CN104191860A - Colored dynamic three-dimensional moire image thin film based on micro printing and preparation method thereof - Google Patents
Colored dynamic three-dimensional moire image thin film based on micro printing and preparation method thereof Download PDFInfo
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- CN104191860A CN104191860A CN201410428043.XA CN201410428043A CN104191860A CN 104191860 A CN104191860 A CN 104191860A CN 201410428043 A CN201410428043 A CN 201410428043A CN 104191860 A CN104191860 A CN 104191860A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/342—Moiré effects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
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Abstract
The invention discloses a colored dynamic three-dimensional moire image thin film based on micro printing and a preparation method of the colored dynamic three-dimensional moire image thin film. The moire image thin film comprises a transparent base material layer, a micro-lens array layer located on one side of the transparent base material layer, and a micro-pattern array layer located on the other side of the transparent base material layer. The micro-lens array layer comprises a plurality of micro-lenses arranged in an array. The micro-pattern array layer comprises a plurality of micro-patterns which are arranged in an array and are different in color. The array arrangement of the micro-lenses is matched with the array arrangement of the micro-patterns. The moire image formed by the moire image thin film is characterized by being colored, dynamic and three-dimensional, and an observer can directly observe a colored three-dimensional dynamic pattern without any special observation skills under any luminous environment.
Description
Technical field
The present invention relates to public's optical visual safety anti-fake technical field, particularly relate to a kind of colored dynamic solid moir é pattern film based on micro-printing and preparation method thereof.
Background technology
In prior art, the main Techniques of Optical Security using is divided three classes: the public is false proof, specialty is false proof and three lines are false proof.The false proof main employing of the public forms main scape pattern, multichannel and dynamic technique.False proof thumbnail image and the word of mostly adopting of specialty, can know and distinguish with the high magnified glass of automatic light source.False proof diffraction element and the various coding techniques etc. of being mainly of three lines.Wherein, public's anti-counterfeiting technology feature is in the normal state, not by any instrument, with the naked eye or sense organ can Direct Recognition feature, the most easily for broad masses of the people distinguish, therefore particularly important.It should have two fundamentals: be easy to identification and be difficult to forge.
In public's anti-counterfeiting technology, at present mainly refer to diffraction light change image DOVID (Diffractive Optically Variable Image Devices) for the Techniques of Optical Security of label, banknote, credit card etc., it comprises the known hologram image of people, comprises pixel hologram, dot matrix hologram and dynamic Mohr diagram etc. that the later stage grows up.Well-known product is as a kind of DOVID technology of French Hologram Industries company development in recent years, be characterized in that image resolution ratio is 600LPI, but the diffraction element resolution of trickle word and lines is to 6000LPI, and brightness of image is high, bright in luster.The optical grating construction of diffraction recognition technology is to be invented by the Switzerland Zurich of Paul Scherrer institute laboratory, and its grating cycle is less than 0.4 μ m, and (the embossed holographic grating cycle is generally 1 μ m).In the time that horizontal level is observed image (or word), be red; When image is planar turned to 90 °, observe bottle green.Machine-readable reliability is high and equipment price is low.But along with holography is in the extensive use in the fields such as ticket, trade mark, packaging, many producers have all had the ability of producing holographic product, make laser hologram be absorbed in trust crisis.
Therefore, people need urgently to find and meet that technology is high, cost is low, the popular technology of easy to identify, arbitral a new generation.As the 4th generation laser in combination hologram technology, by tens even the different two dimensional image of hundreds of by tens hundreds of holograms that time exposure is recorded even, by each side of objective and over time process record get off, three dimensions (the X that this hologram not only can recording and reconstruction object, Y, Z) characteristic, can also the variation of (T) in time of this three-dimensional body of recording and reconstruction.Make this hologram reference object do not limited, need to tens even hundreds of frame two dimensional image carry out record, thereby exposure frequency is tens hundred times even of common holography, this needs special instrument and equipment and more exquisite technical process to realize.Also just like the G-switch technology of Australian SecurencyPTY company, by making special optical layers, realize that to observe from a direction be certain color, observing from orthogonal direction is with it the complementary color of this color, need not Special Training and instrument.Only in one second to several seconds, just can differentiate by easy method.In addition, people have also invented safety line and windowing technology thereof, the threshold that further develops skill, and safety line is the wire mark that the thin-film material that works is made.
