CN106445210B - Touch panel and touch display device - Google Patents
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- CN106445210B CN106445210B CN201510473491.6A CN201510473491A CN106445210B CN 106445210 B CN106445210 B CN 106445210B CN 201510473491 A CN201510473491 A CN 201510473491A CN 106445210 B CN106445210 B CN 106445210B
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Abstract
The invention discloses a touch panel and a touch display device, wherein the touch panel comprises: a cover plate; folding deviceThe emissivity matching layer is positioned below the cover plate; the touch device is positioned below the refractive index matching layer; and an optical matching layer under the touch device, wherein the refractive index matching layer comprises a first low refractive index dielectric layer and a first high refractive index dielectric layer, wherein the first low refractive index dielectric layer is in direct contact with the upper surface of the touch device, and the first high refractive index dielectric layer is positioned between the first low refractive index dielectric layer and the cover plate, wherein the optical matching layer comprises a second low refractive index dielectric layer and a second high refractive index dielectric layer, wherein the second low refractive index dielectric layer is in direct contact with the lower surface of the touch device, and is positioned between the touch device and the second high refractive index dielectric layer, wherein the square resistance of the second high refractive index dielectric layer is more than 10 after ultraviolet light is irradiated 9 Ohmic each side.
Description
Technical Field
The present invention relates to a touch panel, and more particularly, to a touch panel structure and a touch display device including the same.
Background
Touch panels are widely used in electronic products such as household appliances, communication devices, and electronic information devices, gradually replace existing input interfaces such as physical keyboards and mice, and provide efficient operation interfaces. The current touch panel has developed a monolithic substrate structure in which the sensing electrode is directly formed on the protective cover. Although the touch panel with the structure is light and thin, if the sensing electrode is an etched pattern, the reflection of light between the etched area and the non-etched area is different, so that the appearance of the touch panel has optical problems such as chromatic aberration. Therefore, an optical compensation layer is arranged in the touch panel to improve the optical problem.
However, the use of the touch panel with the optical compensation layer in the ultraviolet environment has the problem of touch insensitivity, so a new touch panel structure is needed to overcome the above problems.
Disclosure of Invention
The invention aims to provide a touch panel and a touch display device, which are used for solving the problem that the touch panel with an optical compensation layer is insensitive to touch when being used in an ultraviolet environment.
In order to achieve the above object, a touch panel according to an embodiment of the present invention includes: a cover plate; the refractive index matching layer is positioned below the cover plate; the touch device is positioned below the refractive index matching layer; and an optical matching layer under the touch device, wherein the refractive index matching layer comprises a first low refractive index dielectric layer and a first high refractive index dielectric layer, wherein the first low refractive index dielectric layer is in direct contact with the upper surface of the touch device, and the first high refractive index dielectric layer is positioned between the first low refractive index dielectric layer and the cover plate, wherein the optical matching layer comprises a second low refractive index dielectric layer and a second high refractive index dielectric layer, wherein the second low refractive index dielectric layer is in direct contact with the lower surface of the touch device, and is positioned between the touch device and the second high refractive index dielectric layer, wherein the square resistance of the second high refractive index dielectric layer is more than 10 after ultraviolet light is irradiated 9 Ohmic each side.
In another embodiment of the present invention, a touch display device includes: the touch panel; and a display panel under the touch panel, wherein the touch device comprises: a sense electrode region; the metal wiring area is positioned at the periphery of the sensing electrode area; wherein the display panel includes: a display region substantially corresponding to the sensing electrode region; and the frame area corresponds to the metal wiring area.
Since the second high refractive index dielectric layer of the invention has a resistance value of more than 10 after ultraviolet light irradiation 9 And in each ohm direction, the influence of free carriers generated after the optical adhesive and the second high-refractive-index dielectric layer irradiate ultraviolet light on the back-end processor when the back-end processor detects the touch device is reduced, and the touch sensitivity is increased.
