CN105022513B - Touch panel and touch control display apparatus - Google Patents
Touch panel and touch control display apparatus Download PDFInfo
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- CN105022513B CN105022513B CN201410163008.XA CN201410163008A CN105022513B CN 105022513 B CN105022513 B CN 105022513B CN 201410163008 A CN201410163008 A CN 201410163008A CN 105022513 B CN105022513 B CN 105022513B
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Abstract
The present invention discloses a kind of touch panel and touch control display apparatus.The touch panel includes：Substrate has visible area and shading region；Light shield layer is arranged on the shading region of substrate, and light shield layer has upper surface and the first sloped sidewall；Sensing electrode layer, is arranged on the visible area of substrate, and sensing electrode layer is extended by visible area on the light shield layer including electrode, wherein, electrode has first thickness on the upper surface of light shield layer, and has second thickness on the first sloped sidewall of light shield layer, and second thickness is less than first thickness.
Description
Technical field
The present invention relates to touch technology, and more particularly to a kind of touch panel and touch control display apparatus.
Background technology
In recent years, touch device has been widely applied in various electronic products, such as mobile phone, personal digital assistant
(PDA) or PC etc..Touch panel generally includes the polytypes such as resistor-type, capacitive, acoustic wave type, infra red type,
Generally rectangular cross-section transparent panel form, and the display surface one side of liquid crystal display device is arranged at by the way of stacking, and pass through
Flexible circuit board etc. is connected to liquid crystal display device and corresponding control device, so as to fulfill touch function.
Formed touch control display apparatus is combined with touch panel by liquid crystal display device, user can be allowed using hand or
Other objects of person contact the touch panel and input information to the display device, and reduce or eliminate user to other input equipments
The dependence of (for example, keyboard, mouse and remote controler etc.), facilitates the operation of user.
With the demand of application, a kind of touch device for being thinned design has been developed in recent years, due to such slimming
Touch device has the advantages that frivolous, is gradually favored be subject to user.However, the manufacture craft of such Slim touch device
And structure still has comparable challenge.
The content of the invention
To solve the above problems, one embodiment of the invention provides a kind of touch panel, including：Substrate has a visible area
An and shading region；One light shield layer is arranged on the shading region of the substrate, which has a upper surface and one first inclination
Side wall；One sensing electrode layer, is arranged on the visible area of the substrate, and the sensing electrode layer includes an electrode by the visible area
It extends on the light shield layer, wherein, which has a first thickness on the upper surface of the light shield layer, and the electrode is at this
There is a second thickness, which is less than the first thickness on first sloped sidewall of light shield layer.
Another embodiment of the present invention provides a kind of touch control display apparatus, including：One display panel；One touch panel is set
In on the display panel, which includes：One substrate has a visible area and a shading region；One light shield layer, is arranged at this
On the shading region of substrate, which has a upper surface and one first sloped sidewall；One sensing electrode layer, is arranged at the base
On the visible area of plate, and the sensing electrode layer is extended to including an electrode on the light shield layer, wherein, the electrode is in the light shield layer
The upper surface on there is a first thickness, and the electrode have on first sloped sidewall of the light shield layer it is one second thick
Degree, the second thickness are less than the first thickness.
Above and other purpose, feature and advantage to allow invention can be clearer and more comprehensible, cited below particularly to go out to be preferably implemented
Example, and coordinate appended attached drawing, it is described in detail below：
Description of the drawings
Fig. 1 is the top view of the touch panel in some embodiments of the invention；
Fig. 2 is the top view of the sensing electrode layer in the visible area of touch panel in some embodiments；
Fig. 3 A to Fig. 3 E are each stage sectional view that touch panel is formed in some embodiments of the invention；
Fig. 4 is the partial enlarged view in the region of Fig. 3 B 301；
Fig. 5 A are the sectional view of the touch panel in other embodiments of the invention；
Fig. 5 B are the enlarged drawing in the region of the touch panel shown by Fig. 5 A 501；
Fig. 6 A are the sectional view of the touch panel in other embodiments of the invention；
Fig. 6 B are the enlarged drawing in the region of the touch panel shown by Fig. 6 A 601；
Fig. 7 is the schematic diagram of the touch control display apparatus 700 of some embodiments of the invention.
Symbol description
V~visible area
M~shading region
100th, 100a, 100b, 100c~touch device
110~substrate
130~sensing electrode layer
131~electrode portion
131X~first electrode
131Y~second electrode
The second electrode of 131Y '~extension
131Z~connecting portion
133~bridge
150~signal lead layer
120a, 120b, 120c~light shield layer
132~insulation division
111~upper surface of base plate
116~substrate upper portion side wall
117~substrate middle part of sliding channel
118~substrate lower sides
W1~the first width
W2~the second width
113~base lower surface
115~substrate side wall
700~touch control display apparatus
200~display panel
H1~first thickness
H2~second thickness
H3~the three thickness
301st, 501,601~region
The sloped sidewall of 123b, 123c~second
125~upper angled side wall
127~lower tilt side wall
θ1~first angle
θ2~second angle
θ3~third angle
θ4~fourth angle
Specific embodiment
Several different embodiments are provided due to the different characteristic of the present invention.In the present invention specific element and arrange be for
Simplification, but the present invention is not limited with these embodiments.It for example, can in the description that first element is formed in second element
Including the embodiment that first element and second element contact directly, also include having additional element to be formed in first element and the
Between two element, so that first element and second element embodiment not in direct contact.In addition, for simplicity, the present invention
It is represented in different examples with the component symbol and/or letter that repeat, but does not represent and have between each embodiment and/or structure
Specific relation.
It is noted that the attached drawing of the various embodiments of this case is simplified schematic diagram, to emphasize the feature of the present invention, because
Component size in this figure is simultaneously non-fully drawn according to actual ratio.And the embodiment of the present invention may also be comprising not shown in figure
Element.
Fig. 1 is shown in the top view of the touch panel 100 in some embodiments of the invention.Touch panel 100 includes substrate
110, substrate 110 can be a substrate, and with visible area V and shading region M, and shading region M is around the periphery of visible area V.Fig. 2
It shows in some embodiments, the top view of the sensing electrode layer in the visible area V of substrate 110.Sensing electrode layer 130 may include
Electrode portion 131, and electrode portion 131 can include multiple first electrode 131X arranged in column, multiple second electrodes being arranged in rows
131Y and multiple connecting portion 131Z is connecting first electrode 131X in same row and adjacent.Sensing electrode layer 130 also wraps
Include multiple bridge 133 and more insulation divisions 132.Multiple bridge 133 can be used to connection on a same row and adjacent second
Electrode 131Y, and multiple insulation divisions 132 may be disposed between connecting portion 131Z and bridge 133, to the connecting portion that is electrically insulated
131Z and bridge 133.
It is to be understood that sensing electrode layer shown in Fig. 2 130 is used by way of example only, not limiting first electrode
The quantity and pattern of the elements reality such as 131X, second electrode 131Y, and the shape of first electrode 131X and second electrode 131Y
The diamond shape or triangular shaped being not limited in diagram.That is, in some other embodiments of the present invention, above-mentioned sensing electrode layer
Each element can also have other patterns and form, scope of the invention is not so limited.
Fig. 3 A to Fig. 3 E, which are shown in some embodiments of the invention, forms each stage sectional view of touch panel 100a (to scheme
Exemplified by 2 A-A ' hatching lines).With reference to Fig. 3 A, substrate 110 is provided.Substrate 110 has visible area V and the screening positioned at visible area V sides
Light area M.Substrate 110 can be formed by transparent insulation material, as glass, ethylene terephthalate (PET), polyether sulfone (PES),
Polyacrylate (PAR), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallyl (polyallylate),
Makrolon (PC) or its similar material.Substrate 110 can be hard substrate or flexible substrate.Substrate 110 can be planar shaped
Shape, curve form or other irregular shapes.
Light shield layer 120a is formed on the shading region M of substrate 110.As shown in Figure 3A, light shield layer 120a is close to visible area V
One side there is the first sloped sidewall 121, and have between the upper surface 122 of light shield layer 120a and its first sloped sidewall 121
First angle θ1.In some embodiments, first angle θ1Between 135 ° to 165 °.As first angle θ1When too big, it may cause
Light shield layer 120a is extended into visible area V, and influences the display efficiency of institute's forming apparatus.In addition, as first angle θ1Too
When big, it is also possible to cause light shield layer 120a excessively thin in the segment thickness of the first sloped sidewall 121, cause light shield layer 120a close
The phenomenon that light leak, occurs for the part of visible area V.Opposite, as first angle θ1It, then may be due to light shield layer 120a when too small
Upper surface and its first sloped sidewall 121 between angle it is too steep, cause the electrode being formed thereon afterwards break.