Also having the noticeable technology of new generation of a class is by microlens array (Microlens array, MLA) and the More amplifying technique of micrographics array (Micropattern array, MPA) in conjunction with realization.More's amplification relates to a kind of phenomenon, can produce this phenomenon from having when the microlens array of roughly the same cycle dimension is observed the array being made up of identical micrographics, occurs with amplification or the rotation form of micrographics.More amplifies phenomenon general principle at M.C.Hutley, R.Hunt, and R.F.Stevens and P.Savander, Pure Appl.Opt.3 (1994), describes in pp.133～142 to some extent.Drinkwater etc. are in U.S. Patent No. 5,712, take the lead in having proposed the safety device that hemispherical dimpling lens arra is combined with micrographics array in 731.Micrographics is near the back focal plane of dimpling lens, and human eye is observed the More's intensified image that can see micrographics at lenticule convex side, and wherein dimpling aperture of lens is at 50～250 microns, and micrographics array obtains by the mode of intaglio printing, and minimum resolution is 5 microns.Be unfavorable for making the drawback of ultrathin (thickness is less than 50 microns) device in order to overcome above-mentioned patent, in U.S. Patent No. 2005/0180020Al and later patents No.2008/0037131Al, R.A.Steenblik etc. have further expanded the safety device scope of making according to above-mentioned micro-optics principle, as dimpling aperture of lens is decreased to 20～30 microns, focal length is less than 50 microns, space layer is less than 50 microns, micrographics layer has changeable complexity and arranges, can be transparent, translucent, fluorescence, phosphorescence, dye, optically variable pigments etc., and some structures based on reflective mode operation etc. are proposed.A kind of predefined curved Bravias lattice structure has been proposed in Chinese patent safety element (application number 200680048634.8).By design microlens array and micrographics array and permutation and combination thereof, can realize multiple visual effect: 1) micrographics amplifies: invisible micrographics is amplified to and can be directly observed by naked eyes originally; 2) orthogonal movement: while rocking along certain direction, the grand design of observing moves along vertical with it direction; 3) third dimension: the grand design of observing has emersion or depression in the stereoeffect of paper; 4) motion deformation: the variation of size, shape etc. also may occur the grand design of observing in moving process.More's amplifying technique both can realize separately the above-mentioned several visual effects to micrographics, can also realize the combination of above-mentioned several visual effects simultaneously, as a kind of, very easily for naked eyes are distinguished a line technology of looking, it can not copy for digital imagery, scanning, duplicating, printing equipment etc.
In United States Patent (USP) and patent application US5712731, US2005/0180020A1 and US2008/0037131A1, propose dimpling lens arra to be combined and to be applied to safety device with micrographics array, micrographics array is wherein to obtain by the mode of intaglio printing, and minimum resolution is 5 microns.Mainly preparation method is, is coated with photoresist on the fexible films such as PET, and using with the relief printing plate of micro-picture and text is several microns of dark grooves in the photoresist surface imprint degree of depth, by blade coating mode, ink is inserted to groove, makes micro-picture and text show corresponding color.In this micro-diagram text manufacture method, the color of image obtains by Fill Color ink in groove, and micro-picture and text color is single, can not form colorize and show; Micro-picture and text characteristic size is several microns, and general printing-ink particle is tens microns, therefore, needs the nanoscale ink of special facture could serve as Fill Color ink; In order to make abundant ink be received in groove, improve the contrast between micro-picture and text and background, depth of groove will be greater than 3 microns.Need to make large depth-to-width ratio embossed metal template, in the time that large format dynamic image is made, improve its technology difficulty.
Therefore,, for above-mentioned technical problem, be necessary to provide a kind of colored dynamic solid moir é pattern film based on micro-printing and preparation method thereof.
Summary of the invention
In view of this,, in order to solve described the problems of the prior art, the invention provides a kind of colored dynamic solid moir é pattern film based on micro-printing and preparation method thereof.
