CN107339943B - The total optical path self calibration apparatus for measuring thickness of thin film and measurement method of palarization multiplexing - Google Patents
The total optical path self calibration apparatus for measuring thickness of thin film and measurement method of palarization multiplexing Download PDFInfo
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- 230000003287 optical effect Effects 0.000 title claims abstract description 37
- 239000010409 thin film Substances 0.000 title claims abstract description 18
- 238000000691 measurement method Methods 0.000 title abstract description 6
- 239000000523 sample Substances 0.000 claims abstract description 156
- 239000010408 film Substances 0.000 claims abstract description 106
- 238000005259 measurement Methods 0.000 claims abstract description 46
- 230000010287 polarization Effects 0.000 claims abstract description 41
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- 230000005540 biological transmission Effects 0.000 claims abstract description 19
- 239000013307 optical fiber Substances 0.000 claims description 73
- 238000001228 spectrum Methods 0.000 claims description 22
- 238000000926 separation method Methods 0.000 claims description 11
- 230000003595 spectral effect Effects 0.000 claims description 10
- 239000000835 fiber Substances 0.000 claims description 8
- 238000012360 testing method Methods 0.000 claims description 8
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 230000004913 activation Effects 0.000 claims 2
- 238000009738 saturating Methods 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 4
- 238000013461 design Methods 0.000 abstract description 3
- 238000005305 interferometry Methods 0.000 description 5
- 230000033001 locomotion Effects 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000004441 surface measurement Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000011426 transformation method Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
Abstract
The present invention is to provide the total optical path self calibration apparatus for measuring thickness of thin film and measurement method of a kind of palarization multiplexing.Include light source output module, film thickness measuring probe module, demodulated interferential instrument module, polarization beam splitting module and acquisition and control module.The present invention uses polarization multiplexing, and two probes use orthogonal state polarised light.Measuring probe is able to achieve the transmission and reflection of transmission ray, and when no film to be measured can realize the measurement of two probe absolute distance H；Between two probe of film placement to be measured, the measurement of two probes and the absolute distance H1 and H2 of film front and rear surfaces to be measured is realized；Film thickness d to be measured can be determined by d=H- (H1+H2).The present invention is implemented without calibration object and can measure to film thickness to be measured, the design of optical path overcomes in measurement process since internal system mechanical instability and external environment variation bring influence altogether, has many advantages, such as that self calibration, the identification of feature white light interference peak is simple, dynamic range is big, measurement result can trace to the source.
Description
Technical field
The present invention relates to a kind of optical measuring device, especially a kind of apparatus for measuring thickness of thin film.Specifically
A kind of total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing.
Background technique
With flourishing for material science and technology, it is essential to meet the urgent of fields such as microelectronics, photoelectron, new energy
It asks, film is in fields such as optical engineering, mechanical engineering, Communication Engineering, bioengineering, space technology, chemical engineering, engineering in medicine
It is widely used.One of thin-film material core the most and crucial parameter are exactly thickness, it plays pass not only for film preparation
The effect of key also substantially determines the application performances such as mechanics, electromagnetism, photoelectricity and the optics of film.
1961, N.Schwartz et al., which is proposed, a kind of to be perceived using high-accuracy mechanical contact pilotage in body surface movement
Contact probe method (N.Schwartz, R.Brown, " the A Stylus Method for Evaluating of the variation of surface profile
the Thickness of Thin Films and Substrate Surface Roughness,”in Transactions
of the Eighth Vacuum Symposium and Second International Congress(Pergamon,New
York, 1961), pp.836-845.), the advantages that this method has stability good, and resolving power is high, and measurement range is big；But due to
Include the probe based on mechanical movement in sonde method, needs to carry out secondary operation when to measured thin film, furthermore probe is in film table
The movement in face can also cause certain damage to film.Therefore noncontact measuring method is just cracking instead of contact measuring method pair
The thickness of film measures.
2013, Ma Xizhi of Nanjing Aero-Space University et al. disclosed a kind of ultrasonic film thickness measuring instrument and its measurement side
Method (Chinese Patent Application No.: 201310198294.9), resonance occurs for the surface that oil film is incident in this method transmitting ultrasonic pulse,
The thickness of oil film is measured by measuring the correlation properties of reflected impulse again；But this method is only applicable to the survey of liquid mould
Amount, and different models need to be established for the film of different-thickness range, demodulation difficulty is larger.
Optical measuring method has high-precision advantage, starts gradually to be widely applied in terms of measured film thickness
Come.2012, Qu Lianjie of Jingdongfang Photoelectric Science & Technology Co., Ltd., Beijing et al. disclose a kind of film thickness device and method (in
State's number of patent application: 201210080756.2), this method passes through prism in such a way that space optical path is in conjunction with optic fibre light path
Light-splitting processing is carried out to color light source and is radiated at the surface of film, by measure the characteristics of different reflected lights to the thickness of film into
Row measurement.This method expands the spectral range of the device sample point of measured film thickness, improves resolution ratio.
