CN103646672A - A novel wave-absorbing function design with material and structure wave-absorbing functions being integrated - Google Patents
A novel wave-absorbing function design with material and structure wave-absorbing functions being integrated Download PDFInfo
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- CN103646672A CN103646672A CN201310642720.3A CN201310642720A CN103646672A CN 103646672 A CN103646672 A CN 103646672A CN 201310642720 A CN201310642720 A CN 201310642720A CN 103646672 A CN103646672 A CN 103646672A
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Abstract
The invention discloses a novel wave-absorbing function design with material and structure wave-absorbing functions being integrated. A thick film characteristic of SU-8 novel negative photoresist is utilized; wave-absorbing materials and the SU-8 photoresist are combined, and micro-electronic technique means is utilized to perform patterning and a periodic structure is formed; and then the area outside the developed photoresist structure is filled with wave-absorbing materials based on wave-absorbing characteristic demands, and thus the wave-absorbing functions of the double materials and double structures are expressed. The thick film characteristic of the SU-8 photoresist is utilized and a patterning method is utilized to give play to the double wave-absorbing function of the materials and the structure; the novel wave-absorbing function design has the technical features of wide structure variable range and large material selection freedom; and the novel wave-absorbing function design facilitates the optimization design of a wave-absorbing system, and helps to improve wave-absorbing bandwidth and efficiency.
Description
Technical field
What the present invention relates to is a kind of suction wave energy design, and specifically a kind of logging material and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one.
Background technology
Absorbing material refers to electromagnetic wave that can attenuation by absorption incident, and by the effects such as dielectric vibration, eddy current and magnetostriction of absorbing agent, electromagnetic energy is changed into heat energy and dissipate, or the class functional material that electromagnetic wave is disappeared because of interference.People originate from its application in military field at first to the research of absorbing material.Nowadays, the development of digital communication causes electromagnetic a large amount of leakage, make the range of application of electromagnetic wave absorbent material far beyond military field, thereby absorbing material safely etc. also have demand widely in aspect in television broadcasting, human body electromagnetic protection, communication and navigational system.
Absorbing material, according to moulding process and load-bearing capacity, can be divided into coating-type absorbing materials (CRAM) and structure-type wave-absorption material (SRAM) two classes.Coating-type absorbing materials weatherability, cohesiveness and heat-resisting quantity are poor, and parts are obviously increased weight, thereby particularly at aerospace field, are subject to increasing restriction in actual applications.Structure-type wave-absorption composite material is the multi-gradient functional material that absorbing radar wave has again good load-carrying properties that is suitable for compositions such as the resin matrix of different electromagnetism and mechanical property, fortifying fibre, function filling agent and extraordinary comb cores, it can obviously alleviate architecture quality when improving useful load, have good designability concurrently, and the enforcement that is conducive to widen the New Radar Absorbing mechanism (as breadboardin and hand are levied medium etc.) of absorption band, thereby become one of emphasis of current absorbing material research and development.
Through the literature search of prior art is found, Zhao in 2012 is that diligent to wait the research that is published in the relevant active carbon-fiber felt screen of compound substance journal (upright carbon fiber)/resin compounded absorbing material be improve or improve absorbing property with periodic structure bond material characteristic.Its material behavior will be subject to constraint or the impact of periodic structure moulding on the one hand, and periodic structure exists larger space waste on the other hand, and the regulating power of its physical dimension is also comparatively limited.
Summary of the invention
The present invention is directed to prior art above shortcomings, a kind of novel suction wave energy design is proposed, utilize the thick film characteristic of SU-8 novel negative glue, mix, utilize microelectric technique means graphically to form periodic structure absorbing material and SU-8 photoresist, then the region outside the photoresist structure after development requires Selective filling absorbing material according to microwave absorbing property, the suction wave energy of the two material double structure of performance, is conducive to inhale the raising of the wide and usefulness of wavestrip.
The present invention is achieved by the following technical solutions, the present invention includes following steps:
The first step, mixes with absorbing material SU-8 photoresist and is spun in the substrates such as glass with certain weight ratio.
