CN104166316A - Online projection objective wave aberration detection device and method - Google Patents
Online projection objective wave aberration detection device and method Download PDFInfo
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Abstract
A kind of on-line detection device of wave aberration of projection lens and method, the structure of the detecting device include light source, rotating diffuser, the first condenser lens, fiber array, the second condenser lens, diffusive optical element, object plane original screen panel, image planes original screen panel, two-dimension photoelectric sensor, Phaseshift controlling module and computer; Rotating diffuser is by bracket, motor and round diffusing scattering optics element group at being provided commonly for converting incoherent light for the light source of coherent light or partially coherent light with multimode fiber array. Be respectively 0 by acquiring phase-shift phase,
π,
10 width interference fringe pictures calculate phase, eliminate influence of the grating multiorder diffractive interference of light to phase extraction precision. Present invention improves object plane gratings to the modulation effect of light field space coherence, realizes high-precision alignment result, the systematic error of phase extraction in wave aberration detection is reduced, to improve the wave aberration detection accuracy of optical system.
Description
Technical field
The present invention relates to a kind of wave aberration pick-up unit of optical system, particularly relate to a kind of on-line detection device of wave aberration and method that adopts the projection lens of lithography machine of expanding light illumination.
Background technology
Photoetching technique is one of core technology of great scale integrated circuit manufacture, the figure on mask is transferred on the photoresist that is coated on silicon chip surface by the method for exposure, then by techniques such as development, etchings, figure is transferred on silicon chip.Projection objective is the core component of litho machine imaging system, and the wave aberration of projection objective is the principal element that causes optical patterning deterioration, and finally causes image contrast decline, the process window of litho machine to dwindle with product yield and reduce.In actual exposure process, the micro-vibration of system and eyeglass continue to be subject to the acute variation that the factors such as the non-uniform heat flux of excimer laser all can cause projection objective wave aberration, therefore need to be in litho machine integrated wave aberration of photo-etching machine projection objective on-line measurement device, to realize fast, accurately the online detection to projection objective wave aberration.
Wave aberration of photo-etching machine projection objective detection technique can be divided three classes according to measuring object: the wave aberration detection technique based on photoresist exposure, the wave aberration detection technique of measuring based on aerial image and the wave aberration detection technique (PMI) based on pupil planar survey.Bright strange shear interference is a kind of wave aberration detection technique based on pupil planar survey, illuminating bundle forms even diffraction light by the mask mark of being manufactured by diffuse component and enters projection objective pupil, shearing grating on light beam projectual mirror image face splits into two identical wavefront, these two wavefront mutually stagger certain distance and in far field the relevant diffraction pattern that obtains.By measuring interference pattern, and utilize Phase Retrieve Algorithm can extract the wave aberration of projection objective, have and there is no the advantages such as space path-length error, accuracy of detection is high, sensitivity is high, can be advantageously applied in online detection of wave aberration of projection objective.But it is incoherent light source that bright strange shear interference requires light source, and grating multi-level diffraction light phase mutual interference meeting has a strong impact on phase extraction precision, and the depth of parallelism to the diffraction grating in object plane and image planes, collimation are had relatively high expectations simultaneously.Therefore reduce light source spatial coherence, eliminate grating multistage diffracted error, improve grating to the capable effect of near peace, be that bright strange shear interference is applied to the prerequisite that high precision projection objective wave aberration detects.
Van De Kerkhof etc. propose a kind of by integrated wave aberration pick-up unit (the formerly technology [1] of reference based on bright strange shear interference principle on mask aligner mask platform and silicon slice platform, Van de Kerkhof, M., et al., Full optical column characterization of DUV lithographic projection tools.Optical Microlithography Xvii, Pts 1-3,2004.5377:p.1960-1970), realize wave aberration of photo-etching machine projection objective and detect online.But the problem that this device exists is: light source is partially coherent light, thereby directly impact affects the problems such as measuring accuracy to light field space coherence's modulation effect.US Patent No. 7333216 discloses a kind of wave aberration pick-up unit that adopts multimode fiber array to reduce light source space coherence (formerly technology [2] of reference, U.Wegmann, H.Haidner, M.Schriever.Apparatus for wavefront detection, United States patent US7333216B2,2008.), but the problem that this device exists is: between object plane grating and image planes grating, lack effectively to the capable regulatory function of near peace, easily drawing-in system error.Matthieu Visser etc. has proposed expansion light source interferometer and has carried out EUV lithographic objective wave aberration detection (formerly technology [3] of reference, Matthieu Visser, Martign K.Dekker, Petra Hegeman, et al., " Extended source interferometry for at-wavelength test of EUV-optics ", Emerging Lithographic Technologies Iii, Pts 1 and2,1999.3676:p.253-263), but the problem existing is the interference that there is no more senior diffraction terms of elimination and 0 grade.