As a part of optical measuring method, White Light Interferometer is surveyed due to having the measurement advantage of absolute magnitude in film thickness
Amount field gradually starts to grow up.The basic principle of White Light Interferometer is: connecting scanning in an arm end of white light interferometer
For mirror as pickup arm, another arm lengths are fixed to be used as reference arm, changes sensing arm lengths by motion scan mirror, works as pickup arm
When the light path of middle transmission light is matched with the light path realization for transmitting light in reference arm, the interference peak of appearance is maximum, by identifying peak
Realize the measurement of relevant parameter in the position of value.2008, Peter J.de Groot of Zygo company, the U.S. et al. disclosed one
Kind is used for scanning interferometer method (the Scanning interferometry for thin film of film thickness and surface measurement
Thickness and surface measurements, US Patent 7468799), this method uses white light interference theory
Measured film thickness method, two peak values are extracted from interference light intensity figure using Fourier transformation method, this method is not by thin
The influence of film thickness is not only suitable for the film that measurement thickness is greater than the coherence length of laser, and is suitable for measurement thickness and is less than light source
The film of coherence length.2014, Jia Chuanwu of Shandong University et al. disclosed a kind of wide range optical interferometry measurement film thickness
System (Chinese Patent Application No.: 201410290494.1), the method cloth which forms between reflecting mirror and collimating mirror
In-polo interferometer, it measures and can obtain by measuring the Fabry-Perot chamber length before and after placing film to be measured under reflecting mirror
To the thickness of film to be measured, this method structure is simple, and measurement accuracy is higher, but due to needing film to be measured being placed on reflection
The lower section of mirror is easy to generate destruction to the form of film surface.
Summary of the invention
The purpose of the present invention is to provide a kind of precision height, self calibration, the identification of feature white light interference peak is simple, can trace to the source,
The total optical path self calibration apparatus for measuring thickness of thin film of the palarization multiplexing of dynamic range.The object of the invention is also to provide a kind of thin
Membrane thickness measured method.
The object of the present invention is achieved like this:
Including light source output module 1, film thickness measuring probe module 6, demodulated interferential instrument module 7, polarization beam splitting module 8 and
Acquisition and control module 9；The output light of light source output module 1 is input in polarization-maintaining coupler 3 via 45 ° of polarizers 2；Polarization-maintaining coupling
Incident light is divided into two-way and passes through 0 ° of analyzer 4 and 90 ° analyzer 5 respectively into the 1st of film thickness measuring probe module 6 by clutch 3
The measurement of relevant parameter is carried out in measuring probe 601 and the 2nd measuring probe 602；It measures and visits via the 1st measuring probe 601 and the 2nd
First 602 return light is input in demodulated interferential instrument module 7；Pass through the position scanning means 704 in demodulated interferential instrument module 7
The matching of light path is realized in scanning；The interference signal for matching light path is input in polarization beam splitting module 8 and realizes different polarization states, no
The separation of co-wavelength interference light；Interference signal after separation carries out the calculating of relevant parameter by acquiring with acquisition in control module 9.
The present invention may also include:
1, the light source output module 1 is by wide spectrum light source 101, the 1st isolator 102, narrowband Frequency Stabilized Lasers light source the 103, the 2nd
Isolator 104 and the 1st wavelength division multiplexer 105 are formed, and wide spectrum light source 101 is connected with the 1st isolator 102, narrowband frequency stabilization
Laser light source 103 is connected with 104 input terminal of the 2nd isolator, the 1st isolator 102 and 104 output end of the 2nd isolator respectively with
The 1st input terminal 1a of 1st wavelength division multiplexer 105, the 2nd input terminal 1b are connected.
2, in the light source output module 1 each light source feature are as follows: half spectral width of wide spectrum light source 101 be greater than 45nm,
Fiber power is greater than 2mW；Half spectral width of narrowband Frequency Stabilized Lasers light source 103 is less than 1pm, and fiber power is greater than 2mW；Wide spectrum light source
101 have different central wavelength from narrowband Frequency Stabilized Lasers light source 103, and the frequency spectrum of the two is unfolded in half spectral width
Part.
3, the film thickness measuring probe 6 is made of the 1st measuring probe 601 and the 2nd measuring probe 602；1st measurement is visited
First 601 and the 2nd measuring probe 602 can be achieved at the same time transmission and reflection to transmission ray, and the reflectivity of transmission ray exists
Between 20%~80%；1st measuring probe 601 and the 2nd measuring probe 602 can work in the fast axle and slow axis of polarization maintaining optical fibre；
The emergent ray of 1st measuring probe 601 and the 2nd measuring probe 602 mutually coincides；Device under test 603 place measurement when, respectively with
The emergent ray of 1st measuring probe 601 and the 2nd measuring probe 602 is vertical；The output of 1st measuring probe 601 and 0 ° analyzer 4
End is connected, and 5 output end of the 2nd measuring probe 602 and 90 ° analyzer is connected.
4, the demodulated interferential instrument module 7 is by polarization-maintaining coupler 701, polarization-maintaining self-focusing lens 702, removable single side reflection
Mirror 703 and position scanning means 704 are formed, and polarization-maintaining self-focusing lens 702 can work in the fast axle and slow axis of polarization maintaining optical fibre
Make, can be achieved at the same time reflection and transmission, camera lens light reflectance between 20%~80%, by 601 He of the 1st measuring probe
The 2nd output end 3b that the light that 2nd test probe 602 is collected passes through polarization-maintaining coupler 3 respectively is input to polarization-maintaining coupler 701 the 2nd
In input terminal 7b, the 3rd output end 7c of polarization-maintaining coupler 701 is connect with polarization-maintaining self-focusing lens 702, polarization-maintaining coupler 701
1st output end 7a is connect with the input terminal of polarization splitting prism 803；Polarization-maintaining self-focusing lens 702, removable single side reflecting mirror
703 reconciliation cadre enrolled among workers's interferometer couplers 701 collectively constitute demodulated interferential instrument；The scanning range L energy of 704 table top of position scanning means
When enough meeting film thickness measuring probe module and being not inserted into film 603 to be measured, demodulated interferential instrument is able to achieve by inside and outside different probe lens
The light path of surface reflection matches.