In some embodiments, the thickness of light shield layer 120a is between 1.25 μm to 1.55 μm.Form the first light shield layer 120
Method may include to be coated with light screening material on substrate 110, then this light screening material is patterned to form and is tilted with first
The light shield layer 120a of side wall 121.Light screening material carries out patterned method for example including exposure with development.Light screening material is, for example,
The coloured photo anti-corrosion agent material being made of resin, pigment, emulsion and solvent.In some embodiments, it is photic using black
Anticorrosive additive material is to form light shield layer 120a, such as polyimide or ink material.
With reference to Fig. 3 B, after light shield layer 120a is formed, electrode portion 131 is formed on the visible area V of substrate 110.Electrode
Portion 131 includes first electrode 131X (Fig. 3 B are not shown, with reference to Fig. 2), multiple the second electricity being arranged in rows of multiple arrangements in column
Pole 131Y and multiple connecting portion 131Z to connect first electrode 131X adjacent in same row.Although it should be noted that
The quantity of the elements such as Fig. 2 and the first electrode 131X, second electrode 131Y, connecting portion 131Z of Fig. 3 B is different, but Fig. 2 and Fig. 3 B are only
For example, not limiting the quantity and pattern of the elements such as first electrode 131X, second electrode 131Y, connecting portion 131Z.
As shown in Figure 3B, electrode portion 131 further includes the second electrode 131Y ' of extension, and the second electrode 131Y ' extended by
It is extended on the visible area V of substrate 110 on light shield layer 120a.In addition, the second electrode 131Y ' of extension is in the first sloped sidewall
Thickness on 121 is less than its thickness on the upper surface of light shield layer 120a 122 and visible area V.
The detailed construction of light shield layer 120a and the second electrode 131Y ' of extension can be further with reference to Fig. 4.Fig. 4 is shown
Partial enlarged view in the region of Fig. 3 B 301.As shown in figure 4, the second electrode 131Y ' of extension is in the upper surface of light shield layer 120a
There is first thickness H on 1221, there is second thickness H on the first sloped sidewall 121 of light shield layer 1202, and in substrate 110
There is the 3rd thickness H on visible area V3.In some embodiments, first thickness H1Equal to the 3rd thickness H3, and second thickness H2It is small
In first thickness H1And the 3rd thickness H3。
In some embodiments, second thickness H2To first thickness H1Ratio between 0.6 to 0.9.By in light shield layer
The second electrode 131Y ' of the extension of thinner thickness is formed on the first sloped sidewall 121 of 120a, visible area V and shading can be reduced
The problem of reflecting brightness disproportionation (mura) that area M has a common boundary.Therefore, if second thickness H2To first thickness H1The too big (the two of ratio
Thickness difference is too small or identical), then it can not the phenomenon that effectively reduce brightness is uneven.If however, second thickness H2To first thickness H1
Ratio it is too small (the two thickness difference too big), then may result in the problem of second electrode 131Y ' of extension easily breaks.
In some embodiments, first thickness of the second electrode 131Y ' of extension on the upper surface of light shield layer 120 122
H1Between 50nm to 70nm.In some embodiments, the second electrode 131Y ' of extension is in the first sloped sidewall of light shield layer 120
Second thickness H on 1212Between 30nm to 63nm.In some embodiments, the second electrode 131Y ' of extension is in substrate 110
There is the 3rd thickness H on visible area V3Between 50nm to 70nm.
As shown in figure 4, the edge of light shield layer 120a and the edge of substrate 110 can have the first length W1.In some implementations
In example, the first width W1Between 150 μm to 300 μm.
The forming method of electrode portion 131 is, for example, comprehensive deposition transparent conductive material layer, then recycles photoetching, erosion
Carve manufacture craft transparent conductive material layer is patterned, with formed first electrode 131X, second electrode 131Y, connecting portion 131Z with
And the second electrode 131Y ' of extension.Depositing manufacture craft includes sputter (sputtering), physical vaporous deposition (PVD), changes
Learn vapour deposition process (CVD) or other suitable manufacture crafts.Lithographic patterning manufacture craft includes photoresist and is coated with (example
Such as, rotary coating), it is soft baking (soft baking), mask registration (mask aligning), exposure (exposure), exposure
(post-exposure baking) is toasted afterwards, development photoresist, rinsing, drying (for example, hard baking), other are suitable
The combination of manufacture craft and/or above-mentioned manufacture craft.Etching process includes dry-etching (dry etching), wet type is lost
Carve (wet etching) and/or other engraving methods (for example, reactive ion etching (reactive ion etching)).
It has been observed that when with etch patterning transparent conductive material layer to form the second electrode 131Y ' of extension, can pass through
Adjust etching condition so that the second electrode 131Y ' of the extension formed has on the first sloped sidewall 121 of light shield layer 120a
There is relatively thin thickness, and there is thicker thickness on the upper surface of light shield layer 120a 122 and visible area V.
The transparent conductive material for forming electrode portion 131 is, for example, tin indium oxide (indium tin oxide, ITO), oxidation
Indium zinc (indium zinc oxide, IZO), cadmium tin (cadmium tin oxide, CTO), aluminum zinc oxide (aluminum
Zinc oxide, AZO), indium tin zinc oxide (indium tin zinc oxide, ITZO), zinc oxide (zinc oxide), oxygen
Cadmium (cadmium oxide, CdO), hafnium oxide (hafnium oxide, HfO), indium gallium zinc (indium gallium
Zinc oxide, InGaZnO), indium gallium zinc-magnesium (indiumgallium zinc magnesium oxide,
InGaZnMgO), indium gallium magnesium (indium gallium magnesium oxide, InGaMgO), indium gallium aluminium
(indium gallium aluminum oxide, InGaAlO) or combinations of the above.
After electrode portion 131 is formed, insulation division 132 is formed above each connecting portion 131Z of electrode portion 131, such as Fig. 3 C
It is shown.Formed insulation division 132 method may include to form insulation material layer, be, for example, photoresist layer, recycle photoetching or
Manufacture craft is printed by this insulation artwork, to form insulation division 132.Forming the insulating materials of insulation division 132 can be
The insulating materials of organic or inorganic is, for example, the materials such as polyimide (polyimide), epoxy resin, silica, silicon nitride.
Then, bridge 133 is formed on insulation division 132, as shown in Figure 3D.Forming the material of bridge 133 includes gold
Belong to conducting wire, transparent conductive material or combinations of the above.Plain conductor includes copper (Cu), silver-colored (Ag), aluminium (Al) or combinations of the above.
Transparent conductive material include tin indium oxide (indium tin oxide, ITO), indium zinc oxide (indium zinc oxide,
IZO), cadmium tin (cadmium tin oxide, CTO), aluminum zinc oxide (aluminum zinc oxide, AZO), indium oxide
Tin zinc (indium tin zinc oxide, ITZO), zinc oxide (zinc oxide), cadmium oxide (cadmium oxide,
CdO), hafnium oxide (hafnium oxide, HfO), indium gallium zinc (indium gallium zinc oxide, InGaZnO),
Indium gallium zinc-magnesium (indium gallium zinc magnesium oxide, InGaZnMgO), indium gallium magnesium (indium
Gallium magnesium oxide, InGaMgO), indium gallium aluminium (indium gallium aluminum oxide,
) or combinations of the above InGaAlO.In some embodiments, photoetching and etching process or printing manufacture craft shape are utilized
Into bridge 133.
In addition, further in forming signal lead layer on the second electrode 131Y ' of the extension on light shield layer 120a
150, as shown in Figure 3D.Signal lead layer 150 is electrically connected with conductive part 131Y '.The material for forming signal lead layer 150 is, for example,
Transparent conductive materials or the foregoing combinations such as the metal materials such as silver, aluminium, indium tin oxide (ITO).In some embodiments, it is sharp
Signal lead layer 150 is formed with metal material, to reach preferred electric conductivity.Photoetching and etching process or print can be passed through
Brush manufacture craft forms signal lead layer 150.In some embodiments, in same manufacture craft, formed using identical material
Bridge 133 and signal lead layer 150 are, for example, metal material.That is, bridge 133 and signal lead layer 150 can shapes simultaneously
Into for reducing manufacturing process steps and cost.
