CN103824693B - 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法 - Google Patents

一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法 Download PDF

Info

Publication number
CN103824693B
CN103824693B CN201410107547.1A CN201410107547A CN103824693B CN 103824693 B CN103824693 B CN 103824693B CN 201410107547 A CN201410107547 A CN 201410107547A CN 103824693 B CN103824693 B CN 103824693B
Authority
CN
China
Prior art keywords
coating
permanent magnet
rare earth
earth permanent
iron boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410107547.1A
Other languages
English (en)
Other versions
CN103824693A (zh
Inventor
孙宝玉
陈晓东
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHENYANG ZHONGBEI TONGCI TECHNOLOGY Co Ltd
Original Assignee
SHENYANG ZHONGBEI TONGCI TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHENYANG ZHONGBEI TONGCI TECHNOLOGY Co Ltd filed Critical SHENYANG ZHONGBEI TONGCI TECHNOLOGY Co Ltd
Priority to CN201410107547.1A priority Critical patent/CN103824693B/zh
Publication of CN103824693A publication Critical patent/CN103824693A/zh
Priority to US14/662,235 priority patent/US9938625B2/en
Application granted granted Critical
Publication of CN103824693B publication Critical patent/CN103824693B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/02—Compacting only
    • B22F3/04—Compacting only by applying fluid pressure, e.g. by cold isostatic pressing [CIP]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/008—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression characterised by the composition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/324—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal matrix material layer comprising a mixture of at least two metals or metal phases or a metal-matrix material with hard embedded particles, e.g. WC-Me
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/241—Chemical after-treatment on the surface
    • B22F2003/242—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Composite Materials (AREA)
  • Ceramic Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Physical Vapour Deposition (AREA)
  • Hard Magnetic Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)

Abstract

本发明公开了一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，首先进行合金熔炼，在熔融状态下将合金浇铸到带水冷却的旋转铜辊上冷却形成合金片,接着进行氢破碎，氢破碎后进行混料，混料后进行气流磨，之后在氮气保护下用混料机混料后送到氮气保护磁场取向压机成型，成形后在保护箱内封装，然后取出进行等静压，之后送入烧结设备烧结和时效制成钕铁硼稀土永磁磁体，之后进行机械加工制成钕铁硼稀土永磁器件，之后对钕铁硼稀土永磁器件进行镀膜，镀膜共分3层，第一层为磁控溅射镀层，镀层厚度为：0.02-5μm，第二层为磁控溅射和多弧离子镀的混合镀层，镀层厚度为：1-10μm，第三层为磁控溅射镀层，镀层厚度为：0.1-5μm；采用复合镀膜作稀土永磁器件的表面处理工序，不仅提高了稀土永磁器件的抗腐蚀能力，同时也提高了稀土永磁器件的磁性能。

