CN109143753A - A kind of optical module, optical projection mould group, sensing device and equipment - Google Patents

A kind of optical module, optical projection mould group, sensing device and equipment Download PDF

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Publication number
CN109143753A
CN109143753A CN201811047032.1A CN201811047032A CN109143753A CN 109143753 A CN109143753 A CN 109143753A CN 201811047032 A CN201811047032 A CN 201811047032A CN 109143753 A CN109143753 A CN 109143753A
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CN
China
Prior art keywords
optical
light
pattern
light beam
path
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Withdrawn
Application number
CN201811047032.1A
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Chinese (zh)
Inventor
王小明
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Shenzhen Fushi Technology Co Ltd
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Shenzhen Fushi Technology Co Ltd
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Application filed by Shenzhen Fushi Technology Co Ltd filed Critical Shenzhen Fushi Technology Co Ltd
Priority to CN201811047032.1A priority Critical patent/CN109143753A/en
Publication of CN109143753A publication Critical patent/CN109143753A/en
Withdrawn legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2066Reflectors in illumination beam
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2033LED or laser light sources

Abstract

The application is suitable for optics and electronic technology field, provides a kind of optical module, the pattern beam for being used to project predetermined pattern on a measured target object is sensed.The optical module includes optical path-deflecting portion and pattern generation portion.The optical path-deflecting portion is used to the projecting direction of light beam changing into the second direction different from first direction by first direction.The pattern generation portion is used to forming original beam into the pattern beam that can project predetermined pattern.The application also provides a kind of optical projection mould group, sensing device and equipment including the optical module.

Description

A kind of optical module, optical projection mould group, sensing device and equipment
Technical field
The application belongs to optical technical field more particularly to a kind of optical module, optical projection mould group, sensing device and sets It is standby.
Background technique
Existing three-dimensional (Three Dimensional, 3D) recognition of face mould group is because being necessary to ensure that enough light in inside Journey would generally be made that comparison is thick, not meet the designer trends of current electronic device slimming.And if set to meet slimming It counts and will affect its recognition effect if compressing the inside light path of 3D recognition of face mould group.
Summary of the invention
Technical problems to be solved in this application are to provide the novel optical module of one kind, optical projection mould group, sensing Device and equipment can meet slimming design requirement under the premise of keeping enough light paths.
The application embodiment provides a kind of optical module, applies in an optical projection mould group, for tested one Project the pattern beam of predetermined pattern on object, the optical module includes optical path-deflecting portion and pattern generation portion, described Optical path-deflecting portion is used to after deflecting special angle from the light beam of a light source project away, to reduce entire optical projection mould group Thickness on final projecting direction, the pattern generation portion is for modulating light beam to form the figure that can project predetermined pattern Case light beam.
In some embodiments, the special angle is 90 degree.
In some embodiments, the optical path-deflecting portion includes reflecting surface, will by the reflex of the reflecting surface The light beam of projection deflects the special angle.
In some embodiments, the reflecting surface by light beam realize total reflection come reach light beam is deflected it is described pre- Angle is determined, or, the reflecting surface is provided with reflective coating, by described in light beam deflection of the reflex of reflective coating by projection Predetermined angular.
In some embodiments, the optical path-deflecting portion further comprises incident side surface and light emission side surface, is come from The light beam of light source enters the optical path-deflecting portion from the incident side surface, and is transmitted along first direction, and beam Propagation is worked as It is reflected to the reflecting surface, the light beam after reflection transmits in a second direction.
In some embodiments, the optical path-deflecting portion includes trapezoidal prism or triangular prism.
In some embodiments, path of the light beam in optical path-deflecting portion along first direction transmission is longer than in a second direction The path of transmission.
In some embodiments, the pattern generation portion corresponds to the incident side setting in the optical path-deflecting portion, or, described Pattern generation portion corresponds to the light emission side setting in the optical path-deflecting portion.
In some embodiments, the pattern generation portion includes in diffraction optical element, microlens array and grating Any one or the combination of several of them.
In some embodiments, the pattern generation portion is structure as a whole with the optical path-deflecting portion, or, the pattern Generating unit and the optical path-deflecting portion are separate structure.
In some embodiments, the pattern generation portion passes through the optical microstructures that are correspondingly arranged to the light of incident beam Field carries out rearrangement to form the pattern beam that can project predetermined pattern, and the pattern generation portion is to be formed with the light The individual optical elements for learning micro-structure, the light emission side after the deflection optical portion deflection light beam is set;Or
The pattern generation portion is the institute on the light emission side surface after being formed directly into the deflection optical portion deflection light beam State optical microstructures;Or
The pattern generation portion by the light field of the optical microstructures that are correspondingly arranged to incident beam carry out rearrangement come The pattern beam that can project predetermined pattern is formed, the pattern generation portion is the independent light for being formed with the optical microstructures Element is learned, the incident side in the deflection optical portion is set and between the light beam adjustment section and optical path-deflecting portion;Or
The pattern generation portion is the optical microstructures being formed directly on the reflecting surface in the deflection optical portion, is entered The formation of rearrangement light field can under the action of the optical microstructures while being reflected for the light beam being incident upon on reflecting surface The pattern beam for projecting predetermined pattern projects.
In some embodiments, the reflecting surface is reflecting curved surface.
In some embodiments, the optical module further comprises light beam adjustment section, for collimating to light beam Or/and it expands.
In some embodiments, the optical path-deflecting portion includes reflecting prism, and the reflecting prism includes along projection light Incident side surface, reflecting surface and the light emission side surface that road is set gradually, the light beam adjustment section include with optical alignment and/or The optical texture of effect is expanded, the optical texture is formed directly into incident side surface and/or the light emission side of the reflecting prism On surface;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side set gradually along projecting light path Surface, reflecting surface and light emission side surface, the light beam adjustment section include the optical texture for having optical alignment and/or expanding effect Patch, the optical texture patch are bonded on the incident side surface and/or light emission side surface of reflecting prism;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side set gradually along projecting light path Surface, reflecting surface and light emission side surface, the light beam adjustment section include having optical alignment and/or expanding the independence of effect thoroughly Mirror, the lens correspond to the incident side surface of reflecting prism and/or the setting of light emission side surface, the lens and can move along projecting light path It is dynamic;Or
The optical path-deflecting portion includes reflecting mirror, and the reflecting surface of the reflecting mirror changes the direction of projecting light path to realize light Road deflection, the light beam adjustment section includes the separate lenses for having optical alignment and/or expanding effect, and corresponding reflecting mirror enters light Side and/or light emission side setting;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side set gradually along projecting light path Surface, reflecting surface and light emission side surface, the light beam adjustment section include having optical alignment and/or expanding the independence of effect thoroughly Mirror, the lens correspond to the incident side surface setting of reflecting prism, and the lens can be moved along projecting light path.
The application embodiment provides a kind of optical projection mould group, for projecting the pattern beam with predetermined pattern to quilt It surveys on object and is sensed comprising the optical module of light source and above-mentioned any one embodiment.
In some embodiments, the light source is the wide face type vertical cavity surface emitting laser (Vertical of single hole Cavity Surface Emitting Laser,VCSEL).The wide face type VCSEL of single hole is the uniform face light of luminous intensity Source.The uniform light field that the light source issues is carried out rearrangement formation by the pattern generation portion can project irregular pattern Pattern beam.
Alternatively, the light source be array VCSEL, including be formed in be randomly distributed on the same semiconductor base it is more A VCSEL luminescence unit, can project the spot pattern of irregular distribution.The pattern generation portion copies multiple described do not advise The spot pattern that is then distributed simultaneously is unfolded and is formed to be incident upon on measured target object irregularly to divide within the scope of preset expanded- angle The spot pattern of cloth.
Alternatively, the light source is array VCSEL, including it is formed in equal according to same intervals on the same semiconductor base Multiple VCSEL luminescence units of even arrangement, can project equally distributed spot pattern.The pattern generation portion is by the light source The uniform light field of sending carries out rearrangement and forms the pattern beam for capableing of pro-jection rule pattern.
Alternatively, the light source is array VCSEL, including it is formed in equal according to same intervals on the same semiconductor base Multiple VCSEL luminescence units of even arrangement, can project equally distributed spot pattern.It the pattern generation portion can also be by edge The light field of the luminescence unit of preset direction arrangement mutually merges the candy strip arranged with formation rule.
Alternatively, the light source includes the first emission part for issuing the first light beam and the second emission part for issuing the second light beam. First light beam is used to form the flood beam of optical power detection.Second light beam is used to form on measured target object Project the pattern beam of predetermined pattern.First emission part and the second emission part are formed on the same semiconductor base simultaneously It is independently worked by different control signals.
The application embodiment provides a kind of sensing device, for sensing the three-dimensional information of measured target object.The sensing Device includes the optical projection mould group and sensing mould group of above-mentioned any one embodiment.The sensing mould group is for sensing the light It learns the predetermined pattern that mould group projects on measured target object and the image by analyzing the predetermined pattern obtains tested subject matter Three-dimensional information.
A kind of equipment, the sensing device including above-mentioned any one embodiment, the equipment is according to the sensing device institute The three-dimensional information of the measured target object sensed executes corresponding function.
Optical module provided by the application embodiment, optical projection mould group, sensing device and equipment will be by that will project Optical path carry out it is partially deflected to reduce whole mould group along the thickness of projecting direction, be conducive to using the mould group various equipment it is thin Typeization design.
The additional aspect and advantage of the application embodiment will be set forth in part in the description, partially will be from following Become obvious in description, or is recognized by the practice of the application embodiment.
Detailed description of the invention
Fig. 1 is the structural schematic diagram for the optical module that the application first embodiment provides.
Fig. 2 is the structural schematic diagram for the optical module that the application second embodiment provides.
Fig. 3 is the structural schematic diagram for the optical module that the application third embodiment provides.
Fig. 4 is the structural schematic diagram for the optical module that the 4th embodiment of the application provides.
Fig. 5 is the structural schematic diagram for the optical module that the 5th embodiment of the application provides.
Fig. 6 is the structural schematic diagram for the optical module that the application sixth embodiment provides.
Fig. 7 is the structural schematic diagram for the optical module that the 7th embodiment of the application provides.
Fig. 8 is the structural schematic diagram for the optical module that the 8th embodiment of the application provides.
Fig. 9 is the structural schematic diagram for the optical module that the 9th embodiment of the application provides.
Figure 10 is the structural schematic diagram for the optical projection mould group that the tenth embodiment of the application provides.
Figure 11 is the structural schematic diagram for the optical projection mould group that the 11st embodiment of the application provides.
Figure 12 is the structural schematic diagram for the optical projection mould group that the 12nd embodiment of the application provides.
Figure 13 is the structural schematic diagram for the optical projection mould group that the 13rd embodiment of the application provides.
Figure 14 is the structural schematic diagram of the light source of optical projection mould group in Figure 13.
Figure 15 is the structural schematic diagram for the sensing device that the 14th embodiment of the application provides.
Figure 16 is the structural schematic diagram for the equipment that the 15th embodiment of the application provides.