In some embodiments, after bridge 133 and signal lead layer 150 is formed, edging system is carried out to substrate 110
Make technique.Pass through the wedge angle at 110 edge of edging manufacture craft grinding base plate so that 110 edge of substrate in obtuse angle, to reduce substrate
110 risks ruptured in subsequently assembling manufacture craft.In some embodiments, substrate 110 is ground the lead angle of rear formation
Part has the second width W2, such as between 120 μm to 180 μm.
As shown in FIGURE 3 E, substrate 110 have upper surface of base plate 111, base lower surface 113 and substrate side wall 115, and into
After row edging manufacture craft, substrate side wall 115 include the different substrate upper portion side wall 116 of slope, substrate middle part of sliding channel 117 and
Substrate lower sides 118.In some embodiments, the angle between upper surface of base plate 111 and substrate upper portion side wall 116 between
145 ° to 155 °.In some embodiments, the angle between base lower surface 113 and substrate lower sides 118 between 145 ° extremely
155°。
It has been observed that light shield layer 120a has the first sloped sidewall 121, it can avoid extending to the second electricity of extension thereon
The broken string of pole 131Y '.In addition, the second electrode 131Y ' of extension is less than in the thickness of the first sloped sidewall 121 of light shield layer 120a
Thickness in light shield layer 120a upper surfaces 122 can improve the reflecting brightness disproportionation (mura) that visible area V and shading region M has a common boundary
Problem.
Fig. 5 A are shown in the sectional view of the touch panel 100b in other embodiments of the invention.Touch surface shown in Fig. 5 A
Plate 100b is similar to the touch panel 100a shown in Fig. 3 E, however the light shield layer 120b of touch panel 100b is except having first to incline
Outside oblique side wall 121, also with the second sloped sidewall 123b.
The forming method and material of light shield layer 120b can be similar to the light shield layer 120a of Fig. 3 A.For example, it is applied on substrate 110
Cloth light screening material, then this light screening material is patterned to form with the first sloped sidewall 121 and the second sloped sidewall
The light shield layer 120b of 123b.First sloped sidewall 121 is located at light shield layer 120b close to the one side of visible area V, and the second inclined side
Wall 123b is located at opposite sides of the light shield layer 120b away from visible area V.After light shield layer 120b is formed, it can be formed as shown in FIGURE 3 E
Sensing electrode layer 130, wherein the second electrode 131Y ' extended is extended to by visible area V on light shield layer 120b, and the extended
Thickness of the two electrode 131Y ' on the first sloped sidewall 121 of light shield layer 120b is less than it on light shield layer 120b upper surfaces 122
Thickness.In addition, touch panel 100b also includes and the same or similar various elements of touch panel 100a, and its manufacture craft side
Method and material are also same or similar with touch panel 100a, therefore this will not be repeated here.
Fig. 5 B are then shown in the enlarged drawing in the region 501 of the touch panel 100b shown by Fig. 5 A.Similar to Fig. 3 E, touch-control
For the substrate 110 of panel 100b after edging manufacture craft, substrate side wall 115 includes the different substrate upper side of slope
Wall 116, substrate middle part of sliding channel 117 and substrate lower sides 118.In some embodiments, substrate 110 is ground rear formation
Lead angle part has the second width W2, such as between 120 μm to 180 μm.In addition, in some embodiments, this edging makes work
Skill grinds away the marginal portion that the upper surface 111 of substrate is not covered by light shield layer 120b completely so that the edge of light shield layer 120b
It aligns with the edge of the upper surface 111 of substrate, therefore the light leak of touch panel can be reduced.In addition, as shown in Figure 5 B, due to real herein
It applies and the second sloped sidewall 123 that manufacture craft is not ground to light shield layer 120b is ground in example, therefore the second sloped sidewall 123 and base
Plate upper portion side wall 116 has different slopes.
More specifically, light shield layer 120b has upper surface 122, the first sloped sidewall 121 and the second sloped sidewall 123b,
And there is first angle θ between 122 and first sloped sidewall 121 of upper surface of light shield layer 120b1, upper surface 122 and second incline
There is second angle θ between oblique side wall 123b2.In some embodiments, first angle θ1With second angle θ2It is identical.At some
In embodiment, second angle θ2Between 135 ° to 165 °.
It has been observed that light shield layer 120b also has the first sloped sidewall 121, therefore it can avoid extending to the second of extension thereon
The broken string of electrode 131Y '.In addition, the second electrode 131Y ' of extension is small in the thickness of the first sloped sidewall 121 of light shield layer 120b
In the thickness in light shield layer 120b upper surfaces 122, the reflecting brightness disproportionation (mura) that visible area V and shading region M has a common boundary can be improved
The problem of.In addition, light shield layer 120b extends close to the part at 110 edge of substrate with more the second sloped sidewall 123b, therefore can
Reduce the light leak at touch panel 100b edges.It therefore, can when forming the touch panel 100b of Fig. 5 A and Fig. 5 B illustrated embodiments
The light leak at touch panel 100b edges can be avoided by not forming secondary ink layer, therefore can reduce the complexity and drop of manufacture craft
Low manufacture cost.In addition, the second sloped sidewall 123b also can reduce substrate 110 in follow-up edging as the protective layer of substrate 110
Or the risk ruptured in assembling manufacture craft.
Fig. 6 A are shown in the sectional view of the touch panel 100c in other embodiments of the invention.Touch surface shown in Fig. 6 A
Plate 100c is similar to the touch panel 100c shown in Fig. 5 A, however the second sloped sidewall of the light shield layer 120c of touch panel 100c
123c has third angle θ3。
The forming method and material of light shield layer 120c can be similar to the light shield layer 120b of Fig. 5 A.For example, it is applied on substrate 110
Cloth light screening material, then this light screening material is patterned to form with the first sloped sidewall 121 and the second sloped sidewall
Light shield layer (the light shield layer 120b for being identical to Fig. 5 A).Then, it is further to grind in the grinding manufacture craft of substrate 110
The bottom of the second sloped sidewall of light shield layer 120b so that the second sloped sidewall 123c has the different upper angled side wall of slope
125 and lower tilt side wall 127.In addition, the slope of the lower tilt side wall 127 of light shield layer 120c and substrate upper portion side wall 116
Slope it is identical.
It should be noted that touch panel 100c also includes the structures such as sensing electrode layer 130 as shown in FIGURE 3 E, wherein extending
Second electrode 131Y ' extended to by visible area V on light shield layer 120c, and extend second electrode 131Y ' in light shield layer 120c
The first sloped sidewall 121 on thickness be less than its thickness on light shield layer 120c upper surfaces 122.In addition, touch panel
100b also include with the same or similar various elements of touch panel 100a, and its process for making and material also with touch panel
100a is same or similar, therefore this will not be repeated here.
Fig. 6 B are then shown in the enlarged drawing in the region 601 of the touch panel 100c shown by Fig. 6 A.As shown in Figure 6B, pass through
After edging manufacture craft, light shield layer 120c is upper with upper surface 122, the first sloped sidewall 121 and the second sloped sidewall 123c's
Portion's sloped sidewall 125 and lower tilt side wall 127.Have between 122 and first sloped sidewall 121 of upper surface of light shield layer 120b
First angle θ1, there is between 122 and second sloped sidewall 123c of upper surface second angle θ2, upper angled side wall 125 and lower part
There is third angle θ between sloped sidewall 1273, have the 4th between lower tilt side wall 127 and the upper surface 111 of substrate 110
Angle, θ4.In some embodiments, third angle θ3Less than 180, such as between 130 ° to 170 °.In some embodiments, the 4th
Angle, θ4Between 25 ° to 35 °.
It has been observed that light shield layer 120c also has the first sloped sidewall 121 and the second sloped sidewall 123c, therefore can also avoid prolonging
The broken string of the second electrode 131Y ' of extension thereon is extended, and improves the reflecting brightness disproportionation that visible area V and shading region M has a common boundary
(mura) the problem of.
