CN108531870A - A kind of novel evacuated coating apparatus - Google Patents
A kind of novel evacuated coating apparatus Download PDFInfo
- Publication number
- CN108531870A CN108531870A CN201810490217.3A CN201810490217A CN108531870A CN 108531870 A CN108531870 A CN 108531870A CN 201810490217 A CN201810490217 A CN 201810490217A CN 108531870 A CN108531870 A CN 108531870A
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- CN
- China
- Prior art keywords
- vacuum
- tight
- vacuum chamber
- substrate
- housing
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of novel evacuated coating apparatus, including cabinet, the side of the cabinet is equipped with vacuum chamber, the inner bottom of the vacuum chamber is equipped with heating furnace, the lower inside of the vacuum chamber is equipped with crucible by fixed frame, and sealing cover is equipped with above the vacuum chamber, the first substrate is equipped at the top of the anode plate, the inner upper of the vacuum (-tight) housing is equipped with cathode plate by holder, and sputtering target material is equipped with below the cathode plate.The present invention is equipped with vacuum (-tight) housing and vacuum chamber, cathode plate and anode plate are installed in vacuum (-tight) housing, plated film is carried out by sputter coating principle, and crucible is installed in the inside of vacuum chamber, heating furnace is installed below crucible, plated film can be carried out by evaporation coating principle by it, two different plated film modes use simultaneously, the versatility for significantly increasing device, improves the scope of application.
Description
Technical field
The present invention relates to vacuum coater field, specifically a kind of novel evacuated coating apparatus.
Background technology
Vacuum coater be it is a kind of by physical method generate thin-film material technology, vacuum indoor material atom from
Heating source, which isolates, to be got on the surface of plated object, and technique is used to produce optical mirror slip, such as long glass at first
Eyeglass etc., after extend to other function films, disc aluminizes, decoration film coating and material surface modifying etc., as Watchcase plating is imitative
Gold, machinery knives plated film change processing red hardness, prepare film layer in a vacuum, including be coated with the metal of crystalline state, semiconductor,
The simple substance such as insulator or compound film.Although chemical vapor deposition also uses the vacuum means such as decompression, low pressure or plasma,
General vacuum coating refers to the method deposition film with physics.Vacuum coating there are three types of form, i.e., evaporation coating, sputter coating and
Ion plating.
There are many shortcomings for the vacuum coater of current stage, for example, universal performance is poor, installing and dismounting is not square
Just, it has not been convenient to use.
Invention content
The purpose of the present invention is to provide a kind of novel evacuated coating apparatus, to solve universal performance in the prior art
Difference, installing and dismounting are inconvenient, it has not been convenient to the problem of using.
To achieve the above object, the present invention provides the following technical solutions：A kind of novel evacuated coating apparatus, including cabinet,
The side of the cabinet is equipped with vacuum chamber, and the inner bottom of the vacuum chamber is equipped with heating furnace, the inside of the vacuum chamber
Lower section is equipped with crucible by fixed frame, and sealing cover is equipped with above the vacuum chamber, is equipped at the top of the sealing cover
Second handle is equipped with elbow-board below the sealing cover, substrate fixed plate, the base is equipped with below the elbow-board
Clamping plate is installed, the side of the clamping plate is equipped with spring, control panel, institute are equipped with above the cabinet in piece fixed plate
It states and vacuum (-tight) housing is installed above control panel, the side of the vacuum (-tight) housing is equipped with argon gas and is filled with mouth, the top of the vacuum (-tight) housing
End side is equipped with the first in command, and the lower inside of the vacuum (-tight) housing is equipped with anode plate, is equipped at the top of the anode plate
The inner upper of first substrate, the vacuum (-tight) housing is equipped with cathode plate by holder, and sputtering is equipped with below the cathode plate
Target.
Preferably, the heating furnace is located at the underface of crucible, and crucible is located at the underface of the second substrate.
Preferably, the both sides of the elbow-board are both provided with sliding slot, and elbow-board passes through the madial wall of sliding slot and vacuum chamber
It is slidably connected.
Preferably, the sputtering target material and the first substrate face are installed, and the first substrate is fixed on cathode plate by fixture
On.
Preferably, it there are six the clamping plate is arranged altogether, and is connected by spring between six clamping plates.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention is equipped with vacuum (-tight) housing and vacuum chamber, in vacuum (-tight) housing
Cathode plate and anode plate are inside installed, plated film is carried out by sputter coating principle, and crucible is installed in the inside of vacuum chamber,
Heating furnace is installed below crucible, plated film, two different plated film modes can be carried out by evaporation coating principle by it
It uses simultaneously, significantly increases the versatility of device, improve the scope of application, and the second substrate is mounted in substrate fixed plate,
It is equipped in substrate fixed plate through spring controlled clamping plate, facilitates its installing and dismounting, and substrate fixed plate is mounted on and inlays
The lower section of plate, is equipped with sealing cover above elbow-board, and second handle is equipped at the top of sealing cover, passes through such design
Greatly facilitate the installing and dismounting of substrate fixed plate.
