CN107092046A - A kind of high reflective mirror of wide spectrum - Google Patents

A kind of high reflective mirror of wide spectrum Download PDF

Info

Publication number
CN107092046A
CN107092046A CN201710282344.XA CN201710282344A CN107092046A CN 107092046 A CN107092046 A CN 107092046A CN 201710282344 A CN201710282344 A CN 201710282344A CN 107092046 A CN107092046 A CN 107092046A
Authority
CN
China
Prior art keywords
reflective mirror
wide spectrum
high reflective
glass substrate
reflecting layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710282344.XA
Other languages
Chinese (zh)
Inventor
毛书正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Moao Optical Devices Co Ltd
Original Assignee
Shanghai Moao Optical Devices Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Moao Optical Devices Co Ltd filed Critical Shanghai Moao Optical Devices Co Ltd
Priority to CN201710282344.XA priority Critical patent/CN107092046A/en
Publication of CN107092046A publication Critical patent/CN107092046A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • G02B5/0816Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention discloses a kind of high reflective mirror of wide spectrum, it is characterised in that:The reflective mirror includes the substrate being made up of glass substrate, reflecting layer is provided with the glass substrate, the reflecting layer can improve the reflectivity of wavelength light between 190 1100nm.The present invention is to be combined using metal with deielectric-coating, pass through well-designed and special manufacturing process, its reflectivity of the reflective mirror being coated with is more than 88% from 190nm~1100nm average reflectances, ultraviolet and infrared reflection is improved intentionally, and the reflectance spectrum of reflective mirror is adjusted according to the spectrum photoelectric effect of receiver, so that the whole output integrated energy of spectral instrument reaches balance, the quality of instrument is improved.

Description

A kind of high reflective mirror of wide spectrum
Technical field
The present invention relates to optical instrument and spectroanalysis instrument field, specifically a kind of high reflective mirror of wide spectrum is mainly used to Improve the reflectivity from ultraviolet to the spectrum of infrared light.
Background technology
Scientific research is with being commonly used analytical instrument in real life, in many analytical instrument, such as:Spectrophotometer, be by The light of complicated component is decomposed into the scientific instrument of spectrum line, it is desirable to which light source has from VUV to infrared spectrum (160nm- 3500nm), due to the light path system that the structural requirement of instrument must be constituted using grating beam splitting with multiple reflective mirrors, such as Fig. 2 institutes Show.But replicas all at present and all very weak, the as shown in Figure 3 reflection spectrum curve of the ultraviolet of reflective mirror, 200nm reflectivity has 60%.Six reflective mirrors are had in Fig. 2 light path system, target is reached after six secondary reflections Gross energy is (0.6)6=4.7%, this necessarily affects the quality of instrument.For that purpose it is necessary to the reflectivity of reflective mirror be improved, to improve The quality of instrument.
The content of the invention
It is an object of the invention to solve the above problems there is provided a kind of high reflective mirror of wide spectrum, reflective mirror can be improved and existed The reflectivity of 190nm~1100nm wavelength light, makes its output integrated energy loss very little after multiple reflections, and then improve The quality of instrument.
In order to achieve the above object, the present invention is achieved by the following technical solutions:
The present invention provides a kind of high reflective mirror of wide spectrum, it is characterised in that:The reflective mirror includes being made up of glass substrate Substrate, on the glass substrate be provided with reflecting layer, the reflecting layer can improve wavelength light between 190-1100nm Reflectivity.
Further, the reflecting layer is made up of five layer material films.
Further, the second layer material film of five layer material film is identical with the material of the 4th layer material film.
Further, the material membrane is plated on the glass substrate by the method for physical coating.
Further, the thickness in the reflecting layer is less than the thickness of glass substrate.
Further, the material membrane be inorganic material film, by silica, alundum (Al2O3), magnesium fluoride, magnesia, The mixture of hafnium oxide, metallic aluminium or these two or more materials is constituted.
The beneficial effects of the invention are as follows:The present invention is to be combined using metal with deielectric-coating, by well-designed and special Manufacturing process, its reflectivity of the reflective mirror being coated with from 190nm~1100nm average reflectances be more than 88%, improve intentionally it is ultraviolet with Infrared reflection, and the reflectance spectrum of reflective mirror is adjusted according to the spectrum photoelectric effect of receiver so that spectral instrument it is whole Individual output integrated energy reaches balance, improves the quality of instrument.Fig. 4 is the reflected light for the reflective mirror that design is required according to user Spectral curve, Fig. 5 is the reflection spectrum curve being actually coated with.The visible reflectivity at 200nm is about 93% from Fig. 4 and Fig. 5. The gross energy that target is reached after six secondary reflections is (0.93)6=64.7%.From Fig. 3 it can be seen that energy is improved compared with Fig. 5 It is very big, improve the quality of instrument.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing There is the accompanying drawing used required in technology description to be briefly described, it should be apparent that, drawings in the following description are only this Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is mirror construction schematic diagram of the present invention;
Fig. 2 is the overall light path system schematic diagram of existing spectrophotometer;
Fig. 3 is spectral reflectance curve figure when existing reflective mirror incidence angle is 45 °;
Fig. 4 is the spectral reflectance curve figure of calculating when reflective mirror incidence angle of the present invention is 45 °;
Fig. 5 is actual spectrum reflectance curves when reflective mirror incidence angle of the present invention is 45 °.
In Fig. 1:1- glass substrates, the material membranes of 2- first, the material membranes of 3- second, the material membranes of 4- the 3rd, the material membranes of 5- the 4th, The material membranes of 6- the 5th.
Embodiment
With reference to the accompanying drawings and examples, the embodiment to the present invention is further described.Following examples are only For clearly illustrating technical scheme, and it can not be limited the scope of the invention with this.
As shown in figure 1, the present invention provides a kind of high reflective mirror of wide spectrum, it is characterised in that:The reflective mirror is included by glass The substrate 1 that glass substrate is constituted, provided with the reflecting layer being made up of five layer material films 2,3,4,5,6 on the glass substrate 1, wherein Second layer material film 3 is identical with the material of the 4th layer material film 5, and the material membrane is plated in glass base by the method for physical coating On plate 1, the reflecting layer can improve the reflectivity of wavelength light between 190-1100nm.
Further, the material membrane be inorganic material film, by silica, alundum (Al2O3), magnesium fluoride, magnesia, The mixture of hafnium oxide, metallic aluminium or these two or more materials is constituted.
The present invention is to be combined using metal with deielectric-coating, and by well-designed and special manufacturing process, what is be coated with is reflective Its reflectivity of mirror is more than 88% from 190nm~1100nm average reflectances, improves ultraviolet with infrared reflection intentionally, and according to connecing Receive the spectrum photoelectric effect of device to adjust the reflectance spectrum of reflective mirror so that the whole output integrated energy of spectral instrument reaches Balance, improves the quality of instrument.Fig. 4 is the reflection spectrum curve for the reflective mirror that design is required according to user, and Fig. 5 is actually to be coated with Reflection spectrum curve.The visible reflectivity at 200nm is about 93% from Fig. 4 and Fig. 5.Mesh is reached after six secondary reflections Target gross energy is (0.93)6=64.7%.Energy can be seen compared with Fig. 5 from Fig. 3 and improves very big, the matter of instrument is improved Amount.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention God is with principle, and any modification, equivalent substitution and improvements made etc. should be included in the scope of the protection.

Claims (6)

1. a kind of high reflective mirror of wide spectrum, it is characterised in that:The reflective mirror includes the substrate being made up of glass substrate, described Glass substrate is provided with reflecting layer, and the reflecting layer can improve the reflectivity of wavelength light between 190-1100nm.
2. the high reflective mirror of a kind of wide spectrum according to claim 1, it is characterised in that:The reflecting layer is by five layer material films Composition.
3. the high reflective mirror of a kind of wide spectrum according to claim 2, it is characterised in that:The second layer of five layer material film Material membrane is identical with the material of the 4th layer material film.
4. the high reflective mirror of a kind of wide spectrum according to Claims 2 or 3, it is characterised in that:The material membrane passes through physics The method plating of plated film is on the glass substrate.
5. the high reflective mirror of a kind of wide spectrum according to claim 1, it is characterised in that:The thickness in the reflecting layer is less than glass The thickness of glass substrate.
6. the high reflective mirror of a kind of wide spectrum according to claim any one of 1-5, it is characterised in that:The material membrane is nothing Machine material membrane, by silica, alundum (Al2O3), magnesium fluoride, magnesia, hafnium oxide, metallic aluminium or these two or more things The mixture of matter is constituted.
CN201710282344.XA 2017-04-26 2017-04-26 A kind of high reflective mirror of wide spectrum Pending CN107092046A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710282344.XA CN107092046A (en) 2017-04-26 2017-04-26 A kind of high reflective mirror of wide spectrum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710282344.XA CN107092046A (en) 2017-04-26 2017-04-26 A kind of high reflective mirror of wide spectrum

Publications (1)

Publication Number Publication Date
CN107092046A true CN107092046A (en) 2017-08-25

Family

ID=59638045

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710282344.XA Pending CN107092046A (en) 2017-04-26 2017-04-26 A kind of high reflective mirror of wide spectrum

Country Status (1)

Country Link
CN (1) CN107092046A (en)

Citations (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4101707A (en) * 1977-04-04 1978-07-18 Rockwell International Corporation Homogeneous multilayer dielectric mirror and method of making same
CN1122126A (en) * 1994-01-10 1996-05-08 皮尔金顿玻璃有限公司 Coatings on glass
CN1327162A (en) * 2000-06-05 2001-12-19 富士写真光机株式会社 Aluminium reflector and its preparing method
CN1427959A (en) * 2000-05-09 2003-07-02 艾尔坎技术及管理有限公司 Reflector
CN1441263A (en) * 2003-04-08 2003-09-10 中国科学院西安光学精密机械研究所 High-reflectivity high-damage threshold superwide-band fs laser reflector
CN1477407A (en) * 2003-07-11 2004-02-25 中国科学院上海光学精密机械研究所 Wide-angle and wide-spectrum reflecting membrane and its preparation method
CN1527100A (en) * 2003-09-24 2004-09-08 �Ϻ���ͨ��ѧ Setting method and device for continuously gradual periodical wide band omnibearing all-medium reflector
CN1530669A (en) * 2003-02-28 2004-09-22 ������������ʽ���� Reflective mirror and optical instrument therewith
CN1744989A (en) * 2002-12-20 2006-03-08 日真光学技术有限公司 Optical coatings for ultraviolet and infrared reflection
CN1882855A (en) * 2003-11-21 2006-12-20 伊斯曼柯达公司 Highly reflective optical element
CN1940599A (en) * 2005-09-28 2007-04-04 精碟科技股份有限公司 Optical component
CN101002114A (en) * 2004-06-11 2007-07-18 日本瑞翁株式会社 Reflection preventing laminated body and optical member
CN101393276A (en) * 2007-09-21 2009-03-25 鸿富锦精密工业(深圳)有限公司 Wide-band antireflective film and optical element with the wide-band antireflective film
CN102239433A (en) * 2008-12-04 2011-11-09 优泊公司 Light reflector and planar light source device using same
CN102439491A (en) * 2009-03-13 2012-05-02 喷射金属技术公司 Anticorrosion mirror, method for producing same, and uses thereof in solar energy collection
CN102707350A (en) * 2012-06-19 2012-10-03 宜兴市晶科光学仪器有限公司 Ultraviolet visible band high-reflectance high-stability reflecting mirror and preparation method thereof
CN102749667A (en) * 2012-07-28 2012-10-24 杭州科汀光学技术有限公司 Optical filter for image chip
CN103874939A (en) * 2011-10-13 2014-06-18 韶华欧洲有限责任公司 Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same
CN203673094U (en) * 2014-01-02 2014-06-25 杭州科汀光学技术有限公司 Reflecting mirror
CN104345362A (en) * 2014-10-18 2015-02-11 中山市创科科研技术服务有限公司 Metallic film reflector and manufacturing method thereof
CN104407405A (en) * 2014-04-24 2015-03-11 深圳大学 Mirror with variable reflectivity
CN104428698A (en) * 2012-07-10 2015-03-18 柯尼卡美能达株式会社 Infrared shielding film having dielectric multilayer film structure
CN104459848A (en) * 2014-11-27 2015-03-25 中国科学院长春光学精密机械与物理研究所 Aluminum-silver multilayer broadband reflection film based on aluminum oxide interlayer
CN204989523U (en) * 2015-09-02 2016-01-20 浙江星星瑞金科技股份有限公司 Window protection screen with infrared ultraviolet is by function
CN105974501A (en) * 2014-08-15 2016-09-28 丰田自动车工程及制造北美公司 Non-color shifting multilayer structure and protective coating on the same
CN106068467A (en) * 2013-09-18 2016-11-02 玻璃与陶瓷研究有限公司卢森堡中心 Dielectric mirror

Patent Citations (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4101707A (en) * 1977-04-04 1978-07-18 Rockwell International Corporation Homogeneous multilayer dielectric mirror and method of making same
CN1122126A (en) * 1994-01-10 1996-05-08 皮尔金顿玻璃有限公司 Coatings on glass
CN1427959A (en) * 2000-05-09 2003-07-02 艾尔坎技术及管理有限公司 Reflector
CN1327162A (en) * 2000-06-05 2001-12-19 富士写真光机株式会社 Aluminium reflector and its preparing method
CN1744989A (en) * 2002-12-20 2006-03-08 日真光学技术有限公司 Optical coatings for ultraviolet and infrared reflection
CN1530669A (en) * 2003-02-28 2004-09-22 ������������ʽ���� Reflective mirror and optical instrument therewith
CN1441263A (en) * 2003-04-08 2003-09-10 中国科学院西安光学精密机械研究所 High-reflectivity high-damage threshold superwide-band fs laser reflector
CN1477407A (en) * 2003-07-11 2004-02-25 中国科学院上海光学精密机械研究所 Wide-angle and wide-spectrum reflecting membrane and its preparation method
CN1527100A (en) * 2003-09-24 2004-09-08 �Ϻ���ͨ��ѧ Setting method and device for continuously gradual periodical wide band omnibearing all-medium reflector
CN1882855A (en) * 2003-11-21 2006-12-20 伊斯曼柯达公司 Highly reflective optical element
CN101002114A (en) * 2004-06-11 2007-07-18 日本瑞翁株式会社 Reflection preventing laminated body and optical member
CN1940599A (en) * 2005-09-28 2007-04-04 精碟科技股份有限公司 Optical component
CN101393276A (en) * 2007-09-21 2009-03-25 鸿富锦精密工业(深圳)有限公司 Wide-band antireflective film and optical element with the wide-band antireflective film
CN102239433A (en) * 2008-12-04 2011-11-09 优泊公司 Light reflector and planar light source device using same
CN102439491A (en) * 2009-03-13 2012-05-02 喷射金属技术公司 Anticorrosion mirror, method for producing same, and uses thereof in solar energy collection
CN103874939A (en) * 2011-10-13 2014-06-18 韶华欧洲有限责任公司 Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same
CN102707350A (en) * 2012-06-19 2012-10-03 宜兴市晶科光学仪器有限公司 Ultraviolet visible band high-reflectance high-stability reflecting mirror and preparation method thereof
CN104428698A (en) * 2012-07-10 2015-03-18 柯尼卡美能达株式会社 Infrared shielding film having dielectric multilayer film structure
CN102749667A (en) * 2012-07-28 2012-10-24 杭州科汀光学技术有限公司 Optical filter for image chip
CN106068467A (en) * 2013-09-18 2016-11-02 玻璃与陶瓷研究有限公司卢森堡中心 Dielectric mirror
CN203673094U (en) * 2014-01-02 2014-06-25 杭州科汀光学技术有限公司 Reflecting mirror
CN104407405A (en) * 2014-04-24 2015-03-11 深圳大学 Mirror with variable reflectivity
CN105974501A (en) * 2014-08-15 2016-09-28 丰田自动车工程及制造北美公司 Non-color shifting multilayer structure and protective coating on the same
CN104345362A (en) * 2014-10-18 2015-02-11 中山市创科科研技术服务有限公司 Metallic film reflector and manufacturing method thereof
CN104459848A (en) * 2014-11-27 2015-03-25 中国科学院长春光学精密机械与物理研究所 Aluminum-silver multilayer broadband reflection film based on aluminum oxide interlayer
CN204989523U (en) * 2015-09-02 2016-01-20 浙江星星瑞金科技股份有限公司 Window protection screen with infrared ultraviolet is by function

Similar Documents

Publication Publication Date Title
Wilbrandt et al. Protected and enhanced aluminum mirrors for the VUV
CN105372801B (en) A kind of solar blind UV camera lens and system
JP7475450B2 (en) Optical element having a protective coating, its method of manufacture and optical device - Patents.com
CN103018902A (en) Method for designing optical thin film systems
Furler Angular dependence of optical properties of homogeneous glasses
CN204166153U (en) A kind of spectro-film and beam splitter
Aurand et al. Creating circularly polarized light with a phase-shifting mirror
Ferencz et al. Recent developments of laser optical coatings in Hungary
CN107092046A (en) A kind of high reflective mirror of wide spectrum
CN105717564B (en) Depolarization pentagonal prism and preparation method thereof
Lappschies et al. Advanced dielectric coatings for the Euclid mission telescope manufactured by the PARMS process
US7256940B2 (en) Multi-layer thin-film broadband beam splitter with matched group delay dispersion
CN108287413A (en) A kind of 1064nm wave bands High Extinction Ratio high damage threshold half-angle polarization spectroscope production method
TW544534B (en) System capable of changing the wavelength and intensity of output light
CN205643757U (en) Depolarisation pentagonal prism
CN105463399B (en) The method for improving deep ultraviolet heavy caliber spherical optics element membrane system uniformity
van Nijnatten A spectrophotometer accessory for directional reflectance and transmittance of coated glazing
US10359544B2 (en) Long-wave infrared anti-reflective laminate
Lappschies et al. Extension of ion beam sputtered oxide mixtures into the UV spectral range
US20160195656A1 (en) Structure of ultraviolet light polarization component and manufacturing process therefor
US20070099001A1 (en) Blister resistant optical coatings
JP2005258050A (en) Reflection mirror and image projection device using the same
Rudisill et al. Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application
Habel et al. Octave spanning wedge dispersive mirrors with low dispersion oscillations
CN210222375U (en) Spectroscope of neutral beam splitting membrane combined by metal medium

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20170825