Specific embodiment
Presently filed embodiment is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein from beginning Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng The embodiment for examining attached drawing description is exemplary, and is only used for explaining the application, and should not be understood as the limitation to the application.? In the description of the present application, it is to be understood that term " first ", " second " are only used for describing, and should not be understood as instruction or dark Show relative importance or implicitly indicates the quantity of indicated technical characteristic or put in order.Define as a result, " first ", The technical characteristic of " second " can explicitly or implicitly include one or more technical characteristic.In retouching for the application In stating, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise specific regulation or limit, term " installation ", " phase Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration connection;It can To be mechanical connection, it is also possible to be electrically connected or is in communication with each other;It can be directly connected, the indirect phase of intermediary can also be passed through Even, the connection inside two elements or the interaction relationship between two elements be can be.For the ordinary skill of this field For personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
Following disclosure provides many different embodiments or example is used to realize the different structure of the application.In order to Simplify disclosure herein, hereafter only to the component of specific examples and being set for describing.Certainly, they are merely examples, and And purpose does not lie in limitation the application.In addition, the application can reuse reference number and/or reference word in different examples Mother, this reuse are itself not indicate the various embodiments discussed to simplify and clearly state the application And/or the particular kind of relationship between setting.In addition, the application in the following description provided by various specific techniques and material only For the example for realizing technical scheme, but those of ordinary skill in the art should be aware that the technical solution of the application It can be realized by other techniques for not describing hereafter and/or other materials.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable manner In formula.In the following description, many details are provided so as to fully understand presently filed embodiment.However, this Field technical staff will be appreciated that even if without one or more in the specific detail, or using other structures, group Member etc. can also practice the technical solution of the application.In other cases, it is not shown in detail or describes known features or operation To avoid the emphasis of fuzzy the application.
As shown in Figure 1, the application first embodiment provides a kind of optical module 1, for issue a light source 10 Original beam is converted into the pattern beam with predetermined pattern, and projects on the pattern beam to a measured target object, with sense Survey the three-dimensional information of measured target object.The predetermined pattern can be the hot spot of multiple irregular distributions, or a plurality of rule The striped then arranged, certainly, the predetermined pattern can also be other suitable patterns, and the application does not do the predetermined pattern Specific limitation.
It can be the light beam with specific wavelength according to sensing principle and application scenarios, the original beam.In this implementation In mode, the original beam, for example, be infrared or near infrared light, wave-length coverage be 750 nanometers (Nanometer, nm) extremely 1650nm.So, the original beam is also not limited to infrared or near infrared light, such as can also be other suitable for ultraviolet light etc. Light beam.
Currently, 3D detection technology large-scale application is in intelligent terminal, augmented reality (Augmented Reality, AR)/void The multiple fields such as quasi- reality (Virtual Reality, VR), intelligent security guard, robot vision, automatic Pilot, automedica. The pattern beam is the light beam projected on measured target object during sensing the 3D information of measured target object, Ke Yi The 3D information that preset light pattern is used to sense measured target object is projected on measured target object.Acquired measured target object 3D information has a variety of applications, for example can use the functions such as the 3D information realization face recognition.It should be noted that this Shen Specific limitation please not done to the application of this 3D information in full.
The optical module 1 includes light beam adjustment section 12, optical path-deflecting portion 14 and pattern generation portion 16.The light source 10 is sent out Original beam out is incident to pattern generation portion 16 after the adjustment in light beam adjustment section 12 and optical path-deflecting portion 14, to generate energy Enough pattern beams that predetermined pattern is projected on measured target object.
The light beam adjustment section 12 is used to adjust the original beam issued from the light source 10, so that subsequent be incident on pattern Light beam in generating unit 16 keeps collimating and meeting preset aperture requirement substantially.The light beam adjustment section 12 is sent out according to light source 10 Original beam feature out may include one or more optical textures 120, such as: if the issued original beam of light source 10 The angle of divergence is bigger, then needs to be arranged optical alignment structure 120 for original beam and be converted to approximately parallel collimated ray, can make The range that light beam after must converting is covered will not the significant change with change in optical path length;If the issued original beam of light source 10 Aperture is too small, needs to be arranged optical beam-expanding structure 120 by the borehole enlargement of original beam, so as to cover the full pattern Generating unit 16.The optical texture 120 can be one or more independent optical elements, can also be formed directly into optics group On the surface of other optical elements of part 1.
The optical texture 120 can be but be not limited to non-spherical structure.As long as the optical texture 120 may be implemented Required function, such as but be not limited to collimate or expand, the optical texture 120 of various suitable shapes can be used.
The optical path-deflecting portion 14 for changing projecting light path direction, to meet light path of the projecting light path along specific direction Design requirement.In order to meet the design requirement of optics module slimming, the optical path-deflecting portion 14 is by projecting light path by light source 10 Exit direction deflection special angle after project away again, to reduce thickness of the entire optics module on final projecting direction.
The optical path-deflecting portion 14 includes the incident side 140 set gradually along optical path, reflecting surface 142 and light emission side 144.Institute It states incident side 140 to be arranged towards light source 10, the original beam issued for importing light source 10.The reflecting surface 142 is used for will The light emission side 144 in incident light beam towards optical path-deflecting portion 14 reflects.The tilt angle of the reflecting surface 142 is according to optical path-deflecting The light path angle to be deflected of portion 14 is configured.The light emission side 144 is arranged towards reflecting surface 142, for that will pass through reflection Light beam after face 142 deflects projects away.
In the present embodiment, the optical path-deflecting portion 14 includes reflecting prism, and light source 10 is emitted along first direction X Light beam deflection substantially 90 degree after in a second direction Y project away.The incident side 140 be reflecting prism towards light source 10 its In a side surface.The reflecting surface 142 is the inclined-plane of reflecting prism, is substantially in 45 degree of settings with first direction X.The light emission side 144 be surface of the reflecting prism towards exit direction, substantially vertical with 140 surface of incident side.The light beam adjustment section 12 Including the optical texture 120 with optical alignment effect, be formed directly into respectively the reflecting prism 140 surface of incident side and On 144 surface of light emission side.The reflecting prism is to be integrated with the integrated optical element of collimation and deflection optical path function.
