CN107797218B - Objective lens aberration correcting lens, aberration correcting method, optical system and photoetching machine - Google Patents

Objective lens aberration correcting lens, aberration correcting method, optical system and photoetching machine Download PDF

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CN107797218B
CN107797218B CN201610777202.6A CN201610777202A CN107797218B CN 107797218 B CN107797218 B CN 107797218B CN 201610777202 A CN201610777202 A CN 201610777202A CN 107797218 B CN107797218 B CN 107797218B
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objective lens
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CN107797218A (en
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郭银章
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Shanghai Micro Electronics Equipment Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/021Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment

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  • General Physics & Mathematics (AREA)
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Abstract

The invention discloses an objective lens aberration correcting lens, which comprises a pressure control device and a lens which are connected, the lens comprises a first flat thin lens, a second flat thin lens, a lens barrel, a first space ring, a second space ring, a first pressing ring and a second pressing ring, wherein the first space ring, the second space ring, the first pressing ring and the second pressing ring fix the first flat thin lens and the second flat thin lens in the lens barrel along the incident direction of light rays, the first flat thin lens, the second flat thin lens and the inner wall of the lens barrel enclose a filling area, the pressure control device is communicated with the filling area, for adjusting the pressure within the filling area such that the first and second flat thin lenses are deformed, and the deformation of the first flat thin lens and the second flat thin lens is controllable, and the first flat thin lens and the second flat thin lens are used in the objective lens and can compensate the aberration of the objective lens. The invention also discloses an aberration correction method, which has low technical difficulty and simple operation.

Description

Objective lens aberration correcting lens, aberration correcting method, optical system and photoetching machine
Technical Field
The invention relates to an objective lens aberration correcting lens, an aberration correcting method, an optical system and a photoetching machine.
Background
As semiconductor technology is continuously developed, the precision of the manufacturing process of semiconductor devices is more and more required, for example, in the photolithography process, the optical system in the exposure apparatus of the advanced lithography machine needs smaller and smaller aberrations and distortions, and in the exposure apparatus of such an optical system, it is required that variations in aberrations and distortions caused by various environmental and other factors can be easily compensated in real time. In order to meet the above requirements, compensation is generally performed by adjusting the position or shape of one or more lenses.
Aberration compensation in exposure equipment is generally realized by using an adjustable lens mode, namely aberration change is generated by adjusting each degree of freedom of the lens so as to compensate image quality; US20080204905(a1) published in 8/28/2008 discloses a special four-bar mechanism driven by piezoelectric ceramics, which is a four-bar mechanism formed by deforming an elastic metal material under stress, and can realize high-precision displacement of a lens in the optical axis direction or preset deformation of the lens.
International patent WO2008037496(a2) published in 4/3/2008 discloses an active deformation mechanism for image quality compensation, which applies forces in opposite directions to the axial edge positions of a lens to make the surface of the lens deform in equal thickness (the absolute values of the surface shapes of the deformation of the front surface of the lens and the deformation of the rear surface of the lens are equal and the signs are opposite), and because of the equal thickness deformation, the deformation of the front surface and the deformation of the rear surface are mostly cancelled, so that a very small transmission wavefront change is generated, and a specific wavefront distribution is obtained to compensate the corresponding wave aberration, and the active deformation mechanism can be used for compensating Z5, Z12 and Z11 surface shapes; generally, the ratio of the surface type of the equal-thickness deformation generated by applying opposite-direction force to the axial edge position of the lens to the transmitted wavefront is below 15:1, that is, the very large equal-thickness surface deformation of the lens can obtain small wavefront change, very large stress can be generated inside the lens, density difference can be generated inside the lens material, so that the material generates stress birefringence, other aberration changes are generated in the compensation process, the aberration compensation effect is greatly reduced, meanwhile, as the lens bears very large acting force, the lens is very easy to generate plastic deformation, once calibration and maintenance need to be performed on the active deformation mechanism at this time, compensation is generally performed by polishing a single lens surface near the pupil, and the process is complicated.
Disclosure of Invention
The invention provides an objective aberration correction objective aberration correcting lens, which is used for solving the problems of poor compensation effect and complex device structure of the existing aberration compensation device.
