CN109269778B - High-precision testing method for deep cut-off narrow-band filter - Google Patents
High-precision testing method for deep cut-off narrow-band filter Download PDFInfo
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- CN109269778B CN109269778B CN201811301039.1A CN201811301039A CN109269778B CN 109269778 B CN109269778 B CN 109269778B CN 201811301039 A CN201811301039 A CN 201811301039A CN 109269778 B CN109269778 B CN 109269778B
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Abstract
The invention belongs to the technical field of optics, and particularly relates to a high-precision testing method of a deep cut-off narrow-band optical filter. And determining key test numbers influencing the performance of the optical filter by multiple linear regression of multiple groups of data to obtain the test error of the optical filter. The method has universality for optical system design and optical thin film element design.
Description
Technical Field
The invention belongs to the technical field of optics, and particularly relates to a high-precision testing method of a deep cut-off narrow-band filter.
Background
The narrow-band filter is an important component of an optical imaging system, and along with the continuous development of space technology, the narrow-band filter is widely applied to the aspects of resource detection, ocean detection, climate observation military investigation, astronomical observation and the like, can effectively reduce the influence of background noise signals, improves the signal-to-noise ratio of received signals, and plays an irreplaceable role. In recent years, with the rapid development of technologies such as lightning detection and high-resolution imaging, the bandwidth requirement of the optical filter is more and more narrow. For example, in lightning detection, because background radiation is far greater than a lightning signal, the lightning signal is often submerged in strong background radiation, and an ultra-narrow band filter (bandwidth-1 nm) is needed in an optical system to filter background radiation while acquiring a characteristic peak signal of lightning, so that the method is an effective means for improving the signal-to-noise ratio of the lightning detection. In engineering development, various errors are introduced under the influence of factors such as a deposition method, deposition conditions, deposition parameters and the like in a film coating process of the deep cut narrow-band filter, so that a deviation exists between a real spectral characteristic parameter and a theoretical design, and therefore, after the preparation of the filter is finished, the spectral characteristics of the filter need to be tested, the spectral characteristic parameters comprise a central wavelength, a bandwidth, a transmittance, a suppression bandwidth and the like, and the parameters can be usually calculated through testing the spectral transmittance of the filter.
At present, a spectrophotometer is the most common equipment for testing spectral transmittance of a filter, but a deep cut ultra-narrow band filter test has a very serious problem, for example, when the ultra-narrow band filter is tested, a wavelength angle drift error is introduced due to non-vertical incidence of light, the spectral transmittance is influenced by the length of integration time, the spectral waveform is influenced by data intervals, and the like.
In summary, under the demand of development of high-precision optical elements, especially in the background of application of deep-cut and ultra-narrow-band filter films, how to accurately test the performance of a deep-cut narrow-band filter using a spectrophotometer becomes a bottleneck technical problem in manufacturing high-performance filters.
Disclosure of Invention
Technical problem to be solved
The technical problem to be solved by the invention is as follows: how to realize the performance evaluation of the deep cut-off narrow-band filter based on a spectrophotometer.
(II) technical scheme
In order to solve the technical problem, the invention provides a high-precision testing method of a deep cut-off narrow-band filter, which comprises the following steps:
step 1: firstly, selecting m-1 test parameters of spectrophotometer, respectively recording as variable x1、x2、……xm-1；
Step 2: selecting different parameters under each variable, n parameters in total, then defining the matrix X of the tested parameter variables as follows:
and step 3: performance index Y of optical filteriExamining center wavelength, peak transmittance, bandwidth and cut-off band depth, defined herein as Y1、Y2、Y3And Y4Represents;
step 4, the relationship is characterized as follows, and the matrix β is a matrix needing multiple regression based on a mathematical multiple linear regression method:
and 5: determining relevant parameters of a test experiment by adopting an experimental design method, and respectively carrying out experimental test on the designed parameters;
step 6: performing variance analysis on the multiple linear regression, and checking the test result YiWhether a significant linear relation exists between the test parameter X and the test parameter X, constructing a test statistic by a test hypothesis method, and determining the significance of the linear regression relation under a given significance level α;
and 7: further performing partial regression coefficient test, providing parameter x with insignificant effect on Y value, and finally determining YiAnd a multiple linear regression equation for X; for the test of the deep cut-off narrow band filter, the parameter b0Is exactly YiThe remaining parameters are errors that affect the test results.
Wherein, in the step 1, the test parameters include: integration time, light intensity attenuation ratio, diaphragm aperture and slit width.
(III) advantageous effects
Compared with the prior art, the invention provides a method for testing a deep cut narrow-band filter film based on a spectrophotometer, which is characterized in that test parameters are used as variables influencing test results, key parameters influencing the test results are determined through multiple linear regression, and the method can be used for testing the deep cut filter film with the cut-off degree of below 1% and the bandwidth of below 2 nm.
Drawings
FIG. 1 is a graph showing a first set of test results for a deep cut narrow band filter film.
FIG. 2 is a graph showing the second set of test results for a deep cut narrow band filter film.
FIG. 3 is a graph showing the third set of test results for a deep cut narrow band filter film.
Fig. 4 is a graph showing the fourth set of test results for a deep cut narrow band filter film.
FIG. 5 is a diagram showing the fifth set of test results of a deep cut narrow band filter film.
Fig. 6 is a diagram showing the results of the sixth set of tests on a deep cut narrow band filter film.
FIG. 7 is a graph showing the seventh set of test results for a deep cut narrow band filter film.
Fig. 8 is a diagram illustrating the eighth set of test results of the deep cut narrow band filter film.
FIG. 9 is a graph showing the ninth set of test results for a deep cut narrow band filter film.
Detailed Description
In order to make the objects, contents, and advantages of the present invention clearer, the following detailed description of the embodiments of the present invention will be made in conjunction with the accompanying drawings and examples.
In order to solve the technical problem, the invention provides a high-precision testing method of a deep cut-off narrow-band filter, which comprises the following steps:
step 1: firstly, selecting m-1 test parameters of spectrophotometer, respectively recording as variable x1、x2、……xm-1；
Step 2: selecting different parameters under each variable, n parameters in total, then defining the matrix X of the tested parameter variables as follows:
and step 3: performance index Y of optical filteriThe center wavelength, peak transmittance, bandwidth and cut-off band depth are mainly examined, and defined herein as Y1、Y2、Y3And Y4The relevant literature defining the principles of reference optical films is indicated;
step 4, the relationship is characterized as follows, and the matrix β is a matrix needing multiple regression based on a mathematical multiple linear regression method:
and 5: determining relevant parameters of a test experiment by adopting an experimental design method, and respectively carrying out experimental test on the designed parameters;
step 6: performing variance analysis on the multiple linear regression, and checking the test result YiWhether a significant linear relation exists between the test parameter X and the test parameter X, constructing a test statistic by a test hypothesis method, and determining the significance of the linear regression relation under a given significance level α;
and 7: further performing partial regression coefficient test, providing parameter x with insignificant effect on Y value, and finally determining YiAnd a multiple linear regression equation for X; for the test of the deep cut-off narrow band filter, the parameter b0Is exactly YiThe remaining parameters are errors that affect the test results.
Wherein, in the step 1, the test parameters include: integration time, light intensity attenuation ratio, diaphragm aperture and slit width.