Description

一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法
技术领域
本发明属于永磁器件领域,特别是涉及一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法。
背景技术
钕铁硼稀土永磁材料,以其优良的磁性能得到越来越多的应用，被广泛用于医疗的核磁共振成像，计算机硬盘驱动器，音响、手机等；随着节能和低碳经济的要求，钕铁硼稀土永磁材料又开始在汽车零部件、家用电器、节能和控制电机、混合动力汽车，风力发电等领域应用。
现有技术的稀土永磁器件的表面处理工艺主要有电镀Ni-Cu-Ni、电镀Zn、电泳、喷涂等技术，也有采用真空镀铝的方法，如中国专利ZL96192129.3，揭示了真空镀Ti和AlN的方法；另一个中国专利ZL01111757.5揭示了采用真空蒸发镀锌、铝、锡、镁的方法。
现有技术如图1所示，在真空处理腔1内部的上区有两个支撑件7并排设置，可以绕一个水平旋转轴线上的转轴6转动。由不锈钢丝网形成的六个圆筒5装入磁件14，由转轴8在支撑件7的转轴6的外侧圆周方向中并支撑为一个环形，用于绕转轴6旋转。作为用于蒸发的材料铝丝9的蒸发段的多个加热舟2设置在一个在处理腔1下区中的支撑平台3上升起的加热舟支撑基座4上。铝丝9固定和缠绕在支撑平台3之下的一个供给辊子10上。铝丝9的前端由面向加热舟2的一个内表面的热阻保护管11导向达到加热舟2上，一个凹口12 设置在保护管11的一部分中，而进给齿轮13对应于凹口12安装，并直接与铝丝9接触，这样通过进给铝丝9可以恒定地将铝丝供入加热舟2中，加热蒸发沉积到转动的料筒5中的磁件14上完成其表面镀铝。
现有技术采用蒸发镀膜，膜层与基体的结合力差，提高稀土永磁器件的抗腐蚀能力存在不足；也有的现有技术采用了磁控溅射镀膜，由于磁控溅射的效率低，不适合低成本大批量生产，也有的没有解决装卡技术，不易装卡，生产麻烦；也有的现有技术采用多弧离子镀膜，由于多弧离子镀膜时存在大颗粒，不能达到稀土永磁器件的耐腐蚀性要求，为了解决多弧离子镀的缺点，现有技术也有人想到了采用多弧离子镀与磁控溅射镀复合镀膜，但都没有解决高效率、低成本、大批量生产技术，设备结构存在不足；特别是现有技术的稀土永磁器件的电镀化学处理工艺，能耗高有污染，要求昂贵的水处理设备，处理不当对生态环境有严重影响，因本发明的生产工艺过程在真空中进行，不使用对环境污染物质，不会给生态环境造成污染，同时还消除在电镀工艺过程中的“电池”作用对磁性能的降低的影响。为此，本发明提供一种新型稀土永磁器件的真空复合镀膜设备弥补了现有技术的不足；另外采用本发明的设备生产的钕铁硼稀土永磁器件不仅提高了稀土永磁器件的抗腐蚀能力，还提高了稀土永磁器件的磁性能，明显提高稀土永磁器件的磁能积和矫顽力,节约稀缺的稀土资源，尤其是节约了更稀缺的重稀土用量。
发明内容
本发明是提供一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，通过以下技术方案实现提高稀土永磁器件的磁性能和提高的抗腐蚀能力：
一种钕铁硼稀土永磁器件复合镀膜设备，包括真空镀膜室、充气系统、圆柱阴极磁控靶、平面阴极磁控靶、阴极多弧离子靶、阳极层线性离子源、转架和料筐；所述的真空镀膜室由卧式真空壳体、前门和后盖组成，前门和真空壳体通过橡胶密封圈密封，后盖或者焊接在卧式真空壳体上或者通过连接件连接，转架的传动装置安装在后盖上，真空室外的电机传动轴通过动密封装置传送到真空镀膜室内；转架设计在真空镀膜室内，通过转轴支撑在框架上，框架固定在真空壳体上；转架的轴线与卧式真空壳体的轴线平行，网状料筐两端有转轴安装在转架上，转轴的轴线与转架的轴线平行，转架围绕真空壳体的轴线公转，网状料筐即随转架一起公转又自转。
圆柱阴极磁控靶安装在真空镀膜室内的后盖上，电源、冷却水和传动装置由外部引入，圆柱阴极磁控靶位于转架的内部，轴线与转架轴线平行。所述的圆柱阴极磁控靶设置为一个以上。
所述的圆柱阴极磁控靶内装有多个轴向充磁的磁环，磁环间有导磁环，磁环相对于圆柱阴极磁控靶轴向往复移动。
所述的圆柱阴极磁控靶内或者装有多条径向充磁的磁条，磁条在圆柱阴极磁控靶内沿着圆周分布，磁条间有间隔，磁条的数量为3条或者3条以上，磁条相对于圆柱阴极磁控靶同轴转动。
所述的磁环或者磁条由钕铁硼稀土永磁制造。
平面阴极磁控靶安装在真空壳体上，分布在转架的外围，所述的平面阴极磁控靶内设置有跑道形状的环状磁条，磁条由钕铁硼稀土永磁制造，用冷却水冷却，数量一个以上。
阴极多弧离子靶安装在真空壳体上，分布在转架的外围，所述的阴极多弧离子靶为方形或圆形，内部设置有磁铁，磁铁由钕铁硼稀土永磁制造，用冷却水冷却，数量一个以上。
阳极层线性离子源安装在真空壳体上，分布在转架的外围。
所述的真空镀膜室内设置有加热器，加热温度范围在100-600℃。
一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，首先进行合金熔炼，在熔融状态下将合金浇铸到带水冷却的旋转铜辊上冷却形成合金片,接着进行氢破碎，氢破碎后进行混料，混料后进行气流磨，之后在氮气保护下用混料机混料后送到氮气保护磁场取向压机成型，成形后在保护箱内封装，然后取出进行等静压，之后送入烧结设备烧结和时效制成钕铁硼稀土永磁磁体，之后进行机械加工制成钕铁硼稀土永磁器件，之后对钕铁硼稀土永磁器件进行镀膜，镀膜共分3层，第一层为磁控溅射镀层，镀层厚度为：0.02-5μm，第二层为磁控溅射和多弧离子镀的混合镀层，镀层厚度为：1-10μm，第三层为磁控溅射镀层，镀层厚度为： 0.1-5μm。
所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Dy-Al、Tb-Al中的一种，第二层为磁控溅射和多弧离子镀的混合镀层，镀层为Al、Ni-Cr中的一种以上，第三层为磁控溅射镀层，镀层为Al。
所述的镀膜靶材为Al、Dy-Al、Tb-Al、Dy-Fe、Tb-Fe、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上。
所述的钕铁硼稀土永磁器件的膜系，为Al、Dy-Al、Tb-Al、Dy-Fe、Tb-Fe中的一种以上。
所述的钕铁硼稀土永磁器件的膜系为Al、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上。
所述的钕铁硼稀土永磁器件的膜系为Al。
所述的充气系统或者充入一种气体或者充入一种以上的气体。
所述的充气系统充入的气体为氩气、氮气、氧气、氢气中的一种以上。
所述的充气系统充入的气体为氩气。
所述的镀膜过程中还充入氩气和氧气，氧气/氩气的体积百分数在0.1-5%，氧气的充入提高了钕铁硼稀土永磁器件的电阻率，电阻率提高有利于减少涡流，提高磁体的使用温度。
所述的真空泵为机械真空泵、罗茨真空泵、油扩散真空泵、分子泵中的一种以上。
所述的磁控溅射镀膜条件为，温度30~600℃，沉积压强为氩气条件下0.1~1Pa,功率密度为1~20w/cm2；线性离子源的放电电压100~3000V，离子能量100~2000eV,氩气条件下工作气压0.01~1Pa。所述的镀膜工序中采用磁控溅射镀膜和多弧离子镀膜，磁控溅射镀膜和多弧离子镀膜单独、交替或同时进行工作。
稀土永磁器件在机械加工工序之后进行复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层厚度为：0.02-5μm，第二层为磁控溅射和多弧离子镀的混合镀层，镀层厚度为：1-10μm，第三层为磁控溅射镀层，镀层厚度为： 0.1-5μm。
所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Al、Dy-Al、Tb-Al、Dy-Fe、Tb-Fe中的一种，第二层为磁控溅射和多弧离子镀的混合镀层，镀层为Al、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上，第三层为磁控溅射镀层，镀层为Al、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上。
所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Dy-Al、Tb-Al、Dy-Fe、Tb-Fe中的一种，第二层为磁控溅射和多弧离子镀的混合镀层，镀层为Al、Ni-Cr、Al2O3、ZrO2、AZO中的一种以上，第三层为磁控溅射镀层，镀层为Al、Ni-Cr、Al2O3、ZrO2、AZO中的一种以上。
所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Al、Ni-Cr中的一种或一种以上，第二层为磁控溅射和多弧离子镀的混合镀层，镀层为Al、Ni-Cr中的一种或一种以上，第三层为磁控溅射镀层，镀层为Al、Ni-Cr中的一种或一种以上。