The reflecting prism is optically denser medium compared to air.Correspondingly, when the light beam that light source 10 issues enters from air It is reflected when being incident upon reflecting prism, collimating effect further can be played to incident light beam.
Therefore, in the present embodiment, optical path-deflecting portion 14 is arranged by the light emission side in light source 10 to realize projection light The direction on road deflects, and can play converging action to the light beam of edge-diffusion.
The first direction X and the second direction are vertical.Wherein, the first direction is, for example, horizontal direction, described Second direction Y is, for example, vertical direction.Ground is changed, the first direction X for example can also be vertical direction, the second direction X is, for example, horizontal direction.The application does not do specific limitation to first direction X and second direction Y.
It is understood that in the present embodiment, being adjusted according to the characteristics of luminescence of the light source 10 and the light beam Optical path length required by a pair of of optical texture 120 in portion 12, the reflecting prism can substantially tri-prismoids or trapezoidal rib Cylinder.Such as: when above-mentioned required light path is shorter, 140 surface of incident side, reflecting surface 142 and the light out of the reflecting prism 144 surface of side, which mutually borders on, substantially forms tri-prismoid.When above-mentioned required light path is longer, the entrance prism enters light It is separated by distance required for one section of light path along optical path direction between 140 surface of side and reflecting surface 142, the reflecting prism is substantially Trapezoidal prism.
The reflecting prism can be anti-by the light emission side 144 in incident beam towards optical path-deflecting portion 14 using total reflection principle It penetrates.However, changing ground, in addition to total reflection principle, reflection function can also be realized by the way that reflecting material is arranged in reflecting surface 142 Can, such as patch reflectance coating etc..
Further, in some embodiments, the reflecting surface 142 and first direction X can also be in other proper angles Setting, it is not limited to 45 degree.
The reflecting prism can also be replaced by other appropriate members with the same function, it is not limited to prism, only It is used for that Y is projected away in a second direction after substantially 90 degree of light beam that first direction X is emitted deflection by light source 10.
The light beam that the light source 10 is emitted does not need to be strictly defined as along first direction X yet, can also be with first direction X The outgoing beam being at certain angle of inclination.Correspondingly, the deflection angle of light beam is also not limited to 90 degree.
It is understood that the optical module 1 can also include one or more optical elements with other function, The incident side 140 or light emission side 144 that the deflection optical portion 14 can be corresponded to are configured to supply the optics of the light source 10 spy The gap between optical requirement that property and projecting beam need to meet.Such as: if the relatively narrow nothing of original beam that light source 10 is issued Method covers the full pattern generation portion 16, then the optical module 1 can also include one or more light for having and expanding function Element is learned to be used to extend light beam to cover the full pattern generation portion 16.
The pattern generation portion 16 is used to incident light beam formation can project predetermined pattern on measured target object Pattern beam.The pattern generation portion 16 passes through the optical microstructures 163 being correspondingly arranged and carries out weight to the light field of incident beam New to arrange to realize above-mentioned function, the optical microstructures 163 include but is not limited to diffraction optics lines, microlens array, light Grid and combinations thereof.
For forming the predetermined pattern of irregular distribution hot spot, if the light source 10 is the hair of multiple irregular distributions The light emitting array of light unit composition, light beam issued itself have included multiple beamlets of irregular distribution, then the figure The light beam group that case generating unit 16 is issued by the luminescence unit that the optical microstructures 163 replicate multiple irregular distributions, And it is unfolded within the scope of preset expanded- angle and forms the spot pattern for being incident upon and being randomly distributed on measured target object.If The light beam that the light source 10 is launched is the light beam of even intensity distribution, then the pattern generation portion 16 can be micro- by the optics Light beam is carried out rearrangement by structure 163, is dispersed as that the pattern beam of irregular pattern can be projected.In present embodiment In, the pattern generation portion 16 is the diffraction optical element (Diffractive that 14 light emission side 144 of deflection optical portion is arranged in Optical Element,DOE).The DOE is independent optical element, including transparent substrate 160 and is formed in transparent substrate On diffraction optics lines as optical microstructures 163.Wherein, the irregular pattern is for example including random, pseudorandom With quasi-periodic pattern.
Ground is changed, the pattern generation portion 16 can also be thrown by forming the method for transmission pattern on the transparent substrate Project the pattern beam with predetermined pattern.For example, forming the pattern layer made of light-proof material, institute on the transmission substrate It states and forms the light beam with predetermined pattern in requisition for the position hollow out of light transmission in pattern layer to allow light beam to project away.
The pattern generation portion 16 is not limited to the above embodiment, and can also be other suitable structures, as long as can be real Incident light beam is now formed to the pattern beam that predetermined pattern can be projected on measured target object.
In the present embodiment, preferably, path of the light beam in optical path-deflecting portion 14 along first direction X transmission is longer than edge The path of second direction Y transmission.
As shown in Fig. 2, the application second embodiment provides a kind of optical module 2, in first embodiment Optical module 1 is essentially identical, and the main distinction is that the light beam adjustment section 22 includes a pair of of optics with optical alignment effect Structure patch 220 is bonded in respectively on 244 surface of 240 surface of incident side and light emission side of reflecting prism, and and indirect formation Integral structure on 244 surface of 240 surface of incident side and light emission side of the reflecting prism.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The optical texture patch 220 can be but be not limited to non-spherical structure.As long as the optical texture patch 220 Functions, the optical texture patch 220 of various suitable shapes such as required optical function may be implemented, such as collimate or expand all is Can with.
As shown in figure 3, the application third embodiment provides a kind of optical module 3, in first embodiment Optical module 1 is essentially identical, and the main distinction is that the light beam adjustment section 32 includes a pair of independent lens 320, respectively corresponds 340 surface of incident side of reflecting prism and the setting of 344 surface of light emission side.The lens 320 can be along the different location of projecting light path It is arranged on 344 surface of 340 surface of incident side or light emission side without being directly anchored to reflecting prism.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The lens 320 can be but be not limited to the lens for having the effects that optical alignment or expanding.For example, described Mirror 320 is the lens of non-spherical lens, spherical lens or various other suitable shapes.
As shown in figure 4, the 4th embodiment of the application provides a kind of optical module 4, in third embodiment Optical module 3 is essentially identical, and the main distinction is that the light beam adjustment section 42 includes a pair of independent lens 420, corresponding anti- Penetrate 340 surface of the incident side setting of prism.The pattern generation portion 46 is the light out for being formed directly into the deflection optical portion 44 Optical microstructures 463 on 344 surface of side.The optical microstructures 463 carry out rearrangement to the light field of incident beam with shape At the pattern beam that can project predetermined pattern.The optical microstructures 463 include but is not limited to diffraction optics lines, lenticule battle array Column, grating and combinations thereof.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The lens 420 can be but be not limited to the lens for having the effects that optical alignment or expanding.The lens 420, for example, can be the lens of non-spherical lens, spherical lens or various other suitable shapes.
As shown in figure 5, the 5th embodiment of the application provides a kind of optical module 5, in the 4th embodiment Optical module 4 is essentially identical, and the main distinction is that the light beam adjustment section 52 includes being formed directly into the incident side of reflecting prism Optical texture 520 on 540 surfaces.The pattern generation portion 56 is 544 table of light emission side for being formed in the deflection optical portion 54 Optical microstructures 563 on face.The optical microstructures 563 carry out rearrangement to the light field of incident beam can be projected with being formed The pattern beam of predetermined pattern.The optical microstructures 563 include but is not limited to diffraction optics lines, microlens array, grating And combinations thereof.
The optical texture 520 can be but be not limited to the optical texture of aspherical shape.As long as the optical texture 520 may be implemented required function, such as have the function of optical alignment or expand, and the optical texture 520 of various suitable shapes is all It is possible.
It is understood that the light beam adjustment section 52 can also include the incident side of one or more corresponding reflecting prisms The optical lens 522 of 540 surfaces setting.The optical lens 522 can be configured along the different location of projecting light path, with cooperation The optical texture 520 on 540 surface of incident side is formed in realize preset pH effect effect.
As shown in fig. 6, the application sixth embodiment provides a kind of optical module 6, in third embodiment Optical module 3 is essentially identical, and the main distinction is that the optical path-deflecting portion 64 includes reflecting mirror 642, passes through the reflecting mirror 642 Reflection change the direction of projecting light path to realize optical path-deflecting.The light beam adjustment section 62 includes a pair of of separate lenses 620, the incident side 640 and light emission side 644 for respectively corresponding reflecting mirror are arranged.
The lens 620 can be but be not limited to non-spherical lens, as long as required function may be implemented in the lens 620 Can, such as have the function of optical alignment or expand, the lens 620 of various suitable shapes are all possible.
Ground is changed, in other embodiments, the light beam in the optical module 1-6 of the respective embodiments described above is adjusted Portion 12-62 also can be omitted.
As shown in fig. 7, the 7th embodiment of the application provides a kind of optical module 7, in first embodiment Optical module 1 is essentially identical, and the main distinction is that the reflecting surface 742 is the curved surface for having both light beam adjustment function and reflection function Structure.The light beam adjustment function includes but is not limited to the functions such as to collimate or expand.Therefore, the reflecting surface 742 is changing throwing The function of a part of light beam adjustment section 72 can also be realized while penetrating the direction of optical path, so as to reduce the light beam The number of elements of adjustment section 72 or the setting of optical texture.Certainly, for changing the reflection of projecting light path on the reflecting surface 742 Function can be realized by the method for total reflection principle or setting reflective coating.
In addition, changing ground, the function that the reflecting surface 742 for example can also have reflection function to adjust without light beam Energy.Since the reflecting surface 742 is reflecting curved surface, the light beam with certain diffusion angle issued from light source 10 can be adjusted To go out to be shot out along the vertical direction.Correspondingly, light beam adjustment section 72 is omitted altogether.
As shown in figure 8, the 8th embodiment of the application provides a kind of optical module 8, in third embodiment Optical module 3 is essentially identical, and the main distinction is that the separate lenses of the light beam adjustment section 82 correspond to the deflection optical portion 84 840 surface of incident side setting.The setting of pattern generation portion 86 is in the light beam adjustment section 82 and the deflection optical portion 84 Between.The original beam that the light source 83 issues successively forms energy after the modulation in light beam adjustment section 82 and pattern generation portion 86 It is projected away again after enough projecting the pattern beam of predetermined pattern through changing direction by deflection optical portion 84.
As shown in figure 9, the 9th embodiment of the application provides a kind of optical module 9, in the 8th embodiment Optical module 8 is essentially identical, and the main distinction is that the pattern generation portion 96 is to be formed directly into the deflection optical portion 94 Optical microstructures 963 on reflecting surface 942.The optical microstructures 963 carry out rearrangement to the light field of incident beam with shape At the pattern beam that can project predetermined pattern.The optical microstructures 963 include but is not limited to diffraction optics lines, lenticule battle array Column, grating and combinations thereof.The light beam being incident on reflecting surface 942 is while being reflected in the work of the optical microstructures 963 The pattern beam injection that can project predetermined pattern is formed with lower rearrangement light field.
For the embodiment of Fig. 8 and Fig. 9, since the incident side in the deflection optical portion is arranged in pattern generation portion, thus Compared to the light emission side that the deflection optical portion is arranged in pattern generation portion, the light using the optical module can further be thinned Mould group is learned in thickness in a second direction.
Expansiblely, corresponding be omitted of the light beam adjustment section in the optical module of above-mentioned each embodiment is also feasible 's.In this way, the thickness of the optics module including the optical module similarly may be implemented to be thinned.
Further, it is also possible additionally to increase certain elements in the optical module of above-mentioned each embodiment, it should all Fall into the protection scope of the application.
As shown in Figure 10, the tenth embodiment of the application provides a kind of optical projection mould group 81 comprising light source 80 and Optical module 1 as described in the above-mentioned first to the 7th embodiment.The light beam that the light source 80 issues passes through the optical module 1 Predetermined pattern is projected on measured target object afterwards, with the three-dimensional information for sensing measured target object.
The light source 80 is semiconductor laser.Preferably, the light source 80 is vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL), can pass through photoetching in semiconductor substrate 800 Or the techniques such as etching are made.
In the present embodiment, the light source 80 is the wide face type VCSEL of single hole.The wide face type VCSEL of single hole only has one A lightening hole, the aperture that shines is larger, the luminous aperture of the single luminescence unit several times in general array VCSEL.The list The light beam that the wide face type VCSEL in hole is issued is in the area source of substantially parallel outgoing after the modulation of the light beam adjustment section 12.Institute Pattern generation portion 16 is stated, for example, the uniform light that the area source can be issued by the optical microstructures 163 of corresponding design Field carries out rearrangement, to form the pattern beam that can project irregular pattern on measured target object.
As shown in figure 11, the 11st embodiment of the application provides a kind of optical projection mould group 91, implements with the 8th Optical projection mould group 81 in mode is essentially identical, and the main distinction is the light source 90 for multiple VCSEL luminescence units composition Light emitting array can including being formed in the multiple VCSEL luminescence units 902 being randomly distributed on the same semiconductor base 900 Project the spot pattern of irregular distribution.The pattern generation portion 16, for example, the optical microstructures of corresponding design can be passed through 163 copy the spot pattern of multiple irregular distributions and are incident upon on measured target object.
As shown in figure 12, the 12nd embodiment of the application provides a kind of optical projection mould group 101, implements with the 8th Optical projection mould group 81 in mode is essentially identical, and the main distinction is the light source 100 for multiple VCSEL luminescence units composition Light emitting array, including be formed on the same semiconductor base 1000 according to the evenly arranged multiple VCSEL hair of same intervals Light unit 1002 can project equally distributed spot pattern.The micro- knot of optics that the pattern generation portion 16 passes through corresponding design The equally distributed spot pattern is dispersed as the spot pattern of irregular distribution and is incident upon on measured target object by structure 163. The pattern generation portion 16, for example, it is also possible to which the optical microstructures 163 by corresponding design shine what is arranged along preset direction The light field of unit mutually merges the candy strip arranged with formation rule.
As shown in Figure 13 and Figure 14, the 13rd embodiment of the application provides a kind of optical projection mould group 111, with Optical projection mould group 81 in eight embodiments is essentially identical, and the main distinction is that the light source 110 includes independently controlling System luminous the first emission part 112 and the second emission part 114.First emission part 112 issues the first light beam and is used to form light Strong equally distributed flood beam.The flood beam be projected on measured target object for identification the measured target object whether For the special object for meeting default feature.For example, the flood beam can be used to identify whether the measured target object is face. The second light beam that second emission part 114 issues is used to form the pattern beam that predetermined pattern is projected on measured target object. The predetermined pattern is used to sense the three-dimensional information of the measured target object.First emission part 112 and the second emission part 114 It may be formed on the same semiconductor base 115 to be integrated into overall structure.In the present embodiment, first light beam and The wavelength of two light beams is identical, and wave-length coverage is 750nm to 1650nm.
In the present embodiment, first emission part 112 includes one or more for emitting the first of the first light beam Illuminator 1120.Second emission part 114 includes one or more for emitting the second illuminator 1140 of the second light beam.Institute It states the first illuminator 1120 and the second illuminator 1140 is formed on the same semiconductor base 115.The semiconductor base 114 On define positioned at first light emitting region 122 at the middle part of semiconductor base 114 and be arranged around first light emitting region 122 The second light emitting region 102.First illuminator 1120 is uniform according to preset same intervals in the first light emitting region 102 Distribution.Second illuminator 1140 is irregularly arranged in the second light emitting region 122.
First illuminator 1120 and the second illuminator 1140 can be semiconductor laser.Preferably, in this implementation In mode, first illuminator 1120 and the second illuminator 1140 are VCSEL.
In the present embodiment, first light emitting region 122 positioned at 114 middle part of semiconductor base is rectangle.It is described Second light emitting region 102 is correspondingly arranged at four edges of the first light emitting region 122.First illuminator 1120 is second It is uniformly arranged along two sides of each corner in the second light emitting region 102 according to same intervals four corners of light emitting region 102 Cloth multilayer, first light emitting region 122 be Figure 12 described in dotted line surround envelope the first light emitting region 102 each Four right angle frame bar-shaped zones at right angle.Second illuminator 102 is irregularly arranged in the first light emitting region 122, is used In the second light beam for issuing light intensity irregular distribution when lighting.
It is understood that multiple equally distributed first illuminators in each described first light emitting region 102 1120 can also be substituted by the wide face type VCSEL of a single hole.That is, each first light emitting region 102 is the wide face type of a single hole VCSEL issues the first light beam of even intensity as area source.
It is provided with the first pad 104 connecting with first illuminator 1120 on the semiconductor base 115, described One pad 104 is for controlling shining for the first illuminator 1120 with external circuit connection.It is arranged on the semiconductor base 115 There is the second pad 124 connecting with second illuminator 1140, second pad 124 is used to control with external circuit connection Make shining for the second illuminator 1140.Therefore, first illuminator 1120 and the second illuminator 1140 can pass through different controls Signal processed independently works.
Accordingly, described image generating unit 16 includes diffusion part 161 and patterning portion 162.The corresponding light of the diffusion part 161 First light emitting region 102 of source structure 100 is arranged, for issuing the first illuminator 1120 described in the first light emitting region 102 The first beam spread formed optical power detection flood beam.The second of the 162 corresponding light source structure 100 of patterning portion Light emitting region 122 is arranged, for by second illuminator 1140 issues described in the second light emitting region 122 the second light beam by pair The optical microstructures 163 that should be arranged replicate multiple irregular distributions the second illuminator 1140 issue light beam group, and It is unfolded within the scope of preset expanded- angle and is formed and be incident upon the spot pattern being randomly distributed on measured target object.The pattern Light beam, which is incident upon on measured target object, to be formed by pattern and can generate corresponding deformation because of the change in depth of measured target object, is passed through The change in shape situation for analyzing the predetermined pattern being incident upon on measured target object can obtain the three-dimensional information of the measured target object.
As shown in figure 15, the 14th embodiment of the application provides a kind of sensing device 50, is used to sense tested mesh Mark the spatial information of object.The spatial information includes but is not limited to that the three-dimensional information on measured target object surface, measured target object exist Other 3 D stereo information relevant to measured target object such as dimension information of location information, measured target object in space.Institute The spatial information of the measured target object sensed can be used for identifying measured target object or construct the 3 D stereo of measured target object Model.
The sensing device 50 include the optical projection mould group 81 as provided by above-mentioned tenth to the 13rd embodiment and Sense mould group 500.The optical projection mould group 81 carries out sensing identification for projecting in particular beam to measured target object.It is described Sensing mould group 500 is used to sense the specific image that the optical projection mould group 81 projects on measured target object and by analysis institute State the correlation space information of the tested subject matter of specific image acquisition.
In the present embodiment, the sensing device 50 is to sense the three-dimensional information on measured target object surface and identify accordingly The 3D face authentification device of measured target object identity.
The particular beam includes the flood beam of even intensity and can project default figure on measured target object The pattern beam of case.The sensing mould group 500 according to the image that the flood beam sensed is formed on measured target object come Identify whether close measured target object is face.The sensing mould group 500 is according to the pattern beam sensed tested The change in shape of the predetermined pattern projected on object is to analyze the three-dimensional information on measured target object surface and accordingly to quilt It surveys object and carries out face recognition.
As shown in figure 16, the 15th embodiment of the application provides a kind of equipment 60, such as mobile phone, laptop, flat Plate computer, touch-control interaction screen, door, the vehicles, robot, automatic numerical control lathe etc..The equipment 60 includes at least one State sensing device 50 provided by the 14th embodiment.The equipment 60 be used for according to the sensing result of the sensing device 50 come It is corresponding to execute corresponding function.The corresponding function unlocks after including but not limited to identifying user's identity, payment, starts and preset Application program, avoidance, identification user's countenance after using depth learning technology judge user mood and health feelings Any one or more in condition.
In the present embodiment, the sensing device 50 is to sense the three-dimensional information on measured target object surface and identify accordingly The 3D face authentification device of measured target object identity.The equipment 60 is the mobile phone equipped with the 3D face authentification device, notes Electric terminals, door, the vehicles, safety check, the entry and exit such as this computer, tablet computer, touch-control interaction screen etc. are related to passing in and out permission Equipment.
Compared with existing 3D senses optics module, optical module 1 provided herein, optical projection mould group 11, sense It is partially deflected to reduce whole mould group along the thickness of projecting direction, favorably by carrying out projecting light path to survey device 50 and equipment 60 It is designed in the slimming of the various equipment using the mould group.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the application.In this specification In, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the application, all the application's not to limit the application Made any modifications, equivalent replacements, and improvements etc., should be included within the scope of protection of this application within spirit and principle.

Claims (18)

1. a kind of optical module is applied in an optical projection mould group, for projecting default figure on a measured target object The pattern beam of case, the optical module include optical path-deflecting portion and pattern generation portion, and the optical path-deflecting portion will be for that will come from It is projected away after the light beam deflection special angle of one light source, to reduce entire optical projection mould group along the final projecting direction of light beam Thickness, the pattern generation portion is for modulating light beam to form the pattern beam that can project predetermined pattern.
2. optical module as described in claim 1, which is characterized in that the special angle is 90 degree.
3. optical module as claimed in claim 1 or 2, which is characterized in that the optical path-deflecting portion includes reflecting surface, passes through institute The light beam of projection is deflected the special angle by the reflex for stating reflecting surface.
4. optical module as claimed in claim 3, which is characterized in that the reflecting surface is reached by realizing total reflection to light beam The predetermined angular is deflected to by light beam, or, the reflecting surface is provided with reflective coating, it will by the reflex of reflective coating The light beam of projection deflects the predetermined angular.
5. optical module as claimed in claim 4, which is characterized in that the optical path-deflecting portion further comprises incident side surface With light emission side surface, the light beam from light source from the incident side surface enter the optical path-deflecting portion, and along first direction into Row transmission, when beam Propagation is reflected to the reflecting surface, the light beam after reflection transmits in a second direction and from light emission side table Face projects away, to reduce the thickness of entire optical projection mould group in a second direction.
6. optical module as claimed in claim 5, which is characterized in that the optical path-deflecting portion includes trapezoidal prism or trigone Column.
7. optical module as claimed in claim 5, which is characterized in that light beam is in optical path-deflecting portion along first direction transmission Path is longer than the path transmitted in a second direction.
8. optical module as claimed in claim 4, which is characterized in that the pattern generation portion corresponds to the optical path-deflecting portion Incident side setting, or, the pattern generation portion corresponds to the light emission side setting in the optical path-deflecting portion.
