CN107096782A - A kind of MicroLED glass substrates method for suppersonic cleaning - Google Patents
A kind of MicroLED glass substrates method for suppersonic cleaning Download PDFInfo
- Publication number
- CN107096782A CN107096782A CN201710359903.2A CN201710359903A CN107096782A CN 107096782 A CN107096782 A CN 107096782A CN 201710359903 A CN201710359903 A CN 201710359903A CN 107096782 A CN107096782 A CN 107096782A
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- CN
- China
- Prior art keywords
- ultrasonic
- micro led
- led glass
- cleaned
- cleaning
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a kind of Micro LED glass substrate method for suppersonic cleaning, comprise the following steps：(1) Micro LED glass substrates to be cleaned are sent into ultrasonic cleaner by Micro LED glass substrates by conveyer；(2) cleaning fluid to Micro LED glass substrates to be cleaned are added into above-mentioned ultrasonic pen rinse bath to be completely submerged in the cleaning fluid of ultrasonic cleaner；The different frequency ultrasonic wave produced by the first ultrasonic frequency generator and the second ultrasonic frequency generator is applied to cleaning fluid and carries out ultrasonic wave cleaning to Micro LED glass substrates；(3) the Micro LED glass substrates that above-mentioned cleaned liquid was cleaned are put into supersonic wave cleaning machine, carrying out ultrasonic wave with deionized water is cleaned, and water temperature is controlled at 40 50 DEG C, cleans 10 15min；Carry out twice ultrasonic to glass substrate with deionized water again to clean, scavenging period is 15 20min, cleaning temperature is 40 50 DEG C.(4) by by the Micro cleaned LED glass substrates by conveyer from ultrasonic cleaner be carried out come.
Description
Technical field
The present invention relates to glass substrate technical field, and in particular to a kind of Micro LED glass substrate ultrasonic waves cleaning side
Method.
Background technology
Cleaning glass substrate is the step of reusing frequency highest in Micro LED liquid-crystalline glasses processing procedures, per together
Glass baseplate surface must all be cleaned up before fabrication steps, to remove pollutant, it is to avoid the life of native oxide film
Into, it is increasing with the size of glass substrate, the purity requirements of substrate surface are also improved constantly.What glass substrate was cleaned
While purpose is to remove the dirt of substrate surface, it is necessary to ensure that substrate its electrical parameter and characteristic after the completion of cleaning, really
Protect the quality and reliability of element.
The content of the invention
The present invention is intended to provide a kind of Micro LED glass substrate method for suppersonic cleaning.
The present invention provides following technical scheme：
A kind of Micro LED glass substrate method for suppersonic cleaning, comprises the following steps：
(1) Micro LED glass substrates to be cleaned are sent into ultrasonic wave by Micro LED glass substrates by conveyer
Rinse bath；
(2) cleaning fluid to Micro LED glass substrates to be cleaned are added into above-mentioned ultrasonic pen rinse bath to be totally submerged
In the cleaning fluid of ultrasonic cleaner；Produced by the first ultrasonic frequency generator and the second ultrasonic frequency generator
Different frequency ultrasonic wave is applied to cleaning fluid and carries out ultrasonic wave cleaning to Micro LED glass substrates；
(3) the Micro LED glass substrates that above-mentioned cleaned liquid was cleaned are put into supersonic wave cleaning machine, use deionization
Water carries out ultrasonic wave cleaning, and water temperature is controlled at 40-50 DEG C, cleans 10-15min；Glass substrate is carried out with deionized water again
Twice ultrasonic is cleaned, and scavenging period is 15-20min, and cleaning temperature is 40-50 DEG C.
(4) by by the Micro cleaned LED glass substrates by conveyer from ultrasonic cleaner be carried out come.
The frequency of the first ultrasonic frequency generator and the second ultrasonic frequency generator be respectively 60KHz with
90KHz。
The ultrasonic cleaning solution is n-amyl alcohol and absolute ethyl alcohol by volume 3：2 mix.
The resistivity of the deionized water is 7-9M Ω cm.
Angle between glass substrate and the ultrasonic cleaner horizontal plane is 30-45 °.
The mass concentration of the n-amyl alcohol is more than 99.9%.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention in ultrasonic cleaner by setting different frequencies
The ultrasonic frequency generator of rate, the particle of the ultrasonic frequency generator correspondence certain limit particle diameter of each frequency band is carried out
Cleaning, is not required to be replaced and cleaned groove, shortens the manufacturing process for cleaning time, saved cost, and Micro LED glass substrates are relative to those
Ultrasonic frequency generator is obliquely installed, and more effectively removes the particle for being attached to Micro LED glass substrates；The present invention's is clear
The glass no-watermark that washing method is washed out, inviolateness can fully meet liquid Micro LED glass substrate follow-up work needs.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of Micro LED glass substrate method for suppersonic cleaning of embodiment, comprises the following steps：
(1) Micro LED glass substrates to be cleaned are sent into ultrasonic wave by Micro LED glass substrates by conveyer
Rinse bath；
(2) cleaning fluid to Micro LED glass substrates to be cleaned are added into above-mentioned ultrasonic pen rinse bath to be totally submerged
In the cleaning fluid of ultrasonic cleaner；Produced by the first ultrasonic frequency generator and the second ultrasonic frequency generator
Different frequency ultrasonic wave is applied to cleaning fluid and carries out ultrasonic wave cleaning to Micro LED glass substrates；
(3) the Micro LED glass substrates that above-mentioned cleaned liquid was cleaned are put into supersonic wave cleaning machine, use deionization
Water carries out ultrasonic wave cleaning, and water temperature is controlled at 40-50 DEG C, cleans 10-15min；Glass substrate is carried out with deionized water again
Twice ultrasonic is cleaned, and scavenging period is 15-20min, and cleaning temperature is 40-50 DEG C.
(4) by by the Micro cleaned LED glass substrates by conveyer from ultrasonic cleaner be carried out come.
The frequency of the first ultrasonic frequency generator and the second ultrasonic frequency generator be respectively 60KHz with
90KHz。
The ultrasonic cleaning solution is n-amyl alcohol and absolute ethyl alcohol by volume 3：2 mix.
The resistivity of the deionized water is 7-9M Ω cm.
Angle between glass substrate and the ultrasonic cleaner horizontal plane is 30-45 °.
The mass concentration of the n-amyl alcohol is more than 99.9%.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit is required rather than the explanation is limited, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Although not each moreover, it will be appreciated that the present specification is described in terms of embodiments
Embodiment is only comprising an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
Art personnel may be appreciated other embodiment.
Claims (6)
1. a kind of Micro LED glass substrate method for suppersonic cleaning, it is characterised in that comprise the following steps：
(1) Micro LED glass substrates are sent into ultrasonic wave by Micro LED glass substrates to be cleaned by conveyer to clean
Groove；
(2) into above-mentioned ultrasonic pen rinse bath add cleaning fluid to Micro LED glass substrates to be cleaned be completely submerged in it is super
In the cleaning fluid of sound wave rinse bath；The difference produced by the first ultrasonic frequency generator and the second ultrasonic frequency generator
Frequency ultrasonic wave is applied to cleaning fluid and carries out ultrasonic wave cleaning to Micro LED glass substrates；
(3) the Micro LED glass substrates that above-mentioned cleaned liquid was cleaned are put into supersonic wave cleaning machine, entered with deionized water
Row ultrasonic wave is cleaned, and water temperature is controlled at 40-50 DEG C, cleans 10-15min；Glass substrate is carried out with deionized water again secondary
It is cleaned by ultrasonic, scavenging period is 15-20min, cleaning temperature is 40-50 DEG C.
(4) by by the Micro cleaned LED glass substrates by conveyer from ultrasonic cleaner be carried out come.
2. a kind of Micro LED glass substrate method for suppersonic cleaning according to claim 1, it is characterised in that：It is described
The frequency of first ultrasonic frequency generator and the second ultrasonic frequency generator is respectively 60KHz and 90KHz.
3. a kind of Micro LED glass substrate method for suppersonic cleaning according to claim 1, it is characterised in that：It is described
Ultrasonic cleaning solution is n-amyl alcohol and absolute ethyl alcohol by volume 3：2 mix.
4. a kind of Micro LED glass substrate method for suppersonic cleaning according to claim 1, it is characterised in that：It is described
The resistivity of deionized water is 7-9M Ω cm.
5. a kind of Micro LED glass substrate method for suppersonic cleaning according to claim 1, it is characterised in that：It is described
Angle between glass substrate and ultrasonic cleaner horizontal plane is 30-45 °.
6. a kind of Micro LED glass substrate method for suppersonic cleaning according to claim 3, it is characterised in that：It is described
The mass concentration of n-amyl alcohol is more than 99.9%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710359903.2A CN107096782A (en) | 2017-05-20 | 2017-05-20 | A kind of MicroLED glass substrates method for suppersonic cleaning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710359903.2A CN107096782A (en) | 2017-05-20 | 2017-05-20 | A kind of MicroLED glass substrates method for suppersonic cleaning |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107096782A true CN107096782A (en) | 2017-08-29 |
Family
ID=59668848
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710359903.2A Pending CN107096782A (en) | 2017-05-20 | 2017-05-20 | A kind of MicroLED glass substrates method for suppersonic cleaning |
Country Status (1)
| Country | Link |
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| CN (1) | CN107096782A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109047160A (en) * | 2018-08-07 | 2018-12-21 | 湖南普照信息材料有限公司 | A kind of cleaning method of mask plate glass substrate |
| CN109290279A (en) * | 2018-09-28 | 2019-02-01 | 东莞市银泰丰光学科技有限公司 | A kind of glass light guide plate mildew cleaning process |
| CN111804664A (en) * | 2020-07-22 | 2020-10-23 | 万津实业(赤壁)有限公司 | Method for cleaning glass element |
| CN113695307A (en) * | 2020-05-20 | 2021-11-26 | 天津嘉林科医有限公司 | Method for cleaning glassware containing atorvastatin calcium |
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| CN102601074A (en) * | 2012-03-19 | 2012-07-25 | 深圳市华星光电技术有限公司 | Method for cleaning TFT-LCD (thin film transistor liquid crystal display) glass substrate |
| CN104160444A (en) * | 2011-12-28 | 2014-11-19 | Hoya株式会社 | Production method for glass substrate for information recording medium |
| CN104277944A (en) * | 2013-09-29 | 2015-01-14 | 东旭集团有限公司 | TFT (thin film transistor) liquid crystal glass substrate cleaning fluid and cleaning method thereof |
| KR20150016738A (en) * | 2013-08-05 | 2015-02-13 | 황원식 | Method for reclaiming glasssubstrate for mobile |
| CN106623238A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Suction-transfer type thin glass substrate continuous cleaning system and method |
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2017
- 2017-05-20 CN CN201710359903.2A patent/CN107096782A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104160444A (en) * | 2011-12-28 | 2014-11-19 | Hoya株式会社 | Production method for glass substrate for information recording medium |
| CN102601074A (en) * | 2012-03-19 | 2012-07-25 | 深圳市华星光电技术有限公司 | Method for cleaning TFT-LCD (thin film transistor liquid crystal display) glass substrate |
| KR20150016738A (en) * | 2013-08-05 | 2015-02-13 | 황원식 | Method for reclaiming glasssubstrate for mobile |
| CN104277944A (en) * | 2013-09-29 | 2015-01-14 | 东旭集团有限公司 | TFT (thin film transistor) liquid crystal glass substrate cleaning fluid and cleaning method thereof |
| CN106623238A (en) * | 2016-11-17 | 2017-05-10 | 天津滨海光热反射技术有限公司 | Suction-transfer type thin glass substrate continuous cleaning system and method |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109047160A (en) * | 2018-08-07 | 2018-12-21 | 湖南普照信息材料有限公司 | A kind of cleaning method of mask plate glass substrate |
| CN109290279A (en) * | 2018-09-28 | 2019-02-01 | 东莞市银泰丰光学科技有限公司 | A kind of glass light guide plate mildew cleaning process |
| CN113695307A (en) * | 2020-05-20 | 2021-11-26 | 天津嘉林科医有限公司 | Method for cleaning glassware containing atorvastatin calcium |
| CN111804664A (en) * | 2020-07-22 | 2020-10-23 | 万津实业(赤壁)有限公司 | Method for cleaning glass element |
| CN111804664B (en) * | 2020-07-22 | 2022-07-19 | 万津实业(赤壁)有限公司 | Method for cleaning glass element |
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Application publication date: 20170829 |