CN104076533A - Method for improving performance of electrically-controlled diffraction device - Google Patents

Method for improving performance of electrically-controlled diffraction device Download PDF

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Publication number
CN104076533A
CN104076533A CN201410355643.8A CN201410355643A CN104076533A CN 104076533 A CN104076533 A CN 104076533A CN 201410355643 A CN201410355643 A CN 201410355643A CN 104076533 A CN104076533 A CN 104076533A
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crystal
automatically controlled
niobate
optical element
diffractive optical
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�田�浩
周忠祥
王磊
孟祥达
胡程鹏
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Harbin Institute of Technology
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Harbin Institute of Technology
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Abstract

The invention relates to a method for improving performance of an electrically-controlled diffraction device and aims to solve the technical problems that recording time is long, the driving voltage is high, the space charge field is small and the space charge field is influenced by the recording angle in the conventional electrically-controlled diffraction method. According to the method provided by the invention, direct-current external electric fields are applied to the two ends of an electrically-controlled holographic crystal in the electrically-controlled diffractive device when gratings are recorded. The method can be used in miniaturized or integrated optical systems.

Description

A kind of method that improves automatically controlled diffractive optical element performance
Technical field
The present invention relates to improve the method for automatically controlled diffractive optical element performance.
Background technology
Along with the develop rapidly of modern information technology, for the storage of information and treatment technology, be the focus of research, and automatically controlled diffraction exactly have the powerful application potential of this respect always.At present, the automatically controlled diffraction property based on material has been developed multiple high speed optical device, such as holographic optical switch, optical beam-splitter, optical holography memory device etc.Its principle is to utilize holographic method to write holographic grating in paraelectric phase electric control holographic material, thereby reaches the object of controlling outgoing beam.But the automatically controlled diffraction property of existing automatically controlled diffractive optical element is all to utilize the automatically controlled diffraction property of crystalline material to realize completely, have the following disadvantages, the first, in during grating record, only rely on the diffusional effect of the sharp charge carrier of light to form grating, reach a few minutes writing time; The second, the diffraction efficiency under lower driving electric field is not high, generally need under larger electric field driven, could obtain large diffraction efficiency (as 700V/mm); The 3rd, the space charge field producing due to diffusional effect while recording grating is little, and under different recording angular, space charge field has very big-difference.These shortcomings all will cause the application of automatically controlled diffractive optical element limited, are the key factors that hinders its development.In the epoch of the develop rapidly of optical communication and optical information processing system, the method that can realize a kind of automatically controlled diffraction that writing time is short, driving voltage is low, space charge field is large becomes inevitable demand.
Summary of the invention
The present invention will solve the technical matters that the writing time of the method for existing automatically controlled diffraction is long, driving voltage is high, space charge field is little, space charge field is affected by recording angular, and a kind of method that improves automatically controlled diffractive optical element performance is provided.
The method of the automatically controlled diffractive optical element performance of raising of the present invention is, when recording grating, the electric control holographic crystal two ends in automatically controlled diffractive optical element are applied to direct current external electric field.
The method that automatically controlled diffraction property is enhanced that the present invention proposes, to utilize when recording grating, to crystalline material two ends in addition a certain size direct current external electric field realize, by the effect of additional enhancing electric field, make not only to rely on diffusion field to be used for forming space charge field at material internal, also exist than the contribution of its stronger drift field.
In the present invention by when recording grating hologram to crystal two ends external electric field in addition, can realize when guaranteeing still there is larger diffraction efficiency, writing time from a few minutes that reach maximum diffraction efficiency are shortened to several seconds, shortened writing time greatly, be much better than traditional automatically controlled diffraction property, can meet the requirement of optical-fiber network to high-speed record optical device; Driving voltage is relatively low just can realize large diffraction efficiency.When not adding outer enhancing electric field, need larger read-out voltage just can reach maximum diffraction efficiency, and can reduce to a certain extent driving voltage by electric field enhancement effect; Enhancing that all can implementation space charge field under different recording angulars, and what different angles strengthened comes to the same thing, improve the size that light swashs the space charge field of charge carrier formation, and make it not be subject to the impact of recording angular, this can be applied in optical device that multi-angle selects automatically controlled diffraction property, is conducive to miniaturization that device designs and develops, integrated.High speed of the present invention, real-time automatically controlled diffractive optical element can meet the requirement of following new optical devices.
Accompanying drawing explanation
Fig. 1 measures the light path schematic diagram of the paraelectric phase potassium tantalate-niobate crystalline material diffraction efficiency of doped with manganese and iron in test one; Wherein 1 is laser instrument, and 2 is beam splitter, and 3 is the first attenuator, and 4 is the second attenuator, 5 is the first catoptron, and 6 is the second catoptron, and 7 is the first optical shutter, and 8 is the second optical shutter, 9 is paraelectric phase electric control holographic crystal, and 10 is photodetector, and 11 is direct voltage source.
Fig. 2 is grating record, read in overall process light intensity over time.
Fig. 3 is recording angular while being 2 θ=20 °, electric field E in addition in recording process 0w=300V/mm, 400V/mm, 500V/mm strengthen and without the diffraction efficiency under electric field enhancing condition with measure of the change result figure writing time.
Fig. 4 is recording angular while being 2 θ=20 °, strengthens electric field and be 300V/mm and without strengthening under current field condition, diffraction efficiency is with the measurement result figure that reads electric field change.
Fig. 5 is that the diffraction efficiency of different angles is with reading electric field change result figure without strengthening under electric field.
Fig. 6 is under different angles, and during the enhancing electric field of identical 300V/mm, diffraction efficiency is with reading electric field change result figure in addition.
Embodiment
Embodiment one: the method for the automatically controlled diffractive optical element performance of raising of present embodiment is, when recording grating, the electric control holographic crystal two ends in automatically controlled diffractive optical element are applied to direct current external electric field.
Embodiment two: present embodiment is different from embodiment one is that the voltage of the size of the direct current external electric field crystal that is every millimeter of thickness is 300~800V; Other is identical with embodiment one.
Embodiment three: present embodiment is different from embodiment one is that the voltage of the size of the direct current external electric field crystal that is every millimeter of thickness is 400V; Other is identical with embodiment one.
Embodiment four: present embodiment is different from embodiment one is that the voltage of the size of the direct current external electric field crystal that is every millimeter of thickness is 500V; Other is identical with embodiment one.
Embodiment five: what present embodiment was different from one of embodiment one to four is that described electric control holographic crystal is the paraelectric phase electrooptical material that can produce automatically controlled photorefractive effect; Other is identical with one of embodiment one to four.
Embodiment six: what present embodiment was different from one of embodiment one to five is that described paraelectric phase electrooptical material is potassium tantalate-niobate crystal or potassium tantalate-niobate sodium crystal; Other is identical with one of embodiment one to five.
Embodiment seven: present embodiment is different from one of embodiment one to six is described potassium tantalate-niobate crystal or the potassium tantalate-niobate sodium crystal paraelectric phase potassium tantalate-niobate crystal that is doped with manganese and iron or the potassium tantalate-niobate sodium crystal of mixing iron.Other is identical with one of embodiment one to six.
Embodiment eight: present embodiment is different from embodiment seven is that the paraelectric phase potassium tantalate-niobate crystal of doped with manganese and iron is prepared according to the following steps:
One, be K:(Ta+Nb in molar ratio) ratio of 26:25, Mn volumetric molar concentration is 0.01%~0.1%, and the volumetric molar concentration of iron is 0.2%~0.3% to take K 2cO 3powder, Ta 2o 5powder, Nb 2o 5powder, MnO 2powder and Fe 3o 4powder mixes, and obtains mixed-powder, and ground and mixed is even, puts into crucible;
Two, crucible is placed in to heating furnace, is warming up at ambient temperature 900~1100 ℃, and be incubated 9~11h, must mix the potassium tantalate-niobate polycrystal of iron, manganese;
Three, polycrystal is placed in to growth furnace, is warming up to 1200~1230 ℃, and be incubated 5~10h, be then cooled to 1180 ℃;
Four, adopt top seed crystal flux method, under the condition that is 5~15r/min at seed rod rotating speed, rotate to after crystal shouldering to 8~15mm, then in pull rate, be that 0.4~0.6mm/h lifts crystal to 20~30mm, again crystal is proposed, then be down to room temperature, the paraelectric phase potassium tantalate-niobate crystal that obtains Emission in Cubic doped with manganese and iron, chemical formula is Fe 0.2~0.3: Mn 0.01~0.1: KTa 0.60nb 0.40o 3; Wherein in step 1, the mol ratio of Ta ︰ Nb is 17:8, and step 4 cosolvent is K 2cO 3powder.Other is identical with embodiment seven.