To achieve these goals, the technical scheme that the embodiment of the present invention provides is as follows:
A kind of colored dynamic solid moir é pattern film based on micro-printing, described moir é pattern film comprises transparent substrate layer, is positioned at the microlens array layer of transparent substrate layer one side and is positioned at the micrographics array layer of transparent substrate layer opposite side, described microlens array layer comprises the lenticule of some array arrangements, described micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches.
As a further improvement on the present invention, described microlens array layer and micrographics array layer are quadrate array arrangement mode or hexagonal array arrangement mode.
As a further improvement on the present invention, in described micrographics array layer, the overall dimensions of micrographics is 10 μ m～100 μ m, and live width is 1 μ m～20 μ m.
As a further improvement on the present invention, the magnifying power of described moir é pattern film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle is each other θ.
As a further improvement on the present invention, the period ratio r of described microlens array and micrographics array is 1 o'clock, and the magnifying power of described moir é pattern film is:
As a further improvement on the present invention, the cycle that the moir é pattern that described moir é pattern film forms moves is:
Wherein, the cycle of microlens array is a, and the cycle of micrographics array is b, and the distance between microlens array and micrographics is h, and the viewing angle of offset from perpendicular is Ф.
Correspondingly, a kind of preparation method of the colored dynamic solid moir é pattern film based on micro-printing, described method comprises:
S1, provide a transparent substrate layer;
S2, prepare microlens array layer in transparent substrate layer one side, described microlens array layer comprises the lenticule of some array arrangements;
S3, prepare micrographics array layer at transparent substrate layer opposite side, described micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches.
As a further improvement on the present invention, described step S3 is specially:
Metal mask version is positioned in transparent substrate layer, and aims at, in metal mask version, comprise the hollow out micrographics structure of some array arrangements;
One end in metal mask version is poured ink into, apply certain pressure at the ink position of metal mask version with scraper plate, move towards the metal mask version other end, ink is expressed to transparent substrate layer from hollow out micrographics structure by scraper plate in movement simultaneously, forms the micrographics of array arrangement;
Repeat above-mentioned steps, in transparent substrate layer, form some cover array arrangements and there is the micrographics of different colours.
As a further improvement on the present invention, the preparation method of described metal mask version is specially:
In metal substrate, evenly apply photoresist or photoetching dry film;
By laser direct-writing or photomask exposure, after developing, form relief type micrographics structure;
By metal plating technique, form metal deposition layer on the surface of the show-through current-carrying part of metal substrate;
Remove photoresist, and metal deposition layer is separated from metal substrate, form the metal mask version with hollow out micrographics structure.
As a further improvement on the present invention, the thickness of described metal mask version is 5um～100um.
As a further improvement on the present invention, the material of described metal mask version is Ni, Cu, Ni-Co alloy or Fe-Ni alloy.
As a further improvement on the present invention, in described metal mask version, be provided with contraposition mark, transparent substrate layer and metal mask version adopt CCD or machinery cover bit alignment.
The present invention has following beneficial effect:
The moir é pattern that moir é pattern film forms has colour, dynamically and three-dimensional characteristic, horizontal parallax and vertical parallax have been retained simultaneously, can demonstrate color three dimension dynamic image clearly, the effect of identification is not only provided, also the manufacture difficulty of anti-fake product will further be increased simultaneously, make observer under any luminous environment, do not need special Observational Techniques just can observe color three dimension motion graphics.
Moir é pattern film preparation is convenient, and micrographics printing cost is low and resolution ratio is high; Metal mask version is easy to make.
Brief description of the drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, the accompanying drawing the following describes is only some embodiment that record in the present invention, for those of ordinary skill in the art, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of moir é pattern film in a detailed description of the invention in the present invention;
Fig. 2 a, 2b are respectively the structural representation of micrographics array layer and microlens array in the embodiment of the invention;
Fig. 3 a～3f is preparation method's process chart of moir é pattern film in the embodiment of the invention;
Fig. 4 a, 4b are respectively the structural representation of the first metal mask version and the second metal mask version in the embodiment of the invention;
Fig. 5 a～5d is preparation method's process chart of metal mask version in the embodiment of the invention.
Detailed description of the invention
Describe the present invention below with reference to detailed description of the invention shown in the drawings.But these embodiments do not limit the present invention, the conversion in structure, method or function that those of ordinary skill in the art makes according to these embodiments is all included in protection scope of the present invention.
