CN109675415A - A kind of high-efficiency high-density low temperature plasma generation preparing device - Google Patents
A kind of high-efficiency high-density low temperature plasma generation preparing device Download PDFInfo
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- CN109675415A CN109675415A CN201910015104.2A CN201910015104A CN109675415A CN 109675415 A CN109675415 A CN 109675415A CN 201910015104 A CN201910015104 A CN 201910015104A CN 109675415 A CN109675415 A CN 109675415A
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- Prior art keywords
- preparing device
- low temperature
- plasma
- metal component
- temperature plasma
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/50—Carbon oxides
- B01D2257/504—Carbon dioxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/91—Bacteria; Microorganisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention discloses a kind of high-efficiency high-density low temperature plasmas, and preparing device occurs, it is multilayer chamber structure that preparing device, which occurs, for the gas ions, for gaseous medium to be generated plasma, exterior thereto is equipped with plasma generator, plasma generator metal device is as surface plasmon resonance part, it is delivered in gas ions generation preparing device to reaction gas by conveying device, gas ions occur to be disposed with the photon amplification metal component connecting with plasma generator in preparing device by inlet end to exhaust end, photon decouples metal component and light reaction metal component, wherein, carbonado coating is attached on the inner wall of at least one metal component, or other coatings are selected according to different application scene.The plasma occurs low-energy-consumption high-efficiency low temperature plasma of the preparing device for treatment fluid medium and preparing device occurs, preparing device can allow to have improved treatment effect while energy-efficient, and reduce the entire ventilating system entirety energy consumption of cooperation in unison.
Description
Technical field
The present invention relates to the technical field handled with plasma technology fluid, and in particular to a kind of high-efficiency high-density
Preparing device occurs for low temperature plasma.
Background technique
A variety of applications of various methods and the plasma that plasma generates are known in the art.
It is known in the art to be sterilized by gaseous medium described in corona treatment to gaseous medium, wherein using described
Plasma destroys flcating germ and chemical toxicant.Certain volatile organic compounds can be for example destroyed using these methods
(VOC), especially long-chain VOC, toxicity two dislike because and fine particle effective degradation.
It is also known in the art to be sterilized using corona discharge plasma to gaseous medium, especially to short chain VOC, example
Such as carbon dioxide, to strong streptomycin, such as two dislike because degradation, effective degradation of degradation and fine particle to oil smoke.
The clarifier being currently known has the sterilization effect realized insufficient, low efficiency, the high disadvantage of energy consumption, especially pair
Certain micro-organisms and toxin (such as short chain VOC)
Summary of the invention
It is an object of the present invention to overcome defect present in existing lower temperature plasma technology, provide a kind of for locating
Preparing device occurs for the low-energy-consumption high-efficiency low temperature plasma for managing fluid media (medium), which (can consume few energy-efficient
Energy) while allow to have improved (reinforcing) treatment effect, and the entire ventilation for reducing cooperation in unison is (outer
Wind-force) system entirety energy consumption.Particularly, this purpose include can be by the synthesis of molecule and decomposition, biological structure (such as albumen
Matter, pollen, spore, bacterium or virus) inactivation or broken, short chain VOC, the degradation of strong streptomycin and fine particle it is effective
Degradation.
The mesh of sufficiently cleaned up pollution sources may be implemented by low energy consumption, high efficiency, high density low temperature plasma in the present invention
Mark.
The technical scheme is to design a kind of high-efficiency high-density low temperature plasmas, and preparing device, the ion occurs
It is multilayer chamber structure that preparing device, which occurs, for body, and for gaseous medium to be generated plasma, exterior thereto is equipped with plasma
Device, plasma generator metal device as surface plasmon resonance part, to reaction gas by convey device be delivered to from
Daughter occurs in preparing device, and gas ions occur to be disposed in preparing device by inlet end to exhaust end to be connected with plasma generator
Photon amplification metal component, photon decoupling metal component and the light reaction metal component connect.
Preferred technical solution is that the gaseous medium includes air or molecule, biomolecule, microorganism and its any group
It closes.
Preferred technical solution is in addition, the plasma includes excited molecule, free radical, ion, free electron photon
And any combination thereof
Preferred technical solution is applied on the electrodes in addition, in the chamber interior at least provided with an electrode
Voltage or high voltage.