By following examples, verify beneficial effect of the present invention:
Embodiment mono-:
The method of the automatically controlled diffractive optical element performance of raising of the present embodiment is, when recording grating, the crystalline material two ends in automatically controlled diffractive optical element are applied to direct current external electric field.Wherein crystalline material is the paraelectric phase potassium tantalate-niobate crystal of doped with manganese and iron, and wherein the volumetric molar concentration of manganese is 0.05%, and the volumetric molar concentration of iron is 0.25%, and crystalline size is 3.68 * 2.02 * 1.13mm 3.The paraelectric phase potassium tantalate-niobate crystal preparation method of doped with manganese and iron is as follows: one, K ︰ (Ta+Nb) is the ratio of 26 ︰ 25 in molar ratio, and Mn volumetric molar concentration is 0.05%, and the volumetric molar concentration of iron is 0.25% to take K 2cO 3powder, Ta 2o 5powder, Nb 2o 5powder, MnO 2powder and Fe 3o 4powder mixes, and obtains mixed-powder, and ground and mixed is even, puts into crucible; Two, crucible is placed in to heating furnace, is warming up at ambient temperature 1000 ℃, and be incubated 10h, must mix the potassium tantalate-niobate polycrystal of iron, manganese; Three, polycrystal is placed in to growth furnace, is warming up to 1210 ℃, and be incubated 10h, be then cooled to 1180 ℃; Four, adopt top seed crystal flux method, under the condition that is 5~15r/min at seed rod rotating speed, rotate to crystal shouldering to 13mm, then in pull rate, be that 0.6mm/h lifts crystal to 30mm, again crystal is proposed, then be down to room temperature, the paraelectric phase potassium tantalate-niobate crystal that obtains Emission in Cubic doped with manganese and iron, chemical formula is Fe 0.25: Mn 0.05: KTa 0.60nb 0.40o 3; Wherein in step 1, the mol ratio of Ta ︰ Nb is 17:8, and step 4 cosolvent is K 2cO 3powder.
As shown in Figure 1, this light path is two ripple coupling optical path to the light path schematic diagram of the paraelectric phase potassium tantalate-niobate crystalline material diffraction enhanced imaging effect of measurement doped with manganese and iron, and step is as follows:
One, the record of holographic grating: the wavelength of laser instrument 1 output is the laser of 491.0 nanometers, through beam splitter 2, be divided into folded light beam and transmitted light beam two bundle coherent lights, folded light beam is through the first attenuator 3 decay, the first catoptron 5 reflections, transmitted light beam the is through two attenuators 4 decay, after the second catoptron 6 reflections, paraelectric phase potassium tantalate-niobate crystal 9 interior intersection interferences at doped with manganese and iron, selected recording angular is 2 θ, when grating records, the both positive and negative polarity of voltage source 11 is connected to respectively the two ends of the paraelectric phase potassium tantalate-niobate crystal 9 of doped with manganese and iron with wire, on crystal, apply DC voltage, make crystal two ends produce a certain size electric field E 0w, by the first optical shutter 7 and the second optical shutter 8, control t writing time, in crystal, record Bragg diffraction grating, the polarization direction of coherent light perpendicular to [001] direction of principal axis of tantalum doping potassium niobate crystal in plane of incidence.
Two, the readout of holographic grating: paraelectric phase potassium tantalate-niobate crystal 9 two ends by 11 pairs of doped with manganese of voltage source and iron are external electric field E in addition 0carry out reading of holographic grating, read electric field and be increased to 500V/mm from 0V/mm, the diffraction intensity while reading by photoconductive detector 10 measurements, realizes the measurement of diffraction efficiency.
Change test condition and test the automatically controlled performance of the paraelectric phase potassium tantalate-niobate crystal 9 of doped with manganese and iron under different condition.
Test 1: 2 θ=20 in step 1 °, E 0w=0, when grating records, voltage source 11 does not apply DC voltage on the paraelectric phase potassium tantalate-niobate crystal 9 of doped with manganese and iron, and this is measuring method of the prior art, as benchmark relatively.