Fig. 7 displays show the touch control display apparatus 700 of some embodiments of the invention, and touch control display apparatus includes touch panel
100 with display panel 200.Touch panel 100 can be foregoing touch panel 100a, 100b and 100c.Display panel 200 is for example
For liquid crystal display panel (Liquid Crystal Display；) or organic LED display panel (organic LCD
light-emitting diode；OLED).In some embodiments, liquid crystal display panel (LCD) includes thin film transistor base plate
With the colored filter substrate being oppositely arranged, wherein thin film transistor base plate still includes thin-film transistor structure, pixel electrode, sweeps
Retouch the structures such as line and data cable.In some embodiments, organic LED display panel (OLED) includes cathode layer, organic
The structure sheafs such as LED layers, anode layer, tft layer, lower substrate and upper substrate, wherein Organic Light Emitting Diode layer
Including hole transport sublayer (hole transporting layer, HTL), a luminescent layer (emitting layer) and electronics
Transmit sublayer (electron transporting layer, HTL).
Although disclosing the present invention with reference to several of the above preferred embodiment, the present invention is not limited to, it is any
Those of ordinary skill in the art without departing from the spirit and scope of the present invention, can make arbitrarily to change and moisten
Decorations, therefore protection scope of the present invention should be subject to what the claim enclosed was defined.
Claims (9)
1. a kind of touch panel, including：
Substrate has visible area and shading region；
Light shield layer is arranged on the shading region of the substrate, which has upper surface and the first sloped sidewall；
Sensing electrode layer is arranged on the visible area of the substrate, and the sensing electrode layer includes electrode, is extended by the visible area
To the light shield layer,
Wherein, the electrode on the upper surface of the light shield layer have first thickness, and the electrode the light shield layer this first
There is second thickness, which is less than the first thickness, and the wherein substrate has upper surface of base plate and base on sloped sidewall
Plate side wall, the substrate side wall include substrate upper portion side wall, substrate middle part of sliding channel and substrate lower sides, and the substrate upper side
The slope of wall, the substrate middle part of sliding channel and the substrate lower sides is all different.
2. touch panel as described in claim 1, the wherein second thickness are to the ratio of the first thickness between 0.6 to 0.9.
3. have between the upper surface of touch panel as described in claim 1, the wherein light shield layer and first sloped sidewall
There is first angle, the first angle is between 135 ° to 165 °.
4. touch panel as described in claim 1, the wherein light shield layer have the second sloped sidewall, and first sloped sidewall
Positioned at the light shield layer close to the one side of the visible area, and second sloped sidewall is located at a phase of the light shield layer away from the visible area
The upper angled side wall and lower tilt side wall that offside, wherein second sloped sidewall have slope different.
5. have between the upper surface of touch panel as claimed in claim 4, wherein second sloped sidewall and the light shield layer
There is second angle, the second angle is between 135 ° to 165 °.
6. have the between touch panel as claimed in claim 4, wherein the upper angled side wall and the lower tilt side wall
Three angles, the third angle low-angle is between 130 ° to 170 °.
7. have between touch panel as claimed in claim 4, wherein the lower tilt side wall and the upper surface of base plate of the substrate
4th angle, the 4th angle is between 25 ° to 35 °.
8. touch panel as claimed in claim 4, the angle wherein between the substrate upper portion side wall and the upper surface of base plate is situated between
In 145 ° to 155 °.
9. the lower sides of second sloped sidewall of touch panel as claimed in claim 4, the wherein light shield layer is oblique
Rate is identical with the slope of the substrate upper portion side wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410163008.XA CN105022513B (en) | 2014-04-22 | 2014-04-22 | Touch panel and touch control display apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410163008.XA CN105022513B (en) | 2014-04-22 | 2014-04-22 | Touch panel and touch control display apparatus |
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| CN105022513A CN105022513A (en) | 2015-11-04 |
| CN105022513B true CN105022513B (en) | 2018-05-22 |
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|---|---|---|---|---|
| US11275403B2 (en) * | 2019-03-08 | 2022-03-15 | Innolux Corporation | Tiled display device |
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| KR101862876B1 (en) * | 2012-03-27 | 2018-05-31 | 엘지이노텍 주식회사 | Touch panel |
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| CN103189932A (en) * | 2010-12-30 | 2013-07-03 | Lg化学株式会社 | Electrode, and electronic device comprising same |
| CN103186273A (en) * | 2011-12-29 | 2013-07-03 | 宸鸿科技(厦门)有限公司 | Touch-control device and manufacturing method thereof |
| CN103383605A (en) * | 2012-05-04 | 2013-11-06 | 恒颢科技股份有限公司 | Touch panel |
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