CN111300963A - Variable lattice holographic invisible pattern forming method - Google Patents

Abstract

The invention discloses a variable dot matrix holographic invisible pattern forming method, which comprises the following steps: designing a microstructure pattern; drawing the microstructure pattern into a grating dot matrix; sending the grating lattice to a platinum relief machine, reading grating lattice parameters by the platinum relief machine and transmitting the grating lattice parameters to a laser, and etching the grating lattice on the photoetching offset plate by the laser; developing the etched photoresist plate into a pattern by a developing solution to become a photolithography master; the photolithographic master transfers the pattern to a registration transfer film, an alumite, a composite paper or a film, depending on the print carrier. The method changes the traditional mechanical cutting technology, designs the microstructure pattern independently, draws the microstructure pattern into a grating dot matrix, etches the grating dot matrix on the photoetching offset plate by laser sequentially through a platinum relief machine and a laser, and forms a photoetching master slice to transfer the pattern to various products, so that a user can not see the graphic content on the product appearance, and the aim of invisible anti-counterfeiting is fulfilled.

Description

Variable lattice holographic invisible pattern forming method

Technical Field

The invention relates to a holographic dot matrix photoetching technology, in particular to a variable dot matrix holographic invisible pattern forming method.

Background

The traditional holographic dot matrix photoetching technology mainly utilizes laser dot matrix light spots to engrave on a photoetching offset plate, firstly utilizes the traditional mechanical cutting technology to cut out required shapes and sizes such as squares, circles and the like on a metal shade sheet, and laser penetrates through the metal shade sheet to form the square or circular light spots to engrave on the photoetching offset plate and finally transfers the square or circular light spots onto a product. The existing dot matrix photoetching technology is often single in light spot and invariable in pattern, so that the light spot cannot be changed too much.

Disclosure of Invention

The present invention is directed to solving at least one of the problems of the prior art. Therefore, the invention provides a variable dot matrix holographic invisible pattern forming method, which can manufacture a product with an invisible anti-counterfeiting function according to an independently designed pattern.

The variable lattice holographic invisible pattern forming method provided by the embodiment of the invention comprises the following steps of: step one, designing a microstructure pattern; secondly, drawing the microstructure pattern into a grating dot matrix; thirdly, the grating dot matrix is sent to a platinum relief machine, the platinum relief machine reads grating dot matrix parameters and transmits the parameters to a laser, and the laser etches the grating dot matrix on the photoetching offset plate; step four, developing the etched photoresist plate to form a pattern through a developing solution to form a photoetching master slice; and fifthly, according to the printing carrier, the photoetching master slice transfers the pattern to a positioning transfer film, electrochemical aluminum, composite paper or a film.

The method has the following beneficial effects: the method changes the traditional mechanical cutting technology, designs the microstructure pattern independently, draws the microstructure pattern into a grating dot matrix, etches the grating dot matrix on the photoetching offset plate by laser sequentially through a platinum relief machine and a laser, and forms a photoetching master slice to transfer the pattern to various products, so that a user can not see the graphic content on the product appearance, and the aim of invisible anti-counterfeiting is fulfilled.

According to some embodiments of the invention, the microstructure pattern comprises graphics and/or text.

Detailed Description

In the following description of the present invention, unless otherwise explicitly defined, terms such as design, drawing, etching, transfer printing, etc. should be construed broadly, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in consideration of the detailed contents of the technical solutions.

The invention provides a variable lattice holographic invisible pattern forming method, which comprises the following steps:

step one, designing a microstructure pattern;

secondly, drawing the microstructure pattern into a grating dot matrix;

thirdly, the grating dot matrix is sent to a platinum relief machine, the platinum relief machine reads grating dot matrix parameters and transmits the parameters to a laser, and the laser etches the grating dot matrix on the photoetching offset plate;

step four, developing the etched photoresist plate to form a pattern through a developing solution to form a photoetching master slice;

and fifthly, according to the printing carrier, the photoetching master slice transfers the pattern to a positioning transfer film, electrochemical aluminum, composite paper or a film.

The method changes the traditional mechanical cutting technology, designs the microstructure pattern independently, some patterns can rotate along with the set angle, and some patterns can not rotate along with the set angle, then draws the microstructure pattern into a grating dot matrix, etches the grating dot matrix on the photoetching offset plate by laser through a platinum relief machine and a laser, and forms a photoetching master slice to transfer the pattern to various products, so that a user can not see the pattern content on the product appearance, and the aim of invisible anti-counterfeiting is achieved.

In addition, the microstructure pattern comprises figures and/or characters, the microstructure pattern is not limited to a conventional square or round light spot, and each enterprise can have a proprietary microstructure pattern and a corresponding anti-counterfeiting mark.

While the embodiments of the present invention have been described in detail, the present invention is not limited to the embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.

Claims (2)

1. The method for forming the variable-lattice holographic invisible pattern is characterized by comprising the following steps of:

step one, designing a microstructure pattern;

secondly, drawing the microstructure pattern into a grating dot matrix;

thirdly, the grating dot matrix is sent to a platinum relief machine, the platinum relief machine reads grating dot matrix parameters and transmits the parameters to a laser, and the laser etches the grating dot matrix on the photoetching offset plate;

step four, developing the etched photoresist plate to form a pattern through a developing solution to form a photoetching master slice;

and fifthly, according to the printing carrier, the photoetching master slice transfers the pattern to a positioning transfer film, electrochemical aluminum, composite paper or a film.

2. The method for forming a variable lattice holographic stealth pattern according to claim 1, wherein the microstructure pattern comprises graphics and/or text.