CN107255907B - Compensation device, exposure device and exposure compensation method - Google Patents
Compensation device, exposure device and exposure compensation method Download PDFInfo
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- CN107255907B CN107255907B CN201710707431.5A CN201710707431A CN107255907B CN 107255907 B CN107255907 B CN 107255907B CN 201710707431 A CN201710707431 A CN 201710707431A CN 107255907 B CN107255907 B CN 107255907B
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
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Abstract
The invention provides a compensation device, an exposure device and an exposure compensation method. The exposure device provided by the invention can adjust the colored solutions with different concentrations to shield the light emitted by the exposure machine through the compensation device between the base station of the exposure machine and the light outlet of the exposure machine. The thinner the film thickness in the film to be processed is, the higher the concentration of the colored solution at the projection position is, so that the photosensitive depth of the film to be processed is quantitatively compensated, the matching between the exposure and the film thickness of the film to be processed is realized, and the precise structure size is formed on the substrate after exposure.
Description
Technical Field
The present invention relates to the field of lithography technologies, and in particular, to a compensation apparatus, an exposure apparatus, and an exposure compensation method.
Background
TFT-LCD flat panel displays are now the mainstream display devices due to their excellent performance and easy mass production. With the rapid development of TFT-LCD production technology, the requirement for production precision is also continuously raised.
The photolithography technique in the TFT-LCD manufacturing process is a main means for forming a specific pattern and is also an important technique affecting the production accuracy. The photoresist (light resistance) material is required for photoetching, but the equipment in the prior art has relatively low requirement on the precision of gluing, and the uniformity of the photoresist needs to be achieved through a subsequent photoresist throwing process. In the production process, the gluing thickness of the gluing equipment is not uniform enough, and the phenomenon can cause that the key sizes at different positions have larger difference at the same exposure speed. This difference seriously affects the uniformity of the product size. Especially for high-resolution products, the size of a key part fluctuates, and the refinement degree of the products is seriously reduced.
Disclosure of Invention
The invention aims to provide a compensation device, an exposure device and an exposure compensation method, so as to solve the problem of low product size refinement degree caused by non-uniform film thickness of a film layer to be processed.
In one aspect, a compensation device is provided and applied to an exposure machine, and comprises a solution box;
colored solution is injected into the solution box, wherein the colored solution is used for adjusting the transmittance of emergent rays of the exposure machine so as to quantitatively compensate the photosensitive depth of the film layer to be processed.
Furthermore, the compensation device also comprises an outer resin box, wherein the outer resin box comprises at least one slot, and each slot is used for accommodating the solution box filled with the colored solution.
Further, the concentration of the colored solution in the solution boxes in the groove positions is pre-configured, wherein the concentration of the colored solution in each solution box is uniform; the concentration of the colored solution in the solution box in each groove position is respectively determined by the photosensitive depth compensation quantity of the film layer to be processed at the projection position.
Furthermore, at least two contact electrodes are arranged on the outer surface of one side of the solution box, counter electrodes matched with the contact electrodes are arranged on the periphery of the solution box, the contact electrodes and the counter electrodes are communicated with colored solution in the solution box, and the colored solution contains color developing ions; the compensation device further comprises: an electric brush; one end of the brush can be electrically connected with the contact electrode; when quantitative compensation is carried out, the electric brush moves to a target contact electrode, the compensation device controls the voltage difference between the target contact electrode and a counter electrode at the peripheral position of the solution box by adjusting the voltage applied to the electric brush, and the distribution of the color-developing ions in the colored solution is changed, so that the concentration of the colored solution at the target contact electrode is adjusted.
Further, the contact electrode is made of a transparent material; the contact electrodes are distributed in a matrix on the outer surface of one side of the solution box.
In another aspect, there is provided an exposure apparatus including: the exposure machine base station, the exposure machine light outlet and the compensation device;
when the exposure device is used for exposure, the compensation device is positioned between the base station of the exposure machine and the light outlet of the exposure machine and is used for quantitatively compensating the photosensitive depth of the film layer to be processed positioned below the solution box.
In another aspect, an exposure compensation method is further provided, including:
determining a compensation area and the photosensitive depth compensation quantity of the film to be processed at the compensation area according to the film thickness distribution of the film to be processed;
adjusting a compensation device to enable the concentration of the colored solution in the solution box to be matched with the photosensitive depth compensation amount;
and exposing the film layer to be processed by utilizing the compensation device.
Further, before adjusting the compensation device, the method further comprises: preparing a solution box in advance; the step of preparing a solution cartridge further comprises: acquiring the corresponding relation between the concentration of the colored solution and the photosensitive depth compensation amount; and preparing a solution box according to the corresponding relation, wherein the concentration of the colored solution in the solution box corresponds to the photosensitive depth compensation amount.
Further, when the film thickness distribution of the compensation region in the film layer to be processed satisfies the first condition, the step of adjusting the compensation device includes: determining at least one solution box with colored solution with corresponding concentration according to the photosensitive depth compensation amount and the corresponding relation; and arranging the at least one solution box at a corresponding position of the compensation area so as to quantitatively compensate the photosensitive depth of the film layer to be processed in the compensation area.
Further, when the film thickness distribution of the compensation region in the film layer to be processed satisfies a second condition, the adjusting the compensation device includes: moving a brush to a central position of the compensation zone; determining the voltage difference between the contact electrode at the central position and the counter electrode at the peripheral position of the solution box according to the photosensitive depth compensation amount and the corresponding relation; and adjusting the voltage difference between the electric brush and the counter electrode, and controlling the concentration distribution of the colored solution in the solution box to be matched with the photosensitive depth compensation amount of the compensation area according to the voltage difference.
Compared with the prior art, the invention has the following advantages:
the invention provides a compensation device, an exposure device and an exposure compensation method. The thinner the film thickness in the film to be processed is, the higher the concentration of the colored solution at the projection position is, so that the photosensitive depth of the film to be processed is quantitatively compensated, the matching between the exposure and the film thickness of the film to be processed is realized, and the precise structure size is formed on the substrate after exposure.
Drawings
Fig. 1 is a schematic cross-sectional view of a compensation device according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of an exposure apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic perspective view of a compensation device in another exposure apparatus according to an embodiment of the present invention;
FIG. 4 is a schematic cross-sectional view illustrating another exposure apparatus according to an embodiment of the present invention;
FIG. 5 is a schematic perspective view of a solution box and a brush in a compensation device according to an embodiment of the present invention;
FIG. 6 is a flow chart of an exposure method according to an embodiment of the present invention;
FIG. 7 is a flow chart of another exposure method provided by the embodiments of the present invention;
fig. 8 is a flowchart of another exposure method according to an embodiment of the present invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "upper", "lower", "left", "right", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing and simplifying the description, but do not indicate or imply that the machine or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The following detailed description of embodiments of the invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Referring to fig. 1, a schematic cross-sectional structure diagram of a compensation apparatus according to an embodiment of the present invention is shown. The compensation device can be applied to the technical field of photoetching, and can be applied to an exposure machine.
The compensation device 11 provided by the embodiment of the invention comprises a solution box 111. A colored solution is injected into the solution box 111, wherein the colored solution is used for adjusting the transmittance of the emergent light of the exposure machine so as to perform quantitative compensation on the photosensitive depth of the film layer to be processed. The film to be processed is a film made of a photosensitive material, and for example, the film to be processed may be a photoresist layer.
Specifically, when the thickness of the film to be processed is not uniform, if the same exposure amount is used to expose each region of the film to be processed, the exposure of the region with thicker film thickness in the film to be processed is insufficient, or the exposure of the region with thinner film thickness in the film to be processed is excessive, and the larger the deviation between the film thickness at a certain position and the average film thickness is, the larger the photosensitive depth compensation amount is. By means of targeted compensation of all areas of the film to be processed, the influence of poor film thickness uniformity of the film to be processed on the size of a product can be effectively reduced. Because colored solution can shelter from light usually to reduce the transmissivity of light, moreover, the concentration of colored solution is bigger, and is stronger to the effect of sheltering from of light, will make the transmissivity of light when passing this colored solution also lower. Therefore, the transmittance of emergent light of the exposure machine can be effectively adjusted by adjusting the concentration of the colored solution, so that the exposure irradiated on the film layer to be processed is controlled, and the quantitative compensation of the photosensitive depth of the film layer to be processed is realized.
In practical application, because the exposure machine only relates to the irradiation of ultraviolet rays, purple complementary yellow can be selected as the color of the colored solution, and the emergent rays of the exposure machine can be better shielded. For example, the yellow colored solution may be made of Fe3+ solution, or may be iodine solution, which is not limited in the embodiment of the present invention.
In summary, the compensation device 11 provided in the embodiment of the present invention can adjust the transmittance of the light emitted from the exposure machine by adjusting the concentration of the colored solution in the solution box 111, so as to perform quantitative compensation on the photosensitive depth of the film to be processed, and achieve the matching between the exposure amount and the film thickness of the film to be processed, thereby achieving the formation of a precise structure size on the substrate after exposure.