Record by holographic grating and read two steps, diffraction efficiency to the paraelectric phase potassium tantalate-niobate crystal 9 of the doped with manganese under different writing times and iron is measured, obtained best writing time is 240s simultaneously, maximum diffraction efficiency obtains reading when electric field is 350V/mm, maximum diffraction efficiency is 78.3%, and the light intensity now responding in photodetector over time as shown in Figure 2.
Test 2: by 2 θ=20 ° of the setting in step 1, E 0wset up separately and be set to 300V/mm, 400V/mm, 500V/mm, measure different strengthen diffraction efficiency under electric fields with writing time change curve as shown in Figure 3, read electric field curve as shown in Figure 4.In Fig. 3, ■ is E 0wduring=0V/mm, diffraction efficiency is with situation of change writing time, ● be E 0wduring=300V/mm, diffraction efficiency is with situation of change writing time, ▲ be E 0wduring=400V/mm, diffraction efficiency is with situation of change writing time, and ▼ is E 0wduring=500V/mm, diffraction efficiency is with situation of change writing time, as can be seen from Figure 3, increase along with additional enhancing electric field, not too large variation of maximum diffraction efficiency, but reach the writing time of maximum diffraction efficiency but in continuous shortening, the 240s in the time of by added electric field is not reduced to 14s, 6s, 4s, can find out that additional enhancing electric field can reduce writing time greatly and still keep relatively large diffraction efficiency.In Fig. 4, ● be E 0wduring=0V/mm, read electric field curve, ■ is E 0wduring=300V/mm, read electric field curve, as can be seen from Figure 4 by electric field enhancement effect, can realize less reading and under electric field, just obtain larger diffraction efficiency, this point is for the exploitation of device and to improve be also very important.
Test 3: 2 θ in step 1 are set as respectively to 5 ° and 40 °, E 0wbe set as respectively 0V/mm, 300V/mm, measure without strengthening and read electric field curve result as shown in Figure 5 in electric field, different recording angular situation, 300V/mm strengthens and reads electric field curve result as shown in Figure 6 in electric field, different recording angular situation.Wherein data point is experimental measurements, and curve is fitting result.Best titime time under different situations and the space charge field result obtaining by matched curve are as shown in table 1.
Best titime time under table 1 different situations and the space charge field result obtaining by matched curve
Known by the space charge field that adding in contrast table 1 strengthens before and after electric field, space charge field strengthens in electric field situation relevantly with angle not adding, and numerical value is less, by electric field enhancement effect, can reach identical numerical value and practical obtain enhancing.
Fig. 6 and table 1 result show, diffraction efficiency and angle after electric field strengthens are irrelevant, writing time is also identical, and can reach a larger and approximately uniform diffraction efficiency, and this is for the exploitation of multi-angle device and the miniaturization of device is integrated a very large meaning.
Embodiment bis-: the method that iron (Fe) potassium tantalate-niobate sodium (KNTN) crystal property is mixed in the raising of the present embodiment is, when recording grating, the iron potassium tantalate-niobate sodium crystal two ends of mixing in automatically controlled diffractive optical element are applied to direct current external electric field.(volumetric molar concentration of wherein mixing iron in the potassium tantalate-niobate sodium crystal of iron is 0.30%).The index path of test is identical with the optical system for testing figure in embodiment mono-.
Test result shows, at recording angular, is 2 θ=20 °, and voltage source 11 does not apply DC voltage E mixing on the potassium tantalate-niobate sodium crystal 9 of iron 0wtime, be 240s the writing time of crystal, maximum diffraction efficiency is 79%.And utilize voltage source 11 to apply DC voltage E mixing on the potassium tantalate-niobate sodium crystal 9 of iron 0wduring=300V/mm, be reduced to 16s writing time, maximum diffraction efficiency is 71.8%, and the size of the diffraction efficiency after electric field enhancing and angle 2 θ is irrelevant.

Claims (8)

1. improve a method for automatically controlled diffractive optical element performance, it is characterized in that the method is, when recording grating, the electric control holographic crystal two ends in automatically controlled diffractive optical element are applied to direct current external electric field.
2. a kind of method that improves automatically controlled diffractive optical element performance according to claim 1, the voltage of the crystal that the size that it is characterized in that direct current external electric field is every millimeter of thickness is 300~800V.
3. a kind of method that improves automatically controlled diffractive optical element performance according to claim 1, the voltage of the crystal that the size that it is characterized in that direct current external electric field is every millimeter of thickness is 400V.
