CN108231532A - A kind of deep ultraviolet light source of electron-beam excitation fluorescent powder - Google Patents

A kind of deep ultraviolet light source of electron-beam excitation fluorescent powder Download PDF

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Publication number
CN108231532A
CN108231532A CN201711497187.0A CN201711497187A CN108231532A CN 108231532 A CN108231532 A CN 108231532A CN 201711497187 A CN201711497187 A CN 201711497187A CN 108231532 A CN108231532 A CN 108231532A
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CN
China
Prior art keywords
electron
light source
ultraviolet light
deep ultraviolet
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711497187.0A
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Chinese (zh)
Inventor
赵健
夏忠平
朱滨
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Shanghai Youwei Photoelectric Technology Co Ltd
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Shanghai Youwei Photoelectric Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Youwei Photoelectric Technology Co Ltd filed Critical Shanghai Youwei Photoelectric Technology Co Ltd
Priority to CN201711497187.0A priority Critical patent/CN108231532A/en
Publication of CN108231532A publication Critical patent/CN108231532A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/38Devices for influencing the colour or wavelength of the light
    • H01J61/42Devices for influencing the colour or wavelength of the light by transforming the wavelength of the light by luminescence
    • H01J61/44Devices characterised by the luminescent material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/36Seals between parts of vessels; Seals for leading-in conductors; Leading-in conductors
    • H01J61/361Seals between parts of vessel

Abstract

The present invention relates to ultraviolet source field more particularly to a kind of deep ultraviolet light sources of electron-beam excitation fluorescent powder.The light source includes fluorescent screen, electron gun and glass shell, wherein the fluorescent screen includes quartz glass and coated in the Ultraluminescence bisque on the quartz glass;The electron gun is set in the glass shell, and for the electron beam that the electron gun generates towards the Ultraluminescence bisque, the Ultraluminescence bisque sends out deep ultraviolet light under the electron-beam excitation through quartz glass;The fluorescent screen passes through transitional glass and the glass shell sealing-in.The deep ultraviolet light source of the application is pollution-free, at low cost, is easy to mass produce.

Description

A kind of deep ultraviolet light source of electron-beam excitation fluorescent powder
Technical field
This application involves ultraviolet source field more particularly to a kind of deep ultraviolet light sources of electron-beam excitation fluorescent powder.
Background technology
Deep ultraviolet light source is widely used in radiation sterilizing field, and current most common deep ultraviolet light source is mercury lamp, but mercury lamp Containing mercury, mercury pollution is all be easy to cause during production and use, while generate purple during mercury lamp by way of gas discharge Outer light, the spectral line of mercury lamp are the continuous spectrum of ultraviolet region, and application efficiency is low, simultaneously because electrode temperature is high when mercury lamp works, Cause its service life shorter.
UV-LED has the characteristics that mercury-free, energy saving, portable, is a kind of ultraviolet source that can substitute mercury lamp, but UV-LED Transfer efficiency is low, while its higher manufacture cost and relatively low output power limit are in the application in sterilizing field.
Invention content
The embodiment of the present application provides a kind of deep ultraviolet light source of electron-beam excitation fluorescent powder, with provide it is a kind of it is pollution-free, Power is high, deep ultraviolet light source at low cost.
In order to achieve the above objectives, the embodiment of the present application provides a kind of deep ultraviolet light source of electron-beam excitation fluorescent powder, institute It states light source and includes fluorescent screen, electron gun and glass shell, wherein:
The fluorescent screen includes quartz glass and coated in the Ultraluminescence bisque on the quartz glass;
The electron gun is set in the glass shell, and the electron beam that the electron gun generates is towards the Ultraluminescence Bisque, the Ultraluminescence bisque send out deep ultraviolet light under the electron-beam excitation through quartz glass;
The fluorescent screen passes through transitional glass and the glass shell sealing-in.
Further, the Ultraluminescence bisque includes host material and active ions, and the host material is yttrium phosphate.
Further, the active ions are Bi2+, Pr3+Or Gd3+In any one.
Further, the electronic glass of the model DM308 or DM305 of the glass shell.
Further, the fluorescent screen passes through multiple tracks transitional glass and the glass shell sealing-in.
Further, the electron beam that the electron gun generates excites the fluorescence in a manner of focusing on scanning or area projection Bisque.
Further, the electron gun is thermal electron rifle or field emission gun,.
Further, the operating voltage of the electron gun is 5kv~20kv.
Further, the Ultraluminescence bisque is used as adhesive coated on the quartz glass by silica.
Further, the light source further includes metal anode, the metal anode by metal can cut down with outside the glass Shell matched seal.
Deep ultraviolet light source provided by the embodiments of the present application includes fluorescent screen, electron gun and glass shell, electron gun fluorescence Screen is all placed in glass shell, and the fluorescent powder in electron-beam excitation fluorescent screen is generated by electron gun, so as to send out deep ultraviolet light, The application is light-emitting window using quartz glass, sealing-in is carried out by transitional glass and outer casing shell, so as to significantly improve The light power of light source, while the light source of the application is pollution-free, it is at low cost, it is easy to mass produce.
Description of the drawings
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, to embodiment or it will show below There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this Some embodiments described in application, for those of ordinary skill in the art, in the premise of not making the creative labor property Under, it can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the schematic diagram of the deep ultraviolet light source of the electron-beam excitation fluorescent powder of the embodiment of the present application.
Specific embodiment
In order to make those skilled in the art better understand the technical solutions in the application, below in conjunction with the application reality The attached drawing in example is applied, the technical solution in the embodiment of the present application is clearly and completely described, it is clear that described implementation Example is merely a part but not all of the embodiments of the present application.Based on the embodiment in the application, this field is common Technical staff's all other embodiments obtained without making creative work should all belong to the application protection Range.
Below in conjunction with the accompanying drawings, the specific embodiment of the embodiment of the present application is described in further detail.
With reference to figure 1, the deep ultraviolet light source of the electron-beam excitation fluorescent powder of the embodiment of the present application includes electron gun 1, outside glass Shell 2 and fluorescent screen.Wherein fluorescent screen is by quartz glass 3 and coated in 4 groups of Ultraluminescence bisque on the quartz glass 3 Into the Ultraluminescence bisque 4 can be used as adhesive coated on the quartz glass 3 by silica;Electron gun 1 is set It in the glass shell 2, is protected by glass shell 2, and required vacuum environment can be provided by glass shell 2, The electron gun is thermal electron rifle or field emission gun, and the operating voltage of the electron gun is preferably 5kv~20kv;Into One step, the electron beam that the electron gun generates excites the phosphor powder layer in a manner of focusing on scanning or area projection, such as schemes Shown in middle arrow, the electron beam that the electron gun generates is towards the Ultraluminescence bisque 4, and the Ultraluminescence bisque 4 is in institute It states and sends out deep ultraviolet light through quartz glass 3 under electron-beam excitation.In the deep ultraviolet light source of the prior art, mercury lamp is to use gas The mode of body electric discharge generates ultraviolet light, but mercury has severe toxicity, pollutes environment, while gas discharge mode short life, intensity are non-adjustable System;Another kind is UV-LED deep ultraviolet lamps, is to generate deep ultraviolet