CN111534789A - Method for reducing deformation of mask unit sheet part, frame integrated mask and manufacturing method thereof - Google Patents
Method for reducing deformation of mask unit sheet part, frame integrated mask and manufacturing method thereof Download PDFInfo
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- CN111534789A CN111534789A CN202010082579.6A CN202010082579A CN111534789A CN 111534789 A CN111534789 A CN 111534789A CN 202010082579 A CN202010082579 A CN 202010082579A CN 111534789 A CN111534789 A CN 111534789A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Preparing Plates And Mask In Photomechanical Process (AREA)
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Abstract
The invention relates to a method for reducing deformation of a mask unit sheet part, a frame integrated mask and a manufacturing method thereof. A method of reducing a deformation amount of a mask cell sheet portion according to the present invention is a method of reducing a deformation amount of a mask cell sheet portion of a frame when manufacturing a frame-integrated mask including a plurality of masks formed with a plurality of mask patterns and a frame having a plurality of mask cell regions and having the mask cell sheet portion connected to an edge frame portion, wherein a tensile force applied to the mask cell sheet portion when the mask cell sheet portion is connected to the edge frame portion is greater than a tensile force applied to the mask when the mask is attached to the mask cell region.
Description
Technical Field
The invention relates to a method for reducing deformation of a mask unit sheet part, a frame integrated mask and a manufacturing method thereof. And more particularly, to a method of reducing a deformation amount of a mask unit sheet portion, which can accurately perform alignment (align) between masks by reducing a deformation amount of the mask unit sheet portion based on a tensile force applied to the mask, a frame-integrated mask, and a method of manufacturing the same.
Background
As a technique for forming pixels in an OLED (organic light emitting diode) manufacturing process, a Fine Metal Mask (FMM) method is mainly used, which attaches a Metal Mask (Shadow Mask) in the form of a thin film to a substrate and deposits an organic substance at a desired position.
In the existing OLED manufacturing process, after a mask is manufactured in a bar shape, a plate shape, or the like, the mask is solder-fixed to an OLED pixel deposition frame and used. One mask may have a plurality of cells corresponding to one display. In addition, in order to manufacture a large-area OLED, a plurality of masks may be fixed to an OLED pixel deposition frame, and each mask is stretched to be flat in the process of being fixed to the frame. Adjusting the tensile force to flatten the entire portion of the mask is a very difficult task. In particular, in order to align a mask pattern having a size of only several μm to several tens μm while flattening all the cells, it is necessary to finely adjust a tensile force applied to each side of the mask and to meet a high difficulty in checking an alignment state in real time.
However, in the process of fixing a plurality of masks to one frame, there is a problem that alignment between the masks and between the mask units is not good. In addition, in the process of welding and fixing the mask to the frame, the mask film has a problem that the mask is sagged or distorted due to a load because the thickness of the mask film is too thin and the area of the mask film is large; a problem of misalignment of the mask unit due to wrinkles, burrs (burr), etc. generated at the welded portion during the welding process, etc.
In the ultra-high quality OLED, the conventional QHD quality is 500-600PPI (pixel per inch), the pixel size reaches about 30-50 μm, and the 4K UHD and 8K UHD high quality has higher resolution than the conventional QHD quality, such as 860PPI and 1600 PPI. In this way, in consideration of the pixel size of the ultra-high quality OLED, it is necessary to reduce the alignment error between the cells to about several μm, and exceeding this error causes product defects, so the yield may be extremely low. Therefore, it is necessary to develop a technique capable of preventing the sagging or distortion or the like of the mask and making the alignment accurate, a technique of fixing the mask to the frame, and the like.
Disclosure of Invention
Technical problem
Accordingly, the present invention has been made to solve the above-mentioned problems of the related art, and an object of the present invention is to provide a method of reducing a deformation amount of a mask unit sheet portion, which can accurately align a position of a mask by reducing a deformation amount of the mask unit sheet portion based on a tensile force applied to the mask, a frame-integrated mask, and a method of manufacturing the same.
Technical scheme
The above object of the present invention can be achieved by a method of reducing a deformation amount of a mask cell sheet portion for reducing a deformation amount of a mask cell sheet portion of a frame when manufacturing a frame-integrated mask, the frame-integrated mask including: and a frame having a plurality of mask cell regions and having a mask cell sheet portion connected to the edge frame portion, wherein a tensile force applied to the mask cell sheet portion when the mask cell sheet portion is connected to the edge frame portion is greater than a tensile force applied to the mask when the mask is attached to the mask cell regions.