In order to solve the technical problems, the technical scheme of the invention is as follows:
an objective aberration correcting lens comprises a pressure control device and a lens, wherein the lens is connected with the pressure control device, the lens comprises a first flat thin lens, a second flat thin lens, a lens barrel, a first space ring, a second space ring, a first pressing ring and a second pressing ring, the first flat thin lens and the second flat thin lens are sequentially arranged in the lens barrel along a light incidence direction, a filling area is defined by the first flat thin lens, the second flat thin lens and the inner wall of the lens barrel, the pressure control device is communicated with the filling area and is used for adjusting the pressure in the filling area, the first space ring fixedly connected with the inner wall of the lens barrel is arranged on one side of the first flat thin lens close to the filling area, the second space ring fixedly connected with the inner wall of the lens barrel is arranged on one side of the second flat thin lens close to the filling area, and the lens fixedly connected with the lens barrel is arranged on one side of the first flat thin lens far away from the filling area And one side of the second flat thin lens, which is far away from the filling area, is provided with the second pressing ring fixedly connected with the lens barrel.
Preferably, the pressure control device comprises a liquid pipe and a hydraulic control device, one end of the liquid pipe is communicated with the filling area, and the other end of the liquid pipe is connected with the hydraulic control device.
Preferably, the first space ring and the second space ring are both annular supporting blocks, the first pressing ring and the second pressing ring are both annular pressing blocks, and the annular supporting blocks correspond to the annular pressing blocks in position and are both arranged on an axis parallel to the light incidence direction.
Preferably, the first space ring and the second space ring each include a plurality of support blocks uniformly arranged in an annular shape along the circumferential direction, the first pressing ring and the second pressing ring each include a plurality of pressing blocks uniformly arranged in an annular shape along the circumferential direction, and the support blocks correspond to the pressing blocks in position and are both arranged on an axis parallel to the light incidence direction.
Preferably, the first space ring and the second space ring each include two support blocks, the first pressing ring and the second pressing ring each include two pressing blocks, and the two support blocks are respectively arranged in a positive Y-axis direction and a negative Y-axis direction of the objective lens coordinate system, or the two support blocks are respectively arranged in a positive X-axis direction and a negative X-axis direction of the objective lens coordinate system.
Preferably, the first spacer ring and the second spacer ring each include two support blocks, the first pressing ring and the second pressing ring each include two pressing blocks, the two support blocks are respectively arranged in a first quadrant and a third quadrant of an objective lens coordinate system, or the two support blocks are respectively arranged in a second quadrant and a fourth quadrant of the objective lens coordinate system, and the two support blocks form an angle of 45 degrees with an axis of the objective lens coordinate system.
Preferably, the first space ring and the second space ring each include three support blocks, the first pressing ring and the second pressing ring each include three pressing blocks, and one of the three support blocks is located on an X-axis of an objective lens coordinate system.
Preferably, the first space ring and the second space ring each include three support blocks, the first pressing ring and the second pressing ring each include three pressing blocks, and one of the three support blocks is located on the Y axis of the objective lens coordinate system.
Preferably, the first space ring and the second space ring each include four support blocks, the first pressing ring and the second pressing ring each include four pressing blocks, and the four support blocks are respectively arranged in the X-axis positive direction, the X-axis negative direction, the Y-axis positive direction and the Y-axis negative direction of the objective lens coordinate system.
Preferably, the first space ring and the second space ring each include four support blocks, the first pressing ring and the second pressing ring each include four pressing blocks, the four support blocks are respectively arranged in four quadrants of an objective lens coordinate system, and the four support blocks form an angle of 22.5 degrees with an axis in the objective lens coordinate system.
Preferably, a sealing soft glue is adopted between the first flat thin lens and the lens barrel and between the second flat thin lens and the lens barrel for sealing.
According to the technical scheme adopted by the invention, the objective aberration correcting mirror respectively enables the first flat thin lens and the second flat thin lens to generate unequal-thickness deformation through a hydraulic control device, the pressing block and the supporting block for fixing the first flat thin lens and the second flat thin lens are different in distribution, the first flat thin lens and the second flat thin lens generate different surface types after being deformed, the objective aberration correcting mirror is simple in structure and can be applied to an objective lens to correct the aberration of the objective lens, and the fixing mode of the first flat thin lens and the second flat thin lens is set according to the surface type distribution in the Zernike polynomial, so that the corresponding surface type in the Zernike polynomial can be generated, and the real-time adjustment of the change of the Zernike aberration of the objective lens corresponding to the constant term on the image surface is realized.
The invention also discloses an aberration correction method adopting the objective lens aberration correction lens, which comprises the following steps:
step 1: obtaining Zernike constant term aberration existing in the objective lens according to the imaging of the objective lens;
step 2: if Z4 in the Zernike aberration of the objective lens presents second-order curvature of field, selecting the first space ring and the second space ring in the objective lens aberration correcting lens as annular supporting blocks, selecting the first pressing ring and the second pressing ring as annular pressing blocks, wherein the annular pressing blocks correspond to the annular supporting blocks in position and are arranged on an axis parallel to the incident direction of the light, installing the adjusted objective lens aberration correcting lens at an object plane or an image plane close to the objective lens, and turning to step 9;
and step 3: if Z5 in the Zernike aberration of the objective lens exhibits astigmatism of 0 ° or 90 ° as a constant term of field of view, the first and second spacers in the objective lens aberration correcting lens each include two support blocks, the first and second press rings each include two press blocks, the two support blocks are respectively disposed in a Y-axis positive direction and a Y-axis negative direction of an objective lens coordinate system, or the two support blocks are respectively disposed in an X-axis positive direction and an X-axis negative direction of the objective lens coordinate system, the press blocks correspond to the support blocks in position and are both disposed on an axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is mounted at a pupil position near the objective lens, and the process goes to step 9;
and 4, step 4: if Z6 in the Zernike aberration of the objective lens shows astigmatism of constant term ± 45 ° of field of view, the first and second spacers in the objective lens aberration correcting lens each include two support blocks, the first and second spacers each include two pressing blocks, the two support blocks are respectively arranged in the first and third quadrants of the objective lens coordinate system, or the two support blocks are respectively arranged in the second and fourth quadrants of the objective lens coordinate system, and the two support blocks form an angle of 45 ° with the axis of the objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is installed at a position close to the pupil of the objective lens, and the process goes to step 9;
and 5: if Z10 in Zernike aberration of the objective lens presents trefoil aberration of constant term of field of view, the first space ring and the second space ring in the objective lens aberration correction lens both comprise three support blocks, the first pressing ring and the second pressing ring both comprise three pressing blocks, one support block in the three support blocks is positioned on X axis of objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at the position close to the pupil of the objective lens, and the process goes to step 9;
step 6: if Z11 in Zernike aberration of the objective lens presents trefoil aberration of constant term of field of view, the first space ring and the second space ring in the objective lens aberration correction lens both comprise three support blocks, the first pressing ring and the second pressing ring both comprise three pressing blocks, one support block in the three support blocks is positioned on Y axis of objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at the position close to pupil of the objective lens, and the process goes to step 9;
and 7: if Z17 in the Zernike aberrations of the objective lens presents a four-leaf aberration of a constant term of a field of view, the first space ring and the second space ring in the objective lens aberration correction lens each include four support blocks, the first space ring and the second space ring each include four press blocks, the four support blocks are respectively arranged on an X-axis positive direction, an X-axis negative direction, a Y-axis positive direction and a Y-axis negative direction of an objective lens coordinate system, the press blocks correspond to the support blocks in position and are both arranged on an axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at a pupil position close to the objective lens, and the process goes to step 9;
and 8: if Z18 in the Zernike aberration of the objective lens presents a four-leaf aberration of a constant term of a field of view, the first and second space rings in the objective lens aberration correcting lens each include four support blocks, the first and second space rings each include four press blocks, the four support blocks are respectively arranged in four quadrants of an objective lens coordinate system, and the four support blocks form an angle of 22.5 degrees with an axis in the objective lens coordinate system, the press blocks correspond to the support blocks in position and are both arranged on an axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is installed at a pupil position close to the objective lens, and the process goes to step 9;
and step 9: and adjusting the pressure of a filling area in the aberration correction mirror by the pressure control device, so that the first flat thin lens and the second flat thin lens are respectively deformed, and the aberration is compensated and corrected.
The technical scheme adopted by the invention has low technical difficulty and is simple to operate.
The invention also discloses an optical system, which comprises the objective lens and the objective lens aberration correcting lens.
According to the technical scheme, the objective lens aberration correcting lens is arranged on the image surface, the object surface or the pupil of the objective lens, and the objective lens aberration correcting lens generates a surface type in a Zernike polynomial, so that the aberration generated by the objective lens on the image surface can be corrected, and the precision of the optical system is improved.
The invention also discloses a photoetching machine which comprises the optical system.
According to the technical scheme, after the objective lens aberration correcting mirror is adopted, the optical system of the photoetching machine can compensate the change of aberration and distortion in real time, and the photoetching efficiency of the photoetching machine is improved.
Drawings
FIG. 1 is a schematic diagram of an objective aberration correcting lens according to an embodiment of the present invention;
FIGS. 2-3 are schematic diagrams illustrating deformation of a first plate thin lens and a second plate thin lens, respectively, according to an embodiment of the invention;
FIGS. 4 to 7 are schematic diagrams of the distribution of briquettes according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of coefficients of a Zernike polynomial in accordance with one embodiment of the present invention;
FIG. 9 is a distribution diagram of the surface shapes in the Zernike polynomials in an embodiment of the present invention.
FIGS. 1 to 7 show: 1-a first flat thin lens, 2-a second flat thin lens, 3-a lens cone, 4-a soft sealing glue, 5-a filling area, 6-a liquid pipe, 7-a hydraulic control device, 8-a first space ring, 91-a first pressing ring, 911-a pressing block and 92-a second pressing ring.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be noted that the drawings are in simplified form and are not to precise scale, which is provided for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Referring to fig. 1, an objective aberration correcting lens includes a pressure control device and a lens connected to each other, wherein the pressure control device controls the pressure of the lens, so that the lens deforms to generate a surface profile in a zernike polynomial.
The lens comprises a first flat thin lens 1, a second flat thin lens 2, a lens barrel 3, a first space ring 8, a first pressing ring 91 and a second pressing ring 92, wherein the first flat thin lens 1 and the second flat thin lens 2 are sequentially arranged in the lens barrel 3 along a light incidence direction, a sealing soft glue 4 is adopted for sealing and filling between the first flat thin lens 1 and the lens barrel 3 and between the second flat thin lens 2 and the lens barrel 3, a filling area 5 is defined by the inner walls of the first flat thin lens 1, the second flat thin lens 2 and the lens barrel 3, the pressure control device is communicated with the filling area 5, filling liquid is input into the filling area 5, the pressure of the filling liquid is controlled to enable the first flat thin lens 1 and the second flat thin lens 2 to deform, and the first space ring fixedly connected with the inner wall of the lens barrel 3 is arranged between the first flat thin lens 1 and the second flat thin lens 28, the first pressing ring 91 fixedly connected with the lens barrel 3 is arranged on one side of the first flat thin lens 1 away from the filling area 5, and the second pressing ring 92 fixedly connected with the lens barrel 3 is arranged on one side of the second flat thin lens 2 away from the filling area 5.
The pressure control device comprises a liquid pipe 6 and a hydraulic control device 7, one end of the liquid pipe 6 is communicated with the filling area 5, and the other end of the liquid pipe is connected with the hydraulic control device 7.
Referring to fig. 2 and 3, the hydraulic control device 7 inputs a filling liquid into the filling area 5 through the liquid pipe 6, and controls the pressure of the filling liquid in the filling area 5, so as to deform the first flat thin lens 1 and the second flat thin lens 2, respectively. Referring to fig. 3, when the pressure of the filling liquid is greater than the atmospheric pressure, the filling liquid presses the first flat thin lens 1 and the second flat thin lens 2 outwards, the first pressing ring 91 prevents the first flat thin lens 1 from outwards moving, so that the side surface of the first flat thin lens 1 on the side of the first pressing ring 91 deforms due to uneven stress, the first flat thin lens 1 deforms in an unequal thickness, and similarly, the second flat thin lens 2 deforms in an unequal thickness, and the deformation amounts of the first flat thin lens 1 and the second flat thin lens 2 are equal; referring to fig. 2, when the pressure of the filling liquid is less than the atmospheric pressure, the atmospheric pressure presses the first flat thin lens 1 and the second flat thin lens 2 inward, the first spacer 8 prevents the first flat thin lens 1 from pressing inward, so that the side surface of the first flat thin lens 1 on the side of the first spacer 8 deforms due to uneven stress, the first flat thin lens 1 deforms with unequal thickness, and similarly, the second flat thin lens 2 deforms with unequal thickness, and the deformation amounts of the first flat thin lens 1 and the second flat thin lens 2 are equal. In the above deformation mode, the first flat thin lens 1 and the second flat thin lens 2 bear a small pressure, and the service life of the lens is long.
The first space ring 8 includes at least one supporting block (not shown), when there is one supporting block, the supporting block is an annular supporting block, when there is a plurality of supporting blocks, the plurality of supporting blocks are uniformly arranged along the circumferential direction, as shown in fig. 4 to 6, the first pressing ring 91 and the second pressing ring 92 each include at least one pressing block 911, when the first pressing ring 91 and the second pressing ring 92 each include one pressing block 911, the pressing block 911 is an annular pressing block, when the first pressing ring 91 and the second pressing ring 92 each include a plurality of pressing blocks 911, the plurality of pressing blocks 911 are uniformly arranged along the circumferential direction, and the supporting blocks correspond to the positions of the pressing blocks 911 and are both arranged on an axis parallel to the light incidence direction. The pressing block 911 and the supporting block are distributed differently, and the first flat thin lens 1 and the second flat thin lens 2 are deformed differently.
Referring to fig. 4, 8 and 9, if Z4 in the Zernike aberration of the objective lens shows the second-order curvature of field, the first spacer 8 in the objective lens aberration correcting lens is a continuous annular support block, the first pressing ring 91 and the second pressing ring 92 are a continuous annular pressing block 911, the support blocks correspond to the pressing block 911 in position and are both arranged on an axis parallel to the light incidence direction, and at this time, the objective lens aberration correcting lens has a Z4 face shape change. When the objective lens aberration correcting lens with the Z4 face shape change is arranged at the object plane or the image plane of the objective lens, the generated Z4 face shape directly generates the Z4 wavefront change at the object plane or the image plane, so that the objective lens realizes aberration correction at the image plane. The objective lens aberration correcting lens is arranged on the object plane or the image plane of the objective lens, when the liquid pressure is equal to the atmospheric pressure, because each field beam of the lens close to the object plane or the image plane passes through different positions of the objective lens aberration correcting lens, the ratio of the sub-aperture close to the object plane or the image plane to the clear aperture is far less than 1: 1, the light of the central field passes through the central position of the surface of the objective lens aberration correcting lens, and the light of the marginal field passes through the marginal position of the surface of the objective lens aberration correcting lens, so that the difference between the imaging position points of the central field point and the marginal field point in the axial direction is generated, namely the field curvature is increased, therefore, the real-time adjustment of the field curvature can be realized by arranging the objective lens aberration correcting lens with the Z4 surface type change at the object plane or the image plane of the objective lens. Because the first flat thin lens 1 and the second flat thin lens 2 are deformed in unequal thicknesses, the smaller deformation of the lenses can generate larger wavefront change, and the compensation sensitivity is improved.
Referring to fig. 5, 8 and 9, if Z5 in Zernike aberrations of the projection objective exhibits astigmatism of 0 ° or 90 ° as a constant term of field of view, the first spacer 8 in the objective aberration correction lens includes two support blocks, and the first and second press rings 91 and 92 each include two compacts 911, see fig. 5(a), the two support blocks are respectively disposed in a Y-axis positive direction and a Y-axis negative direction of an objective coordinate system, or in an X-axis positive direction and an X-axis negative direction of the objective coordinate system, the support blocks corresponding to the compacts 911 in positions and both disposed on an axis parallel to the light incidence direction, the adjusted objective aberration correction lens is installed near a pupil position of the objective lens, the first and second flat thin lenses 1 and 2 are deformed, according to a Zernike polynomial coefficient distribution, the first flat thin lens 1 and the second flat thin lens 2 simultaneously generate a Z5 surface type in a zernike polynomial to compensate the aberration of the objective lens.
If Z6 in the Zernike aberrations of the projection objective exhibits astigmatism of the constant term ± 45 ° of the field of view, the first spacer 8 in the objective aberration correcting lens includes two support blocks, and the first pressing ring 91 and the second pressing ring 92 each include two pressing blocks 911, see fig. 5(b), which are respectively disposed in the first quadrant and the third quadrant of the objective coordinate system, or the two supporting blocks are respectively arranged in the second quadrant and the fourth quadrant of the objective lens coordinate system, the two supporting blocks form an angle of 45 degrees with the axis of the objective lens coordinate system, the supporting blocks correspond to the position of the press block 911, and are all arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is arranged at the pupil position close to the objective lens, the first flat thin lens 1 and the second flat thin lens 2 simultaneously generate a Z6 surface type in a zernike polynomial to compensate the aberration of the objective lens.