镀膜工序前稀土永磁器件要进行喷砂工序，喷砂采用的材料是石英、玻璃微珠、氧化铝、氧化铈、氧化镧、氧化铈和氧化镧的混合物、氧化锆的一种或一种以上。
镀膜工序前或者有喷涂工序，喷涂材料为铝或含铝的化合物、电泳漆中的一种。
镀膜工序中或者有控制镀膜过程的永磁器件加热工序，温度范围在100-600℃。
镀膜工序后或者有热处理工序。
所述的热处理工序的热处理温度在110-890℃。
所述的热处理工序的热处理在真空或保护气氛下进行。
卧式钕铁硼稀土永磁器件复合镀膜设备或者安装在洁净厂房中，厂房的洁净度在10,000级以上。
金相分析显示，所述的一种带有复合镀膜的钕铁硼稀土永磁器件从器件表面向内延伸1mm范围内主相晶粒中的重稀土的含量高于器件主相晶粒中重稀土的含量，含量高的重稀土分布在主相R2T14B的外围，形成RH2T14B包围R2T14B的新主相结构，RH2T14B相与R2T14B相间无晶界相；其中，R代表在钕铁硼稀土永磁体金相结构中主相中的稀土，T代表元素Fe和Co，RH表示主相中重稀土的含量高于平均值的稀土。
本发明的有益效果：找到了一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，明显提高钕铁硼稀土永磁器件的耐腐蚀性能，使钕铁硼稀土永磁器件能用于海上风电、混合动力汽车等高耐蚀性要求的领域，扩大了钕铁硼稀土永磁的用途；一般情况下，钕铁硼稀土永磁的表面涂层都会降低磁性能，本发明发现采用本发明的设备和工艺生产的钕铁硼稀土永磁器件的磁性能，尤其是磁能积和矫顽力得到明显提高，为提高钕铁硼稀土永磁的磁性能找到了新方法，对减少稀土用量，保护稀缺的自然资源具有重要意义。
附图说明
下面通过附图进一步说明本发明：
图1 为现有技术的的真空镀膜示意图
图2 为本发明的的真空镀膜示意图
图中：1、真空处理腔；2、加热舟；3、支撑平台；4、加热舟支撑基座；5、装料圆筒；6、绕转轴；7、支撑件；8、转轴；9、铝丝；10、辊子；11、热阻保护管；12、凹口；13、进给齿轮；14、磁件；15、真空壳体；16、阳极层线性离子源；17、多弧离子源；18、真空泵；19、平面磁控靶；20、加热装置；21、Ⅰ级自动齿轮；22、Ⅰ级从动齿轮；23、Ⅱ级主动齿轮；24、Ⅱ级从动齿轮；25、转架；26、料筐；27、永磁器件；28、圆柱磁控靶；29、转轴Ⅰ；30、转轴Ⅱ；31、抽真空管路。
如图2所示，本发明为磁控溅射镀膜和多弧离子镀膜组合工作的真空镀膜设备。在一个连接有真空泵18的卧式真空壳体15的中心线上设有一个圆柱型旋转磁控靶28，在转架25的圆周上布置有多个（图中为8个）不锈钢网制成的料筐26，料筐26内装有永磁器件27。真空室外的驱动电机（未标出）通过动密封传动轴连接Ⅰ级主动齿轮21,带动固定在转架25上的Ⅰ级从动齿轮22完成转架25绕转轴Ⅰ29公转。固定在真空壳体15上的Ⅱ级主动齿轮23通过转架25的公转带动Ⅱ级从动齿轮24绕转轴Ⅱ30自转，料筐26的两端设有转轴与转轴Ⅱ30联接，因此料筐26可以达到公转加自转目的，使永磁器件27在料筐26内翻炒被均匀沉积上靶材材料。在圆形真空壳体15外部设有阳极层线性离子源16，多个多弧离子源17，连接真空泵18的抽真空管路31，多个平面磁控靶19和加热装置20。
镀膜工序前真空室抽真空达到E-4Pa量级，回充氩气，工作气压0.01~1Pa，料筐26公转加自转，启动阳极层线性离子源，放电电压100~3000V，离子轰击永磁器件27，经过5~10分钟停止轰击。料筐26是绝缘的，也可以接负压-50~-200V。先期离子轰击清洗的目的，是清洗永磁器件27表面的氧化物、含碳氢化物，使其表面粗化增加表面能和离子辅助沉积等作用。加热装置20对料筐26和料筐26内永磁器件27加热到120~600℃，起到除去水汽，提高膜层附着力作用。镀膜工序是在加热到200℃时，料筐26公转加自转并经高压离子清洗后，真空室15再次抽真空达到E-4Pa量级，回充氩气，工作气压0.1~1Pa，分别或同时启动平面磁控靶19、圆柱型磁控溅射靶28和多弧离子源17，使其分别单独工作或交替工作或同时工作，将靶材材料沉积到永磁器件27上形成单质膜和介质膜的涂层。
具体实施方式
下面通过实施例的对比进一步说明本发明的显著效果。
实施例1
按如下工艺制造：
1、分别按表一A1、A2、A3、A4成分选取合金600Kg熔炼，在熔融状态下将合金浇铸到带水冷却的旋转铜辊上冷却形成合金片,接着进行氢破碎，氢破碎后进行混料，混料后进行气流磨，之后在氮气保护下用混料机混料后送到氮气保护磁场取向压机成型，保护箱内的氧含量150ppm，取向磁场强度1.8T，模腔内温度2℃，磁块尺寸62×52×42mm,取向方向为42尺寸方向，成形后在保护箱内封装，然后取出进行等静压，等静压压力200MPa，之后送入烧结设备烧结和时效。
