CN109668906A - It is a kind of for measuring the measurement method and device of optical film layer laser damage threshold - Google Patents
It is a kind of for measuring the measurement method and device of optical film layer laser damage threshold Download PDFInfo
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- CN109668906A CN109668906A CN201910095088.2A CN201910095088A CN109668906A CN 109668906 A CN109668906 A CN 109668906A CN 201910095088 A CN201910095088 A CN 201910095088A CN 109668906 A CN109668906 A CN 109668906A
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- film layer
- optical film
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- laser
- optical
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
Abstract
For film layer laser damage threshold measurement in the prior art, there are biggish subjective factors, lead to the film layer laser damage threshold inaccuracy of measurement, the present invention provides a kind of for measuring the measurement method and device of optical film layer laser damage threshold, and the measuring beam of light output system output is divided into identical two light beams by beam splitter device；It is therein a branch of to be input in the beam quality diagnostic system for writing light beam intensity；Another light beams are radiated on optical film layer；When this is radiated at the threshold value that the beam intensity on optical film layer meets or exceeds film layer damage, the spectral line with optical film layer base metals then is received in the optical information acquisition device, the threshold value of the damage of the optical film layer is determined according to beam energy, the spot diameter in beam quality diagnostic system.The present invention greatly improves the accuracy of optical film layer laser damage threshold measurement.
Description
Technical field
The present invention relates to optical film layer laser damage threshold fields of measurement, and in particular to one kind is based on laser-induced breakdown light
The optical film layer laser damage threshold method for automatic measurement of spectrum and the device of application this method.
Background technique
In the laser system of high power or high-energy, it usually needs using the optical element of different function, as high reflective mirror,
Anti-reflection mirror etc..This just needs to plate the dielectric film or metal film of layer of transparent in optical element substrate, to change material
The transmission and reflection characteristic on surface.The maximum power or energy that the resisting laser damage performance and optical system of optical film layer are able to bear
Measure closely related, laser damage threshold almost has become the indispensable performance indicator of optical film layer at present.
In order to evaluate the resisting laser damage ability of optical film layer, test side of the domestic and international many researchers to laser threshold
Method has conducted extensive research, including microscopic observation method, photo-thermal optoacoustic method, scanning electron microscope method, interferometry, holographic probe method, etc. from
Daughter flicker method etc..It is usually to be differentiated by micro- sem observation to the differentiation of film layer damage in these measurement methods, no
Microscope type used in same method is also different, and enlargement ratio also has very big difference, and different operator's film layers
The discrimination standard of damage also has difference, and there are larger subjective factors, this results in the measurement error of film layer laser damage threshold.
Summary of the invention
For film layer laser damage threshold measurement in the prior art, there are biggish subjective factors, lead to the film layer of measurement
Laser damage threshold inaccuracy, the present invention provides a kind of for measuring the measurement method and dress of optical film layer laser damage threshold
It sets.Measurement method of the present invention is simple, excludes subjective factor, keeps measurement result more accurate.
In order to solve the above-mentioned technical problem, the technical solution adopted by the present invention is that: one kind is for measuring optical film layer laser
The measurement method of damage threshold, its technical solution is that: the measuring beam that laser output system is exported is filled by beam splitter
It sets and is divided into identical two light beams；A branch of beam quality diagnostic system being input to for writing light beam intensity therein
In；Another light beams are radiated on optical film layer；Film layer damage is met or exceeded when this is radiated at the beam intensity on optical film layer
The threshold value of wound then receives the spectral line with optical film layer base metals in the optical information acquisition device, is examined according to beam quality
Beam energy, spot diameter in disconnected system determine the threshold value of the damage of the optical film layer.
A kind of measuring device using the above method, its technical solution is that: including being surveyed for exporting for film layer
The laser output system of light beam is measured, the optical film layer of laser output system side is set and is arranged in the optical film layer other side
Optical information acquisition device, further include the beam splitter device being arranged between laser output system and optical film layer, light beam matter
Amount detection systems and information processing system；
Wherein, the measuring beam that laser output system exports is divided into two bundles identical light beam by beam splitter device,
Wherein light beam is incident on beam quality diagnostic system, and another light beams are incident on the surface of optical film layer；The optical film layer
The other side be provided with optical information acquisition device；Information processing system acquires the information in optical information acquisition device, is believed according to light
The output energy for ceasing the optical film layer spectrum line traffic control laser output system in acquisition device increases or stops.
The beneficial effects of the present invention are: the measuring beam that the present invention is exported laser output system by beam splitter device
It is divided into two bundles identical light beam, wherein light beam is incident on beam quality diagnostic system, and another light beams are incident on light
The surface for learning film layer, to be monitored automatically to the degree of impairment that optical film layer receives.The optical information acquisition device pair
Plasma resonance optical signal is sensitive, moment can occurs in plasma and quickly capture to optical signal；Pass through institute simultaneously
Information processing system control laser output is stated, while acquiring laser beam information, quickly calculates optical film layer laser damage automatically
Hurt threshold value.The present invention fully relies on instrument and optical film layer damage is measured and calculated, and eliminates the influence of subjective factor, pole
The big accuracy for improving the measurement of optical film layer laser damage threshold, has in optical film layer laser damage threshold fields of measurement
Very important application prospect.
