CN110560425B - Ultrasonic cleaning device, cleaning method and application thereof - Google Patents
Ultrasonic cleaning device, cleaning method and application thereof Download PDFInfo
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- CN110560425B CN110560425B CN201910892980.3A CN201910892980A CN110560425B CN 110560425 B CN110560425 B CN 110560425B CN 201910892980 A CN201910892980 A CN 201910892980A CN 110560425 B CN110560425 B CN 110560425B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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Abstract
The invention relates to the technical field of ultrasonic cleaning, in particular to an ultrasonic cleaning device, a cleaning method and application thereof. The single-channel transducer and the gradient spiral acoustic structure member are both arranged in the water tank and are positioned below an object to be cleaned. The single channel signal transmitter sends the supersound sound wave, behind the single channel transducer, is being emitted to outside formation vortex sound field by gradient spiral acoustic structure spare, and the vortex sound field has the shearing force of perpendicular to emission direction, utilizes the shearing force action in the object surface of treating cleaning of vortex sound field to clean, like this, avoids the cavitation erosion harm that cavitation brought.
Description
Technical Field
The invention relates to the technical field of ultrasonic cleaning, in particular to an ultrasonic cleaning device, a cleaning method and application thereof.
Background
The surfaces of articles such as precious metal materials, high-precision optical elements, semiconductor materials and the like need to be maintained and cleaned regularly, and conventional ultrasonic cleaning or high-frequency ultrasonic cleaning is generally adopted, namely, the cavitation action of ultrasonic waves in liquid and micro-jet impact generated by cavitation secondary effect are utilized to directly or indirectly act on dirt attached to the surface of an object to be cleaned, so that the purposes of cleaning the dirt layer by dispersion, emulsification and stripping are achieved.
However, the related art ultrasonic cleaning apparatus relies on a cavitation effect or a high-pressure straight-through washing capability, which causes damage to the surface of the object to be cleaned.
Disclosure of Invention
The invention aims to provide an ultrasonic cleaning device, a cleaning method and application thereof, and aims to solve the problem that the surface of an object to be cleaned is damaged due to the fact that the existing ultrasonic cleaning device relies on cavitation effect for cleaning.
In order to achieve the purpose, the invention adopts the technical scheme that:
in a first aspect, an ultrasonic cleaning device is provided, including a single channel signal transmitter for transmitting ultrasonic waves, a single channel transducer for electrically connecting with the single channel signal transmitter, a gradient spiral acoustic structure member for generating a vortex sound field and a water tank for containing a cleaning liquid medium, which are arranged at the transmitting end of the single channel transducer, wherein the single channel transducer and the gradient spiral acoustic structure member are all arranged in the water tank and are located below an object to be cleaned.
In one embodiment, the gradient spiral acoustic structure comprises a base with a circular cross section for connecting the single-channel transducer and a plurality of medium conducting pillars with a fan-shaped cross section for emitting vortex sound, wherein each medium conducting pillar is arranged on the base with the central axis of the base as the center, and the height of each medium conducting pillar along the axial direction of the base
And are sequentially increased in the circumferential direction of the base from the start position, wherein,
for the height of the medium conducting pillars at present,
the total number of each of the dielectric conducting pillars,
for the current rank of the medium conducting pillars,
the height of the air inlet pipe is preset,
the order of the vortex sound field.
In one embodiment, the mediumThe number of the medium transmission guide columns is eight, and the height of each medium transmission guide column is sequentially
、
、
、
、
、
、
And
。
in one embodiment, the gradient spiral acoustic structure comprises a base for connecting the single-channel transducer and a plurality of medium conducting column sets for emitting a vortex sound field, the base comprises a plurality of fan-shaped placing areas which are equally distributed by taking the central axis of the base as the center, each medium conducting column set is symmetrically arranged in the corresponding fan-shaped placing area by taking the central axis of the base as the center, each medium conducting column set comprises a plurality of conducting sub-columns, and the height of each conducting sub-column along the axial direction of the base
And are sequentially increased in the circumferential direction of the base from the start position, wherein,
to be the current height of the conductive sub-pillars,
the total number of each of the conductive sub-pillars,
for the current rank of the conductive sub-column,
is a preset height.
In one embodiment, the base comprises four fan-shaped placement areas, the number of the dielectric conductive column sets is four, each dielectric conductive column set comprises three conductive sub-columns, and the heights of the conductive sub-columns in each fan-shaped placement area are sequentially
、
And
。
in one embodiment, each of the dielectric conducting pillars is a resin dielectric conducting pillar having a predetermined height range
。
In one embodiment, the sound wave frequency range of the single-channel signal transmitter is greater than or equal to 200KHz and less than or equal to 100 MHz.
