CN104236856B - Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device - Google Patents
Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device Download PDFInfo
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- CN104236856B CN104236856B CN201410456915.3A CN201410456915A CN104236856B CN 104236856 B CN104236856 B CN 104236856B CN 201410456915 A CN201410456915 A CN 201410456915A CN 104236856 B CN104236856 B CN 104236856B
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Abstract
The invention discloses a wave aberration detection device of an objective lens imaging system. The wave aberration detection device comprises a light source, a collimating mirror, a spectroscope, a focusing mirror, a standard spherical reflector, a data processing unit, a wave-front sensor, a first accurate adjustment table and a second accurate adjustment table, wherein the collimating mirror, the spectroscope, the focusing mirror and the standard spherical reflector are sequentially placed in the light emitting direction of the light source, and the wave-front sensor, the first accurate adjustment table and the second accurate adjustment table are connected with the data processing unit. In the wave aberration detection device, the measurement processes and the system error calibration process are switched by changing the position of the standard spherical reflector 5; in the two measurement processes, the standard spherical reflector 5 has the same adjustment accuracy, and therefore the calibration, measurement and correction of device and system errors can be effectively completed, and the wave aberration measurement accuracy is improved. No high-precision standard light source is needed, and cost is reduced; A system error calibration method of the wave aberration detection device is simple and compact in structure and has the advantages of being easy to obtain and the like, and the wave aberration detection of the objective lens imaging system to be detected can be completed through the simple system.
Description
Technical field
The present invention relates to field of optical measuring technologies, specifically a kind of wave aberration detection means of object lens imaging system and
The bearing calibration of this apparatus system error, can change especially for light source, can be added as needed in detection means auxiliary
Help the wave aberration e measurement technology of optics.
Background technology
Wave aberration measurement is usually used in the fields such as adaptive optics, optical detection evaluation.Especially in optical system alignment and thing
In the evaluation of mirror image quality, the measurement of wave aberration is an important means.
It is a kind of widely used wave aberration detection means using Hartmann sensor or shearing interferometer.Traditional Hart
Graceful Wavefront sensor processes software sharing by microlens array, transfer lens, photodetector data.Incident light passes through micro-
Lens array and transfer lens, make light beam conversion imaging to photodetector, output data to data processing by photodetector soft
Part, reduces the optical wavefront of optical system finally by certain algorithm.As Chinese patent application prospectus (application number
98112210.8, publication number cn1245904a) disclosed in a kind of Hartmann wave front sensor.Pass around how improving wavefront at present
The certainty of measurement of sensor it was also proposed that many methods, such as Chinese patent application prospectus (application number 02123756.5, public
The number of opening cn1212508c) a kind of dynamic range of proposing and the adjustable Hartmann wave front sensor of certainty of measurement, and China is specially
One kind that sharp ublic specification of application (application number 201210198965.7, publication number cn102735348a) proposes is based on Hartmann
The wavefront measuring method of Wavefront sensor.But these methods are all around how improving the detection essence of Wavefront sensor itself
Degree is it is impossible to eliminate systematic error in wavefront measurement system.
For the measurement of objective wave aberration, using the wave aberration measured by Wavefront sensor be incident to Wavefront sensor it
The wave aberration of front whole optical system, among these in addition to the wave aberration of object lens, further comprises entrained by light source itself
The wave aberration of the wave aberration of optical element of auxiliary and transfer lens in wave aberration, optical system.Due to these systematic errors
Presence, lead to the precision of Wavefront sensor objective lens wave aberration to substantially reduce.The present invention is directed to enter using Wavefront sensor
Row objective wave aberration measures, and provides one kind can carry out systematic error demarcation and error calibration process convenient object lens imaging system
The wave aberration detection means of system, reduces the requirement to light source and auxiliary optical component for the measuring system, thus can reduce detection
The cost of system, and improve objective wave aberration certainty of measurement.
Content of the invention
It is an object of the invention to provide a kind of device is simple, debug convenient non-interfering method to realize object lens imaging system
Wave aberration high precision test.This detection means does not require on theory of light sources, and general light source can meet requirement.
Meanwhile, the systematic error measurement process of this detection means is simple, be easily achieved so that certainty of measurement can reach Wavefront sensor
The limit of certainty of measurement.
In order to achieve the above object, the technical solution adopted in the present invention is:
A kind of wave aberration detection means of object lens imaging system, its feature is, comprises: light source, sends light along this light source
Collimating mirror, spectroscope, focus lamp and standard spherical reflector that direction is sequentially placed, and data processing unit and this data
Wavefront sensor, the first accurate adjustment platform and the second accurate adjustment platform that processing unit connects respectively；
The light that described light source sends incides described spectroscope after described collimating mirror becomes directional light, by point
It is incident to through described focus lamp after described standard spherical reflector along backtracking to spectroscope, a part after light microscopic reflection
Spectroscope described in light transmission is received by described Wavefront sensor, is processed by described data processing unit；
Described first accurate adjustment platform has five regulation frees degree, for adjusting the position of object lens imaging system to be measured
And direction, the described second accurate adjustment platform has three regulation frees degree, for adjusting described standard spherical reflector
Position and direction.
The imaging system that described object lens imaging system to be measured is single imaging len or is combined by multiple optics.
Described Wavefront sensor is the knockdown Hartmann sensor by microlens array and ccd, or is based on
The shearing interferometer of shear interference principle.
The face shape error of described standard spherical reflector will be less than the accuracy of detection of described Wavefront sensor.
A kind of systematic error correction method of the wave aberration detection means using described objective system, its feature is,
The method is completed by following steps:
1. pass through position and direction that the first fine adjustment platform adjusts object lens imaging system to be measured, make object lens imaging system to be measured
The object point of system is overlapped with the focus of focus lamp, adjusts the position of standard spherical reflector by the second fine adjustment platform, makes standard
The centre of sphere of spherical reflector is overlapped with the picture point of object lens imaging system to be measured；
Wavefront sensor gathers spectroscopical transmission optical information, and is transferred to data processing unit, by data processing unit
Wave aberration w1 under measuring state is obtained after process；
2. by the first fine adjustment platform, object lens imaging system to be measured is removed, standard is adjusted by the second fine adjustment platform
The position of spherical reflector, makes the centre of sphere of standard spherical reflector overlap with the focus of focus lamp；
Wavefront sensor gathers spectroscopical transmission optical information, and is transferred to data processing unit, by data processing list
Unit obtains wave aberration w2 under systematic error demarcation state after processing；
3. calculate w1-w2, that is, complete the correction of object lens imaging system wave aberration detection means systematic error it is achieved that to be measured
The wave aberration measurement of object lens imaging system.
Described systematic error comprises the entrained error of light source itself, collimating mirror, spectroscope, the error of focus lamp introducing
And the measure error that wave front detector error causes.
It is an advantage of the current invention that not needing the spot light of standard or spherical wave as reference, the system of detection means is by mistake
Difference can be removed by way of demarcating, and scaling scheme is simple.By two fine adjustment platforms, position is controlled, make be
System overall structure is simple, debugs conveniently, especially only needs to adjust a little standard spherical reflector i.e. achievable systematic error
High-precision calibrating, can effectively correct wave aberration, light source and the detector that secondary optics in detection means produce and survey
The wave aberration that amount introduces, and the alignment error of light path system.On the basis of this system, auxiliary can be added according to actual needs
Optical element, has no effect on the measurement of wave aberration result.
Brief description
Fig. 1 is object lens imaging system wave aberration detection means measurement pattern figure；
Fig. 2 is object lens imaging system wave aberration detection means systematic error calibration mode figure；
Fig. 3 is wavefront measurement skeleton diagram；
Wherein, 1, light source；2nd, collimating mirror；3rd, spectroscope；4th, focus lamp；5th, standard spherical reflector；6th, Wavefront sensor；
7th, the first fine adjustment platform；8th, the second fine adjustment platform；9th, data processing unit；10th, object lens imaging system to be measured.
Specific embodiment
In order to be better understood from purpose, technical scheme and the advantage of the embodiment of the present invention, below in conjunction with the accompanying drawings and embodiment
The present invention is further illustrated, but should not be limited the scope of the invention with this.
Shown in Fig. 1 is the imaging wave aberration detection means of object lens imaging system.The light that light source 1 sends is through collimating mirror 2
After become directional light, reflexed to by spectroscope 3 and be converted into a1 on the focal plane of focus lamp 4 after focus lamp 4.That is, light source 1 and standard
Straight mirror 2, constitutes the formation assembly of directional light.Spectroscope 3 is used for light splitting and the reflection with wave aberration information of source of parallel light
The transmission of light, becomes the significant components in this device.Focus lamp 4 is the optical element of auxiliary, has a pair for subsidiary
Wave aberration measurement under the image formation state of the imaging system of conjugate point, it is possible to achieve the convergence of directional light, constitutes spot light.
A pair of conjugate point a1 of object lens imaging system 10 to be measured and a2, object point a1 converges to after object lens imaging system 10
Picture point a2, then dissipates again.Converge position in picture point a2 and put into standard spherical reflector 5 so that picture point a2 diverging light passes through
Along backtracking after standard spherical reflector 5 reflection, reflected light is back to spectroscope 3 along light path always.By the first accurate tune
Object lens 10 to be measured and the position of standard spherical reflector 5 and direction are adjusted by section platform 7 and the second fine adjustment platform 8 respectively,
The measurement of described imaging wave aberration can complete arbitrarily to meet the wave aberration measurement under the mutual conjugate condition in position, only needs to meet
Object point a1 is overlapped with the focus of focus lamp 4, picture point a2 is overlapped with the centre of sphere of standard spherical reflector 5.
Along backtracking to the reflected light of spectroscope 3, a part of light transmission is received by Wavefront sensor 6, finally by data
Processing unit 9 processes and obtains wavefront information.Wave-front measurement process is as shown in figure 3, Wavefront sensor 6 is by microlens array and ccd
Composition.Incide from the directional light of spectroscope 3 and light splitting is carried out on microlens array, corresponding positional information figure is gathered by ccd
(Hartmann sensor) or interference pattern (shearing interferometer), delivers in data processing unit 9 and is processed, obtain light beam
Wave aberration information.
It is present in any one optical element in detection means, all can introduce wave aberration.And Wavefront sensor 6 collection is surveyed
The wave aberration of amount is the wave aberration of whole light path system, not only contains the wave aberration of object lens imaging system 10 to be measured, also comprises
Other optical elements measure error that for example collimating mirror, spectroscope, light source error and detector itself introduce etc. in light path.As
What extracts the wave aberration of object lens imaging system to be measured, and subject matter is how to remove other system error.
The removing method of systematic error is as shown in Figure 2.Main thought is to remove object lens imaging system to be measured, then carries out one
The measurement of secondary wave aberration, completes the measurement of other optical modules, light source and detector error in detection means.Accurate by first
Object lens imaging system 10 to be measured is removed by regulating platform 7, and standard spherical reflector 5 is moved to its centre of sphere by the second fine adjustment platform 8
The position overlapping with the focus of focus lamp 4, Wavefront sensor 6 carries out the measurement of a wave aberration again, that is, complete detection means
The demarcation of systematic error.
The systematic error correction method of object lens imaging system wave aberration detection means, comprises the steps of
(1) object lens imaging system 10 to be measured is adjusted by the first fine adjustment platform 7 so as to the focus of object point a1 and focus lamp 4
Overlap, the position of standard spherical reflector is adjusted so as to the centre of sphere and object lens imaging system 10 to be measured by the second fine adjustment platform 8
Picture point a2 overlap.Spectroscope 3 transmitted light is gathered by Wavefront sensor 6, is processed by data processing unit 9 and obtain measuring state
Under wave aberration w1；
(2) by the first fine adjustment platform 7, object lens imaging system 10 to be measured is removed, adjusted by the second fine adjustment platform 8
The position of standard spherical reflector is so as to the centre of sphere is overlapped with the focus of focus lamp 4.Spectroscope 3 transmission is gathered by Wavefront sensor 6
Light, processes, by data processing unit 9, wave aberration w2 obtaining under systematic error demarcation state；
(3) correction of object lens imaging system wave aberration detection means systematic error is completed it is achieved that determinand by w1-w2
The wave aberration measurement of mirror imaging system 10.
For object lens imaging system 10 to be measured, different imaging conjugate point, that is, correspond to different numerical apertures (n.a).Can
With the focus lamp 4 by changing different focal, to realize the coupling of same object lens difference conjugate imaging, to realize different conjugate imagings
Wave aberration measurement.
With regard to the first fine adjustment platform 7 and the second fine adjustment platform 8, the first fine adjustment platform 7 is wherein required not only to have
Three-dimensional regulation, also needs to the two-dimensional adjustment on angled simultaneously, to realize the optical axis pair of object lens imaging system 10 to be measured
Standard, and the regulation that overlaps of object point a1 and focus lamp 4 focus.And for module 8 part, need standard spherical reflector 5
The centre of sphere is overlapped with picture point a2 of object lens imaging system to be measured, because standard spherical reflector 5 has symmetry in itself, therefore only needs
The three-dimensional wanting locus adjusts.
In sum, the invention provides a kind of wave aberration detection means of object lens imaging system, the system of detection means
Error can be removed by way of demarcating.By the first fine adjustment platform 7 and the second fine adjustment platform 8, position is controlled
System, is that system architecture is simple, debugs convenient it is only necessary to the position of adjustment spherical reflector 5 can achieve the high-precision of systematic error
Scale is fixed, the error that entrained error of the light source 1 in system light path itself, collimating mirror 2, spectroscope 3, focus lamp 4 are introduced
And the measure error that wave front detector 6 error causes.Reduce the requirement to light source 1 for the measuring system, improve measuring system
Precision.
Claims (2)
1. a kind of systematic error correction method of the wave aberration detection means of object lens imaging system, the ripple picture of this object lens imaging system
Device for detecting difference comprises: light source (1), sends the collimating mirror (2) that light direction is sequentially placed, spectroscope (3), focus lamp along this light source
And standard spherical reflector (5), and the wavefront that data processing unit (9) is connected respectively with this data processing unit (9) (4)
Sensor (6), the first accurate adjustment platform (7) and the second accurate adjustment platform (8)；The light that described light source (1) sends is through described
Collimating mirror (2) become directional light after incide described spectroscope (3), through described focus lamp after being reflected by spectroscope (3)
(4) be incident to along backtracking to spectroscope (3) after described standard spherical reflector (5), described in a part of light transmission point
Light microscopic (3) is received by described Wavefront sensor (6), is finally processed by described data processing unit (9)；The first described essence
Close adjustment platform (7) has five regulation frees degree, for adjusting position and the direction of object lens imaging system (10) to be measured, described
Second accurate adjustment platform (8) has three regulation frees degree, for adjusting position and the side of described standard spherical reflector (5)
To；It is characterized in that, the method is completed by following steps:
1. pass through position and direction that the first fine adjustment platform (7) adjusts object lens imaging system (10) to be measured, so that object lens to be measured is become
Object point (a1) as system (10) is overlapped with the focus of focus lamp (4), adjusts standard sphere by the second fine adjustment platform (8) anti-
Penetrate the position of mirror (5), so that the centre of sphere of standard spherical reflector (5) is overlapped with the picture point (a2) of object lens imaging system (10) to be measured；
Wavefront sensor (6) gathers the transmission optical information of spectroscope (3), and is transferred to data processing unit (9), by data processing
Unit (9) obtains wave aberration w1 under measuring state after processing；
2. by the first fine adjustment platform (7), object lens imaging system (10) to be measured is removed, adjusted by the second fine adjustment platform (8)
The position of whole standard spherical reflector (5), makes the centre of sphere of standard spherical reflector (5) overlap with the focus of focus lamp (4)；
Wavefront sensor (6) gathers the transmission optical information of spectroscope (3), and is transferred to data processing unit (9), at data
Reason unit (9) obtains wave aberration w2 under systematic error demarcation state after processing；
3. calculate w1-w2, that is, complete the correction of object lens imaging system wave aberration detection means systematic error it is achieved that object lens to be measured
The wave aberration measurement of imaging system (10).
2. the systematic error correction method of object lens imaging system wave aberration detection means according to claim 1, its feature
It is, described systematic error comprises the entrained wave aberration of light source (1) itself, collimating mirror (2), spectroscope (3), focus lamp
(4) wave aberration introducing.
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