The invention discloses a kind of colored dynamic solid moir é pattern film based on micro-printing, comprise transparent substrate layer, be positioned at the microlens array layer of transparent substrate layer one side and be positioned at the micrographics array layer of transparent substrate layer opposite side, microlens array layer comprises the lenticule of some array arrangements, micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of lenticular array arrangement and micrographics matches.
As shown in Figure 1, in a detailed description of the invention of the present invention, moir é pattern film comprises transparent substrate layer 1, microlens array layer 2 and micrographics array layer 3, wherein, microlens array layer comprises the lenticule 21 of some array arrangements, micrographics array layer comprises that the first micrographics 31 of some array arrangements and the second micrographics 32, the first micrographics 31 and the second micrographics 32 have different colors.
The moir é pattern that in present embodiment, moir é pattern film forms not only has solid, dynamic effect, can also realize colorize, below moir é pattern film is elaborated.
The moir é pattern film of lenticule micrographics combination has retained horizontal parallax and vertical parallax simultaneously, ensures that viewing angle is large, makes observer under any luminous environment, does not need special Observational Techniques just can observe three-dimensional colour figure.Want the 3-D view of clear display, lenticule must strictly mate with closely sealed with micrographics, and the color of micrographics is not limited to two covers in other embodiments.
In present embodiment, the structure of micrographics and lenticular structure match.The arrangement mode of micro lens array layer has two kinds, i.e. square arrangement mode or hexagonal array mode.The array arrangement of micrographics is arranged corresponding with corresponding microlens array.
In present embodiment, the magnifying power of moir é pattern film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle is each other θ.
In micrographics array layer, the overall dimensions of micrographics is 10 μ m～100 μ m, and live width is 1 μ m～20 μ m.According to above-mentioned formula, micrographics array amplifies through microlens array, and figure magnifying power M is 20～∞.In the time of r=1, the computing formula of figure magnifying power is
In the time of θ=0.1 °, it is 573 times according to above-mentioned formula figure magnifying power M.Preferably, micrographics height is 5 μ m～100 μ m, if the high 20um of micrographics, the feature size after More's amplification is 11.45mm, and people's bore hole can be identified.
In the time having certain distance between microlens array and micrographics array, because viewing angle variation can cause the movement of micrographics array.Suppose that the microlens array cycle is a, the micrographics array cycle is b, distance between microlens array and micrographics is h (thickness of transparent substrate layer), the cycle of More's enlarged image is L, during taking offset from perpendicular Ф as viewing angle, the cycle that the moir é pattern that moir é pattern film forms moves is:
The dynamic effect of moir é pattern, when cycle of images is larger, the spacing h of lenticule and micrographics is larger, and the cycle of micrographics array is less, and dynamic effect is better.Moir é pattern has two kinds of dynamic effects:
1) if the orientation of micrographics array and microlens array is identical, arrangement cycle difference, observer's change of perspective, can see that the direction that the dynamic direction of More's enlarged image moves with observer is identical or contrary.
2) if micrographics array is identical with the lenticule cycle, but between have a little angle theta, in the time that eyes vertically move, moir é pattern transverse shifting, in the time of eyes transverse shifting, moir é pattern vertically moves.
Stereoeffect be due to observe time binocular parallax form.In the time that the micrographics cycle is less than the lenticule cycle, produce the effect that figure sinks, in the time that the micrographics cycle is greater than the lenticule cycle, produce the effect of figure floating, More's enlarged image that these floatings are sunk forms 3-D effect.
Shown in ginseng Fig. 2 a, 2b, be respectively the structural representation of micrographics array layer and microlens array in the embodiment of the invention.In micrographics array layer, the first micrographics 31 is for having the sun micrographics of the first color and array arrangement, the second micrographics 32 is for having the crescent moon micrographics of the second color and array arrangement, and microlens array layer 2 comprises some lenticules 21 that respective array is arranged that have.
The crescent moon micrographics overall dimensions that has the sun micrographics of the first color and have the second color is 10 μ m～100 μ m, and live width is 1 μ m～20 μ m.According to above-mentioned formula, micrographics array amplifies through microlens array, can observe by bore hole.