The above object of the present invention can be achieved by a method of reducing a deformation amount of a mask cell sheet portion for reducing a deformation amount of a mask cell sheet portion of a frame when manufacturing a frame-integrated mask, the frame-integrated mask including: and a frame having a plurality of mask cell regions and having a mask cell sheet portion connected to the edge frame portion, wherein an amount of deformation of the mask based on a tensile force applied to the mask cell regions when the mask is attached to the mask cell regions is reduced by increasing at least one of a thickness and a pattern width of the mask cell sheet portion.
A tensile force applied to the mask when the mask is attached to the mask cell region may be 0.1N to 5N, and the tensile force applied to the mask cell sheet portion when the mask cell sheet portion is coupled to the edge frame portion may be not more than 98N within a range greater than the tensile force applied to the mask.
The thickness of the mask unit sheet part may be 0.1mm to 1mm, and the pattern width of the mask unit sheet part may be 1mm to 10 mm.
Further, the above object of the present invention can be achieved by a frame-integrated mask integrally formed of a plurality of masks and a frame for supporting the masks, comprising: a plurality of masks formed with a plurality of mask patterns; and a frame having a plurality of mask cell regions, the edge frame portion having mask cell sheet portions connected thereto, the masks being respectively attached to the mask cell regions, a tensile force applied to the mask cell sheet portions when the mask cell sheet portions are connected to the edge frame portion being greater than a tensile force applied to the masks when the masks are attached to the mask cell regions.
Further, the above object of the present invention can be achieved by a method of manufacturing a frame-integrated mask integrally formed of a plurality of masks and a frame for supporting the masks, comprising: (a) preparing a frame having a plurality of mask unit regions and having a mask unit sheet portion connected to an edge frame portion; (b) a step of making the mask correspond to the mask unit region of the frame by mounting the template to which the mask is temporarily attached on the frame; and (c) attaching a mask to the frame, in the step (a), when the mask unit sheet part is coupled to the edge frame part, a tensile force applied to the mask unit sheet part is made larger than a tensile force applied to the mask when the mask is attached to the mask unit region.
Further, the above object of the present invention can be achieved by a method of manufacturing a frame-integrated mask integrally formed of a plurality of masks and a frame for supporting the masks, comprising: (a) preparing a frame having a plurality of mask unit regions and having a mask unit sheet portion connected to an edge frame portion; (b) a step of making the mask correspond to the mask unit region of the frame by mounting the template to which the mask is temporarily attached on the frame; and (c) attaching a mask to the frame, wherein in the step (a), a deformation amount of the mask based on a tensile force applied to the mask cell region when the mask is attached to the mask cell region is reduced by increasing at least one of a thickness of the mask cell sheet part and a pattern width.
Effects of the invention
According to the present invention having the structure as described above, it is possible to have an effect of accurately aligning the position of the mask by reducing the amount of deformation of the mask unit sheet part based on the tensile force applied to the mask.
Drawings
Fig. 1 is a schematic view illustrating a conventional process of attaching a mask to a frame.
Fig. 2 is a front view and a side sectional view of a frame-integrated mask according to an embodiment of the present invention.
FIG. 3 is a schematic top view and side cross-sectional view of a mask and a template for supporting the mask according to an embodiment of the invention.
Fig. 4 is a schematic view illustrating a state in which a template is loaded onto a frame so that a mask corresponds to a unit area of the frame according to an embodiment of the present invention.
Fig. 5 is a schematic view illustrating a process of separating the mask from the stencil after attaching the mask to the frame according to an embodiment of the present invention.
Fig. 6 is a schematic view illustrating a state in which a mask is attached to a frame according to an embodiment of the present invention.
Fig. 7 is a schematic plan view and experimental data illustrating a state in which a tensile force is applied to a mask die portion according to an embodiment of the present invention.
Fig. 8 is a schematic top view and experimental data illustrating deformation of a mask die portion based on a tensile force of a mask compared to a tensile force of the mask die portion according to an embodiment of the present invention.
Fig. 9 is experimental data illustrating deformation of a mask die portion based on thickness and width variations of the mask die portion according to an embodiment of the present invention.