Drawings
FIG. 1 is a cross-sectional view of a touch panel according to an embodiment of the invention;
fig. 2A to 2D are top views illustrating a manufacturing process of a touch device according to an embodiment of the invention;
FIG. 3 is a cross-sectional view of a touch panel according to an embodiment of the invention;
FIG. 4 is a cross-sectional view of a touch display device according to an embodiment of the invention;
FIG. 5 is a schematic view showing the reflectivity of the composite structure of the cover plate, the reflective layer, and the anti-fouling layer for light with different wavelengths according to an embodiment of the present invention;
FIG. 6 is a schematic diagram showing the reflectivity of the composite structure of the cover plate and the index matching layer for light with different wavelengths according to an embodiment of the present invention;
FIG. 7 is a schematic diagram showing the reflectivity of the composite structure of the transparent conductive pattern and the optical matching layer for light with different wavelengths according to an embodiment of the present invention.
Symbol description
10 touch panel
21A, 23A touch electrode
21B, 23B connection electrode
27A, 27B contact holes
24 metal wiring
25 dielectric layer
40 touch display device
45 display panel
45A display area
45B border region
47 optical cement
100 cover plate
101 index matching layer
101H, 107H high refractive index dielectric layers
101L, 107L low refractive index dielectric layers
103 touch device
103A sense electrode region
103B metal wiring area
107 optical matching layer
109 transparent protective layer
301 antireflective layer
Detailed Description
The invention will be further described in detail with reference to the drawings and detailed description. Various embodiments will be provided next to practice the invention. It is to be understood that these examples are intended to illustrate and not to limit the invention. In addition, the first component is formed on the second component, meaning that the first component and the second component may be in direct contact, or with additional components interposed between the first component and the second component (without direct contact). The directional terms "upper" and "lower" are used only to describe the relative positions in the drawings. When the device in the figures is rotated to other orientations, it is possible to have other relative orientations. Moreover, the components are not necessarily to scale in order to clearly and concisely illustrate the drawings.
Fig. 1 is a cross-sectional view of a touch panel 10 according to an embodiment of the invention. The touch panel 10 has a cover plate 100, an index matching layer 101 under the cover plate 100, a touch device 103 under the index matching layer 101, and an optical matching layer 107 under the touch device 103. The cover 100 may be a reinforced cover, and may be used to support the touch device 103, as well as provide a rigid protection. In one embodiment, the formation method of the reinforced cover plate can be a chemical ion exchange or similar manufacturing process. In one embodiment, the cover plate 100 is a transparent plate material such as glass or a polymer material. In another embodiment, the cover plate 100 is an acrylic thermoplastic material. Further, the thickness of the cover plate 100 may be between about 0.2mm to 2.0 mm. If the thickness of the cover plate 100 is too thick, the weight and volume of the touch panel 10 are increased. If the thickness of the cover plate 100 is too thin, it may not be possible to support the touch device 103 and other units formed thereunder.
In fig. 1, the index matching layer 101 includes a multilayer structure of a low refractive index dielectric layer 101L and a high refractive index dielectric layer 101H. As shown in fig. 1, the low refractive index dielectric layer 101L directly contacts the upper surface of the touch device 103, and the first high refractive index dielectric layer 101H is located between the low refractive index dielectric layer 101L and the cover plate 100. Although the index matching layer 101 of fig. 1 is only a two-layer structure, it should be understood that it may be a multi-layer structure (from bottom to top) of 101L/101H/101L/101H … (the lowest layer is the low index dielectric layer 101L and the uppermost layer is the high index dielectric layer 101H), and the number of layers may be between 2 and 50. The index matching layer 101 is used to avoid the problem that the sensing electrode pattern of the touch device 103 interferes with the image displayed by the display device under the strong ambient light. In one embodiment of the present invention, the low refractive index dielectric layer 101L is thickA degree of between 25nm and 35nm and a refractive index of between 1.2 and 1.5; the high refractive index dielectric layer 101H has a thickness of 5nm to 15nm and a refractive index of 1.8 to 2.5. For example, the low refractive index dielectric layer 101L may be silicon oxide, while the high refractive index dielectric layer 101H may be niobium oxide (e.g., nb 2 O x ) Or silicon nitride (e.g. Si 3 N 4 ). If the thickness of the low refractive index dielectric layer 101L or the high refractive index dielectric layer 101H is too thick or too thin (or the refractive index is too high or too low), the anti-reflection effect cannot be achieved, i.e. the user may observe the sensing electrode pattern of the touch device 103 in sunlight.