light by electroluminescent mode, electroluminescent mode by On the one hand the limitation of material can only send out the light of specific wavelength, another aspect transfer efficiency is low, and light extraction general power is low, limits Its application in the industry.And the deep ultraviolet light source of the application is generated by way of electron gun excitated fluorescent powder, by swashing The fluorescent powder for sending out different, can generate the deep ultraviolet light of different wave length, at the same can by adjusting electron gun operating voltage from And light power is adjusted, another aspect the application uses quartz glass to avoid simple glass to deep ultraviolet as light-emitting window The absorption of light, so as to significantly improve the transfer efficiency of light source, embodiments herein is generated by electron-beam excitation fluorescent powder The mode of deep ultraviolet light, have long lifespan, stability is good, it is efficient the advantages of.
The fluorescent screen passes through transitional glass 5 and 2 sealing-in of glass shell.The quartz glass selected in the fluorescent screen The light transmittance of 3 pairs of ultraviolet lights reaches more than 90%, can preferably penetrate the optics of the continuous spectrum from far ultraviolet to near-infrared Quartz glass, quartz glass relative to simple glass have UV Absorption it is small, transmitance it is strong the advantages of, be particularly advantageous for dark purple Outer light penetrates.The casing part of light source selects the electronic glass of common electronic glass, preferably model DM308 or DM305, has Conducive to reduction production cost, and common electronic glass is easy to process, while can be with reproducing electronic gun stem matched seal.Quartzy glass Connectivity problem between glass 3 and glass shell 2 becomes the difficulties in this field, quartz glass and ordinary electronic glass melting point Difference is very big, and quartz glass fusing point is up to 1000 DEG C or so, and common electronic glass fusing point is at 600 DEG C or so, while the two heat Coefficient of expansion difference is very big, and direct sealing-in difficulty is big, be easy to cause sealing-in crackle, and yield rate is low;By the present invention in that use transition Glass 5 is by the fluorescent screen and 2 sealing-in of glass shell, and the coefficient of thermal expansion fusing point and coefficient of thermal expansion of transitional glass 5 are all Between quartz glass and the coefficient of thermal expansion of glass shell, so as to reduce sealing-in difficulty, sealing-in yield rate is improved, is had Conducive to reduction production cost.Preferably, fluorescent screen passes through multiple tracks transitional glass and glass shell sealing-in in the embodiment of the present application.
The Ultraluminescence bisque used in the embodiment of the present application includes host material and active ions, and the host material is Yttrium phosphate, active ions are preferably Bi2+, Pr3+Or Gd3+In any one.Yttrium phosphate is low with phonon energy, chemical stabilization The advantages of property is good, by adulterating Bi2+, Pr3+Or Gd3+Ion, so as to sending out the dark purple of different wave length under electron-beam excitation Outer light.
Further, the light source further includes metal anode 7, can be cut down by metal between metal anode 7 and glass shell Matching connection, while the glass shell inner wall in the embodiment of the present application is coated with electrically conductive graphite, when the electron beam that electron gun generates During excitated fluorescent powder, phosphor surface meeting stored charge will ultimately result in fluorescent powder hair so as to influence the energy absorption of fluorescent powder Light efficiency declines, and can charge be led to metal anode by electrically conductive graphite, so as to improve light-emitting phosphor efficiency.Existing skill Metal anode is generally fixed on reproducing electronic gun stem in art, but electrically conductive graphite just must be coated with to contacting with metal anode at this time Position, for glass shell of different shapes, coating difficulty increase is unfavorable for large-scale production, the metal anode of the application is straight Connect with glass shell sealing-in, increase electrically conductive graphite coating flexibility, be conducive to large-scale production.
Further, the embodiment of the present application further includes reflecting layer 6, is coated on phosphor powder layer by way of vapor deposition, Fine aluminium reflecting layer of the preferred thickness for 100nm or so, so that the deep ultraviolet light generated after electron-beam excitation fluorescent powder is concentrated Towards light-emitting surface project, reduce deep ultraviolet light towards light source internal project and caused by go out light loss.
Deep ultraviolet light source provided by the embodiments of the present application includes fluorescent screen, electron gun and glass shell, electron gun fluorescence Screen is all placed in glass shell, and the fluorescent powder in electron-beam excitation fluorescent screen is generated by electron gun, so as to send out deep ultraviolet light, The application is light-emitting window using quartz glass, can significantly improve the light power of light source, while fluorescent screen passes through transition glass Glass carries out sealing-in with outer casing shell, solves the disadvantage that quartz glass and outer casing shell sealing-in are difficult, improves sealing-in yield rate, drops Low production cost.The relatively existing mercury lamp of the ultraviolet source of the embodiment of the present application and UV-LED etc., have it is pollution-free, it is at low cost, The advantages of being easy to large-scale production, is with a wide range of applications in sterilizing field.
Particular embodiments described above has carried out the purpose, technical solution and advantageous effect of the application further in detail It describes in detail bright, it should be understood that the foregoing is merely the specific embodiment of the embodiment of the present application, is not used to limit this Shen Protection domain please, all any modification, equivalent substitution, improvement and etc. within spirit herein and principle, done, should all wrap It is contained within the protection domain of the application.

Claims (10)

1. a kind of deep ultraviolet light source of electron-beam excitation fluorescent powder, which is characterized in that the light source include fluorescent screen, electron gun, And glass shell, wherein:
The fluorescent screen includes quartz glass and coated in the Ultraluminescence bisque on the quartz glass;
The electron gun is set in the glass shell, and the electron beam that the electron gun generates is towards the ultraviolet fluorescence powder Layer, the Ultraluminescence bisque send out deep ultraviolet light under the electron-beam excitation through quartz glass;
The fluorescent screen passes through transitional glass and the glass shell sealing-in.
2. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the ultraviolet fluorescence powder Layer includes host material and active ions, and the host material is yttrium phosphate.
3. the deep ultraviolet light source of electron-beam excitation fluorescent powder as claimed in claim 2, which is characterized in that the active ions are Bi2+, Pr3+Or Gd3+In any one.
4. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the glass shell The electronic glass of model DM308 or DM305.
5. the deep ultraviolet light source of electron-beam excitation fluorescent powder as claimed in claim 4, which is characterized in that the fluorescent screen passes through Multiple tracks transitional glass and the glass shell sealing-in.
6. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the electron gun generates Electron beam excite the phosphor powder layer in a manner of focusing on scanning or area and project.
7. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the electron gun is heat Launching electronics rifle or field emission gun,.
8. the deep ultraviolet light source of electron-beam excitation fluorescent powder as claimed in claim 7, which is characterized in that the work of the electron gun Make voltage as 5kv~20kv.
9. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the ultraviolet fluorescence powder Layer is used as adhesive coated on the quartz glass by silica.
10. the deep ultraviolet light source of electron-beam excitation fluorescent powder as described in claim 1, which is characterized in that the light source also wraps Metal anode is included, the metal anode can be cut down and the glass shell matched seal by metal.
CN201711497187.0A 2017-12-31 2017-12-31 A kind of deep ultraviolet light source of electron-beam excitation fluorescent powder Pending CN108231532A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023212875A1 (en) * 2022-05-05 2023-11-09 上海极优威光电科技有限公司 Ultraviolet cathode ray tube

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CN1108681A (en) * 1993-12-17 1995-09-20 东芝株式会社 Fluorescentor, cathode ray tube, fluorescent lamp and radiation intensifying paper
CN1626615A (en) * 2003-11-12 2005-06-15 日亚化学工业株式会社 Green luminous yttrium silicate luminophor and CRT using same
CN1658364A (en) * 2004-02-17 2005-08-24 株式会社日立显示器 Display apparatus
CN101842869A (en) * 2007-09-03 2010-09-22 国立大学法人神户大学 Deep ultraviolet semiconductor optical device
TWM448783U (en) * 2012-08-22 2013-03-11 Univ Nat Defense Field emission cathode and field emission lamp thereof
CN103018963A (en) * 2011-09-22 2013-04-03 哈利盛东芝照明株式会社 Ultraviolet irradiation device
US20130313964A1 (en) * 2012-05-25 2013-11-28 Futaba Corporation Ultraviolet Light-Emitting Material And Ultraviolet Light Source
CN203423142U (en) * 2013-06-25 2014-02-05 四川天微电子有限责任公司 Solar blind type photoelectric sensor
CN104736661A (en) * 2012-10-23 2015-06-24 浜松光子学株式会社 Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation
CN104755584A (en) * 2012-10-23 2015-07-01 浜松光子学株式会社 Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1108681A (en) * 1993-12-17 1995-09-20 东芝株式会社 Fluorescentor, cathode ray tube, fluorescent lamp and radiation intensifying paper
CN1626615A (en) * 2003-11-12 2005-06-15 日亚化学工业株式会社 Green luminous yttrium silicate luminophor and CRT using same
CN1658364A (en) * 2004-02-17 2005-08-24 株式会社日立显示器 Display apparatus
CN101842869A (en) * 2007-09-03 2010-09-22 国立大学法人神户大学 Deep ultraviolet semiconductor optical device
CN103018963A (en) * 2011-09-22 2013-04-03 哈利盛东芝照明株式会社 Ultraviolet irradiation device
US20130313964A1 (en) * 2012-05-25 2013-11-28 Futaba Corporation Ultraviolet Light-Emitting Material And Ultraviolet Light Source
TWM448783U (en) * 2012-08-22 2013-03-11 Univ Nat Defense Field emission cathode and field emission lamp thereof
CN104736661A (en) * 2012-10-23 2015-06-24 浜松光子学株式会社 Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation
CN104755584A (en) * 2012-10-23 2015-07-01 浜松光子学株式会社 Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation
CN203423142U (en) * 2013-06-25 2014-02-05 四川天微电子有限责任公司 Solar blind type photoelectric sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023212875A1 (en) * 2022-05-05 2023-11-09 上海极优威光电科技有限公司 Ultraviolet cathode ray tube

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