CN105873344A - Transverse gradient multi-layer film reflective element based X-ray monoenergetic imaging method - Google Patents
Transverse gradient multi-layer film reflective element based X-ray monoenergetic imaging method Download PDFInfo
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- CN105873344A CN105873344A CN201610164479.1A CN201610164479A CN105873344A CN 105873344 A CN105873344 A CN 105873344A CN 201610164479 A CN201610164479 A CN 201610164479A CN 105873344 A CN105873344 A CN 105873344A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
- H05H1/005—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using X-rays or alpha rays
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Abstract
The invention provides a transverse gradient multi-layer film reflective element based X-ray monoenergetic imaging method. The scheme is targeted to a point launching X-ray light source with certain emittance; through special design of the element parameters, reflection/diffraction for the same photon energy on each position of the multi-layer film can be satisfied, and the purpose of X-ray monoenergetic imaging is achieved. The shortcoming of a relatively high image difference which is caused by the influence from the surface type of the reflective element when a crystal element with a logarithmic spiral surface type is taken as the reflective element is overcome; and meanwhile, the multi-layer film element is relatively high in bandwidth, and relatively high in reflective photon flux, so that online adjustment can be realized in a relatively easy way. The X-ray monoenergetic imaging method is applied to the X-ray monoenergetic imaging fields, including plasma self-luminous imaging in Z pinching and an ICF process, point projection backlight imaging, absorption contrast imaging, phase contrast imaging and the like based on a laboratory X-ray light source.
Description
Technical field
The present invention relates to X-ray monoenergetic imaging field, especially a kind of based on transverse gradients multilayer film reflecting element
X-ray monoenergetic formation method.
Background technology
In Z constriction experimentation, the high-temperature high-density plasma significant condition parameter that electromagnetism constriction implosion produces
Measure, be particularly significant for physical processes such as the energy coupling in deep understanding and research plasma and unstability growths
's.Z pinch plasma itself is a kind of very effective strong x-ray source, at the stagnation stage of constriction, dense plasmas plasma
Body self can give off substantial amounts of X-ray in the widest spectral region, and this X-ray contains plasma temperature, density and electricity
From parameter information such as states.To this, use the X-ray to particular energy to carry out monoenergetic imaging, be research Z pinch plasma shape
One of most important diagnostic means of state.
Summary of the invention
The purpose of the present invention, it is simply that for the deficiency existing for prior art, and provide a kind of based on transverse gradients multilamellar
The technical scheme of the X-ray monoenergetic formation method of film reflecting element, the program uses multilayer film reflection X-ray to detector, energy
Enough improve image intensity signal and signal to noise ratio, eliminate difference simultaneously, and online collimation adjustment is also more prone to.
This programme is achieved by the following technical measures:
A kind of X-ray monoenergetic formation method based on transverse gradients multilayer film reflecting element, includes by self-luminous body
With the luminous source of aperture composition, the angle of departure of luminous source exit Xray is α, and x-ray bombardment is reflected at the multilayer film of a length of l
On element, the X-ray beam grazing angle at multilayer film reflecting element two ends is respectively θ1And θ2, wherein θ1<θ2；X-ray is passed through
Inject detector image-forming after multilayer film reflection, it is characterized in that: comprise the following steps that
A. the thickness of multilayer film is determined:
Multilayer film has diffraction characteristic to the reflection of X-ray, i.e. the X-ray of lower of certain angle reflection particular energy, with
The periodic thickness of multilayer film is relevant, need to meet correction bragg's formula:
Wherein, the wavelength of the X-ray that λ is reflected, d is the periodic thickness of multilayer film, and n is that X-ray is in film material
Refractive index, θ is the grazing angle of light beam；
It is sized to draw that the angle of departure α of light source is according to object of certainly giving out light:
Wherein, H is the height dimension of detected object, L1Distance for self-luminous body to aperture；
Further according to geometrical relationship, it is possible to draw:
θ1=θ2-α ③
Wherein, β is central light beam, i.e. the grazing angle on multilayer film reflecting element of the light beam on the angular bisector of α；
Determine the multilayer film periodic thickness d near aperture one end2, due to d2With θ2Meet formula Bragg relationship 1., logical
Cross formula 1. to calculate and can obtain θ2Value, be 3. calculated θ according to formula1Value, calculating the most further according to formula
To multilayer film away from the periodic thickness d of aperture one end1Value, wherein d2<d1；Meanwhile, the thickness of multilayer film is in its longitudinal direction
Linear change, the value of thickness gradient is (d1-d2)/l；
B. the length of multilayer film is determined:
The length of multilayer film and its distance dependent away from light source point, application sine in upper and lower two trianglees of central light beam
Theorem obtains:
Wherein L2It is the aperture centre distance to multilayer film reflecting element, l1Centered by light beam injecting a little on multilayer film
The multilayer film length of lower section, l2Centered by the light beam multilayer film length injected above a little on multilayer film, by formula 5. and public
Formula can obtain after 6. converting:
The effective length of required multilayer film is:
C. the distance between multilayer film and detector is determined:
Central light beam injecting a little to vertical dimension L of detector on multilayer film3Can be calculated by following formula:
Wherein M is imaging amplification ratio, L1For the distance by self-luminous body to aperture, L2It is that aperture is to multilayer film reflector
The centre distance of part.