Reference numerals:
50: form panel
55: temporary bonding part
100: mask and method for manufacturing the same
200: frame structure
210: edge frame section
220: mask unit sheet part
221: edge sheet part
223: first grid sheet part
225: second grid sheet part
C: cell and mask cell
CR: mask unit region
GD: pattern width of mask unit sheet part, and width of first and second grid sheet parts
P: mask pattern
WB: welding bead
Detailed Description
The following detailed description of the invention refers to the accompanying drawings, which illustrate specific embodiments by way of example, in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. It is to be understood that the various embodiments of the invention, although different from one another, are not necessarily mutually exclusive. For example, particular shapes, structures and characteristics described herein may be associated with one embodiment and may be implemented in other embodiments without departing from the spirit and scope of the present invention. In addition, it is to be understood that the location or arrangement of individual elements within each disclosed embodiment may be modified without departing from the spirit and scope of the invention. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled, as appropriately interpreted. Like reference numerals in the drawings denote the same or similar functions in many respects, and the length, area, thickness, and shape thereof may be exaggerated for convenience.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily practice the invention.
Fig. 1 is a schematic view illustrating a conventional process of attaching a mask 10 to a frame 20.
The conventional mask 10 is of a Stick Type (Stick-Type) or a Plate Type (Plate-Type), and the Stick Type mask 10 of fig. 1 can be used by fixing both sides of a Stick to an OLED pixel evaporation frame by welding. The Body (Body) of the mask 10[ or the mask film 11] has a plurality of display cells C. One cell C may correspond to a display of a smartphone or the like. A pixel pattern P corresponding to each pixel of the display is formed on the cell C.
Referring to fig. 1 (a), the rod-shaped mask 10 is mounted on the frame 20 having a quadrangular frame shape in an expanded state by applying tensile forces F1 to F2 in the longitudinal direction of the rod-shaped mask 10. The cells C1 to C6 of the rod mask 10 are located in the blank area inside the frame body of the frame 20.
Referring to fig. 1 (b), after aligning by finely adjusting tensile forces F1 to F2 applied to the respective sides of the rod-shaped mask 10, the rod-shaped mask 10 and the frame 20 are connected to each other by welding W to a portion of the side surface of the rod-shaped mask 10. Fig. 1 (c) illustrates a side cross section of the bar-shaped mask 10 and the frame connected to each other.
Although the tensile forces F1 to F2 applied to the respective sides of the bar-shaped mask 10 are finely adjusted, there still occurs a problem that the mask units C1 to C3 are poorly aligned with each other. Such examples are the cells C1-C6 having different distances between patterns or non-uniform patterns P. Since the rod-shaped mask 10 includes the plurality of cells C1 to C6, has a large area, and has a very thin thickness of the order of several tens of μm, sagging or twisting is likely to occur due to a load. In addition, it is very difficult to observe the alignment state of the cells C1 to C6 through a microscope while adjusting the tensile forces F1 to F2 so that all the cells C1 to C6 are in a flat state. In order to prevent the mask pattern P having a size of several μm to several tens μm from adversely affecting the pixel process of the ultra high quality OLED, the alignment error is preferably not more than 3 μm. This alignment error between adjacent cells is referred to as Pixel Position Accuracy (PPA).
Further, it is also very difficult to confirm the alignment state between the plurality of rod masks 10 and between the plurality of cells C1 to C6 of the rod masks 10 by connecting the plurality of rod masks 10 to one frame 20, respectively, and the alignment operation has to lead to an increase in process time, which is a significant cause of lowering the production efficiency.
After the rod-shaped mask 10 is fixedly coupled to the frame 20, the tensile forces F1 to F2 applied to the rod-shaped mask 10 act as tensile forces (tension) to the frame 20. This tension finely deforms the frame 20, and distorts the alignment between the cells C1-C6.
Thus, the present invention provides a frame 200 and a frame-integrated mask, which can make the mask 100 and the frame 200 form an integrated structure. The mask 100 integrated with the frame 200 prevents deformation such as sagging and twisting, and can be accurately aligned on the frame 200.
Fig. 2 is a front view and a side sectional view (fig. 2 (b)) illustrating a frame-integrated mask according to an embodiment of the present invention.
In this specification, the members of the frame-integrated type mask will be briefly described below, however, the description of the structure and manufacturing process of the frame-integrated type mask can be understood as inserting the contents of korean patent application No. 2018-0016186 in its entirety.
Referring to fig. 2, the frame integrated mask may include a plurality of masks 100 and a frame 200. In other words, the plurality of masks 100 are attached to the frame 200 one by one. Hereinafter, for convenience of explanation, the mask 100 having a square shape is exemplified, but the mask 100 may have a bar-shaped mask shape having protrusions for clamping on both sides before being attached to the frame 200, and the protrusions may be removed after being attached to the frame 200.