The touch device 103 of fig. 1 is divided into a sensing electrode area 103A and a metal routing area 103B located at the periphery of the sensing electrode area 103A. Fig. 2A to 2D are top views of a manufacturing process of the touch device 103 according to an embodiment of the invention. As shown in fig. 2A, the sensing electrode regions 103A of the touch electrodes 21A and 23A and the connection electrode 23B are formed on the low refractive index dielectric layer 101L. The touch electrodes 23A in the same row are connected by connecting electrodes 23B. The touch electrodes 21A are independent of each other and are not connected to each other, and do not contact the touch electrode 23A and the connection electrode 23B. Although the touch electrodes 21A and 23A are diamond-shaped with the same area in the following embodiments and the drawings, it should be understood that the touch electrodes may take other shapes, such as triangle, quadrangle, hexagon, or other possible shapes, and not necessarily have the same area, as desired. In an embodiment of the invention, the touch electrodes 21A and 23A and the connection electrode 23B may be made of transparent conductive material such as Indium Tin Oxide (ITO), indium Zinc Oxide (IZO), fluorine doped tin oxide (FTO), aluminum doped zinc oxide (AZO), gallium doped zinc oxide (GZO), or the like, and the forming method may be sputtering a whole piece of transparent conductive material, then performing photolithography, or performing direct screen printing to form the touch electrode pattern. Then, metal traces 24 are formed in the metal trace regions 103B, which are connected to the terminal touch electrodes 21A. The thickness of the touch electrodes 21A and 23A and the connecting electrode 23B (i.e. transparent conductive pattern) is between 20nm and 30 nm. The refractive index of the transparent conductive pattern is greater than the refractive indices of the low refractive index dielectric layer 101L and the low refractive index dielectric layer 107L, the refractive index of the high refractive index dielectric layer 101H is greater than the refractive indices of the low refractive index dielectric layer 101L and the cover plate 100, and the refractive index of the high refractive index dielectric layer 107H is greater than the refractive index of the low refractive index dielectric layer 107L. In this way, the refractive index of the multi-layer structure of the touch panel 10 is arranged in a zigzag shape.
Next, as shown in fig. 2B, an insulating layer 25 is formed on the low refractive index dielectric layer 101L, the touch electrodes 21A and 23A, the connection electrode 23B, and the metal trace 24. The insulating layer 25 may be made of an inorganic material, such as silicon oxide or silicon nitride, or an organic material, such as photoresist, and may be formed by a chemical vapor deposition process, a physical vapor deposition process, or sputtering.
Next, as shown in fig. 2C, contact holes 27A are formed through the insulating layer 25 on the terminal touch electrode 21A, and contact holes 27B are formed through the insulating layers 25 on both sides of the touch electrode 21A. The contact holes 27A and 27B may be formed by photolithography and etching processes. Next, as shown in fig. 2D, the connection electrode 21B and the metal trace 24 are formed. In an embodiment of the present invention, the connection electrode 21B and the metal trace 24 may be made of metal such as silver, copper, aluminum, alloys thereof, or multi-layer structures thereof, and the forming method may be sputtering the whole metal layer, photolithography, or direct screen printing of the connection electrode pattern. The metal traces 24 in the metal trace region 103B may be further connected to pads (not shown) to be electrically connected to external circuits. It is understood that the touch electrode 23A may also be configured as a trace as described above to be electrically connected to the pad and the external circuit. The connection electrode 21B is located on the insulating layer 25 and electrically connects the adjacent touch electrodes 21A through the contact hole 27B, so that the touch electrodes 11A in the same row are electrically connected. Generally, in order to avoid the highly reflective metal trace 24 reflecting ambient light, a light shielding element (not shown) is additionally formed corresponding to the metal trace region 103B. The light shielding element may be a conventional Black Matrix (BM) located between the metal trace 24 and the low refractive index dielectric layer 101L, between the metal trace and the low refractive index dielectric layer 107L described later, or other suitable locations.