Example 1
Example (c): test results of deep cut-off narrowband filter
1. Depositing a sample of the deep cut filter film on a quartz substrate, and testing by using a lambda-900 spectrophotometer;
2. firstly, selecting the test parameters of the spectrophotometer as slit width, light intensity attenuation proportion, diaphragm aperture, integral time and the like, and respectively recording as variable x1、x2、x3And x4；
3、x1The parameters of the variables were chosen as: 0.2nm, 0.5nm and 1 nm; x is the number of2The parameters of the variables were chosen as: 1%, 10% and 100％；x3The parameters of the variables were chosen as: 2mm, 5mm and 10 mm; x is the number of4The parameters of the variables were chosen as: 0.05s, 0.1s and 0.2 s;
4. constructing a test parameter matrix X:
5. test result matrix Y: wherein the unit of the central wavelength is nm, and the unit of the bandwidth is nm;
6. results of multiple linear regression analysis of center wavelength: the multiple regression equation is as follows:
ycenter wavelength＝765.3493+0.15646×x1-0.01501×x2+0.020748×x3+1.2381×x4
Through analysis of variance, the correlation coefficient is 0.97215, which shows that the fitting degree of the regression variable to the sample data point is high; the remaining standard deviation is 0.041794, where x3And x4Is highly significant, x1Is significant, x2Was not significant. Therefore, further tests of partial regression coefficients were performed for the four variables 0.43425, 0.05645, 0.57586 and 0.64939, respectively, indicating yCenter wavelengthThe order of the influence is x4、x3And x1. This indicates that the central wavelength of the filter film is 765.3nm, and the integration time, the aperture of the incident diaphragm and the slit width of the test are key parameters influencing the central wavelength test of the filter.
7. Results of multiple linear regression analysis of peak transmittance: the multiple regression equation is as follows:
ypeak transmittance＝95.8201-22.6453×x1-1.5091×x2-1.1643×x3-1.5263×x4
Through analysis of variance, the correlation coefficient is 0.99553, which shows that the fitting degree of the regression variable to the sample data point is high; the remaining standard deviation was 1.1999 a,wherein x1And x3Is highly significant, x2And x4Was not significant. Therefore, further tests of partial regression coefficients were performed for the four variables 0.88247, 0.079659, 0.45371 and 0.011241, respectively, indicating yPeak transmittanceThe order of the influence is x1And x3. This indicates that the peak transmittance of the filter film is 95.82%, and the tested slit width and the aperture of the incident diaphragm are key parameters influencing the peak transmittance test of the filter.
8. Results of multiple linear regression analysis of bandwidth: the multiple regression equation is as follows:
ybandwidth of＝0.92872+0.29582×x1-0.005005×x2+0.02449×x3-0.14286×x4
Through analysis of variance, the correlation coefficient is 0.96837, which shows that the fitting degree of the regression variable to the sample data point is high; the remaining standard deviation is 0.049114, where x1And x3Is highly significant, x2And x4Was not significant. Therefore, further tests of partial regression coefficients were performed for the four variables 0.74408, 0.017047, 0.61579 and 0.067884, respectively, indicating yBandwidth ofThe order of the influence is x1And x3. This shows that the bandwidth of the filter film is 0.93nm, and the tested slit width and the aperture of the incident diaphragm are key parameters influencing the bandwidth test of the filter.
9. Results of multiple linear regression analysis of cut-off band depth: the multiple regression equation is as follows:
yminimum transmittance of cut-off band＝-2.3766×10-4+9.5558×10-4×x1-1.8428×10-4×x2-3.0585×10-5×x3+2.8876×10-3×x4
Through analysis of variance, the correlation coefficient is 0.94889, which shows that the fitting degree of the regression variable to the sample data point is high; the remaining standard deviation was 1.9248 × 10-4Wherein x is1Is highly significant, x4Is significant, x2And x3Was not significant. Thus doing furtherExamination of partial regression coefficients, 0.77559, 0.20261, 0.24824 and 0.44292 for the four variables, respectively, indicating yMinimum transmittance of cut-off bandThe order of the influence is x1And x4. This indicates that the slit width and the integration time of the test are key parameters affecting the filter cut-off band depth test.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (1)
1. A high-precision testing method for a deep cut-off narrow-band filter is characterized in that a sample of the deep cut-off narrow-band filter is deposited on a quartz substrate and is tested by using a spectrophotometer, and the method comprises the following steps:
step 1: firstly, selecting m-1 test parameters of spectrophotometer, respectively recording as variable x1、x2、……xm-1；
Step 2: selecting different parameters under each variable, n parameters in total, then defining the matrix X of the tested parameter variables as follows:
and step 3: performance index Y of deep cut-off narrow band filteriExamining center wavelength, peak transmittance, bandwidth and cut-off band depth, defined herein as Y1、Y2、Y3And Y4Represents;
step 4, the relationship is characterized as follows, and the matrix β is a matrix needing multiple regression based on a mathematical multiple linear regression method:
and 5: determining relevant parameters of a test experiment by adopting an experimental design method, and respectively carrying out experimental test on the designed parameters;
step 6: performing variance analysis on the multiple linear regression, and checking the test result YiWhether a significant linear relation exists between the test parameter X and the test parameter X, constructing a test statistic by a test hypothesis method, and determining the significance of the linear regression relation under a given significance level α;
and 7: further performing partial regression coefficient test, providing parameter x with insignificant effect on Y value, and finally determining YiAnd a multiple linear regression equation for X; for the test of the deep cut-off narrow band filter, the parameter b0Is exactly YiThe other parameters are errors affecting the test result;
in step 1, the test parameters include: integration time, light intensity attenuation ratio, diaphragm aperture and slit width.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004069164A2 (en) * | 2003-01-30 | 2004-08-19 | Euro Celtique Sa | Wireless blood glucose monitoring system |
| CN1570586A (en) * | 2004-04-30 | 2005-01-26 | 宁波大学 | Automatic detecting device for spike filter |
| CN103411952A (en) * | 2013-08-08 | 2013-11-27 | 浙江大学 | Alga sort classification identification method based on Raman spectroscopy technique |
| CN104180901A (en) * | 2014-08-15 | 2014-12-03 | 中国科学院上海技术物理研究所 | Transmittance spectrum measurement device and method for ultra-narrow band filter |
| CN107479191A (en) * | 2017-08-15 | 2017-12-15 | 天津津航技术物理研究所 | A kind of the laser rectangle optical filter and design method of visible optical depth cut-off |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6449033B2 (en) * | 1999-04-26 | 2002-09-10 | Corning Incorporated | Apparatus and method for measuring polarization dependent loss |
| CN106405709B (en) * | 2016-11-16 | 2018-12-28 | 天津津航技术物理研究所 | A kind of broadband cut-off ultra-narrow band pass filter |
| CN106707393A (en) * | 2016-12-08 | 2017-05-24 | 西南技术物理研究所 | Method for making rectangular deep cut-off ultra-narrow band pass filter |
| CN107462525A (en) * | 2017-06-27 | 2017-12-12 | 北京航空航天大学 | A kind of spectral signature parameter method of testing of linear variable filter |
-
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004069164A2 (en) * | 2003-01-30 | 2004-08-19 | Euro Celtique Sa | Wireless blood glucose monitoring system |
| CN1570586A (en) * | 2004-04-30 | 2005-01-26 | 宁波大学 | Automatic detecting device for spike filter |
| CN103411952A (en) * | 2013-08-08 | 2013-11-27 | 浙江大学 | Alga sort classification identification method based on Raman spectroscopy technique |
| CN104180901A (en) * | 2014-08-15 | 2014-12-03 | 中国科学院上海技术物理研究所 | Transmittance spectrum measurement device and method for ultra-narrow band filter |
| CN107479191A (en) * | 2017-08-15 | 2017-12-15 | 天津津航技术物理研究所 | A kind of the laser rectangle optical filter and design method of visible optical depth cut-off |
Non-Patent Citations (2)
| Title |
|---|
| Study on the design and preparation of wideband deep cutoff bandpass filter;Yugang Jiang;《International Symposium on Optoelectronic Technology and Application》;20181231;全文 * |
| 光谱仪器测试参数对测试结果的影响;陈淑芳;《照明工程学报》;19950930;全文 * |
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