Preferred technical solution is in addition, photon amplification metal component is the transmittance plate equipped with uniform and equidistant perforation
Grid and/or diffraction grating are attached with carbonado coating or fullerene coated or nickel coating etc. on the surface of the grid.
Further preferred technical solution is in addition, be equipped with insulating component, the chamber shape at the both ends of the metal component
At between metal component and insulating component and the exhaust chamber made of insulating component, hang down with gaseous medium circulating direction
It is uniformly distributed by several ventholes on straight metal component and insulating component, be additionally provided on metal component several it is equally distributed
Spray point.
Further preferred technical solution is in addition, be equipped with cylinder at the center of chamber interior photon amplification metal component
The web plate of structure is attached with carbonado coating or fullerene coated or nickel coating etc. on the surface of the web plate.
Further preferred technical solution is in addition, be evenly equipped with several root diameters to electric discharge on the surface of the cylindrical structure web plate
Needle.
Further preferred technical solution on the metal component in addition, be loaded with the electromagnetic oscillation wave of periodic vibration.
Further preferred technical solution is in addition, pass through insulated connecting piece and spiral shell between the metal component and insulating component
Nail is connected with each other.
The advantages and beneficial effects of the present invention are: preparing device, which occurs, for the high-efficiency high-density low temperature plasma has
While energy-efficient (consuming a small amount of energy), and entire ventilation (outer wind-force) system for reducing cooperation in unison is whole
Energy consumption allows to have improved (reinforcing) treatment effect.Particularly, this purpose include can by the synthesis of molecule and point
Solution, biological structure (such as protein, pollen, spore, bacterium or virus) inactivation or broken, short chain VOC, strong streptomycin degradation, with
And fine particle effective degradation the effect of.
The internal metallic material of the preparing device has selected copper (other metal materials are optional according to different application scene), existing
There is the reaction for biasing toward and being explained when air or liquid pass through preparing device in technology, but the present invention can increase metal sheet
Body generates application principle and the effect of phasmon after the instantaneous pressure energy by obtaining high-tension current.In the preparing device,
In addition to point discharge (corona-type electric discharge generates energy, punctures air, so that outside the breakdown generation plasma of gaseous material), also
There is the cooperation of many inserted sheets and annulus with holes and needle point, increase metallic area, also increases electronic collection oscillation,
It is exactly phasmon, generates surface plasma body resonant vibration, the free electron air mass for being present in metal inside becomes bulk plasmon,
The free electron air mass for being present in metal surface is known as surface plasma.In this way, a part of light quantum is stored in phasmon
In, it can re-emit in the form of light, another part light quantum then can decay to form electron-hole pair.These high energy
Hot carrier can produce many photochemical reactions.Most important pollution degradation is exactly to be generated using phasmon nano particle
Hot carrier can reduce chemical reaction activated energy barrier.To trigger the reaction that conventional heat activity mechanics is not supported.It should
Structure inside preparing device is high-energy, efficient generation (low temperature) plasma.The clarifier can be improved short chain VOC
The destruction of (such as carbon dioxide, carbon monoxide), the degradation of strong streptomycin (such as two dislike because) and effective drop of fine particle
Solution.In general the VOC of short-chain structure, strong streptomycin are very strong molecular structures, are to be not enough to destroy without enough efficiency
Its structure.
The clarifier can be plasma chamber, and the gaseous medium stream into the plasma chamber enters according to this
The clarifier of invention.Gaseous medium can be gaseous medium to be processed, or for handling other gaseous medium, liquid, consolidating
The gaseous medium of body, surface or any combination thereof.In addition, plasma generates clarifier particularly including for generating electromagnetic radiation
Generator, the frequency of the electromagnetic radiation is radio-frequency region to microwave range.Dielectric structure according to the present invention is formed, so that
Plasma can be conveyed in the inside configuration and along the structure.Particularly, it can control excimer amplitude in surface etc..It is special
Not, such structure with arbitrary cross section can be constructed.In the context of this application, it is believed that plasma is gas
And/or steam, the gas and/or steam are separated into its component under the influence of electric fields.Therefore, plasma include photon,
Free electron, ion, free radical and neutral particle (being especially excited neutral particle) and other ingredients.Such plasma
The preferred low temperature plasma of body.Particularly, the degree of ionization of such plasma is less than 10%, and preferably smaller than 5%, it is more excellent
Choosing is less than 3%, and more preferably less than 1.5%.
Detailed description of the invention
Fig. 1 is the air inlet side explosive view that preparing device occurs for high-efficiency high-density low temperature plasma of the present invention；
The exhaust side explosive view of preparing device occurs for Fig. 2 high-efficiency high-density low temperature plasma of the present invention.
Fig. 3 is the cylindrical structure web plate expanded view that preparing device occurs for high-efficiency high-density low temperature plasma of the present invention；
Fig. 4 is the gaseous medium input end-view that preparing device occurs for high-efficiency high-density low temperature plasma of the present invention；
Fig. 5 is the gaseous medium output end-view that preparing device occurs for high-efficiency high-density low temperature plasma of the present invention；
Fig. 6 is the figure that photon amplification metal component in preparing device occurs for high-efficiency high-density low temperature plasma of the present invention
Piece；
Fig. 7 is the picture that light reaction metal component in preparing device occurs for high-efficiency high-density low temperature plasma of the present invention；
Fig. 8 is the figure that photon decoupling metal component in preparing device occurs for high-efficiency high-density low temperature plasma of the present invention
Piece.
In figure: 1, chamber；2, ion generator；3, inlet end；4, exhaust end；5, photon amplifies metal component；5.1, thoroughly
Penetrate grid；5.2, diffraction grating；6, photon decouples metal component；7, light reaction metal component；8, insulating component；9, discharge chamber
Room；10, venthole；11, spray point；12, web plate；13, insulated connecting piece；14, screw.
Specific embodiment
With reference to the accompanying drawings and examples, further description of the specific embodiments of the present invention.Following embodiment is only
For clearly illustrating technical solution of the present invention, and not intended to limit the protection scope of the present invention.
As shown in Fig. 1~8, the present invention is a kind of high-efficiency high-density low temperature plasma generation preparing device, the ion
Body occurs preparing device and is equipped with plasma outside chamber 1 for gaseous medium to be generated plasma for multilayer chamber structure
Device 2, the metal device on plasma generator pass through conveying device conveying to reaction gas as surface plasmon resonance part
Occur in preparing device to gas ions, plasma occurs to be disposed with by inlet end 3 to exhaust end 4 and plasma in preparing device
Photon amplification metal component 5, photon decoupling metal component 6 and the light reaction metal component 7 that generator 2 connects.
The preferred embodiment of the invention is, the gaseous medium include air or molecule, biomolecule, microorganism and its
Any combination.
The preferred embodiment of the invention is in addition, the plasma includes excited molecule, free radical, ion, freely electricity
Sub-light and any combination thereof
The preferred embodiment of the invention in addition, set inside the chamber 1 there are two electrode, respectively electric discharge anode and
Discharge cathode, is applied with voltage or high voltage on the electrodes.Each group of unit component of internal chamber has all used this
The electric discharge of corona-type known to field, magnetic charging or glow discharge generate plasma.
The preferred embodiment of the invention is in addition, photon amplification metal component 5 is equipped with uniform and equidistant perforation
Transmission grid 5.1 and/or diffraction grating 5.2, be attached with carbonado coating or fullerene on the surface of the grid and apply
Layer or nickel coating etc..
Further preferred embodiment of the present invention in addition, the both ends of the metal component be equipped with insulating component 8, it is described
Chamber 1 is formed between metal component and insulating component 8 and the exhaust chamber 9 made of insulating component 8, with gaseous medium
It is uniformly distributed by several ventholes 10 on circulating direction vertical metal component and insulating component, it is additionally provided on metal component several
The equally distributed spray point 11 of root.
Further preferred embodiment of the present invention is in addition, at the center of 1 internal photon of chamber amplification metal component 5
Web plate 12 equipped with cylindrical structure is attached with carbonado coating on the surface of the web plate 12 or fullerene coated or nickel applies
Layer etc..
Further preferred embodiment of the present invention is in addition, be evenly equipped with several on the surface of the cylindrical structure web plate 12
Radial spray point 11.
Further preferred embodiment of the present invention on the metal component in addition, be loaded with the electromagnetism shake of periodic vibration
Swing wave.
Further preferred embodiment of the present invention between the metal component and insulating component 8 by insulation in addition, connected
Fitting 13 and screw 14 are connected with each other.