In the present invention, the preparation method of moir é pattern film specifically comprises:
S1, provide a transparent substrate layer;
S2, prepare microlens array layer in transparent substrate layer one side, described microlens array layer comprises the lenticule of some array arrangements;
S3, prepare micrographics array layer at transparent substrate layer opposite side, described micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches.
Wherein step S3 is specially:
Metal mask version is positioned in transparent substrate layer, and aims at, in metal mask version, comprise the hollow out micrographics structure of some array arrangements;
One end in metal mask version is poured ink into, apply certain pressure at the ink position of metal mask version with scraper plate, move towards the metal mask version other end, ink is expressed to transparent substrate layer from hollow out micrographics structure by scraper plate in movement simultaneously, forms the micrographics of array arrangement;
Repeat above-mentioned steps, in transparent substrate layer, form some cover array arrangements and there is the micrographics of different colours.
Shown in Fig. 3 a～3f, the preparation method of moir é pattern film in the specific embodiment of the invention is elaborated.
First, provide a transparent substrate layer 1, prepare the lenticule 21 of array arrangement in transparent substrate layer one side, form microlens array layer.
Utilize the saturating ink of metal mask version micrographics part, the non-micrographics part not general principle of strike through is printed.
Shown in ginseng Fig. 3 a, the first metal mask version 41 is positioned in transparent substrate layer 1, and aims at, in the first metal mask version 41, comprise the first hollow out micrographics structure of some array arrangements;
Shown in ginseng Fig. 3 a, 3b, pour first ink 51 with the first color in one end of the first metal mask version 41, apply certain pressure at the first ink position of the first metal mask version with scraper plate 6, move towards first metal mask version 41 other ends, the first ink 51 is expressed to transparent substrate layer 1 from the first hollow out micrographics structure by scraper plate 6 in movement simultaneously.Because the viscous effect of ink makes trace set within limits, printing process middle scraper 6 is line with the first metal mask version 41 with transparent substrate layer 1 all the time and contacts.
After scraper plate 6 is scraped the whole space of a whole page, lifted, the first metal mask version is also lifted simultaneously, and the first ink 51 is gently scraped back to initial position, can form the first micrographics 31 of the array arrangement shown in Fig. 3 c.
Similarly, shown in ginseng Fig. 3 d～3f, second micrographics 32 that can form equally array arrangement by the second metal mask version 42, second ink 52 with the second color and scraper plate 6, its print principle is identical with the print principle of the first micrographics, no longer repeats at this.Different from the first micrographics, the first metal mask version 41 is placed for being close to transparent substrate layer 1, and the second metal mask version 42 is placed for being close to the first micrographics, and distance transparent substrate layer 1 has certain distance.
Ginseng Fig. 4 a, 4b are depicted as the structural representation that has the first metal mask version 41 of sun micrographics in the embodiment of the invention and have the second metal mask version 42 of crescent moon micrographics.Micrographics can be also other figures or word or its combination in other embodiments.
In Fig. 4 a, 4b, black part is divided into barrier bed, and micrographics is openwork part.The overall dimensions of openwork part is 5um～100um, and live width is 0.5 μ m～20 μ m.The thickness 5 μ m～100 μ m of metal mask version, and in metal mask version, there is cross alignment mark, for realize accurate contraposition in post-production.
When printing micrographics, by the cross alignment mark in the first metal mask version and the second metal mask version, adopt CCD or machinery cover bit alignment, thereby realize the colored micrographics array with higher contrast.
Metal mask version in the present invention adopts metal deposition growing method, and concrete steps are:
Shown in ginseng Fig. 5 a, evenly apply photoresist or photoetching dry film 402 in metal substrate 401, photoresist can be negativity or positivity, and thickness is 5um～100um;
By laser direct-writing or photomask exposure, after developing, form the relief type micrographics structure shown in Fig. 5 b;
Shown in ginseng Fig. 5 c, by metal plating technique, form metal deposition layer 403 on the surface of metal substrate 401 show-through current-carrying parts;
Remove photoresist or photoetching dry film, and metal deposition layer 403 is separated from metal substrate 401, can form the metal mask version with hollow out micrographics structure shown in Fig. 5 d.
The graphics resolution of laser direct-write photoetching system can reach 0.2um-0.5um, and therefore, the present invention can realize the micrographics exposure of the above live width of 1um.Therefore, the micrographics live width of above-mentioned metal mask plate can reach 1 micron, and overall dimensions can reach 10 microns.Preferably, the thickness 5um-100um of metal mask plate in the present embodiment, material is Ni, Cu, Ni-Co alloy or Fe-Ni alloy.
The present invention can be applied in anti-counterfeiting technology, and novel anti-counterfeiting technology visually requires: colour, innervation, multidimensional, multichannel and layered effect.
If make colored micrographics with traditional mode of printing, taking the large format silk screen of Luscher company and the top imaging system JetScreen2000 of offset plate as example, it has the ink jet printing head that 256 nozzles form, and the output of 700dpi image in different resolution can be provided; The Amanda of subsidiary of Autoprint Srl. company releases novel temperature-sensitive ink-jet printer DigitAll, can realize the image in different resolution output of 720 × 720dpi; Aspect digital serigraphy, the novel super wide format Grandjet printing machine resolution ratio of Scitex is 370 × 370dpi; The Fresco printing machine of Nur company can reach the resolution ratio of 720dpi.Therefore, with the technical merit of printing at present or printing, (10 μ micrographics m) is made can not to realize high accuracy (site error is less than 1%) and high-resolution, realize thereby do not have the precision that More amplifies, and the printing type of poor efficiency is also difficult to realize mass, the low-cost production of micrographics.
Compared with prior art, the present invention has following beneficial effect:
The moir é pattern that moir é pattern film forms has colour, dynamically and three-dimensional characteristic, horizontal parallax and vertical parallax have been retained simultaneously, can demonstrate color three dimension dynamic image clearly, the effect of identification is not only provided, also the manufacture difficulty of anti-fake product will further be increased simultaneously, make observer under any luminous environment, do not need special Observational Techniques just can observe color three dimension motion graphics.
Moir é pattern film preparation is convenient, micrographics printing cost is low and resolution ratio is high (micrographics overall dimensions 5um～100um, live width 0.5 μ m～20 μ is m); Metal mask version is easy to make.
To those skilled in the art, obviously the invention is not restricted to the details of above-mentioned example embodiment, and in the situation that not deviating from spirit of the present invention or essential characteristic, can realize the present invention with other concrete form.Therefore, no matter from which point, all should regard embodiment as exemplary, and be nonrestrictive, scope of the present invention is limited by claims instead of above-mentioned explanation, is therefore intended to all changes that drop in the implication and the scope that are equal to important document of claim to include in the present invention.Any Reference numeral in claim should be considered as limiting related claim.
In addition, be to be understood that, although this description is described according to embodiment, but be not that each embodiment only comprises an independently technical scheme, this narrating mode of description is only for clarity sake, those skilled in the art should make description as a whole, and the technical scheme in each embodiment also can, through appropriately combined, form other embodiments that it will be appreciated by those skilled in the art that.
Claims (12)
1. the colored dynamic solid moir é pattern film based on micro-printing, it is characterized in that, described moir é pattern film comprises transparent substrate layer, is positioned at the microlens array layer of transparent substrate layer one side and is positioned at the micrographics array layer of transparent substrate layer opposite side, described microlens array layer comprises the lenticule of some array arrangements, described micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches.
2. moir é pattern film according to claim 1, is characterized in that, described microlens array layer and micrographics array layer are quadrate array arrangement mode or hexagonal array arrangement mode.
3. moir é pattern film according to claim 1, is characterized in that, in described micrographics array layer, the overall dimensions of micrographics is 10 μ m～100 μ m, and live width is 1 μ m～20 μ m.
4. moir é pattern film according to claim 1, is characterized in that, the magnifying power of described moir é pattern film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle is each other θ.
5. moir é pattern film according to claim 4, is characterized in that, the period ratio r of described microlens array and micrographics array is 1 o'clock, and the magnifying power of described moir é pattern film is:
6. moir é pattern film according to claim 1, is characterized in that, the cycle that the moir é pattern that described moir é pattern film forms moves is:
Wherein, the cycle of microlens array is a, and the cycle of micrographics array is b, and the distance between microlens array and micrographics is h, and the viewing angle of offset from perpendicular is Ф.
7. a preparation method for the colored dynamic solid moir é pattern film based on micro-printing as claimed in claim 1, is characterized in that, described method comprises:
S1, provide a transparent substrate layer;
S2, prepare microlens array layer in transparent substrate layer one side, described microlens array layer comprises the lenticule of some array arrangements;
S3, prepare micrographics array layer at transparent substrate layer opposite side, described micrographics array layer comprises some cover array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches.
8. preparation method according to claim 7, is characterized in that, described step S3 is specially:
Metal mask version is positioned in transparent substrate layer, and aims at, in metal mask version, comprise the hollow out micrographics structure of some array arrangements;
One end in metal mask version is poured ink into, apply certain pressure at the ink position of metal mask version with scraper plate, move towards the metal mask version other end, ink is expressed to transparent substrate layer from hollow out micrographics structure by scraper plate in movement simultaneously, forms the micrographics of array arrangement;
Repeat above-mentioned steps, in transparent substrate layer, form some cover array arrangements and there is the micrographics of different colours.
9. preparation method according to claim 8, is characterized in that, the preparation method of described metal mask version is specially:
In metal substrate, evenly apply photoresist or photoetching dry film;
By laser direct-writing or photomask exposure, after developing, form relief type micrographics structure;
By metal plating technique, form metal deposition layer on the surface of the show-through current-carrying part of metal substrate;
Remove photoresist, and metal deposition layer is separated from metal substrate, form the metal mask version with hollow out micrographics structure.
10. preparation method according to claim 9, is characterized in that, the thickness of described metal mask version is 5um～100um.
11. preparation methods according to claim 9, is characterized in that, the material of described metal mask version is Ni, Cu, Ni-Co alloy or Fe-Ni alloy.
12. preparation methods according to claim 8, is characterized in that, in described metal mask version, are provided with contraposition mark, and transparent substrate layer and metal mask version adopt CCD or machinery cover bit alignment.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428043.XA CN104191860B (en) | 2014-08-27 | 2014-08-27 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
| PCT/CN2015/075480 WO2016029692A1 (en) | 2014-08-27 | 2015-03-31 | Coloured dynamic stereoscopic moire image thin film based on micro printing and preparation method therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428043.XA CN104191860B (en) | 2014-08-27 | 2014-08-27 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
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| CN107945651A (en) * | 2017-12-12 | 2018-04-20 | 四川云盾光电科技有限公司 | A kind of micronano optical 3D dynamic anti-fakes film and manufacture craft |
| CN108828700A (en) * | 2018-07-18 | 2018-11-16 | 中国科学院光电技术研究所 | It is a kind of based on microlens array and micrographics array can be along the preparation method for the motion graphics that a direction moves |
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| CN111175982B (en) * | 2020-02-24 | 2023-01-17 | 京东方科技集团股份有限公司 | Near-to-eye display device and wearable equipment |
| CN111638568A (en) * | 2020-06-02 | 2020-09-08 | 成都美塔科技有限责任公司 | Dynamic display film and preparation method thereof |
| CN114675354A (en) * | 2020-12-24 | 2022-06-28 | 昇印光电（昆山）股份有限公司 | Optical imaging film, manufacturing method and electronic equipment cover plate carrying optical imaging film |
| CN112630989A (en) * | 2020-12-29 | 2021-04-09 | 苏州大学 | Three-dimensional two-dimensional code imaging film and preparation method of two-dimensional code layer |
| CN112630989B (en) * | 2020-12-29 | 2022-12-16 | 苏州大学 | Three-dimensional two-dimensional code imaging film and preparation method of two-dimensional code layer |
| CN114907593A (en) * | 2021-02-09 | 2022-08-16 | Oppo广东移动通信有限公司 | Composite sheet, method for preparing composite sheet and electronic device |
| CN114851745A (en) * | 2022-05-05 | 2022-08-05 | 中丰田光电科技(珠海)有限公司 | Optical anti-counterfeiting element with additive micro-relief three-dimensional structure, product and preparation method |
| CN114851745B (en) * | 2022-05-05 | 2023-01-13 | 中丰田光电科技(珠海)有限公司 | Optical anti-counterfeiting element with additive micro-relief three-dimensional structure, product and preparation method |
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| WO2016029692A1 (en) | 2016-03-03 |
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