the covering layer positioned on the waveguide grating antenna is in a spatial curved surface shape, the covering layer is similar to a lens structure, when a light beam emitted from the waveguide grating antenna passes through the curved surface part and the interface of air, the light beam emergent angle is enlarged according to the refraction law of light, the light power emitted from the waveguide grating antenna is distributed to a larger angle range, the optical phased array still has larger emergent power when scanning to a large angle, and the performance of the optical phased array when the light beam is turned to the large angle for working is improved. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (10)
1. A waveguide grating antenna array for an optical phased array, the waveguide grating antenna array comprising:
a substrate;
the waveguide grating antennas are arranged in a one-dimensional array along the transverse direction and are positioned on the substrate, and each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth;
the covering layer covers the waveguide grating antennas and the substrate, is positioned on the waveguide grating antennas and is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antennas and the refractive index of air.
2. A waveguide grating antenna array for an optical phased array as claimed in claim 1, wherein: the substrate is an SOI substrate and comprises a bottom monocrystalline silicon layer, an oxygen embedding layer and a top monocrystalline silicon layer; the waveguide grating antenna is formed in the top monocrystalline silicon layer; or the base waveguide of the waveguide-grating antenna is formed in the top monocrystalline silicon layer, and the grating teeth of the waveguide-grating antenna are formed above the top monocrystalline silicon layer.
3. A waveguide grating antenna array for an optical phased array as claimed in claim 2, wherein: the covering layer is made of silicon dioxide.
4. A waveguide grating antenna array for an optical phased array as claimed in claim 1, wherein: the curvature of the covering layer on the waveguide grating antenna is 9.9 × 105m-1～4.4×106m-1In the meantime.
5. A waveguide grating antenna array for an optical phased array as claimed in claim 4, wherein: the curvature of the covering layer on the waveguide grating antenna is 2.4 × 106m-1～4.4×106m-1In the meantime.
6. A method of fabricating a waveguide grating antenna array for an optical phased array, the method comprising:
providing a substrate;
forming a plurality of waveguide grating antennas which are arranged in a one-dimensional array along the transverse direction on the substrate, wherein each waveguide grating antenna comprises a substrate waveguide and a plurality of grating teeth;
and forming a covering layer on the waveguide grating antenna and the substrate, wherein the covering layer positioned on the waveguide grating antenna is in a space curved surface shape, and the refractive index of the covering layer is between the refractive index of the waveguide grating antenna and the refractive index of air.
7. The method of manufacturing a waveguide grating antenna array for an optical phased array as claimed in claim 6, wherein: the substrate is an SOI substrate and comprises a bottom monocrystalline silicon layer, an oxygen embedding layer and a top monocrystalline silicon layer; the waveguide grating antenna is formed in the top monocrystalline silicon layer; or the base waveguide of the waveguide-grating antenna is formed in the top monocrystalline silicon layer, and the grating teeth of the waveguide-grating antenna are formed above the top monocrystalline silicon layer.
8. The method of manufacturing a waveguide grating antenna array for an optical phased array as claimed in claim 7, wherein: the covering layer is made of silicon dioxide.
9. The method of manufacturing a waveguide grating antenna array for an optical phased array as claimed in claim 6, wherein: and forming the covering layer by adopting a chemical vapor deposition process, wherein the covering layer positioned on the waveguide grating antenna is in a space curved surface shape due to the height difference between the substrate and the waveguide grating antenna.
10. The method of manufacturing a waveguide grating antenna array for an optical phased array as claimed in claim 6, wherein: the curvature of the covering layer on the waveguide grating antenna is 9.9 × 105m-1～4.4×106m-1In the meantime.
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| CN113985679A (en) * | 2021-11-16 | 2022-01-28 | 吉林大学 | Optical phased array system and preparation method thereof |
| CN116661059A (en) * | 2023-07-20 | 2023-08-29 | 上海铭锟半导体有限公司 | High-directivity waveguide grating antenna and preparation method thereof |
| CN117148500A (en) * | 2023-11-01 | 2023-12-01 | 赛丽科技(苏州)有限公司 | Grating antenna |
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| WO2023005192A1 (en) * | 2021-07-30 | 2023-02-02 | 联合微电子中心有限责任公司 | Optical antenna and manufacturing method therefor, and optical phased array chip |
| CN113608197B (en) * | 2021-07-30 | 2024-04-02 | 联合微电子中心有限责任公司 | Optical antenna, manufacturing method thereof and optical phased array chip |
| CN113985679A (en) * | 2021-11-16 | 2022-01-28 | 吉林大学 | Optical phased array system and preparation method thereof |
| CN116661059A (en) * | 2023-07-20 | 2023-08-29 | 上海铭锟半导体有限公司 | High-directivity waveguide grating antenna and preparation method thereof |
| CN116661059B (en) * | 2023-07-20 | 2023-09-26 | 上海铭锟半导体有限公司 | High-directivity waveguide grating antenna and preparation method thereof |
| CN117148500A (en) * | 2023-11-01 | 2023-12-01 | 赛丽科技(苏州)有限公司 | Grating antenna |
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