Preferred as this programme: the reflection bandwidth of multilayer film is 1%-10%.
Preferred as this programme: the reflecting surface of multilayer film is plane.
The beneficial effect of this programme can be learnt according to the narration of such scheme, owing to launching for certain in this scenario
The point of degree launches X-ray source, by the particular design of component parameters, makes each position on multilayer film all meet same light
Reflection/the diffraction of sub-energy, reaches the purpose of X-ray monoenergetic imaging.Instant invention overcomes employing and there is logarithmic spiral face type
Crystal element, as reflecting element, is affected by reflecting element face type and is had the inferior position of bigger aberration, meanwhile, and multilayer film element
Bandwidth relatively big, reflection photon flux is higher, and its on-line control is the most relatively easy.
As can be seen here, the present invention compared with prior art, has substantive distinguishing features and progress, and its beneficial effect implemented is also
It is apparent from.
Accompanying drawing explanation
Fig. 1 is the formation method schematic diagram of the present invention.
In figure, 1 is self-luminous body, and 2 is aperture, and 3 is multilayer film reflecting element, and 4 is detector.
Detailed description of the invention
All features disclosed in this specification, or disclosed all methods or during step, except mutually exclusive
Feature and/or step beyond, all can combine by any way.
Any feature disclosed in this specification (including any accessory claim, summary and accompanying drawing), unless chatted especially
State, all can be by other equivalences or there is the alternative features of similar purpose replaced.I.e., unless specifically stated otherwise, each feature is only
It it is an example in a series of equivalence or similar characteristics.
The present invention is applied to X-ray monoenergetic imaging field, becomes including the plasma self-luminous during Z constriction, ICF
Picture, spot projection backlight imaging, and absorption-contrast imaging based on Laboratory X-ray light source and phase contrast imaging etc..
The imaging device of the present invention includes the luminous source being made up of self-luminous body and aperture, luminous source exit Xray
The angle of departure be α, x-ray bombardment is on the multilayer film reflecting element of a length of l, and X-ray beam is at multilayer film reflecting element two
The grazing angle of end is respectively θ1And θ2, wherein θ1<θ2；X-ray injects detector image-forming after multilayer film reflects.
The monoenergetic formation method of the present invention comprises the following steps that
A. the thickness of multilayer film is determined:
Multilayer film has diffraction characteristic to the reflection of X-ray, i.e. the X-ray of lower of certain angle reflection particular energy, with
The periodic thickness of multilayer film is relevant, need to meet correction bragg's formula:
Wherein, the wavelength of the X-ray that λ is reflected, d is the periodic thickness of multilayer film, and n is that X-ray is in film material
Refractive index, θ is the grazing angle of light beam；
It is sized to draw that the angle of departure α of light source is according to object of certainly giving out light:
Wherein, H is the height dimension of detected object, L1Distance for self-luminous body to aperture；
Further according to geometrical relationship, it is possible to draw:
θ1=θ2-α ③
Wherein, β is central light beam, i.e. the grazing angle on multilayer film reflecting element of the light beam on the angular bisector of α；
Determine the multilayer film periodic thickness d near aperture one end2, due to d2With θ2Meet formula Bragg relationship 1., logical
Cross formula 1. to calculate and can obtain θ2Value, be 3. calculated θ according to formula1Value, calculating the most further according to formula
To multilayer film away from the periodic thickness d of aperture one end1Value, wherein d2<d1；Meanwhile, the thickness of multilayer film is in its longitudinal direction
Linear change, the value of thickness gradient is (d1-d2)/l；
B. the length of multilayer film is determined:
The length of multilayer film and its distance dependent away from light source point, application sine in upper and lower two trianglees of central light beam
Theorem obtains:
Wherein L2It is the aperture centre distance to multilayer film reflecting element, l1Centered by light beam injecting a little on multilayer film
The multilayer film length of lower section, l2Centered by the light beam multilayer film length injected above a little on multilayer film, by formula 5. and public
Formula can obtain after 6. converting:
The effective length of required multilayer film is:
C. the distance between multilayer film and detector is determined:
Central light beam injecting a little to vertical dimension L of detector on multilayer film3Can be calculated by following formula:
Wherein M is imaging amplification ratio, L1For the distance by self-luminous body to aperture, L2It is that aperture is to multilayer film reflector
The centre distance of part.
The reflection bandwidth of multilayer film is 1%-10%.The reflecting surface of multilayer film is plane.
The invention provides the Parameters design of the transverse gradients multilayer film element of complete set, and utilize pinhole imaging system
Principle give the scheme of design of Optical System.The present invention is applied to X-ray monoenergetic imaging field, including Z constriction, ICF mistake
Plasma self-luminous imaging in journey, spot projection backlight imaging, and absorption-contrast imaging based on Laboratory X-ray light source and
Phase contrast imaging etc..
The invention is not limited in aforesaid detailed description of the invention.The present invention expands to any disclose in this manual
New feature or any new combination, and the arbitrary new method that discloses or the step of process or any new combination.
Claims (3)
1. an X-ray monoenergetic formation method based on transverse gradients multilayer film reflecting element, include by self-luminous body and
The luminous source of aperture composition, the angle of departure of luminous source exit Xray is α, and x-ray bombardment is in the multilayer film reflector of a length of l
On part, the X-ray beam grazing angle at multilayer film reflecting element two ends is respectively θ1And θ2, wherein θ1<θ2；X-ray is through too much
Inject detector image-forming after tunic reflection, it is characterized in that: comprise the following steps that
A. the thickness of multilayer film is determined:
Multilayer film has diffraction characteristic to the reflection of X-ray, i.e. the X-ray of lower of certain angle reflection particular energy, with multilamellar
The periodic thickness of film is relevant, need to meet correction bragg's formula:
Wherein, the wavelength of the X-ray that λ is reflected, d is the periodic thickness of multilayer film, and n is X-ray folding in film material
Penetrating rate, θ is the grazing angle of light beam；
It is sized to draw that the angle of departure α of light source is according to object of certainly giving out light:
Wherein, H is the height dimension of detected object, L1Distance for self-luminous body to aperture；
Further according to geometrical relationship, it is possible to draw:
θ1=θ2-α ③
Wherein, β is central light beam, i.e. the grazing angle on multilayer film reflecting element of the light beam on the angular bisector of α；
Determine the multilayer film periodic thickness d near aperture one end2, due to d2With θ2Meet formula Bragg relationship 1., by public affairs
1. formula calculates and can obtain θ2Value, be 3. calculated θ according to formula1Value, many being calculated the most further according to formula
Tunic is away from the periodic thickness d of aperture one end1Value, wherein d2<d1；Meanwhile, the thickness of multilayer film becomes line in its longitudinal direction
Property change, the value of thickness gradient is (d1-d2)/l；
B. the length of multilayer film is determined:
The length of multilayer film and its distance dependent away from light source point, apply sine in upper and lower two trianglees of central light beam
:
Wherein L2It is the aperture centre distance to multilayer film reflecting element, l1Centered by light beam on multilayer film, inject a lower section
Multilayer film length, l2Centered by the light beam multilayer film length injected above a little on multilayer film, by formula 5. with formula 6.
Can obtain after conversion:
The effective length of required multilayer film is:
C. the distance between multilayer film and detector is determined:
Central light beam injecting a little to vertical dimension L of detector on multilayer film3Can be calculated by following formula:
Wherein M is imaging amplification ratio, L1For the distance by self-luminous body to aperture, L2It is that aperture is to multilayer film reflecting element
Centre distance.
A kind of X-ray monoenergetic formation method based on transverse gradients multilayer film reflecting element the most according to claim 1, its
Feature is: the reflection bandwidth of described multilayer film is 1%-10%.
A kind of X-ray monoenergetic imaging device based on transverse gradients multilayer film reflecting element the most according to claim 1, its
Feature is: the reflecting surface of described multilayer film is plane.
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| CN201610164479.1A CN105873344A (en) | 2016-03-22 | 2016-03-22 | Transverse gradient multi-layer film reflective element based X-ray monoenergetic imaging method |
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Cited By (3)
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| CN108982503A (en) * | 2018-07-30 | 2018-12-11 | 华中科技大学苏州脑空间信息研究院 | A kind of coplanar parallel detecting method of multilayer signal based on gradient reflection |
| CN109324469A (en) * | 2018-09-25 | 2019-02-12 | 中国工程物理研究院上海激光等离子体研究所 | A kind of quasi- Single energy X ray absorptionmetry pinhole camera and its installation and debugging method |
| CN112987286A (en) * | 2021-04-21 | 2021-06-18 | 中国工程物理研究院流体物理研究所 | Light beam scanning system based on volume Bragg grating |
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| CN109324469A (en) * | 2018-09-25 | 2019-02-12 | 中国工程物理研究院上海激光等离子体研究所 | A kind of quasi- Single energy X ray absorptionmetry pinhole camera and its installation and debugging method |
| CN112987286A (en) * | 2021-04-21 | 2021-06-18 | 中国工程物理研究院流体物理研究所 | Light beam scanning system based on volume Bragg grating |
| CN112987286B (en) * | 2021-04-21 | 2021-07-20 | 中国工程物理研究院流体物理研究所 | Light beam scanning system based on volume Bragg grating |
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