CN106886339B - A kind of touch sensing and preparation method - Google Patents
A kind of touch sensing and preparation method Download PDFInfo
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- CN106886339B CN106886339B CN201710151639.3A CN201710151639A CN106886339B CN 106886339 B CN106886339 B CN 106886339B CN 201710151639 A CN201710151639 A CN 201710151639A CN 106886339 B CN106886339 B CN 106886339B
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0414—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using force sensing means to determine a position
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
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- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
- Measuring Fluid Pressure (AREA)
Abstract
It includes substrate, hearth electrode, left supporting station, right supporting station, supporting surface, top electrode, supporting layer, pressure column and flexible layer that the present invention, which discloses a kind of touch sensing and preparation method, the touch sensing,；Hearth electrode is covered in substrate surface；Left supporting station and right supporting station are stood on substrate, and left supporting station and right supporting station height are identical；Supporting surface connects left supporting station and right supporting station；Top electrode is covered on above left supporting station and right supporting station；Supporting layer is covered in top electrode surface；Pressure column is stood on supporting layer；Flexible layer is laid in above pressure column.Touch sensing disclosed by the invention and preparation method, it is made improvements by structure to touch sensing and preparation method, provide the touch sensing that one kind is stable and reliable for performance, is hardly damaged and can be accurately positioned and measure actual pressure size, it relieves touch sensing and excessively relies on the limitation of material bring, processing efficiency is substantially increased, processing cost is reduced.
Description
Technical field
The present invention relates to touch screen and sensor technical fields, more particularly to a kind of touch sensing and preparation method.
Background technique
Touch screen as a kind of newest computer input apparatus, it be at present most simply, conveniently, a kind of naturally man-machine friendship
Mutual mode, it imparts multimedia with brand-new looks, is extremely attractive completely new multimedia interactive equipment, is mainly used in
The inquiry of public information, leader's office, Industry Control, military commanding, electronic game, choosing song or selecting dish, multimedia teaching, real estate
Presell etc..And touch sensing is that touch screen realizes the automatic primary link detected and automatically control.Skill is shown from flat-panel touch
Since art comes out, the performance for how optimizing sensor improves sensor and the compatibility of touch screen always is researcher very
The research direction of attention.
Traditional touch sensing mostly uses greatly sandwich structure, due to the limitation of its structure, conventional touch sensor
Function and stability be often not so good as people's will.It is traditional due to being too dependent on the characteristic of material itself and in terms of processing
Process for manufacturing touch panel cannot be compatible with traditional touch sensing technique, runs counter to desire.Although currently, some touch sensings
The function that can incude applied stress on different directions is realized, but still remains that structure is complicated, accuracy is low, manufacturing cost
Problem high, reliability is low.Requirement with people to touch sensing is higher and higher, can either realize that touch sensible again can be quasi-
It determines position and the sensor for measuring actual pressure size receives the concern of numerous scientific research personnel.
In past research process, traditional touch sensing depends on high performance sensing material, and seldom
It is improved in the structure of sensor, so that the performance of touch sensing is difficult to be greatly enhanced and break through,
In addition, the manufacturing process of traditional touch sensing is limited by sensing material temperature and other conditions, touch-control is caused to sense
Device manufacturing cost is high, processing efficiency is low.The present invention is focused on and is made improvements in the structure and preparation method of sensor, to provide
A kind of stable and reliable for performance, touch sensing for being hardly damaged and being accurately positioned and measure actual pressure size, and solve
In addition to touch sensing excessively relies on the limitation of material bring, substantially increases processing efficiency and reduce processing cost.
Summary of the invention
The object of the present invention is to provide a kind of touch sensing and preparation methods, pass through the structure and system to touch sensing
Preparation Method makes improvements, provide it is a kind of it is stable and reliable for performance, be hardly damaged and can be accurately positioned and to measure actual pressure big
Small touch sensing, and relieve touch sensing and excessively rely on the limitation of material bring, processing efficiency is substantially increased, is dropped
Low processing cost.