2、时效后进行机械加工，加工成方片30×20×10 mm尺寸，将工件选择性进行倒角、喷砂、喷铝、电泳、喷涂、之后进行真空镀膜，第一层采用磁控溅射镀膜，第二层为磁控溅射和多弧离子镀的混合镀层，第三层为磁控溅射镀层，镀层厚度分别为：0.02-5μm，0.1-15μm，1-5μm，有的实验还进行了镀第四层，第四层为磁控溅射镀层，厚度0.1-5μm，第四层未标注元素符号的为只有三层镀膜，各层选用的材料、磁性能和耐腐蚀性能的测量结果列入表二。
表一、实施例和对比例的稀土永磁合金的成分
编号 成分
A1 Ｎd30Dy1Fe67.9Ｂ0.9Al0.2
A2 Ｎd30Dy1Fe67.5Co1.2Cu0.1Ｂ0.9Al0.1
A3 (Ｐr0.2Ｎd0.8)25Dy5Fe67.4Co1.2Cu0.3Ｂ0.9Al0.2
A4 (Ｐr0.2Ｎd0.8)25Dy5Tb1Fe65Co2.4Cu0.3Ｂ0.9Al0.2Ga0.1Zr0.1
表二、本发明的镀层材料、磁性能和耐腐蚀性能的测量结果
对比例1
分别按表一的A1、A2、A3、A4成分选取合金600Kg熔炼，在熔融状态下将合金浇铸到带水冷却的旋转的冷却辊上冷却形成合金片，然后使用真空氢碎炉对合金片进行粗破碎，氢破碎后进行气流磨，在氮气保护下用混料机混料后送到氮气保护磁场取向压机成型，取向磁场强度1.8T，磁块尺寸62×52×42mm,取向方向为42尺寸方向，成形后在保护箱内封装，然后取出进行等静压，等静压压力200MPa，之后送入真空烧结炉烧结和时效，再进行机械加工，加工成方片30×20×10 mm尺寸，将工件选择性进行倒角或喷砂，之后进行电镀Ni-Cu-Ni，磁性能和耐腐蚀性能的测量结果列入表三。
表三、对比例的磁性能和耐腐蚀性能的测量结果
实施例2
选取实施例1中的成分制作钕铁硼稀土永磁器件，镀层选择第一层镀Dy-Al合金，第二层镀Al+ Al，第三层镀Al的镀层作温度实验，结果列入表四，序号1为镀膜时未加热也没有进行热处理的对比例，通过表四可以看出，镀膜温度和镀膜后的热处理温度对材料的磁性能有影响，明显提高了磁体的矫顽力，也就是提高了磁体的使用温度，在同等使用温度下，可以减少重稀土的用量，节约了稀缺资源。
表四、镀膜温度和热处理温度对磁性能和耐腐蚀性能的影响
注：1、耐蚀性（PCT试验）
实验条件：样品10X10X10mm，2个标准大气压，120℃，100%湿度，48小时，失重<5mg/cm2。
2、盐雾试验：
实验条件：5%NaCl 溶液，25℃≥48小时验，表面没有变化。
实施例中，真空镀膜工序前要有喷砂工序：因为稀土永磁器件在加工过程中，在其表面都会存在一定量的油脂和脏污，而这些污物对真空镀膜工艺稳定性及镀膜产品的耐腐蚀性能有很大的影响，因此配置合理的清洗设备及工艺是稀土永磁器件真空镀膜质量性能的基本保证，只有合理的清洗工艺才能保证涂层具有良好的附着力。喷砂工序采用的材料是石英、玻璃微珠、氧化铝、氧化铈、氧化镧、氧化铈和氧化镧的混合物、氧化锆的一种以上。真空镀膜工序前或者还有喷涂工序，喷涂材料为铝或含铝的化合物、电泳漆中的一种。
实施例中，在镀膜工序中高压离子清洗工序：真空室抽真空高于E-4Pa数量级，充氩气，工作气压0.01~1Pa，料筐公转加自转，启动阳极层线性离子源，放电电压100~3000V，离子轰击稀土永磁器件5~10分钟。料筐是绝缘的，也可以接负压-50~-200V。
实施例中，镀膜工艺配置：合理的工艺配置包括单、双磁控阴极配置（包括平面、圆柱旋转磁控阴极配置），多弧阴极配置，阳极层线性离子源、加热装置和真空泵等。不同镀膜工艺配置导致生产速率、离子能量等变化，对镀膜产品性能有重要影响。真空室抽真空高于E-4Pa数量级，回充氩气，工作气压3E-1Pa，料筐公转加自转，磁控溅射沉积和电弧蒸发沉积分别单独工作或单独交替工作或同时工作；磁控溅射沉积和电弧蒸发沉积分别与离子轰击单独工作或单独交替工作。
实施例中，镀膜工艺装料：料筐的结构对镀膜产品外观及涂层质量有较大影响，应避免出现表面划伤及其他物理损伤。料筐为不锈钢网制成的圆筒型或多边形柱状结构，中间有隔板形成多个隔离空间，每个空间放置一块或几块永磁器件。
实施例中，真空镀膜工序后或者有热处理工序，热处理温度100-900℃。
通过实施例和对比例的比较进一步说明，采用本发明的技术明显提高磁体的磁性能和耐腐蚀性能，是非常有发展的工艺和设备技术。

Claims (15)

1.一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：首先进行合金熔炼，在熔融状态下将合金浇铸到带水冷却的旋转铜辊上冷却形成合金片,接着进行氢破碎，氢破碎后进行混料，混料后进行气流磨，之后在氮气保护下用混料机混料后送到氮气保护磁场取向压机成型，成形后在保护箱内封装，然后取出进行等静压，之后送入烧结设备烧结和时效制成钕铁硼稀土永磁磁体，之后进行机械加工制成钕铁硼稀土永磁器件，之后在真空镀膜室内对钕铁硼稀土永磁器件进行磁控溅射镀膜和多弧离子镀的复合镀膜，镀膜共分3层，第一层为磁控溅射镀层，镀层为Dy-Al、Tb-Al、Dy-Fe、Tb-Fe中的一种，镀层厚度为：0.02-5μm，第二层为磁控溅射和多弧离子镀的复合镀层，镀层厚度为：1-10μm，第三层为磁控溅射镀层，镀层厚度为： 0.1-5μm；
所述的复合镀膜工序后还有热处理工序，热处理温度60-900℃。
2.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的真空镀膜室内设置有加热器，加热温度范围在30-600℃。
3.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的真空镀膜室内设置有阳极层线性离子源，所述的复合镀膜条件为，温度30~600℃，沉积压强为氩气条件下0.1~1Pa,功率密度为1~20w/cm2，线性离子源的放电电压100~3000V，离子能量100~2000eV,氩气条件下工作气压0.01~1Pa，所述的复合镀膜工序中采用磁控溅射镀膜和多弧离子镀膜单独、交替或同时进行工作。
4.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的复合镀膜过程中还充入氩气和氧气，氧气/氩气的体积百分数在0.1-5%。
5.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的复合镀膜属于物理气相沉积，磁控镀膜材料为Al、Dy-Al、Tb-Al、Dy-Fe、Tb-Fe、Ti、Mo、Si、不锈钢、Al2O3、ZrO2、AZO中的一种, 所述的磁控溅射和多弧离子镀的复合镀层，镀膜材料为Al、Ti、Mo、Si、不锈钢、Al2O3、ZrO2、ITO、AZO中的一种以上。
6.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的复合镀膜工序前还有喷砂工序，喷砂采用的材料是石英、玻璃微珠、氧化铝、氧化铈、氧化镧、氧化铈和氧化镧的混合物、氧化锆的一种以上，镀膜工序前还有喷涂工序，喷涂材料为铝或含铝的化合物和电泳漆中的一种。
7.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Al、Dy-Al、Tb-Al、Dy-Fe、Tb-Fe中的一种，第二层为磁控溅射和多弧离子镀的复合镀层，镀层为Al、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上，第三层为磁控溅射镀层，镀层为Al、Ni-Cr、Ti、Mo、Si、Al2O3、ZrO2、AZO中的一种以上。
8.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的复合镀膜工序，镀膜共分3层，第一层为磁控溅射镀层，镀层为Dy-Al、Tb-Al中的一种，第二层为磁控溅射和多弧离子镀的混合镀层，镀层为Al、Ni-Cr中的一种以上，第三层为磁控溅射镀层，镀层为Al。
9.根据权利要求1所述的一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法，其特征在于：所述的一种带有复合镀膜的钕铁硼稀土永磁器件表面外向内延伸0.5mm范围内，主相晶粒中重稀土的含量高于晶粒主相中重稀土的含量，含量高的重稀土分布在主相R2T14B的外围，形成RH2T14B包围R2T14B的新主相结构，RH2T14B相与R2T14B相间无晶界相；其中，R代表在钕铁硼稀土永磁器件金相结构中主相中的稀土，T代表元素Fe和Co，RH表示主相中重稀土的含量高于平均值的稀土。
10.一种在如权利要求1所述制造方法中使用的钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的复合镀膜设备包括真空镀膜室、圆柱阴极磁控靶、平面阴极磁控靶、阴极多弧离子靶、阳极层线性离子源、转架和料筐；所述的真空镀膜室由真空壳体、前门和后盖组成，前门和真空壳体通过橡胶密封圈密封，后盖或者焊接在真空壳体上或者通过连接件连接在真空壳体上；转架设计在真空镀膜室内，通过转轴支撑在框架上，框架固定在真空壳体上；转架的轴线与真空壳体的轴线平行，网状料筐两端有转轴安装在转架上，转轴的轴线与转架的轴线平行，转架围绕真空壳体的轴线公转，网状料筐即随转架一起公转又自转；所述的圆柱阴极磁控靶安装在真空镀膜室内的后盖上，圆柱阴极磁控靶位于转架的内部，轴线与转架轴线平行；圆柱阴极磁控靶设置为一个以上。
11.根据权利要求10所述的一种钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的圆柱阴极磁控靶内装有多个轴向充磁的磁环，磁环间有导磁环，磁环相对于圆柱阴极磁控靶轴向往复移动，所述的磁环由钕铁硼稀土永磁制造。
12.根据权利要求10所述的一种钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的圆柱阴极磁控靶内装有多条径向充磁的磁条，磁条在圆柱阴极磁控靶内沿着圆周分布，磁条间有间隔，磁条的数量为3条或者3条以上，磁条相对于圆柱阴极磁控靶材套管同轴转动，所述的磁条由钕铁硼稀土永磁制造。
13.根据权利要求10所述的一种钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的平面阴极磁控靶安装在真空壳体上，分布在转架的外围，所述的平面阴极磁控靶内设置有跑道形状的环形磁条，磁条由钕铁硼稀土永磁制造，用冷却水冷却，数量为一个以上。
14.根据权利要求10所述的一种钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的阴极多弧离子靶安装在真空壳体上，分布在转架的外围，所述的阴极多弧离子靶为方形或圆形，内部设置有磁铁，磁铁由钕铁硼稀土永磁制造，用冷却水冷却，数量为一个以上。
15.根据权利要求10所述的一种钕铁硼稀土永磁器件的复合镀膜设备，其特征在于：所述的阳极层线性离子源安装在真空壳体上，分布在转架的外围。
CN201410107547.1A 2014-03-22 2014-03-22 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法 Active CN103824693B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201410107547.1A CN103824693B (zh) 2014-03-22 2014-03-22 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法
US14/662,235 US9938625B2 (en) 2014-03-22 2015-03-18 Method for manufacturing NdFeB rare earth permanent magnetic device with composite plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410107547.1A CN103824693B (zh) 2014-03-22 2014-03-22 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法

Publications (2)

Publication Number Publication Date
CN103824693A CN103824693A (zh) 2014-05-28
CN103824693B true CN103824693B (zh) 2016-08-17

Family

ID=50759697

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410107547.1A Active CN103824693B (zh) 2014-03-22 2014-03-22 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法

Country Status (2)

Country Link
US (1) US9938625B2 (zh)
CN (1) CN103824693B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103820765A (zh) * 2014-03-22 2014-05-28 沈阳中北真空设备有限公司 一种钕铁硼稀土永磁器件的复合镀膜设备及制造方法
CN104328380A (zh) * 2014-07-31 2015-02-04 宁夏天马滚动体制造有限公司 轴承滚柱非平衡磁控溅射离子镀装置及方法
CN105448511A (zh) * 2014-08-29 2016-03-30 平湖乔智电子有限公司 散热风扇马达磁石的制造方法
CN104562001A (zh) * 2014-12-22 2015-04-29 苏杏梅 一种灯具配件的镀膜方法
CN104900359B (zh) 2015-05-07 2017-09-12 安泰科技股份有限公司 复合靶气相沉淀制备晶界扩散稀土永磁材料的方法
CN105185498B (zh) 2015-08-28 2017-09-01 包头天和磁材技术有限责任公司 稀土永磁材料及其制造方法
JP6783935B2 (ja) * 2016-12-21 2020-11-11 パオトウ リサーチ インスティチュート オブ レア アース ネオジム−鉄−ボロン永久磁石材料の製造方法
KR102016615B1 (ko) * 2017-09-14 2019-08-30 (주)코미코 내플라즈마 특성이 향상된 플라즈마 에칭 장치용 부재 및 그 제조 방법
CN108018497B (zh) * 2017-11-30 2019-07-09 江西金力永磁科技股份有限公司 一种钕铁硼磁体及钕铁硼磁体表面制备铝合金镀层的方法
CN108231322B (zh) * 2017-12-22 2020-06-16 中国科学院宁波材料技术与工程研究所 一种沉积有复合薄膜的烧结钕铁硼磁体及其制备方法
CN108359937B (zh) * 2018-02-27 2023-08-22 温州驰诚真空机械有限公司 转换式物理气相沉积粒子源
CN112662939B (zh) * 2020-12-16 2022-03-25 太原理工大学 一种表面沉积涂层的超薄永磁体