Referring to fig. 2, a schematic cross-sectional structure diagram of an exposure apparatus according to an embodiment of the present invention is shown. Referring to fig. 2, an exposure apparatus provided in an embodiment of the present invention includes: an exposure machine base 12, an exposure machine light outlet 13 and a compensation device 11. The compensation device 11 is located between the exposure machine base 12 and the exposure machine light outlet 13, and includes a resin outer box 112 and a solution box 111. The resin outer box 112 includes an outer box body 1121 and a frame support 1122, wherein the outer box body 1121 is located between the film layer 15 to be processed and the light outlet 13 of the exposure machine, and is used for accommodating the solution box 111, and the frame support 1122 is used for erecting the outer box body 1121 on the exposure machine base 12. The solution box 111 is filled with a colored solution, wherein the colored solution is used for shielding light emitted from the light outlet 13 of the exposure machine, and the concentration of the colored solution is inversely proportional to the film thickness of the film layer 15 to be processed at the projection position.
In order to facilitate understanding of the embodiment of the present invention, the structure of the solution box 111 filled with the colored solution will be briefly described as follows:
the solution box 111 is a main component of the compensation device 11, and can use the colored solution injected into the solution box 111 to shield the light emitted from the light outlet 13 of the exposure machine, and can use the colored solutions with different concentrations to play a shielding effect in different degrees, thereby realizing the adjustment of transmittance.
Specifically, since the surface of the solution is generally flat, the light emitted from the light outlet 13 of the exposure machine is not easily changed when passing through the colored solution inside the solution box 111. Especially for the solution box 111 filled with the colored solution, the fluctuation of the liquid level can be effectively avoided, so that the colored solution in the solution box 111 always keeps a smooth surface, and the adjustment of the transmittance is accurately controlled. Compared with an electrochromic technology, the control mode is simple, the preparation price is low, and the use cost is effectively reduced.
In the actual use process, one or more solution boxes 111 may be provided, and the use mode of the solution box 111 may be flexibly adjusted according to the film thickness distribution of the film layer 15 to be processed. Moreover, because the exposure machine only relates to the irradiation of ultraviolet rays, purple complementary yellow can be selected as the color of the colored solution, so that a better shielding effect is achieved on the rays emitted from the light outlet 13 of the exposure machine. For example, the yellow colored solution may be made of Fe3+The solution may be an iodine solution, but is not limited in the embodiment of the present invention. Specifically, if the difference between the film thickness of the film layer 15 to be processed in the X region and the average film thickness of the film layer 15 to be processed is larger than the threshold film thickness, the yellow solution having the corresponding concentration may be used to block a portion of the violet emitted during exposure at the position according to the degree of the film thickness deviationAnd external light to avoid over exposure of the film 15 to be treated at the position.
In summary, in the exposure apparatus provided in the embodiment of the present invention, the compensation apparatus 11 between the exposure machine base 12 and the exposure machine light outlet 13 can be used to adjust the colored solutions with different concentrations to block the light emitted from the exposure machine. The thinner the film thickness in the film layer 15 to be processed is, the higher the concentration of the colored solution at the projection position is, so that the influence of the same exposure on the position with the weak film thickness in the film layer 15 to be processed is reduced, the matching between the exposure and the film thickness of the film layer 15 to be processed of the substrate 14 is realized, and the uniform structural size is formed on the substrate after exposure. And the liquid level in the solution box 111 is flat, so that the refinement degree of the structure size on the substrate 14 can be effectively improved.
On the basis of the exposure apparatus provided in the previous embodiment, referring to fig. 3, a schematic perspective view of a compensation apparatus 21 in another exposure apparatus provided in the embodiment of the present invention is shown, in the compensation apparatus 21, an outer cartridge body 2121 includes at least one slot 21211, and each slot 21211 is used for accommodating a solution cartridge 211 filled with a colored solution. The concentration of the colored solution in the solution cassettes 211 in each slot 21211 is preset, and the concentration of the colored solution in each solution cassette 211 is uniform.
When the solution box 211 with a colored solution having a certain concentration is required to block the light emitted from the exposure machine, the solution box 211 with the colored solution having the concentration can be directly inserted into the corresponding slot 21211. The solution cassette 211 having the colored solution of the concentration may be selected from a plurality of solution cassettes 211. The plurality of solution boxes 211 are filled with colored solutions with different concentrations in advance, and the concentration of the colored solution in each solution box 211 can be linearly distributed, so that different use requirements are met. For example, 5 colored solutions having concentrations of 80% X, 90% X, 100% X, 110% X, and 120% X may be poured in advance into the A, B, C, D, E solution boxes 211, respectively, and when it is necessary to use a solution box 211 having a colored solution having a concentration of 90% X, the solution box 211B having a colored solution having that concentration may be directly inserted into the corresponding slot 21211. In practical applications, the same concentration of the colored solution may be injected into a plurality of solution cartridges 211 in advance for use. When it is necessary to use the solution cassette 211 having a colored solution of a certain concentration, the colored solution of the concentration prepared in advance may be injected into the solution cassette 211.
Specifically, the concentration of the colored solution in the solution tank 211 in each slot 21211 is determined by the photosensitive depth compensation amount of the film 15 to be processed at the projection position. If the film thickness of the film 15 to be processed at a certain position is thinner than the average film thickness, that is, the photosensitive depth compensation amount is larger, the colored solution with the corresponding concentration is required to shield the light emitted from the exposure machine, so as to avoid the deviation of the structure size formed on the substrate after the exposure due to overexposure at the position. In practical applications, the corresponding relationship between the concentration change of the colored solution and the corresponding film thickness change of the film 15 to be processed may be obtained in advance through experiments, for example, the corresponding relationship is shown in the form of a relationship curve, and the concentration of the colored solution in the solution box 211 in the corresponding slot 21211 is determined according to the corresponding relationship and the photosensitive depth compensation amount of the film 15 to be processed at the projection position. For example, if the film thickness of the film 15 to be processed in the M, N, P, Q four areas is relatively thin, the solution box 211 with the corresponding concentration of the colored solution needs to block the light. The M region and the N region need to be blocked by a solution cartridge 211 having a 110% X concentration colored solution, the P region and the Q region need to be blocked by a solution cartridge 211 having a 120% X concentration colored solution, the M region and the N region each need to have 2 solution cartridges 211 inserted into a slot 21211 at a projection position to block the region, and the P region and the Q region each need to have 1 solution cartridge 211 inserted into a slot 21211 at a projection position to block the region. It is possible to insert 4 solution cartridges 211 having a 110% X concentration colored solution into the slots 21211 at the M-region and N-region projection positions, respectively, and 2 solution cartridges 211 having a 120% X concentration colored solution into the slots 21211 at the P-region and Q-region projection positions, respectively, thereby correspondingly reducing the exposure amount to the film layer 15 to be processed in these regions and further ensuring the uniformity of the structure size on the substrate after exposure. Therefore, although the film thickness distribution of the film 15 to be processed coated on the substrate 14 is different, the film 15 to be processed with different film thicknesses in different areas can be shielded by only replacing the solution box 211 and inserting the solution box 211 with the colored solution with different concentrations into the corresponding slot 21211.
In summary, in the compensating device 21 according to the embodiment of the invention, the outer box body 2121 includes at least one slot 21211, and each slot 21211 is used for accommodating the solution box 211 filled with the colored solution. Can realize sheltering from the membrane layer 15 to be processed of different membrane thicknesses of different regions through combining a plurality of solution boxes 211 of annotating the coloured solution that have different concentrations, and then realize the matching nature that the exposure and basement 14 membrane layer 15 to be processed are thick. When the areas needing to be shielded are different, the solution box 211 only needs to be replaced to effectively shield the solution box in a targeted mode, and the operation is very simple and convenient.
On the basis of the exposure apparatus provided in the previous embodiment, referring to fig. 4, a schematic cross-sectional structure diagram of another exposure apparatus provided in the embodiment of the present invention is shown, and referring to fig. 5, a schematic three-dimensional structure diagram of a solution box 311 and a brush 313 in another compensation apparatus provided in the embodiment of the present invention is shown. The compensation device further comprises a brush 313, one end of the brush 313 can be electrically connected with a corresponding number of the at least two contact electrodes 3111, and the other end of the brush 313 can move synchronously with the light outlet 13 of the exposure machine. Therefore, the electric brush 313 can move synchronously with the exposure machine light outlet 13, and can be accurately positioned to the position needing exposure. And the contact electrode 3111 at the projection position can be accurately energized by the brush 313, so that a stable concentration gradient ring is formed centering on the position.
Specifically, in the compensation device 31, at least two contact electrodes 3111 are disposed on an outer surface of one side of the solution tank 311, a counter electrode matched with the contact electrodes 3111 is disposed on the periphery of the solution tank 311, and one ends of the at least two contact electrodes 3111 and the counter electrode are both communicated with the colored solution. The contact electrode 3111 may be made of a transparent material such as Indium Tin Oxide (ITO), and the plurality of contact electrodes 3111 may be distributed in a matrix on an outer surface of the solution tank 311.
In practical application, the colored solution contains the color development ions,for example, the chromogenic ion in the colored solution may be Fe3+To give a yellow color to the solution. The color-developing ions can move in the solution box 311 under the action of voltage, so that the concentration distribution of the color-developing ions in the solution box 311 changes, and the adjusting effect of each area in the solution box 311 on the light transmittance is further changed. For example, if the difference between the average film thickness of the film layer 15 to be processed and the film thickness at the compensation region is greater than the threshold film thickness, that is, the film thickness of the film layer 15 to be processed at the compensation region is less than the average film thickness, the compensation region can be compensated by adjusting the concentration of the colored solution at each region in the solution box 311, that is, the concentration at the position is controlled to increase by adjusting the voltage, so as to achieve a better light shielding effect, wherein the compensation region is a region of the film layer 15 to be processed where the difference between the film thickness and the average film thickness is greater than the threshold film thickness. In practical applications, the region where the film thickness of the film 15 to be processed is greater than the average film thickness or less than the average film thickness can be used as the compensation region.
When the photoresist is coated by adopting the spin coating process, the film layer 15 to be processed in the coating starting region is often relatively thick, and the chromogenic ions in the region can be electrified to be controlled to move to the periphery of the solution box 311, so that the concentration of the chromogenic ions in the region is reduced, the exposure amount at the position is relatively increased, and the film thickness of the film layer 15 to be processed in the region and the surrounding film thickness tend to be uniform. The priming area refers to an area where the photoresist drops on the substrate when the film layer 15 to be treated is coated. Specifically, when performing quantitative compensation, the light outlet 13 of the exposure machine can drive the electric brush 313 to move to the center of the compensation region in the film 15 to be processed, and the current can be conducted to the contact electrode 3111 at the center through the electric brush 313, and then conducted to the colored solution communicated with the contact electrode 3111. The voltage difference between the contact electrode 3111 at the central position and the counter electrode at the peripheral position of the solution cartridge 311 can be used to change the distribution of the colored ions in the colored solution to adjust the concentration of the colored solution at the compensation zone. For example, if the contact electrode 3111 at the center position is charged with positive charges and the counter electrode at the peripheral position is charged with negative charges, the color-developing ion is Fe3+. Then the central region Fe3+Will be at a position around 311 of the solution boxMove so as to make Fe at the central position3+The concentration is decreased, thereby functioning to increase the transmittance at the center position of the solution cartridge 311.
In summary, in the compensation apparatus 31 provided in the embodiment of the present invention, the solution box 311 is provided with at least two contact electrodes 3111 at a side close to the light outlet 13 of the exposure machine, one end of the at least two contact electrodes 3111 is communicated with the colored solution, and the other end is communicated with the outside of the solution box 311, so that the charges conducted on the brushes 313 can be introduced into the colored solution through the contact electrodes 3111, a voltage difference can be formed by matching with the opposite charges conducted on the counter electrodes at the peripheral position of the solution box 311, and the distribution of the colored ions in the colored solution is changed by using the voltage difference, thereby achieving the effect of adjusting the concentration of the colored solution at the compensation region. Thereby functioning to adjust the transmittance at the center position of the solution tank 311. Since a concentration gradient circular ring centered on a point can be generated in the solution tank 311 by the voltage difference, a circular compensation region can be accurately compensated.
The embodiment of the invention also provides an exposure method. The exposure method can be applied to the exposure apparatus described above. Referring to fig. 6, a flowchart of an exposure method according to an embodiment of the present invention is shown.
After the film thickness distribution of the film to be processed is obtained through the film thickness testing equipment, the film thickness of each region of the film to be processed can be compared with the average film thickness of the film to be processed, the deviation between the film thickness of each region of the film to be processed and the average film thickness of the film to be processed is determined, and then the photosensitive depth compensation quantity of the film to be processed at the compensation region is determined, wherein the region with the deviation larger than the threshold film thickness can be determined as the compensation region. In practical application, the compensation region can be expanded according to the film thickness of the adjacent position of the compensation region, so as to realize more accurate compensation. In addition, when comparing the film thickness of each region of the film layer to be processed with the average film thickness of the film layer to be processed, the average film thickness in each region may be used for comparison with the average film thickness of the entire film layer to be processed, or the film thickness at the boundary position of each region may be used for comparison with the average film thickness of the entire film layer to be processed.
Specifically, the colored solutions with different concentrations have different shielding effects on the light emitted from the light outlet of the exposure machine. The greater the concentration of the colored solution, the lower the transmittance of light, and the smaller the exposure amount irradiated to the film layer to be processed at the projection position. Conversely, the smaller the concentration of the colored solution, the higher the transmittance of light, and the greater the exposure amount of the film to be processed irradiated at the projection position. Therefore, before the film to be processed is exposed by the compensation device, the compensation device at the projection position of the compensation area needs to be adjusted according to the film thickness distribution of the film to be processed, so as to control the concentration of the colored solution in the solution box to be matched with the film thickness distribution of the film to be processed in the compensation area. For example, when the film thickness of the film to be processed is thinner at a certain position, the concentration of the colored solution in the solution box at the projection position of the position can be correspondingly increased, so that the exposure quantity irradiated on the film to be processed at the position is reduced, the matching between the exposure quantity and the film thickness of the film to be processed is realized, and the uniform structural size is formed on the substrate after exposure. After the adjustment of the concentration of the colored solution in the solution box at the projection position is completed according to the film thickness of the film to be processed coated on the substrate, the film to be processed can be compensated in a targeted manner by using the compensation device comprising the solution box. For example, a solution box with a colored solution with a specific concentration can be inserted into the corresponding slot, or the solution box is electrified, so that the concentration of the colored solution in the solution box is changed and stabilized, and the adjustment of the compensation device is realized.
After the compensation device is adjusted in the compensation area, the concentration of colored solution in a solution box in the compensation device can realize effective adjustment of light emitted from a light outlet of an exposure machine, the film to be processed is exposed by using the compensation device, and the excessive exposure of the position with the thinner film thickness of the film to be processed coated on the substrate under the irradiation of the same exposure can be effectively avoided, so that the uniform structural size is formed on the substrate after the exposure.
In summary, in the exposure method provided by the embodiment of the present invention, the compensation area is determined according to the film thickness distribution of the film to be processed, and the compensation device is adjusted in the compensation area, so that the concentration of the colored solution in the solution box at the projection position of the compensation area is matched with the film thickness of the film to be processed in the compensation area, and then the compensation device is used to expose the film to be processed, thereby effectively avoiding overexposure at a position where the film thickness of the film to be processed coated on the substrate is thinner under the irradiation of the same exposure amount, and thus ensuring that a uniform structural size is formed on the substrate after exposure.
The embodiment of the invention also provides another exposure method. Referring to fig. 7, a flowchart of another exposure method provided by the embodiment of the invention is shown.
The degree of the change of the concentration of the colored solution in the solution box is different, and the influence on the exposure quantity irradiated to the film layer to be treated is also different. In order to accurately adjust the transmittance of each position of the solution box and control the change of the film thickness of the film to be processed after exposure and development, the corresponding relationship between the concentration of the colored solution and the photosensitive depth compensation amount can be determined in advance through experiments, so as to clearly determine which concentration of the colored solution is needed to be shielded when different photosensitive depth compensation amounts are needed.
Specifically, the original film thickness of the film to be processed may be measured, for example, the film thickness of the film to be processed may be measured by using K-MAC. And exposing after covering the solution cartridges having different concentrations of the colored solution at different positions of the film to be treated, for example, covering the solution cartridge having a first concentration of the colored solution at a first position, and exposing the film to be treated after covering the solution cartridge having a second concentration of the colored solution at a second position. And measuring the film thickness change of each position of the film layer to be processed after the development, thereby obtaining the corresponding relation between the concentration change of the colored solution and the photosensitive depth change of the corresponding film layer to be processed, and further determining the corresponding relation between the concentration of the colored solution and the photosensitive depth compensation quantity. In practical applications, in order to facilitate the control of the critical dimension, the corresponding relationship between the critical dimension and the concentration of the colored solution can be prepared in advance.
And step 702, determining at least one solution box with colored solution with corresponding concentration according to the photosensitive depth compensation amount of the film layer to be processed at the compensation area and the corresponding relation.
When the film thickness distribution of the compensation region in the film layer to be processed meets the first condition, that is, the compensation region can be divided into at least one sub-region, wherein when the film thickness of the film layer to be processed of each sub-region is uniform, the solution box of which concentration of the colored solution is required to be arranged at the projection position of each sub-region in the compensation region is determined to shield according to the film thickness of the film layer to be processed of each sub-region in the compensation region and the corresponding relation, so that accurate compensation of the compensation region is realized. The compensation area refers to an area where the difference between the film thickness of the film to be processed and the average film thickness is larger than a threshold film thickness.
And 703, arranging at least one solution box at a corresponding position of the compensation area so as to quantitatively compensate the photosensitive depth of the film layer to be processed in the compensation area.
In practical applications, if the compensation region includes at least one sub-region having a similar shape, at least one solution cassette may be inserted into the compensation device at a projection position corresponding to each sub-region of the film layer to be processed, respectively, according to the shape and size of the compensation region, so as to shield each corresponding sub-region. For example, for a linear poor glue application, i.e. for a rectangular compensation area, a rectangular solution box combination can be used to synthesize the corresponding size for shading. That is, after determining at least one rectangular solution box having a colored solution with a corresponding concentration, the at least one rectangular solution box may be inserted into a rectangular slot at a corresponding position in the compensation device to be spliced into a shape and a size corresponding to the compensation area, so as to shield the compensation area.
After the compensation device is adjusted, the concentration of the colored solution in the solution box in the compensation device can realize effective control of light emitted from the light outlet of the exposure machine, the film to be processed is exposed by the compensation device, and the excessive exposure of the position with the thinner film thickness of the film to be processed coated on the substrate under the irradiation of the same exposure can be effectively avoided, so that the uniform structural size is formed on the substrate after the exposure.
In summary, in the exposure method provided by the embodiment of the present invention, the corresponding relationship between the concentration of the colored solution and the photosensitive depth compensation amount is obtained, and according to the photosensitive depth compensation amount of the film to be processed at the compensation region and the corresponding relationship, at least one solution box having the colored solution with the corresponding concentration is determined, and then the at least one solution box is disposed at the corresponding position of the compensation region, so as to perform quantitative compensation on the photosensitive depth of the film to be processed at the compensation region. Thereby through making up a plurality of solution boxes that have the coloured solution of different concentrations of notes, realize sheltering from the pending rete of different membrane thickness in different regions, and then realize the matching nature of exposure and the pending rete membrane thickness. When the areas needing to be shielded are different, the solution boxes only need to be replaced, targeted effective shielding can be carried out, and the operation is very simple and convenient.
The embodiment of the invention also provides another exposure method. Referring to fig. 8, a flowchart of another exposure method provided by the embodiment of the invention is shown.
Specifically, the corresponding relationship between the concentration change of the colored solution and the corresponding film thickness change of the film to be processed can be determined in advance through experiments, so as to accurately describe the influence of the concentration change of the colored solution on the film thickness change of the film to be processed after exposure and development.
In practical application, when the film thickness distribution of the compensation region in the film layer to be processed satisfies the second condition, that is, the film thickness of the film layer to be processed in the compensation region increases in a gradient manner or decreases in a gradient manner, the central position of the compensation region can be determined according to the shape of the compensation region, and the concentration distribution of the colored solution in the solution box is changed by taking the central position as a dot. For example, when the film layer to be processed coated on the substrate has circular poor gluing, that is, when the compensation area is circular, the electric brush connected with the light outlet of the exposure machine can be moved to the center of the compensation area, so that the concentration distribution of the colored solution in the solution box is changed by taking the center of the circle as a dot.
After the central position of the compensation area is determined and the electric brush connected with the light outlet of the exposure machine is moved to the central position, the voltage difference between the contact electrode at the central position and the counter electrode at the peripheral position of the solution box can be determined according to the film thickness of the film layer to be processed at the compensation area and the corresponding relation.
Specifically, when the light outlet of the exposure machine drives the electric brush to move to the central position of the compensation area in the film layer to be processed, the current can be conducted to the contact electrode at the central position through the electric brush, and then conducted to the colored solution communicated with the contact electrode. The voltage difference between the contact electrode at the central location and the counter electrode at the peripheral location of the solution cartridge can be used to change the distribution of the colored ions in the colored solution to adjust the concentration of the colored solution at the compensation zone. For example, if the contact electrode at the center is positively charged and the counter electrode at the peripheral position is negatively charged, the color-developing ion is Fe3 +. The central region Fe3+ will move towards the peripheral position of the cartridge, thereby decreasing the concentration of Fe3+ at the central position and thus acting to increase the transmittance at the central position of the cartridge.
And step 804, adjusting the voltage difference between the electric brush and the counter electrode, and controlling the concentration distribution of the colored solution in the solution box to be matched with the photosensitive depth compensation amount of the compensation area according to the voltage difference.
In the process of adjusting the concentration distribution of the colored solution through the voltage difference, the concentration change of the colored solution in the solution box can be adjusted by controlling the voltage between the contact electrode at the central position and the counter electrode at the peripheral position of the solution box, so that the concentration distribution of the colored solution is stabilized to the extent that the exposure amount penetrating through the compensation device is matched with the film thickness of the film to be processed. To achieve accurate compensation of the compensation zone.
After the compensation device is adjusted, the concentration of the colored solution in the solution box in the compensation device can realize effective control of light emitted from the light outlet of the exposure machine, the film to be processed is exposed by the compensation device, and the excessive exposure of the position with the thinner film thickness of the film to be processed coated on the substrate under the irradiation of the same exposure can be effectively avoided, so that the uniform structural size is formed on the substrate after the exposure.
In summary, in the exposure method provided in the embodiment of the present invention, the corresponding relationship between the concentration of the colored solution and the photosensitive depth compensation amount is obtained, and according to the photosensitive depth compensation amount of the film layer to be processed at the compensation region and the corresponding relationship, the voltage difference between the contact electrode at the central position and the counter electrode at the peripheral position of the solution box is determined, and then the voltage differences on the brush and the counter electrode are adjusted, and the concentration distribution of the colored solution in the solution box is controlled to match the photosensitive depth compensation amount of the compensation region according to the voltage difference. Therefore, the voltage difference can be utilized to change the distribution of the color-developing ions in the colored solution, and the effect of adjusting the concentration of the colored solution at the compensation area is achieved. Thereby playing a role in adjusting the transmittance of the solution box at the projection position of the compensation area. Because a concentration gradient circular ring centered on a point can be generated in the solution cartridge under the effect of the voltage difference, a circular compensation region can be accurately compensated.
The embodiments in the present specification are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.
The exposure apparatus and the exposure method provided by the present invention are described in detail above, and the principle and the embodiment of the present invention are explained in the present document by applying specific examples, and the description of the above examples is only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. A compensation device is applied to an exposure machine and is characterized in that,
the compensation device comprises a plurality of solution cartridges;
colored solution is injected into the solution box, wherein the colored solution is used for adjusting the transmittance of emergent light of the exposure machine so as to quantitatively compensate the photosensitive depth of the film layer to be processed;
the concentration of the colored solution in the solution boxes is pre-configured, wherein the concentration of the colored solution in each solution box is uniform;
the concentration of the colored solution in the solution box is respectively determined by the photosensitive depth compensation quantity of the film layer to be processed at the projection position.
2. Compensation apparatus according to claim 1,
the compensation device further comprises an outer resin box, wherein the outer resin box comprises at least one slot, and each slot is used for accommodating the solution box filled with the colored solution.
3. A compensation device is applied to an exposure machine and is characterized in that,
the compensation device comprises a solution box;
colored solution is injected into the solution box, wherein the colored solution is used for adjusting the transmittance of emergent light of the exposure machine so as to quantitatively compensate the photosensitive depth of the film layer to be processed; the outer surface of one side of the solution box is provided with at least two contact electrodes, the periphery of the solution box is provided with a counter electrode matched with the contact electrodes, the contact electrodes and the counter electrode are both communicated with colored solution in the solution box, and the colored solution contains colored ions;
the compensation device further comprises: an electric brush; one end of the brush can be electrically connected with the contact electrode;
when quantitative compensation is carried out, the electric brush moves to a target contact electrode, the compensation device controls the voltage difference between the target contact electrode and a counter electrode at the peripheral position of the solution box by adjusting the voltage applied to the electric brush, and the distribution of the color-developing ions in the colored solution is changed, so that the concentration of the colored solution at the target contact electrode is adjusted.
4. Compensation apparatus according to claim 3,
the contact electrode is made of a transparent material;
the contact electrodes are distributed in a matrix on the outer surface of one side of the solution box.
5. An exposure apparatus comprising an exposure machine base and an exposure machine light outlet, characterized in that the exposure apparatus further comprises a compensation apparatus according to any one of claims 1 to 2;
when the exposure device is used for exposure, the compensation device is positioned between the base station of the exposure machine and the light outlet of the exposure machine and is used for quantitatively compensating the photosensitive depth of the film layer to be processed positioned below the solution box.
6. An exposure apparatus comprising an exposure machine base and an exposure machine light outlet, characterized in that the exposure apparatus further comprises a compensation apparatus according to any one of claims 3 to 4;
when the exposure device is used for exposure, the compensation device is positioned between the base station of the exposure machine and the light outlet of the exposure machine and is used for quantitatively compensating the photosensitive depth of the film layer to be processed positioned below the solution box.
7. An exposure compensation method applied to the exposure apparatus according to claim 5 or 6, comprising:
determining a compensation area and the photosensitive depth compensation quantity of the film to be processed at the compensation area according to the film thickness distribution of the film to be processed;
adjusting a compensation device to enable the concentration of the colored solution in the solution box to be matched with the photosensitive depth compensation amount;
and exposing the film layer to be processed by utilizing the compensation device.
8. The method of claim 7, further comprising, prior to adjusting the compensating block: preparing a solution box in advance;
the step of preparing a solution cartridge further comprises:
acquiring the corresponding relation between the concentration of the colored solution and the photosensitive depth compensation amount;
and preparing a solution box according to the corresponding relation, wherein the concentration of the colored solution in the solution box corresponds to the photosensitive depth compensation amount.
9. The method according to claim 8, applied to the exposure apparatus according to claim 5, wherein when the film thickness distribution of the compensation region in the film layer to be processed satisfies the first condition, the step of adjusting the compensation apparatus comprises:
determining at least one solution box with colored solution with corresponding concentration according to the photosensitive depth compensation amount and the corresponding relation;
and arranging the at least one solution box at a corresponding position of the compensation area so as to quantitatively compensate the photosensitive depth of the film layer to be processed in the compensation area.
10. The method according to claim 8, applied to the exposure apparatus according to claim 6, wherein when the film thickness distribution of the compensation region in the film layer to be processed satisfies the second condition, the step of adjusting the compensation apparatus comprises:
moving a brush to a central position of the compensation zone;
determining the voltage difference between the contact electrode at the central position and the counter electrode at the peripheral position of the solution box according to the photosensitive depth compensation amount and the corresponding relation;
and adjusting the voltage difference between the electric brush and the counter electrode, and controlling the concentration distribution of the colored solution in the solution box to be matched with the photosensitive depth compensation amount of the compensation area according to the voltage difference.
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