To achieve the above object, the present invention provides following schemes:
A kind of touch sensing, the touch sensing include: substrate, hearth electrode, left supporting station, right supporting station, support
Face, top electrode, supporting layer, pressure column and flexible layer；The hearth electrode is covered in the substrate surface；The left supporting station and
The right supporting station is stood on the substrate, and the left supporting station and the right supporting station height are identical；The hearth electrode connection
The left supporting station and the right supporting station bottom；The supporting surface connects the left supporting station and the right supporting station；It is described
Top electrode is covered on above the left supporting station and the right supporting station；The supporting layer is covered in the top electrode surface；Institute
Pressure column is stated to stand on the supporting layer；The flexible layer is laid in above the pressure column.
Optionally, the left supporting station and the right supporting station and the substrate are in set angle；Outside the left supporting station
Side and substrate left side edge distance are h, and on the outside of the right supporting station and substrate right side edge distance is h；The left side
Supporting station and the right supporting station do not contact；The junction of the supporting surface and the left supporting station is located at the left supporting station
The junction of the upper half, the supporting surface and the right supporting station is located at the upper half of the right supporting station；The top electrode connects
It connects at the top of the left supporting station and the right supporting station；The hearth electrode, the left supporting station, the right supporting station and the top
Electrode collectively constitutes a trapezium structure.
Optionally, the thickness of the top electrode is less than the thickness of the hearth electrode；The thickness of the supporting layer is less than described
The thickness of top electrode；The pressure column is cylindrical shape structure, the left supporting station and the right supporting station inside top distance
For d, the diameter of the pressure column is d/2, the pressure pillar height 2mm.
Optionally, the substrate is parallel with the hearth electrode；The hearth electrode is parallel with the supporting surface；The supporting surface
It is parallel with the top electrode；The top electrode is parallel with the supporting layer；The supporting layer is parallel with the flexible layer；It is described soft
Property slice width degree is consistent with the substrate width.
The invention also discloses a kind of touch sensing preparation methods, which comprises
The uniform metal film of a layer thickness is sputtered on through over cleaning and dry substrate, using figure photoetching process by institute
Stating metal film etching is hearth electrode；
Left supporting station, right supporting station and supporting surface, the left side are processed on the hearth electrode using minute manufacturing technique
Supporting station and the right supporting station are stood on the substrate, and the supporting surface connects the left supporting station and the right supporting station；
One layer of metal material is covered on the left supporting station and the right supporting station using minute manufacturing technique, using figure
Shape photoetching process etches the metal material for top electrode；
One layer of insulating rubber material in the spin coating of the top electrode surface, using figure photoetching process by the electro-insulating rubber
Material etch is supporting layer；
The one strata dimethyl siloxane insulating rubber material of spin coating above the supporting layer, will using figure photoetching process
The dimethyl silicone polymer insulating rubber material is etched into single cylindrical body as pressure column；
Polyimide flex material is covered on the pressure column, processing forms flexible layer.
Optionally, described that left supporting station, right supporting station and branch are processed on the hearth electrode using minute manufacturing technique
Support face, the left supporting station and the right supporting station are stood on the substrate, and the supporting surface connects the left supporting station and institute
Stating right supporting station includes:
The left supporting station, the right branch are processed using insulating materials on the hearth electrode using minute manufacturing technique
Cushion cap and the supporting surface, the hearth electrode connect the left supporting station and the right supporting station bottom；
The left supporting station and the right supporting station are stood on the substrate, and the left supporting station and the right supporting station are high
Spend identical, the left supporting station and the right supporting station and the substrate are in set angle；On the outside of the left supporting station with it is described
Substrate left side edge distance is h, and on the outside of the right supporting station and substrate right side edge distance is h；The left supporting station and
The right supporting station does not contact；
The supporting surface is parallel with the hearth electrode；The supporting surface connects the left supporting station and the right supporting station,
The junction of the supporting surface and the left supporting station is located at the upper half of the left supporting station, the supporting surface and the right branch
The junction of cushion cap is located at the upper half of the right supporting station.
Optionally, described that one layer of metal is covered on the left supporting station and the right supporting station using minute manufacturing technique
Material, uses figure photoetching process to etch the metal material to include: for top electrode
The uniform metal of a layer thickness is covered on the left supporting station and the right supporting station using minute manufacturing technique
Material, the thickness of the metal material are less than the thickness of the hearth electrode；
The metal material is set completely to connect the left supporting station and the right branch by figure photoetching and etching technics
At the top of cushion cap, the top electrode is formed；The top electrode is parallel with the supporting surface；The hearth electrode, the left supporting station, institute
It states right supporting station and the top electrode collectively constitutes a trapezium structure.