Each mask 100 may have a plurality of mask patterns P formed thereon, and one mask 100 may have one cell C formed thereon. One mask unit C may correspond to a display of a smartphone or the like.
The mask 100 may be made of invar, super invar, nickel (Ni), nickel-cobalt (Ni-Co), or the like. The mask 100 may use a sheet metal (sheet) generated by a rolling process or electroforming.
The frame 200 is formed to which a plurality of masks 100 can be attached. The frame 200 is preferably composed of the same material as the mask in view of thermal deformation. The frame 200 may include a generally quadrilateral, quadrilateral frame-like edge frame portion 210. The interior of the edge frame portion 210 may be hollow.
In addition, the frame 200 has a plurality of mask unit regions CR, and may include a mask unit sheet portion 220 connected to the edge frame portion 210. The mask unit sheet portion 220 may be composed of an edge sheet portion 221 and first and second grid sheet portions 223 and 225. The edge sheet portion 221, the first grid sheet portion 223, and the second grid sheet portion 225 are portions divided on the same sheet, and are integrally formed with each other.
The thickness of the edge frame part 210 is greater than that of the mask unit sheet part 220 and is formed with a thickness of several mm to several cm. The mask die section 220 is thinner than the thickness of the edge frame section 210 but thicker than the mask 100, and may have a thickness of about 0.1mm to 1 mm. The first and second grid sheet portions 223, 225 may be about 1-10 mm wide.
In a planar sheet, a plurality of mask unit regions CR (CR11 to CR56) may be provided except for the regions occupied by the edge sheet portion 221 and the first and second grid sheet portions 223 and 225.
The frame 200 has a plurality of mask unit regions CR, and the masks 100 may be attached in such a manner that each mask unit C corresponds to the mask unit region CR. The mask unit C corresponds to the mask unit region CR of the frame 200, and a part or all of the dummy portion may be attached to the frame 200[ the mask unit sheet portion 220 ]. Thus, the mask 100 and the frame 200 may form an integral structure.
Fig. 3 is a schematic top view and side cross-sectional view illustrating a mask 100 and a template 50 for supporting the mask according to an embodiment of the present invention.
Referring to fig. 3 (a) and 3 (b), the mask 100 may include a mask unit C formed with a plurality of mask patterns P and a dummy portion DM located at the periphery of the mask unit C. The mask 100 may be made of a metal sheet produced by a rolling process, electroforming, or the like, and one cell C may be formed on the mask 100. The dummy portion DM corresponds to a portion of the mask film 110[ mask metal film 110] other than the cell C, and may include only the mask film 110 or may include the mask film 110 formed with a predetermined dummy portion pattern similar to the morphology of the mask pattern P. The dummy portion DM corresponds to an edge of the mask 100, and a part or all of the dummy portion DM may be attached to the frame 200[ the mask die portion 220 ].
The width of the mask pattern P may be formed in a size of less than 40 μm, and the thickness of the mask 100 may be formed in a size of about 5 to 20 μm. Since the frame 200 has a plurality of mask cell regions CR (CR11 to CR56), it may have a plurality of masks 100, the masks 100 having mask cells C (C11 to C56) corresponding to the mask cell regions CR (CR11 to CR 56).
Referring to fig. 3 (b), the mask 100 may be moved in a state of being attached to and supported by one surface of the template 50. The central portion of the stencil 50 corresponds to the mask unit C of the mask metal film 110, and the edge portion may correspond to the dummy portion DM of the mask metal film 110. In order to be able to completely support the mask metal film 110, the stencil 50 has a size greater than or equal to the area of the mask metal film 110 and has a flat plate shape.
The mask 50 may have a laser through hole 51 formed therein so that the laser light L irradiated from the upper portion of the mask 50 reaches the welding portion WP of the mask 100 (performs a welding function). The laser through holes 51 may be formed in the mask 50 so as to correspond to the positions and the number of the welding portions WP.
The template 50 may have a temporary bonding portion 55 formed on one surface thereof. The temporary bonding portion 55 may temporarily adhere the mask 100[ or the mask metal film 110] to one surface of the stencil 50 and support it on the stencil 50 before the mask 100 is attached to the frame 200.
The temporary bonding portion 55 may use an adhesive that is separated based on the application of heat and an adhesive that is separable based on UV irradiation. As an example, the temporary bonding portion 55 may use liquid wax (liquid wax).
The mask 100 may be attached to the template 50 in a state where a predetermined tensile force IT is applied [ see fig. 4 ]. The tensile force may be exerted by a difference in thermal expansion coefficient between the mask 100 and the template 50, or may be exerted by physically stretching the mask 100 and attaching it to the template 50.
Fig. 4 is a schematic view illustrating a state in which the template 50 is loaded onto the frame 200 so that the mask 100 corresponds to the cell region CR of the frame 200 according to an embodiment of the present invention.
The template 50 may be transferred by a vacuum chuck 90. The mask 100 is transferred by sucking the mask to the surface of the template 50 opposite to the surface thereof by the vacuum chuck 90.
The mask 100 may be made to correspond to one mask unit region CR of the frame 200. The mask 100 may be made to correspond to the mask unit region CR by loading the stencil 50 onto the frame 200 or the mask unit sheet part 220. Whether the mask 100 corresponds to the mask unit region CR may be confirmed by controlling the position of the template 50/vacuum chuck 90 while using a microscope. Since the template 50 presses the mask 100, the mask 100 can be brought into close contact with the frame 200.
A plurality of templates 50 may be sequentially or simultaneously loaded onto the frame 200 or the mask unit sheet parts 220 so that each mask 100 corresponds to each mask unit region CR. If the sizes of the mask 50 and the mask 100 are the same, the mask 50 corresponding to a specific mask cell region CR11 and the masks 50 corresponding to the mask cell regions CR12, CR21 adjacent thereto do not interfere/overlap with each other and are formed at predetermined intervals. The predetermined interval may be a size 1/2 that is less than the width of the first and second grid sheet portions 223, 225.
In addition, the lower support 70 may be disposed at the lower portion of the frame 200. The lower supporter 70 may press the opposite surface of the mask unit region CR in contact with the mask 100. Meanwhile, since the lower supporter 70 and the stencil 50 press the edge of the mask 100 and the frame 200 (or the mask die sheet portions 220) in opposite directions to each other, the aligned state of the mask 100 may be maintained without distortion.
Next, the mask 100 is irradiated with laser light L, and the mask 100 may be attached to the frame 200 based on laser welding. The part of the welding part WP of the laser welded mask generates a welding bead WB, which may have the same material as the mask 100/frame 200 and be integrally connected.
The mask 100 may be attached to all the mask cell regions CR by repeatedly performing the process of attaching the mask 100 to the frame 200 while performing the laser light L irradiation while corresponding one mask 100 to one mask cell region CR. Alternatively, all the masks 100 may be simultaneously corresponded and attached to all the mask cell regions CR.
Fig. 5 is a schematic view illustrating a process of separating the mask from the stencil after attaching the mask to the frame according to an embodiment of the present invention.
Referring to fig. 5, after the mask 100 is attached to the frame 200, the mask 100 and the stencil 50 may be separated (bonding). The separation of the mask 100 from the template 50 may be performed by at least any one of heating ET, chemical treatment CM, application of ultrasonic waves US, and application of ultraviolet rays UV to the temporary bonding portion 55. Since the mask 100 can maintain the state of being attached to the frame 200, only the stencil 50 can be lifted. As an example, if heat ET at a temperature higher than 85 to 100 ℃ is applied, the viscosity of the temporary bonding portion 55 is lowered, the adhesion force of the mask 100 to the stencil 50 is weakened, and the mask 100 and the stencil 50 can be separated. As another example, the mask 100 and the template 50 may be separated by immersing the temporary bonding portion 55 in a chemical such as IPA, acetone, or ethanol to dissolve or remove the temporary bonding portion 55. As another example, if the ultrasonic wave US is applied or the ultraviolet ray UV is applied, the adhesion force of the mask 100 and the template 50 becomes weak, so that the mask 100 and the template 50 can be separated.
The tensile force IT applied to the mask 100 is released while the template 50 is separated from the mask 100, and thus may be converted into a tensile force TS that tensions both sides of the mask 100. In other words, the mask 100 is stretched to a length greater than the original length thereof and is adhered to the template 50, and the mask is welded and adhered to the frame 200 in this state, whereby the tensioned state [ the state in which the mask sheet portion 220 on the periphery is itself subjected to the tension TS ] can be maintained.
Fig. 6 is a schematic view illustrating a state in which the mask 100 is attached to the frame 200 according to an embodiment of the present invention. Fig. 6 illustrates a state in which all the masks 100 are attached to the cell regions CR of the frame 200. The masks 100 may be attached one by one and then the templates 50 may be separated, or all the masks 100 may be attached and then all the templates 50 may be separated.
