CN107742628A - Flexible scintillation screen, radiation image sensor and preparation method thereof - Google Patents
Flexible scintillation screen, radiation image sensor and preparation method thereof Download PDFInfo
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- CN107742628A CN107742628A CN201710815754.6A CN201710815754A CN107742628A CN 107742628 A CN107742628 A CN 107742628A CN 201710815754 A CN201710815754 A CN 201710815754A CN 107742628 A CN107742628 A CN 107742628A
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- 239000010408 film Substances 0.000 claims description 25
- 230000004888 barrier function Effects 0.000 claims description 20
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
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- 229910052581 Si3N4 Inorganic materials 0.000 claims description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
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- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 239000011734 sodium Substances 0.000 claims description 7
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 7
- 229910052716 thallium Inorganic materials 0.000 claims description 7
- 239000004411 aluminium Substances 0.000 claims description 6
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- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
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- FYIBGDKNYYMMAG-UHFFFAOYSA-N ethane-1,2-diol;terephthalic acid Chemical compound OCCO.OC(=O)C1=CC=C(C(O)=O)C=C1 FYIBGDKNYYMMAG-UHFFFAOYSA-N 0.000 description 1
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- 150000002466 imines Chemical class 0.000 description 1
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- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14663—Indirect radiation imagers, e.g. using luminescent members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14692—Thin film technologies, e.g. amorphous, poly, micro- or nanocrystalline silicon
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Measurement Of Radiation (AREA)
Abstract
The present invention provides a kind of flexible scintillation screen, radiation image sensor and preparation method, and the preparation of scintillation screen includes：One substrate is provided, and in forming release layer on the surface of substrate one；Flexible base layer is formed in release layer surface；Scintillator layers are prepared in flexible substrates layer surface；The protective layer of covering scintillator layers is formed in flexible base layer around the scintillator layers surface and scintillator layers；The substrate to remove release layer and be connected with release layer is peeled off, obtains flexible scintillation screen.By such scheme, flexible scintillation screen of the invention and preparation method can solve the problems, such as to encapsulate that flow is complicated, equipment cost is high in the prior art, simplify device preparation flow, reduce production cost, and obtained scintillation screen is frivolous；The flexible scintillation screen of the present invention employs flexible base layer, deflection, solves the problems, such as caused by hard substrate, and flexible scintillation screen of the invention goes for a variety of occasions for needing flexible scintillation screen, such as X-ray flat panel detector, CT detectors field.
Description
Technical field
The invention belongs to scintillation screen and X-ray flat panel detector to manufacture and design field, more particularly to a kind of flexible flicker
Screen, radiation image sensor and preparation method thereof.
Background technology
X-ray art utilizes X ray short wavelength, the property easily penetrated, the different material spy different to X-ray absorption
Point, it is imaged by detecting the intensity through the X ray of object.Flat panel detector (FPD：Flat panel detector) make
For the core component of x-ray imaging system, it is responsible for that X ray is changed into electric signal and is recorded as picture, can be in good time by display
It has been shown that, it can also preserve and be read for follow-up.
In general, FPD includes scintillation screen, pel array (photoreceptor array), control module, signal processing module and led to
Believe module.Scintillator absorbs X-ray and is translated into visible ray；Visible light transformation caused by scintillator is telecommunications by pel array
Number；Electric signal is amplified and generates data signal by analog-to-digital conversion by signal processing module, by being imaged after correcting, compensating.In X
Ray flat panel detector industry, cesium iodide scintillation screen have low dosage, high-resolution, high picture quality, turn into industry and send out
The main product of exhibition.For cesium iodide scintillation screen, light photon can be converted into when receiving x-ray photon and exciting, can
See light photon and then the panel that is photoelectrically converted receives to switch to electronics vacancy pair, so as to read generation image by peripheral circuit.
In the prior art, cesium iodide scintillation screen, matrix, caesium iodide scintillator layer, encapsulated layer are included；Its matrix typically has carbon
Plate, optical fiber guide plate, aluminium base, in order to improve light extraction efficiency and water proofing property, generally use organic film and inorganic thin film it is transparent
Packaged type.In addition, fexible film is widely used in the matrix material of flexible display screen, it mainly has frivolous, resistant to bending, waterproof
The advantages that.Wherein, the encapsulation of existing scintillation screen completes encapsulation using CVD and sputtering equipment, exist encapsulation flow is complicated, equipment into
The problems such as this is high, and existing cesium iodide scintillation screen, its matrix are generally not bending hard substrate, as carbon plate, optical fiber are led
Plate, aluminium base, limiting it, (such as detector is flexible detector, and corresponding scintillator is also required to use in the application of special occasions
Flexible flexible scintillation screen).
Therefore, how to provide that a kind of encapsulation is simple, cost is low and the scintillation screen of deflection is with the real category that solves the above problems
It is necessary.
The content of the invention
In view of the above the shortcomings that prior art, it is an object of the invention to provide a kind of flexible scintillation screen and radioactive ray
Imaging sensor and respective preparation method, for solving to encapsulate flow complexity, equipment cost height in the prior art with applied field
Close the problems such as limited.
In order to achieve the above objects and other related objects, the present invention provides a kind of preparation method of flexible scintillation screen, including
Following steps：
1) substrate is provided, and the substrate has relative first surface and second surface, and in the first surface
Upper formation release layer；
2) flexible base layer is formed in the release layer surface；
3) scintillator layers are prepared in the flexible substrates layer surface, the scintillator layers are used for the incident ray received
Be converted to visible ray；
4) covering institute is formed in the flexible base layer around the scintillator layers surface and the scintillator layers
State the protective layer of scintillator layers；And
5) substrate to remove the release layer and be connected with the release layer is peeled off, obtains flexible scintillation screen.
As a preferred embodiment of the present invention, also include between step 1) and step 2)：In the release layer surface shape
Into barrier layer, the barrier layer is between the release layer and the flexible base layer.
As a preferred embodiment of the present invention, the barrier layer be silicon oxide layer, silicon nitride layer and silicon oxide layer and
One kind in the laminated structural layers that silicon nitride layer is formed.
As a preferred embodiment of the present invention, in step 1), the substrate includes glass substrate, and the release layer includes
Amorphous silicon layer.
As a preferred embodiment of the present invention, in step 2), by the technique that coats and solidify by the flexible substrates
Layer is made on the release layer, wherein, the temperature of the solidification is 100~200 DEG C, and the time is 60~120min.
As a preferred embodiment of the present invention, in step 2), the flexible base layer includes Kapton, epoxy
One kind in resin film and pet film；The light transmission rate of the flexible base layer be 70%~
100%, thickness is 10~200 μm.
As a preferred embodiment of the present invention, in step 3), the scintillator layers are made by way of hot evaporation
In in the flexible base layer.
As a preferred embodiment of the present invention, in step 3), the material of the scintillator layers includes the cesium iodide for mixing thallium
And mix one kind in the cesium iodide of sodium；The thickness of the scintillator layers is 200~800 μm.
As a preferred embodiment of the present invention, in step 4), the protective layer is fixed on by fluid sealant described soft
On property basalis, wherein, the fluid sealant is located in the flexible base layer and surrounds the scintillator layers, and the protective layer covers
Cover the scintillator layers and be connected by the fluid sealant with the flexible base layer.
As a preferred embodiment of the present invention, in step 4), the protective layer is waterproof reflecting layer, the waterproof reflection
Layer is inorganic thin film or the one kind being attached with the organic film of reflectance coating；The thickness of the protective layer is 50~200 μm.
As a preferred embodiment of the present invention, the waterproof reflecting layer is the organic film for being attached with reflectance coating, described
Reflectance coating is one kind in silverskin and aluminium film.
As a preferred embodiment of the present invention, in step 5), laser irradiation is carried out from the second surface of the substrate, and
The laser is exposed to the interface of the release layer and the flexible base layer, blow the associative key of the interface, with stripping
The substrate being connected from the release layer and with the release layer, obtains flexible scintillation screen.
The present invention also provides a kind of preparation method of radiation image sensor, including step：
Flexible scintillation screen is prepared using the preparation method of the flexible scintillation screen described in any one middle scheme as described above, and in by
The side of the flexible base layer of the nearly flexible scintillation screen forms the sensor array corresponding with the flexible scintillation screen, with
To radiation image sensor, wherein, the sensor array is used for visible caused by the flexible scintillation screen that is received
Optical signal is converted to electric signal.
As a preferred embodiment of the present invention, by Optical transparent adhesive by the flexible scintillation screen and the sensor array
Row attach, to realize the coupling of the flexible scintillation screen and the sensor array.
The present invention also provides a kind of flexible scintillation screen, wherein, the flexible scintillation screen is to use flexibility of the present invention
The flexible scintillation screen of the preparation of scintillation screen, including：
Flexible base layer；
Scintillator layers, positioned at the flexible substrates layer surface, the incident ray for being received is converted into visible ray；
Protective layer, in the flexible base layer around the scintillator layers surface and the scintillator layers, and
Cover the scintillator layers.
As a preferred embodiment of the present invention, the flexible scintillation screen also includes barrier layer, and the barrier layer is located at institute
State surface of the flexible base layer away from the scintillator layers side.
As a preferred embodiment of the present invention, the substrate includes glass substrate；The material of the scintillator layers includes
Cesium iodide mixes thallium and cesium iodide mixes one kind in sodium；The protective layer is waterproof reflecting layer, and the waterproof reflecting layer is inorganic thin
Film or the one kind being attached with the organic film of reflectance coating.
The present invention also provides a kind of radiation image sensor, wherein, the radiation image sensor is using this hair
The radiation image sensor that the radiation image sensor preparation method of bright offer is prepared, including：
Scintillation screen, it is the flexible scintillation screen being prepared according to any one above-mentioned preparation method of the present invention；
Sensor array, flashed positioned at the side of the flexible base layer close to the flexible scintillation screen, and with the flexibility
Shield corresponding, electric signal is converted to for visible ray caused by the flexible scintillation screen that is received.
As a preferred embodiment of the present invention, the sensor array includes one in flat panel detector, photographing element
Kind.
As described above, flexible scintillation screen, radiation image sensor and the respective preparation method of the present invention, have following
Beneficial effect：
1) flexible scintillation screen and preparation method of the invention can solve to encapsulate flow complexity, equipment cost in the prior art
The problem of high, so as to simplify device preparation flow, production cost is reduced, and obtained scintillation screen is frivolous；
2) flexible scintillation screen of the invention employs flexible base layer, deflection, solves caused by existing hard substrate
Problem, flexible scintillation screen of the invention go for a variety of occasions for needing flexible scintillation screens, as X-ray flat panel detector,
The fields such as CT detectors.
Brief description of the drawings
Fig. 1 is shown as the flow chart of flexible scintillation screen preparation method provided by the invention.
Fig. 2 is shown as providing substrate in prepared by flexible scintillation screen provided by the invention and forms the structural representation of release layer
Figure.
Fig. 3 is shown as being formed the structural representation of flexible base layer in prepared by flexible scintillation screen provided by the invention.
Fig. 4 is shown as being formed the structural representation on barrier layer in prepared by flexible scintillation screen provided by the invention.
Fig. 5 is shown as being formed the structural representation of scintillator layers in prepared by flexible scintillation screen provided by the invention.
Fig. 6 is shown as being formed the structural representation of protective layer in prepared by flexible scintillation screen provided by the invention.
Fig. 7 is shown as peeling off the structural representation of release layer and substrate in prepared by flexible scintillation screen provided by the invention.
Fig. 8 is shown as the structural representation for the scintillation screen being prepared in prepared by flexible scintillation screen provided by the invention.
Fig. 9 is shown as the structural representation of coupling sensor array in prepared by radiation image sensor provided by the invention
Figure.
Figure 10 is shown as application of the flexible scintillation screen provided by the invention on CT detectors.