Summary of the invention
The object of the invention is to overcome the deficiency of above-mentioned formerly technology, a kind of on-line detection device of wave aberration of the projection objective based on bright strange shear interference principle is provided, utilize this measurement device projection objective wave aberration, have advantages of that speed is fast, precision is high.
Technical solution of the present invention is as follows:
A kind of on-line detection device of wave aberration of projection lens, its feature is: be rotation scatterer, the first condenser lens, fiber array, the second condenser lens, diffusive optical element, object plane original screen panel, image planes original screen panel, two-dimension photoelectric sensor successively along light source output beam direction; Described object plane original screen panel is placed on object plane pattern displacement platform, and described image planes original screen panel is placed on image planes pattern displacement platform, and described image planes pattern displacement platform is connected with phase shift control module, and described two-dimension photoelectric sensor is connected with computing machine.
Described rotation scatterer, is made up of support, motor and circular diffuse scattering optics element, for coherent light or partially coherent light are converted into incoherent light; Described circular diffuse scattering optics element is arranged on motor, under the driving of motor, rotates along central shaft;
Described diffusive optical element is the optical element that frosted glass, microlens array etc. make illuminating bundle Uniform Illumination in tested optical system numerical aperture;
Described fiber array by the fibre bundle of honeycomb arrangement, can further destroy light field space coherence by multimode optical fiber;
Described object plane original screen panel is P by two cycles
oand the object plane grating that dutycycle is 50% and object plane grating alignment mark composition, two object plane gratings are respectively grid stroke the first grating and grid stroke the second gratings in the x-direction in the y-direction.
The first described grating and the second grating are the diffraction grating of phase grating or amplitude grating or other types.
The cycle P of described object plane grating
ocycle P with described image planes grating
imeet following relation,
P
o＝P
i·M
Wherein, the imaging enlargement factor that M is tested optical system;
Described object plane grating alignment mark is made up of with the 4th grating that is positioned at below the 3rd grating that is positioned at top; Described the 3rd grating and the 4th grating are all line gratings, and the cycle is respectively P
1and P
2, and to differ be 5%;
Described tested optical system numerical aperture is NA, and imaging enlargement factor is M:1;
Described image planes original screen panel is made up of image planes grating and image planes grating alignment mark;
Described image planes grating is to have tessellate layout, and printing opacity unit is with lightproof unit the square that size is identical, and each printing opacity unit is around 4 lightproof unit, and each lightproof unit is around 4 printing opacity unit; The cycle P of described image planes grating
iequal foursquare catercorner length; Described image planes grating printing opacity unit and the diagonal of lightproof unit are parallel to x axle and y direction of principal axis;
Described image planes grating alignment mark is made up of with the 6th grating that is positioned at below the 5th grating that is positioned at top, the cycle of the 5th described grating equals the cycle of object plane grating alignment mark the 4th grating and the product of tested optical system imaging enlargement factor, and the cycle of the 6th described grating equals the cycle of object plane grating alignment mark the 3rd grating and the product of tested optical system imaging enlargement factor;
Described object plane pattern displacement platform is the displacement platform that the first grating and the second grating is moved into respectively to tested optical system object space light path;
Described image planes pattern displacement platform is image planes grating to be moved into the image space light path of tested optical system, and the drive image planes image planes grating displacement platform of motion in the x-direction and in the y-direction;
Described two-dimension photoelectric sensor is camera, CCD, cmos image sensor, PEEM, or 2 D photoelectric detector array, receives the Shearing interference fringes that image planes grating generates on its test surface;
Described computing machine is used for control wave aberration testing process, storage of measurement data, and interferogram is processed and analyzed.
A kind of projection objective wave aberration on-line detection method, performing step is as follows:
(1) adjust the height that rotates scatterer, the light beam that light source sends is seen through from the first half of circular diffuse scattering optics element; Regulate the first condenser lens and fiber array input end, the transmitted light that rotates scatterer is coupled in fiber array preferably;
(2) object plane original screen panel is placed on object plane pattern displacement platform, and adjusts on the object plane of tested optical system, and motive objects concave grating displacement platform moves into the first grating on object plane original screen panel the true field point position of tested optical system;
(3) diffusive optical element is placed near object plane original screen panel position, adjusts the second condenser lens and fiber array output terminal and make object plane original screen panel by Uniform Illumination;
(4) image planes original screen panel is placed on image planes pattern displacement platform, and adjust in the image planes of tested optical system, mobile image planes pattern displacement platform, image planes grating is moved into the image space light fine jade of tested optical system, two-dimension photoelectric sensor is placed in after image planes original screen panel, is used for surveying the interference fringe that image planes grating forms;
(5) adjust object plane pattern displacement platform, the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark on image planes original screen panel according to the object plane grating alignment mark on object plane original screen panel becomes on two-dimension photoelectric sensor is aimed at, in the time that two groups of stripeds overlap completely, illustrated to the first grating and image planes grating to the capable adjusting of near peace (referring to technology [4] formerly, Moon, E.E.and H.I.Smith, Nanometer-precision pattern registration for scanning-probe lithographies using interferometric-spatial-phase imaging.Journal of Vacuum Science & Technology B:Microelectronics and Nanometer Structures, 2006.24 (6): p.3083-3087.),
(6) image planes pattern displacement platform mobile image planes grating in the x-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor gathers a width lateral shear interferograms I
xk, wherein k=1,2,3 ..., 12; Select the 10 width interference fringe pictures except the 8th, 9 width wherein, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the x-direction, represent the gradient information of tested wavefront in x direction;
(7) motive objects concave grating displacement platform, moves into the second grating on object plane original screen panel the true field point position of tested optical system; Adjust object plane pattern displacement platform, the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark on image planes original screen panel according to the object plane grating alignment mark on object plane original screen panel becomes on two-dimension photoelectric sensor is aimed at, in the time that two groups of stripeds overlap completely, illustrated to the second grating and image planes grating to the capable adjusting of near peace;
(8) image planes pattern displacement platform mobile image planes grating in the y-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor gathers a width lateral shear interferograms I
yk, wherein k=1,2,3 ..., 12; Select the 10 width interference fringe pictures except the 8th, 9 width wherein, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the y-direction, represent the gradient information of tested wavefront in y direction;
(9), to above-mentioned phase extraction result solution parcel, obtain respectively the difference wavefront Δ W of x direction and y direction
xwith Δ W
ycarry out shear interference wavefront reconstruction, obtain tested optical system wavefront.
Compared with technology formerly, the present invention has the following advantages:
1. adopt rotation scatterer and fiber array, further destroyed light source space coherence, improved object plane grating pair light field space coherence's modulation effect, improved the measuring accuracy of optical system wavefront aberration.
2. adopt difference grating as alignment mark, produce displacement is had to the amplification Moire fringe of high sensitivity characteristic, thereby realized high-precision alignment result, reduce systematic error.
3. can eliminate well 0 grade with ± 1 grade outside more senior diffraction terms, can eliminate well multi-level diffraction light in bright strange shear interference and interfere the impact on phase extraction precision causing.
4. improve object plane grating pair light field space coherence's modulation effect, realized high-precision alignment result, reduced the systematic error of phase extraction during wave aberration detects, thereby improved the wave aberration accuracy of detection of optical system.
Brief description of the drawings
Fig. 1 is on-line detection device of wave aberration of projection lens schematic diagram of the present invention;
Fig. 2 is rotation scatterer schematic diagram;
Fig. 3 is fiber array cross-sectional view;
Fig. 4 is object plane original screen panel schematic diagram;
Fig. 5 is image planes original screen panel schematic diagram;
Fig. 6 is the Moire fringe producing in the different relative displacement situations of grating alignment mark.
Embodiment
For making content of the present invention, implementation process and advantage clearer, below in conjunction with embodiment and accompanying drawing, the invention will be further described, but should not limit the scope of the invention with this embodiment.
Fig. 1 is the schematic diagram of on-line detection device of wave aberration of projection lens of the present invention, as seen from the figure, this apparatus structure comprises: be rotation scatterer 2, the first condenser lens 3, fiber array 4, the second condenser lens 5, diffusive optical element 6, object plane original screen panel 7, image planes original screen panel 10, two-dimension photoelectric sensor 13 successively along light source 1 output beam direction; Described object plane original screen panel 7 is placed on object plane pattern displacement platform 8, described image planes original screen panel 10 is placed on image planes pattern displacement platform 11, described image planes pattern displacement platform 11 is connected with phase shift control module 12, and described two-dimension photoelectric sensor 11 is connected with computing machine 14;
Described rotation scatterer 2 (referring to Fig. 2), is made up of support 203, motor 202 and circular diffuse scattering optics element 201, for coherent light or partially coherent light are converted into incoherent light; Described circular diffuse scattering optics element 201 is arranged on motor 202, under the driving of motor 202, rotates along central shaft;
Described diffusive optical element 6 is optical elements that frosted glass, microlens array etc. make illuminating bundle Uniform Illumination in tested optical system 9 numerical apertures;
Described fiber array 4 (referring to Fig. 3) is pressed the fibre bundle of honeycomb arrangement by multimode optical fiber, for further destroying the spatial coherence of light field;
Described object plane original screen panel 7 (referring to Fig. 4) is P by two cycles
oand the object plane grating that dutycycle is 50% and object plane grating alignment mark 703 form, two object plane gratings are respectively grid stroke the first grating 701 and grid stroke the second gratings 702 in the x-direction in the y-direction.
The first described grating 701 and the second grating 702 are one dimension diffraction grating of phase type or amplitude type or other types.
Described object plane grating alignment mark 703 is made up of with the 4th grating 705 that is positioned at below the 3rd grating 704 that is positioned at top; Described the 3rd grating 704 and the 4th grating 705 are all line gratings, and the cycle is respectively P
1and P
2, and to differ be 5%;
Described image planes original screen panel 10 (referring to Fig. 5) is made up of image planes grating 1001 and image planes grating alignment mark 1002;
Described image planes grating 1001 is chessboard gratings, has tessellate layout, and printing opacity unit is with lightproof unit the square that size is identical, and each printing opacity unit is around 4 lightproof unit, and each lightproof unit is around 4 printing opacity unit; The cycle P of described image planes grating 1001
iequal foursquare catercorner length; Described image planes grating 1001 printing opacity unit and the diagonal of lightproof unit are parallel to x axle and y direction of principal axis;
Ideally, image planes grating 1001 diffraction only have 0 grade and other odd terms, and even item lacks level, and luminous energy mainly concentrates on 0 grade and ± 1 grade, each odd number order of diffraction produces and interferes far field and 0 grade, and on shear direction, the cycle of equivalent grating is the each cellular construction square of the chessboard grating length of side
doubly.
The diagonal that described image planes grating 1001 is placed to printing opacity unit and lightproof unit is parallel to x axle and the axial state of y, sees it is all Ronchi grating in the x-direction with y direction, and dutycycle is 50%.
Described image planes grating alignment mark 1002 is made up of with the 6th grating 1004 that is positioned at below the 5th grating 1003 that is positioned at top, the cycle of the 5th described grating 1003 equals the cycle of object plane grating alignment mark 703 the 4th grating 705 and the product of tested optical system 9 imaging enlargement factors, and the cycle of the 6th described grating 1004 equals the cycle of object plane grating alignment mark 703 the 3rd grating 704 and the product of tested optical system 9 imaging enlargement factors;
Embodiment:
In DUV exposure optical system, light source 1 is generally ArF, KrF excimer laser, exports light wavelength and is respectively 193nnm, 248nm.ArF excimer laser taking wavelength as 193nm is light source 1, and the numerical aperture of tested optical system 9 is 0.75, imaging enlargement ratio is 4 × and, it is 1/20 that shearing rate is set, and selects the cycle P of image planes grating 801
ibe 2.6 μ m, the object plane grating cycle is P
obe 10.4 μ m; The 5th grating of image planes grating alignment mark and the cycle of the 6th grating are respectively 25 μ m, 26 μ m; The 3rd grating of object plane grating marker and the cycle of the 4th grating are respectively 104 μ m, 100 μ m.
Described object plane pattern displacement platform 8 is the displacement platforms that the first grating 701 and the second grating 702 moved into respectively to tested optical system 9 object space light paths;
Described image planes pattern displacement platform 11 is object plane grating 1001 to be moved into the image space light path of tested optical system 9, and drive object plane grating 1001 displacement platform of motion in the x-direction and in the y-direction;
Described object plane grating alignment mark 703 and image planes grating alignment mark 802 form differential mode grating marker, aim at for the nano high-precision of realizing object plane original screen panel 7 and image planes original screen panel 10;
Described two-dimension photoelectric sensor 13 is camera, CCD, cmos image sensor, PEEM, or 2 D photoelectric detector array, receives the Shearing interference fringes that image planes grating 10 generates on its test surface;
Described computing machine 14 is for control wave aberration testing process, storage of measurement data, and interferogram is processed and analyzed.
Use said apparatus and technology can carry out projection objective wave aberration detection, detection method comprises the following steps:
(1) adjust the height that rotates scatterer 2, the light beam that light source 1 sends is seen through from the first half of circular diffuse scattering optics element 201; Regulate the first condenser lens 3 and fiber array 4 input ends, the transmitted light that makes to rotate scatterer 2 is coupled in fiber array 4 preferably;
(2) object plane original screen panel 7 is placed on object plane pattern displacement platform 8, and adjusts on the object plane of tested optical system 9, and motive objects concave grating displacement platform 8 moves into the first grating 701 on object plane original screen panel 7 the true field point position of tested optical system 9;
(3) diffusive optical element 6 is placed near object plane original screen panel 7 positions, adjusts the second condenser lens 5 and fiber array 4 output terminals and make object plane original screen panel 7 by Uniform Illumination, and ensure that the first grating 701 and object plane grating alignment mark 703 are all thrown light on;
(4) image planes original screen panel 10 is placed on image planes pattern displacement platform 11, and adjust in the image planes of tested optical system 9, mobile image planes pattern displacement platform 11, image planes grating 1001 is moved into the image space light fine jade of tested optical system 9, two-dimension photoelectric sensor 13 is placed in after image planes original screen panel 10, is used for surveying the interference fringe of image planes grating 1001;
(5) adjust object plane pattern displacement platform 8, the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark 1002 on image planes original screen panel 10 according to the object plane grating alignment mark 703 on object plane original screen panel 7 becomes on two-dimension photoelectric sensor 13 is aimed at; Referring to accompanying drawing 6, (a)～(d) be respectively to reduce gradually moire fringe corresponding to process in two group echo grating relative displacements, (e) be that two groups of gratings overlap completely, the candy strip while realizing object plane grating and image planes grating alignment; In the time adjusting object plane pattern displacement platform 11 two groups of stripeds overlapped completely, illustrate to the first grating 701 and image planes grating 1001 to the capable adjusting of near peace;
(6) image planes pattern displacement platform 11 mobile image planes grating 1001 in the x-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor 13 gathers a width lateral shear interferograms I
xk, wherein k=1,2,3 ..., 12; Select I wherein
x1, I
x2, I
x3, I
x4, I
x5, I
x6, I
x7, I
x10, I
x11, I
x12, correspond respectively in x direction phase-shift phase and be 0,
π,
10 width interference fringe pictures, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the x-direction, represent the gradient information of tested wavefront in x direction;
(7) motive objects concave grating displacement platform 8, moves into the second grating 702 on object plane original screen panel 7 the true field point position of tested optical system 9; Adjust object plane pattern displacement platform 8, the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark 1002 on image planes original screen panel 10 according to the object plane grating alignment mark 703 on object plane original screen panel 7 becomes on two-dimension photoelectric sensor is aimed at, in the time that two groups of stripeds overlap completely, illustrated to the second grating 702 and image planes grating 1001 to the capable adjusting of near peace;
(8) image planes pattern displacement platform 11 mobile image planes grating 1001 in the y-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor 13 gathers a width lateral shear interferograms I
yk, wherein k=1,2,3 ..., 12; Select I wherein
y1, I
y2, I
y3, I
y4, I
y5, I
y6, I
y7, I
y10, I
y11, I
y12, correspond respectively in y direction phase-shift phase and be 0,
π,
10 width interference fringe pictures, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the y-direction, represent the gradient information of tested wavefront in y direction;
(9), to above-mentioned phase extraction result solution parcel, obtain respectively the difference wavefront Δ W of x direction and y direction
xwith Δ W
ycarry out shear interference wavefront reconstruction, obtain tested optical system 9 wavefront.
The concrete theory that above-mentioned wave aberration detection method is eliminated the multistage diffracted error of image planes grating is discussed below:
According to bright strange shear interference principle, the light intensity in detection plane is
Wherein, a
0for background light intensity, k is positive integer, a
mfor the m order diffraction of grating diffraction in x direction and the interference fringe contrast of 0 grade,
for the m order diffraction of grating in x direction and the phase differential of 0 inter-stage.While considering phase shift, light intensity expression can be rewritten as
Wherein,
for the phase differential of the m order diffraction in x direction and 0 inter-stage, δ is the phase-shift phase of image planes grating 1001 along shear direction, the phase-shift phase of m order diffraction when m δ represents that grating moves along shear direction.
If consider front 9 order diffractions of image planes optical grating diffraction, suppose
for the phase differential of the m order diffraction on shear direction and 0 inter-stage, m=± 1, ± 3 ..., ± 9.In order to suppress the impact of grating multi-level diffraction light on phase extraction precision, gather phase-shift phase and be 0,
π,
10 width interferograms, respectively walk light intensity and be respectively
Can obtain according to formula (3)～(12):
Due in the time not considering phase shift, in little shearing displacement situation, meet
?
tested optical system 9 is along the phase place of shear direction
for:
In order to recover the two-dimentional original wavefront of tested optical system 9, need to use two orthogonal shear directions to carry out shear interference twice, obtain and represent the gradient information of tested wavefront in x direction and y direction respectively
with
to above-mentioned phase extraction result solution parcel, obtain respectively the difference wavefront Δ W of x direction and y direction
xwith Δ W
ycarry out shear interference wavefront reconstruction, obtain tested optical system 9 wavefront.
Those of ordinary skill in the art should be realized that, above embodiment is only for the present invention is described, and not as limitation of the invention, as long as within the scope of connotation of the present invention, variation to the above embodiment and distortion, within all belonging to the scope of the claims in the present invention book.
Claims (3)
1. an on-line detection device of wave aberration of projection lens, it is characterized in that, comprising: rotation scatterer (2), the first condenser lens (3), fiber array (4), the second condenser lens (5), diffusive optical element (6), object plane original screen panel (7), image planes original screen panel (10), the two-dimension photoelectric sensor (13) placed successively along light source (1) output beam direction;
Described object plane original screen panel (7) is placed on object plane pattern displacement platform (8), described image planes original screen panel (10) is placed on image planes pattern displacement platform (11), this image planes pattern displacement platform (11) is connected with phase shift control module (12), described two-dimension photoelectric sensor (13) be connected with computing machine (14);
Described object plane original screen panel (7) is positioned at the object plane of tested optical system (9), and described image planes original screen panel (10) is positioned at the picture plane of tested optical system (9);
Described object plane original screen panel (7) is P by two cycles
oand the object plane grating that dutycycle is 50%, and object plane grating alignment mark (703) composition, these two object plane gratings are respectively grid stroke the first grating (701) and grid stroke the second gratings (702) in the x-direction in the y-direction;
Described image planes original screen panel is made up of image planes grating and image planes grating alignment mark;
The cycle P of described object plane grating
ocycle P with described image planes grating
imeet following relation,
P
o＝P
i·M
Wherein, M is the imaging enlargement factor of tested optical system (9).
2. on-line detection device of wave aberration of projection lens according to claim 1, it is characterized in that, described rotation scatterer (2) is made up of support (203), motor (202) and circular diffuse scattering optics element (201), for coherent light or partially coherent light are converted into incoherent light; It is upper that described circular diffuse scattering optics element (201) is arranged on motor (202), under the driving of motor (202), rotates along central shaft.
3. a projection objective wave aberration on-line detection method, is characterized in that, the method comprises the steps:
1. the height of adjusting rotation scatterer (2), makes the light beam that light source (1) sends see through from the first half of circular diffuse scattering optics element (201);
Regulate the first condenser lens (3) and fiber array (4) input end, the transmitted light that rotates scatterer (2) is coupled in fiber array (4);
2. object plane original screen panel (7) is placed on object plane pattern displacement platform (8), adjust to object plane pattern displacement platform (8) object plane original screen panel (7) is positioned on the object plane of tested optical system (9), and the first grating (701) on object plane original screen panel (7) moves into the true field point position of tested optical system (9);
3. diffusive optical element (6) is placed near object plane original screen panel (7) position, adjusts the second condenser lens (5) and fiber array (4) output terminal and make object plane original screen panel (7) by Uniform Illumination;
4. image planes original screen panel (10) is placed on image planes pattern displacement platform (11), mobile image planes pattern displacement platform (11) is positioned in the image planes of tested optical system (9) image planes original screen panel (10), and image planes grating (1001) moves into the image space light path of tested optical system (9);
Two-dimension photoelectric sensor (13) is placed in after image planes original screen panel (10), is used for surveying the interference fringe that image planes grating (1001) forms;
5. adjust object plane pattern displacement platform (8), the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark (1002) on image planes original screen panel (10) according to the object plane grating alignment mark (703) on object plane original screen panel (7) becomes on two-dimension photoelectric sensor (13) is aimed at, in the time that two groups of stripeds overlap completely, illustrated to the first grating (701) and image planes grating (1001) to the capable adjusting of near peace, enter step 6.;
6. by image planes pattern displacement platform (11) mobile image planes grating (1001) in the x-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor (13) gathers a width lateral shear interferograms I
xk, wherein k=1,2,3 ..., 12;
Select wherein I
x1, I
x2, I
x3, I
x4, I
x5, I
x6, I
x7, I
x10, I
x11, I
x1210 width interference fringe pictures, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the x-direction, represent the gradient information of tested wavefront in x direction;
7. motive objects concave grating displacement platform (8), moves into the second grating (702) on object plane original screen panel (7) the true field point position of tested optical system (9); Adjust object plane pattern displacement platform (8), the Moire fringe that the differential aligning grating forming with the image planes grating alignment mark (1002) on image planes original screen panel (10) according to the object plane grating alignment mark (703) on object plane original screen panel (7) becomes on two-dimension photoelectric sensor (13) is aimed at, in the time that two groups of stripeds overlap completely, illustrated to the second grating (702) and image planes grating (1001) to the capable adjusting of near peace, enter step 8.;
8. by image planes pattern displacement platform (11) mobile image planes grating (1001) in the y-direction, mobile 12 times, in the mobile 1/12 grating cycle at every turn, each mobile rear two-dimension photoelectric sensor (13) gathers a width lateral shear interferograms I
yk, wherein k=1,2,3 ..., 12;
Select wherein I
x1, I
x2, I
x3, I
x4, I
x5, I
x6, I
x7, I
x10, I
x11, I
x1210 width interference fringe pictures, calculate phase place by following formula:
Wherein,
for tested wavefront phase place in the y-direction, represent the gradient information of tested wavefront in y direction;
9. 6. step is wrapped up with the phase extraction result solution that 8. step obtains, will obtain respectively the difference wavefront Δ W of x direction and y direction
xwith Δ W
ycarry out shear interference wavefront reconstruction, obtain tested optical system (9) wavefront.
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| CN201410421815.7A CN104166316B (en) | 2014-08-26 | On-line detection device of wave aberration of projection lens and detection method |
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| CN104166316A true CN104166316A (en) | 2014-11-26 |
| CN104166316B CN104166316B (en) | 2016-11-30 |
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| CN109900201A (en) * | 2019-03-12 | 2019-06-18 | 中国科学院上海光学精密机械研究所 | Grating shearing interferometric optical imaging system wave aberration detection method |
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