4. a kind of method that improves automatically controlled diffractive optical element performance according to claim 1, the voltage of the crystal that the size that it is characterized in that direct current external electric field is every millimeter of thickness is 500V.
5. according to a kind of method that improves automatically controlled diffractive optical element performance described in claim 1,2,3 or 4, it is characterized in that described electric control holographic crystal is the paraelectric phase electrooptical material that can produce automatically controlled photorefractive effect.
6. a kind of method that improves automatically controlled diffractive optical element performance according to claim 5, is characterized in that the paraelectric phase electrooptical material of the described automatically controlled photorefractive effect of generation is potassium tantalate-niobate crystal or potassium tantalate-niobate sodium crystal.
7. a kind of method that improves automatically controlled diffractive optical element performance according to claim 6, is characterized in that the potassium tantalate-niobate crystal that described potassium tantalate-niobate crystal or potassium tantalate-niobate sodium crystal are doped with manganese and iron or the potassium tantalate-niobate sodium crystal of mixing iron.
8. a kind of method that improves automatically controlled diffractive optical element performance according to claim 7, is characterized in that the paraelectric phase potassium tantalate-niobate crystal of doped with manganese and iron is prepared according to the following steps:
One, be K:(Ta+Nb in molar ratio) ratio of 26:25, Mn volumetric molar concentration is 0.01%~0.1%, and the volumetric molar concentration of iron is 0.2%~0.3% to take K 2cO 3powder, Ta 2o 5powder, Nb 2o 5powder, MnO 2powder and Fe 3o 4powder mixes, and obtains mixed-powder, and ground and mixed is even, puts into crucible;
Two, crucible is placed in to heating furnace, is warming up at ambient temperature 900~1100 ℃, and be incubated 9~11h, must mix the potassium tantalate-niobate polycrystal of iron, manganese;
Three, polycrystal is placed in to growth furnace, is warming up to 1200~1230 ℃, and be incubated 5~10h, be then cooled to 1180 ℃;
Four, adopt top seed crystal flux method, under the condition that is 5~15r/min at seed rod rotating speed, rotate to after crystal shouldering to 8~15mm, then in pull rate, be that 0.4~0.6mm/h lifts crystal to 20~30mm, again crystal is proposed, then be down to room temperature, the paraelectric phase potassium tantalate-niobate crystal that obtains Emission in Cubic doped with manganese and iron, chemical formula is Fe 0.2~0.3: Mn 0.01~0.1: KTa 0.60nb 0.40o 3; Wherein in step 1, the mol ratio of Ta ︰ Nb is 17:8, and step 4 cosolvent is K 2cO 3powder.
CN201410355643.8A 2014-07-24 2014-07-24 Method for improving performance of electrically-controlled diffraction device Pending CN104076533A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101372361A (en) * 2008-09-28 2009-02-25 哈尔滨工业大学 Cubic phase sodium potassium tantalateniobate crystal and preparation thereof
CN101799593A (en) * 2010-04-23 2010-08-11 哈尔滨工业大学 High-speed electric control holographic crystal diffraction beam splitter, preparation method thereof and beam splitting method realized based on beam splitter
CN101846862A (en) * 2010-05-26 2010-09-29 哈尔滨工业大学 Method for realizing information processing of optical image by electric control refractive index grating
US20120008482A1 (en) * 2010-07-09 2012-01-12 TIPD, Inc. System for holography
CN103603044A (en) * 2013-11-26 2014-02-26 哈尔滨工业大学 Niobium-rich lithium-doped potassium tantalate niobate single crystal and preparation method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101372361A (en) * 2008-09-28 2009-02-25 哈尔滨工业大学 Cubic phase sodium potassium tantalateniobate crystal and preparation thereof
CN101799593A (en) * 2010-04-23 2010-08-11 哈尔滨工业大学 High-speed electric control holographic crystal diffraction beam splitter, preparation method thereof and beam splitting method realized based on beam splitter
CN101846862A (en) * 2010-05-26 2010-09-29 哈尔滨工业大学 Method for realizing information processing of optical image by electric control refractive index grating
US20120008482A1 (en) * 2010-07-09 2012-01-12 TIPD, Inc. System for holography
CN103603044A (en) * 2013-11-26 2014-02-26 哈尔滨工业大学 Niobium-rich lithium-doped potassium tantalate niobate single crystal and preparation method thereof

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Application publication date: 20141001