The internal chamber includes fine, largely, wide, the uniform component layout of spacing.Partial component includes
The photon energy enlarged structure of uniform and equidistant perforation.Internal component can increase according to the actual situation diamond coatings with
Continue growing the quantity of photon in plasma.
All component designs allow a large amount of gas without hindrance can pass through this generation preparing device with smooth.It is being located at front and back
Internal chamber 1 because of internal different member arrangements, when passing through each chamber 1 can with maximum area and plasma
Body reacts.
In general, herein and full text is understood, especially need to consider in terms for the treatment of effect to coexist in etc. from
Three active species in daughter are as follows:
1), electric power is derived from ion, electronics or excited molecule
2), photon, especially UV photon or the full spectral radiance of UV
3), compound is often referred to pollutant, such as reactive chemical species (especially free radical), flcating germ and chemistry
Toxin (especially VOC, pollen, bacterium, spore or virus), fine particle refer to that aerodynamics equivalent diameter is small in surrounding air
In the particulate matter for being equal to 2.5 microns.
Metal material used in internal chamber, for surface plasmon resonance collaboration processing to occur.Surface plasma
The wavelength of body excimer is exactly the cycle of oscillation of metal surface electronics, therefore this preparing device processes various periodic modulations in metal surface
Structure, to realize the control to surface plasmon resonance amplitude.
Peripheral shell is evenly distributed using multiple round holes to be covered with, to realize zero windage.Apparent size design can be with
The air filter of Shi Suiyi substitution existing market ventilating system.
Interior section grating member is related to the principle application that grating principle includes transmission grating and diffraction grating.Component master
It is dynamic to intervene and the wavelength of photon and the resonance amplitude of surface phasmon in control plasma.
The present invention combines the known technology main points of related every field, rationally pacifies in the technological design inside preparing device
Row, becomes the generation preparing device of the highdensity low temperature plasma of completely new ultrahigh energy efficiency.
Plasma particularly including excited molecule, free radical, ion, free electron, photon and any combination thereof.
The present invention also illustrates present apparatus internal structure certainly other than in processing gaseous medium generation plasma
Body ontology can also generate surface plasmon resonance as metal medium.
Meanwhile the internal structure of this preparing device expands photon numbers in plasma using the principle of optical device grating,
And radiation pattern is that three-dimensional is uniformly distributed to greatly improve this preparing device working efficiency.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvements and modifications can also be made, these improvements and modifications
Also it should be regarded as protection scope of the present invention.
Claims (10)
1. preparing device occurs for a kind of high-efficiency high-density low temperature plasma, which is characterized in that preparing device occurs for the gas ions
For multilayer chamber structure, for gaseous medium to be generated plasma, exterior thereto is equipped with plasma generator, and plasma occurs
Device metal device is delivered to gas ions generation preparing device by conveying device as surface plasmon resonance part, to reaction gas
Interior, gas ions occur to be disposed with the photon amplification gold connecting with plasma generator in preparing device by inlet end to exhaust end
Metal elements, photon decoupling metal component and light reaction metal component.
2. preparing device occurs for high-efficiency high-density low temperature plasma as described in claim 1, which is characterized in that the gaseous state
Medium includes air or molecule, biomolecule, microorganism and any combination thereof.
3. preparing device occurs for high-efficiency high-density low temperature plasma as described in claim 1, which is characterized in that it is described it is equal from
Daughter includes excited molecule, free radical, ion, free electron photon and any combination thereof.
4. preparing device occurs for high-efficiency high-density low temperature plasma as described in claim 1, which is characterized in that in the chamber
Chamber interior is applied with voltage or high voltage at least provided with an electrode on the electrodes.
5. preparing device occurs for high-efficiency high-density low temperature plasma as described in claim 1, which is characterized in that the photon
Amplify metal component be transmission grid and/or diffraction grating equipped with uniform and equidistant perforation, it is attached on the surface of the grid
Have carbonado coating or fullerene coated or nickel coating.
6. preparing device occurs for high-efficiency high-density low temperature plasma as claimed in claim 5, which is characterized in that in the gold
The both ends of metal elements are equipped with insulating component, and the chamber is formed between metal component and insulating component and by insulating component system
At exhaust chamber, it is uniformly distributed by several ventilations on the metal component and insulating component vertical with gaseous medium circulating direction
Hole is additionally provided with several equally distributed spray points on metal component.