Second step, front baking is solidified photoresist
The 3rd step, exposure makes it graphical
The 4th step, middle baking, development obtain periodically photoresist structure
The 5th step, according to performance need, is filled into absorbing material and mixed with resin in the space of photoresist structure and forms new absorbent structure.
Described absorbing material refers to: metal, ferrite or carbon fiber etc.
The present invention utilizes SU-8 photoresist thick film characteristic, adopt the dual suction ripple effect of graphical means performance material and structure, have structurally variable wide ranges, material is selected the large technical characteristic of degree of freedom, be convenient to inhale the optimal design of wave system system, be conducive to inhale the raising of the wide and usefulness of wavestrip.
Accompanying drawing explanation
Fig. 1 is embodiment arrangenent diagram.
Fig. 2 is embodiment process chart;
In figure, 1,2 be wherein respectively different absorbing materials.
Below embodiments of the invention are elaborated, the present embodiment is implemented take technical solution of the present invention under prerequisite, provided detailed embodiment and concrete operating process, but protection scope of the present invention is not limited to following embodiment.
Embodiment
Embodiment 1:
As depicted in figs. 1 and 2, embodiment 1 comprises the following steps:
The first step, SU-8 photoresist is mixed with the weight ratio of 10:2 with ferroferric oxide wave absorbing material, be spun on the glass sheet of 1 millimeters thick after stirring and remove bubble, spin coating thickness is 500 microns.
Second step, the glass sheet after spin coating is placed in to baking oven front baking solidifies photoresist, pre-bake temperature is 90 degree, and the time is 5 hours.
Photoresist after the 3rd step, exposure curing, at 10mw/cm
2ultraviolet light intensity under expose 200 seconds.Photoresist structure is periodicity hexagon cellular structure.
The 4th step, middle baking and development, middle baking condition is 90 degree one hour, development conditions is one hour.
The 5th step, in the hexagon cellular structure of photoresist, fill metal absorbing material.
What the present embodiment was prepared is two materials suction property period of wave structures of ferrite and metal.Its structure pitch can be optimized according to absorbing property.
As depicted in figs. 1 and 2, embodiment 2 comprises the following steps:
The first step: SU-8 photoresist is mixed with the weight ratio of 10:3 with ferroferric oxide wave absorbing material, be spun on the glass sheet of 1 millimeters thick after stirring and remove bubble, spin coating thickness is 600 microns.
Second step, the glass sheet after spin coating is placed in to baking oven front baking solidifies photoresist, pre-bake temperature is 90 degree, and the time is 6 hours.
Photoresist after the 3rd step, exposure curing, at 10mw/cm
2ultraviolet light intensity under expose 250 seconds.Photoresist structure is periodicity square structure.
The 4th step, middle baking and development, middle baking condition is 90 degree 1.5 hours, development conditions is 1.2 hours.
The 5th step, outside the square structure of photoresist filling carbon fiber absorbing material.
What the present embodiment was prepared is two materials suction property period of wave structures of ferrite and carbon fiber.Its structure pitch can be optimized according to absorbing property.
Embodiment 3
As depicted in figs. 1 and 2, embodiment 2 comprises the following steps:
The first step: SU-8 photoresist is mixed with the weight ratio of 10:3 with ferroferric oxide wave absorbing material, be spun on the glass sheet of 1 millimeters thick after stirring and remove bubble, spin coating thickness is 600 microns.
Second step, the glass sheet after spin coating is placed in to baking oven front baking solidifies photoresist, pre-bake temperature is 90 degree, and the time is 6 hours.
Photoresist after the 3rd step, exposure curing, at 10mw/cm
2ultraviolet light intensity under expose 250 seconds.Photoresist structure is periodicity decussate texture.
The 4th step, middle baking and development, middle baking condition is 90 degree 1.5 hours, development conditions is 1.2 hours.
The 5th step, outside the square structure of photoresist filling carbon fiber absorbing material.
What the present embodiment was prepared is two materials suction property period of wave structures of ferrite and carbon fiber.Its structure pitch can be optimized according to absorbing property.
