CN104988582B - The sensor monocrystalline silicon etching device of equipment operating efficiency can be improved - Google Patents
The sensor monocrystalline silicon etching device of equipment operating efficiency can be improved Download PDFInfo
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- CN104988582B CN104988582B CN201510399725.7A CN201510399725A CN104988582B CN 104988582 B CN104988582 B CN 104988582B CN 201510399725 A CN201510399725 A CN 201510399725A CN 104988582 B CN104988582 B CN 104988582B
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Abstract
Improve the sensor monocrystalline silicon etching device of equipment operating efficiency the invention discloses a kind of, it includes is provided with magnet coil on the outside of reative cell, reative cell；Multiple storing end-rack in the horizontal direction are provided with outside the reative cell, each is put end-rack and circularizes extension along the side end face of reative cell, and magnet coil is fixed on the upper surface of the storing end-rack corresponding to it；It is attached between multiple storing end-rack by the support rod member extended in vertical direction；The outside of the reative cell is provided with multiple elevating screws, and it is connected to the lifting motor for being arranged on reative cell upper surface, and the elevating screw is fixedly secured to one another with putting end-rack；The sensor monocrystalline silicon etching device of equipment operating efficiency is improved using above-mentioned technical proposal, it can drive magnet coil to lift by elevating screw, it is improved with the overall processing precision for the monocrystalline silicon for causing batch processing, and the process efficiency for causing sensor overall gets a promotion.
Description
Technical field
It is especially a kind of to improve the biography of equipment operating efficiency the present invention relates to a kind of process equipment of semiconductor components and devices
Sensor monocrystalline silicon etching device.
Background technology
Sensor in process, is both needed to perform etching it processing with monocrystalline silicon；During existing lithography,
It is overlayed on horse often through by multiple monocrystalline silicon, and by importing reacting gas to horse position, and cause
Reacting gas produces plasma under electric field environment, to be performed etching to monocrystalline silicon；However, in existing etching device, by
It is relatively fixed in the position of magnet coil, causes it to be difficult to uniformly locate the reacting gas of each position in reaction vessel
Reason, so as to cause the overall processing time to be extended, operating efficiency is affected.
The content of the invention
The technical problem to be solved in the present invention is to provide a kind of sensor monocrystalline silicon etching device, it can be reacted by reducing
The fraction defective of each indoor position monocrystalline silicon, to cause the overall production efficiency of sensor to be improved.
In order to solve the above technical problems, improving the sensor monocrystalline silicon etching of equipment operating efficiency the present invention relates to a kind of
Device, it includes reative cell, and the upper end of reative cell is provided with air duct, and it is connected to the gas being arranged on outside reative cell
Source chamber, the bottom of reative cell is provided with pump-line, and it is connected to the vavuum pump being arranged on outside reative cell；The reative cell
Axial location be provided with horse, it is connected to the horse rotating mechanism being arranged on outside reative cell；Set on the outside of the reative cell
It is equipped with magnet coil；Multiple storing end-rack in the horizontal direction are provided with outside the reative cell, each puts end-rack
Extension is circularized along the side end face of reative cell, the storing end-rack is corresponded with magnet coil, and each magnet coil is equal
The upper surface for the storing end-rack being fixed on corresponding to it；Support bar between multiple storing end-rack by extending in vertical direction
Part is attached；The outside of the reative cell is provided with multiple elevating screws, and it is connected to the liter for being arranged on reative cell upper surface
Motor is dropped, and the elevating screw is put in end-rack with multiple, and the storing end-rack positioned at extreme higher position is fixedly secured to one another.
As a modification of the present invention, at least 3 support rod members, Duo Gezhi are provided between two neighboring storing end-rack
Strut member on reative cell axis into rotationally symmetrical.Using above-mentioned design, it can be by multiple support rod members so as to obtain multiple
Put achievable stable connection between end-rack.
As a modification of the present invention, in the sensor monocrystalline silicon etching device for improving equipment operating efficiency,
Elevating screw is corresponded with support rod member, and each elevating screw is respectively connected with a lifting motor.Using above-mentioned design, its
It can cause to support rod member by multiple lifting motors, put end-rack and magnet coil is lifted under the driving of elevating screw
When, good stability can be kept in real time.
As a modification of the present invention, set in the sensor monocrystalline silicon etching device for improving equipment operating efficiency
Be equipped with four support rod members, each support rod member with it is multiple storing end-rack in, positioned at extreme higher position storings end-rack intersect
End has been fixedly connected with an elevating screw, and every elevating screw is connected respectively to lifting motor.Using above-mentioned design,
It may be such that the stability of connection and the lifting of multiple storing end-rack is able to further improve.
As a modification of the present invention, each is put in end-rack and is provided with multiple directive wheels；The directive wheel exists
Put and extended between end-rack and reative cell, and the outer wall of itself and reative cell fits.Using above-mentioned design, it to put
End-rack can realize that storing end-rack exists together with magnet coil in lifting process by rolling of the directive wheel on reacting outdoor wall
Stability radially, to avoid it from being subjected to displacement to cause monocrystalline silicon etching precision inside reative cell to be affected.
As a modification of the present invention, each is put in end-rack, and it is with supporting the intersection location of rod member to be provided with
One directive wheel, it may be such that storing end-rack is able to further improve together with the radial stability of magnet coil.
As a modification of the present invention, in the outer wall of reative cell, the correspondence position of directive wheel is provided with vertically
The guide rail of extension, the directive wheel is extended to inside guide rail.Using above-mentioned design, it can setting by guide rail
Put and make it that the movement locus of directive wheel is more accurate, to avoid it from offseting.
As a modification of the present invention, preventing rubber layer is provided with the inwall of the guide rail, it can be reduced
The mutual loss of directive wheel and reative cell.
The sensor monocrystalline silicon etching device of equipment operating efficiency is improved using above-mentioned technical proposal, it can be by setting
Put the storing end-rack outside reative cell magnet coil is fixed, putting end-rack can be carried out under the driving of elevating screw
Lifting, to cause magnet coil also to be lifted therewith；Magnet coil in lifting process, what it was produced inside reative cell
Electric Field Distribution can also carry out real-time change, so that the Electric Field Distribution in reative cell is more uniformly distributed, and in reative cell, each position
The reacting gas put is in the presence of above-mentioned electric field, and the distribution of its plasma produced is also more uniformly distributed, and then causes reaction
In room, the craft precision for the etching technics that the monocrystalline silicon of each position is carried out can be able to reach desirability.Said apparatus
So that the overall processing precision of the monocrystalline silicon of batch processing is improved, to avoid the appearance of defect ware, so that sensor
Overall process efficiency gets a promotion.
Brief description of the drawings
Fig. 1 is schematic diagram of the present invention；
Fig. 2 is reative cell horizontal sectional view in the present invention；
Reference numerals list：
1-reative cell, 2-air duct, 3-source of the gas room, 4-pump-line, 5-vavuum pump, 6-horse, 7-horse
Rotating mechanism, 8-magnet coil, 9-put end-rack, 10-support rod member, 11-elevating screw, 12-lifting motor, 13-
Directive wheel, 14-guide rail.
Embodiment
With reference to embodiment, the present invention is furture elucidated, it should be understood that following embodiments are only used for
The bright present invention rather than limitation the scope of the present invention.It should be noted that the word "front", "rear" used below in description,
"left", "right", "up" and "down" refer to the direction in accompanying drawing, and word " interior " and " outer " are referred respectively to towards or away from specific
The direction at component geometry center.
Embodiment 1
As shown in Figure 1 a kind of improves the sensor monocrystalline silicon etching device of equipment operating efficiency, and it includes reaction
Room 1, the upper end of reative cell 1 is provided with air duct 2, and it is connected to the source of the gas room 3 being arranged on outside reative cell 1, reative cell 1
Bottom be provided with pump-line 4, it is connected to the vavuum pump 5 being arranged on outside reative cell 1；The axis of the reative cell 1
Position is provided with horse 6, and it is connected to the horse rotating mechanism 7 being arranged on outside reative cell 1, and it, which has been specifically included, is connected to piece
The rotary shaft of frame rotating mechanism 7, and it is arranged on the electric rotating machine outside reative cell 1；The outside of reative cell 1 is provided with electromagnetism
Coil 8.
Multiple storing end-rack 9 in the horizontal direction are provided with outside the reative cell 1, each puts the equal of end-rack 9
Extension is circularized along the side end face of reative cell 1, the storing end-rack 9 is corresponded with magnet coil 8, each magnet coil 8
The upper surface for the storing end-rack 9 being both secured to corresponding to it；Branch between multiple storing end-rack 9 by extending in vertical direction
Strut member 10 is attached；The outside of the reative cell 1 is provided with multiple elevating screws 11, and it, which is connected to, is arranged on reative cell 1
The lifting motor 12 of upper surface, the elevating screw 11 with it is multiple storing end-rack 9 in, positioned at extreme higher position storing end-rack 9 that
This is fixedly connected.
As a modification of the present invention, as shown in Fig. 2 the sensor monocrystalline silicon for improving equipment operating efficiency is carved
Four support rod members 10 are provided with erosion device, each support rod member 10 is put in end-rack 9 with multiple, positioned at extreme higher position
The intersecting end for putting end-rack 9 has been fixedly connected with an elevating screw 11, and every elevating screw 11 has been connected respectively one
Individual lifting motor 12.Using above-mentioned design, it can be by multiple support rod members so as to can be achieved between obtaining multiple storing end-rack steady
Fixed connection, and it can cause support rod member by multiple lifting motors, put end-rack and magnet coil in elevating screw
When being lifted under driving, good stability can be kept in real time.
The sensor monocrystalline silicon etching device of equipment operating efficiency is improved using above-mentioned technical proposal, it can be by setting
Put the storing end-rack outside reative cell magnet coil is fixed, putting end-rack can be carried out under the driving of elevating screw
Lifting, to cause magnet coil also to be lifted therewith；Magnet coil in lifting process, what it was produced inside reative cell
Electric Field Distribution can also carry out real-time change, so that the Electric Field Distribution in reative cell is more uniformly distributed, and in reative cell, each position
The reacting gas put is in the presence of above-mentioned electric field, and the distribution of its plasma produced is also more uniformly distributed, and then causes reaction
In room, the craft precision for the etching technics that the monocrystalline silicon of each position is carried out can be able to reach desirability.Said apparatus
So that the overall processing precision of the monocrystalline silicon of batch processing is improved, to avoid the appearance of defect ware, so that sensor
Overall process efficiency gets a promotion.
Embodiment 2
As a modification of the present invention, each is put in end-rack 9 and is provided with multiple directive wheels 13；The directive wheel
13 are extended between end-rack 9 and reative cell 1 putting, and the outer wall of itself and reative cell 1 fits.Using above-mentioned design, its
So that putting end-rack in lifting process, storing end-rack can be realized together with electricity by rolling of the directive wheel on reacting outdoor wall
The stability of magnetic coil diametrically, to avoid it from being subjected to displacement to cause inside reative cell monocrystalline silicon etching precision by shadow
Ring.
As a modification of the present invention, each is put in end-rack 9, and it is with supporting the intersection location of rod member 10 to be respectively provided with
There is a directive wheel 13, it may be such that storing end-rack is able to further improve together with the radial stability of magnet coil.
Remaining feature of the present embodiment and advantage are same as Example 1.
Embodiment 3
As a modification of the present invention, in the outer wall of reative cell 1, the correspondence position of directive wheel 13 is provided with along vertical side
To the guide rail 14 of extension, the directive wheel 13 is extended to inside guide rail 14.Using above-mentioned design, it can be by being oriented to
The setting of track make it that the movement locus of directive wheel is more accurate, to avoid it from offseting.
As a modification of the present invention, preventing rubber layer is provided with the inwall of the guide rail 14, it can subtract
The mutual loss of few directive wheel and reative cell.
Remaining feature of the present embodiment and advantage are same as Example 2.
Claims (8)
1. a kind of improve the sensor monocrystalline silicon etching device of equipment operating efficiency, it includes reative cell, reative cell it is upper
End is provided with air duct, and it is connected to the source of the gas room being arranged on outside reative cell, and the bottom of reative cell is provided with pumping
Pipeline, it is connected to the vavuum pump being arranged on outside reative cell；The axial location of the reative cell is provided with horse, and it is connected to
It is arranged on the horse rotating mechanism outside reative cell；Magnet coil is provided with the outside of the reative cell；Characterized in that, described anti-
Answer outdoor to be provided with multiple storing end-rack in the horizontal direction, each put end-rack along the side end face of reative cell into
Annular extension, the storing end-rack is corresponded with magnet coil, and each magnet coil is both secured to the storing corresponding to it
The upper surface of end-rack；It is attached between multiple storing end-rack by the support rod member extended in vertical direction；The reaction
The outside of room is provided with multiple elevating screws, and it is connected to the lifting motor for being arranged on reative cell upper surface, the elevating screw
Put with multiple in end-rack, the storing end-rack positioned at extreme higher position is fixedly secured to one another.
2. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 1, it is characterised in that
Be provided with least 3 support rod members between two neighboring storing end-rack, multiple support rod members on reative cell axis into rotation
Symmetrically.
3. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 2, it is characterised in that
In the sensor monocrystalline silicon etching device for improving equipment operating efficiency, elevating screw is corresponded with support rod member, often
One elevating screw is respectively connected with a lifting motor.
4. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 3, it is characterised in that
Four support rod members, each support bar are provided with the sensor monocrystalline silicon etching device for improving equipment operating efficiency
Part is put in end-rack with multiple, and an elevating screw has been fixedly connected with positioned at the intersecting end of the storing end-rack of extreme higher position,
Every elevating screw is connected respectively to lifting motor.
5. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 4, it is characterised in that
Each is put in end-rack and is provided with multiple directive wheels；The directive wheel is extended between storing end-rack and reative cell,
And the outer wall of itself and reative cell fits.
6. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 5, it is characterised in that
Each is put in end-rack, and it is with supporting the intersection location of rod member to be provided with a directive wheel.
7. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 6, it is characterised in that
In the outer wall of reative cell, the correspondence position of directive wheel is provided with the guide rail vertically extended, the directive wheel extension
To guide rail.
8. improve the sensor monocrystalline silicon etching device of equipment operating efficiency according to described in claim 7, it is characterised in that
Preventing rubber layer is provided with the inwall of the guide rail.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201510399725.7A CN104988582B (en) | 2015-07-09 | 2015-07-09 | The sensor monocrystalline silicon etching device of equipment operating efficiency can be improved |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201510399725.7A CN104988582B (en) | 2015-07-09 | 2015-07-09 | The sensor monocrystalline silicon etching device of equipment operating efficiency can be improved |
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| CN104988582A CN104988582A (en) | 2015-10-21 |
| CN104988582B true CN104988582B (en) | 2017-08-11 |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108998834A (en) * | 2018-07-26 | 2018-12-14 | 芜湖凯兴汽车电子有限公司 | A kind of sensor monocrystalline silicon etching device |
| CN109494177B (en) * | 2018-09-13 | 2021-07-02 | 蚌埠市龙子湖区金力传感器厂 | Sensor monocrystalline silicon etching device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0223616A (en) * | 1988-07-12 | 1990-01-25 | Seiko Epson Corp | Dry etching device and manufacture of semiconductor device |
| US6392187B1 (en) * | 1997-10-15 | 2002-05-21 | Tokyo Electron Limited | Apparatus and method for utilizing a plasma density gradient to produce a flow of particles |
| JP4273016B2 (en) * | 2004-02-10 | 2009-06-03 | キヤノン株式会社 | Method for manufacturing liquid discharge head |
| JP5091258B2 (en) * | 2007-02-26 | 2012-12-05 | ビーコ・インスツルメンツ・インコーポレーテッド | Ion source and method of operating an ion source electromagnet |
| US8419960B2 (en) * | 2008-07-11 | 2013-04-16 | Tokyo Electron Limited | Plasma processing apparatus and method |
| CN101820720A (en) * | 2010-03-24 | 2010-09-01 | 中国地质大学（北京） | Soft magnetic-shell strong-electromagnetic field reinforced-inductive coupling plasma generator |
| KR101226266B1 (en) * | 2010-09-13 | 2013-01-25 | (주)세미머티리얼즈 | Plasma Reactor FOR TEXTURING OF SOLAR CELL |
| KR101251880B1 (en) * | 2011-12-29 | 2013-04-08 | 로체 시스템즈(주) | Apparatus for etching of wafer and wafer etching method using the same |
| CN103227090B (en) * | 2013-02-04 | 2016-04-06 | 深圳市劲拓自动化设备股份有限公司 | A kind of linear plasma source |
| CN204825137U (en) * | 2015-07-09 | 2015-12-02 | 江苏德尔森传感器科技有限公司 | Can improve equipment work efficiency's sensor monocrystalline silicon etching device |
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Effective date of registration: 20160303 Address after: 215600, Jiangsu Suzhou Zhangjiagang Free Trade Zone, Hong Kong and Macao Road 15 sensor industry park Applicant after: Mou Heng Address before: 215600 Jiangsu, Suzhou, Zhangjiagang Free Trade Zone, Hong Kong and Macao road sensor industry park Applicant before: The gloomy sensor Science and Technology Ltd. of Jiangsu Dare |
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Effective date of registration: 20160322 Address after: 400714 Chongqing District of Beibei city and high-tech Industrial Park Road No. 5, No. 317 of the Milky way Applicant after: Chongqing Adelson Sensor Technology Co., Ltd. Address before: 215600, Jiangsu Suzhou Zhangjiagang Free Trade Zone, Hong Kong and Macao Road 15 sensor industry park Applicant before: Mou Heng |
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Effective date of registration: 20210416 Address after: 210000 Zhongguancun Software Park, 7 Yingcui Road, Jiangjun Avenue, Jiangning Development Zone, Nanjing City, Jiangsu Province Patentee after: JIANGSU DER SENSOR HOLDINGS Ltd. Address before: 400714 Chongqing District of Beibei city and high-tech Industrial Park Road No. 5, No. 317 of the Milky way Patentee before: Chongqing Adelson Sensor Technology Co.,Ltd. |
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