Optionally, one layer of insulating rubber material in the spin coating of the top electrode surface, will using figure photoetching process
The insulating rubber material etches as supporting layer
After the top electrode is formed, the uniform insulating rubber material of a layer thickness in the spin coating of the top electrode surface,
The thickness of the insulating rubber material is less than the thickness of the top electrode；
Low-temperature annealing processing is carried out to the insulating rubber material, the insulation after annealing is made using photolithographic patterning process
The top electrode is completely covered in rubber material, forms the supporting layer.
Optionally, the one strata dimethyl siloxane insulating rubber material of the spin coating above the supporting layer, using figure
The dimethyl silicone polymer insulating rubber material is etched into single cylindrical body as pressure column by shape photoetching process
After the supporting layer is formed, in the one strata dimethyl siloxane electro-insulating rubber of top spin coating of the supporting layer
Film, the dimethyl silicone polymer electro-insulating rubber film with a thickness of 2mm；
The electro-insulating rubber film is made annealing treatment；
The dimethyl silicone polymer electro-insulating rubber film after annealing is etched into individually using photolithographic patterning process
Cylindrical body is as pressure column, and the left supporting station and the right supporting station inside top distance are d, and the diameter of the pressure column is
d/2。
Optionally, described that polyimide flex material is covered on the pressure column, processing forms flexible layer and includes:
The polyimide flex material that spin coating a layer thickness is 8 μm on the glass substrate cleaned up, in 350 DEG C of conditions
Lower annealing 1 hour, is then removed the polyimide flex material using the method for mechanical stripping from glass substrate
Get off, is laid in above the pressure column；
Make the polyimide flex material and the substrate-parallel, processing forms consistent described with the substrate width
Flexible layer.
The specific embodiment provided according to the present invention, the invention discloses following technical effects:
1, the invention proposes a kind of new structural touch sensing, support knot is used for multiple times in the touch sensing
Structure come prevent as stress concentrate or no to scale and caused by sensor degradation, ensure that the reliable work of touch sensing
Make, and the touch sensing can either realize touch sensible, and can be accurately positioned, moreover it is possible to it is big to measure actual pressure
It is small.
2, for conventional touch sensor when realizing the detection of pressure, detection accuracy depends on the property of sensor material
Can, it is necessary to using be quick on the draw, expensive pressure sensitive.And a kind of touch sensing proposed by the present invention and its preparation side
Method realizes the measurement of pressure position and size by improving the structure of touch sensing, relieves conventional touch sensor mistake
Divide and rely on the limitation of material bring, substantially increases processing efficiency and reduce processing cost.
Detailed description of the invention
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the invention
Example, for those of ordinary skill in the art, without any creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the schematic cross-section of touch sensing embodiment of the present invention；
Fig. 2 is the operation principle schematic diagram of touch sensing embodiment of the present invention；
Fig. 3 is the process flow chart of touch sensing preparation method of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The object of the present invention is to provide a kind of novel touch sensing devices and preparation method.
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing and specific real
Applying mode, the present invention is described in further detail.
Fig. 1 is the schematic cross-section of touch sensing embodiment of the present invention.
A kind of touch sensing as shown in Figure 1, the touch sensing include: substrate 101, hearth electrode 102, Zuo Zhicheng
Platform 103, right supporting station 104, supporting surface 105, top electrode 106, supporting layer 107, pressure column 108 and flexible layer 109.The bottom
Electrode 102 is covered in 101 surface of substrate.The left supporting station 103 and the right supporting station 104 stand on the substrate 101
On, the left supporting station 103 and 104 height of the right supporting station are identical.The hearth electrode 102 connects the left supporting station 103
With right 104 bottom of supporting station.The supporting surface 105 connects the left supporting station 103 and the right supporting station 104.It is described
Top electrode 106 is covered on 104 top of the left supporting station 103 and the right supporting station.The supporting layer 107 is covered in the top
106 surface of electrode.The pressure column 108 is stood on the supporting layer 107.The flexible layer 109 is laid in the pressure column
108 tops.
The left supporting station 103 and the right supporting station 104 and the substrate 101 are in set angle, the left supporting station
103 and the right supporting station 104 be inclined column structure.103 outside of left supporting station and 101 left side edge of substrate
Distance is h, and right 104 outside of supporting station and 101 right side edge of the substrate distance are h.The left supporting station 103 and described
Right supporting station 104 does not contact.
The supporting surface 105 is identical as the left supporting station 103 and 104 material of right supporting station.The supporting surface 105
It is located at the upper half of the left supporting station 103, the supporting surface 105 and the right branch with the junction of the left supporting station 103
The junction of cushion cap 104 is located at the upper half of the right supporting station 104.The hearth electrode 102 connects 103 He of left supporting station
104 bottom of right supporting station.The top electrode 106 connects 104 top of the left supporting station 103 and the right supporting station.Institute
It states hearth electrode 102, the left supporting station 103, the right supporting station 104 and the top electrode 106 and collectively constitutes a trapezoidal knot
Structure.
The space prismatoid shape structure that the touch sensing uses plays good supporting role to entire sensor,
Structure is simple and stablizes.
Wherein, the thickness of the top electrode 106 is less than the thickness of the hearth electrode 102.The thickness of the supporting layer 107 is small
In the thickness of the top electrode 106.
The pressure column 108 is cylindrical shape structure.The pressure column 108 stands on the centre bit of the supporting layer 107
It sets.The left supporting station 103 and 104 inside top of right supporting station distance are d, and the diameter of the pressure column 108 is d/2,
The pressure column 108 is 2mm high.
The substrate 101 is parallel with the hearth electrode 102.The hearth electrode 102 is parallel with the supporting surface 105.It is described
Supporting surface 105 is parallel with the top electrode 106.The top electrode 106 is parallel with the supporting layer 107.The supporting layer 107 with
The flexible layer 109 is parallel.The width of the flexible layer 109 and 101 equivalent width of substrate.
Fig. 2 is the operation principle schematic diagram of touch sensing embodiment of the present invention.
When touch sensing of the present invention is not by any external force, section morphology is as shown in Figure 1, the pressure drag film
104 and the supporting layer 105 be in natural horizontal state, at this time the resistance of the pressure drag film 104 be initial resistance.
When touch sensing of the present invention is not by any external force, section morphology is as shown in Figure 1, the top electrode
106, the supporting layer 107 and the flexible layer 109 are in natural horizontal state, at this time the top electrode 106 and the bottom
The distance between electrode 102 is initial distance.
As shown in Fig. 2, when touch sensing of the present invention is by extraneous pressure, the top electrode 106, the branch
Support layer 107 and the flexible layer 109 are in reclinate state, and the top electrode 106,107 and of the supporting layer
The bending degree of the flexible layer 109 changes with the variation of ambient pressure, at this time the top electrode 106 and the bottom
The distance between electrode 102 also with bending degree variation and change, then by the top electrode 106 and the bottom electricity
The capacitance that pole 102 is constituted also changes therewith.The extraneous pressure that the touch sensing is subject to can be then obtained by algorithm
Linearly or nonlinearly relationship between force value and the capacitance, so as to determine institute according to the capacitance size detected
State the ambient pressure value that touch sensing is subject to.
Further, each touch sensing can be fabricated to by touch surface in the form of network array
Plate, when there is external force to be applied on touch panel, since each touch sensing stress size is uneven, its available stress
The gradient of size, so that the application position of external force is determined according to maximum gradient, and according to touch sensing cell array, to sit
Target form represents the position of applied external force.
And when ambient pressure is excessive, the top electrode 106 and the supporting layer 107 are by the lower section supporting surface
105 support, bending degree reach maximum value, ensure that the deformation degree of the top electrode 106 and the supporting layer 107 exists
In its regime of elastic deformation.Meanwhile the supporting layer 107 plays the role of buffering and support, the pressure column 108 plays transmitting
The effect of pressure.
The present invention proposes a kind of novel touch sensing, touch-control sensing of the present invention from the angle of structure innovation
Device support construction is used for multiple times prevent as stress concentrate or no to scale and caused by sensor degradation, ensure that touch-control
The reliably working of sensor.The design for the trapezoidal support construction that the touch sensing uses can mention for entire sensor structure
For very reliable support, also ensuring the touch sensing, sensing capabilities are reliable and stable during the work time.In addition, trapezoidal
Support construction can play the role of the good protection to top electrode 106, avoid damaging sensor since application stress is excessive.By
Play the role of experiencing pressure in top electrode, therefore its top increases integrally-built bending resistance by a supporting surface 105
Qu Nengli.And it is real that touch sensing of the present invention makes full use of the flexible of top electrode while reliably working
The variation of existing capacitor, makes it that can either realize that touch sensible can be accurately positioned again and measure actual pressure size.
Fig. 3 is the process flow chart of touch sensing preparation method of the present invention.
Referring to Fig. 3, a kind of touch sensing preparation method, which comprises
Step 201: the uniform metal film of a layer thickness is sputtered on through over cleaning and dry substrate, using figure photoetching
Technique etches the metal film for hearth electrode.
Wherein, the hearth electrode width is less than the width of the substrate.
Step 202: processing left supporting station, right supporting station and support on the hearth electrode using minute manufacturing technique
Face, the left supporting station and the right supporting station are stood on the substrate, and the supporting surface connects the left supporting station and described
Right supporting station, specifically includes:
The left supporting station, the right branch are processed using insulating materials on the hearth electrode using minute manufacturing technique
Cushion cap and the supporting surface, the hearth electrode connect the left supporting station and the right supporting station bottom；
The left supporting station and the right supporting station are stood on the substrate, and the left supporting station and the right supporting station are high
Spend identical, the left supporting station and the right supporting station and the substrate are in set angle, the left supporting station and the right branch
Cushion cap is inclined column structure；It is h with the substrate left side edge distance on the outside of the left supporting station, outside the right supporting station
Side and substrate right side edge distance are h；The left supporting station and the right supporting station do not contact；
The supporting surface is parallel with the hearth electrode；The supporting surface connects the left supporting station and the right supporting station,
The junction of the supporting surface and the left supporting station is located at the upper half of the left supporting station, the supporting surface and the right branch
The junction of cushion cap is located at the upper half of the right supporting station.
Step 203: one layer of metal material is covered on the left supporting station and the right supporting station using minute manufacturing technique
Material, uses figure photoetching process to etch the metal material for top electrode, specifically includes:
The uniform metal of a layer thickness is covered on the left supporting station and the right supporting station using minute manufacturing technique
Material, the thickness of the metal material are less than the thickness of the hearth electrode；
The metal material is set completely to connect the left supporting station and the right branch by figure photoetching and etching technics
At the top of cushion cap, the top electrode is formed；The top electrode is parallel with the supporting surface；The hearth electrode, the left supporting station, institute
It states right supporting station and the top electrode collectively constitutes a trapezium structure.
Wherein, the metal material metal material high using good bandability, conductivity.
Step 204: one layer of insulating rubber material in the spin coating of the top electrode surface, it will be described using figure photoetching process
Insulating rubber material etching is supporting layer, is specifically included:
After the top electrode is formed, the uniform insulating rubber material of a layer thickness in the spin coating of the top electrode surface,
The thickness of the insulating rubber material is less than the thickness of the top electrode；
Low-temperature annealing processing is carried out to the insulating rubber material, eliminates surface residual stress；
The insulating rubber material after annealing is set to be completely covered the top electrode using photolithographic patterning process, described in formation
Supporting layer.
Wherein, play the role of buffering and support using one layer of insulating rubber material in spin coating.
Step 205: the one strata dimethyl siloxane insulating rubber material of spin coating above the supporting layer, using figure light
The dimethyl silicone polymer insulating rubber material is etched into single cylindrical body as pressure column by carving technology, is specifically included:
After the supporting layer is formed, in one layer of PDMS (dimethyl silicone polymer) insulation of top spin coating of the supporting layer
Rubber membrane, the PDMS electro-insulating rubber film with a thickness of 2mm；
The PDMS electro-insulating rubber film is made annealing treatment, annealing temperature requires control within the scope of a quota；
The dimethyl silicone polymer electro-insulating rubber film after annealing is etched into individually using photolithographic patterning process
Cylindrical body plays the role of transmitting pressure, the pressure column is vertical with the supporting layer as pressure column；
The left supporting station and the right supporting station inside top distance are d, and the diameter of the pressure column is d/2, error
Control is in 1 μ m.
Step 206: polyimide flex material is covered on the pressure column, processing forms flexible layer, it specifically includes:
PI (polyimides) flexible material that spin coating a layer thickness is 8 μm on the glass substrate cleaned up, at 350 DEG C
Under the conditions of make annealing treatment 1 hour, then using the method for mechanical stripping by the PI (polyimides) flexible material from glass base
It strips down, is laid in above the pressure column on plate；
Make the PI (polyimides) flexible material and the substrate-parallel, processing forms consistent with the substrate width
The flexible layer.
For conventional touch sensor when realizing the detection of pressure, detection accuracy depends on the property of sensor material
Can, it is necessary to using be quick on the draw, expensive pressure sensitive.And a kind of touch sensing proposed by the present invention and its preparation side
Method mainly realizes the measurement of pressure position and size by the new structure of touch sensing, relieves conventional touch sensing
Device excessively relies on the limitation of material bring, substantially increases processing efficiency and reduces processing cost.
Used herein a specific example illustrates the principle and implementation of the invention, and above embodiments are said
It is bright to be merely used to help understand method and its core concept of the invention；At the same time, for those skilled in the art, foundation
Thought of the invention, there will be changes in the specific implementation manner and application range.In conclusion the content of the present specification is not
It is interpreted as limitation of the present invention.
Claims (10)
1. a kind of touch sensing characterized by comprising substrate, hearth electrode, left supporting station, right supporting station, supporting surface, top
Electrode, supporting layer, pressure column and flexible layer；The hearth electrode is covered in the substrate surface；The left supporting station and described
Right supporting station is stood on the substrate, and the left supporting station and the right supporting station height are identical；Described in the hearth electrode connection
Left supporting station and the right supporting station bottom；The supporting surface connects the left supporting station and the right supporting station；The top electricity
Pole is covered on above the left supporting station and the right supporting station；The supporting layer is covered in the top electrode surface；The pressure
Power column is stood on the supporting layer；The flexible layer is laid in above the pressure column.
2. touch sensing as described in claim 1, which is characterized in that the left supporting station and the right supporting station with it is described
Substrate is in set angle；On the outside of the left supporting station and substrate left side edge distance is h, the right supporting station outside and institute
Stating substrate right side edge distance is h；The left supporting station and the right supporting station do not contact；The supporting surface and the left bearing
The junction of platform is located at the upper half of the left supporting station, and the junction of the supporting surface and the right supporting station is located at the right side
The upper half of supporting station；The top electrode connects at the top of the left supporting station and the right supporting station；The hearth electrode, the left side
Supporting station, the right supporting station and the top electrode collectively constitute a trapezium structure, wherein the left supporting station and the right side
Supporting station respectively constitutes the waist of the trapezium structure, and the top electrode constitutes the upper bottom of the trapezium structure, the hearth electrode structure
At the bottom of the trapezium structure.
3. touch sensing as described in claim 1, which is characterized in that the thickness of the top electrode is less than the hearth electrode
Thickness；The thickness of the supporting layer is less than the thickness of the top electrode；The pressure column is cylindrical shape structure, the left bearing
Platform and the right supporting station inside top distance are d, and the diameter of the pressure column is d/2, the pressure pillar height 2mm.
4. touch sensing as described in claim 1, which is characterized in that the substrate is parallel with the hearth electrode；The bottom
Electrode is parallel with the supporting surface；The supporting surface is parallel with the top electrode；The top electrode is parallel with the supporting layer；Institute
It is parallel with the flexible layer to state supporting layer；The flexible layer width is consistent with the substrate width.
5. a kind of touch sensing preparation method, which is characterized in that the described method includes:
The uniform metal film of a layer thickness is sputtered on through over cleaning and dry substrate, using figure photoetching process by the gold
Belonging to film etching is hearth electrode；
Left supporting station, right supporting station and supporting surface, the left bearing are processed on the hearth electrode using minute manufacturing technique
Platform and the right supporting station are stood on the substrate, and the supporting surface connects the left supporting station and the right supporting station；
One layer of metal material is covered on the left supporting station and the right supporting station using minute manufacturing technique, using figure light
Carving technology etches the metal material for top electrode；
One layer of insulating rubber material in the spin coating of the top electrode surface, using figure photoetching process by the insulating rubber material
Etching is supporting layer；
The one strata dimethyl siloxane insulating rubber material of spin coating above the supporting layer, will be described using figure photoetching process
Dimethyl silicone polymer insulating rubber material is etched into single cylindrical body as pressure column；
Polyimide flex material is covered on the pressure column, processing forms flexible layer.
6. according to the method described in claim 5, it is characterized in that, described added on the hearth electrode using minute manufacturing technique
Work goes out left supporting station, right supporting station and supporting surface, and the left supporting station and the right supporting station are stood on the substrate, the branch
Support face connects the left supporting station and the right supporting station specifically includes:
The left supporting station, the right supporting station are processed using insulating materials on the hearth electrode using minute manufacturing technique
With the supporting surface, the hearth electrode connects the left supporting station and the right supporting station bottom；
The left supporting station and the right supporting station are stood on the substrate, the left supporting station and the right supporting station height phase
Together, the left supporting station and the right supporting station and the substrate are in set angle；The left supporting station outside and the substrate
Left side edge distance is h, and on the outside of the right supporting station and substrate right side edge distance is h；The left supporting station and described
Right supporting station does not contact；
The supporting surface is parallel with the hearth electrode；The supporting surface connects the left supporting station and the right supporting station, described
The junction of supporting surface and the left supporting station is located at the upper half of the left supporting station, the supporting surface and the right supporting station
Junction be located at the upper half of the right supporting station.
7. according to the method described in claim 5, it is characterized in that, it is described using minute manufacturing technique in the left supporting station and
On the right supporting station cover one layer of metal material, use figure photoetching process by the metal material etch for top electrode it is specific
Include:
The uniform metal material of a layer thickness is covered on the left supporting station and the right supporting station using minute manufacturing technique,
The thickness of the metal material is less than the thickness of the hearth electrode；
The metal material is set completely to connect the left supporting station and the right supporting station by figure photoetching and etching technics
The top electrode is formed on top；The top electrode is parallel with the supporting surface；The hearth electrode, the left supporting station, the right side
Supporting station and the top electrode collectively constitute a trapezium structure.
8. according to the method described in claim 5, it is characterized in that, one layer of insulation rubber in the spin coating of the top electrode surface
Glue material uses figure photoetching process to etch the insulating rubber material and specifically includes for supporting layer:
After the top electrode is formed, the uniform insulating rubber material of a layer thickness, described in the spin coating of the top electrode surface
The thickness of insulating rubber material is less than the thickness of the top electrode；
Low-temperature annealing processing is carried out to the insulating rubber material, the electro-insulating rubber after annealing is made using photolithographic patterning process
The top electrode is completely covered in material, forms the supporting layer.
9. according to the method described in claim 5, it is characterized in that, the one strata dimethyl of the spin coating above the supporting layer
The dimethyl silicone polymer insulating rubber material is etched into individually by siloxanes insulating rubber material using figure photoetching process
Cylindrical body is specifically included as pressure column:
After the supporting layer is formed, in the one strata dimethyl siloxane electro-insulating rubber film of top spin coating of the supporting layer, institute
State dimethyl silicone polymer electro-insulating rubber film with a thickness of 2mm；
The electro-insulating rubber film is made annealing treatment；
The dimethyl silicone polymer electro-insulating rubber film after annealing is etched by single cylinder using photolithographic patterning process
Body is as pressure column, and the left supporting station and the right supporting station inside top distance are d, and the diameter of the pressure column is d/2.
10. according to the method described in claim 5, it is characterized in that, described be covered on the pressure for polyimide flex material
On power column, processing forms flexible layer and specifically includes:
The polyimide flex material that spin coating a layer thickness is 8 μm on the glass substrate cleaned up, is moved back under the conditions of 350 DEG C
Fire processing 1 hour, is then stripped down the polyimide flex material using the method for mechanical stripping from glass substrate,
It is laid in above the pressure column；
Make the polyimide flex material and the substrate-parallel, processing is formed and the consistent flexibility of the substrate width
Layer.
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