Description of the drawings
Fig. 1 is the structural diagram of the present invention.
Fig. 2 is the upward view of the substrate fixed plate of the present invention.
In figure：1- holders, 2- cathode plates, 3- sputtering target materials, 4- argon gas are filled with mouth, the first substrates of 5-, 6- anode plates, 7- controls
Panel processed, 8- cabinets, 9- fixed frames, 10- crucibles, 11- heating furnaces, 12- vacuum (-tight) housings, the 13- first in command, 14- second handles,
15- sealing covers, 16- elbow-boards, 17- substrates fixed plate, the second substrates of 18-, 19- vacuum chambers, 20- springs, 21- clamping plates.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Please refer to Fig.1~2, in the embodiment of the present invention, a kind of novel evacuated coating apparatus, including cabinet 8, the one of cabinet 8
Side is equipped with vacuum chamber 19, and vacuum chamber 19 is used for evaporation coating, and the inner bottom of vacuum chamber 19 is equipped with heating furnace 11, heating furnace
11 are used for heating crucible 10, and the lower inside of vacuum chamber 19 is equipped with crucible 10 by fixed frame 9, and crucible 10 is used for containing
Evaporated material is put, the top of vacuum chamber 19 is equipped with sealing cover 15, and sealing cover 15 is used for being sealed the top of vacuum chamber 19,
The top of sealing cover 15 is equipped with second handle 14, and the lower section of sealing cover 15 is equipped with elbow-board 16, and elbow-board 16 facilitates substrate
Fixed plate 17 is mounted in vacuum chamber 19, and the lower section of elbow-board 16 is equipped with substrate fixed plate 17, and substrate fixed plate 17 is used for solid
Determine the second substrate 18, clamping plate 21 is installed in substrate fixed plate 17, clamping plate 21 is used for gripping the second substrate 18, press from both sides
The side of plate 21 is equipped with spring 20, and the top of cabinet 8 is equipped with control panel 7, and the top of control panel 7 is equipped with vacuum (-tight) housing
12, vacuum (-tight) housing 12 is used for sputter coating, and the side of vacuum (-tight) housing 12 is equipped with argon gas and is filled with mouth 4, and argon gas is filled with mouth 4 and is used for vacuum
It is filled with argon gas in cover 12, the top side of vacuum (-tight) housing 12 is equipped with the first in command 13, and the lower inside of vacuum (-tight) housing 12 is equipped with sun
The top of pole plate 6, anode plate 6 is equipped with the first substrate 5, and the inner upper of vacuum (-tight) housing 12 is equipped with cathode plate 2 by holder 1,
The lower section of cathode plate 2 is equipped with sputtering target material 3, and heating furnace 11 is located at the underface of crucible 10, and crucible 10 is located at the second substrate
The both sides of 18 underface, elbow-board 16 are both provided with sliding slot, and elbow-board 16 is slided by the madial wall of sliding slot and vacuum chamber 19
Dynamic connection, sputtering target material 3 and 5 face of the first substrate are installed, and the first substrate 5 is fixed on by fixture on cathode plate 2, sputtering target
Material 3 and 5 face of the first substrate are installed, and the first substrate 5 is fixed on by fixture on cathode plate 2.
The present invention operation principle be：When in use, vacuum (-tight) housing 12 is raised for the equipment, and the first substrate 5 is mounted on sun
On pole plate 6, the second substrate 18 is fixed in substrate fixed plate 17, substrate fixed plate 17 is sent by vacuum chamber by elbow-board 16
In 19, in vacuum (-tight) housing 12, the argon gas that 10 ~ 1 pas are filled with after high vacuum is evacuated to by system, between anode plate 6 and cathode plate 2
Several kilovoltages, two interpolars are added to generate glow discharge, the cation for generation of discharging flies to cathode under electric field action, with sputtering
3 surface atom of target collides, and is known as sputtered atom by the target atom that collision is escaped from target surface, sputtered atom is in 5 table of the first substrate
Face deposition film forming, and in vacuum chamber 19, evaporated material is put into crucible 10, by heating furnace 11 to the evaporation in crucible 10
Substance is evaporated, and the atom or molecule of evaporated material are deposited on condensing mode on the second substrate 18.
It is obvious to a person skilled in the art that invention is not limited to the details of the above exemplary embodiments, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the present invention is by appended power
Profit requires rather than above description limits, it is intended that all by what is fallen within the meaning and scope of the equivalent requirements of the claims
Variation is included within the present invention.Any reference signs in the claims should not be construed as limiting the involved claims.