Claims (8)
1. logging material and structure are inhaled wave energy in a New Radar Absorbing Functional Design for one, it is characterized in that, comprise the steps:
The first step, mixes with absorbing material SU-8 photoresist and is spun in the substrates such as glass with certain weight ratio;
Second step, front baking is solidified photoresist;
The 3rd step, exposure makes it graphical;
The 4th step, middle baking, development obtain periodically photoresist structure;
The 5th step, according to performance need, is filled into absorbing material and mixed with resin in the space of photoresist structure and forms new absorbent structure.
2. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, described SU-8 photoresist mixes with certain weight ratio with absorbing material, and its ratio can be adjusted according to the feasibility of performance need and technique by root.
3. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, SU-8 photoresist is mixed with certain weight ratio with absorbing material and be spun in the substrates such as glass, substrate can be the materials such as glass, silicon.
4. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, SU-8 photoresist is mixed with certain weight ratio with absorbing material and is spun in the substrates such as glass, the thickness of spin coating can be from several microns to several millimeters not etc.
5. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, developing, to obtain periodically photoresist structure can be the periodic structures such as square, rectangle, cross are capable.
6. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, according to performance need, absorbing material and mixed with resin are filled in the space of photoresist structure and form new absorbent structure, its absorbing material can be other materials such as metal, ferrite or carbon fiber, also can comprise the auxiliary materials such as resin.
7. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, according to performance need, absorbing material and mixed with resin are filled in the space of photoresist structure and form new absorbent structure, its absorbing material can be metal, ferrite or carbon fiber etc. and the mixture of auxiliary material, and its ratio can be regulated according to performance need.
8. logging material according to claim 1 and structure are inhaled wave energy in the New Radar Absorbing Functional Design of one, it is characterized in that, the spacing between periodic structure can be adjusted according to performance need.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111170753A (en) * | 2020-01-21 | 2020-05-19 | 烟台大学 | Circuit-screen-containing ceramic wave-absorbing material with high-temperature resistance and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3904055A1 (en) * | 1988-02-12 | 1989-08-24 | Litton Systems Inc | IR WINDOW WITH METAL GRID AND METHOD FOR PRODUCING SUCH A WINDOW |
| US5148172A (en) * | 1988-01-18 | 1992-09-15 | Commissariat A L'energie Atomique | Absorbing coating, its process of manufacture and covering obtained with the aid of this coating |
| CN1330779A (en) * | 1998-11-18 | 2002-01-09 | 克拉里安特国际有限公司 | Antireflective composition for deep ultraviolet photoresist |
| CN1620245A (en) * | 2003-08-15 | 2005-05-25 | 纳幕尔杜邦公司 | Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof |
| CN101246310A (en) * | 2008-03-19 | 2008-08-20 | 吉林大学 | Negative fluorine-contained photoresist composition and its application in polymer optical waveguide device |
-
2013
- 2013-12-02 CN CN201310642720.3A patent/CN103646672A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5148172A (en) * | 1988-01-18 | 1992-09-15 | Commissariat A L'energie Atomique | Absorbing coating, its process of manufacture and covering obtained with the aid of this coating |
| DE3904055A1 (en) * | 1988-02-12 | 1989-08-24 | Litton Systems Inc | IR WINDOW WITH METAL GRID AND METHOD FOR PRODUCING SUCH A WINDOW |
| CN1330779A (en) * | 1998-11-18 | 2002-01-09 | 克拉里安特国际有限公司 | Antireflective composition for deep ultraviolet photoresist |
| CN1620245A (en) * | 2003-08-15 | 2005-05-25 | 纳幕尔杜邦公司 | Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof |
| CN101246310A (en) * | 2008-03-19 | 2008-08-20 | 吉林大学 | Negative fluorine-contained photoresist composition and its application in polymer optical waveguide device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111170753A (en) * | 2020-01-21 | 2020-05-19 | 烟台大学 | Circuit-screen-containing ceramic wave-absorbing material with high-temperature resistance and preparation method thereof |
| CN111170753B (en) * | 2020-01-21 | 2022-05-17 | 烟台大学 | Circuit-screen-containing ceramic wave-absorbing material with high-temperature resistance and preparation method thereof |
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Application publication date: 20140319 |