9. optical module as described in claim 1, which is characterized in that the pattern generation portion includes diffraction optical element, micro- Any one or the combination of several of them in lens array and grating.
10. optical module as claimed in claim 8, which is characterized in that the pattern generation portion is with the optical path-deflecting portion Integral structure, or, the pattern generation portion and the optical path-deflecting portion are separate structure.
11. the optical module as described in any one of claim 1-10, which is characterized in that the pattern generation portion by pair The optical microstructures that should be arranged carry out rearrangement to the light field of incident beam to form the pattern that can project predetermined pattern Light beam, the pattern generation portion are the individual optical elements for being formed with the optical microstructures, are arranged in the deflection optical portion Light emission side after deflecting light beam;Or
The pattern generation portion is the light on the light emission side surface after being formed directly into the deflection optical portion deflection light beam Learn micro-structure;Or
The pattern generation portion carries out rearrangement to the light field of incident beam to be formed by the optical microstructures being correspondingly arranged The pattern beam of predetermined pattern can be projected, the pattern generation portion is the Individual optical member for being formed with the optical microstructures The incident side in the deflection optical portion is arranged in and between the light beam adjustment section and optical path-deflecting portion in part;Or
The pattern generation portion is the optical microstructures being formed directly on the reflecting surface in the deflection optical portion, is incident to The formation of rearrangement light field can project light beam on reflecting surface under the action of the optical microstructures while being reflected The pattern beam of predetermined pattern projects out.
12. optical module as claimed in claim 3, which is characterized in that the reflecting surface is reflecting curved surface.
13. the optical module as described in any one of claim 1-10, which is characterized in that the optical module further wraps Light beam adjustment section is included, for being collimated or/and being expanded to light beam.
14. optical module as claimed in claim 13, which is characterized in that the optical path-deflecting portion includes reflecting prism, described Reflecting prism includes the incident side surface set gradually along projecting light path, reflecting surface and light emission side surface, the light beam adjustment section Including with optical alignment and/or expanding the optical texture of effect, the optical texture is formed directly into the reflecting prism On incident side surface and/or light emission side surface;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side table set gradually along projecting light path Face, reflecting surface and light emission side surface, the light beam adjustment section include the optical texture patch for having optical alignment and/or expanding effect Piece, the optical texture patch are bonded on the incident side surface and/or light emission side surface of reflecting prism;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side table set gradually along projecting light path Face, reflecting surface and light emission side surface, the light beam adjustment section include the separate lenses for having optical alignment and/or expanding effect, The lens correspond to the incident side surface of reflecting prism and/or the setting of light emission side surface, the lens and can move along projecting light path; Or
The optical path-deflecting portion includes reflecting mirror, and the reflecting surface of the reflecting mirror changes the direction of projecting light path to realize that optical path is inclined Turn, the light beam adjustment section includes the separate lenses for having optical alignment and/or expanding effect, the incident side of corresponding reflecting mirror And/or light emission side setting;Or
The optical path-deflecting portion includes reflecting prism, and the reflecting prism includes the incident side table set gradually along projecting light path Face, reflecting surface and light emission side surface, the light beam adjustment section include the separate lenses for having optical alignment and/or expanding effect, The lens correspond to the incident side surface setting of reflecting prism, and the lens can be moved along projecting light path.
15. a kind of optical projection mould group is sensed on the pattern beam to measured target object with predetermined pattern for projecting, It includes light source and the optical module as described in any one of claim 1 to 14.
16. optical projection mould group as claimed in claim 15, which is characterized in that the light source is the wide face type vertical cavity surface of single hole Emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL), the wide face type VCSEL of single hole For the uniform area source of luminous intensity, the uniform light field that the light source issues is carried out rearrangement and is formed by the pattern generation portion The pattern beam of irregular pattern can be projected;Or
The light source is array VCSEL, including being formed in the multiple VCSEL being randomly distributed on same semiconductor base hair Light unit, can project the spot pattern of irregular distribution, and the pattern generation portion copies multiple irregular distributions Spot pattern is simultaneously unfolded within the scope of preset expanded- angle and forms the hot spot for being incident upon and being randomly distributed on measured target object Pattern;Or
The light source is array VCSEL, including is formed in evenly arranged according to same intervals on the same semiconductor base Multiple VCSEL luminescence units, can project equally distributed spot pattern, and the pattern generation portion issues the light source equal Even light field carries out rearrangement and forms the pattern beam that can project irregular pattern;Or
The light source is array VCSEL, including is formed in evenly arranged according to same intervals on the same semiconductor base Multiple VCSEL luminescence units, can project equally distributed spot pattern, and the pattern generation portion can also will be along preset direction The light field of the luminescence unit of arrangement mutually merges the candy strip arranged with formation rule;Or
The light source includes the first emission part for issuing the first light beam and the second emission part for issuing the second light beam, first light Beam is used to form the flood beam of optical power detection, second light beam be used to form projected on measured target object it is default The pattern beam of pattern, first emission part and the second emission part are formed on the same semiconductor base and by different Control signal independently works.
17. a kind of sensing device, for sensing the three-dimensional information of measured target object comprising as described in claim 15 or 16 Optical projection mould group and sensing mould group, the sensing mould group be used for sense the optics module projected on measured target object it is pre- If pattern and the image by analyzing the predetermined pattern obtain the three-dimensional information of tested subject matter.
18. a kind of equipment, including the sensing device described in claim 17, the equipment is sensed according to the sensing device The three-dimensional information of measured target object execute corresponding function.
CN201811047032.1A 2018-09-08 2018-09-08 A kind of optical module, optical projection mould group, sensing device and equipment Withdrawn CN109143753A (en)

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Application publication date: 20190104