In one embodiment, the ultrasonic cleaning device further comprises a fixing frame, and the fixing frame is suspended right above the gradient spiral acoustic structure.
In a second aspect, a cleaning method of the ultrasonic cleaning device is provided, and the cleaning method includes the following steps:
pretreating an object to be cleaned;
immersing an object to be cleaned and a gradient spiral acoustic structure of the ultrasonic cleaning device in a liquid cleaning medium, wherein the object to be cleaned is positioned right above the gradient spiral acoustic structure of the ultrasonic cleaning device;
the cleaning parameters are as follows: the cleaning time range is
(ii) a The cleaning temperature range is
(ii) a The sound wave frequency range of a single-channel signal emitter of the ultrasonic cleaning device is more than or equal to 200KHz and less than or equal to 100 MHz.
In a third aspect, there is provided the use of an ultrasonic cleaning device as described above for cleaning metals, optical elements and semiconductor materials.
The ultrasonic cleaning device provided by the embodiment of the invention has the beneficial effects that: the ultrasonic cleaning device comprises the following working processes: the single channel signal transmitter sends the supersound sound wave, behind the single channel transducer, is being emitted to outside formation vortex sound field by gradient spiral acoustic structure spare, and the vortex sound field has the shearing force of perpendicular to emission direction, utilizes the shearing force action in the object surface of treating cleaning of vortex sound field to clean, like this, avoids the cavitation erosion harm that cavitation brought. Meanwhile, compared with the conventional high-frequency ultrasonic wave, the ultrasonic cleaning device has the advantages that the propagation direction of the high-frequency ultrasonic wave is parallel to the surface of the object to be cleaned, so that the cleaning effect can be obtained, the ultrasonic cleaning device provided by the invention meets a plurality of cleaning angles, when the spatial direction of the object to be cleaned is limited, the object to be cleaned can obtain better cleaning effect at a plurality of angles, the original limitation is avoided, and the ultrasonic cleaning device is more feasible in practical application.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic structural diagram of an ultrasonic cleaning apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic cleaning diagram of a vortex acoustic field generated by an ultrasonic cleaning apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a gradient helical acoustic structure of an ultrasonic cleaning apparatus according to an embodiment of the present invention;
FIG. 4 is a front view of a gradient helical acoustic structure of an ultrasonic cleaning apparatus provided in accordance with an embodiment of the present invention;
FIG. 5 is another front view of a gradient helical acoustic structure of an ultrasonic cleaning apparatus provided in accordance with an embodiment of the present invention;
fig. 6 is a schematic diagram of the variation of the outgoing phase with the height of the ultrasonic sound wave of the ultrasonic cleaning device provided by the embodiment of the invention after passing through each resin medium transmission post;
FIG. 7 is a comparison diagram of an ultrasonic cleaning apparatus for cleaning glass sheets according to another embodiment of the present invention;
FIG. 8 is a comparison diagram of an ultrasonic cleaning device for cleaning copper sheets according to another embodiment of the present invention;
FIG. 9 is another schematic structural diagram of a gradient spiral acoustic structure of an ultrasonic cleaning apparatus according to an embodiment of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
In the description of the present invention, it is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships illustrated in the drawings, and are used merely for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In order to explain the technical solution of the present invention, the following detailed description is made with reference to the specific drawings and examples.
Referring to fig. 1 and 2, an ultrasonic cleaning apparatus provided by an embodiment of the present application includes a single channel signal emitter 10 for emitting ultrasonic waves, a single channel transducer 20 for electrically connecting to the single channel signal emitter 10, a gradient spiral acoustic structure 30 disposed at an emitting end of the single channel transducer 20 for generating a vortex acoustic field, and a water tank 40 for containing a cleaning liquid medium. The single channel transducer 20 and the gradient spiral acoustic structure 30 are both placed in the water tank 40 and below the object to be cleaned, and the single channel transducer 20 and the gradient spiral acoustic structure 30 are both immersed in the cleaning liquid medium. It is understood that the ultrasonic sound waves pass through the gradient spiral acoustic structure 30 to form a vortex sound field, and the vortex sound field provides shear force in the cleaning liquid medium to act on the surface of the object to be cleaned.
The ultrasonic cleaning device provided by the embodiment of the application has the following working process: the single channel signal transmitter 10 sends the supersound sound wave, behind single channel transducer 20, is being emitted to the outside by gradient spiral acoustic structure 30 and forms the vortex sound field, and the vortex sound field has the shearing force F of perpendicular to emission direction, utilizes the shearing force F of vortex sound field to act on and treats the cleaning object surface and clean, like this, avoids the cavitation damage that cavitation brought. Simultaneously, compared with the conventional high-frequency ultrasonic wave propagation direction, the surface parallel with the object to be cleaned can obtain the cleaning effect, the ultrasonic cleaning device provided by the application meets a plurality of cleaning angles, when the space direction of the object to be cleaned is limited, the object to be cleaned can obtain a better cleaning effect at a plurality of angles, the original limitation is avoided, and the practical application is more feasible.
Referring to fig. 1 to 4, in the present embodiment, the gradient spiral acoustic structure 30 includes a base 31 with a circular cross-section for connecting the single channel transducer 20 and a plurality of medium conducting pillars 32a with a fan-shaped cross-section for emitting vortex sound. It will be appreciated that one end of the base 31 is used to connect to the single channel transducer 20, and the other end is used to connect to each of the dielectric conducting pillars 32 a. The medium conducting pillars 32a are disposed on the base 31 with the central axis of the base 31 as the center, and it can be understood that the cross-sectional areas of the medium conducting pillars 32a are equal in the radial direction of the base 31. The height of each medium conducting post 32a along the axial direction of the base 31
And the starting position is sequentially increased along the circumferential direction of the base 31, it can be understood that, starting from the starting medium conducting post 32a, along the circumferential direction of the base 31, the height of each medium conducting post 32a is sequentially increased according to the above formula until the end medium conducting post 32a is finished. Wherein the content of the first and second substances,
is at presentThe height of the media-conducting post 32a,
the total number of the medium-conducting pillars 32a,
to present the rank of the media-conveying post 32a,
the height of the air inlet pipe is preset,
the order of the vortex sound field. The gradient helical acoustic structure 30 works as follows: because the propagation speeds of the ultrasonic sound waves in different media are different, namely the propagation speed in the liquid transmission medium is different from the propagation speed in the fixed medium, when the ultrasonic sound waves pass through the medium transmission columns 32a with different heights, the ultrasonic sound waves sequentially enter the liquid medium according to the height gradient of each medium transmission column 32a to realize extension emission, namely the ultrasonic sound waves pass through the medium transmission columns 32a with shorter heights and enter the liquid medium firstly, so that the phase difference is realized among the ultrasonic sound waves output by each medium transmission column 32a, and finally, the phase field of the ultrasonic sound waves is enabled to have 2m pi phase difference change around the central axis of the base 31 for one circle, namely, a phase difference change of 2m pi is finally obtained
Vortex sound field of order. When in use
And when the acoustic field is not less than 1, a first-order vortex acoustic field is obtained.
Referring to fig. 4, in one embodiment, the number of the medium-conveying guiding pillars 32a is eight, and the height of each medium-conveying guiding pillar 32a is sequentially
、
、
、
、
、
、
And
. Of course, the number of media transport pillars 32 may be increased or decreased depending on the actual cleaning requirements.
Referring to fig. 5, in another embodiment, the number of the medium-conveying pillars 32a is twelve, and the height of each medium-conveying pillar 32 is sequentially
、
、
、
、
、
、
、
、
、
、
And
。
in one embodiment, when the number of the medium conducting pillars 32a is nearly infinite, the heights of the adjacent medium conducting pillars 32a are close, i.e. a smooth transition connection is formed, and at this time, each medium conducting pillar 32a constitutes a spiral body spirally rising along the central axis direction of the base, and meanwhile, the spiral body can also generate a vortex sound field.
Referring to fig. 9, in one embodiment, the gradient spiral acoustic structure 30 includes a base 31 for connecting a single channel transducer and having a circular cross-section, and a plurality of dielectric conductive pillar sets 32b for transmitting a vortex acoustic field. The base 31 comprises a plurality of sector-shaped placing areas 31a which are equally arranged by taking the central axis of the base as the center, each medium conducting column group 32b is symmetrically arranged in the corresponding sector-shaped placing areas 31a by taking the central axis of the base 31 as the center, each medium conducting column group 32b comprises a plurality of conducting sub-columns 32b1, and the height of each conducting sub-column 32b1 in the axial direction of the base
And are sequentially increased in the circumferential direction of the base from the start position, wherein,
the height of the current conductor post 32b1,
the total number of conductive sub-pillars 32b1,
to the current rank of conductor post 32b1,
is a preset height. Here, each group of dielectric conductive pillar 32b corresponds to a first-order vortex sound field, and it can be understood that the number of the dielectric conductive pillar groups 32b is the same as the order of the vortex sound field.
Referring to fig. 9, in one embodiment, the base 31 includes four sectors 31a, the number of dielectric conductive pillar sets 32b is four, each dielectric conductive pillar set 32b includes three conductive sub-pillars 32b1, and the height of each conductive sub-pillar 32b1 in each sector 31a is sequentially the same as the height of each conductive sub-pillar 32b1 in the sector
、
And
。
in another embodiment, when the number of conductive sub-pillars 32b1 in the dielectric conductive pillar set 32b is close to infinity, the height of the adjacent conductive sub-pillars 32b1 is close, i.e., a smooth transition connection is formed, and each conductive sub-pillar 32b1 forms a spiral rising spirally along the central axis of the base, and the spiral can also generate a vortex sound field.
In one embodiment, each of the media-conveying pillars 32 is a resin-media-conveying pillar having a predetermined height range
. It can be understood that the transmission speed of the ultrasonic sound wave is different from transmission medium to transmission medium, and at the same time, the order of the vortex sound field is also influenced. Referring to fig. 6, fig. 6 is a schematic diagram showing the variation of the phase of the ultrasonic sound wave after passing through the guide pillars of the resin mediumIn the mass transfer guide column, when the height is preset
With =3.5mm, a one-step vortex sound field can be obtained.
In another embodiment, each dielectric conducting post 32 is a metal dielectric conducting post, and the preset height range of the metal dielectric conducting post is
. It can be understood that different transmission media meet different preset height ranges of the m-order vortex sound field.
In one embodiment, the acoustic frequency range of the single channel signal transmitter 10 is 200KHz or more and 100MHz or less. It is understood that the sound wave frequency of the single channel signal transmitter 10 may be 200KHz, 500 KHz, 1000 KHz, 1MHz, 2 MHz, 5MHz, 10 MHz, 20 MHz, 50 MHz, 75 MHz, 90 MHz, 100 MHz.
Referring to fig. 1, in one embodiment, the ultrasonic cleaning apparatus further includes a fixing frame 50, and the fixing frame 50 is suspended over the gradient spiral acoustic structure 30. It is understood that the holder 50 is used to mount the object to be cleaned, and when the object to be cleaned is placed on the holder 50, the surface to be cleaned is perpendicular to the ultrasonic wave emitting direction of the gradient helical acoustic structure 30, thereby obtaining a better cleaning effect.
The application also provides a cleaning method of the ultrasonic cleaning device, which comprises the following steps:
firstly, preprocessing an object to be cleaned;
immersing the object to be cleaned and the gradient spiral acoustic structural member of the ultrasonic cleaning device in a liquid cleaning medium, wherein the object to be cleaned is positioned right above the gradient spiral acoustic structural member of the ultrasonic cleaning device;
step three, the cleaning parameters are as follows: the cleaning time range is
(ii) a The cleaning temperature range is
(ii) a The sound wave frequency range of a single-channel signal emitter of the ultrasonic cleaning device is more than or equal to 200KHz and less than or equal to 100 MHz.
In one embodiment, the step of pre-treating the object to be cleaned includes cutting, grouping, and soaking in advance. For example, a copper sheet to be cleaned was cut into square pieces having a length by width of 3cm by 0.8cm, divided into a control group and a test group, and both the control group and the test group were immersed in sewage.
In one embodiment, the surface of the object to be cleaned is perpendicular, parallel or angled to the acoustic emission direction of the gradient helical acoustic structure of the ultrasonic cleaning apparatus. Since the vortex sound field generates a shearing force in a direction perpendicular to the emission direction, the cleaning effect is optimal when the surface of the object to be cleaned is perpendicular to the sound wave emission direction.
In one embodiment, the cleaning time range is
。
In one embodiment, the cleaning temperature range is
。
In one embodiment, the single channel signal emitter of the ultrasonic cleaning device has a sound wave frequency range of 1MHz or greater and 5MHz or less.
For example, referring to fig. 7, fig. 7 (a) is a schematic diagram of the glass sheet before being cleaned, and fig. 7 (b) is a schematic diagram of the glass sheet after being cleaned in the ultrasonic cleaning device for 10min at a cleaning temperature of 25 ℃, it can be seen that the surface of the cleaned glass sheet is smooth and flawless. Referring to fig. 8, fig. 8 (a) is a schematic diagram of the copper sheet before cleaning, and fig. 8 (b) is a schematic diagram of the copper sheet after cleaning for 2 hours in an ultrasonic cleaning device and at a cleaning temperature of 60 ℃, and it can be seen that the surface of the copper sheet has no traces of cavitation erosion before and after comparative cleaning.
The application also provides an application of the ultrasonic cleaning device, and the ultrasonic cleaning device is used for cleaning metal, optical elements and semiconductor materials. Because metal, optical elements and semiconductor materials all have high requirements on the smoothness and the flatness of the surfaces of the metal, optical elements and semiconductor materials, the conventional ultrasonic cleaning is easy to generate cavitation effect, so that the surface of the metal, optical elements and semiconductor materials is subjected to cavitation erosion.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. The ultrasonic cleaning device is characterized by comprising a single-channel signal transmitter for transmitting ultrasonic waves, a single-channel transducer for electrically connecting with the single-channel signal transmitter, a gradient spiral acoustic structure member arranged at the transmitting end of the single-channel transducer and used for generating a vortex sound field, and a water tank for containing a cleaning liquid medium, wherein the single-channel transducer and the gradient spiral acoustic structure member are both arranged in the water tank and are positioned below an object to be cleaned; the gradient spiral sound structure comprises a base which is used for being connected with the single-channel transducer and has a circular cross section and a plurality of medium transmission guide pillars which are used for transmitting vortex sound and have fan-shaped cross sections, the medium transmission guide pillars are arranged on the base in a uniformly distributed mode by taking the central axis of the base as the center, and the height of each medium transmission guide pillar along the axial direction of the base
And are sequentially increased in the circumferential direction of the base from the start position, wherein,
for the height of the medium conducting pillars at present,
the total number of each of the dielectric conducting pillars,
for the current rank of the medium conducting pillars,
the height of the air inlet pipe is preset,
is the order of the vortex sound field; or, the gradient spiral acoustic structure includes a base for connecting the single-channel transducer and a plurality of medium conduction column sets for transmitting a vortex sound field, the base includes a plurality of sector-shaped placing areas equally divided and arranged by taking the central axis of the base as a center, each of the medium conduction column sets is symmetrically arranged in the corresponding sector-shaped placing area by taking the central axis of the base as a center, each of the medium conduction column sets includes a plurality of conduction sub-columns, and each of the conduction sub-columns is along the height of the axial direction of the base
And are sequentially increased in the circumferential direction of the base from the start position, wherein,
to be the current height of the conductive sub-pillars,
the total number of each of the conductive sub-pillars,
for the current rank of the conductive sub-column,
is a preset height.
2. The ultrasonic cleaning device according to claim 1, wherein the number of the medium-conveying pillars is eight, and each of the medium-conveying pillarsThe height of the guide post is sequentially
、
、
、
、
、
、
And
。
3. the ultrasonic cleaning device according to claim 1, wherein the base comprises four sectors, the number of the dielectric conducting column sets is four, each dielectric conducting column set comprises three conductive sub-columns, and the height of each conductive sub-column in each sector is sequentially the same as the height of each conductive sub-column in each sector
、
And
。
4. the ultrasonic cleaning device according to claim 1, wherein each of the dielectric conducting pillars is a resin dielectric conducting pillar, and the predetermined height range of the resin dielectric conducting pillar is
。
5. The ultrasonic cleaning device according to claim 1, wherein the sound wave frequency range of the single channel signal transmitter is greater than or equal to 200KHz and less than or equal to 100 MHz.
6. The ultrasonic cleaning device according to claim 1, further comprising a holder for placing an object to be cleaned, wherein the holder is suspended directly above the gradient helical acoustic structure.
7. A cleaning method of an ultrasonic cleaning apparatus according to claim 1, characterized in that the cleaning method comprises the steps of:
pretreating an object to be cleaned;
immersing an object to be cleaned and a gradient spiral acoustic structure of the ultrasonic cleaning device in a liquid cleaning medium, wherein the object to be cleaned is positioned right above the gradient spiral acoustic structure of the ultrasonic cleaning device;
the cleaning parameters are as follows: the cleaning time range is
(ii) a The cleaning temperature range is
(ii) a The sound wave frequency range of a single-channel signal emitter of the ultrasonic cleaning device is more than or equal to 200KHz and less than or equal to 100 MHz.
8. Use of an ultrasonic cleaning device according to claim 1 for cleaning metals, optical elements and semiconductor materials.
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