CN110231064A - A kind of microflow sensor and its manufacturing system and method - Google Patents
A kind of microflow sensor and its manufacturing system and method Download PDFInfo
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/16—Measuring force or stress, in general using properties of piezoelectric devices
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- Organic Chemistry (AREA)
- Fluid Mechanics (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
A kind of microflow sensor of the present invention and its manufacturing system and method;The sensor includes the piezoelectric membrane as substrate, and the respectively arranged sensor electrode of tow sides of the microvillus array and piezoelectric membrane of piezoelectric membrane front or back is arranged in;Microvillus array can generate bending under the impact of gas or liquid;Substrate deformation caused by the villus of bending deformation in microvillus array is converted into electric signal output by piezoelectric membrane;Sensor electrode is used to detect the electric signal of piezoelectric membrane output.The method deposited by single tube probe Local electrochemical grows villus sensor array under the real-time monitoring and control microdisplacement actuator movement of control host on piezoelectric membrane.When array is impacted by microfluid different directions, its microvillus generates corresponding strain, the piezoelectric membrane of villus root is driven to generate miniature deformation, which generates micro voltage on piezoelectric membrane the two poles of the earth, carries out micrometeor detection by real-time monitoring micro voltage signal amplitude.
Description
Technical field
The present invention relates to micrometeor detection field, specially a kind of microflow sensor and its manufacturing system and method.
Background technique
Microflow sensor is as microfluid flow detection in fields such as bioscience, medicine using very extensive.At present
Detection for flow is all that the method for mechanical flow sensor detects, but this method is suitable only for flow and reaches certain
The detection of the gas or fluid flow of number of levels is similar to for fields such as biology and medicine, such as needing to detect
The method of the demand of the fine liquids such as biological Hemodynamic environment and flow flow or micro- gas flow, mechanical micrometeor detection is complete
It cannot meet the requirements.
Mainly there are following some methods for micrometeor context of detection at present:
(1) silicon micro mechanical flow sensor is to make certain micro-structure, micrometeor on silicon wafer by the method for MEMS
Not only outer dimension is small for sensor, can reach very low measurement magnitude, and dead zone capacity is small, and the response time is short, is suitable for micro-
The accurate measurement and control of fluid, in biological reagent flow measurement, flow cytometer, granule technology etc. have answers extensively
With;
(2) low-grade fever flow sensor is using temperature sensor measurement microfluid by generating temperature before and after microheater
The heat very challenging, fluid is taken away is thermally isolated between heater and sensing element to measure micrometeor in degree variation
Amount increases power consumption, in addition, heat flow transducer heats the fluid in microchannel, may will affect biomolecule in fluid
Activity and characteristic.Usually they are suitable for cleaning fluid, because impurity may change heat transfer property and lead to measurement error;
(3) mechanical flow sensor is interacted using the momentum and sensing device of fluid, and measurement is drawn by pulling force or pressure
The variation of the electrical parameter risen is the extraction of energy on this essence, i.e., it is measured flow energy conversion is mechanical energy
Flowing.In fact, it is to answer water flow by mechanical sense, this makes it less sensitive to small flow;
(4) micro-cantilever realizes flow sensor using resistance or pressure difference, when fluid orthogonal is flowed in micro-cantilever,
Its kinetic energy can make micro-cantilever generate bending, pass through the flow velocity of the available fluid of the flexural measurement of optics or electrical method.Though
A right direction micro-cantilever has very high sensitivity due to that efficiently can convert drag for fluid momentum, but due to
Fluid must flow vertically through substrate in this configuration, therefore installation direction has selectivity in practical applications.
(5) the quick flow sensor of minute-pressure, the sensor are made of two layers of silica and one layer of monocrystalline silicon varistor
From curved micro-cantilever flow sensor.The difference of different interlayer residual stress is bent outwardly micro-cantilever upon discharge, along table
The dynamic fluid of surface current generates impact and bending to micro-cantilever, and sensor, as sensing element, reads bending using varistor
Amount calculates micrometeor.But same its has selectivity to the direction of fluid.
In order to carry out the production of microflow sensor, it is necessary to carry out the molding of micro-structure using the method for minute manufacturing.
The subtraction manufacture of various photoetching processes is substantially molding that is two-dimensional, therefore not being suitable for complex three-dimensional structure.At present in gold
Belonging to the most mature method of increasing material manufacturing is selective laser melting (SLM) and electron-beam smelting (EBM), both technologies are by gold
The local fusing for belonging to particle forms solid material, and still, the minimum feature of powder fusion method is tens microns, by metal powder
It radiates in granular size and metal high limitation, is difficult to further increase molding precision;Directly writing (DIW) is one kind micro-
The mature technology deposited under metrical scale to multiple material there are certain requirements the liquid solution of writing, and be deposited
Structure need just to be able to satisfy Structural strength calls by special process;EHD prints (also referred to as e-jet printing)
A method of ink-jet or the injection of single drops out from nozzles, the technology based on Electrofluid Mechanics are mainly used in polymer, egg
The two dimension printing of white matter, silicon nanowires, carbon nanotube, the coarse patterns of metallic particles dispersion, has been set up gold in recent years
Metal nano-particle ink deposits the high-resolution deposition method of 2 and 3 dimensional organization, but this method is used for three-dimensional printing technology also
It is not overripened;Electrophoresis is the movement of charged particle under electric field action in a liquid, by adding metal ion in a liquid,
The method for carrying out assembling metal nanoparticle by electric field action local deposits;Plating is that one kind is widely used in industry and research
Technology, carry out surface electrochemistry reaction usually as a kind of method of homogenieity, cannot achieve 3D structure and heterogeneous
The molding of structure.
Summary of the invention
Aiming at the problems existing in the prior art, the present invention provides a kind of microflow sensor and its manufacturing system and side
Method can detect Tiny pore and fluid flow, all sensitive to multidirectional fluid motion, and the high sensitivity detected.
The present invention is to be achieved through the following technical solutions:
The micro- of piezoelectric membrane front or back is arranged in including the piezoelectric membrane as substrate in a kind of microflow sensor
The respectively arranged sensor electrode of the tow sides of villus array and piezoelectric membrane;
The microvillus array can generate bending under the impact of gas or liquid;
Substrate deformation caused by the villus of bending deformation in microvillus array is converted into telecommunications by the piezoelectric membrane
Number output;
The sensor electrode is used to detect the electric signal of piezoelectric membrane output.
Preferably, the piezoelectric membrane includes piezoelectric material film, and successively sprays the copper foil of gold plating and plating
Layer.
Preferably, the microvillus array includes several being deposited on piezoelectricity according to array arrangement and by Local electrochemical
Copper post on film;The range that copper post is deposited on piezoelectric membrane is grade, and copper post dimensional accuracy is nanoscale.
A kind of microflow sensor manufacturing system, using Local electrochemical deposition platform;The Local electrochemical deposition
Platform includes a micro-displacement Motion Control Platform and capillary probe;
The capillary probe is one in 2-5 microns of bottom end opening of capillary, and capillary is interior to be full of 0.05-
0.5M/LCuSO4Solution places a copper electrode in capillary;
The micro-displacement Motion Control Platform includes control host, connect with capillary probe and drives it in X, Y, Z
The microdisplacement actuator and DC power supply of three directions movement;The anode of DC power supply connects through current/voltage-converted amplifier
Copper electrode is connect, cathode connects the conductive substrates of sensor;Control the control terminal of the output end connection microdisplacement actuator of host;Electricity
The input terminal of stream/voltage converting amplifiers output end connection control host.
Preferably, microdisplacement actuator includes micro machine and piezoelectric ceramics locator, and micro machine completes micrometer resolution
Displacement movement, piezoelectric ceramics locator complete precision be nanoscale displacement movement.
Further, the motion range of microdisplacement actuator is grade, and kinematic accuracy is 0.2 nanometer.
A kind of microflow sensor production method, based on system described in above-mentioned any one comprising following steps,
Step 1, flatness is carried out to piezoelectric material film surface and finish is handled, as basic substrate;
Step 2, conductive sensor electrode is added respectively in the tow sides of base substrate;
Step 3, one layer of zinc, aluminium and alumin(i)um zinc alloy or gold are sprayed in the upper surface of base substrate by the method for metal spraying
Foil;
Step 4, one layer of copper foil or zinc foil are plated on goldleaf by electric plating method, obtains piezoelectric membrane 4;
Step 5, piezoelectric membrane is fixed on micro-displacement Motion Control Platform, micro-displacement Motion Control Platform controls capillary
Movement of the pipe probe in Z-direction, the interior CuSO for being full of 0.05-0.5M/L of capillary4Solution, by adding between copper electrode and substrate
It carries a DC power supply and carries out Local electrochemical deposition, Local electrochemical deposition copper post forms bionical micro- suede on piezoelectric membrane
Hair carries out the growth of microvillus antenna array control, obtains miniflow by control micro-displacement Motion Control Platform in the movement of XOY plane
Quantity sensor.
Preferably, in step 5, when carrying out Local electrochemical deposition, copper electrode inside capillary probe and as base
Apply DC voltage on the piezoelectric membrane at bottom, is wherein anode on copper electrode, the surface of conductive piezoelectric membrane is cathode, in sun
The extremely upper oxidation reaction that occurs forms copper ion, supplements the copper ion of capillary probe content, and reduction reaction shape occurs in cathode
Piezoelectric membrane surface is deposited at copper atom.
Preferably, in step 5, specific step is as follows for step 5:
Step 5.1, it is drawn by capillary of the bench to borate glass, forming tip inlets radius is 2-5
Micron capillary column probe;
Step 5.2, pass through CuSO4·5H20 crystal configuration concentration is the CuSO of 0.05-0.5M/L4Aqueous solution, by CuSO4
Aqueous solution pours into capillary probe content portion by filling needle;Due to the surface tension collective effect of gravity and liquid, opened at tip
Mouth forms one and a half months shape droplet;
Step 5.3, the copper conductor electrode that purity is 99.9999% is inserted into inside capillary probe and is used as copper electrode;
Step 5.4, using DC power supply, the copper electrode inside capillary probe is connected with dry cell anode, as sun
Pole;It will be connected after conductive piezoelectric membrane series connection ionic current/voltage converting amplifiers with dry battery cathode, as cathode;
Step 5.5, host control micro electric machine and piezoelectric ceramics locator driving capillary probe are controlled with 0.05-0.25 μ
The speed of m/s is detected to piezoelectric membrane surface, after semilune droplet and the contact of piezoelectric membrane surface, detects redox
Current break stops capillary probe movement at this time;
Step 5.6, keep semilune drop and piezoelectric membrane surface contact precondition under, with 0.05-0.25 μm/
The speed of s promotes capillary probe, since the Local electrochemical deposition of copper principle just forms micro- column structure of similar villus, when
It is lifted up probe with the speed greater than 0.5 μm/s, so that the semilune drop of probe tip and the copper post tip being deposited
Single villus is obtained after separation;
Step 5.7, by the micro machine and piezoelectric ceramics locator of mobile X and Y-direction, change capillary probe in piezoelectricity
Deposition position on film repeats step 5.5-5.6, until all array positions are correspondingly formed single villus, thus in piezoelectricity
In the grade range of deposition of film, microvillus array is formed;Wherein, the dimensional accuracy of single villus is nanoscale, and bottom is straight
Diameter is corresponding identical as the opening of capillary probe.
Preferably, the voltage of DC power supply is less than 1.2v.
Compared with prior art, the invention has the following beneficial technical effects:
The present invention passes through the method that single tube probe Local electrochemical deposits, in the real-time monitoring and control microbit of control host
It moves under actuator motions, villus sensor array is grown on piezoelectric membrane.When array is impacted by microfluid different directions
When, microvillus generates corresponding strain, and the piezoelectric membrane which will drive villus root generates miniature deformation, which exists
Piezoelectric membrane generates micro voltage on the two poles of the earth, carries out micrometeor detection by real-time monitoring micro voltage signal amplitude.
Microflow sensor of the present invention carries out bionical object villus array structure molding, sensor using local plating technology
Tiny pore and fluid flow can be detected.The microvillus array structure sensing of the bionical villus of microflow sensor production
Device can overcome the problems, such as that traditional microflow sensor is selective to the direction of fluid, to multidirectional fluid motion
High sensitivity that is all sensitive, and detecting.
Local electrochemical deposition platform of the present invention is adopted by the micro-displacement Motion Control Platform of production microvillus array of structures
With the micro machine of millimeter range and the piezoelectric ceramics locator of nano-precision, design is limited based on half-moon-shaped drop on platform
The technology of Local electrochemical deposition can produce range in grade, and precision is in nanoscale micro-structure.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of microflow sensor described in present example.
Fig. 2 is the moulding process flow process figure of microflow sensor described in present example.
Fig. 3 is the structure that Local electrochemical deposition platform described in present example carries out the printing of microvillus array structure
Schematic diagram.
In figure: 1 --- control host, 2 --- current/voltage-converted amplifier, 3 --- DC power supply, 4 --- piezoelectricity is thin
Film, 5 --- microvillus array, 6 --- microdisplacement actuator, 7 --- capillary probe, 8 --- CuSO4Solution, 9 --- copper electricity
Pole, 10 --- sensor electrode.
Specific embodiment
Below with reference to specific embodiment, the present invention is described in further detail, it is described be explanation of the invention and
It is not to limit.
A kind of microflow sensor of the present invention, the test problems of micrometeor are solved by bionical villus, can be multi-direction
Carry out micrometeor detection;Villus array is generated by the method for micro-pipe parcel plating based on the limitation of small semilune drop,
Micro- gas/liquid flow is carried out using bionical object villus perception principle to detect.
The present invention grows microvillus on piezoelectric membrane, through the method that micro- Local electrochemical deposits on piezoelectric membrane
Array structure, when that can generate bending under impact of the microvillus in gas or liquid, which will drive the pressure of microvillus root
Electric substrate generates micro- deformation, so that piezoelectric membrane generates micro- charge, formation micro voltage can by the amplitude of the voltage for micro- deformation meeting
To detect the size of micrometeor.
When low current sensor of the present invention is made, Local electrochemical deposition platform is depended on;The part electrification
Learning deposition platform includes a micro-displacement Motion Control Platform and capillary probe 7;
Micro-displacement Motion Control Platform includes tri- directions of motion of X, Y, Z, motion range 15mm, and kinematic accuracy is
0.2nm;Capillary probe 7 is one and is full of 0.05-0.5M/ in the capillary that bottom end opening is 2-5 microns of openings, capillary
The CuSO of L4Solution.The copper electrode 9 of a fine copper, the conducting surface substrate formed after substrate metal spraying and plating are placed in capillary
That is piezoelectric membrane 4 carries out local deposits by loading a DC power supply 3 between copper electrode 9 and substrate.
When preparing piezoelectric membrane 4, it is necessary first to smooth and surface smoothness is carried out to piezoelectric material film surface and is handled,
Its upper and lower surface respectively draws a sensor electrode 10;Secondly, spraying one layer of zinc, aluminium and alumin(i)um zinc alloy on its surface by metal spraying
Or goldleaf, the preferred thickness of foil are 10 microns;It is in one layer of preferred thickness of metal spraying electroplating surface finally by electric plating method
20-50 microns of copper or zinc layers of foil.
When preparing microflow sensor, micro-structured form is carried out by the method that 7 Local electrochemical of capillary probe deposits.
Its forming principle is by CuSO4Aqueous electrolyte pours into capillary probe 7,7 tip of capillary probe due to gravity and
The collective effect of surface tension forms one and a half months shape drop in capillary tip, the copper electrode 9 inside capillary probe 7
With apply DC voltage on the piezoelectric membrane 4 as substrate, wherein on copper electrode 9 be anode, conductive piezoelectric membrane 4 be yin
Pole occurs oxidation reaction on anode and forms copper ion, supplements the copper ion of 7 content of capillary probe, occurs also in cathode
Original reaction forms copper atom and is deposited on 4 surface of piezoelectric membrane.
Micro-displacement Motion Control Platform is using micro machine and piezoelectric ceramics locator collectively as driving element, i.e. micro-displacement
Actuator 6, micro machine complete the displacement movement of micrometer resolution, and piezoelectric ceramics locator completes nanoscale displacement movement,
Driving capillary probe 7 by control host 1 constantly driving micro machine and piezoelectric ceramics locator, opposite piezoelectricity is thin in z-direction
Film 4 moves, and can grow copper post and form microvillus, continuous moving long goes out copper post permutation structure and forms micro- suede in the x, y direction
Hair array.
A kind of microflow sensor of the invention, as shown in Figure 1 comprising the sensor electrode of the electric signal for detection
10, for the caused substrate deformation of villus shape bending to be converted into the piezoelectric membrane 4 of electric signal output, in gas or
Curved microvillus array 3 is generated under the impact of liquid;It is substrate with piezoelectric membrane 4, is arranged in substrate front surface or reverse side micro-
Villus array 3, the tow sides of piezoelectric membrane 4 are respectively arranged with sensor electrode 10.
The fabrication processing figure of microflow sensor of the present invention is as shown in Figure 2.
The specific implementation steps are as follows for it:
Step 1, flatness is carried out to piezoelectric material film surface and finish is handled, as basic substrate;
Step 2, conductive sensor electrode 10 is added respectively in the tow sides of base substrate;
Step 3,10 microns of a layer thickness of zinc, aluminium and aluminium zinc are sprayed in the upper surface of base substrate by the method for metal spraying
Alloy or goldleaf;
Step 4, copper foil or zinc foil that a layer thickness is 20-50 microns are plated on goldleaf by electric plating method, is obtained
To piezoelectric membrane 4;
Step 5, piezoelectric membrane 4 is fixed on micro-displacement Motion Control Platform, it is flat by control micro-displacement motion control
Platform is in the movement of Z-direction, and Local electrochemical deposition copper post forms bionical microvillus on piezoelectric membrane 4, by controlling microbit movement
Dynamic control platform carries out the growth of microvillus antenna array control, obtains microflow sensor in the movement of XOY plane.
In the present invention, in order to complete the molding to the microvillus array, using Local electrochemical deposition method come
Carry out shaping structures.It needs to draw microcapillary by bench to obtain capillary probe 7, be formed in capillary tip
One diameter is about 2-5 microns of opening, and the CuSO that concentration is about 0.05-0.5M/L is poured into inside capillary probe 74It is molten
Liquid forms the drop of one and a half months shape in capillary tip due to the collective effect of gravity and surface tension of liquid.In capillary
It is inserted into a pure copper electrode 9 inside probe 7, applies DC voltage between copper electrode 9 and conductive substrates, copper electrode 9 is sun
Pole, substrate are cathode, and reduction reaction can occur in substrate after semilune drop and substrate contact and form copper atom deposition
In substrate surface, oxidation reaction can occur in anode, copper resolves into copper ion and forms supplement in the solution.By controlling host 1
The microdisplacement actuator 6 of control micro electric machine and piezoelectric ceramics locator composition can form the micro-structure for being similar to biological villus
Array.
Specifically, in step 5, as the microvillus array structure of the microflow sensor core, growth control method
It is as follows:
Step 5.1, it is drawn by capillary of the bench to borate glass, forming tip inlets radius is 2-5
Micron capillary column probe 7;
Step 5.2, pass through (CuSO4·5H20) crystal configuration concentration is the CuSO of 0.05-0.5M/L4Aqueous solution, will
CuSO4Aqueous solution pours into 7 content portion of capillary probe by filling needle;Due to the surface tension collective effect of gravity and liquid,
Tip inlets form one and a half months shape droplet;
Step 5.3, the copper conductor electrode that purity is 99.9999% is inserted into inside capillary probe 7;
Step 5.4, using voltage < 1.2v DC power supply 3, this preferred embodiment uses dry cell;It will be in capillary probe 7
The copper electrode 8 in portion is connected with dry cell anode, as anode;The conductive series connection of piezoelectric membrane 4 ionic current/voltage conversion is put
It is connected after big device 2 with dry battery cathode, as cathode;
Step 5.5,1 control micro electric machine of host and piezoelectric ceramics locator driving capillary probe 7 are controlled with 0.05-0.25
μm/speed of s detects to 4 surface of piezoelectric membrane, after semilune droplet and 4 surface of piezoelectric membrane contact, detect oxidation
Reduction current mutation stops capillary probe 7 at this time and moves.Microdisplacement actuator and piezoelectric ceramics locator use three directions
Motion control, for controlling capillary probe 7 in the movement on vertical piezoelectric membrane surface and the movement of Z-direction, and in XOY plane
Interior translation;The control host 1 can use computer or host computer;
Step 5.6, in the case where keeping the precondition of drop and piezoelectric membrane 4, hair is promoted with the speed of 0.05-0.25 μm/s
Tubule probe 7, since copper principle deposition just forms micro- column structure of similar villus, when upward with the speed greater than 0.5 μm/s
Probe is promoted, so that obtaining single villus after the semilune drop of probe tip is separated with the copper post tip being deposited;
Step 5.7, by the micro machine and piezoelectric ceramics locator of mobile X and Y-direction, change capillary probe 7 and pressing
Deposition position on conductive film 4 repeats step 5.5-5.6, until all array positions are correspondingly formed single villus, thus in base
Plinth substrate range is to form microvillus array in 15*15 millimeters;Villus dimensional accuracy is nanoscale, and diameter is 2-5 microns, excellent
The length of choosing is 50 microns.