Returning to fig. 1, the optical matching layer 107 includes a low refractive index dielectric layer 107L and a high refractive index dielectric layer 107H. The low refractive index dielectric layer 107L directly contacts the lower surface of the touch device 103 and is located between the touch device 103 and the high refractive index dielectric layer 107H. The optical matching layer 107 is used to form optical matching with the sensing electrode region 103A. When ambient light reflects a reflected light after penetrating the cover plate 100 and the sensing electrode area 103A, the difference between the reflected light of the electrode pattern and the electrodeless pattern area in the sensing electrode area 103A can be adjusted. In this way, the optical matching layer 107 can compensate the reflectivity difference between the electrode pattern and the electrodeless pattern region, so that the reflection color of the ambient light reflected by the touch panel 10 is adjusted to be close to natural light without being blue or yellow. In an embodiment of the invention, the low refractive index dielectric layer 107L has a thickness of 15nm to 35nm and a refractive index of 1.2 to 1.5, and the high refractive index dielectric layer 107H has a thickness of 10nm to 20nm and a refractive index of 1.8 to 2.5. For example, the low refractive index dielectric layer 107L may be silicon oxide, and the high refractive index dielectric layer 107H may be silicon nitride. If the thickness of the low refractive index dielectric layer 107L or the high refractive index dielectric layer 107H is too thick or too thin (or the refractive index is too high or too low), the effect of adjusting the color tone of the reflected light cannot be achieved, that is, a user may see a bluish or yellowish image in sunlight due to the difference of the reflectivity between the electrode pattern and the electrodeless pattern in the sensing electrode region.
It is noted that the high refractive index dielectric layer 107H is then bonded to the display device via an optical adhesive. If the high refractive index dielectric layer 107H is made of metal oxide such as niobium oxide, in the manufacturing process that the high refractive index dielectric layer 107H contacts the optical cement and irradiates ultraviolet to harden, the high refractive index dielectric layer 107H (such as niobium oxide) may be reduced to a semiconductor, or the carriers (electrons or holes) of the high refractive index dielectric layer 107H may transition from a valence band (valence band) to a conduction band (conduction band) after ultraviolet irradiation, so that the free carriers of the high refractive index dielectric layer 107H are increased, and the square resistance of the high refractive index dielectric layer 107H is reduced. The optical cement 47 was irradiated with ultraviolet light (about 480J/cm) 2 Above, the surface of the optical adhesive 47 may also generate free carriers (or due to the interaction between the material of the high refractive index dielectric layer 107H and the optical adhesive 47), so that the free carriers between the high refractive index dielectric layer 107H and the optical adhesive 47 form a virtual capacitor (virtual capacitor) in the touch device 103, which affectsThe back-end processor measures the accuracy of whether the touch device 103 is touched by the proximity of the charged object.
Therefore, the material of the high refractive index dielectric layer 107H is selected such that the sheet resistance of the high refractive index dielectric layer 107H is still greater than 10 after being irradiated with ultraviolet light 9 Ohm per square (preferred embodiment is greater than 10) 10 Ohm per square), the silicon nitride meets the requirement that the resistance remains at 10 after ultraviolet irradiation 10 Ohm, therefore, silicon nitride is used as the high refractive index dielectric layer 107H to reduce the influence of free carriers generated after being irradiated with ultraviolet light on the back-end processor when detecting the touch device, and increase the sensitivity of touch. In addition, since the low dielectric constant material also helps to avoid decreasing the resistance (or increasing the conductivity) under uv light, in some embodiments, a material having a lower dielectric constant (dielectric value) than niobium oxide may be used as the high refractive index dielectric layer 107H. In addition, the high refractive index dielectric layer 101H can also have a resistance value of more than 10 after ultraviolet irradiation 9 Ohmic everything material (e.g. Si 3 N 4 ) A material having a low dielectric constant (for example, a K value (dielectric constant) of 20 or less) may be used.
It is noted that the metal trace 24 of the metal trace region 103B has a certain thickness, as shown in fig. 1. In this way, the thickness of the optical matching layer 107 corresponding to the metal trace region 103B is smaller than the thickness of the optical matching layer 107 corresponding to the sensing electrode region 103A. In some cases, the thickness of the optical matching layer 107 corresponding to the metal routing region 103B is less than 10nm. In this case, the optical matching layer 107 cannot effectively protect the metal traces 24. In this way, the metal traces 24 may be protected by a transparent protection layer 109 (e.g., gloss oil). In an embodiment of the invention, the thickness of the transparent protection layer 109 is between 20nm and 30 nm. If the thickness of the transparent protection layer 109 is too thin, the metal trace 24 cannot be further protected. If the thickness of the transparent protective layer 109 is too thick, the material cost increases. It should be noted that the transparent protection layer 109 only corresponds to the metal trace 24 and not corresponds to the sensing electrode region 103A. If the transparent protective layer 109 is formed on the optical matching layer 107 in an integrated manner, the optical matching effect is destroyed, and the image is bluish or yellowish.