Detailed description of the invention
Fig. 1 is system block diagram of the invention.
It should be clear that: the part in dotted line frame in Fig. 1 is a unit module, such as laser parameter adjuster
101, Nd:YAG pulse laser 102, frequency-doubling crystal 103, beam expanding lens 104 constitute laser output system 100.
It should be clear that: the dotted line with arrow in Fig. 1 indicates that light beam, arrow indicate the direction of propagation of light beam.
Specific embodiment
Below in conjunction with the accompanying drawings and specific embodiment, the present invention is described in further details.
As shown in Figure 1, of the present invention measure 900 damage from laser of optical film layer based on laser induced breakdown spectroscopy
The self-operated measuring unit of threshold value, the system include laser output system 100, beam attenuation system 200, beam splitter device 300,
Beam quality diagnostic system 400, sample mobile control platform 500, optical information acquisition device 600, information processing system 800, arteries and veins
Rush delay time generator 700.
The laser output system 100, including laser parameter adjuster 101, Nd:YAG pulse laser 102, frequency multiplication are brilliant
Body 103, beam expanding lens 104, can be arranged by laser parameter adjuster 101 the initial output energy of Nd:YAG pulse laser 102,
The parameters such as frequency, 102 launch wavelength of Nd:YAG pulse laser are the laser beam of 1064nm, and laser beam can pass through frequency-doubling crystal
103 obtain the laser (frequency-doubling crystal is selected according to actual needs) that wavelength is 532nm, 355nm, can be to variety classes optical film
Layer 900 measures；Laser reduces its angle of divergence by beam expanding lens 104, to obtain the better laser beam of directionality.
The beam attenuation system 200 is connect with information processing system 800, and information processing system 800 can be according to optical film
Layer degree of impairment automatically adjusts beam attenuation system, if optical film layer is in spectrum to detect substrate member there is no damage
Plain (Si) spectral line, then information processing system 800 automatically adjusts beam attenuation system 200, improves laser and exports energy, until optics
It is to detect base metals (Si) spectral line in spectrum that damage, which occurs, for film layer 900, and information processing system 800 adjusts beam attenuation immediately
System 200 is exported to laser is stopped.
The beam splitter device 300 includes 301, total reflection mirrors 302 of a beam splitter and two condenser lenses
303,304, laser beam is divided into two bundles identical light beam by beam splitter device 300, and wherein beam of laser is incident on light beam
Quality diagnosis system 400, another beam laser light incident to 900 surface of optical film layer.
The beam quality diagnostic system 400 includes energy measuring apparatus such as energy meter and spot size measuring device such as light
Spot analyzer adjusts beam quality diagnostic system 400 and three-dimensional mobile example platform 502, makes to be incident on beam quality diagnostic system
400 light beam and the light beam energy having the same and spot size for being incident on 900 surface of optical film layer, in measurement process
Light beam carry out real-time monitoring；The beam quality diagnostic system 400 is connect with information processing system 800, and beam quality is examined
Disconnected parameter is real-time transmitted to information processing system 800, so that information processing system 800 is to optical film layer damage threshold relevant parameter
Carry out processing calculating.The 900 damage threshold calculation method of optical film layer are as follows: Fth=4E/ π d2；Wherein E is laser energy, and d is
Spot diameter, FthUnit is J/cm2。
The information processing system 800 can be computer system, and the software for handling data is arranged inside, passes through
It is connect with beam quality diagnostic system 400, for acquiring beam information, while obtaining spectral information from Spectrum software, it can
Processing analysis is carried out to information collected；The information processing system 800 is also connect with beam attenuation system 200, Neng Gougen
Judge whether to need to improve laser output energy according to whether there is base metals (Si) spectral line in gained spectral information.
The mobile control platform 500 of the sample includes driving system of stepping motor 501, three-dimensional mobile example platform 502, is used for
Change the irradiation position of optical coating eyeglass.Wherein driving system of stepping motor 501 is connect with computer, adjusts three-dimensional move in real time
The horizontal position of dynamic sample stage 502；Three-dimensional mobile example platform 502 is used to place test optics plated film lens.The optical coating
Optical film layer 900 is provided on eyeglass.
The optical information acquisition device 600 includes condenser lens 601, transmission fiber 602, spectrometer 603 and ICCD detection
Device 604, for acquiring plasma resonance optical signal.When optical coating eyeglass damages, in lens surface generation plasma
Body, plasma resonance light enter transmission fiber 602, transmission fiber 602 and 603 phase of spectrometer by the convergence of condenser lens 601
Connection, the spectrometer 603 are echelle spectrometer, are used to carry out light-splitting processing to optical signal, then optical signal continues
Into ICCD detector 604；The ICCD detector 604 is for detecting optical signal and converting optical signals to electric signal, then
Input computer system obtains the spectrum of plasma resonance light.