When microvillus array by different directions micro- gas or micro- liquid impact when, villus can be made to generate certain
Bending and vibration, the bending and vibration will cause 4 deformation of piezoelectric membrane as villus substrate, and then be converted into telecommunications
Number, the sensor electrode 10 by the way that 4 tow sides of piezoelectric membrane are arranged in draws the small electrical signals of detection, judges miniflow according to this
The size of amount.The small electrical signals of detection are amplified through current/voltage-converted amplifier.
As shown in figure 3, micro-displacement Motion Control Platform of the present invention comprising for microdisplacement actuator 6 into
The control computer 1 of row control, the current/voltage for detecting the variation of the micro-current in electroplating process convert amplifier 2, pass through
Microdisplacement actuator 6 promotes capillary probe 7, for providing the DC power supply 3 of plating, for growing microvillus array
5 piezoelectric membrane 4;The micro machine and piezoelectric ceramics locator that microdisplacement actuator 6 includes are for controlling capillary probe 7 in base
In bottom 15*15 millimeters of growth scope, copper post is grown having a size of nanoscale and grows precision.Wherein, piezoelectric membrane 4 also can
It is placed on the motion platform moved in XOY plane, throwing of the capillary on piezoelectric membrane is changed by the movement of motion platform
Shadow position;At least one can be moved in XOY plane for motion platform and capillary probe 7, reach setting accuracy.Piezoelectric ceramics
Locator is the actuator of Piezoelectric Driving, and precision is higher than micro machine.
The tip of capillary probe 7 is semilune microlayer model, for limiting the range of plating;Capillary probe 7 passes through machine
Tool device is connected and fixed with microdisplacement actuator 6, and the aqueous solution of copper sulphate is filled in capillary probe 7, for generate copper from
Son;Electron reduction is obtained into copper deposition on the surface of piezoelectric membrane 4 in cathode copper ion;Cupric electrolysis in anode, copper electrode 9 is
Copper ion supplements the copper ion in solution.
Claims (10)
1. a kind of microflow sensor, which is characterized in that including the piezoelectric membrane (4) as substrate, be arranged in piezoelectric membrane (4)
The microvillus array (3) of front or back and the respectively arranged sensor electrode of tow sides (10) of piezoelectric membrane (4);
The microvillus array (3) can generate bending under the impact of gas or liquid;
Substrate deformation caused by the villus of bending deformation in microvillus array (3) is converted into electricity by the piezoelectric membrane (4)
Signal output;
The sensor electrode (10) is used to detect the electric signal of piezoelectric membrane (4) output.
2. a kind of microflow sensor according to claim 1, which is characterized in that the piezoelectric membrane (4) includes pressure
Electric material film, and successively spray the copper foil layer of gold plating and plating.
3. a kind of microflow sensor according to claim 1, which is characterized in that the microvillus array (3) includes
It is several according to array arrangement and the copper post that is deposited on piezoelectric membrane (4) by Local electrochemical;It is deposited on piezoelectric membrane (4)
The range of copper post is grade, and copper post dimensional accuracy is nanoscale.
4. a kind of microflow sensor manufacturing system, which is characterized in that use Local electrochemical deposition platform;The part electricity
Chemical deposition platform includes a micro-displacement Motion Control Platform and capillary probe (7);
The capillary probe (7) is one in 2-5 microns of bottom end opening of capillary, and capillary is interior to be full of 0.05-0.5M/
LCuSO4Solution places a copper electrode (9) in capillary;
The micro-displacement Motion Control Platform include control host (1), connect with capillary probe (7) and drive its X, Y,
The microdisplacement actuator (6) and DC power supply (3) of tri- directions Z movement;The anode of DC power supply (3) turns through current/voltage
Amplifier (2) connection copper electrode (9) is changed, cathode connects the conductive substrates of sensor;The output end for controlling host (1) connects microbit
Move the control terminal of actuator (6);The input terminal of output end connection control host (1) of current/voltage-converted amplifier (2).
5. a kind of microflow sensor manufacturing system according to claim 4, which is characterized in that microdisplacement actuator (6)
Including micro machine and piezoelectric ceramics locator, micro machine completes the displacement movement of micrometer resolution, and piezoelectric ceramics locator is complete
It is nanoscale displacement movement at precision.
6. a kind of microflow sensor manufacturing system according to claim 4 or 5, which is characterized in that microdisplacement actuator
(6) motion range is grade, and kinematic accuracy is 0.2 nanometer.
7. a kind of microflow sensor production method, which is characterized in that based on being described in any one of claim 4-6
System comprising following steps,
Step 1, flatness is carried out to piezoelectric material film surface and finish is handled, as basic substrate;
Step 2, conductive sensor electrode (10) is added respectively in the tow sides of base substrate;
Step 3, one layer of zinc, aluminium and alumin(i)um zinc alloy or goldleaf are sprayed in the upper surface of base substrate by the method for metal spraying;
Step 4, one layer of copper foil or zinc foil are plated on goldleaf by electric plating method, obtains piezoelectric membrane 4;
Step 5, piezoelectric membrane (4) is fixed on micro-displacement Motion Control Platform, micro-displacement Motion Control Platform controls capillary
Movement of the pipe probe (7) in Z-direction, the interior CuSO for being full of 0.05-0.5M/L of capillary4Solution, by copper electrode (9) and substrate
Between one DC power supply (3) of load carry out Local electrochemical deposition, Local electrochemical deposits copper post shape on piezoelectric membrane (4)
It is raw to carry out microvillus antenna array control by control micro-displacement Motion Control Platform in the movement of XOY plane at bionical microvillus
It is long, obtain microflow sensor.
8. a kind of microflow sensor production method according to claim 7, which is characterized in that in step 5, carry out part
When electrochemical deposition, apply direct current on the copper electrode (9) of capillary probe (7) inside and the piezoelectric membrane (4) as substrate
Voltage is wherein anode on copper electrode (9), and the surface of conductive piezoelectric membrane (4) is cathode, and oxidation reaction occurs on anode
Copper ion is formed, the copper ion of capillary probe (7) content is supplemented, reduction reaction formation copper atom occurs in cathode and is deposited on
Piezoelectric membrane (4) surface.
9. a kind of microflow sensor production method according to claim 7, which is characterized in that in step 5, step 5
Specific step is as follows:
Step 5.1, it is drawn by capillary of the bench to borate glass, forming tip inlets radius is 2-5 microns
Capillary probe (7);
Step 5.2, pass through CuSO4·5H20 crystal configuration concentration is the CuSO of 0.05-0.5M/L4Aqueous solution, by CuSO4It is water-soluble
Liquid pours into capillary probe (7) content portion by filling needle;Due to the surface tension collective effect of gravity and liquid, opened at tip
Mouth forms one and a half months shape droplet;
Step 5.3, the copper conductor electrode that purity is 99.9999% is inserted into inside capillary probe (7) and is used as copper electrode (9);
Step 5.4, using DC power supply (3), the internal copper electrode (9) of capillary probe (7) is connected with dry cell anode, is made
For anode;Conductive piezoelectric membrane (4) series connection ionic current/voltage converting amplifiers (2) is connected with dry battery cathode afterwards, is made
For cathode;
Step 5.5, host (1) control micro electric machine and piezoelectric ceramics locator driving capillary probe (7) are controlled with 0.05-0.25
μm/speed of s detects to piezoelectric membrane (4) surface, after semilune droplet and piezoelectric membrane (4) surface contact, detect
Redox current mutation stops capillary probe (7) movement at this time;
Step 5.6, under the precondition for keeping semilune drop and the contact of piezoelectric membrane (4) surface, with 0.05-0.25 μm/s
Speed promote capillary probe (7), since the Local electrochemical deposition of copper principle just forms micro- column structure of similar villus,
When being lifted up probe with the speed greater than 0.5 μm/s, so that the semilune drop of probe tip and the copper post being deposited point
Single villus is obtained after the separation of end;
Step 5.7, by the micro machine and piezoelectric ceramics locator of mobile X and Y-direction, change capillary probe (7) in piezoelectricity
Deposition position on film (4) repeats step 5.5-5.6, until all array positions are correspondingly formed single villus, thus pressing
In the grade range of deposition of conductive film (4), microvillus array is formed;Wherein, the dimensional accuracy of single villus is nanoscale, bottom
Portion's diameter and the opening of capillary probe (7) are corresponding identical.
10. a kind of microflow sensor production method according to claim 7, which is characterized in that the electricity of DC power supply (3)
Pressure is less than 1.2v.
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