Referring to fig. 6, 7 and 8, if Z10 among Zernike aberrations of the projection objective lens exhibits trefoil (3-tefoil) aberration of constant term of field of view, the first spacer 8 in the objective aberration correction lens includes three support blocks, the first and second press rings 91 and 92 each include three compacts 911, see fig. 6(a), one of the three support blocks is located on the X-axis of the objective lens coordinate system, the compacts correspond to the support blocks in position and are both disposed on the axis parallel to the light incidence direction, the adjusted objective aberration correction lens is installed near the pupil position of the objective lens, and the first and second flat thin lenses 1 and 2 simultaneously generate Z10 surface type in Zernike polynomial to compensate the aberration of the objective lens.
If Z11 in Zernike aberrations of the projection objective exhibits trefoil (3-tefoil) aberrations which are constant terms of field of view, the first spacer ring 8 in the objective aberration correction lens includes three support blocks, and the first and second pressing rings 91 and 92 each include three pressing blocks 911, see fig. 6(b), one of the three support blocks is located on the Y-axis of the objective coordinate system, the pressing blocks 911 correspond to the support block positions and are each disposed on an axis parallel to the light incidence direction, and the first and second flat thin lenses 1 and 2 simultaneously generate Z11 planes in Zernike polynomials to compensate for the aberrations of the objective lens.
Referring to fig. 7, 8 and 9, if Z17 among Zernike aberrations of the projection objective exhibits a four-lobe (4-tefoil) aberration which is a constant term of field of view, the first spacer 8 in the objective aberration correction lens includes four support blocks, the first and second press rings 91 and 92 each include four compacts 911, see fig. 7(a), the four support blocks are respectively disposed on an X-axis positive direction, an X-axis negative direction, a Y-axis positive direction and a Y-axis negative direction of an objective coordinate system, the compacts 911 correspond to the support blocks in position and are each disposed on an axis parallel to the light incident direction, and the first and second flat thin lenses 1 and 2 simultaneously generate a Z17 plane type in Zernike polynomials to compensate for the aberration of the objective lens.
If Z18 among Zernike aberrations of the projection objective exhibits a four-leaf aberration (4-refoil) of a constant term of field of view, the first spacer ring 8 in the objective aberration correction lens includes four support blocks, the first and second pressing rings 91 and 92 each include four pressing blocks 911, see fig. 7(b), which are divided into four quadrants of an objective coordinate system and which make an angle of 22.5 degrees with an axis in the objective coordinate system, the pressing blocks 911 correspond to the support block positions and are each disposed on an axis parallel to the light incidence direction, and the first and second flat thin lenses 1 and 2 simultaneously generate a Z18 plane in a Zernike polynomial to compensate for the aberration of the objective lens.
The corresponding relationship between the number and distribution of the support blocks and the pressing blocks 911 and the surface type distribution and the transmission wavefront change thereof generated by the objective aberration correcting lens is shown in the following table:
TABLE 1
Figure GDA0002124730120000111
When the objective lens aberration correcting lens with any one of the surface shape changes of Z5, Z6, Z10, Z11, Z17 and Z18 is arranged at the pupil of the objective lens, each field ray generates corresponding wave front change at the pupil position, and because each field ray in the objective lens close to the pupil position passes through the same area of the objective lens aberration correcting lens, the ratio of the sub-aperture to the light-passing aperture at the pupil position is close to 1: 1, the light rays of the central field and the light rays of the marginal field pass through almost the same position on the surface of the objective lens aberration correcting lens, and the surface shape generated by the objective lens aberration correcting lens generates corresponding wave front change on the pupil of the objective lens directly, so that the light rays of the central field and the light rays of the marginal field generate the same wave front change on the pupil of the objective lens, namely the corresponding Zernike aberration change of the objective lens corresponding to a constant term on the image surface, therefore, the objective lens aberration correcting lens is arranged at the pupil position of the objective lens, and the surface shape distribution of any one of Z5, Z6, Z10, Z11, Z17 and Z35 18 is generated by changing the objective lens aberration correcting lens, so that the real-time adjustment of the change of the Zernike aberration corresponding to the constant term on the image surface of the objective lens is realized.
The objective lens aberration correcting lens is arranged in the photoetching objective lens to form an optical system, light beams are imaged by the optical system and have smaller wave aberration and distortion, and the photoetching machine adopting the optical system for imaging can compensate the aberration caused by various environments and other factors in real time, so that the resolution of the photoetching machine is improved.

Claims (12)

1. An objective aberration correcting lens is characterized by comprising a pressure control device and a lens which are connected, wherein the lens comprises a first flat thin lens, a second flat thin lens, a lens barrel, a first space ring, a second space ring, a first pressing ring and a second pressing ring, the first flat thin lens and the second flat thin lens are sequentially arranged in the lens barrel along a light incidence direction, the first flat thin lens, the second flat thin lens and the inner wall of the lens barrel are enclosed to form a filling area, the pressure control device is communicated with the filling area and is used for adjusting the pressure in the filling area, the first space ring fixedly connected with the inner wall of the lens barrel is arranged on one side of the first flat thin lens close to the filling area, the second space ring fixedly connected with the inner wall of the lens barrel is arranged on one side of the second flat thin lens close to the filling area, the side of the first flat thin lens, which is far away from the filling area, is provided with the first pressing ring fixedly connected with the lens barrel, and the side of the second flat thin lens, which is far away from the filling area, is provided with the second pressing ring fixedly connected with the lens barrel; the first space ring and the second space ring respectively comprise a plurality of supporting blocks which are uniformly arranged into a ring shape along the circumferential direction, the first pressing ring and the second pressing ring respectively comprise a plurality of pressing blocks which are uniformly arranged into a ring shape along the circumferential direction, and the supporting blocks correspond to the pressing blocks in position and are respectively arranged on an axis parallel to the light incidence direction.
2. An objective aberration correcting lens according to claim 1, wherein the pressure control means includes a liquid tube having one end communicating with the filling region and the other end connected to the hydraulic control means, and hydraulic control means.
3. The objective lens aberration correcting mirror according to claim 1, wherein the first spacer and the second spacer each include two support blocks, and the first pressing ring and the second pressing ring each include two pressing blocks, the two support blocks being provided in a Y-axis positive direction and a Y-axis negative direction of an objective lens coordinate system, or the two support blocks being provided in an X-axis positive direction and an X-axis negative direction of the objective lens coordinate system.
4. The objective aberration correcting lens according to claim 1, wherein the first and second spacers each comprise two support blocks, the first and second pressing rings each comprise two pressing blocks, the two support blocks are respectively provided in a first quadrant and a third quadrant of an objective coordinate system, or the two support blocks are respectively provided in a second quadrant and a fourth quadrant of the objective coordinate system, and the two support blocks are at an angle of 45 degrees with respect to an axis of the objective coordinate system.
5. The objective aberration correcting mirror according to claim 1, wherein the first spacer and the second spacer each include three support blocks, the first pressing ring and the second pressing ring each include three pressing blocks, and one of the three support blocks is located on an X-axis of an objective coordinate system.
6. The objective aberration correcting mirror according to claim 1, wherein the first spacer and the second spacer each include three support blocks, the first pressing ring and the second pressing ring each include three pressing blocks, and one of the three support blocks is located on a Y-axis of an objective coordinate system.
7. The objective lens aberration correcting mirror according to claim 1, wherein the first spacer and the second spacer each include four support blocks, and the first pressing ring and the second pressing ring each include four pressing blocks, the four support blocks being respectively provided in an X-axis positive direction, an X-axis negative direction, a Y-axis positive direction, and a Y-axis negative direction of the objective lens coordinate system.
8. The objective aberration correcting lens according to claim 1, wherein the first and second spacers each include four support blocks, the first and second pressing rings each include four pressing blocks, the four support blocks are divided into four quadrants of an objective coordinate system, and the four support blocks are at an angle of 22.5 degrees to an axis in the objective coordinate system.
9. The objective lens aberration correcting mirror according to claim 1, wherein a soft seal is used between the first flat thin lens and the lens barrel and between the second flat thin lens and the lens barrel.
10. An aberration correcting method of an objective lens using the aberration correcting lens of the objective lens according to claim 1, comprising the steps of:
step 1: obtaining Zernike constant term aberration existing in the objective lens according to the imaging of the objective lens;
step 2: if Z4 in the Zernike aberration of the objective lens presents second-order curvature of field, selecting the first space ring and the second space ring in the objective lens aberration correcting lens as annular supporting blocks, selecting the first pressing ring and the second pressing ring as annular pressing blocks, wherein the annular pressing blocks correspond to the annular supporting blocks in position and are arranged on an axis parallel to the incident direction of the light, installing the adjusted objective lens aberration correcting lens at an object plane or an image plane close to the objective lens, and turning to step 9;
and step 3: if Z5 in the Zernike aberration of the objective lens exhibits astigmatism of 0 ° or 90 ° as a constant term of field of view, the first and second spacers in the objective lens aberration correcting lens each include two support blocks, the first and second press rings each include two press blocks, the two support blocks are respectively disposed in a Y-axis positive direction and a Y-axis negative direction of an objective lens coordinate system, or the two support blocks are respectively disposed in an X-axis positive direction and an X-axis negative direction of the objective lens coordinate system, the press blocks correspond to the support blocks in position and are both disposed on an axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is mounted at a pupil position near the objective lens, and the process goes to step 9;
and 4, step 4: if Z6 in the Zernike aberration of the objective lens shows astigmatism of constant term ± 45 ° of field of view, the first and second spacers in the objective lens aberration correcting lens each include two support blocks, the first and second spacers each include two pressing blocks, the two support blocks are respectively arranged in the first and third quadrants of the objective lens coordinate system, or the two support blocks are respectively arranged in the second and fourth quadrants of the objective lens coordinate system, and the two support blocks form an angle of 45 ° with the axis of the objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is installed at a position close to the pupil of the objective lens, and the process goes to step 9;
and 5: if Z10 in Zernike aberration of the objective lens presents trefoil aberration of constant term of field of view, the first space ring and the second space ring in the objective lens aberration correction lens both comprise three support blocks, the first pressing ring and the second pressing ring both comprise three pressing blocks, one support block in the three support blocks is positioned on X axis of objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at the position close to the pupil of the objective lens, and the process goes to step 9;
step 6: if Z11 in Zernike aberration of the objective lens presents trefoil aberration of constant term of field of view, the first space ring and the second space ring in the objective lens aberration correction lens both comprise three support blocks, the first pressing ring and the second pressing ring both comprise three pressing blocks, one support block in the three support blocks is positioned on Y axis of objective lens coordinate system, the pressing blocks correspond to the support blocks in position and are both arranged on the axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at the position close to pupil of the objective lens, and the process goes to step 9;
and 7: if Z17 in the Zernike aberrations of the objective lens presents a four-leaf aberration of a constant term of a field of view, the first space ring and the second space ring in the objective lens aberration correction lens each include four support blocks, the first space ring and the second space ring each include four press blocks, the four support blocks are respectively arranged on an X-axis positive direction, an X-axis negative direction, a Y-axis positive direction and a Y-axis negative direction of an objective lens coordinate system, the press blocks correspond to the support blocks in position and are both arranged on an axis parallel to the light incidence direction, the adjusted objective lens aberration correction lens is installed at a pupil position close to the objective lens, and the process goes to step 9;
and 8: if Z18 in the Zernike aberration of the objective lens presents a four-leaf aberration of a constant term of a field of view, the first and second space rings in the objective lens aberration correcting lens each include four support blocks, the first and second space rings each include four press blocks, the four support blocks are respectively arranged in four quadrants of an objective lens coordinate system, and the four support blocks form an angle of 22.5 degrees with an axis in the objective lens coordinate system, the press blocks correspond to the support blocks in position and are both arranged on an axis parallel to the light incidence direction, the adjusted objective lens aberration correcting lens is installed at a pupil position close to the objective lens, and the process goes to step 9;
and step 9: and adjusting the pressure of a filling area in the objective lens aberration correcting lens by the pressure control device, so that the first flat thin lens and the second flat thin lens are respectively deformed, and compensating and correcting aberration.
11. An optical system comprising an objective lens and an objective lens aberration correcting lens according to any one of claims 1 to 9.
12. A lithography machine comprising the optical system of claim 11.
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CN110248179B (en) * 2019-04-04 2020-05-26 复旦大学 Camera pupil aberration correction method based on light field coding
US11221479B2 (en) * 2019-09-24 2022-01-11 Facebook Technologies, Llc Varifocal optical assembly providing astigmatism compensation
CN113376831B (en) * 2021-06-09 2022-07-05 嘉兴中润光学科技股份有限公司 Design method of lens

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