The pulse delay generator 700 be DG645 pulse delay generator, with Nd:YAG pulse laser 102 and
ICCD detector 604 connects, and adjusts delay time and integral door that ICCD detector 604 acquires plasma resonance optical signal
It is wide.
The foregoing is merely the preferred embodiment of invention, oneself, is not intended to limit the invention, all in spirit of the invention
With any modifications, equivalent replacements, and improvements made within principle etc., should all be included in the protection scope of the present invention.
Claims (5)
1. a kind of for measuring the measurement method of optical film layer laser damage threshold, it is characterised in that: by laser output system
(100) measuring beam exported is divided into identical two light beams by beam splitter device (300)；A branch of input therein
Into for the beam quality diagnostic system (400) of writing light beam intensity；Another light beams are radiated on optical film layer (900)；
When the beam intensity being radiated on optical film layer (900) meets or exceeds the threshold value of film layer damage, then optical information acquisition fills
It sets and receives the spectral line with optical film layer (900) base metals in (600), according in beam quality diagnostic system (400)
Beam energy, spot diameter determine the threshold value of the damage of the optical film layer (900).
2. according to claim 1 a kind of for measuring the measurement method of optical film layer laser damage threshold, feature exists
In: optical film layer (900) the damage threshold calculation method are as follows: Fth=4E/ π d2；
Wherein E is laser energy, and d is spot diameter, FthUnit is J/cm2。
3. a kind of measuring device using claim 1 the method, it is characterised in that: including being carried out for exporting for film layer
The laser output system (100) of measuring beam, setting laser output system (100) side optical film layer (900) and set
Set the optical information acquisition device (600) in optical film layer (900) other side, further include setting laser output system (100) with
Beam splitter device (300), beam quality detection system (400) and information processing system between optical film layer (900)
(800)；
Wherein, the measuring beam that laser output system (100) exports is divided into two bundles identical by beam splitter device (300)
Light beam, wherein light beam is incident on beam quality diagnostic system (400), and another light beams are incident on optical film layer (900)
Surface；The other side of the optical film layer (900) is provided with optical information acquisition device (600)；Information processing system (800) acquires light
Information in information collecting device (600), according to optical film layer (900) spectrum line traffic control in optical information acquisition device (600)
The output energy of laser output system (100) increases or stops.
4. according to claim 3 a kind of for measuring the measuring device of optical film layer laser damage threshold, feature exists
In further including beam attenuation system (200)；Wherein, beam attenuation system (200) is arranged in laser output system (100) and light
It between beam beam splitting arrangement (300), is electrically connected with information processing system (800), for the instruction according to information processing system (800)
The output for controlling laser output system (100) increases or stops.
5. according to claim 3 a kind of for measuring the measuring device of optical film layer laser damage threshold, feature exists
In, further include be arranged between laser output system (100) and optical information acquisition device (600) for adjust optical information acquire
The delay time of device (600) acquisition and the pulse delay generator (700) of integral gate-width.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910095088.2A CN109668906A (en) | 2019-01-31 | 2019-01-31 | It is a kind of for measuring the measurement method and device of optical film layer laser damage threshold |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910095088.2A CN109668906A (en) | 2019-01-31 | 2019-01-31 | It is a kind of for measuring the measurement method and device of optical film layer laser damage threshold |
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| CN109668906A true CN109668906A (en) | 2019-04-23 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110927125A (en) * | 2020-02-20 | 2020-03-27 | 四川大学 | Method for setting damage threshold of femtosecond high-power laser to transparent material |
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| CN104296969A (en) * | 2014-10-13 | 2015-01-21 | 同济大学 | Method for calibrating laser-damaged thresholds |
| CN105890878A (en) * | 2016-05-20 | 2016-08-24 | 北京大学 | Measurement device and method for measuring damage threshold of reflector in real time by using femtosecond laser |
| CN109186958A (en) * | 2018-09-19 | 2019-01-11 | 西安工业大学 | A kind of coaxial laser damage threshold test device of more light and implementation method |
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2019
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Patent Citations (3)
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| CN104296969A (en) * | 2014-10-13 | 2015-01-21 | 同济大学 | Method for calibrating laser-damaged thresholds |
| CN105890878A (en) * | 2016-05-20 | 2016-08-24 | 北京大学 | Measurement device and method for measuring damage threshold of reflector in real time by using femtosecond laser |
| CN109186958A (en) * | 2018-09-19 | 2019-01-11 | 西安工业大学 | A kind of coaxial laser damage threshold test device of more light and implementation method |
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| 中国工程热物理学会: "《中国工程热物理学会燃烧学学术会议论文集 上 2007 天津》", 31 December 2007 * |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110927125A (en) * | 2020-02-20 | 2020-03-27 | 四川大学 | Method for setting damage threshold of femtosecond high-power laser to transparent material |
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