Claims (5)
1. a kind of novel evacuated coating apparatus, including cabinet（8）, it is characterised in that:The cabinet（8）Side vacuum is installed
Room（19）, the vacuum chamber（19）Inner bottom heating furnace is installed（11）, the vacuum chamber（19）Lower inside pass through
Fixed frame（9）Crucible is installed（10）, the vacuum chamber（19）Top sealing cover is installed（15）, the sealing cover（15）'s
Top is equipped with second handle（14）, the sealing cover（15）Lower section elbow-board is installed（16）, the elbow-board（16）'s
Lower section is equipped with substrate fixed plate（17）, the substrate fixed plate（17）On clamping plate is installed（21）, the clamping plate（21）One
Side is equipped with spring（20）, the cabinet（8）Top control panel is installed（7）, the control panel（7）Top installation
There is vacuum (-tight) housing（12）, the vacuum (-tight) housing（12）Side argon gas be installed be filled with mouth（4）, the vacuum (-tight) housing（12）Top side
The first in command is installed（13）, the vacuum (-tight) housing（12）Lower inside anode plate is installed（6）, the anode plate（6）Top
Portion is equipped with the first substrate（5）, the vacuum (-tight) housing（12）Inner upper pass through holder（1）Cathode plate is installed（2）, described the moon
Pole plate（2）Lower section sputtering target material is installed（3）.
2. a kind of novel evacuated coating apparatus according to claim 1, it is characterised in that：The heating furnace（11）Positioned at earthenware
Crucible（10）Underface, and crucible（10）Positioned at the second substrate（18）Underface.
3. a kind of novel evacuated coating apparatus according to claim 1, it is characterised in that：The elbow-board（16）Both sides
It is both provided with sliding slot, and elbow-board（16）Pass through sliding slot and vacuum chamber（19）Madial wall be slidably connected.
4. a kind of novel evacuated coating apparatus according to claim 1, it is characterised in that：The sputtering target material（3）With
One substrate（5）Face is installed, and the first substrate（5）It is fixed on cathode plate by fixture（2）On.
5. a kind of novel evacuated coating apparatus according to claim 1, it is characterised in that：The clamping plate（21）It is provided with altogether
Six, and six clamping plates（21）Between pass through spring（21）Connection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810490217.3A CN108531870A (en) | 2018-05-21 | 2018-05-21 | A kind of novel evacuated coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810490217.3A CN108531870A (en) | 2018-05-21 | 2018-05-21 | A kind of novel evacuated coating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108531870A true CN108531870A (en) | 2018-09-14 |
Family
ID=63472470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810490217.3A Pending CN108531870A (en) | 2018-05-21 | 2018-05-21 | A kind of novel evacuated coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108531870A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102046856A (en) * | 2008-05-27 | 2011-05-04 | 皮考逊公司 | Methods and apparatus for deposition reactors |
| CN103397300A (en) * | 2013-08-06 | 2013-11-20 | 中国钢研科技集团有限公司 | Multifunctional experiment device and method for deposition of zinc alloy coating |
| CN205590788U (en) * | 2016-04-18 | 2016-09-21 | 绍兴鑫兴纺织镭射科技有限公司 | Internal type magnetron sputtering target coating machine |
| CN206319058U (en) * | 2016-12-28 | 2017-07-11 | 量镀（上海）新材料科技股份有限公司 | One kind evaporation and magnetron sputtering Integral film-coated equipment |
| CN107236933A (en) * | 2017-08-03 | 2017-10-10 | 肇庆市科润真空设备有限公司 | The filming equipment and method of a kind of flexible parent metal coating thick film |
| CN107385395A (en) * | 2017-06-15 | 2017-11-24 | 嘉兴敏胜汽车零部件有限公司 | A kind of composite film coating device |
| CN107841721A (en) * | 2017-12-22 | 2018-03-27 | 中山国鳌智能科技有限公司 | A kind of Novel film-coated equipment |
-
2018
- 2018-05-21 CN CN201810490217.3A patent/CN108531870A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102046856A (en) * | 2008-05-27 | 2011-05-04 | 皮考逊公司 | Methods and apparatus for deposition reactors |
| CN103397300A (en) * | 2013-08-06 | 2013-11-20 | 中国钢研科技集团有限公司 | Multifunctional experiment device and method for deposition of zinc alloy coating |
| CN205590788U (en) * | 2016-04-18 | 2016-09-21 | 绍兴鑫兴纺织镭射科技有限公司 | Internal type magnetron sputtering target coating machine |
| CN206319058U (en) * | 2016-12-28 | 2017-07-11 | 量镀（上海）新材料科技股份有限公司 | One kind evaporation and magnetron sputtering Integral film-coated equipment |
| CN107385395A (en) * | 2017-06-15 | 2017-11-24 | 嘉兴敏胜汽车零部件有限公司 | A kind of composite film coating device |
| CN107236933A (en) * | 2017-08-03 | 2017-10-10 | 肇庆市科润真空设备有限公司 | The filming equipment and method of a kind of flexible parent metal coating thick film |
| CN107841721A (en) * | 2017-12-22 | 2018-03-27 | 中山国鳌智能科技有限公司 | A kind of Novel film-coated equipment |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180914 |
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| RJ01 | Rejection of invention patent application after publication |