5, it connects optical fiber in optical path to be characterized in: 101 output end tail optical fiber of wide spectrum light source, narrowband Frequency Stabilized Lasers light source 103, the
105,45 ° of each port tail optical fiber of 1 isolator 102, each port tail optical fiber of the 2nd isolator 104, the 1st wavelength division multiplexer polarizers 2 input
Holding each port tail optical fiber of tail optical fiber is single mode optical fiber；45 ° of 2 output end tail optical fibers of the polarizer, each port tail optical fiber of polarization-maintaining coupler 3,0 ° of inspection
4 input/output terminal tail optical fiber of inclined device, 90 ° of 5 input/output terminal tail optical fibers of analyzer, 601 tail optical fibers of the 1st measuring probe, the 2nd measuring probe
602 tail optical fibers, each port tail optical fiber of polarization-maintaining coupler 701,702 tail optical fiber of polarization-maintaining self-focusing lens, each port of polarization splitting prism 803
Tail optical fiber, each port tail optical fiber of the 2nd wavelength division multiplexer 801,802 the 1st photodetector of each port tail optical fiber of the 3rd wavelength division multiplexer, 903 tail
Fibre, 904 tail optical fiber of the 2nd photodetector, 905 tail optical fiber of the 3rd photodetector, 906 tail optical fiber of the 6th photodetector are polarization-maintaining light
It is fine.
Measured film thickness method of the invention are as follows:
1, when being not inserted into film 603 to be measured, driving light path position scanning means 704 carries out light path scanning, makes the 1st measurement
601 internal reflected lights 611 and the 602 outer surface reflected light 612 of the 2nd measuring probe of popping one's head in carry out light path matching, the 2nd measuring probe
602 internal reflected lights 621 and 601 outer surface reflected light 622 of the 1st measuring probe carry out light path matching；Pass through acquisition and control mould
Block 9 carries out demodulation record to relevant parameter, obtains the absolute distance H between two measuring probes；
2, film 603 to be measured is inserted among the 1st measuring probe 601 and the 2nd measuring probe 602, film 603 to be measured and the
1 measuring probe 601 is vertical with the emergent ray of the 2nd measuring probe 602；Driving light path position scanning means 704 carries out light path and sweeps
Retouch, make to be carried out by 601 internal reflected light 613 of the 1st measuring probe and film front surface 603a reflected light 614 to be measured light path matching,
2nd measuring probe, 602 internal reflected light 623 carries out light path matching with film rear surface 603b reflected light 624 to be measured；By adopting
Collection carries out demodulation record to relevant parameter with control module 9, obtains the film front surface 603a to be measured of the 1st measuring probe 601 respectively
Distance H1, the film front surface 603b to be measured of the 2nd measuring probe 602 distance H2；
3, film thickness d, i.e. d=H- (H1+H2) are determined by above-mentioned measured value twice.
The self-alignment apparatus for measuring thickness of thin film of total optical path of palarization multiplexing provided by the invention has high-precision, self-correcting
It is quasi-, the identification of feature white light interference peak is simple, can trace to the source, the features such as dynamic range is big.Due to detecting the polarization characteristic of light, can be used for
High-precision measurement is carried out to transparent and opaque film thickness in film production and application.
The present invention provides a kind of self-alignment apparatus for measuring thickness of thin film of total optical path of palarization multiplexing, realizes film thickness
Non-cpntact measurement.Firstly, since two measuring probes can be achieved at the same time the transmission and reflection of incident light, for measuring probe it
Between absolute distance H realize directly measurement；Then film to be measured is inserted among two measuring probes, obtains two measuring probes respectively
Absolute distance H1 and H2 between film front and rear surfaces to be measured；Therefore thickness d=H- (H1+H2) of film to be measured.This hair
It is bright that parameter measurement is carried out from the polarised light that analyzer generates different polarization states between different probes by the polarizer, keep feature white
The identification at interference of light peak is simpler；Two probe return lights share same demodulated interferential device, efficiently avoid external environment
Change the influence generated；Optical path is improved absolute measurement precision, is realized further opening up for dynamic range using double-light-source structured
Exhibition overcomes the unstable brought error of mechanical system in measurement process, improves the stability of measurement；By being visited to measurement
The optimization design of end surface light reflectance and transmissivity is realized and realizes that being not necessarily to calibration sample can be realized to transparent in measurement
Film and the thickness of opaque film carry out high-acruracy survey.
Compared with prior art, the beneficial effects of the present invention are:
(1) measuring probe of the present invention can be achieved at the same time the transmission and reflection of incident light, can be directly realized by measuring system
Self calibration, make it when measuring, without standard sample can the thickness directly to film to be measured measure.
(2) present invention proposes that the two waveband optical fiber optical interferometry film based on wide spectrum light source and narrowband Frequency Stabilized Lasers is thick
The method of degree realizes the extension of its measurement dynamic range, overcomes under the premise of guaranteeing film absolute thickness high-acruracy survey
Error brought by mechanical instability, improves the absolute precision of measurement and the stability of test, and ensure in measurement process
Film Optics test can be achieved to trace to the source.
(3) present invention uses polarization multiplexing, and the polarised light of different polarization states is used between different measuring probes
Simpler, demodulating algorithm can be identified to the thickness measure of transparent membrane and opaque film, white light interference characteristic peak by realizing
It is further simplified.
Detailed description of the invention
Fig. 1 is a kind of total optical path self calibration film thickness measurement device schematic diagram of palarization multiplexing.
Fig. 2 is measuring probe inside modules index path when not loading film to be measured.
Fig. 3 is measuring probe inside modules index path when loading film to be measured.
Fig. 4 is index path inside demodulated interferential instrument.
Fig. 5 is that laser interference signal is traced to the source schematic illustration.
Fig. 6 is distance measurement method schematic diagram when not loading film to be measured based on white light interference theory.
Specific embodiment
The total optical path self calibration film thickness measurement device of palarization multiplexing of the invention is visited by light source output module 1, film thickness measuring
Head module 6, demodulated interferential instrument module 7, polarization beam splitting module 8 and five parts such as acquisition and control module 9 form.Each module group
At being respectively: (1) light source output module 1 is by the 101, the 1st isolator 102 of wide spectrum light source, narrowband Frequency Stabilized Lasers light source the 103, the 2nd
The 104, the 1st wavelength division multiplexer 105 of isolator is formed；(2) film thickness measuring probe module 6 is by the 1st measuring probe 601 and the 2nd
Measuring probe 602 is formed；(3) demodulated interferential instrument module 7 is moved by polarization-maintaining coupler 701, polarization-maintaining self-focusing lens 702
Single side reflecting mirror 703 and position scanning means 704 are formed；(4) polarization beam splitting module 8 is coupled by the 2nd coupler the 801, the 3rd
Device 802 and polarization splitting prism 803 are formed；(5) acquisition with control module 9 by computer 901, data collecting card 902, the
The 903, the 2nd photodetector 904 of 1 photodetector, the 3rd photodetector 905 and the 4th photodetector 906 are formed.
The output light of light source output module 1 is input in polarization-maintaining coupler 3 via 45 ° of polarizers 2；Polarization-maintaining coupler 3 will
Incident light is divided into two-way and passes through the 1st measuring probe that 0 ° of analyzer 4 and 90 ° analyzer 5 enters film thickness measuring probe module 6 respectively
The measurement of relevant parameter is carried out in 601 and the 2nd measuring probe 602；Via the 1st measuring probe 601 and the 2nd measuring probe 602
Return light is input in demodulated interferential instrument module 7；It is real by the scanning of the position scanning means 704 in demodulated interferential instrument module 7
The matching of existing light path.It will complete the matched interference signal of light path and be input to realization different polarization states, difference in polarization beam splitting module 8
The separation of wavelength-interferometric light；Interference signal after separation carries out the calculating of relevant parameter by acquiring with acquisition in control module 9.
Wide spectrum light source 101 in light source output module 1 is connected with the 1st isolator 102, narrowband Frequency Stabilized Lasers light source 103
It is connected with the 2nd isolator 104.1st isolator 102 and the 2nd isolator 104 respectively with 105 input terminal of the 1st wavelength division multiplexer
1a, 1b are connected.Half spectral width of wide spectrum light source 101 is greater than 45nm, and fiber power is greater than 2mW；Narrowband Frequency Stabilized Lasers light source 103
Half spectral width be less than 1pm, fiber power be greater than 2mW.Wide spectrum light source 101 has different from narrowband Frequency Stabilized Lasers light source 103
Central wavelength, and the frequency spectrum of the two unfolded part in half spectral width.
The 1st measuring probe 601 and the 2nd measuring probe 602 in film thickness measuring probe module 6 can be achieved at the same time to transmission
The transmission and reflection of light, the reflectivity of transmission ray is between 20%~80%.1st measuring probe 601 and the 2nd measuring probe
602 can work in the fast axle and slow axis of polarization maintaining optical fibre.The emergent ray of 1st measuring probe 601 and the 2nd measuring probe 602 is mutual
It coincides；When device under test 603 places measurement, hang down respectively with the emergent ray of the 1st measuring probe 601 and the 2nd measuring probe 602
Directly.The output end of 1st measuring probe 601 and 0 ° analyzer 4 is connected, 5 output end phase of the 2nd measuring probe 602 and 90 ° analyzer
Connection.
In demodulated interferential instrument module 7 feature of polarization-maintaining self-focusing lens 702 be that by polarization maintaining optical fibre fast axle and
Slow axis can work；It can be achieved at the same time inner surface reflection and transmission, the light reflectance of camera lens is between 20%~80%.By
The output end 3b that the light that 1st measuring probe 601 and the 2nd test probe 602 is collected passes through polarization-maintaining coupler 3 respectively is input to polarization-maintaining
In 701 input terminal 7b of coupler, the 7c output end of polarization-maintaining coupler 701 is connect with polarization-maintaining self-focusing lens 702, polarization-maintaining coupling
The 7a output end of device 701 is connect with the input terminal of polarization splitting prism 803.Polarization-maintaining self-focusing lens 702, removable single side are anti-
It penetrates the reconciliation cadre enrolled among workers's interferometer coupler 701 of mirror 703 and collectively constitutes demodulated interferential instrument.The scanning range of 704 table top of position scanning means
When L can satisfy film thickness measuring probe module and be not inserted into film 603 to be measured, demodulated interferential instrument is able to achieve by different probe lens
The light path of outer surface reflected light matches.
In polarization beam splitting module 8 the output end 8e and 8f of polarization splitting prism 803 respectively with the 2nd wavelength division multiplexer 801 and
The input terminal of 3rd wavelength division multiplexer 802 is connected.
Acquisition is connect with the 1st photodetector 903 in control module 9 with the 8a output end of the 2nd wavelength division multiplexer 801；2nd
Photodetector 904 is connect with the 8b output end of the 2nd wavelength division multiplexer 801；3rd photodetector 905 and the 3rd wavelength division multiplexer
802 8c output end connection；4th photodetector 906 is connect with the 8d output end of the 3rd wavelength division multiplexer 802.Photodetector
Collected signal is conveyed to computer 901 by data collecting card 902, computer 901 is responsible for position scanning means simultaneously
704 driving is to complete light path scanning.
The requirement of optical fiber is connected in optical path are as follows: 101 output end tail optical fiber of wide spectrum light source, narrowband Frequency Stabilized Lasers light source the 103, the 1st
Each port tail optical fiber of isolator 102,104 port tail optical fibers of the 2nd isolator, each port tail optical fiber of the 1st wavelength division multiplexer 105 are single mode
Optical fiber；45 ° of 2 output end tail optical fibers of the polarizer, each port tail optical fiber of polarization-maintaining coupler 3,0 ° of 4 input/output terminal tail optical fiber of analyzer, 90 °
5 input/output terminal tail optical fiber of analyzer, 601 tail optical fiber of the 1st measuring probe, 602 tail optical fiber of the 2nd measuring probe, polarization-maintaining coupler 701 are respectively held
Mouth tail optical fiber, 702 tail optical fiber of polarization-maintaining self-focusing lens, each port tail optical fiber of polarization splitting prism 803, each port of the 2nd wavelength division multiplexer 801
Tail optical fiber, 802 the 1st photodetector of each port tail optical fiber of the 3rd wavelength division multiplexer, 903 tail optical fiber, 904 tail optical fiber of the 2nd photodetector, the 3rd
905 tail optical fiber of photodetector, 906 tail optical fiber of the 6th photodetector are polarization maintaining optical fibre.
Optical interferometry method is the highest distance measurement method of current accuracy, but due to laser light source coherence length
Longer, laser interference measuring method can only realize the high-acruracy survey of relative variation, cannot achieve the measurement of absolute magnitude.White light
Interferometric method uses the wide spectrum light source of Low coherence.It is defeated after interference since the coherence length of low-coherence light source is very small
The shape of interference fringe out is the pure oscillation modulated by Gaussian envelope, which has a principal maximum, it is corresponded to
Interferometer two-arm optical path difference be zero position.Due to the rigors to interferometer two-arm optical path difference, the position of center striped
Just a good reference position is provided for the measurement of physical quantity.Therefore, to physical quantity in white light interferometric system
Measurement is converted to measure the change in location of the center striped of interference signal.The present invention uses the design of double light sources, such as
Shown in Fig. 5, during the scanning of position scanning means, while white light interference signal and laser interference signal are recorded, by right
The reading of laser interference signal striped number can carry out high-precision calibrating to the mobile actual range of position scanning means.
As shown in Fig. 2, 1st measuring probe 601 returns to the probe spacing of light measurement two and is when being not inserted into film 603 to be measured
Example illustrates distance measurement method used in the present invention:
1st measuring probe, 601 internal reflected light 611 and 602 outer surface reflected light 612 of the 2nd measuring probe are by the 1st solution cadre enrolled among workers
Interferometer coupler is divided into two-way: entering in the 1st self-focusing lens 602 all the way, generates 611 ' and 612 ' reflected lights；Enter all the way
In 1 faraday's reflecting mirror 603,611 " and 612 " reflected lights are generated.Under the control of computer 901,704 band of position scanning means
Dynamic removable single side reflecting mirror 703 carries out light path scanning, as shown in fig. 6, the process that white light interference signal generates are as follows:
(1) when two-arm optical path difference is equal to H, light 611 ' is matched with light 612 " in fixed arm in scan arm, then is generated
1st secondary maximum white light interference signal 631.
(2) when two-arm optical path difference is equal to 0, in scan arm and fixed arm, light 611 ' and light 611 ", light 612 ' and light
612 " match, then generate primary maximum white light interference signal 632.
(3) when two-arm optical path difference is equal to-H, light 612 ' is matched with light 612 " in fixed arm in scan arm, then is generated
2nd secondary maximum white light interference signal 633.
(4) Hilbert transform is carried out by dialogue optical interference signals realize that primary maximum and the position of secondary maximum envelope mention
It takes, obtains the scanning distance absolute difference between primary maximum and secondary maximum using the characteristic of tracing to the source of laser interference signal, the value is then
Represent the absolute distance between the 1st measuring probe 601 and the 2nd measuring probe 602.
Film thickness measuring method based on the above white light interferometry method are as follows:
(1) when being not inserted into film 603 to be measured, driving light path position scanning means 704 carries out light path scanning, makes the respectively
1 measuring probe, 601 internal reflected light 611 and 602 outer surface reflected light 612 of the 2nd measuring probe carry out light path matching, the 2nd measurement
602 internal reflected lights 621 and the 601 outer surface reflected light 622 of the 1st measuring probe of popping one's head in carry out light path matching.Pass through acquisition and control
Molding block 9 carries out demodulation record to relevant parameter, obtains the absolute distance H between two measuring probes.
(2) film 603 to be measured is inserted among the 1st measuring probe 601 and the 2nd measuring probe 602, and can satisfy to be measured
Film 603 and the 1st measuring probe 601 are vertical with the emergent ray of the 2nd measuring probe 602.Drive light path position scanning means
704 carry out light path scanning, make respectively by 601 internal reflected light 613 of the 1st measuring probe and film front surface 603a reflected light to be measured
614 carry out light path matching, 602 internal reflected light 623 of the 2nd measuring probe is carried out with film rear surface 603b reflected light 624 to be measured
Light path matching.Demodulation record is carried out to relevant parameter with control module 9 by acquisition, obtains two measuring probes and film two respectively
Absolute distance H1 and H2 between a surface.
(3) film thickness d can be determined by above-mentioned measured value twice, i.e. d=H- (H1+H2).
It illustrates below and the present invention is described in more detail.
The present invention is completed using the structure that double light sources are total to optical path to film thickness high-acruracy survey and the research traced to the source, overall
Technical solution is as shown in Figure 1.Light source output module 1 by central wavelength be the wide spectrum light source 101 of 1310nm, wavelength 1550nm it is narrow
With the 1st isolator 102 that Frequency Stabilized Lasers light source 103, operation wavelength are 1310nm, the 2nd isolator that operation wavelength is 1550nm
104 and operation wavelength be that 1310nm and the 1st wavelength division multiplexer 105 of 1550nm collectively constitute.Wherein, central wavelength 1310nm
Wide spectrum light source 101 be used as measuring beam, be mainly used for realize film thickness absolute measurement；Wavelength is that the narrowband of 1550nm is steady
Frequency laser light source 103 corrects light beam as optical path, is mainly used for realizing tracing to the source for measured film thickness.1st isolator 102 and
2 isolators 104 enter the 1st wavelength division multiplexer 105 and synthesize a branch of splitting ratio that enters after 45 ° of polarizers 2 as the guarantor of 3dB
In inclined coupler 3, they, which are divided into two-way, passes through 0 ° of analyzer 4 and 90 ° analyzer 5 respectively and enters film thickness measuring probe mould
In block 6；1st measuring probe 601 and 602 lensed endface reflectivity of the 2nd measuring probe and the ratio of transmissivity are 50:50；From the 1st
The measurement light that measuring probe 601 and the 2nd measuring probe 602 return, then inputted respectively by 0 ° of analyzer 4 and 90 ° analyzer 5
To splitting ratio be 3dB polarization-maintaining coupler 3 in, then by splitting ratio be 3dB polarization-maintaining coupler 3 be transported to demodulated interferential instrument module
In 7.Light path matching, the return light difference of two probes are realized by the scanning of the position scanning means 704 in demodulated interferential instrument module 7
It is to be interfered at 3dB polarization-maintaining coupler 701 in splitting ratio.The polarization-maintaining coupler 701 that light after interference is 3dB by splitting ratio
It is transported in 803 in polarization splitting prism, realizes the different polarization states light beam separation that different probe collections arrive.By polarization spectro rib
It is 1310nm's that 803 output end of mirror, which is connected respectively by central wavelength with the 2nd wavelength division multiplexer 801 and the 3rd wavelength division multiplexer 802,
White light measuring beam and wavelength are that 1550nm laser-adjusting light beam is separated by the 1st photodetector 903, the 2nd photodetector
904, the 3rd photodetector 905, acquired in the 4th photodetector 906.The signal being collected into is passed through data by photodetector
Capture card 902, which is transferred in computer 901, carries out demodulation process, and computer 901 is responsible for carrying out position scanning means 704 simultaneously
Driving.
When film 603 to be measured is not inserted into, the output light of light source output module 1 is split than the polarization-maintaining coupling for 3dB
3 beam splitting of device, light pass through 0 ° of analyzer 4 and 90 ° analyzer 5 respectively and enter the 1st measuring probe 601 and the 2nd measuring probe
In 602.As shown in Fig. 2, by the 1st measuring probe 601 itself inner surface of the lens the reflected beams 611,602 lens of the 2nd measuring probe
Outer surface the reflected beams 612 pass through 0 ° of analyzer 4；It is surveyed by the 2nd measuring probe 402 itself intralens reflection light beam the 621, the 1st
The outer surface the reflected beams 622 of amount 601 lens of probe pass through 90 ° of analyzers 5.Above-mentioned light beam is transported to the guarantor that splitting ratio is 3dB
In inclined coupler 3, then it is transported in demodulated interferential instrument module 7 by the polarization-maintaining coupler 3 that splitting ratio is 3dB.Interferometric demodulation instrument mould
The light transmission of polarization-maintaining self-focusing lens 702 in block 7 and the ratio of light reflectivity are 50:50.Light beam is in demodulated interferential instrument module 7
Middle transmission mode are as follows: 4 return light of film thickness measuring probe module is input to polarization-maintaining certainly by the polarization-maintaining coupler 7 that splitting ratio is 3dB
In condenser lens 702, light beam is respectively in the inner surface of polarization-maintaining self-focusing lens 702 and removable 703 surface of single side reflecting mirror point
It does not reflect；It drives removable single side reflecting mirror 703 mobile when position scanning means 704 carries out light path scanning, makes
The exact matching of light path occurs respectively for the reflected light of two film thickness measuringes probe.Light after interference is transported to polarization splitting prism 803
The middle different polarization states light beam separation for arriving different probe collections, the interference light after polarization state separation is by the 2nd wavelength division multiplexer 801
With the 3rd wavelength division multiplexer 802 respectively by the central wavelength of two-way interference signal be 1310nm white light measuring beam and wavelength be
The separation of 1550nm laser-adjusting light beam.White light interference will be formed on the 1st photodetector 903 and the 3rd photodetector 905
Striped will form laser interferencefringes on the 2nd photodetector 904 and the 4th photodetector 906, by believing white light interference
Number available two measuring probe of demodulation between absolute distance H.
