CN107132604B - Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter - Google Patents

Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter Download PDF

Info

Publication number
CN107132604B
CN107132604B CN201710498955.8A CN201710498955A CN107132604B CN 107132604 B CN107132604 B CN 107132604B CN 201710498955 A CN201710498955 A CN 201710498955A CN 107132604 B CN107132604 B CN 107132604B
Authority
CN
China
Prior art keywords
film
film layer
refractive index
sub
index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710498955.8A
Other languages
Chinese (zh)
Other versions
CN107132604A (en
Inventor
卫耀伟
刘浩
蔡清元
王震
潘峰
张哲�
刘志超
吴倩
罗晋
欧阳升
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Laser Fusion Research Center China Academy of Engineering Physics
Original Assignee
Laser Fusion Research Center China Academy of Engineering Physics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laser Fusion Research Center China Academy of Engineering Physics filed Critical Laser Fusion Research Center China Academy of Engineering Physics
Priority to CN201710498955.8A priority Critical patent/CN107132604B/en
Publication of CN107132604A publication Critical patent/CN107132604A/en
Application granted granted Critical
Publication of CN107132604B publication Critical patent/CN107132604B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/289—Rugate filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention provides a gradient refractive index film preparation parameter obtaining method, a preparation method and an optical filter, and belongs to the technical field of film preparation processes. The preparation parameter obtaining method comprises the following steps: obtaining preparation data of a graded-index film to be prepared, wherein the preparation data comprises the refractive index and the film thickness of each film layer of the graded-index film; acquiring a reference corresponding relation, wherein the reference corresponding relation is the relation between the refractive index of the mixed film layer and the film layer concentration; and obtaining the preparation parameters of the graded-index film according to the reference corresponding relation and the preparation data. The method is beneficial to accurately obtaining the preparation parameters of the film with the gradually-changing refractive index to be prepared, so that the film with the gradually-changing refractive index and the optical filter with the performance more meeting the requirements are prepared.

Description

Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter
Technical Field
The invention relates to the technical field of thin film preparation processes, in particular to a graded-index thin film preparation parameter obtaining method, a preparation method and an optical filter.
Background
Rugate (Rugate) filters, which refer to structures with regular periodic variations in refractive index, can achieve special optical properties, such as having the property of reflecting only a narrow band of the spectral region, while transmitting all other bands. The property is similar to that of 1/4 wave stacks, and the high-order secondary reflection band of 1/4 wave stacks is not existed, so that the method is particularly suitable for removing bright spectral lines, such as laser spectral lines, in weak continuous spectral background, and therefore has important application in the fields such as laser protection.
However, the core technology of the graded index film is still mastered abroad and cannot be known, so that a method for preparing the graded index film is urgently needed to break through the monopoly.
Disclosure of Invention
In view of this, the present invention provides a method for obtaining a graded index film preparation parameter, a method for preparing the graded index film, and an optical filter, so as to realize the preparation of the graded index film.
In order to achieve the above purpose, the embodiment of the present invention adopts the following technical solutions:
in a first aspect, an embodiment of the present invention provides a method for obtaining preparation parameters of a graded-index thin film, where the method includes: obtaining preparation data of a graded-index film to be prepared, wherein the preparation data comprises the refractive index and the film thickness of each film layer of the graded-index film; obtaining a reference corresponding relation, wherein the reference corresponding relation is a relation between a refractive index of a mixed film and film concentration, the mixed film comprises a first sub-film and a second sub-film, a first refractive index of a first film material corresponding to the first sub-film is greater than a second refractive index of a second film material corresponding to the second sub-film, and the film concentration is the film concentration of the first sub-film or the film concentration of the second sub-film in the mixed film; and obtaining the preparation parameters of the graded-index film according to the reference corresponding relation and the preparation data.
In a second aspect, an embodiment of the present invention further provides a method for preparing a graded-index thin film, where the method includes: according to the preparation parameters obtained by the preparation parameter obtaining method of the gradient refractive index thin film through the atomic layer deposition technology, a precursor corresponding to a first film layer material and a precursor corresponding to a second film layer material are used as raw materials, and a plurality of film layers are sequentially deposited on a preset substrate to obtain the gradient refractive index thin film, wherein each film layer corresponds to one refractive index.
In a third aspect, an embodiment of the present invention further provides an optical filter, including a substrate and the graded-index film prepared according to the above preparation method, where the graded-index film is attached to the substrate.
Compared with the prior art, the method for obtaining the preparation parameters of the graded-index film provided by the embodiment of the invention obtains the preparation parameters of the graded-index film by obtaining the preparation data and the reference corresponding relation of the graded-index film to be prepared and then obtaining the preparation parameters of the graded-index film according to the obtained preparation data and the reference corresponding relation. The method is beneficial to accurately obtaining the preparation parameters of the graded index film to be prepared, so that the graded index film and the optical filter with the performance more meeting the requirements are prepared.
In order to make the aforementioned and other objects, features and advantages of the present invention comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a block diagram of an electronic device according to an embodiment of the present invention;
FIG. 2 is a flowchart illustrating a method for obtaining parameters of a graded-index film according to a first embodiment of the present invention;
FIG. 3 is a schematic diagram showing the refractive index profile of a graded index film according to a first embodiment of the present invention during one production cycle;
FIG. 4 is a graph showing a comparison of refractive index profiles of a hybrid film layer provided by a first embodiment of the present invention;
FIG. 5 is a flowchart illustrating a step S130 in a method for obtaining parameters of manufacturing a graded-index thin film according to a first embodiment of the present invention;
FIG. 6 is a block diagram of the program modules of an apparatus for obtaining parameters of graded-index thin film formation according to a second embodiment of the present invention;
fig. 7 is a schematic diagram showing a transmission spectrum of a Rugate film prepared by a graded-index film preparation method provided by a third embodiment of the present invention.
Detailed Description
Fig. 1 is a block diagram of an electronic device 100 according to a preferred embodiment of the invention. The electronic device 100 includes a graded index film preparation parameter acquiring apparatus 200, a memory 101, a memory controller 102, a processor 103, a peripheral interface 104, and an input/output unit 105.
The memory 101, the memory controller 102, the processor 103, the peripheral interface 104, and the input/output unit 105 are electrically connected to each other directly or indirectly to implement data transmission or interaction. For example, the components may be electrically connected to each other via one or more communication buses or signal lines. The preparation parameter acquiring device 200 includes at least one software functional module which can be stored in the memory 101 in the form of software or firmware (firmware). The processor 103 is configured to execute an executable module stored in the memory 101, for example, a software functional module or a computer program included in the preparation parameter acquiring device 200.
The Memory 101 may be, but is not limited to, a Random Access Memory (RAM), a Read Only Memory (ROM), a Programmable Read-Only Memory (PROM), an Erasable Read-Only Memory (EPROM), an electrically Erasable Read-Only Memory (EEPROM), and the like. The memory 101 is configured to store a program, and the processor 103 executes the program after receiving an execution instruction, and the method executed by the electronic device 100 defined by the flow disclosed in the following embodiments of the present invention may be applied to the processor 103, or implemented by the processor 103.
The processor 103 may be an integrated circuit chip having signal processing capabilities. The Processor 103 may be a general-purpose Processor, and includes a Central Processing Unit (CPU), a Network Processor (NP), and the like; but may also be a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), an off-the-shelf programmable gate array (FPGA) or other programmable logic device, discrete gate or transistor logic, discrete hardware components. The various methods, steps and logic blocks disclosed in the embodiments of the present invention may be implemented or performed. A general purpose processor may be a microprocessor or the processor 103 may be any conventional processor or the like.
The peripheral interface 104 couples various input/output devices to the processor 103 as well as to the memory 101. In some embodiments, the peripheral interface 104, the processor 103, and the memory controller 102 may be implemented in a single chip. In other examples, they may be implemented separately from the individual chips.
The input and output unit 105 is used for providing input data to the user to realize the interaction of the user with the electronic device 100. The input/output unit 105 may be, but is not limited to, a mouse, a keyboard, and the like.
It will be appreciated that the configuration shown in FIG. 1 is merely illustrative and that electronic device 100 may include more or fewer components than shown in FIG. 1 or have a different configuration than shown in FIG. 1. The components shown in fig. 1 may be implemented in hardware, software, or a combination thereof. In this embodiment, the electronic device 100 may be a coating device, such as an atomic layer deposition coating device, or a computer. When the electronic device 100 is a film coating device, the electronic device includes other film coating control and execution components besides the components shown in fig. 1, which are not described in detail herein.
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
First embodiment
Fig. 2 shows a method for obtaining parameters of manufacturing a graded-index thin film according to a first embodiment of the present invention. The graded index film is a film with refractive index continuously changing along the normal direction of the surface of the film layer and the refractive index keeping unchanged in the direction parallel to the film surface. The Rugate film is one of graded index films, and refers to a film in which a refractive index layer periodically changes as the thickness of the film layer increases. Special optical properties can be achieved by periodic variation of the refractive index, e.g. having the property of reflecting only a narrow spectral region, while transmitting other wavelength bands. The following embodiment will mainly take Rugate film as an example to describe in detail the method for obtaining the preparation parameters of the graded index film provided by the embodiment of the present invention. Referring to fig. 2, the method includes: step S110, step S120, and step S130.
Step S110, obtaining preparation data of the graded-index film to be prepared, wherein the preparation data comprises the refractive index and the film thickness of each film layer of the graded-index film.
In this embodiment, the specific distribution of the refractive index of the graded-index film to be prepared may be designed as required. For example, the refractive index profile can be tailored to the specific spectral performance requirements of the film.
It should be noted that the theoretical Rugate film refers to a structure with a regular periodic refractive index variation, such as sine or cosine variation. In practical design, a discontinuous thin film structure with a stepwise change of refractive index is usually used instead of a film structure with a continuous change of refractive index, so that the high-order sub-reflection band can be suppressed. Therefore, in this embodiment, the graded-index film to be prepared may have a periodic structure in which the refractive index changes stepwise. For example, in a specific application scenario, in order to prepare a Rugate film with a center wavelength of 532nm, the refractive index profile of one preparation period of the graded-index film to be prepared can be as shown in fig. 3.
In this embodiment, the manner of obtaining the preparation data of the graded-index film to be prepared may be: the electronic equipment stores the preparation data of the graded index film to be prepared in advance, and the preparation data is acquired through a preset storage path. The pre-stored preparation data may be preparation data previously input by a user and stored in a preset path. Alternatively, the pre-stored preparation data may also be preparation data of the graded index film to be prepared, which is derived from other third-party application software in the electronic device and stored at the preset path, for example, a user sets a required spectral characteristic curve in the third-party application software, and the third-party application software derives the preparation data of the graded index film to be prepared through the spectral characteristic curve and stores the preparation data at the preset path.
It should be noted that, since the Rugate thin film has a plurality of refractive index periods, and the refractive index distribution of each period is consistent, the refractive index and the film thickness of each film corresponding to each preparation period when the thin film is prepared can be obtained only by obtaining the refractive index distribution of one period of the Rugate thin film to be prepared. The Rugate film to be prepared corresponds to a plurality of preparation cycles, each preparation cycle corresponding to a plurality of film layers. In this embodiment, the acquired preparation data includes the refractive index and the film thickness of each film corresponding to one preparation period. Of course, for other graded index films where the refractive index does not vary periodically, the production data includes the refractive index and film thickness of each film layer of the film to be produced.
For example, for the refractive index profile of a Rugate film of one period as shown in fig. 3, each step on the profile corresponds to one film layer in the period, and the lateral distance of each step corresponds to the film layer thickness of the film layer. The ordinate in fig. 3 represents the refractive index of each film layer in the period; the abscissa is a distance in nanometers (nm), and represents a distance between each film layer and the substrate surface along the normal direction of the film layer, with the substrate surface as a zero coordinate point. As shown in fig. 3, for the first step, i.e. the first film layer of the period, the abscissa is 0 and 424nm, respectively, so that the thickness of the film layer is 424nm, which corresponds to the ordinate being 1.46, so that the refractive index of the film layer is 1.46; for the second step, the second film of the cycle, the beginning and end abscissas are 424nm and 494nm, respectively, and thus the thickness of the film is 70nm, corresponding to an ordinate of 1.54, and thus the refractive index of the film is 1.54.
Step S120, obtaining a reference corresponding relation, wherein the reference corresponding relation is the relation between the refractive index of the mixed film layer and the film layer concentration.
Since it is difficult to find a film material having a refractive index satisfying the requirement in actual production, a mixed film having a refractive index between ρ 1 and ρ 2 can be obtained by mixing a first film material having a higher refractive index ρ 1 and a second film material having a lower refractive index ρ 2. That is, the properties of each film layer included in the Rugate film to be prepared include a single film layer and a mixed film layer. In this embodiment, the single film layer refers to a film layer formed by only one film layer material, and the mixed film layer refers to a film layer formed by a first film layer material and a second film layer material.
The hybrid film layer includes a first sub-film layer and a second sub-film layer. The first sub-film layer is a sub-film layer made of a first film material, and the second sub-film layer is a sub-film layer made of a second film material. The refractive index of the first film material is a first refractive index, the refractive index of the second film material is a second refractive index, and the first refractive index is greater than the second refractive index.
Because the structure of the mixed film layer is complex, in order to obtain the preparation parameters of the mixed film layer, the relationship between the refractive index of the mixed film layer and the film layer concentration needs to be obtained first. The film concentration is the film concentration of the first sub-film layer or the film concentration of the second sub-film layer in the mixed film layer. That is, the film layer concentration of the first sub-film layer and the film layer concentration of the second sub-film layer have a one-to-one correspondence relationship with the refractive index of the mixed film layer. In this embodiment, the film concentration may be a ratio of a thickness of a single sub-film in the mixed film to a thickness of the mixed film.
As an embodiment, the relationship between the refractive index of the mixed film layer and the film layer concentration may be obtained from the first preset model, the first refractive index, and the second refractive index, and the relationship may be used as a reference correspondence relationship. The first refractive index and the second refractive index may be pre-stored in the electronic device according to specific preparation requirements, or may be input in real time. The reference corresponding relation obtained by the method has wide applicability, and can be suitable for preparing the graded-index film made of various film layer materials.
The inventor proves that the mixed film layer conforms to the Rorenz-Lorentz dispersion theory through long-term research and repeated experiments. For example, with hafnium oxide (HfO)2) As the first film material, silicon dioxide (SiO)2) As a second film material, multiple groups of HfO with different film concentrations are prepared by an atomic layer deposition technology2-SiO2Mixing the film layers, and measuring HfO corresponding to the concentration of each film layer2-SiO2The refractive index of the mixed film layer. Wherein the different film concentrations correspond to different cycle times ratios of the two film materials. Multiple sets of HfO as described above2-SiO2HfO in mixed film layer2And SiO2Corresponding cycle number proportion NHfO2:NSiO2The method comprises the following steps: 5:1, 4:2,3:3, 2:4 and 1: 5. HfO with different film layer concentrations prepared by experiments2-SiO2The refractive index of the mixed film layer was fitted linearly to obtain a linear fit curve in fig. 4. In addition, HfO is added2Refractive index of (2) and SiO2The refractive index of (a) is substituted into a dispersion theory model in the Lorentz-Lorenz dispersion theory (Lorentz-Lorenz), resulting in a Lorentz-Lorentz model curve shown in fig. 4. In FIG. 4, the abscissa is SiO in the mixed film layer2Film layer concentration CSiO2And the ordinate is the refractive index of the mixed film layer. As shown in fig. 4, the lorentz-lorentz model curve and the linear fit curve of the experimental data are in good agreement, indicating that the mixed film layer is in agreement with the lorentz-lorentz dispersion theory.
Therefore, the first preset model may be a dispersion theory model in Lorentz-Lorentz dispersion theory (Lorentz-Lorenz). Specifically, the first preset model may be the following formula:
Figure BDA0001332248190000081
in the formula (1), n represents the refractive index of the mixed film layer, and n1、n2Respectively representing the refractive indices of the first and second film materials, C2Representing the second sub-film layer or a film layer concentration of the second sub-film layer. Specifically, when n is1Representing the refractive index of the material of the first film layer, i.e. the first refractive index, n2When the refractive index of the material of the second film layer is expressed, namely the second refractive index, C2Representing the film layer concentration of the second sub-film layer; when n is1Representing the refractive index of the material of the second film layer, i.e. the second refractive index, n2When the refractive index of the material of the first film layer is expressed, namely the first refractive index, C2The film layer concentration of the first sub-film layer is shown.
As another embodiment, when the first film layer material and the second film layer material are determined, the reference correspondence may also be obtained by fitting the experimental results of the user for the specific first film layer material and the specific second film layer material. Specifically, a plurality of mixed film layers with different preset film layer concentrations may be prepared in advance, and the refractive index measurement may be performed respectively, for example, an ellipsometer may be used to measure the refractive index of the mixed film layer, so as to obtain the refractive index of the mixed film layer with each preset film layer concentration, and a straight line fitting may be performed on the plurality of preset film layer concentrations and the refractive index data of the mixed film layer corresponding to each film layer concentration, so as to obtain a relationship between the refractive index of the mixed film layer and the film layer concentration, which is used as the reference correspondence.
Alternatively, in addition to the above two methods, the reference correspondence relationship may be stored in the electronic device by the user in advance.
And step S130, obtaining the preparation parameters of the graded index film according to the reference corresponding relation and the preparation data.
Specifically, referring to fig. 5, the step of obtaining the preparation parameters of the graded-index film according to the reference correspondence and the preparation data at least includes the following steps S131 to S134.
Step S131, the film layer attribute of each film layer is judged according to the first refractive index, the second refractive index and the refractive index of the film layer.
Specifically, the film layer attributes include a mixed film layer and a single film layer. And judging whether the refractive index of each film layer is consistent with the first refractive index or the second refractive index, judging that the film layer is a mixed film layer when the refractive index of the film layer is not equal to the first refractive index or the second refractive index, and judging that the film layer is a single film layer when the refractive index of the film layer is equal to the first refractive index or the second refractive index.
When it is determined that the film layer is the mixed film layer, performing step S132 and step S133; when it is determined that the film layer is a single film layer, step S134 is performed.
And S132, when the film layer is the mixed film layer, obtaining the film layer concentration of the film layer according to the reference corresponding relation and the refractive index of the film layer.
In the reference corresponding relationship, the refractive index of the mixed film layer and the film layer concentration have a one-to-one corresponding relationship, so that the film layer concentration of the mixed film layer can be obtained by bringing the refractive index of the mixed film layer into the reference corresponding relationship.
Step S133, respectively obtaining deposition thicknesses of the first sub-film layer and the second sub-film layer included in the film layer according to a second preset model, the obtained film layer concentration, and the film layer thickness of the film layer.
In this embodiment, the film concentration may be a ratio of a thickness of a single sub-film in the mixed film to a thickness of the mixed film. At this time, the second preset model may specifically be the following formula:
Figure BDA0001332248190000101
in the formula (2), C2Representing the film layer concentration of the first or second sub-film layer, d1、d2Respectively representing the deposition thickness of the first sub-film layer and the deposition thickness of the second sub-film layer, and D representing the film thickness corresponding to the mixed film layer. Specifically, when d1Denotes the deposition thickness of the first sub-film layer, d2When representing the deposition thickness of the second sub-film layer, C2Representing the film layer concentration of the second sub-film layer; when d is1Denotes the deposition thickness of the second sub-film layer, d2When the deposition thickness of the first sub-film layer is expressed, C2The film layer concentration of the first sub-film layer is shown.
Further, the film concentration obtained in step S132 and the film thickness of the mixed film are substituted into the above formula (2), so as to obtain the deposition thicknesses of the first sub-film and the second sub-film included in the mixed film, respectively.
And S134, when the film layer is a single film layer, acquiring the film layer material and the film layer thickness corresponding to the film layer.
When the refractive index of the film is equal to the first refractive index, it indicates that the film only includes the first sub-film, that is, the film is made of only the first film material, and at this time, the film material corresponding to the film is the first film material. When the refractive index of the film is equal to the second refractive index, it indicates that the film only includes the second sub-film, that is, the film only includes the second film material, and at this time, the film material corresponding to the film is the second film material. In addition, the film thickness of the film is the film thickness corresponding to the film in the preparation data obtained in the step S110.
In a specific application scenario of this embodiment, an atomic layer deposition technique is used to prepare the graded-index film, and the preparation parameters to be obtained include the number of cycles of the precursor. It can be understood that in the ald technique, there is a linear relationship between the deposition thickness of the film and the number of deposition cycles of the precursor, and therefore, controlling the thickness of the film by controlling the number of deposition cycles of the precursor is a better control method for the thickness of the film in the ald coating. In addition, the following relationship exists among the thickness d of the single film layer, the growth rate g of the film layer material and the number N of deposition cycles of the precursor:
d＝g·N (3)
at this time, as shown in fig. 5, the method for obtaining parameters of manufacturing a graded-index thin film according to the present embodiment further includes step S135, and after the step S133 is completed, the step S135 is continuously performed.
Step S135, obtaining a first cycle number and a second cycle number when the film is prepared according to a preset first growth parameter, a preset second growth parameter, and a deposition thickness of the first sub-film layer and the second sub-film layer included in the film.
The first growth parameter is the growth rate of a first film layer material, the second growth parameter is the growth rate of a second film layer material, the first cycle number is the cycle number of a precursor corresponding to the first sub-film layer, and the second cycle number is the cycle number of a precursor corresponding to the second sub-film layer.
In this embodiment, the growth rate of the first film layer material and the growth rate of the second film layer material may be stored in the electronic device in advance, or may be a value of the measured growth rate input by the user in real time through the input/output unit.
Specifically, the deposition thickness of the first sub-film layer and the preset first growth parameter are taken into formula (3), so that the first cycle number can be obtained. And (3) bringing the deposition thickness of the second sub-film layer and the preset second growth parameter into formula (3), so as to obtain a second cycle number.
Similarly, when the atomic layer deposition technique is used to prepare the graded-index film, as shown in fig. 5, the method for obtaining the preparation parameters of the graded-index film provided in this embodiment further includes step S136, and after the step S134 is completed, the step S136 is continuously performed.
And S136, obtaining the cycle number of the precursor for preparing the film layer according to the film layer thickness of the film layer and the growth rate of the film layer material corresponding to the film layer.
Specifically, the film thickness of the film and the growth rate of the film material corresponding to the film are taken into formula (3), so that the cycle number of the precursor for preparing the film can be obtained.
Each film layer corresponding to the preparation data acquired in step S110 is processed through the above steps S131 to S136 until the first cycle number and the second cycle number corresponding to each film layer are obtained.
That is to say, when the atomic layer deposition technique is used to prepare the graded-index thin film, the preparation parameters required to be obtained in this embodiment to prepare each film layer include: a first number of cycles and a second number of cycles. Wherein, for the mixed film layer, both the first cycle number and the second cycle number are greater than 0, specifically obtained according to the step S135. For a single film layer, one of the first and second number of cycles is equal to 0 and the other is greater than 0. For example, when the single layer is composed of only the first layer material, the first cycle number is greater than 0, specifically obtained according to the step S136, and the second cycle number is equal to 0; when the single film layer is made of only the second film layer material, the first cycle number is equal to 0, and the second cycle number is greater than 0, which is obtained according to the step S136.
Of course, in other application scenarios of the embodiment of the present invention, for example, when a dual-source co-evaporation method in sputtering or electron beam evaporation is used to prepare a graded-index thin film, the preparation parameters required to be obtained in this embodiment to prepare each film layer include: and the deposition thickness of the first sub-film layer and the deposition thickness of the second sub-film layer correspond to each film layer. For the mixed film layer, both the deposition thickness of the first sub-film layer and the deposition thickness of the second sub-film layer are greater than 0, which is specifically obtained according to step S133. For a single film layer, i.e., including only the first or second sub-film layers, then one of the deposited thickness of the first sub-film layer and the deposited thickness of the second sub-film layer is equal to 0 and the other is greater than 0. For example, when the single film layer only includes the first sub-film layer, the deposition thickness of the second sub-film layer is 0, and the deposition thickness of the first sub-film layer is greater than 0, specifically obtained according to the step S134; when the single film layer only includes the second sub-film layer, the deposition thickness of the first sub-film layer is 0, and the deposition thickness of the second sub-film layer is greater than 0, which is specifically obtained according to the step S134.
Compared with the prior art, the method for obtaining the preparation parameters of the graded-index film provided by the embodiment of the invention obtains the preparation parameters of the graded-index film by obtaining the preparation data and the reference corresponding relation of the graded-index film to be prepared and then obtaining the preparation parameters of the graded-index film according to the obtained preparation data and the reference corresponding relation, and is beneficial to more accurately obtaining the preparation parameters of the graded-index film to be prepared, thereby preparing the graded-index film and the optical filter with more satisfactory performance.
Second embodiment
Fig. 6 shows a block diagram of a device for acquiring preparation parameters according to a second embodiment of the present invention. The manufacturing parameter obtaining apparatus 200 provided in this embodiment is operated in the electronic device 100, and is configured to implement the method for obtaining manufacturing parameters of a graded index film provided in the first embodiment. Referring to fig. 6, the preparation parameter acquiring apparatus 200 includes: a first obtaining module 210, a second obtaining module 220, and a processing module 230.
The first obtaining module 210 is configured to obtain preparation data of a graded-index thin film to be prepared, where the preparation data includes a refractive index and a film thickness of each film layer of the graded-index thin film.
The second obtaining module 220 is configured to obtain a reference corresponding relationship, where the reference corresponding relationship is a relationship between a refractive index of a mixed film and a film concentration, the mixed film includes a first sub-film and a second sub-film, a first refractive index of a first film material corresponding to the first sub-film is greater than a second refractive index of a second film material corresponding to the second sub-film, and the film concentration is the film concentration of the first sub-film or the film concentration of the second sub-film in the mixed film.
And the processing module 230 obtains the preparation parameters of the graded index film according to the reference correspondence and the preparation data.
Further, the second obtaining module 220 is specifically configured to obtain a relationship between the refractive index of the mixed film and the film concentration according to a first preset model, the first refractive index, and the second refractive index, and use the relationship as the reference corresponding relationship.
Further, as shown in fig. 6, the processing module 230 includes a judgment sub-module 231, a first processing sub-module 232, and a second processing sub-module 233.
And the judging submodule 231 is configured to judge the film property of each film according to the first refractive index, the second refractive index, and the refractive index of each film.
The first processing submodule 232 is configured to, when the judging submodule judges that the film layer is the mixed film layer, obtain a film layer concentration for preparing the film layer according to the reference correspondence and the refractive index corresponding to the film layer, and obtain a deposition thickness of the first sub film layer and a deposition thickness of the second sub film layer included in the film layer according to a second preset model, the obtained film layer concentration, and the film layer thickness corresponding to the film layer; obtaining a first cycle number and a second cycle number when the film is prepared according to the deposition thickness of the first sub-film layer, the deposition thickness of the second sub-film layer, a preset first growth parameter and a preset second growth parameter, wherein the first cycle number and the second cycle number are included in the film, the first growth parameter is the growth rate of the first film material, the second growth parameter is the growth rate of the second film material, the first cycle number is the cycle number of the precursor corresponding to the first sub-film layer, and the second cycle number is the cycle number of the precursor corresponding to the second sub-film layer.
And a second processing submodule 233, configured to, when the judging submodule judges that the film layer is a single film layer, obtain, according to the thickness of the film layer corresponding to the film layer and the growth rate of the film layer material corresponding to the film layer, the cycle number of the precursor corresponding to the film layer when the film layer is prepared.
In the above embodiment, the modules may be implemented by software codes, and in this case, the modules may be stored in the memory 101 of the electronic device 100. Of course, the above modules may also be implemented by hardware, such as an integrated circuit chip.
The implementation principle and the technical effect of the manufacturing parameter obtaining apparatus 200 provided by the embodiment of the present invention are the same as those of the foregoing method embodiments, and for the sake of brief description, no mention may be made in the apparatus embodiments, and reference may be made to the corresponding contents in the foregoing method embodiments.
Third embodiment
The third embodiment of the present invention also provides a method for preparing a graded-index film, including: according to the preparation parameters obtained by the method for obtaining the preparation parameters of the graded-index film provided by the first embodiment, by using the precursor corresponding to the first film layer material and the precursor corresponding to the second film layer material as raw materials, a plurality of film layers are sequentially deposited on a preset substrate to obtain the graded-index film, wherein each film layer corresponds to one refractive index. When the prepared graded-index film is a Rugate film, the refractive indexes of the plurality of film layers are periodically distributed.
Specifically, in the atomic layer deposition coating apparatus, a precursor corresponding to the first film layer material and a precursor corresponding to the second film layer material are used as raw materials, and a plurality of film layers are sequentially deposited on a preset substrate according to the preparation parameters obtained by the method for obtaining the preparation parameters of the graded-refractive-index film provided in the first embodiment, so as to obtain the graded-refractive-index film.
It can be understood that, when the graded index film is prepared by using the atomic layer deposition technique, the required process parameters include other parameters, such as deposition temperature, in addition to the preparation parameters obtained by the method for obtaining the preparation parameters of the graded index film provided in the first embodiment. The deposition temperature may be set according to the particular film layer material employed. In addition, for the preparation of the Rugate film, the required process parameters also include preparation cycle number, the preparation cycle number is the number of refractive index cycles included in the Rugate film to be prepared, and the Rugate film is obtained according to a specific mode system design.
Specifically, the first film layer material and the second film layer material can be set as required, and the precursors corresponding to different film layer materials are different, and the growth rates of the corresponding film layers are also different. In this embodiment, the first film material may be hafnium oxide (HfO)2) The second film material may be silicon dioxide (SiO)2). Pure SiO2Has a refractive index of about 1.46, pure HfO2Is about 2.09. At this time, a mixed film layer having a refractive index of 1.46 to 2.09 may be prepared, and thus a graded index film having a refractive index varying between 1.46 to 2.09 may be obtained. Of course, except for HfO2And SiO2In addition, other film layer materials may be used as necessary.
The preparation parameters obtained by the atomic layer deposition technology according to the method for obtaining the preparation parameters of the graded-index film provided by the first embodiment are HfO2Corresponding precursors and SiO2Corresponding precursor is taken as raw material to obtain HfO2-SiO2Rugate film, which can achieve the performance of reflecting only a narrow spectral region, but transmitting all other bands. For example, in one specific preparation, the preparation cycle is set to 22 cycles, and HfO is prepared2-SiO2The transmission spectrum of the Rugate film is shown in FIG. 7, and the transmittance of the Rugate film at the central wavelength of 532nm is 0.73%. Prepared HfO2-SiO2In the Rugate film, HfO2The minimum thickness d _ min _ H of the film layer is 0.0775nm, SiO2The minimum thickness d _ min _ L of the film layer is 0.084 nm.
Fourth embodiment
A fourth embodiment of the present invention provides an optical filter, which includes a substrate and a graded index film prepared according to the preparation method provided in the third embodiment, wherein the graded index film is attached to the substrate. It is understood that when the graded index film is a Rugate film, the filter is a Rugate filter.
It should be noted that, when the substrate suitable for the optical filter is directly used as the predetermined substrate in the manufacturing method provided in the third embodiment, the optical filter having the graded index profile can be directly manufactured by the manufacturing method provided in the third embodiment. Of course, when the substrate used in the manufacturing method provided by the third embodiment is different from the substrate suitable for the optical filter, the graded index film obtained by the manufacturing method provided by the third embodiment may be transferred from the substrate and attached to the suitable substrate to form the optical filter with the desired optical performance.
In the embodiments provided in the present application, it should be understood that the disclosed apparatus and method can be implemented in other ways. The apparatus embodiments described above are merely illustrative, and for example, the flowchart and block diagrams in the figures illustrate the architecture, functionality, and operation of possible implementations of apparatus, methods and computer program products according to various embodiments of the present invention. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s). It should also be noted that, in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved. It will also be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.
In addition, the functional modules in the embodiments of the present invention may be integrated together to form an independent part, or each module may exist separately, or two or more modules may be integrated to form an independent part.
The functions, if implemented in the form of software functional modules and sold or used as a stand-alone product, may be stored in a computer readable storage medium. Based on such understanding, the technical solution of the present invention may be embodied in the form of a software product, which is stored in a storage medium and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes. It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.

Claims (9)

1. A method for obtaining preparation parameters of a graded-index film is characterized by comprising the following steps:
obtaining preparation data of a graded-index film to be prepared, wherein the preparation data comprises the refractive index and the film thickness of each film layer of the graded-index film;
obtaining a reference corresponding relation, wherein the reference corresponding relation is a relation between a refractive index of a mixed film and film concentration, the mixed film comprises a first sub-film and a second sub-film, a first refractive index of a first film material corresponding to the first sub-film is greater than a second refractive index of a second film material corresponding to the second sub-film, and the film concentration is the film concentration of the first sub-film or the film concentration of the second sub-film in the mixed film;
judging the film properties of the film according to the first refractive index, the second refractive index and the refractive index of each film;
and when the film layer is the mixed film layer, obtaining the film layer concentration of the film layer according to the reference corresponding relation and the refractive index of the film layer, and respectively obtaining the deposition thicknesses of the first sub-film layer and the second sub-film layer included by the film layer according to a second preset model, the obtained film layer concentration and the film layer thickness of the film layer.
2. The method of claim 1, wherein the step of obtaining the reference correspondence comprises:
and obtaining the relation between the refractive index of the mixed film layer and the film layer concentration according to a first preset model, the first refractive index and the second refractive index, and taking the relation as the reference corresponding relation.
3. The method of claim 2, wherein the first predetermined model is the following formula:
Figure FDA0002214415680000011
where n represents the refractive index of the mixed film layer, n1, n2 represent the refractive indices of the first and second film layer materials, respectively, and C2 represents the film layer concentration of the first or second sub-film layer.
4. The method of claim 1, wherein after the step of obtaining the deposition thicknesses of the first sub-film layer and the second sub-film layer included in the film layer according to the second predetermined model, the obtained film layer concentration, and the film layer thickness of the film layer, the method further comprises:
obtaining a first cycle number and a second cycle number when the film layer is prepared according to a preset first growth parameter, a preset second growth parameter and the deposition thicknesses of the first sub-film layer and the second sub-film layer included in the film layer, wherein the first growth parameter is the growth rate of the first film layer material, the second growth parameter is the growth rate of the second film layer material, the first cycle number is the cycle number of the precursor corresponding to the first sub-film layer, and the second cycle number is the cycle number of the precursor corresponding to the second sub-film layer.
5. The method according to claim 1, wherein the step of obtaining the production parameters of the graded-index film according to the reference correspondence and the production data further comprises:
and when the film layer is a single film layer, obtaining the cycle number of the precursor for preparing the film layer according to the film layer thickness of the film layer and the growth rate of the film layer material corresponding to the film layer.
6. A method of making a graded index film, the method comprising:
sequentially depositing a plurality of film layers on a preset substrate by using an atomic layer deposition technology and a precursor corresponding to a first film layer material and a precursor corresponding to a second film layer material as raw materials according to the preparation parameters obtained by the method of any one of claims 1 to 5 to obtain the graded-index thin film, wherein each film layer corresponds to one refractive index.
7. The method of claim 6, wherein the refractive indices of the plurality of film layers are periodically distributed.
8. The method of claim 6, wherein the first film material is hafnium oxide and the second film material is silicon dioxide.
9. An optical filter comprising a substrate and a graded index film produced by the production method according to any one of claims 6 to 8, the graded index film being attached to the substrate.
CN201710498955.8A 2017-06-26 2017-06-26 Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter Active CN107132604B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710498955.8A CN107132604B (en) 2017-06-26 2017-06-26 Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710498955.8A CN107132604B (en) 2017-06-26 2017-06-26 Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter

Publications (2)

Publication Number Publication Date
CN107132604A CN107132604A (en) 2017-09-05
CN107132604B true CN107132604B (en) 2020-01-14

Family

ID=59736420

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710498955.8A Active CN107132604B (en) 2017-06-26 2017-06-26 Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter

Country Status (1)

Country Link
CN (1) CN107132604B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105824129A (en) * 2016-03-15 2016-08-03 郑光威 Light-beam-space low pass filter with Rugate films
CN109683270B (en) * 2018-12-15 2020-07-21 中国科学院长春光学精密机械与物理研究所 Method for accurately aligning multiple gradual change filters
CN110735121B (en) * 2019-11-21 2022-03-29 江苏北方湖光光电有限公司 Preparation method of unconventional refractive index mixed film based on magnetron sputtering

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007048195A1 (en) * 2005-10-28 2007-05-03 The University Of Sydney Rugate filters
EP1956399A3 (en) * 2003-08-22 2008-09-03 Olympus Corporation Optical multi-layer filter with periodic variation of high and low refractive index and optical instrument
CN101560653A (en) * 2009-05-14 2009-10-21 浙江大学 Method for preparing gradient-index film
CN102517620A (en) * 2011-12-06 2012-06-27 中国科学院宁波材料技术与工程研究所 Preparation method of antireflective film having gradually changeable refractive indexes
CN102980748A (en) * 2012-12-06 2013-03-20 中国科学院长春光学精密机械与物理研究所 Method for measuring optical constants of thin film with non-uniform refractive index
CN105951051A (en) * 2016-06-16 2016-09-21 哈尔滨工业大学 Method of preparing graded refractive index antireflection film by adopting oblique sputtering process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7903338B1 (en) * 2006-07-08 2011-03-08 Cirrex Systems Llc Method and system for managing light at an optical interface

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1956399A3 (en) * 2003-08-22 2008-09-03 Olympus Corporation Optical multi-layer filter with periodic variation of high and low refractive index and optical instrument
WO2007048195A1 (en) * 2005-10-28 2007-05-03 The University Of Sydney Rugate filters
CN101560653A (en) * 2009-05-14 2009-10-21 浙江大学 Method for preparing gradient-index film
CN102517620A (en) * 2011-12-06 2012-06-27 中国科学院宁波材料技术与工程研究所 Preparation method of antireflective film having gradually changeable refractive indexes
CN102980748A (en) * 2012-12-06 2013-03-20 中国科学院长春光学精密机械与物理研究所 Method for measuring optical constants of thin film with non-uniform refractive index
CN105951051A (en) * 2016-06-16 2016-09-21 哈尔滨工业大学 Method of preparing graded refractive index antireflection film by adopting oblique sputtering process

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
Optical monitoring of rugate filters;Marc Lappschies 等;《PROCEEDINGS OF SPIE》;20051231;第5963卷;59631Z-1-9页 *
Photoluminescence of ion beam sputtered HfO2/Al2O3 and HfO2/SiO2 mixtures;Thimotheus Alig 等;《Optical Interference Coatings》;20161231;全文 *
反应磁控溅射制备SiOx 渐变折射率红外梳状滤光片;宋秋明 等;《中国激光》;20090831;第36卷(第8期);第2143-2148页 *

Also Published As

Publication number Publication date
CN107132604A (en) 2017-09-05

Similar Documents

Publication Publication Date Title
CN107132604B (en) Gradient refractive index film preparation parameter obtaining method, preparation method and optical filter
Corkery et al. On the colour of wing scales in butterflies: iridescence and preferred orientation of single gyroid photonic crystals
JP2008512730A (en) Thin film interference filter and bootstrap method for controlling deposition process of interference filter
Anzengruber et al. Numerical methods for the design of gradient-index optical coatings
Akın et al. Nanostructured TiO2 thin films: synthesis and characterisations
Amotchkina et al. Reliable optical characterization of e-beam evaporated TiO 2 films deposited at different substrate temperatures
Ali et al. Thermo-optical properties of thin-film TiO2–Al2O3 bilayers fabricated by atomic layer deposition
Zhang et al. Crystallinity effect on electrical properties of PEALD–HfO2 thin films prepared by different substrate temperatures
Kim et al. Effect of process temperature on density and electrical characteristics of Hf0. 5Zr0. 5O2 thin films prepared by plasma-enhanced atomic layer deposition
Li et al. Rugate notch filter fabricated by atomic layer deposition
Shen et al. Atomic-level Sn doping effect in Ga2O3 films using plasma-enhanced atomic layer deposition
Netterfield Refractive indices of zinc sulfide and cryolite in multilayer stacks
CN108139514A (en) Flexible bragg reflector
US20150109672A1 (en) Reflective Diffraction Grating and Method for the Production Thereof
Yu et al. Reduced wavelength-dependent quarter-wave plate fabricated by a multilayered subwavelength structure
Chame et al. Crossover effects in a discrete deposition model with Kardar-Parisi-Zhang scaling
Oliveira et al. Universal and nonuniversal features in the crossover from linear to nonlinear interface growth
Alam et al. Heterostructure films of SiO2 and HfO2 for high-power laser optics prepared by plasma-enhanced atomic layer deposition
CN107916410B (en) A kind of reflective optic monitoring method detecting optical coating thickness
Krapivsky et al. A renewal approach to configurational entropy in one dimension
CN104750748B (en) A kind of method and device creating speed for improving theoretical spectral database
Amotchkina Analytical estimations for the reference wavelength reflectance and width of high reflection zone of two-material periodic multilayers
Thöny et al. Magnetron sputter deposition of Ta 2 O 5-SiO 2 quantized nanolaminates
KR102400204B1 (en) How to form a multilayer film
Poitras et al. Ion-beam etching for the precise manufacture of optical coatings

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant