CN104091893A - Color film substrate, method for manufacturing color film substrate and display panel - Google Patents
Color film substrate, method for manufacturing color film substrate and display panel Download PDFInfo
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- CN104091893A CN104091893A CN201410300210.2A CN201410300210A CN104091893A CN 104091893 A CN104091893 A CN 104091893A CN 201410300210 A CN201410300210 A CN 201410300210A CN 104091893 A CN104091893 A CN 104091893A
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- color
- color blocking
- chock insulator
- lamination
- insulator matter
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention discloses a color film substrate, a method for manufacturing the color film substrate and a display panel. The color film substrate, the method for manufacturing the color film substrate and the display panel are used for solving the problems that in the prior art, when a color film substrate is manufactured, the technology for forming insulation mats is complicated, the manufacturing time is long, and the color film substrate manufacturing efficiency is affected. The color film substrate comprises a substrate body, a black matrix, single-layer color resistance and multiple insulation mats, wherein the black matrix is formed on the substrate body, the single-layer color resistance is formed in sub-pixel regions defined by the black matrix, and the multiple insulation mats are located between the sub-pixel regions. Each insulation mat at least comprises a color resistance layer and a shading layer, wherein the color resistance layer is formed by overlapping the single-layer color resistance corresponding to the adjacent multiple sub-pixel regions, and the shading layer is covered with the color resistance layer. The insulation mats are covered with auxiliary electrodes.
Description
Technical field
The present invention relates to flat display technology field, relate in particular to a kind of color membrane substrates and preparation method thereof, display floater.
Background technology
White organic LED (White organic light-emitting diodes, WOLED)+color membrane substrates (Color Filter, CF) technology adopts top transmitting electroluminescent (electroluminescent, EL) mode, has aperture opening ratio advantages of higher.
The structure of WOLED array base palte as shown in Figure 1, comprising: underlay substrate 1; Gate metal layer 2; Gate insulator 3; Active layer 4; Etching barrier layer 5; Source-drain electrode metal level 6; Passivation layer 7; Planarization layer 8; Pixel electrode layer 9, pixel electrode layer 9 is as anode material herein; Luminescent material 10; Cathode material 11; Pixel defines layer 12.The structure of color membrane substrates as shown in Figure 2, comprising: underlay substrate 13; Black matrix 14; Colored filter 15; Insulation material layer 16; Metal wire 17; Chock insulator matter (Photo spacer, PS) 18; Auxiliary electrode layer 19.
Because the processing step that WOLED+CF technology is required is more, amounts of particles while depositing for reducing ITO, require the gap between array base palte and color membrane substrates necessary enough large, need the PS that height of formation is higher and on PS, form auxiliary electrode layer, in forming PS process, need to utilize the region of Mapping Technology formation placement PS (normally at non-pixel region, for example, between adjacent pixel regions), whole underlay substrate is carried out to planarization, apply the thicker coating for the preparation of PS, utilize Mapping Technology to this thicker coating a plurality of steps such as carry out that etching is carried out, Mapping Technology comprises exposure, develop.Therefore, there is complex process in prior art, and for the coating drawing longer problem of time of thicker preparation PS, be unfavorable for improving the preparation efficiency of color membrane substrates.
Summary of the invention
The object of this invention is to provide a kind of color membrane substrates and preparation method thereof, display floater, to solve prior art when preparing color membrane substrates, the complex process, the preparation time that form chock insulator matter are long, affect the problem of the preparation efficiency of color membrane substrates.
The object of the invention is to be achieved through the following technical solutions:
The embodiment of the present invention provides a kind of color membrane substrates, comprise underlay substrate, be formed at the black matrix on described underlay substrate, be formed at individual layer color blocking in the subpixel area that described black matrix encloses, also comprise a plurality of chock insulator matters between described subpixel area, described chock insulator matter at least comprises the light shield layer by the overlapping color blocking lamination forming of individual layer color blocking corresponding to adjacent a plurality of described subpixel area and the described color blocking lamination of covering; On described chock insulator matter, cover auxiliary electrode.
In the embodiment of the present invention, utilize the overlapping described color blocking lamination forming of a plurality of described individual layer color blockings to prepare chock insulator matter for basis, save preparation section and the preparation time of described chock insulator matter, thereby improve the preparation efficiency of described color membrane substrates.
Preferably, described chock insulator matter also comprises transition zone, and described transition zone is between the top end face and described light shield layer of described color blocking lamination.In the embodiment of the present invention, before forming light shield layer, apply the coating of transition zone, avoid, in forming the technique of described light shield layer, the material of described light shield layer being retained in described individual layer color blocking; And can adjust by the thickness of described transition zone is set the height of described chock insulator matter.
Preferably, described color blocking lamination is the lamination of at least three kinds of color blockings in red color resistance, green color blocking, blue color blocking and transparent color blocking.In the embodiment of the present invention, the common overlapping lamination of the individual layer color blocking of usining in adjacent subpixel area, as described color blocking lamination, is conducive to reduce the preparation time of described chock insulator matter.
Preferably, the material of described transition zone is identical with the material of described transparent color blocking.In the embodiment of the present invention, described transition zone does not need special material, and the material preparation with described transparent color blocking, is easy to realize.
Preferably, described chock insulator matter blocks in scope at described black matrix.In the embodiment of the present invention, make described chock insulator matter fall within described black matrix and block in scope, avoid affecting pixel aperture ratio.
Preferably, the profile graphics of described chock insulator matter is trapezoidal, and the profile graphics of described color blocking lamination is trapezoidal or rectangle.In the embodiment of the present invention, described chock insulator matter top end face to bottom surface mask has a gradient, can improve stability.
Preferably, the material of described light shield layer is metal material or opaque resin material.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking, do not need the region that need to place chock insulator matter to be prepared technique, directly utilize the overlapping described color blocking lamination forming of a plurality of described individual layer color blockings for preparing described chock insulator matter in basis, save preparation section and the preparation time of described chock insulator matter, thereby improve the preparation efficiency of described color membrane substrates.
The embodiment of the present invention provides a kind of display floater, comprises color membrane substrates as above.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking, do not need the region that need to place chock insulator matter to be prepared technique, directly utilize the overlapping described color blocking lamination forming of a plurality of described individual layer color blockings for preparing described chock insulator matter in basis, save preparation section and the preparation time of described chock insulator matter, thereby improve the preparation efficiency of described color membrane substrates.
The embodiment of the present invention provides a kind of preparation method of color membrane substrates, comprising:
On underlay substrate, form black matrix;
The subpixel area enclosing at described black matrix applies the coating of corresponding individual layer color blocking, and described underlay substrate is carried out to whole the described individual layer color blocking of exposure formation, the overlapping formation color blocking of the described individual layer color blocking lamination that adjacent described subpixel area is corresponding;
Apply the coating of light shield layer, utilize the mask plate that described light shield layer is corresponding to form chock insulator matter to described substrate-based board to explosure and development, described chock insulator matter comprises described color blocking lamination and described light shield layer;
On described chock insulator matter, form auxiliary electrode layer.
Preferably, before applying the coating of light shield layer, be also included on the top end face of described color blocking lamination and form transition zone.
Preferably, on the top end face of described color blocking lamination, form transition zone, comprising:
On described color blocking lamination, apply the coating of described transition zone;
Utilize the mask plate that described light shield layer is corresponding to expose to the coating of described transition zone; Or the coating of described transition zone is carried out to front baking.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking, do not need the region that need to place chock insulator matter to be prepared technique, directly utilize the overlapping described color blocking lamination forming of a plurality of described individual layer color blockings for preparing described chock insulator matter in basis, save preparation section and the preparation time of described chock insulator matter, thereby improve the preparation efficiency of described color membrane substrates.
Accompanying drawing explanation
Fig. 1 is WOLED array base palte basic structure schematic diagram in prior art;
Fig. 2 is WOLED color membrane substrates basic structure schematic diagram in prior art;
The partial top view of the color membrane substrates that Fig. 3 provides for the embodiment of the present invention;
A kind of color membrane substrates that Fig. 4 provides for the embodiment of the present invention is at the profile at the AA' place of Fig. 3;
The profile of the chock insulator matter on the color membrane substrates that Fig. 5 provides for the embodiment of the present invention;
The another kind of color membrane substrates that Fig. 6 provides for the embodiment of the present invention is at the profile at the AA' place of Fig. 3;
The profile of the chock insulator matter on the another kind of color membrane substrates that Fig. 7 provides for the embodiment of the present invention;
The preparation method's of the color membrane substrates that Fig. 8 provides for the embodiment of the present invention flow chart.
Description of reference numerals:
101, underlay substrate; 102, black matrix; 103, individual layer color blocking; 104, chock insulator matter; 105, color blocking lamination; 106, light shield layer; 107, transition zone; 108, auxiliary electrode.
Embodiment
Below in conjunction with Figure of description, the implementation procedure of the embodiment of the present invention is elaborated.It should be noted that same or similar label from start to finish represents same or similar element or has the element of identical or similar functions.Below by the embodiment being described with reference to the drawings, be exemplary, only for explaining the present invention, and can not be interpreted as limitation of the present invention.
Referring to Fig. 3, the embodiment of the present invention provides a kind of color membrane substrates 100, comprise underlay substrate 101, be formed at the black matrix 102 on underlay substrate, be formed at the middle individual layer color blocking 103 of subpixel area (for example red R, green G, blue B, white W sub-pixel) that black matrix 102 encloses, also comprise a plurality of chock insulator matters 104, each chock insulator matter 104 is between adjacent subpixels region.Well known to a person skilled in the art, corresponding individual layer color blocking 103 is set, for example in different subpixel region, red sub-pixel arranges red color resistance in region, green subpixel areas arranges green color blocking, and blue color blocking is set in blue subpixels region, and transparent color blocking is set in white sub-pixels region; Therefore repeat no more.
Referring to Fig. 4, be the generalized section of the color membrane substrates 100 shown in Fig. 3 at AA' place.In this generalized section, color membrane substrates 100 comprises underlay substrate 101, black matrix 102, the individual layer color blocking 103 that subpixel area is corresponding, the color blocking lamination 105 that individual layer color blocking 103 corresponding to adjacent a plurality of subpixel area forms, light shield layer 106, and auxiliary electrode 108, this auxiliary electrode 108 is covered on the chock insulator matter shown in Fig. 5; Wherein, the chock insulator matter shown in Fig. 3 104 at least comprises color blocking lamination 105 and light shield layer 106.Referring to Fig. 5, show the generalized section of chock insulator matter 104, chock insulator matter 104 at least comprises the light shield layer 106 by the overlapping color blocking lamination forming 105 of adjacent a plurality of individual layer color blockings 103 and covering color blocking lamination 105, light shield layer 106 can make color blocking lamination 105 not have light transmission, avoids the impact on display effect.In the embodiment of the present invention, utilize the overlapping color blocking lamination 105 forming of a plurality of individual layer color blockings 103 for preparing chock insulator matter 104 in basis, save preparation section and the preparation time of chock insulator matter 104, thereby improve the preparation efficiency of color membrane substrates 100.
Chock insulator matter 104 shown in Fig. 5, when prepared by the light shield layer 106 in preparation process, may cause in individual layer color blocking 103 and produce residue, in order to address this problem, provide another kind of color membrane substrates 100, referring to Fig. 6, color membrane substrates 100 comprises underlay substrate 101, black matrix 102, each individual layer color blocking 103, the color blocking lamination 105 that each individual layer color blocking 103 forms, transition zone 107, light shield layer 106, and auxiliary electrode 108, this auxiliary electrode 108 is covered on the chock insulator matter shown in Fig. 7; Fig. 6 is the generalized section at AA' place based on color membrane substrates shown in Fig. 3, and wherein, the chock insulator matter 104 shown in Fig. 3 comprises color blocking lamination 105 and light shield layer 106, also comprises transition zone 107.Ginseng figure Fig. 7, chock insulator matter 104 comprises that light shield layer 106 can make color blocking lamination 105 not have light transmission, avoids the impact on display effect by the light shield layer 106 of the overlapping color blocking lamination forming 105 of adjacent a plurality of individual layer color blockings 103 and covering color blocking lamination 105; Also comprise transition zone 107, transition zone 107 is between the top end face and light shield layer 106 of color blocking lamination 105, by transition zone 107 is set, make follow-up while preparing light shield layer 106, residue is created in the transition zone coating in subpixel area, after having prepared, the mistake of subpixel area can be tided over to layer coating and remove, so in the individual layer color blocking 103 in subpixel area, not have the residue of light shield layer 106.
Based on above-described embodiment:
Preferably, color blocking lamination 105 is the lamination of at least three kinds of color blockings in red color resistance, green color blocking, blue color blocking and transparent color blocking.In the embodiment of the present invention, the common overlapping lamination of the individual layer color blocking 103 of usining in adjacent subpixel area, as color blocking lamination 105, is conducive to reduce the preparation time of chock insulator matter 104.
Preferably, the material of transition zone 107 is identical with the material of transparent color blocking.In the embodiment of the present invention, transition zone 107 does not need special material, and the material preparation with transparent color blocking, is easy to realize.
Preferably, chock insulator matter 104 blocks in scope at black matrix 102.In the embodiment of the present invention, make chock insulator matter 104 fall within black matrix 102 and block in scope, avoid affecting pixel aperture ratio.
Preferably, the profile graphics of chock insulator matter 104 is trapezoidal, and the profile graphics of color blocking lamination 105 is trapezoidal or rectangle.In the embodiment of the present invention, chock insulator matter 104 top end faces to bottom surface mask has a gradient, can improve stability.
Preferably, the material of light shield layer 106 is metal material or opaque resin material.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking 103, do not need the region that chock insulator matter 104 needs are placed to be prepared technique, directly utilize the overlapping color blocking lamination 105 forming of a plurality of individual layer color blockings 103 for preparing chock insulator matter 104 in basis, save preparation section and the preparation time of chock insulator matter 104, thereby improve the preparation efficiency of color membrane substrates 100.
The embodiment of the present invention provides a kind of display floater, comprises the color membrane substrates 100 that as above embodiment provides.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking, do not need the region that need to place chock insulator matter to be prepared technique, directly utilize the overlapping color blocking lamination forming of a plurality of individual layer color blockings for preparing chock insulator matter in basis, save preparation section and the preparation time of chock insulator matter, thereby improve the preparation efficiency of color membrane substrates.
Referring to Fig. 8, the embodiment of the present invention provides a kind of preparation method of color membrane substrates, comprising:
201, on underlay substrate, form black matrix.
202, the subpixel area enclosing at black matrix applies the coating of corresponding individual layer color blocking, and underlay substrate is carried out to whole exposure formation individual layer color blocking, the overlapping formation color blocking of the individual layer color blocking lamination that adjacent subpixel area is corresponding.
204, the coating of coating light shield layer, utilizes the mask plate that light shield layer is corresponding to form chock insulator matter to substrate-based board to explosure and development, and chock insulator matter comprises color blocking lamination and light shield layer.
205, on chock insulator matter, form auxiliary electrode layer.
Preferably, before applying the coating of light shield layer, also comprise 203, on the top end face of color blocking lamination, form transition zone.
Preferably, on the top end face of color blocking lamination, form transition zone, comprising:
On color blocking lamination, apply the coating of transition zone;
Utilize the mask plate that light shield layer is corresponding to expose to the coating of transition zone; Or the coating of transition zone is carried out to front baking.
Embodiment of the present invention beneficial effect is as follows: after forming individual layer color blocking, do not need the region that need to place chock insulator matter to be prepared technique, directly utilize the overlapping color blocking lamination forming of a plurality of individual layer color blockings for preparing chock insulator matter in basis, save preparation section and the preparation time of chock insulator matter, thereby improve the preparation efficiency of color membrane substrates.
Obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.
Claims (11)
1. a color membrane substrates, comprise underlay substrate, be formed at the black matrix on described underlay substrate, be formed at individual layer color blocking in the subpixel area that described black matrix encloses, it is characterized in that, also comprise a plurality of chock insulator matters between described subpixel area, described chock insulator matter at least comprises the light shield layer by the overlapping color blocking lamination forming of individual layer color blocking corresponding to adjacent a plurality of described subpixel area and the described color blocking lamination of covering; On described chock insulator matter, cover auxiliary electrode.
2. color membrane substrates as claimed in claim 1, is characterized in that, described chock insulator matter also comprises transition zone, and described transition zone is between the top end face and described light shield layer of described color blocking lamination.
3. color membrane substrates as claimed in claim 1, is characterized in that, described color blocking lamination is the lamination of at least three kinds of color blockings in red color resistance, green color blocking, blue color blocking and transparent color blocking.
4. color membrane substrates as claimed in claim 3, is characterized in that, the material of described transition zone is identical with the material of described transparent color blocking.
5. the color membrane substrates as described in claim 1 to 4 any one, is characterized in that, described chock insulator matter blocks in scope at described black matrix.
6. color membrane substrates as claimed in claim 5, is characterized in that, the profile graphics of described chock insulator matter is trapezoidal, and the profile graphics of described color blocking lamination is trapezoidal or rectangle.
7. color membrane substrates as claimed in claim 1, is characterized in that, the material of described light shield layer is metal material or opaque resin material.
8. a display floater, is characterized in that, comprises the color membrane substrates as described in claim 1 to 7 any one.
9. a preparation method for color membrane substrates, is characterized in that, comprising:
On underlay substrate, form black matrix;
The subpixel area enclosing at described black matrix applies the coating of corresponding individual layer color blocking, and described underlay substrate is carried out to whole the described individual layer color blocking of exposure formation, the overlapping formation color blocking of the described individual layer color blocking lamination that adjacent described subpixel area is corresponding;
Apply the coating of light shield layer, utilize the mask plate that described light shield layer is corresponding to form chock insulator matter to described substrate-based board to explosure and development, described chock insulator matter comprises described color blocking lamination and described light shield layer;
On described chock insulator matter, form auxiliary electrode layer.
10. preparation method as claimed in claim 9, is characterized in that, before applying the coating of light shield layer, is also included on the top end face of described color blocking lamination and forms transition zone.
11. preparation methods as claimed in claim 10, is characterized in that, on the top end face of described color blocking lamination, form transition zone, comprising:
On described color blocking lamination, apply the coating of described transition zone;
Utilize the mask plate that described light shield layer is corresponding to expose to the coating of described transition zone; Or the coating of described transition zone is carried out to front baking.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410300210.2A CN104091893A (en) | 2014-06-26 | 2014-06-26 | Color film substrate, method for manufacturing color film substrate and display panel |
| PCT/CN2014/087909 WO2015196613A1 (en) | 2014-06-26 | 2014-09-30 | Color film substrate and manufacturing method therefor, and display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410300210.2A CN104091893A (en) | 2014-06-26 | 2014-06-26 | Color film substrate, method for manufacturing color film substrate and display panel |
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| CN104091893A true CN104091893A (en) | 2014-10-08 |
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| CN201410300210.2A Pending CN104091893A (en) | 2014-06-26 | 2014-06-26 | Color film substrate, method for manufacturing color film substrate and display panel |
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| WO (1) | WO2015196613A1 (en) |
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| CN107450221A (en) * | 2017-08-11 | 2017-12-08 | 京东方科技集团股份有限公司 | Color membrane substrates, display panel, display device and preparation method thereof |
| CN107731873A (en) * | 2017-10-12 | 2018-02-23 | 深圳市华星光电半导体显示技术有限公司 | Color membrane substrates and preparation method thereof and OLED display device |
| CN107728389A (en) * | 2017-10-17 | 2018-02-23 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN108205220A (en) * | 2018-01-16 | 2018-06-26 | 青岛海信电器股份有限公司 | Black matrix substrate and preparation method thereof, colored filter, display panel and equipment |
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| WO2019071752A1 (en) * | 2017-10-12 | 2019-04-18 | 深圳市华星光电半导体显示技术有限公司 | Color film substrate, manufacturing method therefor and oled display device |
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| CN108231846A (en) * | 2018-01-02 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method thereof, display device |
| CN108205220A (en) * | 2018-01-16 | 2018-06-26 | 青岛海信电器股份有限公司 | Black matrix substrate and preparation method thereof, colored filter, display panel and equipment |
| CN114355678B (en) * | 2018-02-09 | 2023-11-03 | 京东方科技集团股份有限公司 | Display substrate and display device |
| CN114355678A (en) * | 2018-02-09 | 2022-04-15 | 京东方科技集团股份有限公司 | Display substrate and display device |
| CN109254448A (en) * | 2018-11-15 | 2019-01-22 | 成都中电熊猫显示科技有限公司 | Color membrane substrates and liquid crystal display panel |
| CN109799640A (en) * | 2019-03-13 | 2019-05-24 | 信利（惠州）智能显示有限公司 | Color membrane substrates production method |
| CN110361887A (en) * | 2019-06-28 | 2019-10-22 | 厦门天马微电子有限公司 | Color membrane substrates and preparation method thereof, display panel |
| CN110707138A (en) * | 2019-10-31 | 2020-01-17 | 深圳市华星光电半导体显示技术有限公司 | OLED display panel and manufacturing method thereof |
| CN111029388A (en) * | 2019-12-20 | 2020-04-17 | 武汉华星光电半导体显示技术有限公司 | Display panel and preparation method thereof |
| WO2021120324A1 (en) * | 2019-12-20 | 2021-06-24 | 武汉华星光电半导体显示技术有限公司 | Display panel and preparation method thereof |
| CN111158183A (en) * | 2020-01-16 | 2020-05-15 | 福建华佳彩有限公司 | Panel structure, panel and manufacturing method |
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|---|---|
| WO2015196613A1 (en) | 2015-12-30 |
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