In another embodiment of the present invention, the anti-reflection layer 301 may be formed on the cover plate 100 to further reduce the influence of ambient light on the image, and the refractive index of the anti-reflection layer is higher than that of the cover plate 100.
The index matching layer 101 can effectively mask the electrode pattern in the sensing electrode region 103A and reduce the light reflectivity of the incident ambient light. The optical matching layer 107 can protect the sensing electrode region 103A and improve the image color shift. On the other hand, since the high refractive index dielectric layer 107H in the optical matching layer 107 has a resistance value after irradiation of ultraviolet rays of still more than 10 9 In each ohm direction, the back-end processor can avoid misjudging the electrical property of the touch device 103. On the other hand, the transparent protection layer 109 can further protect the metal trace 24 from electrical defects, metal trace falling off, or metal trace breakage caused by the thin optical matching layer 107.
In an embodiment of the invention, the touch panel 10 is formed as follows: the method includes providing a cover plate 100, forming an index matching layer 101 on the cover plate 100, forming a touch device 103 on the index matching layer 101, and forming an optical matching layer 107 on the touch device 103. In other embodiments of the present invention, a transparent passivation layer 109 may be further formed on the optical matching layer 107, and the transparent passivation layer 109 only corresponds to the metal trace 24 and not corresponds to the electrode region 103A of the touch device 103.
The touch panel 10 can be matched with the display panel 45 to form the touch display device 40. The display panel 45 has a display area 45A and a frame area 45B. The display area 45A generally has a plurality of pixels, and a control unit (e.g., TFT) thereof is connected to the control circuit of the frame area 45B via the gate lines, the common electrode lines, and the data lines. The display panel 45 may be attached to the touch panel 10 by the optical adhesive 47, and the optical adhesive 47 directly contacts the high refractive index dielectric layer 107H. Since the high refractive index dielectric layer 107H is made of the contact optical adhesive 47 and the square resistance of the high refractive index dielectric layer 107H is larger than 10 when irradiated with ultraviolet 9 The material (such as silicon nitride) of each ohm can avoid the electrical failure of the touch device 103 caused by the optical adhesive 47 and the irradiation of ultraviolet rays. The display area 45A substantially corresponds to the sensing electrode area 103A, and is framedRegion 45B corresponds to metal trace region 103B. In one embodiment of the present invention, the display panel 45 may be a Liquid Crystal Display (LCD). In another embodiment, the display panel 45 may also be an electronic paper, an electronic reader, an electroluminescent display (ELD), an organic electroluminescent display (OELD), a Vacuum Fluorescent Display (VFD), a Light Emitting Diode (LED), a Cathode Ray Tube (CRT), a Plasma Display Panel (PDP), a digital optical processor (DLP), a liquid crystal on silicon display (LCoS), an Organic Light Emitting Diode (OLED), a surface conduction electron emission display (SED), a Field Emission Display (FED), a quantum dot laser television, a liquid crystal laser television, a ferroelectric liquid crystal display (FLD), an interferometric modulating display (iMOD), a thick film dielectric electroluminescent (TDEL), a quantum dot light emitting diode (QD-LED), a flexo pixel display (TPD), an organic light sensitive transistor (OLET), a photochromic display, a Laser Phosphor Display (LPD), or the like. The touch display device 40 can include, but is not limited to, an interactive advertisement system, a sales promotion ordering system, an entrance guard identification system, an information inquiry system, a withdrawal system, or a portable mobile device.
In order to make the above and other objects, features and advantages of the present invention more comprehensible, several embodiments accompanied with figures are described in detail below:
examples
Example 1
The glass substrate is used as the cover plate 100 shown in FIG. 3, and a 14.5nm thick high refractive material (such as Ti) is sequentially formed on the cover plate 100 3 O 5 ) Low refractive material (e.g. SiO) 24.5nm thick 2 ) 110nm high refractive index material (e.g. Ti 3 O 5 ) And 84nm low refractive index material (e.g. SiO 2 ) As the anti-reflection layer 301, and a 14nm anti-smudge layer is formed on the anti-reflection layer 301, the anti-smudge layer may be a fluoropolyether material such as perfluoropolyether organosiloxane. The reflectance of the above-described structure for light of different wavelengths is shown in fig. 5.
Example 2
A glass substrate was used as the cover plate 100 shown in fig. 1, and 9nm of niobium oxide (as the high refractive index dielectric layer 101H) and 28nm of silicon oxide (as the low refractive index dielectric layer 101L) were sequentially formed on the cover plate 100 as the refractive index matching layer 101. The reflectance of the above-described structure for light of different wavelengths is shown in fig. 6.
Example 3
A 25nm thick ITO layer was used as the transparent conductive pattern of the touch device 103 shown in fig. 1, and 32nm of silicon oxide (as the low refractive index dielectric layer 107L) and 15nm of silicon nitride (as the high refractive index dielectric layer 107H) were sequentially formed on the transparent conductive pattern as the optical matching layer 107. The reflectance of the above-described structure for light of different wavelengths is shown in fig. 7.
As can be seen from embodiments 2-3, the reflectivity of the refractive index matching layer 101 and the optical matching layer 107 for light with different wavelengths are complementary, and the combination of the two can effectively reduce the reflectivity of the touch panel for ambient light.
Although the present invention has been described with reference to the above embodiments, it should be understood that the invention is not limited thereto, but may be modified and altered by persons skilled in the art without departing from the spirit and scope of the invention.
Claims (13)
1. A touch panel, comprising:
a cover plate;
the refractive index matching layer is positioned below the cover plate;
the touch device is positioned below the refractive index matching layer; and
an optical matching layer positioned under the touch device,
wherein the index matching layer comprises a first low-index dielectric layer and a first high-index dielectric layer, wherein the first low-index dielectric layer is in direct contact with the upper surface of the touch device, the refractive index of the first low-index dielectric layer is between 1.2 and 1.5, the first high-index dielectric layer is positioned between the first low-index dielectric layer and the cover plate, the refractive index of the first high-index dielectric layer is between 1.8 and 2.5,
wherein the optical matching layer comprises a second low refractive index dielectric layer and a second high refractive index dielectric layer, wherein the second low refractive index dielectric layer is directly contacted with the lower surface of the touch device and is positioned between the touch device and the second high refractive index dielectric layer, the refractive index of the second low refractive index dielectric layer is between 1.2 and 1.5, the refractive index of the second high refractive index dielectric layer is between 1.8 and 2.5,
wherein the second high refractive index dielectric layer has a sheet resistance value of more than 10 after ultraviolet light irradiation 9 Ohmic each side.
2. The touch panel of claim 1, wherein the touch device comprises:
a sense electrode region; and
the metal wiring area is positioned at the periphery of the sensing electrode area.
3. The touch panel of claim 2, further comprising a transparent protective layer under the optical matching layer, wherein the transparent protective layer only corresponds to the metal routing region and not to the sensing electrode region.
4. The touch panel of claim 3, wherein the transparent protective layer comprises gloss oil having a thickness of 20nm to 30 nm.
5. The touch panel of claim 2, wherein the sensing electrode region comprises a transparent conductive pattern having a thickness of 20nm to 30 nm.
6. The touch panel of claim 5, wherein the transparent conductive pattern has a refractive index greater than that of the first low-refractive-index dielectric layer and the second low-refractive-index dielectric layer, the first high-refractive-index dielectric layer has a refractive index greater than that of the first low-refractive-index dielectric layer and the cover plate, and the second high-refractive-index dielectric layer has a refractive index greater than that of the second low-refractive-index dielectric layer.
7. The touch panel of claim 1, wherein the first low refractive index dielectric layer has a thickness of 25nm to 35nm and a refractive index of 1.2 to 1.5, and the first high refractive index dielectric layer has a thickness of 5nm to 15nm and a refractive index of 1.8 to 2.5.
8. The touch panel of claim 1, wherein the first low refractive index dielectric layer comprises silicon oxide and the first high refractive index dielectric layer comprises niobium oxide or silicon nitride.
9. The touch panel of claim 1, wherein the second low refractive index dielectric layer has a thickness of 15nm to 35nm and a refractive index of 1.2 to 1.5, and the second high refractive index dielectric layer has a thickness of 10nm to 20nm and a refractive index of 1.8 to 2.5.
10. The touch panel of claim 1, wherein the second low refractive index dielectric layer comprises silicon oxide and the second high refractive index dielectric layer comprises silicon nitride.
11. The touch panel of claim 1, further comprising an anti-reflection layer on the cover plate, wherein the anti-reflection layer has a refractive index greater than that of the cover plate.
12. A touch display device, comprising:
the touch panel of claim 1; and
a display panel positioned under the touch panel,
the touch device comprises:
a sense electrode region; and
the metal wiring area is positioned at the periphery of the sensing electrode area;
wherein the display panel includes:
a display region substantially corresponding to the sensing electrode region; and
the frame area corresponds to the metal wiring area.
13. The touch display device of claim 12, further comprising an optical adhesive, wherein the touch panel and the display panel are attached to each other, and the optical adhesive directly contacts the second high refractive index dielectric layer.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510473491.6A CN106445210B (en) | 2015-08-05 | 2015-08-05 | Touch panel and touch display device |
| TW104220511U TWM521771U (en) | 2015-08-05 | 2015-12-22 | Touch panel and touch display apparatus |
| TW104143079A TWI550472B (en) | 2015-08-05 | 2015-12-22 | Touch panel and touch display apparatus |
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| CN201510473491.6A CN106445210B (en) | 2015-08-05 | 2015-08-05 | Touch panel and touch display device |
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| CN106445210A CN106445210A (en) | 2017-02-22 |
| CN106445210B true CN106445210B (en) | 2023-07-11 |
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| CN106445210B (en) * | 2015-08-05 | 2023-07-11 | 宸鸿科技(厦门)有限公司 | Touch panel and touch display device |
| CN108803908A (en) * | 2017-04-26 | 2018-11-13 | 群创光电股份有限公司 | Touch device |
| CN208459986U (en) * | 2018-05-25 | 2019-02-01 | 广州视源电子科技股份有限公司 | Display panel, touch control film and display device |
| CN109445643A (en) * | 2018-12-26 | 2019-03-08 | 宜昌南玻显示器件有限公司 | The complete aobvious screen of fitting touching |
| CN109407895A (en) * | 2018-12-26 | 2019-03-01 | 业成科技（成都）有限公司 | Bendable touch control component structure |
| TWI725553B (en) * | 2019-09-24 | 2021-04-21 | 友達光電股份有限公司 | Display device and method of manufacturing thereof |
| CN113212163A (en) * | 2020-01-21 | 2021-08-06 | 恒颢科技股份有限公司 | Display module |
| CN111580697A (en) * | 2020-05-09 | 2020-08-25 | 上海天马微电子有限公司 | Composite film, touch panel and display device |
| CN111399701B (en) * | 2020-05-09 | 2024-04-02 | 上海天马微电子有限公司 | Touch module, touch display panel and touch display device |
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| TWM515149U (en) * | 2014-07-30 | 2016-01-01 | Ｌｇ伊諾特股份有限公司 | Touch panel |
| CN106445210B (en) * | 2015-08-05 | 2023-07-11 | 宸鸿科技(厦门)有限公司 | Touch panel and touch display device |
-
2015
- 2015-08-05 CN CN201510473491.6A patent/CN106445210B/en active Active
- 2015-12-22 TW TW104143079A patent/TWI550472B/en active
- 2015-12-22 TW TW104220511U patent/TWM521771U/en unknown
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| JPH028926A (en) * | 1988-06-27 | 1990-01-12 | Catalysts & Chem Ind Co Ltd | Analog type transparent touch panel |
| CN101581800A (en) * | 2008-05-15 | 2009-11-18 | 甘国工 | Compound conducting film and touch screen using same |
| TW201310296A (en) * | 2011-08-26 | 2013-03-01 | Mutto Optronics Corp | Thin sheet glass touch panel and manufacturing method thereof |
| CN204009808U (en) * | 2014-06-19 | 2014-12-10 | 宸鸿科技(厦门)有限公司 | Touch control display apparatus |
| TWM500302U (en) * | 2014-08-18 | 2015-05-01 | Unidisplay Inc | Touch panel and touch display device |
| CN204856433U (en) * | 2015-08-05 | 2015-12-09 | 宸鸿科技(厦门)有限公司 | Touch panel and touch -control display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106445210A (en) | 2017-02-22 |
| TWM521771U (en) | 2016-05-11 |
| TWI550472B (en) | 2016-09-21 |
| TW201706791A (en) | 2017-02-16 |
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