Component label instructions
1 flexible scintillation screen
11 substrates
111 first surfaces
112 second surfaces
12 release layers
13 flexible base layers
14 barrier layers
15 scintillator layers
16 protective layers
17 fluid sealants
2 radiation image sensors
21 sensor arrays
S1~S5 steps 1)~step 5)
Embodiment
Illustrate embodiments of the present invention below by way of specific instantiation, those skilled in the art can be by this specification
Disclosed content understands other advantages and effect of the present invention easily.The present invention can also pass through specific realities different in addition
The mode of applying is embodied or practiced, the various details in this specification can also be based on different viewpoints with application, without departing from
Various modifications or alterations are carried out under the spirit of the present invention.
Fig. 1 is referred to Figure 10.It should be noted that the diagram provided in the present embodiment only illustrates this in a schematic way
The basic conception of invention, though only showing the component relevant with the present invention in diagram rather than according to package count during actual implement
Mesh, shape and size are drawn, and form, quantity and the ratio of each component can be a kind of random change during its actual implementation, and its
Assembly layout form may also be increasingly complex.
Embodiment one：
As shown in Fig. 1~8, the present invention provides a kind of preparation method of flexible scintillation screen, comprises the following steps：
1) substrate is provided, and the substrate has relative first surface and second surface, and in the first surface
Upper formation release layer；
2) flexible base layer is formed in the release layer surface；
3) scintillator layers are prepared in the flexible substrates layer surface, the scintillator layers are used for the incident ray received
Be converted to visible ray；
4) covering institute is formed in the flexible base layer around the scintillator layers surface and the scintillator layers
State the protective layer of scintillator layers；And
5) substrate to remove the release layer and be connected with the release layer is peeled off, obtains flexible scintillation screen.
The preparation method of the flexible scintillation screen of the present invention is illustrated below in conjunction with accompanying drawing.
As shown in S1 and Fig. 2 in Fig. 1, step 1) is carried out, there is provided a substrate 11, and the substrate 11 has relative the
One surface 111 and second surface 112, and in formation release layer 12 on the first surface 111.
As an example, in step 1), the substrate 11 includes glass substrate, and the release layer 12 includes amorphous silicon layer.
Specifically, the substrate 11, as the supporting construction in the flexible scintillation screen preparation, it is ultimately forming flexibility
It can be stripped after scintillation screen structure, the substrate includes but is not limited to glass substrate.In addition, the release layer 12 preferably passes through
CVD (Chemical Vapor Deposition, chemical vapor deposition) technique is prepared, and the release layer is as follow-up shape
Into peel ply during flexible scintillation screen, its material is preferably amorphous silicon material, certainly, in other embodiments, the release layer
Material can be any material realized and peeled off, selection is amorphous silicon layer in the present embodiment, photograph of the release layer in laser
Lower absorption heat is penetrated, consequently facilitating the stripping with flexible base layer 13.
As shown in S2 and Fig. 3 in Fig. 1, step 2) is carried out, flexible base layer 13 is formed in the surface of release layer 12.
As an example, in step 2), by the technique that coats and solidify by the flexible base layer 13 be made in it is described from
On type layer 12, wherein, the temperature of the solidification is 100~200 DEG C, and the time is 60~120min.
As an example, in step 2), the flexible base layer 13 includes Kapton, epoxy resin thin film and gathered
One kind in ethylene glycol terephthalate film；The light transmission rate of the flexible base layer 13 is 70%~100%, and thickness is
10~200 μm.
Specifically, the present invention prepares flexible base layer 13 on the release layer 12, the preparation method in the present embodiment is：
By liquid PET (Polyethylene Terephthalate, polyethylene terephthalate), PI (Polyimide, polyamides
Imines), epoxy resin any one, by coat (included spin coating), sputter, spray, silk-screen printing be prepared into as described in from
On type layer, using heat cure, by liquid flexible film hardening into solid flexible film, the flexible substrate layer 13 is obtained, in this reality
Apply in example, preferably using spin-coating method, it is adapted to the growth of small size film, and equipment is simple, cost is low.In addition, carry out described solid
The temperature of change is preferably 120~180 DEG C, and selection is 150 DEG C in the present embodiment, and the time is preferably 80~100min, the present embodiment
Middle selection is 90min.The thickness for the flexible base layer 13 being prepared is preferably 10~50 μm, in the present embodiment selection be
20 μm, on the one hand scintillation screen that the flexible base layer of the thickness makes to obtain can apply to any required field bent
Close, improve existing carbon plate base scintillation screen (ACS, Amorphous Carbon plate with CsI
Scintillator), optical fiber guide plate base scintillation screen (FOS, Fiber Optical plate with CsI
Scintillator), aluminium base base scintillation screen (ALS, Aluminum Plate with CsI Scintillator) is not flexible
The defects of bent, and it is cost-effective, and product is frivolous, improves flexibility, light transmission rate and the accuracy for detecting structure of device.
As shown in figure 4, as an example, also include between step 1) and step 2)：Formed and hindered in the surface of release layer 12
Barrier 14, the barrier layer 14 is between the release layer 12 and the flexible base layer 13.
Formed as an example, the barrier layer 14 is silicon oxide layer, silicon nitride layer and silicon oxide layer and silicon nitride layer
One kind in laminated structural layers.
Specifically, the barrier layer 14 is used to protect the flexible base layer 13 without prejudice, and in the present embodiment, selection
For the laminated structural layers being made up of silicon oxide layer and silicon nitride layer, wherein it is possible to be that silica connects with the flexible base layer
Touch or silicon nitride is in contact with the flexible base layer.
As shown in S3 and Fig. 5 in Fig. 1, step 3) is carried out, scintillator layers 15 are prepared in the surface of flexible base layer 13,
The incident ray that the scintillator layers 15 are used to be received is converted to visible ray.
As an example, in step 3), the scintillator layers 15 are made in the flexible substrates by way of hot evaporation
On layer 13.
As an example, in step 3), the material of the scintillator layers 15 includes mixing the cesium iodide of thallium and mixes the cesium iodide of sodium
In one kind；The thickness of the scintillator layers 15 is 200~800 μm.
Specifically, in preparing scintillator layers 15 in the flexible base layer 13, doping thallium or sodium are selected in the present embodiment, can
To provide impurity energy level, improve luminescent spectrum (to long-wave band movement-gold-tinted, so with the response wave band of detector photoelectric tube more
Add matching).Its thickness is preferably 400~600 μm, and selection is 500 μm in the present embodiment.
As shown in S4 and Fig. 6 in Fig. 1, step 4) is carried out, in the surface of scintillator layers 15 and the scintillator layers
The protective layer 16 for covering the scintillator layers 15 is formed in the flexible base layer 13 around 15.
As an example, in step 4), the protective layer 16 is fixed in the flexible base layer 13 by fluid sealant 17,
Wherein, the fluid sealant 17 is located in the flexible base layer 13 and surrounds the scintillator layers 15, and the protective layer 16 covers
The scintillator layers 15 are simultaneously connected by the fluid sealant 17 with the flexible base layer 13.
As an example, in step 4), the protective layer 16 is waterproof reflecting layer, the waterproof reflecting layer be inorganic thin film or
The one kind being attached with the organic film of reflectance coating；The thickness of the protective layer is 50~200 μm.
As an example, the waterproof reflecting layer is the organic film for being attached with reflectance coating, the reflectance coating is silverskin and aluminium
One kind in film.
Specifically, the step of present invention additionally comprises protective layer 16 are made around the scintillator layers 15, the present embodiment
In, the protective layer 16 has the function that waterproof, reflection, ensures that visible ray enters via the flexible base layer to greatest extent
Follow-up sensor array, wherein,, can be with waterproof and instead such as Al films when the protective layer 16 selection is inoranic membrane
The effect penetrated, its thickness are preferably 80~180 μm, and selection is 150 μm in the present embodiment.In addition, when choosing is selected as organic film, one
As organic film only there is waterproof, one layer of reflectance coating is prepared preferably between organic film and scintillator layers, so as to anti-
Water and the effect of reflection, thickness is preferably 80~180 μm.
In addition, being that waterproof reflecting layer is bonded in flexible base layer using the fluid sealant 17, encapsulation effect is played, its
Surrounding needs to be sealed with fluid sealant, in actual applications, can also in a manner of well known within the skill of those ordinarily skilled
The periphery cladding fluid sealant in the waterproof reflecting layer, to strengthen sealing effectiveness, is not particularly limited herein.
As shown in the S5 in Fig. 1 and Fig. 7,8, carry out step 5), peel off the release layer 12 and with the phase of release layer 12
The substrate 11 even, obtains flexible scintillation screen.
As an example, in step 5), laser irradiation is carried out from the second surface of the substrate, and expose to the laser
The interface of the release layer and the flexible base layer, blow the associative key of the interface, with peel off the release layer and with
The substrate that the release layer is connected, obtain the flexible scintillation screen with flexible base layer.
Specifically, during peeling off and obtaining flexible scintillation screen, using the laser of specific wavelength from the second of the substrate
Surface is irradiated, so that release layer is broken with flexible base layer in interface, alternatively, it is also possible to make laser expose to institute
The inside of release layer is stated, so that the release layer is divided into two parts by the position that the release layer is irradiated to, finally by two
Part release layer takes out respectively, obtains having the flexible scintillation screen.
It should be noted that the flexible scintillation screen being prepared by this method, in actual application, X ray passes through
Waterproof reflecting layer (protective layer), enters scintillator layers, and X ray is converted to visible light beam, caused visible ray by scintillator layers
Through the high flexible base layer of transmitance, read hence into corresponding charge signal is produced to sensor array.
As shown in figure 8, the present invention also provides a kind of flexible scintillation screen, wherein, the flexible scintillation screen is using this implementation
The flexible scintillation screen arrived prepared by the preparation method of the flexible scintillation screen of example, including：
Flexible base layer 13；
Scintillator layers 15, positioned at the surface of flexible base layer 13, the incident ray for being received is converted into visible
Light；
Protective layer 16, the flexible base layer around the surface of scintillator layers 15 and the scintillator layers 15
On 13, and cover the scintillator layers 15.
As an example, the flexible scintillation screen also includes barrier layer 14, the barrier layer 14 is located at the flexible base layer
13 surfaces away from the side of scintillator layers 15.
Formed as an example, the barrier layer 14 is silicon oxide layer, silicon nitride layer and silicon oxide layer and silicon nitride layer
One kind in laminated structural layers.
Specifically, the barrier layer 14 is used to protect the flexible base layer 13 without prejudice, and in the present embodiment, selection
For the laminated structural layers being made up of silicon oxide layer and silicon nitride layer, wherein it is possible to be that silica connects with the flexible base layer
Touch or silicon nitride is in contact with the flexible base layer.
As an example, the substrate includes glass substrate；The material of the scintillator layers mixes thallium and iodate including cesium iodide
Caesium mixes one kind in sodium；The protective layer is waterproof reflecting layer, and the waterproof reflecting layer is inorganic thin film or is attached with reflectance coating
Organic film in one kind.
Specifically, the thickness of the flexible base layer 13 is preferably 10~50 μm, selection is 20 μm in the present embodiment, the thickness
On the one hand flexible scintillation screen that the flexible base layer of degree makes to obtain can apply to any required occasion bent, and
And it is cost-effective, improve flexibility, light transmission rate and the accuracy for detecting structure of device.
Specifically, the thickness of the scintillator layers 15 is 200~800 μm, preferably 400~600 μm, selected in the present embodiment
It is selected as 500 μm.The thickness of the protective layer is 50~200 μm, and preferably 80~180 μm, selection is 150 μm in the present embodiment.
Embodiment two：
As shown in FIG. 9 and 10, the present invention provides a kind of preparation method of radiation image sensor, including step：
Flexible scintillation screen 1 is prepared using any one preparation method in such as embodiment one, and in close to the flexible flicker
The side of the flexible base layer of screen forms the sensor array 21 corresponding with the flexible scintillation screen, to obtain radiation image
Sensor 2, wherein, visible light signal caused by the flexible scintillation screen that the sensor array is used to be received is converted to
Electric signal.
As an example, the flexible scintillation screen and the sensor array are attached by Optical transparent adhesive (OCA), with reality
The coupling of the existing flexible scintillation screen and the sensor array.
As an example, the sensor array includes one kind in flat panel detector, photographing element.
Specifically, the flexible scintillation screen provided using embodiment one is coupled with sensor unit, so as to manufacture
Radiation image sensor.Wherein, the flexible scintillation screen may be coupled to flat panel sensor (a-Si thin film transistor (TFT)s+light two
Pole pipe), be directly coupled to photographing element (CCD) or by Lens Coupling, i.e., pass through flexibility through the radioactive ray of object
Scintillation screen 1 is detected after being transformed into visible ray by ccd video camera.
The present invention also provides a kind of radiation image sensor 2, including：
Flexible scintillation screen 1, according to the flexible scintillation screen that is prepared such as a kind of any one middle preparation method of embodiment；
Sensor array 21, dodged positioned at the side of the flexible base layer close to the flexible scintillation screen 1, and with the flexibility
Bright screen 1 is corresponding, and electric signal is converted to for visible ray caused by the flexible scintillation screen that is received.
As an example, the sensor array includes one kind in flat panel detector, photographing element.
In summary, the present invention provides a kind of flexible scintillation screen, radiation image sensor and respective preparation method, soft
The preparation method of property scintillation screen, comprises the following steps：A substrate is provided, and the substrate has relative first surface and second
Surface, and in forming release layer on the first surface；Flexible base layer is formed in the release layer surface；In the flexible base
Bottom surface prepares scintillator layers, and the incident ray that the scintillator layers are used to be received is converted to visible ray；In the sudden strain of a muscle
The protective layer for covering the scintillator layers is formed in the flexible base layer around bright body layer surface and the scintillator layers；
And the substrate of the stripping to remove the release layer and be connected with the release layer, obtain flexible scintillation screen.By above-mentioned
Technical scheme, flexible scintillation screen of the invention and preparation method can solve to encapsulate flow complexity, equipment cost in the prior art
The problem of high, so as to simplify device preparation flow, production cost is reduced, and obtained flexible scintillation screen is frivolous；The present invention's
Flexible scintillation screen employs flexible base layer, deflection, solves the problems, such as that of the invention is flexible soft caused by existing hard substrate
Property scintillation screen go for a variety of occasions for needing flexible scintillation screens, such as X-ray flat panel detector, CT detectors neck
Domain.So the present invention effectively overcomes various shortcoming of the prior art and has high industrial utilization.
The above-described embodiments merely illustrate the principles and effects of the present invention, not for the limitation present invention.It is any ripe
Know the personage of this technology all can carry out modifications and changes under the spirit and scope without prejudice to the present invention to above-described embodiment.Cause
This, those of ordinary skill in the art is complete without departing from disclosed spirit and institute under technological thought such as
Into all equivalent modifications or change, should by the present invention claim be covered.
Claims (19)
1. a kind of preparation method of flexible scintillation screen, it is characterised in that comprise the following steps：
1) substrate is provided, and the substrate has relative first surface and second surface, and in shape on the first surface
Into release layer；
2) flexible base layer is formed in the release layer surface；
3) scintillator layers are prepared in the flexible substrates layer surface, the scintillator layers are used for the incident ray conversion received
For visible ray；
4) formed in the flexible base layer around the scintillator layers surface and the scintillator layers and cover the sudden strain of a muscle
The protective layer of bright body layer；And
5) substrate to remove the release layer and be connected with the release layer is peeled off, obtains flexible scintillation screen.
2. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that between step 1) and step 2) also
Including：Barrier layer is formed in the release layer surface, the barrier layer is between the release layer and the flexible base layer.
3. the preparation method of flexible scintillation screen according to claim 2, it is characterised in that the barrier layer is silica
One kind in the laminated structural layers that layer, silicon nitride layer and silicon oxide layer and silicon nitride layer are formed.
4. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 1), the substrate bag
Glass substrate is included, the release layer includes amorphous silicon layer.
5. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 2), by coating and
The flexible base layer is made on the release layer by the technique of solidification, wherein, the temperature of the solidification is 100~200 DEG C,
Time is 60~120min.
6. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 2), the flexible base
Bottom includes one kind in Kapton, epoxy resin thin film and pet film；It is described soft
Property basalis light transmission rate be 70%~100%, thickness be 10~200 μm.
7. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 3), pass through hot evaporation
Mode the scintillator layers are made in the flexible base layer.
8. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 3), the scintillator
The material of layer includes one kind in the cesium iodide for mixing thallium and the cesium iodide for mixing sodium；The thickness of the scintillator layers is 200~800 μ
m。
9. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 4), pass through fluid sealant
The protective layer is fixed in the flexible base layer, wherein, the fluid sealant is located in the flexible base layer and surrounded
The scintillator layers, the protective layer cover the scintillator layers and are connected by the fluid sealant with the flexible base layer
Connect.
10. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 4), the protective layer
For waterproof reflecting layer, the waterproof reflecting layer is inorganic thin film or the one kind being attached with the organic film of reflectance coating；The guarantor
The thickness of sheath is 50~200 μm.
11. the preparation method of flexible scintillation screen according to claim 10, it is characterised in that the waterproof reflecting layer is attached
The organic film of reflectance coating, the reflectance coating is one kind in silverskin and aluminium film.
12. the preparation method of flexible scintillation screen according to claim 1, it is characterised in that in step 5), from the substrate
Second surface carry out laser irradiation, and the laser is exposed to the interface of the release layer and the flexible base layer, burning
The associative key of the disconnected interface, with the substrate peeled off the release layer and be connected with the release layer, obtain flexible
Scintillation screen.
13. a kind of preparation method of radiation image sensor, it is characterised in that including step：
Flexible scintillation screen is prepared using the preparation method as described in any one in claim 1~12, and in close to described soft
Property scintillation screen the side of flexible base layer form the sensor array corresponding with the flexible scintillation screen, to obtain radioactive ray
Imaging sensor, wherein, visible light signal caused by the flexible scintillation screen that the sensor array is used to be received turns
It is changed to electric signal.
14. the preparation method of radiation image sensor according to claim 13, it is characterised in that pass through optical clear
Glue attaches the flexible scintillation screen and the sensor array, to realize the flexible scintillation screen and the sensor array
Coupling.
A kind of 15. flexible scintillation screen, it is characterised in that including：
Flexible base layer；
Scintillator layers, positioned at the flexible substrates layer surface, the incident ray for being received is converted into visible ray；
Protective layer, in the flexible base layer around the scintillator layers surface and the scintillator layers, and cover
The scintillator layers.
16. flexible scintillation screen according to claim 15, it is characterised in that the flexible scintillation screen also includes barrier layer,
The barrier layer is located at surface of the flexible base layer away from the scintillator layers side.
17. flexible scintillation screen according to claim 15, it is characterised in that the substrate includes glass substrate；The sudden strain of a muscle
The material of bright body layer includes that cesium iodide mixes thallium and cesium iodide mixes one kind in sodium；The protective layer is waterproof reflecting layer, described anti-
Water reflecting layer is inorganic thin film or the one kind being attached with the organic film of reflectance coating.
A kind of 18. radiation image sensor, it is characterised in that including：
Flexible scintillation screen, according to the flexible sudden strain of a muscle that is prepared of preparation method as described in any one in claim 1~14
Bright screen；
Sensor array, positioned at close to the flexible scintillation screen flexible base layer side, and with the flexible scintillation screen phase
It is corresponding, be converted to electric signal for visible ray caused by the flexible scintillation screen that is received.
19. the preparation method of radiation image sensor according to claim 18, it is characterised in that the sensor array
Row include one kind in flat panel detector, photographing element.
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