7. preparing device occurs for high-efficiency high-density low temperature plasma as claimed in claim 6, which is characterized in that in the chamber
The center that chamber interior photon amplifies metal component is equipped with the web plate of cylindrical structure, is attached with carbonado on the surface of the web plate
Coating or fullerene coated or nickel coating.
8. preparing device occurs for high-efficiency high-density low temperature plasma as claimed in claim 7, which is characterized in that in the circle
The surface of barrel structure web plate is evenly equipped with several root diameters to spray point.
9. preparing device occurs for high-efficiency high-density low temperature plasma as claimed in claim 8, which is characterized in that in the gold
The electromagnetic oscillation wave of periodic vibration is loaded on metal elements.
10. preparing device occurs for high-efficiency high-density low temperature plasma as described in claim 1, which is characterized in that the gold
It is connected with each other between metal elements and insulating component by insulated connecting piece and screw.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910015104.2A CN109675415A (en) | 2019-01-08 | 2019-01-08 | A kind of high-efficiency high-density low temperature plasma generation preparing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910015104.2A CN109675415A (en) | 2019-01-08 | 2019-01-08 | A kind of high-efficiency high-density low temperature plasma generation preparing device |
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| Publication Number | Publication Date |
|---|---|
| CN109675415A true CN109675415A (en) | 2019-04-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910015104.2A Pending CN109675415A (en) | 2019-01-08 | 2019-01-08 | A kind of high-efficiency high-density low temperature plasma generation preparing device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115121095A (en) * | 2021-03-24 | 2022-09-30 | 湖北湛澜环保科技有限公司 | MRTO magnetic control medium-temperature plasma VOCs digestion device, system and process |
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|---|---|---|---|---|
| JPH07265654A (en) * | 1994-03-31 | 1995-10-17 | Hitachi Zosen Corp | Plasma producing method in plasma-process waste gas purifying device |
| WO1997024515A1 (en) * | 1995-12-28 | 1997-07-10 | Seondo Electric Co., Ltd. | Method and apparatus for cleaning exhaust gas and reducing noise by using high voltage electric field |
| CN103338839A (en) * | 2010-09-02 | 2013-10-02 | 琼-米歇尔·博杜安 | Device and method for the treatment of a gaseous medium and use of the device for the treatment of a gaseous medium, liquid, solid, surface or any combination thereof |
| CN103949131A (en) * | 2014-05-08 | 2014-07-30 | 上海兰宝环保科技有限公司 | Photochemistry coupling low-temperature plasma waste gas treatment device |
| CN105817125A (en) * | 2016-05-27 | 2016-08-03 | 常州大恒环保科技有限公司 | Device for producing plasmas through multi-channel dielectric barrier discharging |
-
2019
- 2019-01-08 CN CN201910015104.2A patent/CN109675415A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07265654A (en) * | 1994-03-31 | 1995-10-17 | Hitachi Zosen Corp | Plasma producing method in plasma-process waste gas purifying device |
| WO1997024515A1 (en) * | 1995-12-28 | 1997-07-10 | Seondo Electric Co., Ltd. | Method and apparatus for cleaning exhaust gas and reducing noise by using high voltage electric field |
| CN103338839A (en) * | 2010-09-02 | 2013-10-02 | 琼-米歇尔·博杜安 | Device and method for the treatment of a gaseous medium and use of the device for the treatment of a gaseous medium, liquid, solid, surface or any combination thereof |
| CN103949131A (en) * | 2014-05-08 | 2014-07-30 | 上海兰宝环保科技有限公司 | Photochemistry coupling low-temperature plasma waste gas treatment device |
| CN105817125A (en) * | 2016-05-27 | 2016-08-03 | 常州大恒环保科技有限公司 | Device for producing plasmas through multi-channel dielectric barrier discharging |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115121095A (en) * | 2021-03-24 | 2022-09-30 | 湖北湛澜环保科技有限公司 | MRTO magnetic control medium-temperature plasma VOCs digestion device, system and process |
| CN115121095B (en) * | 2021-03-24 | 2023-04-25 | 湖北湛澜环保科技有限公司 | MRTO magnetic control medium-temperature plasma VOCs digestion device, system and process |
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Application publication date: 20190426 |