When film 603 to be measured insertion, the output light of light source output module 1 is split than dividing for the polarization-maintaining coupler 3 of 3dB
Beam, light pass through 0 ° of analyzer 4 and 90 ° analyzer 5 respectively and enter in the 1st measuring probe 601 and the 2nd measuring probe 602.Such as
Shown in Fig. 3,601 inner surface of the lens the reflected beams 613 of the 1st measuring probe, film front surface 603a the reflected beams 614 to be measured are passed through
0 ° of analyzer 4；By the 2nd measuring probe 602 itself intralens reflection light beam 623, film rear surface 603b the reflected beams 624 to be measured
By 90 ° of analyzers 5.Above-mentioned light beam is transported in the polarization-maintaining coupler 3 that splitting ratio is 3dB, then the polarization-maintaining for being 3dB by splitting ratio
Coupler 3 is transported in demodulated interferential instrument module 7.Light beam transmission mode in demodulated interferential instrument module 7 are as follows: be by splitting ratio
4 return light of film thickness measuring probe module is input in polarization-maintaining self-focusing lens 702 by the polarization-maintaining coupler 7 of 3dB, light beam difference
It is reflected respectively in the inner surface of polarization-maintaining self-focusing lens 702 and removable 703 surface of single side reflecting mirror；When position is scanned
Device 704 carries out driving removable single side reflecting mirror 703 mobile when light path scanning, the reflected light for making two film thickness measuringes pop one's head in
The exact matching of light path occurs respectively.Light after interference is transported in polarization splitting prism 803 and arrives different probe collections not
It is separated with polarizing beam, the interference light after polarization state separation is distinguished by the 2nd wavelength division multiplexer 801 and the 3rd wavelength division multiplexer 802
The white light measuring beam and wavelength that central wavelength by two-way interference signal is 1310nm are 1550nm laser-adjusting light beam point
From.White-light fringe will be formed on the 1st photodetector 903 and the 3rd photodetector 905；2nd photodetector 904
Laser interferencefringes will be formed on the 4th photodetector 906, by the demodulation of dialogue optical interference signals, the 1st is obtained respectively and surveys
Measure the distance H1 of 601 film front surface 603a to be measured of probe, the distance of the film front surface 603b to be measured of the 2nd measuring probe 602
H2。
Therefore, film thickness is just determined by above-mentioned measured value twice, i.e. H- (H1+H2).
Claims (6)
1. a kind of total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing, including light source output module (1), film thickness measuring
Probe module (6), demodulated interferential instrument module (7), polarization beam splitting module (8) and acquisition and control module (9)；It is characterized in that:
The output light of light source output module (1) is input in polarization-maintaining coupler (3) via 45 ° of polarizers (2)；Polarization-maintaining coupler (3) will
Incident light is divided into the 1st survey that two-way passes through 0 ° of analyzer (4) respectively and 90 ° of analyzers (5) enter film thickness measuring probe module (6)
It is measured in amount probe (601) and the 2nd measuring probe (602)；Via the 1st measuring probe (601) and the 2nd measuring probe
(602) return light is input in demodulated interferential instrument module (7)；Pass through the position scanning means in demodulated interferential instrument module (7)
(704) matching of light path is realized in scanning；The interference signal for matching light path is input in polarization beam splitting module (8) and realizes difference
The separation of polarization state, different wave length interference light；Interference signal after separation is related to acquisition progress in control module (9) by acquisition
The calculating of parameter；
The light source output module (1) by wide spectrum light source (101), the 1st isolator (102), narrowband Frequency Stabilized Lasers light source (103),
2nd isolator (104) and the 1st wavelength division multiplexer (105) are formed, and wide spectrum light source (101) is connected with the 1st isolator (102)
It connects, narrowband Frequency Stabilized Lasers light source (103) is connected with the 2nd isolator (104) input terminal, the 1st isolator (102) output end and
1st input terminal (1a) of 1 wavelength division multiplexer (105) is connected, the 2nd isolator (104) output end and the 1st wavelength division multiplexer (105)
The 2nd input terminal (1b) be connected.
2. the total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing according to claim 1, it is characterized in that: described
Light source output module (1) in each light source feature are as follows: half spectral width of wide spectrum light source (101) is greater than 45nm, and fiber power is big
In 2mW；Half spectral width of narrowband Frequency Stabilized Lasers light source (103) is less than 1pm, and fiber power is greater than 2mW；Wide spectrum light source (101) with
Narrowband Frequency Stabilized Lasers light source (103) has different central wavelength, and the frequency spectrum of the two unfolded portion in half spectral width
Point.
3. a kind of total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing according to claim 1, it is characterized in that:
The film thickness measuring probe module (6) is made of the 1st measuring probe (601) and the 2nd measuring probe (602)；1st measurement is visited
Head (601) and the 2nd measuring probe (602) can be achieved at the same time transmission and reflection to transmission ray；1st measuring probe (601)
Fast axle and slow axis with the 2nd measuring probe (602) in polarization maintaining optical fibre can work；1st measuring probe (601) is visited with the 2nd measurement
The emergent ray of head (602) mutually coincides；Device under test (603) place measurement when, respectively with the 1st measuring probe (601) and the 2nd
The emergent ray of measuring probe (602) is vertical；1st measuring probe (601) is connected with the output end of 0 ° of analyzer (4), and the 2nd surveys
Amount probe (602) is connected with 90 ° of analyzer (5) output ends.
4. the total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing according to claim 1, it is characterized in that: described
Demodulated interferential instrument module (7) is by polarization-maintaining coupler (701), polarization-maintaining self-focusing lens (702), removable single side reflecting mirror (703)
And position scanning means (704) is formed, polarization-maintaining self-focusing lens (702) can work in the fast axle and slow axis of polarization maintaining optical fibre
Make, can be achieved at the same time reflection and transmission, camera lens light reflectance between 20%~80%, by the 1st measuring probe (601)
The 2nd output end (3b) that the light collected with the 2nd test probe (602) passes through polarization-maintaining coupler (3) respectively is input to polarization-maintaining coupling
In the 2nd input terminal (7b) of device (701), the 3rd output end (7c) of polarization-maintaining coupler (701) and polarization-maintaining self-focusing lens (702) are even
It connects, the 1st output end (7a) of polarization-maintaining coupler (701) is connect with the input terminal of polarization splitting prism (803)；Polarization-maintaining self-focusing is saturating
Mirror (702), removable single side reflecting mirror (703) reconciliation cadre enrolled among workers's interferometer coupler (701) collectively constitute demodulated interferential instrument.
5. the total optical path self calibration apparatus for measuring thickness of thin film of palarization multiplexing described in -4 any one according to claim 1,
It is characterized in that optical fiber is connected in optical path to be characterized in: wide spectrum light source (101) output end tail optical fiber, narrowband Frequency Stabilized Lasers light source (103), the
Each port tail optical fiber of 1 isolator (102), each port tail optical fiber of the 2nd isolator (104), the 1st wavelength division multiplexer (105), 45 ° of polarizers
(2) each port tail optical fiber of input terminal tail optical fiber is single mode optical fiber；The 45 ° of polarizer (2) output end tail optical fibers, polarization-maintaining coupler (3) are respectively held
Mouth tail optical fiber, 0 ° of analyzer (4) input/output terminal tail optical fiber, 90 ° of analyzer (5) input/output terminal tail optical fibers, the 1st measuring probes (601)
Tail optical fiber, the 2nd measuring probe (602) tail optical fiber, each port tail optical fiber of polarization-maintaining coupler (701), polarization-maintaining self-focusing lens (702) tail optical fiber,
Each port tail optical fiber of polarization splitting prism (803), each port tail optical fiber of the 2nd wavelength division multiplexer (801), the 3rd wavelength division multiplexer (802) are each
Port tail optical fiber the 1st photodetector (903) tail optical fiber, the 2nd photodetector (904) tail optical fiber, the 3rd photodetector (905) tail optical fiber,
6th photodetector (906) tail optical fiber is polarization maintaining optical fibre.
6. a kind of film of the total optical path self calibration apparatus for measuring thickness of thin film based on palarization multiplexing according to claim 1
Method for measuring thickness, it is characterized in that:
(1), when being not inserted into film to be measured (603), activation point scanning means (704) carries out light path scanning, visits the 1st measurement
Head (601) internal reflected light (611) and the 2nd measuring probe (602) outer surface reflected light (612) carry out light path matching, the 2nd measurement
It pops one's head in (602) internal reflected light (621) and the 1st measuring probe (601) outer surface reflected light (622) carries out light path matching；Pass through
Acquisition to demodulation record is carried out, obtains the absolute distance H between two measuring probes with control module (9)；
(2), film to be measured (603) are inserted into the 1st measuring probe (601) and the 2nd measuring probe (602) is intermediate, film to be measured
(603) vertical with the emergent ray of the 2nd measuring probe (602) with the 1st measuring probe (601)；Activation point scanning means (704)
Light path scanning is carried out, is made by the 1st measuring probe (601) internal reflected light (613) and film front surface to be measured (603a) reflected light
(614) light path matching, the 2nd measuring probe (602) internal reflected light (623) and film rear surface (603b) reflected light to be measured are carried out
(624) light path matching is carried out；Demodulation record is carried out to relevant parameter with control module (9) by acquisition, obtains the 1st measurement respectively
Probe (601) and film front surface to be measured (603a) distance H1, the 2nd measuring probe (602) and film rear surface to be measured
The distance H2 of (603b)；
(3), film thickness d, i.e. d=H- (H1+H2) are determined by above-mentioned measured value twice.
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| CN108426530B (en) * | 2018-01-29 | 2020-04-07 | 哈尔滨工程大学 | Device and method for simultaneously measuring thickness and refractive index of thin film |
| CN111238390B (en) * | 2020-03-12 | 2021-08-17 | 燕山大学 | Detector and method for detecting micro-bending of metal deep hole |
| CN111964580B (en) * | 2020-07-30 | 2022-02-11 | 广东工业大学 | Device and method for detecting position and angle of film based on optical lever |
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