The conventional mask 10 of fig. 1 has a long length because it includes 6 cells C1-C6, and on the contrary, the mask 100 of the present invention has a short length because it includes 1 cell C, and thus the degree of distortion of the Pixel Position Accuracy (PPA) may be reduced. In addition, since the present invention only needs to correspond to one cell C of the mask 100 and confirm the alignment state, the manufacturing time can be significantly reduced compared to the conventional method [ refer to fig. 1] in which a plurality of cells C (C1 to C6) need to be simultaneously corresponding and all the alignment states need to be confirmed.
After the masks 100 are all attached to the corresponding mask cell regions CR, if the template 50 and the masks 100 are separated, the plurality of masks 100 may apply a contraction tension TS to the mask cell regions CR. Preferably, the contraction tensions TS in opposite directions are applied to the adjacent masks 100, and no force is applied to the mask die sheet portions 220 due to the mutual cancellation of the tensions. For example, the tension TS acting in the right direction of the mask 100 attached to the cell region CR11 in the first grid sheet portion 223 between the mask 100 attached to the cell region CR11 and the mask 100 attached to the cell region CR12 preferably cancels out the tension TS acting in the left direction of the mask 100 attached to the cell region CR 12.
However, when the mask unit sheet portions 220 are coupled to the edge frame portions 210, if the coupling is performed in a state where no tensile force is applied or a state where a weak tensile force is applied, sagging occurs based on a load of the mask unit sheet portions 220. In this state, if the plurality of masks 100 apply the tension TS to the mask unit piece portions 220 as shown in fig. 6, the tensions TS between the plurality of masks 100 are not completely cancelled out, and the forces of the portions that are not cancelled out may act on the mask unit piece portions 220. From another perspective, the mask die portions 220 are relatively easily deformed based on the tension TS of the mask 100 because the mask 100 is attached to the relatively thin and weak mask die portions 220 rather than to the edge frame portions 210. If the mask die section 220 is distorted, a problem may occur in that an alignment error of the mask 100 (or the mask pattern P) is increased.
Accordingly, a feature of the present invention is to provide a mask unit sheet portion 220 that is not deformed by the tension TS of the mask 100 when the mask 100 is attached to the mask unit sheet portion 220. For this purpose, the following methods can be considered: (1) the mask unit sheet portion 220 is attached in a state where a stronger tensile force is applied when the mask unit sheet portion 220 is connected to the edge frame 210, so that the mask unit sheet portion 220 is tightened, or (2) the thickness of the mask unit sheet portion 220 is increased, or (3) the rigidity of the mask unit sheet portion 220 is increased by increasing the pattern width GD of the mask unit sheet portion 220 [ the width of the edge sheet portion 221 and the first and second grid sheet portions 223 and 225 ].
Fig. 7 is a schematic plan view and experimental data illustrating a state in which a tensile force is applied to a mask cell sheet portion according to an embodiment of the present invention.
Referring to fig. 7 (a), the mask unit sheet portion 220 can be attached to the edge frame portion 210 in a state where a stronger tensile force F1 is applied. Although it is preferable to apply the tensile force F1 to all sides (inner sides) of the mask unit sheet portion 220, it is not limited thereto. The magnitude of the tensile force F1 may be greater than the tensile force F2[ or the tensile force IT (see fig. 4) ] applied to the mask 100 before the mask 100 is attached to the mask cell piece portion 220. Accordingly, the mask unit sheet portions 220 maintain the tensile force in a more tense state, and thus the mask 100 is not deformed by the tensile force TS applied to the mask unit sheet portions 220 after being attached.
Fig. 7 (b) is experimental data illustrating a sagging amount of the mask die portion 220 when a tensile force F1 from 0N to 98N is applied in a state where the pattern width of the mask die portion 220 is 5mm and the thickness is 0.2 mm. It is confirmed that as the tensile force F1 applied to the mask unit sheet part 220 becomes larger, the sagging amount of the mask unit sheet part 220 becomes smaller. As the tensile force F1 becomes greater, the mask die sheet portion 220 can be tautly connected to the edge frame portion 210.
Fig. 8 is a schematic top view and experimental data illustrating deformation of a mask die portion based on a tensile force of a mask compared to a tensile force of the mask die portion according to an embodiment of the present invention.
Referring to fig. 8 (a), after the mask die sheet portion 220 is coupled to the edge frame portion 210, it may be attached in a state where a tensile force F2 is applied to the mask 100. For convenience of explanation, the template 50 is not shown, and only the mask 100 is shown. As described above, the tensile force F2 of the mask 100 may correspond to the tensile force IT applied when adhering to the template 50. The tensile force F2 may be exerted by a difference in thermal expansion coefficient between the mask 100 and the template 50, or may be exerted by being stuck to the template 50 after physically stretching the mask 100. Alternatively, the mask 100 may be directly clamped without the template 50 and the tensile force F2 may be applied.
Fig. 8 (b) is experimental data illustrating the amount of deformation of the mask unit sheet portion 220 in the following case: after the tensile forces F1 of 0N and 98N were applied and connected to the edge frame part 210 in a state where the pattern width of the mask die part 220 was 5mm and the thickness was 0.2mm, respectively, the tensile forces F2 of 0.1N to 5N were applied to the mask 100 and adhered to the mask die part 220. As the tensile force F2 applied to the mask 100 increases, the amount of deformation of the mask die section 220 shows a tendency to increase. It is only confirmed that the amount of deformation of the mask cell sheet portion 220 tends to decrease under the same condition of the tensile force F2 of the mask 100 as the tensile force F1 of the mask cell sheet portion 220 increases. This is because the mask unit sheet part 220 is tightly coupled to the edge frame part 210 with an increase in the tensile force F1, and the tensile force F1 is greater than the tensile force F2, thus showing that the tensile force F2 of the mask 100 has little influence on the mask unit sheet part 220.
Fig. 9 is experimental data illustrating deformation of a mask die portion based on thickness and width variations of the mask die portion according to an embodiment of the present invention.
The amount of deformation of the mask die portion 220 may be reduced by increasing the thickness of the mask die portion 220 to increase the rigidity. Fig. 9 (a) is experimental data illustrating the detection of the amount of deformation of the mask unit chip part 220 while changing the thickness of the mask unit chip part 220 from 0.1mm to 0.5mm when the mask 100 is attached to the mask unit chip part 220 by applying a tensile force F2 of 1N when the pattern width of the mask unit chip part 220 is 5 mm. It can be confirmed that as the mask die portion 220 becomes thicker, the amount of deformation of the mask die portion 220 tends to decrease.
Further, by increasing the pattern width GD [ the width of the edge sheet portion 221 and the first and second grid sheet portions 223 and 225 ] of the mask sheet portion 220 to increase the rigidity of the mask sheet portion 220, the amount of deformation of the mask sheet portion 220 can be reduced. Fig. 9 (b) is experimental data illustrating the amount of deformation of the mask unit sheet portion 220 when the mask 100 is attached to the mask unit sheet portion 220 by applying a tensile force F2 from 0.1N to 5N while changing the pattern width to 5mm and 10mm, respectively, in a state where the thickness of the mask unit sheet portion 220 is 0.2 mm. It can be confirmed that as the pattern width GD of the mask unit sheet portion 220 increases, the amount of deformation of the mask unit sheet portion 220 shows a tendency to decrease.
As described above, as the tensile force F1 applied during the process of connecting the mask unit sheet portion 220 to the edge frame portion 210 increases and the thickness/pattern width GD of the mask unit sheet portion 220 increases, the mask unit sheet portion 220 can be more firmly connected to the edge frame portion 210. Thereby, deformation of the frame 200[ or the mask unit sheet portions 220] due to the tension TS of the mask can be minimized, and the mask 100 can be attached in a tensioned state, so that generation of wrinkles, deformation, and the like can be prevented. This has the effect of reducing the alignment error of the mask 100[ or the mask pattern P ] and the PPA error between the cells C.
As described above, the present invention has been illustrated and described with reference to the preferred embodiments, but is not limited to the above-described embodiments, and those skilled in the art can make various changes and modifications without departing from the spirit of the present invention. Such variations and modifications are intended to be within the scope of the present invention and the appended claims.
Claims (8)
1. A method of reducing an amount of deformation of a mask die portion for reducing an amount of deformation of a mask die portion of a frame when manufacturing a frame-integrated mask, the frame-integrated mask comprising: a plurality of masks formed with a plurality of mask patterns, and a frame having a plurality of mask cell regions with mask cell sheet portions connected to edge frame portions,
the tensile force applied to the mask unit sheet portion when the mask unit sheet portion is attached to the edge frame portion is greater than the tensile force applied to the mask when the mask is attached to the mask unit region.
2. A method of reducing an amount of deformation of a mask die portion for reducing an amount of deformation of a mask die portion of a frame when manufacturing a frame-integrated mask, the frame-integrated mask comprising: a plurality of masks formed with a plurality of mask patterns, and a frame having a plurality of mask cell regions with mask cell sheet portions connected to edge frame portions,
by increasing at least one of the thickness and the pattern width of the mask unit sheet part, the deformation amount of the mask based on the tensile force applied by the mask unit area when the mask is attached to the mask unit area is reduced.
3. The method of reducing an amount of deformation of a die portion of a mask die as recited in claim 1,
the tensile force applied to the mask when the mask is attached to the mask cell region is 0.1N to 5N, and the tensile force applied to the mask cell sheet portion when the mask cell sheet portion is attached to the edge frame portion is not more than 98N in a range larger than the tensile force applied to the mask.
4. The method of reducing an amount of deformation of a die portion of a mask die as recited in claim 2,
the thickness of the mask unit sheet part is 0.1mm to 1mm, and the pattern width of the mask unit sheet part is 1mm to 10 mm.
5. A frame-integrated mask formed by integrally forming a plurality of masks and a frame for supporting the masks,
the frame-integrated mask includes:
a plurality of masks formed with a plurality of mask patterns; and
a frame having a plurality of mask unit regions, and a mask unit sheet part connected to the edge frame part,
the masks are respectively attached to the mask cell regions,
the tensile force applied to the mask unit sheet portion when the mask unit sheet portion is attached to the edge frame portion is greater than the tensile force applied to the mask when the mask is attached to the mask unit region.
6. The frame-integrated mask according to claim 5,
the tensile force applied to the mask when the mask is attached to the mask cell region is 0.1N to 5N, and the tensile force applied to the mask cell sheet portion when the mask cell sheet portion is attached to the edge frame portion is not more than 98N in a range larger than the tensile force applied to the mask.
7. A method for manufacturing a mask with a frame integrated type, the mask with the frame integrated type being formed by integrating a plurality of masks and a frame for supporting the masks,
the manufacturing method comprises the following steps:
(a) preparing a frame having a plurality of mask unit regions and having a mask unit sheet portion connected to an edge frame portion;
(b) a step of making the mask correspond to the mask unit region of the frame by mounting the template to which the mask is temporarily attached on the frame; and
(c) a step of attaching the mask to the frame,
in the step (a), when the mask unit sheet part is coupled to the edge frame part, a tensile force applied to the mask unit sheet part is made larger than a tensile force applied to the mask when the mask is attached to the mask unit region.
8. A method for manufacturing a mask with a frame integrated type, the mask with the frame integrated type being formed by integrating a plurality of masks and a frame for supporting the masks,
the manufacturing method comprises the following steps:
(a) preparing a frame having a plurality of mask unit regions and having a mask unit sheet portion connected to an edge frame portion;
(b) a step of making the mask correspond to the mask unit region of the frame by mounting the template to which the mask is temporarily attached on the frame; and
(c) a step of attaching the mask to the frame,
in the step (a), the amount of deformation of the mask based on the tensile force applied to the mask cell region when the mask is attached to the mask cell region is reduced by increasing at least one of the thickness and the pattern width of the mask cell sheet portion.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2019-0014481 | 2019-02-07 | ||
| KR20190014481 | 2019-02-07 | ||
| KR1020200012583A KR102358268B1 (en) | 2019-02-07 | 2020-02-03 | Method for reducing amount of deformation of mask-cell-sheet, mask integrated frame and producing method thereof |
| KR10-2020-0012583 | 2020-02-03 |
Publications (2)
| Publication Number | Publication Date |
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| CN111534789A true CN111534789A (en) | 2020-08-14 |
| CN111534789A8 CN111534789A8 (en) | 2022-08-02 |
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| CN202010082579.6A Pending CN111534789A (en) | 2019-02-07 | 2020-02-07 | Method for reducing deformation of mask unit sheet part, frame integrated mask and manufacturing method thereof |
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| CN111534789A8 (en) | 2022-08-02 |
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Correction item: Applicant Correct: Wulaomao Materials Co.,Ltd. False: Wuluomao Materials Co.,Ltd. Number: 33-02 Volume: 36 Correction item: Applicant Correct: Wulaomao Materials Co.,Ltd. False: Wuluomao Materials Co.,Ltd. Number: 33-02 Page: The title page Volume: 36 |