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1070036A (zh) * 1992-09-05 1993-03-17 郭恒桓 内藏式连体组合传动系统
CN101373650A (zh) * 2007-08-23 2009-02-25 北京中科三环高技术股份有限公司 干法喷砂式钕铁硼永磁材料的表面前处理方法
JP2009176880A (ja) * 2008-01-23 2009-08-06 Tdk Corp 永久磁石
CN101949000A (zh) * 2010-09-17 2011-01-19 温州市佳能真空电镀设备科技有限公司 真空磁控溅射多弧离子复合镀膜机
CN102041506A (zh) * 2009-10-13 2011-05-04 北京中科三环高技术股份有限公司 永磁材料的表面处理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU3708495A (en) * 1994-08-01 1996-03-04 Franz Hehmann Selected processing for non-equilibrium light alloys and products
WO1997023884A1 (fr) 1995-12-25 1997-07-03 Sumitomo Special Metals Company Limited Aimant permanent destine a des applications dans des conditions d'ultravide et procede de fabrication
DE19608731A1 (de) * 1996-03-06 1997-09-11 Vacuumschmelze Gmbh Verfahren zur Verbesserung des Korrosionsschutzes von aluminiumbeschichteten Oberflächen
EP0984460B1 (en) * 1998-08-31 2004-03-17 Sumitomo Special Metals Co., Ltd. Fe-B-R based permanent magnet having corrosion-resistant film, and process for producing the same
EP1136587B1 (en) 2000-03-23 2013-05-15 Hitachi Metals, Ltd. Deposited-film forming apparatus
CN101736304B (zh) * 2009-12-17 2012-07-04 烟台正海磁性材料股份有限公司 钕铁硼永磁体表面真空镀铝方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1070036A (zh) * 1992-09-05 1993-03-17 郭恒桓 内藏式连体组合传动系统
CN101373650A (zh) * 2007-08-23 2009-02-25 北京中科三环高技术股份有限公司 干法喷砂式钕铁硼永磁材料的表面前处理方法
JP2009176880A (ja) * 2008-01-23 2009-08-06 Tdk Corp 永久磁石
CN102041506A (zh) * 2009-10-13 2011-05-04 北京中科三环高技术股份有限公司 永磁材料的表面处理方法
CN101949000A (zh) * 2010-09-17 2011-01-19 温州市佳能真空电镀设备科技有限公司 真空磁控溅射多弧离子复合镀膜机

Also Published As

Publication number Publication date
US9938625B2 (en) 2018-04-10
US20150194259A1 (en) 2015-07-09
CN103824693A (zh) 2014-05-28

Similar Documents

Publication Publication Date Title
CN103854819B (zh) 一种钕铁硼稀土永磁器件的混合镀膜方法
CN103824693B (zh) 一种带有复合镀膜的钕铁硼稀土永磁器件的制造方法
CN103820765A (zh) 一种钕铁硼稀土永磁器件的复合镀膜设备及制造方法
CN103839641B (zh) 一种钕铁硼稀土永磁器件的混合镀膜设备及制造方法
CN103839671B (zh) 一种钕铁硼稀土永磁器件的制造方法
CN103820766B (zh) 一种钕铁硼稀土永磁器件的磁控镀膜设备及制造方法
CN100392147C (zh) 一种对靶孪生磁控溅射离子镀沉积装置
CN104831242B (zh) 大尺寸一体化铝钕旋转靶材及其制备方法
CN108018497A (zh) 一种钕铁硼磁体及钕铁硼磁体表面制备铝合金镀层的方法
CN109576668B (zh) 一种多工位长管材高效磁控溅射镀膜专用装置
CN107604328A (zh) 一种燃料电池金属双极板高效环形真空镀膜装置
CN110055503A (zh) 一种用于制备镝/铽镀层的磁控溅射镀膜系统和方法
CN201670871U (zh) 一种新型高效镀膜装置
CN103866241B (zh) 一种离子辅助热蒸发复合磁控溅射镀膜装置
CN101403101A (zh) 一种快速硬质陶瓷涂层离子镀装置
CN104894522A (zh) 真空镀膜装置及镀膜方法
CN101949000A (zh) 真空磁控溅射多弧离子复合镀膜机
CN108274009A (zh) 一种Cr靶材的修复方法
CN205590785U (zh) 一种用于钢材表面镀膜的钛金炉
CN114134456B (zh) 锆合金包壳Cr涂层磁控溅射制备方法
CN202658220U (zh) 磁控溅射镀膜机的磁控溅射靶
CN204779787U (zh) 一种磁控溅射靶枪
CN204174271U (zh) 一种高效散热的旋转平面靶
CN207958490U (zh) 用于重稀土扩散法制作钕铁硼永磁的真空磁控涂覆设备
CN210596244U (zh) 一种用于制备镝/铽镀层的磁控溅射镀膜系统

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant