CN104250849B - Reaction cavity and epitaxial growth equipment - Google Patents
Reaction cavity and epitaxial growth equipment Download PDFInfo
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- CN104250849B CN104250849B CN201310256108.2A CN201310256108A CN104250849B CN 104250849 B CN104250849 B CN 104250849B CN 201310256108 A CN201310256108 A CN 201310256108A CN 104250849 B CN104250849 B CN 104250849B
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Abstract
The invention provides a reaction cavity and epitaxial growth equipment. The reaction cavity comprises a pallet and an induction coil; the pallet is prepared from a magnetic conductor material and is arranged in the reaction cavity, and multiple supporting sites are arranged on the pallet along the circumferential direction of the pallet and are used to support a to-be processed workpiece; the induction coil surrounds the sidewall of the reaction cavity and employs an induction heating manner to heat the pallet; a reflection part is arranged above the pallet and is used to reflect heat irradiated by the pallet and projected to the reflection part to a low-temperature area of the to-be processed workpiece on the supporting sites of the pallet, so that the temperature difference between the low-temperature area and a high-temperature area of the to-be processed workpiece is supplemented. The provided reaction cavity is capable of enabling the radial temperature of the to-be processed workpiece to tend to be uniform, thereby improving the technology uniformity of the epitaxial growth equipment.
Description
Technical field
The present invention relates to microelectronic processing technique field, in particular it relates to reaction chamber and epitaxial growth equipment.
Background technology
MOCVD（Metal Organic Chemical Vapor Deposition, with
Lower abbreviation MOCVD）Equipment can by II or III race's metallo-organic compound and IV or group Ⅴ element hydride mix after lead to
Enter reaction chamber, mixed gas occurs pyrolysis in the substrate surface of heating, and in substrate surface epitaxial growth shape
Into film.
Fig. 1 is the structural representation of existing MOCVD device, and the MOCVD device includes reaction chamber 10, in reaction chamber
Multi-layer graphite pallet 11 is arranged at intervals with vertically in 10, to carry workpiece to be machined, and workpiece to be machined every
Layer pallet 11 on arrangement mode be：Its fringe region is evenly arranged in along the circumference of pallet 11, as shown in Figure 2；And, anti-
Induction coil is surrounded with the periphery wall for answering chamber 10, which is connected with AC power, to heat by the way of sensing heating
Pallet 11, so as to indirectly heat workpiece to be machined.
During use feeling answers coil heats workpiece to be machined, due to the kelvin effect of sensing heating, alternating magnetic field
In the vertical direction distribution as shown in figure 3, alternating magnetic field distribution density in each layer pallet 11 in the radial direction by
The heart gradually increases to edge, causes the vortex flow that pallet 11 is induced uneven in the distribution density radially of pallet 11, this
So that the non-uniform temperature in the radial direction thereof of pallet 11, so as to cause each workpiece to be machined temperature in the radial direction thereof also uneven
It is even, and then reduce the uniformity of technique.
The content of the invention
It is contemplated that at least solving one of technical problem present in prior art, it is proposed that a kind of reaction chamber and outer
Epitaxial growth equipment, which can be compensated to the low-temperature region of workpiece to be machined, so that workpiece to be machined regional has
Uniform temperature, improves the uniformity in technical process.
A kind of reaction chamber is provided for realizing the purpose of the present invention, which includes pallet and induction coil, the pallet is adopted
Make of magnetic conductor material, and be arranged in the reaction chamber, and be provided with the pallet multiple along its circumference row
The carrying position of row, to carry workpiece to be machined；The induction coil is looped around on the side wall of the reaction chamber, to adopt
The mode of sensing heating heats the pallet, is provided with reflection part above the pallet, and the reflection part is used for will
Heat on the reflection part is radiated to by the pallet, towards the workpiece to be machined being placed on each carrying position of the pallet
Low-temperature region reflection, to compensate the temperature difference between the low-temperature region and high-temperature area of the workpiece to be machined；It is described to be added
The low-temperature region and high-temperature area of work workpiece, is the Liang Ge areas of the direction predetermined division by the centrally directed edge of the pallet
Domain.
Wherein, the quantity of the pallet is one or more, the plurality of pallet vertically interval setting.
Wherein, the quantity of the pallet is for multiple, and the reflection part is formed on the pallet lower surface
Recess；Or, the reflection part is the flat board for being arranged on the tray bottom, and is formed with the lower surface of the flat board
Recess；And the recess is crossed to form by the first inclined-plane and the second inclined-plane relative to pallet place planar tilt, its
In, the incline direction on first inclined-plane and angle are arranged to：The pallet being disposed below is radiated to by first inclined-plane
Heat on first inclined-plane, the low-temperature region towards the workpiece to be machined being placed on each carrying position of the pallet are anti-
Penetrate；The incline direction on second inclined-plane and angle are arranged to：Will not stop that the first inclined-plane direction is placed in the pallet
Each carry position on workpiece to be machined low-temperature region reflection heat.
Wherein, the quantity of the pallet is one, and the reflection part is to be arranged on the flat board above the pallet,
And recess is formed with the lower surface of the flat board；Also, the recess is by relative to pallet place planar tilt
First inclined-plane and the second inclined-plane are crossed to form, and wherein, the incline direction on first inclined-plane and angle are arranged to：Described first
The pallet is radiated to the heat on first inclined-plane by inclined-plane, processed on each carrying position of the pallet towards being placed in
The low-temperature region reflection of workpiece；The incline direction on second inclined-plane and angle are arranged to：First inclined-plane will not be stopped
Heat is reflected towards each low-temperature region for carrying the workpiece to be machined on position for being placed in the pallet.
Wherein, the quantity of the recess is one or more, and in pallet institute in the plane, each recess
The projection of shape on the first inclined-plane and the second inclined-plane is annular nested with one another；And first inclined-plane and the second inclined-plane of different recesses
Concentric ring each other.
Wherein, the quantity of the pallet is for multiple, and the reflection part is formed on the pallet lower surface
Convex portion；Also, the lower surface of the convex portion is the first inclined-plane relative to pallet place planar tilt, first inclined-plane
Incline direction and angle be arranged to：First inclined-plane is radiated to the pallet being disposed below on first inclined-plane
Heat, reflects towards each low-temperature region for carrying the workpiece to be machined on position for being placed in the pallet.
Wherein, the quantity of the pallet is one, and the reflection part is to be arranged on the convex portion above the pallet；
Also, the lower surface of the convex portion is the first inclined-plane relative to pallet place planar tilt, first inclined-plane inclines
Tilted direction and angle are arranged to：The pallet being disposed below is radiated to the heat on first inclined-plane by first inclined-plane
Amount, reflects towards each low-temperature region for carrying the workpiece to be machined on position for being placed in the pallet.
Wherein, the quantity of the convex portion is one or more, and the inclined-plane of each convex portion is flat at pallet place
Projection of shape on face is annular；And the first inclined-plane of different convex portions concentric ring each other.
Wherein, reflecting layer is coated with first inclined-plane, to improve the heat reflectivity on first inclined-plane.
Wherein, the heat reflectivity in the reflecting layer is more than or equal to 0.9.
Wherein, the length according to the low-temperature region of the workpiece to be machined in the pallet radially, the pallet and institute
State the first inclined-plane bottom or topmost between vertical spacing, and first inclined-plane in the pallet in the plane
Level interval between the inner edge of the low-temperature region of the outer rim of projection of shape and the workpiece to be machined, and it is oblique to set described first
The angle of inclination in face.
Wherein, using following formula（1）、（2）And（3）, or（4）、（5）And（6）Calculate the inclination on first inclined-plane
Angle,
L=H1Cot α,（3）
L=H1Cot α,（6）
Wherein, α is the angle of inclination on first inclined-plane；D be first inclined-plane in the pallet in the plane
Level interval between the inner edge of the low-temperature region of the outer rim of projection of shape and the workpiece to be machined；L is first inclined-plane
The pallet projection of shape in the plane radical length；H is between the pallet and first inclined-plane bottom
Vertical spacing；H ' is the vertical spacing between the pallet and first inclined-plane the top；H1Exist for first inclined-plane
Perpendicular to the pallet projection of shape in the plane vertical length；B is the low-temperature region of the workpiece to be machined in institute
State pallet length radially.
Used as another technical scheme, the present invention also provides a kind of epitaxial growth equipment, and which includes reaction chamber, described anti-
Chamber is answered to employ the above-mentioned reaction chamber of present invention offer.
The invention has the advantages that：
The reaction chamber that the present invention is provided, which will be radiated to reflecting part by pallet by the reflection part above pallet
Heat on part, reflects towards each low-temperature region for carrying the workpiece to be machined on position for being placed in the pallet, is added with compensating
Temperature difference between the low-temperature region and high-temperature area of work workpiece, the radial temperature such that it is able to make workpiece to be machined tend to equal
It is even, and then the process uniformity of epitaxial growth equipment can be improved.
The present invention provide epitaxial growth equipment, its pass through using the present invention provide above-mentioned reaction chamber, can make by
The radial temperature of processing workpiece tends to uniform, and then can improve the process uniformity of epitaxial growth equipment.
Description of the drawings
Fig. 1 is the structural representation of existing MOCVD device；
Fig. 2 is the schematic diagram of arrangement mode of the workpiece to be machined on every layer of pallet in Fig. 1；
Fig. 3 is the distribution schematic diagram of the interior alternating magnetic field for producing of reaction chamber in Fig. 1；
The structural representation of the reaction chamber that Fig. 4 is provided for first embodiment of the invention；
A kind of structural representation of the reflection part of the reaction chamber that Fig. 5 is provided for first embodiment of the invention；
Fig. 6 for reflection part pallet perspective view in the plane；
Fig. 7 is the schematic diagram at the angle of inclination on the first inclined-plane for determining reflection part in Fig. 5；
The structural representation of another kind of reflection part of the reaction chamber that Fig. 8 is provided for first embodiment of the invention；
The structural representation of the reflection part of the reaction chamber that Fig. 9 is provided for second embodiment of the invention；
Figure 10 is the schematic diagram at the angle of inclination on the first inclined-plane for determining reflection part in Fig. 9；
A kind of structural representation of the reflection part of the reaction chamber that Figure 11 is provided for third embodiment of the invention；And
The structural representation of another kind of reflection part of the reaction chamber that Figure 12 is provided for third embodiment of the invention.
Specific embodiment
For making those skilled in the art more fully understand technical scheme, come to the present invention below in conjunction with the accompanying drawings
The reaction chamber and epitaxial growth equipment of offer is described in detail.
The structural representation of the reaction chamber that Fig. 4 is provided for first embodiment of the invention.Fig. 5 is first embodiment of the invention
A kind of structural representation of the reflection part of the reaction chamber of offer.Fig. 4 and Fig. 5 is seen also, reaction chamber includes pallet
1st, induction coil 2 and reflection part 3.Wherein, pallet 1 is made using magnetic conductor materials such as graphite, and is arranged on reaction chamber
It is interior, and multiple carrying positions along its circumferential array are provided with pallet 1, to carry workpiece to be machined 4；In the present embodiment
In, the quantity of pallet 1 is multiple, and vertically interval setting；Induction coil 2 is looped around on the side wall of reaction chamber, is used
To heat pallet 1 by the way of sensing heating, so as to indirectly heat workpiece to be machined 4.
During the heating pallet 1 of induction coil 2, due to the kelvin effect of sensing heating, in the vertical direction, alternation
The distribution density in magnetic field is gradually increased to edge by center in the radial direction each layer pallet 1, the whirlpool for causing pallet 1 to induce
Electric current is uneven in the distribution density radially of pallet 1, and this causes the temperature in the radial direction thereof of pallet 1 by centrally directed edge
It is incremented by, so as to cause temperature of each workpiece to be machined 4 near the region at 1 center of pallet relatively low, near the region at 1 edge of pallet
Temperature it is higher.In this case, the Temperature Distribution according to the workpiece to be machined 4 being placed on pallet 1 in the radial direction thereof, will be by
Processing workpiece 4 is low-temperature region and high-temperature area from the direction predetermined division at the centrally directed edge of pallet 1, and by reflecting part
The pallet 1 being disposed below is radiated to the heat on reflection part 3 by part 3, and the low-temperature region towards the workpiece to be machined 4 is anti-
Penetrate.
Below reflection part 3 is described in detail.Specifically, in the present embodiment, reflection part 3 is under pallet 1
One or more recesses formed on surface, each recess is by the first inclined-plane 31 relative to 1 place planar tilt of pallet and
Two inclined-planes 32 are crossed to form, also, as shown in fig. 6, for reflection part 3 pallet 2 perspective view in the plane, each recess
The first inclined-plane 31 and the second inclined-plane 32 pallet 1 thereunder projection of shape in the plane be annular nested with one another,
And first inclined-plane 31 and the second inclined-plane 32 of different recesses, 1 institute's annular corresponding in the plane of pallet thereunder is with one heart
Ring.
Wherein, the incline direction on the first inclined-plane 31 and angle are arranged to：First inclined-plane 31 is by the pallet 1 being disposed below
The heat being radiated on the first inclined-plane 31, the low-temperature region towards the workpiece to be machined 4 being placed on each carrying position of pallet 1 are anti-
Penetrate, reflection path is as shown in Figure 5；The incline direction on the second inclined-plane 32 and angle are arranged to：31 court of the first inclined-plane will not be stopped
Heat is reflected to each low-temperature region for carrying the workpiece to be machined 4 on position for being placed in pallet 1.
The concrete mode for setting the angle of inclination on the first inclined-plane 31 is described in detail with reference to Fig. 7.Specifically, exist
In the present embodiment, the length of the angle of inclination on the first inclined-plane 31 according to the low-temperature region of workpiece to be machined 4 in pallet 1 radially,
Vertical spacing between 31 bottom of pallet 1 and the first inclined-plane, and the first inclined-plane 31 pallet 1 projection shape in the plane
Level interval between the inner edge of the low-temperature region of the outer rim of shape and workpiece to be machined 4 and set.For example, according to following three public affairs
Formula（1）、（2）And（3）The angle of inclination on the first inclined-plane 31 is determined,
L=H1Cot α,（3）
Wherein, α is the angle of inclination on the first inclined-plane 31；D be the first inclined-plane 31 pallet 1 projection of shape in the plane
Outer rim and workpiece to be machined 4 low-temperature region inner edge between level interval；L is that the first inclined-plane 31 is flat at the place of pallet 1
The radical length of the projection of shape on face；H is the vertical spacing between 31 bottom of pallet 1 and the first inclined-plane；H1It is oblique for first
Face 31 perpendicular to pallet 1 projection of shape in the plane vertical length；B is being held in the palm for the low-temperature region of workpiece to be machined 4
The length radially of disk 1.
In above three formula, parameter H, B and D can be determined by actual measurement, and by parameter H, B and D are divided
Dai Ru above three formula, you can calculate parameter alpha, H1And L, i.e. determine the tilt angle alpha on the first inclined-plane 31, and its
Perpendicular to pallet 1 projection of shape in the plane length.In actual applications, can be according to the low temperature of workpiece to be machined 4
The size and location in region is adjusted to above-mentioned parameters.
Preferably, reflecting layer is all covered with the first inclined-plane 31 of each recess, the reflecting layer is by anti-with higher heat
Penetrate rate and resistant to elevated temperatures material is made；To improve the heat reflectivity on the first inclined-plane 31, such that it is able to make the first inclined-plane 31 to quilt
The low-temperature region of processing workpiece 4 reflects more heats.In actual applications, it is to obtain good heat reflection effect, reflecting layer
Heat reflectivity be more than or equal to 0.9.
It should be noted that in the present embodiment, reflection part 3 is one or more formed on 1 lower surface of pallet
Recess, i.e. reflection part 3 is monolithic construction with pallet 1, but the invention is not limited in this, in actual applications, such as schemes
Shown in 8, reflection part 3 can also adopt split-type structural with pallet 1, i.e. reflection part 3 is to be arranged on putting down for 1 bottom of pallet
Plate, and one or more recesses are formed with the lower surface of the flat board.
Also, it should be noted that in the present embodiment, the angle of inclination on the first inclined-plane 31 is according to formula（1）、（2）With（3）
It is determined that, but the present invention is not limited to this, in actual applications, can be with according to following three formula（4）、（5）With（6）It is determined that,
L=H1Cot α,（6）
Wherein, H ' is vertical spacing of the first inclined-plane 31 topmost and between pallet 1；In above three formula（4）、（5）
With（6）In, parameter H ', B and D can be determined by actual measurement, and by by parameter H ', that B and D substitutes into above three respectively is public
Formula, you can calculate parameter alpha, H1And L, i.e. determine the tilt angle alpha on the first inclined-plane 31, and its it is flat being located perpendicular to pallet 1
The length of the projection of shape on face.
Explanation is needed further exist for, in the present embodiment, first inclined-plane 31 and the second inclined-plane 32 of each recess is at which
The pallet 1 of lower section projection of shape in the plane be annular nested with one another, but the invention is not limited in this, in reality
Using in, the knot of the Position Design recess that can be located according to the low-temperature region of each workpiece to be machined 4 being placed on pallet 1
Structure, as long as the pallet 1 being disposed below can be radiated to the heat on the first inclined-plane 31 by the first inclined-plane 31 of recess, direction is put
Reflect in each low-temperature region for carrying the workpiece to be machined 4 on position of pallet 1.
The structural representation of the reflection part of the reaction chamber that Fig. 9 is provided for second embodiment of the invention.Refer to Fig. 9,
The reaction chamber that the present embodiment is provided includes pallet 1, induction coil 2 and reflecting part compared with above-mentioned first embodiment, equally
Part 3.As the 26S Proteasome Structure and Function of pallet 1, induction coil 2 and reflection part 3 there has been in the above-described first embodiment in detail
Description, will not be described here.Difference only with regard to the present embodiment from above-mentioned first embodiment is described below.
Specifically, in the present embodiment, reflection part 3 is one or more convex portions formed on 1 lower surface of pallet；And
And, the lower surface of each convex portion is the first inclined-plane 31 relative to 1 place planar tilt of pallet, the incline direction on the first inclined-plane 31
And angle is arranged to：The pallet 1 being disposed below is radiated to the heat on the first inclined-plane 31 by the first inclined-plane 31, and direction is placed in
Each low-temperature region for carrying the workpiece to be machined 4 on position of pallet 1 reflects.
The concrete mode for setting the angle of inclination on the first inclined-plane 31 is described in detail with reference to Figure 10.Specifically,
The angle of inclination on the first inclined-plane 31 is according to following formula（1）、（2）And（3）It is determined that,
L=H1Cot α,（3）
Or, it is also possible to according to following formula（4）、（5）And（6）It is determined that,
L=H1Cot α,（6）
Wherein, α is the angle of inclination on the first inclined-plane 31；D be the first inclined-plane 31 pallet 1 projection of shape in the plane
Outer rim and workpiece to be machined 4 low-temperature region inner edge between level interval；L is that the first inclined-plane 31 is flat at the place of pallet 1
The radical length of the projection of shape on face；H is the vertical spacing between 31 bottom of the first inclined-plane and pallet 1；H ' is first oblique
Vertical spacing of the face 31 topmost and between pallet 1；H1For the first inclined-plane 31 perpendicular to pallet 1 projection shape in the plane
The vertical length of shape；B is length of the low-temperature region of workpiece to be machined 4 in pallet radially.
In above-mentioned formula（1）、（2）And（3）In, parameter H, B and D can be determined by actual measurement, and by by parameter
H, B and D substitute into above three formula respectively, you can calculate parameter alpha, H1And L, i.e. determine the angle of inclination on the first inclined-plane 31
α, and its perpendicular to pallet 1 projection of shape in the plane length.
In above-mentioned formula（4）、（5）With（6）In, parameter H ', B and D can be determined by actual measurement, and by by parameter
H ', B and D substitute into above three formula respectively, you can calculate parameter alpha, H1And L, i.e. determine the angle of inclination on the first inclined-plane 31
α, and its perpendicular to pallet 1 projection of shape in the plane length.
A kind of structural representation of the reflection part of the reaction chamber that Figure 11 is provided for third embodiment of the invention.Refer to
Figure 11, the reaction chamber that the present embodiment is provided include pallet 1, induction coil 2 compared with above-mentioned first, second embodiment, equally
And reflection part 3；As the 26S Proteasome Structure and Function of pallet 1, induction coil 2 and reflection part 3 is implemented above-mentioned first, second
Example in there has been detailed description, will not be described here, below only with regard to the present embodiment it is different from above-mentioned first, second embodiment it
Place is described in detail.
In the present embodiment, the quantity of pallet 1 is one, also, reflection part 3 is the flat board above the pallet 1,
It is formed with one or more recesses on the lower surface of the flat board, in the 26S Proteasome Structure and Function of the recess and above-mentioned first embodiment
The 26S Proteasome Structure and Function of recess is similar, and as which there has been detailed description in the above-described first embodiment, here is not repeated to retouch
State.
It should be noted that in actual applications, as shown in figure 12, reflection part 3 can also be to be arranged on the pallet 1
The 26S Proteasome Structure and Function of the convex portion in one or more convex portions of side, the 26S Proteasome Structure and Function of the convex portion and above-mentioned second embodiment is similar
Seemingly, as which there has been detailed description in above-mentioned second embodiment, here is not repeated description.
In sum, the reaction chamber that above-mentioned each embodiment is provided, which is by the reflection part 3 above pallet 1
Heat on reflection part 3 will be radiated to by pallet 1, towards the workpiece to be machined 4 being placed on each carrying position of the pallet 1
Low-temperature region reflects, to compensate the temperature difference between the low-temperature region and high-temperature area of workpiece to be machined 4, such that it is able to make to be added
The radial temperature of work workpiece 4 tends to uniform, and then can improve the process uniformity of epitaxial growth equipment.
Used as another technical scheme, the embodiment of the present invention also provides a kind of epitaxial growth equipment, and which includes reaction chamber,
The reaction chamber employs the reaction chamber that above-mentioned each embodiment of the present invention is provided.
The epitaxial growth equipment that the present invention is provided, which is passed through the reaction chamber provided using the present embodiment, can make to be added
The radial temperature of work workpiece tends to uniform, and then can improve the process uniformity of epitaxial growth equipment.
It is understood that the embodiment of above principle being intended to be merely illustrative of the present and the exemplary enforcement for adopting
Mode, but the invention is not limited in this.For those skilled in the art, in the essence without departing from the present invention
In the case of god and essence, various modifications and improvement can be made, these modifications and improvement are also considered as protection scope of the present invention.
Claims (13)
1. a kind of reaction chamber, which includes pallet and induction coil, and the pallet is made using magnetic conductor material, and is arranged on institute
State in reaction chamber, and be provided with multiple carrying positions along its circumferential array on the pallet, to carry processed work
Part；The induction coil is looped around on the side wall of the reaction chamber, to heat the pallet by the way of sensing heating,
Characterized in that, reflection part is provided with above the pallet,
For being radiated to the heat on the reflection part by the pallet being disposed below, direction is placed in this to the reflection part
Each of pallet carries low-temperature region reflection of the workpiece to be machined on position, with compensate the low-temperature region of the workpiece to be machined with
Temperature difference between high-temperature area；The low-temperature region and high-temperature area of the workpiece to be machined, is by the center court of the pallet
Two regions of extrorse direction predetermined division.
2. reaction chamber according to claim 1, it is characterised in that the quantity of the pallet is one or more, described
Multiple pallets vertically interval setting.
3. reaction chamber according to claim 2, it is characterised in that the quantity of the pallet be it is multiple, and
The reflection part is the recess formed on the pallet lower surface；Or, the reflection part is described for being arranged on
The flat board of tray bottom, and recess is formed with the lower surface of the flat board；And
The recess is crossed to form by the first inclined-plane and the second inclined-plane relative to pallet place planar tilt, wherein,
The incline direction on first inclined-plane and angle are arranged to：The pallet being disposed below is radiated to by first inclined-plane
Heat on first inclined-plane, the low-temperature region towards the workpiece to be machined being placed on each carrying position of the pallet are anti-
Penetrate；
The incline direction on second inclined-plane and angle are arranged to：Will not stop that the first inclined-plane direction is placed in the pallet
Each carry position on workpiece to be machined low-temperature region reflection heat.
4. reaction chamber according to claim 2, it is characterised in that the quantity of the pallet is, and
The reflection part is to be arranged on the flat board above the pallet, and on the lower surface of the flat board is formed with recess；
Also,
The recess is crossed to form by the first inclined-plane and the second inclined-plane relative to pallet place planar tilt, wherein,
The incline direction on first inclined-plane and angle are arranged to：The pallet is radiated to described first by first inclined-plane
Heat on inclined-plane, reflects towards each low-temperature region for carrying the workpiece to be machined on position for being placed in the pallet；
The incline direction on second inclined-plane and angle are arranged to：Will not stop that the first inclined-plane direction is placed in the pallet
Each carry position on workpiece to be machined low-temperature region reflection heat.
5. the reaction chamber according to claim 3 or 4, it is characterised in that the quantity of the recess is one or more, and
In pallet institute in the plane, the projection of shape on first inclined-plane and the second inclined-plane of each recess is ring nested with one another
Shape；And
First inclined-plane and the second inclined-plane of different recesses concentric ring each other.
6. reaction chamber according to claim 2, it is characterised in that the quantity of the pallet be it is multiple, and
The reflection part is the convex portion formed on the pallet lower surface；Also, the lower surface of the convex portion be relative to
First inclined-plane of pallet place planar tilt, the incline direction on first inclined-plane and angle are arranged to：Described first
The pallet being disposed below is radiated to the heat on first inclined-plane by inclined-plane, towards each carrying position for being placed in the pallet
On workpiece to be machined low-temperature region reflection.
7. reaction chamber according to claim 2, it is characterised in that the quantity of the pallet is, and
The reflection part is to be arranged on the convex portion above the pallet；Also, the lower surface of the convex portion is relative to described
First inclined-plane of pallet place planar tilt, the incline direction on first inclined-plane and angle are arranged to：First inclined-plane
The pallet being disposed below is radiated to into the heat on first inclined-plane, direction is placed in each of the pallet and carries on position
The low-temperature region reflection of workpiece to be machined.
8. the reaction chamber according to claim 6 or 7, it is characterised in that the quantity of the convex portion is one or more, and
The inclined-plane of each convex portion the pallet projection of shape in the plane be annular；And
First inclined-plane of different convex portions concentric ring each other.
9. the reaction chamber according to claim 3-4, described in 6-7 any one, it is characterised in that in first inclined-plane overlying
Reflecting layer is stamped, to improve the heat reflectivity on first inclined-plane.
10. reaction chamber according to claim 9, it is characterised in that the heat reflectivity in the reflecting layer is more than or equal to
0.9。
11. according to claim 3-4, the reaction chamber described in 6-7 any one, it is characterised in that according to the processed work
Between length of the low-temperature region of part in the pallet radially, the pallet and first inclined-plane bottom or the top
Vertical spacing, and first inclined-plane the pallet projection of shape in the plane outer rim and the workpiece to be machined
Low-temperature region inner edge between level interval, and set the angle of inclination on first inclined-plane.
12. reaction chambers according to claim 11, it is characterised in that using following formula (1), (2) and (3), or
(4), (5) and (6) calculate the angle of inclination on first inclined-plane,
L=H1Cot α, (3)
L=H1Cot α, (6)
Wherein, α is the angle of inclination on first inclined-plane；D be first inclined-plane the pallet projection in the plane
Level interval between the inner edge of the low-temperature region of the outer rim of shape and the workpiece to be machined；L is first inclined-plane in institute
State pallet projection of shape in the plane radical length；H is perpendicular between the pallet and first inclined-plane bottom
Straight spacing；H ' is the vertical spacing between the pallet and first inclined-plane the top；H1It is first inclined-plane vertical
In the pallet projection of shape in the plane vertical length；B is the low-temperature region of the workpiece to be machined in the support
Disk length radially.
A kind of 13. epitaxial growth equipments, which includes reaction chamber, it is characterised in that the reaction chamber employs claim
Reaction chamber described in 1-12 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310256108.2A CN104250849B (en) | 2013-06-25 | 2013-06-25 | Reaction cavity and epitaxial growth equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310256108.2A CN104250849B (en) | 2013-06-25 | 2013-06-25 | Reaction cavity and epitaxial growth equipment |
Publications (2)
| Publication Number | Publication Date |
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| CN104250849A CN104250849A (en) | 2014-12-31 |
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| CN106381480B (en) * | 2016-08-31 | 2019-04-19 | 江苏实为半导体科技有限公司 | A kind of chip carrying disk preparation method improving MOCVD heating uniformity |
| CN113818076B (en) * | 2021-11-19 | 2022-03-15 | 华芯半导体研究院(北京)有限公司 | Bearing device and vapor phase epitaxy equipment |
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Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |