CN103443750B - Coating composition for touch panels, coating film, and touch panel - Google Patents

Coating composition for touch panels, coating film, and touch panel Download PDF

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Publication number
CN103443750B
CN103443750B CN201280013782.1A CN201280013782A CN103443750B CN 103443750 B CN103443750 B CN 103443750B CN 201280013782 A CN201280013782 A CN 201280013782A CN 103443750 B CN103443750 B CN 103443750B
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film
touch screen
coating composition
transparency electrode
metal
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CN103443750A (en
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江口和辉
村梶庆太
元山贤
元山贤一
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/58—Metal-containing linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Abstract

Provided are: a coating composition which is capable of forming a coating film that has high reliability and controlled refractive index; a coating film which is formed from the composition; and a touch panel which has the coating film on an electrode. A coating composition for touch panels, which is characterized by containing: a first metal alkoxide that is represented by general formula (I); a second metal alkoxide that is represented by general formula (II); a metal salt that is represented by general formula (III); an organic solvent; water; and a precipitation inhibitor. M＜1＞(OR＜1＞)[n] (I) R＜2＞[l]M＜2＞(OR＜3＞)[m-l] (II) M＜3＞(X)[k] (III)

Description

Touch screen coating composition, film and touch screen
Technical field
The present invention relates to touch screen coating composition, the film being formed by this coating composition and there is this film Touch screen.
Background technology
All the time, form inorganic envelope for various purposes in substrate surfaces such as glass, pottery, metal, plastics.Logical Cross and form inorganic envelope in substrate surface, base material can be given with electrical characteristics, optical characteristics, chemical characteristic, mechanical property etc..Cause This, these inorganic envelopes prevent film, resistance toization as the selection transmission of conducting film, dielectric film, light or absorbing film, alkali metal dissolution Product film, hard coat film etc. and practical.
Method as forming this inorganic envelope, can enumerate CVD (chemical vapor deposition (Chemical Vapor Deposition)), vapor phase method or the use such as PVD (physical vapour deposition (PVD) (Physical Vapor Deposition)), sputtering The liquid phase method of alkoxide cpd etc..
In general, vapor phase method needs the high price of vacuum deposition apparatus etc and large-scale device.Additionally, there is also energy The problem that the size and shape of the base material of film forming is restricted.On the other hand, as the liquid phase method using alkoxide cpd etc., Know so-called sol-gel process.The method has the advantages that to carry out large-area coating, can tackle pattern and formed.Therefore, It is widely used as the film (referring for example to patent documentation 1) in electronic device by the inorganic envelope that liquid phase method is made.Particularly Studying the application in touch screen recently.
In recent years, with the popularization of smart mobile phone, the display picture of mobile phone maximizes.Therefore, carrying out in a large number can profit With the display of the display exploitation to carry out the touch screen of input operation.Using touch screen, because not needing the switch of pressing type Deng input block, so enabling the maximization of display picture.
Touch screen detects the contact position of the operating area that finger or pen etc. are touched.Using this function, touch screen by with Make input equipment.The detection mode of contact position has resistive film mode, electrostatic capacitance mode etc..Using opposite in resistive film mode Two pieces of substrates, in contrast, in electrostatic capacitance mode, substrate used can be one piece.Therefore, by electrostatic capacitance side Formula, can constitute slim touch screen, be suitable for portable machine etc., so developing in large quantities in recent years.
Patent Document 2 discloses a kind of touch screen of electrostatic capacitance mode.In this touch screen, at one of transparency carrier It is configured on face detect the first transparency electrode of coordinate of X-direction and the second transparency electrode for detecting the coordinate of Y-direction, In respective cross section across interlayer dielectric, so that it is not turned on.
Touch screen is arranged in the display devices such as liquid crystal indicator, as can detect touch location with touch screen work( The display device of energy uses.The people of operation touch-screen to observe display device through touch screen, therefore using light in transparency electrode Transmission excellent component.For example using inorganic material such as ITO (tin indium oxide (Indium Tin Oxide)).Additionally, As interlayer dielectric, using acryhic material of insulating properties of pattern formation etc. can be carried out.
Prior art literature
Patent documentation
Patent documentation 1：No. 2881847 publications of Japanese Patent No.
Patent documentation 2：Japanese Patent Laid-Open 2010-28115 publication
Content of the invention
Invent technical problem to be solved
In above-mentioned touch screen, because operating area can be with finger tip or actual contact of nib and depressed etc. sometimes, Desired strength and high reliability.Therefore, carrying out setting on first and second electrodes overlapping across interlayer dielectric to protect The research of cuticula.
As protecting film, using the acryhic material that can carry out pattern formation.However, acryhic material is organic material, Therefore the hardness as protecting film is not enough.Additionally, be used ITO etc. as transparency electrode in the case of, poor with the adaptation of ITO, Become a big factor of the reliability decrease making touch screen.And, acryhic material is difficult to print using hectographic printing etc. The film of technology is formed.Therefore, when film is formed, need the photoetching technique using complex procedures.
Accordingly, as protecting film, carry out replacing acrylic film as the research of the film of composition using inorganic material.With no In the case that machine material is as the film of composition, general hardness is high, and the film as touch screen can expect high reliability.Therefore, right In the film using inorganic material as composition it is desirable to can carry out being formed using the film of printing technology, and show and above-mentioned third The high adhesion of the interlayer dielectric of the organic materials such as olefin(e) acid material.
Additionally, in the touch screen of electrostatic capacitance mode, being formed with the region of the transparency electrodes such as ITO and not forming transparency electrode Region between in terms of reflectance produce difference.Therefore, have and be observed that the pattern of transparency electrode, so that display is declined Problem.
As described above, in existing touch screen, acrylic film is used as the Protective coatings in transparency electrode.But It is that now, the refractive index characteristic for acrylic film does not have any consideration completely.Therefore, it is impossible to expect that acrylic film makes The inconspicuous effect of prescribed electrode pattern.Therefore, it is used and acrylic film is replaced as in the case of the film of composition using inorganic material, This film preferably makes transparent electrode pattern unobtrusively.Specifically, preferably use the film in view of refractive index.
The present invention is in view of this point and the invention that completes.That is, it is an object of the invention to provide one kind is applied to touch Screen, enable high reliability, refractive index obtains the film that controls, and the coating composition that can form such film.
Additionally, having that refractive index is controlled, enabling height can another object of the present invention is to providing on a kind of electrode Touch screen by the film of property.
Solve the technical scheme that technical problem is adopted
The present invention is invention for achieving the object above, and its technology contents is as described below.
1. touch screen coating composition it is characterised in that represent containing following logical formula (I) the first metal alkoxide, under State the second metal alkoxide that logical formula (II) represents, slaine that following logical formula (III) represents, organic solvent, water, anti-precipitation agent；
M1(OR1)n(I)
In formula, M1Represent selected from silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn) at least one metal, R1Represent alkyl or the acetoxyl group of carbon number 1～5, n represents M1Valence mumber 2～5；
R2 lM2(OR3)m-l(II)
In formula, M1Represent selected from silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn) at least one metal；R2Represent hydrogen atom or can be replaced by fluorine atoms and can be by halogen atom, vinyl, ring Oxygen propoxyl group, sulfydryl, methacryloxy, acryloxy, NCO, amino or Carbamido substituted and can have There is the alkyl of heteroatomic carbon number 1～20；R3Represent the alkyl of carbon number 1～5；M represents M2Valence mumber 2～5, l m valence mumber be 3 When be 1 or 2, when the valence mumber of m is 4 be 1～3, m valence mumber be 5 when be 1～4；
M3(X)k(III)
In formula, M3Represent and be selected from aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) With at least one metal of cerium (Ce), X represent hydrochloric acid, nitric acid, sulphuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid or The residue of acetyl pyruvate (ア セ チ Le ア セ ト Na ト) or their basic salt, k represents M3Valence mumber.
2. the touch screen coating composition described in above-mentioned 1 is it is characterised in that the content of the second metal alkoxide is with respect to general Obtained by first metal alkoxide and the addition of the second metal alkoxide, all metal alkoxides are 15 moles of more than %.
3. the touch screen coating composition described in above-mentioned 1 or 2 is it is characterised in that anti-precipitation agent is selected from N- methyl-pyrrole Pyrrolidone, ethylene glycol, dimethylformamide, dimethyl acetylamide, diethylene glycol, propylene glycol, hexanediol and their derivant At least one above material.
4. the touch screen coating composition any one of above-mentioned 1～3 is it is characterised in that the metal raw of slaine Sub- M3Metallic atom M with the first metal alkoxide and the second metal alkoxide1And M2Mol ratio be 0.01≤M3/(M1+M2+M3)≤ 0.7.
5. the touch screen coating composition any one of above-mentioned 1～4 is it is characterised in that the first metal alkoxide is Silicon alkoxide or part thereof condensation substance and the mixture of Titanium alkoxides.
6. the touch screen coating composition any one of above-mentioned 1～5 is it is characterised in that slaine is metal nitre Hydrochlorate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal aminosulfonate, metal sulfonate, gold Belong to acetoacetate, metal acetyl acetonate or their basic salt.
7. the touch screen coating composition any one of above-mentioned 1～6 is it is characterised in that the first metal alkoxide is Silicon alkoxide or part thereof condensation substance and the mixture of Titanium alkoxides, organic solvent comprises aklylene glycol class or its monoether derivant.
8. film is it is characterised in that with the coating composition film forming of the touch screen any one of above-mentioned 1～7.
9. it is characterised in that refractive index is 1.52～1.70, thickness is 40nm～170nm to the film described in above-mentioned 8.
10. touch screen, it is the touch screen of the pattern being formed with transparency electrode in the operating area of substrate, and its feature exists In,
Film described in above-mentioned 8 or 9 is configured at least a portion of the pattern of described transparency electrode.
Touch screen described in 11. above-mentioned 10 it is characterised in that
Described transparent electrode pattern has the first transparent electrode pattern of the position for detecting at least two different directions Constitute with second transparency electrode pattern；
At least a portion of described first transparent electrode pattern and described second transparency electrode pattern is in the behaviour of described substrate Make in region overlapping, and the described first transparent electrode pattern of part in this overlap and described second transparency electrode pattern it Between be configured with the film being made up of organic material；
Described film is configured to be coated at least the one of described first transparent electrode pattern or described second transparency electrode pattern Part, and at least a portion of the coating described film being made up of organic material.
Touch screen described in 12. above-mentioned 11 is it is characterised in that described first transparent electrode pattern and described second transparent electrical The lap of pole figure case exists multiple in the operating area of described substrate, is each configured with face in these multiple laps Long-pending bigger than the area of described lap described in the film that is made up of organic material.
The effect of invention
By the present invention, it is possible to provide one kind can be formed be applied to touch screen, enable high reliability, refractive index is controlled Film touch screen coating composition.
Additionally, passing through the present invention, it is possible to provide a kind of refractive index is controlled, has high intensity, is suitable as touch screen The film of film.
By the present invention, it is possible to provide a kind of obvious phenomenon of pattern of electrode is inhibited, has the touch of high reliability Screen.
Brief description
Fig. 1 be pattern represent the present invention the structure of touch screen top view.
Fig. 2 is the sectional view of the A1-A1 ' line along Fig. 1.
(a) of Fig. 3～(d) is the operation sectional view of the manufacture method of the touch screen representing the present invention.
Fig. 4 is the sectional view of the brief configuration of another of the touch screen representing the present invention.
Fig. 5 be pattern represent the present invention the structure of another example of touch screen top view.
Fig. 6 is the sectional view of the B1-B1 ' line along Fig. 5.
Specific embodiment
<Coating composition>
The coating composition of the present invention contains the first metal alkoxide that above-mentioned logical formula (I) represents, above-mentioned logical formula (II) represents The second metal alkoxide, above-mentioned logical formula (III) represent slaine, organic solvent, moisture, anti-precipitation agent.By this is coated with Compositionss film forming, can obtain being suitable for the film of touch screen.
The film being obtained by the coating composition of the present invention using as the metal-oxide of inorganic matters as main component, with Compared by the film that the organic materials such as acryhic material are constituted, hardness is higher, there is higher intensity.Therefore suitable as touch The electrode protecting film of screen.Additionally, in order to be able to reduce the so-called " electrode pattern that can observe transparent electrode pattern in touch screen It can be seen that " phenomenon, refractive index is controlled in optimum range.As a result, can prevent aobvious using the touch screen using this film The display of showing device declines.
In the film that the present invention obtains, example has such as disposed in the transparent electrode pattern in the operating area of the substrate of touch screen When have for detecting two kinds of transparent electrode patterns of position of two different directions and constitute.Now, configure between them The interlayer dielectric being made up of organic materials such as acryhic materials, so that two kinds of transparent electrode patterns do not electrically connect.For this In the case of planting the touch screen constituting, film is also formed on interlayer dielectric.Here, due to the heat of film and interlayer dielectric The difference of retractility, there is a problem of film ftracture, the reliability decrease of touch screen.
In the coating composition of the present invention, the structure and composition for contained composition is in optimized selection, so that touching The film touching screen does not ftracture.In more detail, in the coating composition of the present invention, for the metal alcohol as main component Salt, can select to be suitable for the structure and composition of the formation of film.
The coating composition of the present invention contains the first metal alkoxide of the structure that following logical formula (I) represent and following formula (II) the second metal alkoxide of the structure representing.
[changing 1]
M1（OR1）N（I）
In formula (I), M1、R1, n defined as described above.Wherein, M1Preferably silicon (Si), titanium (Ti), zirconium (Zr) or aluminum (Al), Particularly preferably silicon (Si) or titanium (Ti).N preferably 3 or 4.
[changing 2]
R2 LM2（OR3）M-l（II）
In formula (II), M2、R2、R3, m defined as described above.Wherein, M2Preferably silicon (Si), titanium (Ti), zirconium (Zr) or aluminum (Al), particularly preferably silicon (Si) or titanium (Ti).
The metal alkoxide representing as formula (I), in the case of silicon alkoxide or part thereof condensation substance, can use formula (IV) one or more mixture of the compound representing or partial condensate (preferably below pentamer).
[changing 3]
Si（OR '）4（IV）
In formula (IV), R ' represents carbon number 1～5, preferably 1～3 alkyl or acetoxyl group.
More specifically, as silicon alkoxide, such as tetramethoxy-silicane, tetraethoxysilane, tetrapropoxy-silicane can be used Tetraalkoxysilane classes such as alkane, four butoxy silanes, four acetoxylsilanes etc..
The metal alkoxide representing as formula (I), in the case of Titanium alkoxides or partial condensate, can be using logical formula V One or more the mixture of compound representing or partial condensate (preferably below pentamer).
[changing 4]
Ti（OR "）4（V）
In formula (V), R " represents the alkyl of carbon number 1～5.
The metal alkoxide representing as formula (I), specifically, as Titanium alkoxides, can using titanium tetraethoxide, four titanium propanolates, Partial condensate such as the titaniums such as erythrol titanium four alkoxide cpd or the four n-butyl titanium tetramers etc..
Other examples of the metal alkoxide representing as formula (I), can enumerate tetraethoxide zirconium, four propanol zirconiums, erythrol zirconium etc. Zirconium four alkoxide cpd；Aluminum three alkoxide cpd such as three aluminium butoxides, aluminum isopropylate, three aluminum ethylate .s；Five propanol tantalums, five butanol tantalums Deng tantalum five alkoxide cpd etc..
The content of the first metal alkoxide is with respect to contained the first metal alkoxide in coating composition and the second metal alkoxide Preferably 20 moles %～85 mole % of total amount, more preferably 30 moles %～70 mole %.
The second metal alkoxide that upper formula (II) represents is used for the coating compositions of the present invention together with above-mentioned first metal alkoxide Thing.In coating composition, by containing the second metal alkoxide, painting being formed on the film being made up of organic materials such as acryhic materials In the case of film, the difference of the thermal expansion between film and organic membrane is alleviated.Even if as a result, shape over an organic film Become film, also can prevent film from ftractureing.For example, in touch screen, even if organic using be made up of acryhic material Film, as above-mentioned interlayer dielectric etc., is formed on film, also can prevent the film on interlayer dielectric from ftractureing.
The content of the second metal alkoxide is with respect to contained the first metal alkoxide in coating composition and the second metal alkoxide Preferably 80 moles %～15 mole % of total amount, more preferably 70 moles %～30 mole %.R2Carbon number be less than 3 situation Under, the content of the metal alkoxide that formula (II) represents is more than 30%, R2Carbon number be more than 4 in the case of or R2In contain sulfydryl In the case of, the content more preferably more than 15% of the second metal alkoxide, and more preferably 75 moles below %.
In the case that the content of the second metal alkoxide is less than 15 moles of %, the film that above-mentioned organic membrane obtains is sent out sometimes Raw cracking.Although not ftractureing in the case of 80 moles of more than %, but it some times happens that homogeneous film cannot be obtained Phenomenon.By using such content, the generation of the cracking in above-mentioned film can be suppressed.
Total content preferably 0.5 weight % of the first contained metal alkoxide and the second metal alkoxide in coating composition～ 20 weight %, more preferably 1 weight %～15 weight %.In the case of this large percentage, the not only storage-stable of coating composition Property is poor, and is difficult to the film thickness monitoring of film.On the other hand, in the case of less, gained film is relatively thin, in order to be advised Fixed thickness and need repeatedly to be coated with.
The preferred metal alkoxide representing as formula (II), such as M2In the case of silicon, following compound can be enumerated.
Such as MTMS, methyl tripropoxy silane, methyl triacetoxysilane, methyl three can be enumerated Butoxy silane, methyl three amoxy silane, methyl three amoxy silane, methyl triple phenoxyl silane, methyl three benzyloxy silicon Alkane, methyl triphen Ethoxysilane, glycidyl oxy methyl trimethoxy silane, glycidyl oxy methyl triethoxysilane, α-glycidoxyethyl trimethoxy silane, α-glycidoxyethyl triethoxysilane, beta epoxide Among three Methoxy silane, beta epoxide Among triethoxysilane, α-glycidoxypropyltrime,hoxysilane, α-epoxy third Epoxide propyl-triethoxysilicane, beta epoxide propoxypropyl trimethoxy silane, beta epoxide propoxypropyl triethoxysilicane Alkane, γ-glycidoxypropyltrime,hoxysilane, γ-glycidoxypropyl group triethoxysilane, γ-glycidoxy Propyl group tripropoxy silane, γ-glycidoxypropyl group three butoxy silane, γ-glycidoxypropyl group triple phenoxyl silane, α-glycidoxy butyl trimethoxy silane, α-glycidoxy butyl triethoxysilane, beta epoxide propyloxybutyl three Ethoxysilane, γ-glycidoxy butyl trimethoxy silane, γ-glycidoxy butyl triethoxysilane, δ-epoxy Propyloxybutyl trimethoxy silane, δ-glycidoxy butyl triethoxysilane, (3,4- epoxycyclohexyl) methyl trimethoxy TMOS, (3,4- epoxycyclohexyl) MTES, β-(3,4- epoxycyclohexyl) ethyl trimethoxy silane, β-(3,4- epoxycyclohexyl) ethyl triethoxysilane, β-(3,4- epoxycyclohexyl) ethyl tripropoxy silane, β-(3,4- Epoxycyclohexyl) ethyl three butoxy silane, β-(3,4- epoxycyclohexyl) ethyl triple phenoxyl silane, γ-(3,4- epoxide ring Hexyl) propyl trimethoxy silicane, γ-(3,4- epoxycyclohexyl) propyl-triethoxysilicane, δ-(3,4- epoxycyclohexyl) Butyl trimethoxy silane, δ-(3,4- epoxycyclohexyl) butyl triethoxysilane, glycidyl oxy methyl methyl dimethoxy oxygen Base silane, glycidyl oxy methyl methyldiethoxysilane, α-glycidoxyethyl methyl dimethoxysilane, α-epoxy Among methyldiethoxysilane, beta epoxide Among methyl dimethoxysilane, beta epoxide Among Ethyldimethoxysilane, α-glycidoxypropyl dimethoxysilane, α-glycidoxypropyl diethoxy Base silane, beta epoxide propoxypropyl methyl dimethoxysilane, beta epoxide propoxypropyl ethyldimethoxysilane, γ- Glycidoxypropyl dimethoxysilane, γ-glycidoxypropyl diethoxy silane, γ-epoxy third oxygen Base hydroxypropyl methyl dipropoxy silane, γ-glycidoxypropyl dibutoxy silane, γ-glycidoxypropyl group first Base hexichol TMOS, γ-glycidoxypropyl group ethyldimethoxysilane, γ-glycidoxypropyl group ethyl diethoxy Base silane, γ-glycidoxypropyl group vinyl dimethoxysilane, γ-glycidoxypropyl group vinyl diethoxy silicon Alkane, ethyl trimethoxy silane, ethyl triethoxysilane, vinyltrimethoxy silane, VTES, second Thiazolinyl triacetoxysilane, phenyltrimethoxysila,e, phenyl triethoxysilane, phenyl triacetoxysilane, γ-chlorine Propyl trimethoxy silicane, γ-chloropropyl triethoxysilane, γ-chloropropyl triacetoxysilane, 3,3,3- trifluoro propyl Trimethoxy silane, γ-methacryloxypropyl trimethoxy silane, γ mercaptopropyitrimethoxy silane, γ-mercapto Base propyl-triethoxysilicane, beta-cyano ethyl triethoxysilane, chloromethyl trimethoxy silane, chloromethane ethyl triethoxy silicane Alkane, N- (beta-aminoethyl) gamma-amino propyl trimethoxy silicane, N- (beta-aminoethyl) gamma-amino hydroxypropyl methyl dimethoxy Base silane, gamma-amino hydroxypropyl methyl dimethoxysilane, N- (beta-aminoethyl) γ aminopropyltriethoxy silane, N- (beta-aminoethyl) gamma-amino hydroxypropyl methyl diethoxy silane, dimethyldimethoxysil,ne, phenyl methyl dimethoxy silicon Alkane, dimethyldiethoxysilane, phenyl methyl diethoxy silane, gamma-chloropropylmethyldimethoxysilane, γ-chlorine third Ylmethyl diethoxy silane, dimethyl 2 acetoxyl group silane, γ-methacryloyloxypropyl methyl dimethoxy silicon Alkane, γ-methacryloyloxypropyl methyl diethoxy silane, γ-mercaptopropyi methyl dimethoxysilane, γ-sulfydryl Methyldiethoxysilane, methylvinyldimethoxysilane, methyl vinyl diethoxysilane, γ-ureido-propyl three Ethoxysilane, γ-ureido-propyl trimethoxy silane, γ-ureido-propyl tripropoxy silane, (R)-N-1- phenylethyl- N '-tri-ethoxy silylpropyl urea, (R)-N-1- phenylethyl-N '-trimethoxysilylpropyl urea, pi-allyl three ethoxy Base silane, 3- methacryloxypropyl trimethoxy silane, 3- methacryloxypropyl, 3- third Alkene acryloxypropylethoxysilane trimethoxy silane, 3- acryloxypropyl triethoxysilane, 3- NCO propyl group three ethoxy Base silane, trifluoro propyl trimethoxy silane, bromopropyl triethoxysilane, diethyldiethoxysilane, diethyl diformazan TMOS, dimethoxydiphenylsilane, diphenyl diethoxy silane, trimethylethoxysilane, trimethyl methoxy Silane, to styryl trimethoxy silane, to styryl triethoxysilane, to styryl tripropoxy silane etc.. They can be used alone or in combination of two or more.
As the slaine containing in the coating composition of the present invention, represented with following formulas (III).
[changing 5]
M3（X）K（III）
In formula (III), M3, X, k defined as described above.Wherein, M3Preferably aluminum (Al), indium (In), cerium (Ce) or zirconium (Zr).X is preferably hydrochloric acid, nitric acid, acetic acid, oxalic acid, the residue of sulfonic acid, acetoacetic acid or acetyl pyruvate or their alkali formula Salt.As the residue of each acid in above-mentioned X, such as nitric acid is also referred to as nitrate anion, and sulphuric acid is also referred to as sulfate radical, its content and M3's Valence mumber is of equal value.Basic salt refers to the situation comprising OH base in the residue of above-mentioned each acid.
In the slaine that formula (III) represents, particularly preferably nitrate, chloride salt, oxalates or its basic salt.Wherein, From the viewpoint of the complexity obtaining, the storage-stable of coating composition, the nitrate of more preferably aluminum, indium or cerium.
The coating composition of the present invention contains organic solvent.This organic solvent obtains forming this film by coating composition To being used for during film adjusting the viscosity of coating composition, improving coating, the content of the organic solvent in coating composition is relatively Contained whole metal alkoxides preferably 80 weight %～99.5 weight % in coating composition, more preferably 85 weight %～99 Weight %.In the case that the content of organic solvent is less, gained film is relatively thin, needs repeatedly to apply to obtain the thickness of regulation Cloth.On the other hand, in the case of more, not only the storage-stable of coating composition is poor, and is difficult to the thickness of film Control.
As organic solvent used in coating composition, can enumerate methanol, ethanol, 1- propanol, 2- propanol, n-butyl alcohol, The alcohols such as 2- butanol, 2- methyl isophthalic acid-propanol, 2- methyl-2-propanol；The esters such as ethyl acetate；The di-alcoholss such as ethylene glycol or it Ester derivant；The ethers such as diethyl ether；The ketones such as acetone, methyl ethyl ketone, Ketohexamethylene；Benzene, toluene etc. are aromatic hydrocarbon etc.. They can be used alone or in combination.
In the case of containing Titanium alkoxides composition in coating composition, as contained aklylene glycol class in organic solvent or Its monoether, can enumerate such as ethylene glycol, diethylene glycol, propylene glycol, hexanediol or their monomethyl ether, single ether, single propyl ether, list Butyl ether or monophenyl ether etc..
In organic solvent used in coating composition contained di-alcoholss or its monoether with respect to Titanium alkoxides mole Than if less than 1, then the effect stability of Titanium alkoxides being risen is little, and the storage-stable of coating composition is poor.The opposing party Face, does not have any problem using di-alcoholss or its monoether in a large number.For example, used in coating composition, organic solvent can also It is all above-mentioned di-alcoholss or its monoether.But, coating composition do not contain Titanium alkoxides in the case of, do not have especially necessary containing Above-mentioned dihydroxylic alcohols and/or its monoether.
Coating composition preferably contains anti-precipitation agent.Anti- precipitation agent prevents when forming coating envelope by coating composition Slaine separates out in film.As anti-precipitation agent, N-Methyl pyrrolidone, dimethylformamide, dimethylacetamide can be enumerated Amine, ethylene glycol, diethylene glycol, propylene glycol or hexanediol or their derivant etc..Wherein more preferably N-Methyl pyrrolidone, second Glycol, diethylene glycol, propylene glycol, hexanediol or their derivant.Anti- precipitation agent can use more than at least one.
As the content of the anti-precipitation agent in coating composition, preferably so that the metal of above-mentioned slaine is converted into metal Meet the ratio (weight ratio) of following conditions after oxide to use.
(anti-precipitation agent/metal-oxide) >=1
If aforementioned proportion is less than 1, the effect that anti-metal during formation coating envelope salts out is little.On the other hand, greatly Amount does not result in any impact using anti-precipitation agent to coating composition, but preferably less than 200.
Can be by metal alkoxide, particularly silicon alkoxide, titanium when Hydrolysis condensation reaction in the presence of slaine Alkoxide or silicon alkoxide and Titanium alkoxides are added in anti-precipitation agent it is also possible to add after hydrolysis-condensation reaction terminates.
On the other hand, as the content of contained slaine in coating composition, above-mentioned first and second are preferably constituted Metallic atom (the M of metal alkoxide1And M2) with the metallic atom (M of above-mentioned slaine3) total content ratio be to meet following conditions Ratio (mol ratio).
0.01≤M3/(M1+M2+M3)≤0.7
If this ratio is less than 0.01, the mechanical strength of gained envelope is not enough, therefore undesirable.On the other hand, if More than 0.7, then the adaptation of the base material to glass substrate and transparency electrode etc. for the film declines.Further, the low temperature below 450 DEG C Under burn till in the case of, also have the tendency of gained film chemical-resistant decline.Wherein, this ratio more preferably 0.01～0.6.
In the coating composition of the present invention, as long as not damaging the effect of the present invention, then can be containing mentioned component beyond The composition such as other compositions, such as inorganic particles, metal oxygen alkane oligomer, metal oxygen alkane polymer, levelling agent, surfactant.
As inorganic particles, preferably silicon dioxide microparticle, alumina particulate, titanium oxide microparticle, magnesium fluoride particulate etc. is micro- Grain, the particularly preferably colloid solution of these inorganic particles.This colloid solution both can be that inorganic particulate powder is scattered in dispersion Colloid solution obtained by medium or the colloid solution of commercially available product.
In the present invention, by containing inorganic particles, the surface configuration of solidification envelope of formation and other function can be given.Make For inorganic particles, preferably 0.001～0.2 μm of its mean diameter, more preferably 0.001～0.1 μm.The mean diameter of inorganic particles In the case of 0.2 μm, the transparency of the solidification envelope being formed with the coating fluid of preparation declines sometimes.
As the disperse medium of inorganic particles, water and organic solvent can be enumerated.As colloid solution, apply from envelope formation From the viewpoint of the stability of cloth liquid, pH or pKa is preferably adjusted to 1～10, more preferably 2～7.
Organic solvent used in disperse medium as colloid solution, can enumerate methanol, ethanol, propanol, butanol, second two Alcohol, propylene glycol, butanediol, pentanediol, 2- methyl-alcohol such as 2,4-PD, diethylene glycol, dipropylene glycol, ethylene glycol ether Class；The ketones such as methyl ethyl ketone, methyl iso-butyl ketone (MIBK)；Toluene, dimethylbenzene etc. are aromatic hydrocarbon；Dimethylformamide, dimethyl The amide-types such as acetamide, N-Methyl pyrrolidone；The esters such as ethyl acetate, butyl acetate, gamma-butyrolacton；Oxolane, 1,4- TwoThe ethers such as alkane.It is preferably wherein alcohols and ketone.Conduct after these organic solvents can mix alone or in any combination divides Dispersion media uses.
In the case that above-mentioned metal alkoxide and slaine are converted into metal-oxide, in the coating composition of the present invention Solid component concentration is preferably in the range of 0.5 weight %～20 weight %.If solid constituent is more than 20 weight %, no The storage-stable of only coating composition is poor, and is difficult to the film thickness monitoring of film.On the other hand, solid constituent is less than In the case of 0.5 weight %, gained film is relatively thin, needs repeatedly to be coated with to obtain the thickness of regulation.Wherein, solid constituent Concentration more preferably 1 weight %～15 weight %.
In the coating composition of the present invention, in order to by above-mentioned first and second metal alkoxides in the presence of above-mentioned slaine Hydrolysis obtains condensation substance and contains water.The amount of this water is with respect to the integral molar quantity preferably 2 of above-mentioned first and second metal alkoxides ～24 moles.Should (in the case that the ratio of the amount (mole) of water/(total mole number of metal alkoxide) is less than 2, metal alkoxide Hydrolysis is insufficient, so that film property is declined, and makes gained apply film strength and declines, therefore undesirable.Aforementioned proportion is more than 24 situation Under, because polycondensation is persistently carried out, so that storage-stable is declined, therefore undesirable.Wherein, this mol ratio more preferably 2～20.
In the case that the slaine containing in coating composition is aqueous salt, its contained moisture participates in hydrolysis, because Need in the amount of contained water in this coating composition to consider the moisture contained by this slaine.For example, the slaine coexisting is aluminum In the case of the aqueous salt of salt, its contained moisture participates in reaction, therefore with respect to the amount of the water used by hydrolysis, needs to consider aluminum Moisture contained by salt.
The coating composition of the present invention can form the film being suitable for touch screen.This film is using the gold as inorganic matters Belong to the film that oxide is main component, there is compared with the film of the organic materials such as acryhic material higher intensity.And, The protecting film of electrode is can serve as in following touch screens.Film has the thermal expansion characteristic of appropriateness, even if being therefore formed at structure Become on the organic membrane of touch screen, the generation of cracking is also suppressed in Min..Additionally, refractive index is controlled in optimum range Interior, so that because the it is observed that decline minimizing of transparent electrode pattern and the display of display device that leads to.
For the control of the refractive index of film, can be realized by controlling the composition of coating composition.That is, the painting of the present invention Film is to make the metal alkoxide hydrolytic condensation containing in above-mentioned coating composition and the film made, by selecting metal alkoxide Composition, can adjust the refractive index of the film of formation to regulation.For example, silicon alkoxide and titanium are selected as metal alkoxide In the case of alkoxide, by adjusting its mixed proportion, the refractive index of gained film can be adjusted to following prescribed limits, In the range of specifically 1.45～2.1 about.
That is, by coating composition coating film forming, in the film that preferably burnt till after the drying and formed, required Refractive index have determined in the case of it may be determined that the constitutive molar ratio of metal alkoxide, such as silicon alkoxide and Titanium alkoxides, with reality Now this refractive index.For example, by the film only coating composition obtained by silanol salt hydrolysiss being formed refractive index be 1.45 about Value.In addition, by only by Titanium alkoxides hydrolyze obtained by the refractive index of film that formed of coating composition be 2.1 about value.Cause This, in the case of being intended to for the refractive index of film to be set as the specific value between about 1.45～2.1, can be made with the ratio of regulation Manufacture coating composition with silicon alkoxide and Titanium alkoxides, to realize this refractive index value.
Additionally, by using other metal alkoxides, the adjustment of the refractive index of gained film also can be carried out.In addition, for this The refractive index of the film of invention, it is also possible to be adjusted by selecting membrance casting condition in addition to composition condition.Thus, enable The high rigidity of film, and enable desired refractive index value.
In the case that film is obtained by the coating composition of the present invention, as described above, preferably by the painting of coating composition Film is dried, and then burns till.It is dried and preferably carries out at room temperature～150 DEG C, more preferably carry out at 40～120 DEG C.When being dried Between preferably 30 seconds～10 minutes about, more preferably 1～8 minute about.As drying meanss, preferably use heating plate or hot blast Circulating baking oven etc..
In view of the thermostability of other member of formation of touch screen, burn till and preferably carry out at 100 DEG C～300 DEG C, more It is well to carry out at 150 DEG C～250 DEG C.Firing time preferably more than 5 minutes, more preferably more than 15 minutes.As the side of burning till Method, preferably uses heating plate, heat-circulation type baking oven, infrared-ray oven etc..
In the case of the film of coating composition is carried out burning till manufacturing film, the refractive index of gained film is according to burning till The difference of temperature and change.Now, firing temperature is higher, more can improve the refractive index of film.Therefore, by selecting firing temperature It is set to the value of appropriateness, the adjustment of the refractive index of gained film can be carried out.
In the case that film is obtained by coating composition, if to film irradiation ultraviolet radiation (UV), gained before burning till The refractive index of film changes.Specifically, ultraviolet irradiation amount is more, more can improve the refractive index of film.Therefore, in order to The presence or absence of realize desired refractive index, ultraviolet can be selected to irradiate.The metal alkoxide bag particularly containing in coating composition In the case of Titanium alkoxides, zirconium alkoxide or tantalum alkoxide, by ultraviolet (UV) irradiation to the film before burning till, gained film Refractive index changes, and ultraviolet irradiation amount is more, more can improve the refractive index of film.Film can be by the choosing of the conditions such as composition In the case of selecting and realizing desired refractive index, ultraviolet irradiation can not be carried out.
The refractive index of film in the case of carrying out ultraviolet irradiation, by selecting its irradiation dose, can be adjusted.Film is terrible In the case of needing to carry out ultraviolet irradiation to desired refractive index, for example, can use high voltage mercury lamp.Using high voltage mercury lamp In the case of, with 365nm conversion, preferably total light irradiation 1000mJ/cm2Above irradiation dose, more preferably 3000mJ/cm2~ 10000mJ/cm2Irradiation dose.As the light source of ultraviolet, in addition to high voltage mercury lamp, it is possible to use low pressure mercury lamp, metal halide Thing lamp, xenon lamp, Excimer lamp etc..In the case of the other light sources beyond high voltage mercury lamp, can irradiate and using above-mentioned height The accumulated light of equivalent during pressure mercury lamp.It is also possible between drying process and firing process in the case of carrying out ultraviolet irradiation Carry out ultraviolet irradiation process.
In the case of containing Titanium alkoxides composition particularly in coating composition, have and be stored at room temperature lower viscosity and slowly raise Property.Like this although having very big problem without worry at practical aspect, but critically control the situation of the thickness of film Under, preferably prudent management is carried out to temperature etc..Such viscosity raises the composition with the Titanium alkoxides in coating composition Increasing of ratio and become notable.Think that its reason is, compared with Titanium alkoxides and silicon alkoxide etc. hydrolysis rate faster, condensation reaction Also faster.
In the case that coating composition contains Titanium alkoxides composition, in order to reduce viscosity B coefficent, preferably following two kinds of preparation methods (1) With preparation method (2).
(1) when Titanium alkoxides being hydrolyzed in the presence of slaine, after in advance di-alcoholss and Titanium alkoxides being sufficiently mixed, root According to needing to mix with silicon alkoxide, hydrolyze in presence of organic solvent.The coating composition little thus, it is possible to obtain viscosity B coefficent.Recognize For this (1) preparation method effective the reason be because having heating when mixing Titanium alkoxides with di-alcoholss, in Titanium alkoxides Alkoxyl and di-alcoholss between occur ester exchange reaction, for hydrolysis-condensation reaction stabilisation.
(2) make in advance silicon alkoxide be hydrolyzed in the presence of slaine reaction after, be mixed with di-alcoholss mix In the titanium alkoxide solution closing, carry out condensation reaction, obtain coating composition.The coating compositions little thus, it is possible to obtain viscosity B coefficent Thing.
Think that the preparation method of this (2) is following reason the reason effective.I.e. although the hydrolysis of silicon alkoxide are with speed faster Degree is carried out, but subsequent condensation reaction is slower compared with Titanium alkoxides.Therefore, after hydrolysis terminate, if promptly added Titanium alkoxides, then the silanol group of the silicon alkoxide after hydrolysis and Titanium alkoxides equably react.Thereby it is believed that hydrolysis after silanol Salt makes the condensation reaction stabilisation of Titanium alkoxides.
Have attempted to the method for the silicon alkoxide hydrolyzing in advance and Titanium alkoxides mixing.But, organic used in reaction In solvent do not contain di-alcoholss in the case of it is impossible to obtain the coating composition of excellent storage stability.2) method shown in exists By have other metal alkoxides of hydrolysis rate and silicon alkoxide faster obtain also useful in the case of coating composition.
Then the coating composition of the present invention makes film using the usual rubbing method implemented by coating film.As painting Cloth method, can adopt such as dip coating, spin-coating method, spraying process, bristle rubbing method, roller transfer method, silk screen print method, ink-jet method or glue Version printing method etc..Wherein particularly preferably it is suitable for ink-jet method and the flexographic printing process of pattern printing.
<Film>
The coating composition of film the invention described above of the present invention is formed.Furthermore, it is possible to the electrode as touch screen is protected Cuticula is used for the touch screen of following present invention.
The film of the present invention be containing as inorganic matters metal-oxide as composition film, and by acryhic material The film constituting Deng organic material is compared, and hardness is higher, has higher intensity.That is, mechanical strength, protects transparency electrode Do not affected by the multiple pressing of finger etc..
In the case that touch screen is constituted by the film that organic material is constituted, for example, it is configured at the interelectrode interlayer of touch screen In the case that dielectric film is made up of organic materials such as acryhic materials, the film of the present invention is especially effective.That is, even if by organic The film of the present invention is formed on the film that material is constituted, also can carry out into the selection being grouped into, so as not to because and organic membrane Difference in terms of thermal expansion and ftracture.
The film of the present invention also is suitable as the protecting film of the electrode of following touch screens.That is, by this film, energy can be suppressed Observe the phenomenon (the visible phenomenon of electrode pattern) of transparent electrode pattern.Therefore, by the touch screen being formed with this film, can subtract The decline of the display of few display device.
The reason observe transparent electrode pattern in touch screen is, the transparency electrode in the operating area of substrate The refractive index of pattern is different from the refractive index of substrate.The transparent electrode pattern of touch screen is generally by as inorganic, metal oxide ITO (tin indium oxide (Indium Tin Oxide)) is constituted.The refractive index of ITO is 1.8～2.1 about.On the other hand, glass base The refractive index of plate is 1.4～1.5 about, therefore has very big difference with the refractive index of ITO.The difference of this refractive index makes formed There is the difference producing reflective character between the region of transparent electrode pattern and the region not forming transparent electrode pattern.That is, companion It is being formed between the region of transparent electrode pattern and the region not forming transparent electrode pattern with the interface reflection characteristic interfered Variant, thus result in the obvious result of electrode pattern when picture shows.
Then, the present inventor is in order that transparent electrode pattern has unobtrusively been repeated conscientiously studies, it was found that having Effect is that on transparent electrode pattern on being configured at substrate, setting refractive index and film thickness is controlled in desired scope Layer.Specifically it is known that by controlling in optimum range the refractive index and film thickness of the protective layer of transparent electrode pattern, can press down The phenomenon that transparent electrode pattern in touch screen processed is inadvertently observed.
Especially it is intended to suppression it is observed that in the case of the phenomenon of transparent electrode pattern, by the refractive index of the film of the present invention Control in the range of 1.50～1.70, in the range of preferably 1.52～1.70.For the control method of refractive index, except as above Beyond the described one-tenth controlling coating composition is grouped into, also can be realized by the control of film build method.
As the forming method of film, can the rubbing method generally implemented such as exemplary application hectographic printing by the coating of the present invention Compositionss coating film forming and method of making film on the electrode of touch screen.
<Touch screen>
Then, the touch screen of the film with the present invention is illustrated.
Fig. 1 and Fig. 2 is the figure of the structure of the touch screen that the present invention is described.Fig. 1 be pattern represent the structure of touch screen Top view.Fig. 2 is the sectional view of the A1-A1 ' line along Fig. 1.
As shown in figure 1, touch screen 1 is constituted with transparent substrate 2, in the transparent region of substrate 2, it is formed with transparency electrode Pattern.Specifically, have in the operating area of substrate 2 along Y-direction extend first transparency electrode 3 and prolong in X direction The second transparency electrode 4 stretched.First transparency electrode 3 and second transparency electrode 4 are by the same layer shape of the same face being arranged at substrate 2 Become.
Substrate 2 glass, acrylic resin, polyester resin, pet resin, polycarbonate resin Fat, polyvinylidene chloride resin, plexiglass, PEN resin, triacetyl cellulose tree The transparent materials such as fat are constituted.Particularly preferably select that there is the thermostability of the formation being suitable for film 5 and the material of chemical resistance Material.In the case of glass, the thickness for example, 0.1mm～2mm of substrate 2 about, in the case of resin film, substrate 2 For example, 10 μm～2000 μm about of thickness.
In Fig. 1, first transparency electrode 3 and second transparency electrode 4 are respectively using multiple cushion part (パ ッ De portion) 21 as being constituted Key element.Each cushion part 21 is configured to separate in the plane respectively, and the gap between each cushion part 21 reduces.That is, in X-direction Upper cushion part 21 arranged in columns and cushion part 21 arranged in columns in the Y-axis direction are configured at whole operation region, so that they that The region that this intersects is little as much as possible.Cushion part 21 can be for example the polygonal shapes such as rhombus, rectangle and hexagon, their examples As offset one from another or being configured to series-like.The radical separating the electrode of (interval) is also not necessarily limited to the example of Fig. 1, can be according to behaviour Make the size in region and the precision of required detection position to determine.
The first transparency electrode 3 that connect multiple cushion part 21 and constitute and second transparency electrode 4 be formed at be equivalent to tactile Touch the position of the operating area of screen 1.First transparency electrode 3 is arranged along X-direction and is separated into multiple regions, detection X-direction Coordinate.Second transparency electrode 4 is arranged along Y-direction and is separated into multiple regions, the coordinate of detection Y-direction.By using this Structure, can improve the precision of touch location detection.
First transparency electrode 3 and second transparency electrode 4 can use at least to the absorbance height of visible ray, have electric conductivity Transparent electrode material being formed.As this transparent electrode material with electric conductivity, such as ITO (tin indium oxide can be enumerated (Indium Tin Oxide)), IZO (indium zinc oxide (Indium Zinc Oxide)) or ZnO (zinc oxide) etc..Using ITO's In the case of, in order to can ensure that enough electric conductivity, thickness preferably 10nm～200nm.
First transparency electrode 3 and second transparency electrode 4 are for example formed as described below.
First, by the material in view of the substrate 2 as substrate from sputtering method, vacuum vapour deposition, ion plating method, spray The method selecting in mist method, infusion process or CVD etc. is forming nesa coating.Then, transparent led to above-mentioned with photoetching technique Electrolemma carries out pattern and is formed.In addition it is also possible to be dispersed in organic solvent using electroconductive stuffing being made up of above-mentioned material etc. Obtained by coating, desired pattern is formed by print process.
In the formation process of transparency electrode, preferably can be with good precision controlling thickness.Therefore, when being formed, preferably It is the method selecting to enable desired thickness, the excellent low-resistance film of the transparency can be formed.
As depicted in figs. 1 and 2, first transparency electrode 3 and second transparency electrode 4 are formed on the same face of substrate 2, become Same layer.Therefore, first transparency electrode 3 and second transparency electrode 4 are intersected in many places, form cross part 18.
In the present invention, the side in cross part 18, first transparency electrode 3 and second transparency electrode 4 is separated, so that It is not contacted with the opposing party.That is, as shown in Fig. 2 arbitrary place in multiple cross parts 18, second transparency electrode 4 is connected, and the One transparency electrode 3 separates.And, in order to couple together the separation position of first transparency electrode 3, it is provided with bridging electrode 20.It is provided with the interlayer dielectric 19 being made up of insulating properties material between bridging electrode 20 and second transparency electrode 4.Hereinafter, See figures.1.and.2 and illustrated in more detail.
As shown in Fig. 2 the interlayer dielectric 19 of light transmission is formed with the second transparency electrode 4 at cross part 18.Layer Between dielectric film 19 formed with organic materials such as photosensitive acrylics.In the case of photosensitive acrylics, utilize Photoetching process makes the structure being only formed with acrylic film in the second transparency electrode 4 at cross part 18.SiO can also be used2 Etc. inorganic material.Using SiO2In the case of, for example can form same structure by using the sputtering method of mask.Consider In the case of patternability, interlayer dielectric 19 preferably uses acrylic film.
The upper strata of interlayer dielectric 19 is provided with bridging electrode 20.Bridging electrode 20 will be separated at cross part 18 First transparency electrode 3 be electrically connected to each other, preferably formed by the material of light transmission.By arranging bridging electrode 20, can be by First transparency electrode 3 electrically connects in the Y direction.
As shown in figure 1, first transparency electrode 3 and second transparency electrode 4 are longitudinal or horizontal by the cushion part 21 of multiple rhombuses Shape to arrangement.In second transparency electrode 4, it is than the Pedicellus et Pericarpium Trapae of second transparency electrode 4 positioned at the coupling part of cross part 18 The narrower shape of the width of the cushion part 21 of shape.Bridging electrode 20 is also the shape more narrower than the width of the cushion part 21 of rhombus, Be formed as rectangle.
As depicted in figs. 1 and 2, in the touch screen 1 of the present invention, first transparency electrode 3 and second transparency electrode 4 are formed There is the film 5 of the invention described above as protecting film.And, its coating operating area being equivalent to touch screen 1 partly in The forming region of transparency electrode and non-formation region.The hardness of film 5 is high, with the first transparency electrode 3 being made up of inorganic material Excellent adhesion with second transparency electrode 4.
The film 5 of the present invention is formed with the coating composition of the invention described above.Specifically, using by above-mentioned formula (I) and The metal alkoxide that formula (II) represents in the presence of aluminium salt in organic solvent hydrolytic condensation so that add anti-precipitation agent and obtain Coating composition.
In touch screen 1, the refractive index and film thickness of optional film 5, so that first transparency electrode 3 and second transparency electrode 4 Each transparent electrode pattern unobtrusively.Specifically, the refractive index of film 5 is preferably in the model more than 1.50 and below 1.70 In enclosing, thickness is preferably in the range of 40nm～170nm.In the case that the refractive index of film 5 is more than 1.50 and is less than 1.60, Thickness is more preferably in the range of 60nm～150nm.Situation in the refractive index of film 5 less than 1.70 scope more than 1.60 Under, thickness is more preferably in the range of 40nm～170nm.
In touch screen 1, for example film 5 is formed by the coating composition containing silicon alkoxide and Titanium alkoxides, and refractive index is 1.52, Thickness is 100nm.
As shown in Fig. 2 in touch screen 1, by the face of first transparency electrode 3 grade and the observation side of display screen 10 will be formed with The superiors overlap across the adhesive linkage 9 using acrylic compounds light-cured resin etc., can be made into a display device.Here, Adhesive linkage 9 is arranged on film 5.
Above-mentioned display device has touch screen 1 and display screen 10, can have backlight as needed.Although saving in Fig. 2 Omit detailed description, but display screen 10 can be using the structure same with known display device.For example, it is liquid crystal indicator In the case of, display screen 10 can be using the structure clipping liquid crystal layer between two pieces of transparency carriers.Each transparency carrier with The opposition side of the side of liquid crystal layer contact can be respectively provided with polaroid.Additionally, on each transparency carrier, in order to control liquid crystal State, can form segment electrode or common electrode.And, liquid crystal layer is sealed by each transparency carrier and encapsulant.
As shown in figure 1, in touch screen 1, being respectively arranged with end in the end of first transparency electrode 3 and second transparency electrode 4 Sub (not shown), draws many wiring leads 11 from this terminal.Wiring lead 11 can be using silver, aluminum, chromium, copper or molybdenum or Person Mo-Nb (molybdenum-niobium) alloy etc. contains the opaque metal wiring of the alloy of these metals etc..Wiring lead 11 is saturating with to first The control circuit of prescribed electrode 3 and second transparency electrode 4 applied voltage, detection touch location is (not shown) to be connected.
Have in the touch screen 1 of above composition, electricity is applied successively to multiple first transparency electrodes 3 and second transparency electrode 4 Pressure, gives electric charge.If certain in the finger touch operation region as electric conductor, pass through finger tip and first transparency electrode Capacitance Coupled between 3 and second transparency electrode 4 and form electric capacity.Therefore, by the electric charge of the contact position of seizure finger tip Change, can detect whether finger touches certain.
Additionally, touch screen 1 can also be by the control of control circuit (not shown) come optionally to first transparency electrode 3 With either one applied voltage in second transparency electrode 4.Now, the transparency electrode be applied with voltage forms electric field, if Finger etc. touches in this condition, then contact position is grounded by the electric capacity of human body.As a result, as the first of object There is the change of resistance value in the terminal (not shown) of transparency electrode 3 or second transparency electrode 4 and contact position between.This resistance value The distance of the terminal of the first transparency electrode 3 to contact position with as object or second transparency electrode 4 is proportional, therefore passes through Detected with control circuit between first transparency electrode 3 or the terminal of second transparency electrode 4 in contact position with as object The current value of flowing, can obtain the coordinate of contact position.
In the touch screen 1 of the present invention, by being arranged at the effect of the film 5 in first transparency electrode 3 and second transparency electrode 4 Really, in operating area, the obvious phenomenon of transparent electrode pattern is inhibited.
Then, the manufacture method of the touch screen 1 of the present invention is illustrated.
Fig. 3 (a)～(d) is the operation sectional view of the manufacture method of the touch screen of the first case representing the present invention.
First, the transparent substrates 2 such as glass substrate are prepared.Substrate 2 cuts into desired shape as needed, cleaning.Connect , form nesa coating in the one side of substrate 2.Between substrate 2 and nesa coating sometimes also formed SiOx, SiNx, The intermediate layers such as SiON.Nesa coating is, for example, ITO, with sputtering method or vacuum vapour deposition etc. with the thickness film forming of 10～200nm. Then, the etching mask being made up of photoresist etc. in the upper layer side formation of nesa coating, leads to transparent in this condition Electrolemma is etched, and carries out pattern to first transparency electrode 3 and second transparency electrode 4 and is formed.By removing etching mask, thus Obtaining the formation shown in Fig. 3 (a) has the transparent conductive film substrate 14 of transparent electrode pattern.
Here, in the cross part 18 of transparent conductive film substrate 14, second transparency electrode 4 is passed through coupling part and is connected, and the One transparency electrode 3 is separated.
Then, exposed after being provided with the side photosensitive resin coating of first transparency electrode 3 and second transparency electrode 4 Photodevelopment, thus form interlayer dielectric 19 (Fig. 3 (b)) in the coupling part of second transparency electrode 4.As for forming interlayer The photoresist of dielectric film 19, using the resin with the transparency.Acrylic resin etc. for example can be used.Use SiO2Cambium layer Between in the case of dielectric film 19, by using the sputtering method of mask, can be made into same structure.But it is contemplated that pattern is formed In the case of property, preferably use acrylic resin.
Then, after interlayer dielectric 19 forming nesa coating, formed by photosensitive on the surface of this nesa coating Property resin constitute etching mask, in this condition nesa coating is etched.Then, remove etching mask, in interlayer The upper strata of dielectric film 19 forms bridging electrode 20, so that the segregated portion of first transparency electrode 3 connects.Thereby, Fig. 3 can be obtained Structure shown in (c).As the nesa coating being formed on interlayer dielectric 19, such as ito film can be enumerated.Now, bridging Electrode 20 is formed by ITO.
For above-mentioned wiring lead 11, formed with silver-colored ink etc. in subsequent handling.But, by above-mentioned operation to transparent It is also possible to remain transparent leading respectively along the outer peripheral edge of first transparency electrode 3 and second transparency electrode 4 when conducting film is etched Electrolemma, thus form wiring lead 11.
Then, hectographic printing coating metal is passed through on first transparency electrode 3, second transparency electrode 4 and bridging electrode 20 The coating composition that oxide skin(coating) is formed.Here, coating composition is depositing in slaine (such as aluminium salt) by metal alkoxide Under in organic solvent hydrolytic condensation so that add anti-precipitation agent and obtain.Then, the film of coating composition will be formed with Substrate 2 in the such as heating plate of 40～150 DEG C (such as 60 DEG C) be dried.Then, at 100～300 DEG C (such as 250 DEG C) Such as in baking oven heating, forms metal oxide layer 5 on first transparency electrode 3, second transparency electrode 4 and bridging electrode 20. Thereby, the touch screen base plate 30 shown in Fig. 3 (d) can be obtained.Film on substrate 2 can also be dried in such as heating plate Afterwards, to this film irradiation ultraviolet radiation, then heat in baking oven.
, using inorganic, metal oxide as main component, hardness is high, has height for the film 5 of the present invention obtaining as mentioned above Intensity.And, even on the interlayer dielectric 19 as organic membrane, also will not ftracture in inside.
Then, the silver-colored ink etc. (not shown) of the terminal from first transparency electrode 3 and the end of second transparency electrode 4 is formed Wiring lead 11, makes touch screen 1.Touch screen 1 is connected with the control circuit (not shown) of touch screen by wiring lead 11.
Prepared touch screen 1 is installed in the front surface of display screen 10 across the adhesive linkages such as acrylic compounds transparent adhesive 9. Now, as needed alignment mark is set on the angle of substrate 2 and display screen 10, is alignd.
It is installed in the touch screen 1 of display screen 10, by arranging film 5, enable high reliability.And, can be suppressed The obvious phenomenon in the operating area of touch screen 1 of the transparent electrode pattern of one transparency electrode 3 and second transparency electrode 4.
Fig. 4 is the sectional view of the brief configuration of another of the touch screen representing the present invention.As shown in figure 4, touch screen 101 There is transparent substrate 102.It is formed with transparent electrode pattern in the operating area of substrate 102.That is, set on the upper strata of substrate 102 It is equipped with the first transparency electrode 103 of position and the second transparency electrode 104 for detecting two different directions respectively.
First transparency electrode 103 and second transparency electrode 104 can use at least to the absorbance height of visible ray, have and lead Electrical transparent electrode material is forming.As this transparent electrode material with electric conductivity, such as ITO or ZnO can be used Deng.In the case of ITO, in order to can ensure that enough electric conductivity, thickness preferably 10～200nm.
First transparency electrode 103 and second transparency electrode 104 are considered as the transparent substrate 102 of substrate and following Protective coating 107 and from sputtering method, vacuum vapour deposition, ion plating method, nebulization, infusion process or CVD etc. select optimal Method is forming.
For example there is the method that pattern formation is carried out by etching method to the transparency electrode being formed as planar using photoetching technique, Or using electroconductive stuffing being made up of above-mentioned material etc. be dispersed in organic solvent obtained by coating, by print process direct Form method of desired pattern etc..It is therefore desirable to good precision controlling thickness in the formation process of transparency electrode.Therefore, When being formed, preferably selection enables desired thickness, the method that can form the excellent low-resistance film of the transparency.
As shown in figure 4, first transparency electrode 103 configures on substrate 102.And, first transparency electrode 103 is formed There is the film 105 of the present invention.Film 105 is formed with the coating composition of the invention described above.And, film 105 is coated to and is equivalent to The operating area of touch screen 101 partly in the forming region of first transparency electrode 103 and non-formation region.
Protective coating 107 is provided with film 105.Protective coating 107 is to be formed by the high acrylic resin of the transparency , the film being made up of organic material.
As shown in figure 4, second transparency electrode 104 configures in protective coating 107.Second transparency electrode 104 is formed There is the film 106 of the present invention.Film 106 is formed with the coating composition of the invention described above.And, film 106 is coated to and is equivalent to The operating area of touch screen 101 partly in the forming region of transparency electrode and non-formation region.The hardness of film 105,106 Height, the excellent adhesion with first transparency electrode 103 and second transparency electrode 104.And, although the film 106 of the present invention with Inorganic, metal oxide is as main component, but will not ftracture in protective coating 107.That is, even if film 106 is with coating The second transparency electrode 104 and coating mode as the protective coating 107 of the film being made up of organic material is formed, inside is not yet Can ftracture.
In touch screen 101, the refractive index and film thickness of optional film 105,106, so that first transparency electrode 103 and second Each transparent electrode pattern of transparency electrode 104 is unobtrusively.Specifically, the refractive index of film 105,106 is preferably being more than 1.50 and the scope below 1.70 in, thickness be preferably in the range of 40nm～170nm.The refractive index of film 105,106 More than 1.50 and less than in the case of 1.60, thickness is more preferably in the range of 60nm～150nm.The refraction of film 105,106 In the case of in rate less than 1.70 scope more than 1.60, thickness is more preferably in the range of 40nm～170nm.
In touch screen 101, such as first transparency electrode 103 and second transparency electrode 104 are respectively by the ITO structure of thickness 28nm Become.Now, film 105,106 is formed by the coating composition of the present invention containing silicon alkoxide and Titanium alkoxides respectively, and refractive index is 1.52, thickness is 100nm.
As shown in figure 4, the adhesive linkage 108 being made up of acrylic compounds transparent adhesive is provided with film 106.Touch screen 101 are installed in display screen 110 across this adhesive linkage 108.
Have in the touch screen 101 of above composition, if certain in the finger touch operation region as electric conductor, Electric capacity is formed by the Capacitance Coupled between finger tip and first transparency electrode 103 and second transparency electrode 104.Therefore, pass through Catch the change of the electric charge of contact position of finger tip, can detect whether finger touches certain.
In touch screen 101, by the film 105,106 being arranged in first transparency electrode 103 and second transparency electrode 104 Effect, enable high reliability.And, also can suppress the obvious phenomenon of transparent electrode pattern in operating area.
Fig. 5 and Fig. 6 is the figure of the structure of another example of the touch screen representing the present invention.Fig. 5 be pattern represent the present invention The structure of another example of touch screen top view.Fig. 6 is the sectional view of the B1-B1 ' line along Fig. 5.
As shown in figure 5, touch screen 201 is constituted with transparent substrate 202, it is formed with the transparent region of substrate 202 Prescribed electrode pattern.That is, have the one side being formed at substrate 202 the first transparency electrode 203 of the coordinate for detecting X-direction, And it is formed at the second transparency electrode 204 of the coordinate for detecting Y-direction of the another side of substrate 202.In the following description, The one side of substrate 202 is top, and the another side of substrate 202 is lower section.And, now, the another side of substrate 202 is to install display The face of the side of screen 210.
Substrate 202 is dielectric base plate.As the material of substrate 202, using glass, acrylic resin, polyester resin, gather Ethylene glycol terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, plexiglass, poly- naphthalene The transparent materials such as naphthalate resin, triacetyl cellulose resin.Particularly preferably select to have to be suitable for the present invention's The thermostability of formation of film 205,206 and the material of chemical resistance.As the thickness of substrate 202, if glass, then May be about 0.1mm～2mm, if resin film, then can be 10 μm～2000 μm.
As shown in figure 5, first transparency electrode 203 and second transparency electrode 204 are respectively by elongated rectangular electrode structure Become.First transparency electrode 203 extends along the Y direction, and second transparency electrode 204 extends along the X direction, respectively with strip with certain Interval arrange.First transparency electrode 203 and second transparency electrode 204 are arranged in the way of orthogonal, and overall is in clathrate.
First transparency electrode 203 and second transparency electrode 204 can use at least to the absorbance height of visible ray, have and lead Electrical transparent electrode material is forming.As this transparent electrode material with electric conductivity, such as ITO or ZnO can be used Deng.In the case of ITO, in order to can ensure that enough electric conductivity, thickness preferably 10～200nm.
First transparency electrode 203 and second transparency electrode 204 consider transparent substrate 202 as substrate and from sputtering Optimal method is selected to be formed in method, vacuum vapour deposition, ion plating method, nebulization, infusion process or CVD etc..
For example there is the method that pattern formation is carried out by etching method to the transparency electrode being formed as planar using photoetching technique, Or using electroconductive stuffing being made up of above-mentioned material etc. be dispersed in organic solvent obtained by coating, by print process direct Form method of desired pattern etc..It is important that can be with good precision controlling thickness in the formation process of transparency electrode.Cause This, when being formed, preferably selection enables desired thickness, the method that can form the excellent low-resistance film of the transparency.
As shown in Figure 5 and Figure 6, film 205 is formed with first transparency electrode 203.Film 205 is coated to and is equivalent to touch Screen 201 operating area partly in the forming region of transparency electrode and non-formation region.Additionally, as shown in fig. 6, second In transparency electrode 204, (in figure is in downside) is also formed with film 206.Film 206 is coated to the operating space being equivalent to touch screen 201 Domain partly in the forming region of transparency electrode and non-formation region.The hardness of film 205,206 is high, with first transparency electrode 203 and the excellent adhesion of second transparency electrode 204.
Film 205,206 is formed with the coating composition of the invention described above, and this coating composition is in aluminum by metal alkoxide In the presence of salt in organic solvent hydrolytic condensation so that add anti-precipitation agent and obtain.
In touch screen 201, the refractive index and film thickness of optional film 204,205, so that first transparency electrode 203 and second Each transparent electrode pattern of transparency electrode 204 is unobtrusively.Specifically, the refractive index of film 205,206 is preferably respectively big In scope in 1.50 and below 1.70, thickness is preferably respectively in the range of 40nm～170nm.Film 205,206 In the case that refractive index is more than 1.50 and is less than 1.60, thickness is more preferably in the range of 60nm～150nm.Film 205,206 Refractive index less than 1.70 scope more than 1.60 in the case of, thickness is more preferably in the range of 40nm～170nm.
In touch screen 201, such as first transparency electrode 203 and second transparency electrode 204 are respectively by the ITO structure of thickness 28nm Become.Now, film 205,206 is formed by with the coating composition of silicon alkoxide and Titanium alkoxides preparation respectively, and refractive index is 1.52, film Thick is 100nm.
As shown in fig. 6, the adhesive linkage 208 being made up of acrylic compounds transparent adhesive is provided with the one side of substrate 202. The coverlay 207 being made up of transparent resin is bonded with adhesive linkage 208.Coverlay 207 is eliminated in Fig. 5.
Coverlay 207 plays the effect of the protecting film of first transparency electrode 203 and film 205.Transparent tree can also be coated with Fat is replacing coverlay 207.At this point it is possible to not need adhesive linkage 208.
The another side of substrate 202 is provided with display across the adhesive linkage 209 being made up of acrylic compounds transparent adhesive Screen 110.
Although eliminating detailed description in Fig. 6, but display screen 210 can be using the knot same with known display device Structure.For example, in the case of being liquid crystal indicator, display screen 210 can adopt and clip liquid crystal layer between two pieces of transparency carriers Structure.The opposition side of the side contacting with liquid crystal layer in each transparency carrier can be respectively provided with polaroid.Additionally, each On bright substrate, in order to control the state of liquid crystal, segment electrode or common electrode can be formed.And, liquid crystal layer is by each transparency carrier With encapsulant sealing.
In touch screen 201, it is respectively arranged with terminal in the end of first transparency electrode 3 and second transparency electrode 4 and (does not scheme Show), draw many wiring leads (not shown) from this terminal.Wiring lead can be using silver, aluminum, chromium, copper or to comprise them Alloy etc. opaque metal wiring.Wiring lead with electricity is applied to first transparency electrode 203 and second transparency electrode 204 Pressure, the control circuit connection (not shown) of detection touch location.
Have in the touch screen 201 of above composition, if certain in the finger touch operation region as electric conductor, Electric capacity is formed by the Capacitance Coupled between finger tip and first transparency electrode 203 and second transparency electrode 204.Therefore, pass through Catch the change of the electric charge of contact position of finger tip, can detect whether finger touches certain.
In touch screen 201, by the film 205,206 being arranged in first transparency electrode 203 and second transparency electrode 204 Effect, in operating area, the obvious phenomenon of transparent electrode pattern is inhibited.
As described above, in the another example of the touch screen of present embodiment, and unlike above-mentioned example, it is not in layer insulation The structure of the film of the present invention is arranged on the organic membrane that film and protective coating etc. are made up of acrylic resin etc..The film of the present invention Example for such touch screen also can effectively act as the effect of the protecting film of the electrode of high intensity.And can prevent transparent The obvious phenomenon of electrode pattern.
More than, the touch screen of the present invention is illustrated, but the present invention is not limited to above-mentioned embodiment.For use Polytype touch screen of the transparency electrodes such as ITO, can be used the film of the present invention as protecting film in this transparency electrode.And And enable high reliability.And also can suppress the obvious phenomenon of transparency electrode.Now, set even if the film of the present invention is formed at It is placed on the various organic membrane in touch screen, inside also will not occur cracking etc..
Embodiment
Below by embodiment, the present invention will be described in more detail, but the present invention is not limited by these embodiments Fixed.
[abridging used in embodiment]
Used in embodiment etc., the implication of abbreviation is as described below.
TEOS：Tetraethoxysilane
C18：Octadecyltriethoxy silane
MPS：γ mercaptopropyitrimethoxy silane
GPS：γ-glycidoxypropyltrime,hoxysilane
UPS：γ-ureidopropyltriethoxysilane
APS：γ aminopropyltriethoxy silane
ACPS：γ-acryloxypropyl trimethoxy silane
MPMS：γ-methacryloxypropyl trimethoxy silane
MTES：MTES
TIPT：Tetraisopropoxy titanium
AN：Aluminum nitrate nonahydrate
EG：Ethylene glycol
HG：2- methyl -2,4-PD (another name：Hexanediol)
BCS：Butoxy ethanol (another name：Butyl cellosolve)
IPA：2- propanol
<Synthesis example 1>(synthesis of coating composition K1)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.6g, HG38.8g, BCS36.8g, TEOS21.7g, GPS10.6g, stir 30 minutes at ambient temperature, obtain A1 liquid.
Add the TIPT4.7g as Titanium alkoxides in the flask of 300mL capacity, be added to HG58.2g, in room temperature Under the conditions of stir 30 minutes, obtain A2 liquid.
Then, above-mentioned A1 liquid and A2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K1.
<Synthesis example 2>(synthesis of coating composition K2)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.7g, HG39.2g, BCS37.3g, TEOS21.7g, MPS8.8g, stir 30 minutes at ambient temperature, obtain B1 liquid.
Add the TIPT4.7g as Titanium alkoxides in the flask of 300mL capacity, be added to HG58.9g, in room temperature Under the conditions of stir 30 minutes, obtain B2 liquid.
Then, above-mentioned B1 liquid and B2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K2.
<Synthesis example 3>(synthesis of coating composition K3)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.6g, HG38.8g, BCS36.9g, TEOS21.7g, ACPS10.5g, stir 30 minutes at ambient temperature, obtain C1 liquid.
Add the TIPT4.7g as Titanium alkoxides in the flask of 300mL capacity, be added to HG58.2g, in room temperature Under the conditions of stir 30 minutes, obtain C2 liquid.
Then, above-mentioned C1 liquid and C2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K3.
<Synthesis example 4>(synthesis of coating composition K4)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.5g, HG38.6g, BCS36.7g, TEOS21.7g, MPMS11.1g, stir 30 minutes at ambient temperature, obtain D1 liquid.
Add TIPT4.7g, HG57.9g in 300mL flask, stir 30 minutes at ambient temperature, obtain D2 liquid.
Then, above-mentioned D1 liquid and D2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K4.
<Synthesis example 5>(synthesis of coating composition K5)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.9g, HG39.7g, BCS37.7g, TEOS15.5g, MTES13.3g, stir 30 minutes at ambient temperature, obtain E1 liquid.
Add TIPT4.7g, HG59.5g in 300mL flask, stir 30 minutes at ambient temperature, obtain E2 liquid.
Then, above-mentioned E1 liquid and E2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K5.
<Synthesis example 6>(synthesis of coating composition K6)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.4g, HG38.3g, BCS36.4g, TEOS21.7g, MPMS9.3g, C183.1g, stir 30 minutes at ambient temperature, obtain F1 liquid.
Add TIPT4.7g, HG57.4g in 300mL flask, stir 30 minutes at ambient temperature, obtain F2 liquid.
Then, above-mentioned F1 liquid and F2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K6.
<Synthesis example 7>(synthesis of coating composition K7)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.5g, HG38.6g, BCS36.7g, TEOS15.5g, APS1.7g, ACPS6.7g, GPS8.8g, stir 30 minutes at ambient temperature, obtain To G1 liquid.
Add TIPT4.7g, HG57.9g in 300mL flask, stir 30 minutes at ambient temperature, obtain G2 liquid.
Then, above-mentioned G1 liquid and G2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K7.
<Synthesis example 8>(synthesis of coating composition K8)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.5g, HG38.5g, BCS36.6g, TEOS15.5g, MPS1.5g, ACPS10.5g, UPS5.9g, stir 30 minutes at ambient temperature, Obtain H1 liquid.
Add TIPT4.7g, HG57.7g in 300mL flask, stir 30 minutes at ambient temperature, obtain H2 liquid.
Then, above-mentioned H1 liquid and H2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K8.
<Synthesis example 9>(synthesis of coating composition K9)
Add AN13.1g, water 3.1g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.3g, HG95.2g, BCS36.2g, TEOS16.3g, MPMS22.8g, stir 30 minutes at ambient temperature.Thereby obtain coating compositions Thing K9.
<Synthesis example 10>(synthesis of coating composition K10)
Add AN12.1g, water 2.8g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.5g, HG56.7g, BCS36.8g, TEOS13.7g, MPMS10.9g, stir 30 minutes at ambient temperature, obtain I1 liquid.
Add TIPT13.4g, HG40.1g in 300mL flask, stir 30 minutes at ambient temperature, obtain I2 liquid.
Then, above-mentioned I1 liquid and I2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K10.
<Synthesis example 11>(synthesis of coating composition K11)
Add AN11.8g, water 2.8g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.6g, HG44.8g, BCS36.8g, TEOS10.5g, MPMS10.3g, stir 30 minutes at ambient temperature, obtain J1 liquid.
Add TIPT17.4g, HG52.1g in 300mL flask, stir 30 minutes at ambient temperature, obtain J2 liquid.
Then, above-mentioned J1 liquid and J2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K11.
<Synthesis example 12>(synthesis of coating composition K12)
Add AN11.5g, water 2.7g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.6g, HG33.5g, BCS36.9g, TEOS7.2g, MPMS10.0g, stir 30 minutes at ambient temperature, obtain L1 liquid.
Add TIPT21.2g, HG63.6g in 300mL flask, stir 30 minutes at ambient temperature, obtain L2 liquid.
Then, above-mentioned L1 liquid and L2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K12.
<Synthesis example 13>(synthesis of coating composition K13)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.7g, HG39.1g, BCS37.1g, TEOS31.1g, stir 30 minutes at ambient temperature, obtain M1 liquid.
Add TIPT4.7g, HG58.6g in 300mL flask, stir 30 minutes at ambient temperature, obtain M2 liquid.
Then, above-mentioned M1 liquid and M2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K13.Coating composition K13 does not contain the metal alkoxide of the structure that above-mentioned logical formula (II) represents.
<Synthesis example 14>(synthesis of coating composition K14)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to EG13.7g, HG39.2g, BCS37.3g, TEOS28.0g, MTES2.7g, stir 30 minutes at ambient temperature, obtain N1 liquid.
Add TIPT4.7g, HG58.8g in 300mL flask, stir 30 minutes at ambient temperature, obtain N2 liquid.
Then, above-mentioned N1 liquid and N2 liquid are mixed, stir 30 minutes at ambient temperature.Thereby obtain coating composition K14.
Coating composition K13, compared with the coating composition K1～K12 of above-mentioned synthesis example 1～synthesis example 12, comprises only few The metal alkoxide of the structure that the above-mentioned logical formula (II) of amount represents.
<Synthesis example 15>(synthesis of coating composition K15)
Add AN12.7g, water 3.0g, stirring in 200mL flask, so that AN is dissolved.Be added thereto to IPA145.6g, TEOS15.5g, MPMS18.5g, TIPT4.7g, stir 30 minutes at ambient temperature.Thereby obtain coating composition K15.
<The evaluation of stability>
For the coating composition of above-mentioned synthesis example, using coating composition K1～K12 and K15 as embodiment 1～ Embodiment 12 and comparative example 1, carry out the evaluation of stability.
The evaluation methodology of stability is：Using the coating composition (K1～K12, K15) of synthesis, with 0.5 micron of aperture After membrane filter pressure filtration, place 1 week at ambient temperature.Then, silicon substrate (100) is upper pass through spin-coating film when, will be Do not observe in film on silicon substrate being evaluated as zero it will be observed that being evaluated as of foreign body of foreign body ×.Above-mentioned evaluation result is shown In table 1.
[table 1]
Embodiment Coating composition Estimation of stability
Embodiment 1 K1 ○
Embodiment 2 K2 ○
Embodiment 3 K3 ○
Embodiment 4 K4 ○
Embodiment 5 K5 ○
Embodiment 6 K6 ○
Embodiment 7 K7 ○
Embodiment 8 K8 ○
Embodiment 9 K9 ○
Embodiment 10 K10 ○
Embodiment 11 K11 ○
Embodiment 12 K12 ○
Comparative example 1 K15 ×
<The film build method I of film>
Using the coating composition of above-mentioned synthesis example, with 0.5 μm of the membrane filter pressure filtration in aperture, rotation is passed through on substrate Coating forms film.This substrate is heated 3 minutes in the heating plate be set as 60 DEG C and is dried.Then, using ultraviolet Irradiation unit (Eye Graphics company (ア イ グ ラ Off ィ ッ Network ス society) UB011-3A type processed), with high voltage mercury lamp (input electricity Source 1000W) with 50mW/cm2The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 2 minutes irradiates.Ultraviolet irradiation amount is 6000mJ/cm2.After ultraviolet irradiates, move in the heated air circulation type baking oven being set as 250 DEG C, burn till 30 minutes.Thus in base Film is formed on plate.
<The film build method II of film>
Using the coating composition of above-mentioned synthesis example, with 0.5 μm of the membrane filter pressure filtration in aperture, rotation is passed through on substrate Coating forms film.This substrate is heated 3 minutes in the heating plate be set as 60 DEG C and is dried.Then, move to and be set as In 250 DEG C of heated air circulation type baking oven, burn till 30 minutes.Film is thus formed on substrate.
More than, the method for the film forming the present embodiment with the coating composition of the present embodiment illustrates.Then, Evaluation to the film of the present embodiment illustrates.Now, using the coating composition K1～K8 of above-mentioned synthesis example, suitable By above-mentioned film build method I film forming on substrate, using the film being formed (KL1～KL8) as the film of the present invention embodiment 13～embodiment 20.In addition, using the coating composition K9～K12 of above-mentioned synthesis example, above-mentioned one-tenth is passed through on suitable substrate Film method II film forming, using the film being formed (KL9～KL12) as the film of the present invention embodiment 21～embodiment 24.This Outward, using the coating composition K13 of above-mentioned synthesis example, by above-mentioned film build method II film forming on suitable substrate, by institute's shape The film (KM2) becoming is as the comparative example 2 of film.
<The evaluation of refractive index>
Substrate uses silicon substrate (100).As described above, the enforcement by film build method I film forming is formed on this silicon substrate The film of example 13～embodiment 20, the film by the embodiment 21～24 of film build method II film forming, become by film build method II The comparative example 2 of film and the film of comparative example 3, carry out the evaluation of refractive index.Evaluation methodology is by using ellipsometer test (ditch buttocks Optics industry institute (buttocks optics work institute) company system, DVA-FLVW) measure refractive index at wavelength 633nm carrying out.
The evaluation result of each film is shown in table 2 below together with coating composition used in being formed with each film.
<Cracking is evaluated>
Form the acrylic film of 2 μm of thickness on the glass substrate.The formation of acrylic film proceeds as described below.First, will The membrane filter pressure filtration in 0.5 μm of aperture of acryhic material compositionss, passes through spin-coating method in the whole surface of glass substrate Form film.Then, by after this substrate on hot plate heat drying 2 minutes, move in heated air circulation type baking oven, burn till 30 points Clock.Thereby form acrylic film on the glass substrate.
Film build method I or film build method II is passed through on aforesaid propylene sorrel film is formed with the thickness of thickness 100nm.
In addition, the embodiment 13～reality by film build method I film forming is formed on the glass substrate be formed with acrylic film Apply the film of example 20, by the film of embodiment 21～24 of film build method II film forming, by the comparison of film build method II film forming The film of example 2, carries out the cracking evaluation of film.
Cracking evaluate evaluation criterion be, in the film on substrate, will not occur ftracture be evaluated as ◎, by face not Occur cracking and only edge occur cracking be evaluated as zero, by whole surface all occur ftracture be evaluated as ×.
Evaluate as a result, understanding compared with the film of comparative example 2, the film of embodiment 13～embodiment 24 is in cracking Generation aspect makes moderate progress.
[table 2]
Embodiment Film Coating composition Membrane formation process Refractive index is evaluated Cracking is evaluated
Embodiment 13 KL1 K1 I 1.51 ○
Embodiment 14 KL2 K2 I 1.51 ◎
Embodiment 15 KL3 K3 I 1.52 ◎
Embodiment 16 KL4 K4 I 1.52 ◎
Embodiment 17 KL5 K5 I 1.48 ○
Embodiment 18 KL6 K6 I 1.52 ◎
Embodiment 19 KL7 K7 I 1.52 ◎
Embodiment 20 KL8 K8 I 1.52 ◎
Embodiment 21 KL9 K9 II 1.49 ◎
Embodiment 22 KL10 K10 II 1.55 ○
Embodiment 23 KL11 K11 II 1.60 ○
Embodiment 24 KL12 K12 II 1.65 ○
Comparative example 2 KM2 K13 II 1.50 ×
<Transparent conductive film substrate>
Prepare the transparent conductive film substrate of nesa coating is formed with substrate, this nesa coating implemented pattern shape Become.Substrate uses glass substrate, and nesa coating uses ITO.As this transparent conductive film substrate, the invention described above can be used Transparent conductive film substrate 14 used in touch screen 1.Here, the thickness of ITO is 28nm.
<The manufacture of touch screen>
The thickness manufacturing in ITO is to be formed with embodiment with the thickness of 100nm on the above-mentioned transparent conductive film substrate of 28nm The substrate of 20 film KL8.Coated optical bonding agent on the substrate, the raw glass of laminating 0.7mm.Then, using ultraviolet Beam irradiating apparatus (Eye Graphics company (ア イ グ ラ Off ィ ッ Network ス society) UB011-3A type processed), with high voltage mercury lamp (input Power supply 1000W) with 50mW/cm2The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thereby make optics Bonding agent solidifies, and is made as the touch screen of the embodiment 25 of the touch screen of evaluating characteristics.
Then, in addition to the film KL10 using embodiment 22 as film replaces the KL8 of embodiment 20, by with Above-mentioned same manufacture method makes the touch screen of embodiment 26.Additionally, except the film using embodiment 23 as film Beyond KL11 is to replace the KL8 of embodiment 20, make the touch screen of embodiment 27 by manufacture method similar to the above.This Outward, in addition to the film KL12 using embodiment 24 as film replaces the KL8 of embodiment 20, by similar to the above Manufacture method makes the touch screen of embodiment 28.
Further, above-mentioned transparent conductive film substrate is used coating composition K12 pass through above-mentioned film build method I and forms film, Operate in the same manner as above-described embodiment 25 in addition, make the touch screen of embodiment 29.Pass through for coating composition K12 The film that film build method I is formed, is 1.70 by the refractive index that evaluation methodology similar to the above records.
Then, in order to for comparative evaluation, the film KM2 except using comparative example 2 as film replaces embodiment 20 KL8 beyond, make the touch screen of comparative example 3 by manufacture method similar to the above.Additionally, using above-mentioned nesa coating Substrate, does not form film, makes the touch screen of comparative example 4 in addition by manufacture method similar to the above.Therefore, compare In the touch screen evaluated of example 4, do not form film on the transparent electrodes.
<Electrode pattern observability is evaluated>
Carry out the evaluation of electrode pattern observability, i.e. the evaluation using embodiment 25～embodiment 29 and comparative example 3,4 is used Touch screen come the whether obvious evaluation of the electrode pattern to carry out ITO.
As evaluation methodology, each touch screen is placed on the cloth of black, irradiates light from top, in this condition with the naked eye Observed.Confirm in the touch screen of comparative example 4 to observe transparent electrode pattern, observe other touch screens on this basis. That these are observed as a result, invisible transparent electrode pattern is evaluated as ◎.Although in addition, transparent electrical pole figure will can be seen What case but its degree were made moderate progress compared with the touch screen of the comparative example 4 without film is evaluated as zero, by its degree with compare The touch screen of example 4 compare do not improve be evaluated as ×.
For the touch screen evaluated of embodiment 25～embodiment 29 and comparative example 3,4, electrode pattern observability is commented The result of valency is shown in table 3 in the lump.
[table 3]
Envelope Refractive index Electrode pattern observability
Embodiment 25 KL8 1.52 ○
Embodiment 26 KL10 1.55 ◎
Embodiment 27 KL11 1.60 ◎
Embodiment 28 KL12 1.65 ◎
Embodiment 29 KL13 1.70 ○
Comparative example 3 KM2 1.50 ×
Comparative example 4 - - -
Above evaluate as a result, as shown in Table 1, coating composition by containing metal nitrate and anti-precipitation agent, surely Qualitative raising.
As shown in Table 2, by suitably controlling the structure and composition of the metal alkoxide containing in coating composition, by this shape Even if the film becoming is formed as the stable film that also will not occur to ftracture on the organic film being made up of acrylic resin etc..
As shown in Table 3, by forming, on electrode, the film that refractive index is appropriately control, can press down in touch screen Electrode pattern observability processed.
The film of the present embodiment all shows the hardness of more than 5H, and this is with general organic crylic acid material less than 3H's It is considerably higher hardness that hardness is compared.
The probability utilizing in industry
The coating composition of the present invention can provide refractive index to obtain the film of the high intensity of control, using the touch of this film In screen, the pattern of electrode will not be obvious.Therefore, it can display device with being required excellent aesthetic property and high reliability Touch screen.
Quote the description of Japanese patent application 2011-010164, the power that on January 20th, 2011 files an application here The full content that sharp claim, drawing and description are made a summary is as the announcement of description of the invention.
The explanation of symbol
1st, 101,201 touch screen
2nd, 102,202 substrate
3rd, 103,203 first transparency electrode
4th, 104,204 second transparency electrode
5th, 6,105,106,205,206 film
9th, 108,208,209 adhesive linkage
10th, 110,210 display screen
11 wiring leads
14 transparent conductive film substrates
18 cross parts
19 interlayer dielectrics
20 bridging electrodes
21 cushion part
30 touch screen base plates
107 protective coatings
207 coverlays

Claims (11)

1. touch screen coating composition is it is characterised in that it is the figure for there being transparency electrode in the operating area of substrate The coating composition of film is formed at least a portion of the transparency electrode of the touch screen of case, represents containing following logical formula (I) Slaine that the second metal alkoxide that first metal alkoxide, following logical formula (II) represent, following logical formula (III) represent, You Jirong Agent, water, anti-precipitation agent；And second the content of metal alkoxide obtain with respect to being added the first metal alkoxide and the second metal alkoxide Whole metal alkoxides be 15～80 moles of %；
M1(OR1)n(I)
In formula, M1Represent selected from silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn) extremely A kind of few metal, R1Represent the alkyl of carbon number 1～5, n represents M1Valence mumber 2～5；
R2 lM2(OR3)m-l(II)
In formula, M2Represent selected from silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg) and zinc (Zn) extremely A kind of few metal；R2Represent by sulfydryl, methacryloxy, acryloxy or Carbamido substituted and can have miscellaneous former The alkyl of the carbon number 1～20 of son；R3Represent the alkyl of carbon number 1～5；M represents M2Valence mumber 2～5, l m valence mumber be 3 when be 1 Or 2, be 1～3 when the valence mumber of m is 4, be 1～4 when the valence mumber of m is 5；
M3(X)k(III)
In formula, M3Represent selected from aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce) at least one metal, X represents hydrochloric acid, nitric acid, sulphuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid or acetyl The residue of pyruvate or their basic salt, k represents M3Valence mumber.
2. touch screen coating composition as claimed in claim 1 is it is characterised in that anti-precipitation agent is selected from N- methyl-pyrrole Pyrrolidone, ethylene glycol, dimethylformamide, dimethyl acetylamide, diethylene glycol, propylene glycol, hexanediol and their derivant At least one more than.
3. touch screen coating composition as claimed in claim 1 or 2 it is characterised in that
The metallic atom M of slaine3Metallic atom M with the first metal alkoxide and the second metal alkoxide1And M2Mol ratio be
0.01≤M3/(M1+M2+M3)≤0.7.
4. touch screen coating composition as claimed in claim 1 it is characterised in that the first metal alkoxide be silicon alkoxide or its Partial condensate and the mixture of Titanium alkoxides.
5. touch screen coating composition as claimed in claim 1 it is characterised in that described slaine be metal nitrate, Metal sulfate, metal acetate, metal chloride, metal oxalate, metal aminosulfonate, metal sulfonate, metal second Acetoacetate, metal acetyl acetonate or their basic salt.
6. coating composition as claimed in claim 1 it is characterised in that described organic solvent comprise aklylene glycol class or its Monoether derivant.
7. film is it is characterised in that with the coating composition film forming of the touch screen any one of claim 1～6.
8. it is characterised in that refractive index is 1.52～1.70, thickness is 40nm～170nm to film as claimed in claim 7.
9. touch screen, it is the touch screen of the pattern being formed with transparency electrode in the operating area of substrate it is characterised in that inciting somebody to action Film described in claim 7 or 8 configures at least a portion of the pattern of described transparency electrode.
10. touch screen as claimed in claim 9 it is characterised in that
Described transparent electrode pattern has the first transparent electrode pattern and of the position for detecting at least two different directions Two transparent electrode patterns and constitute；
At least a portion of described first transparent electrode pattern and described second transparency electrode pattern is in the operating space of described substrate Overlapping in domain, and join between the described first transparent electrode pattern of part in this overlap and described second transparency electrode pattern It is equipped with the film being made up of organic material；
Described film is configured to be coated at least a portion of described first transparent electrode pattern or described second transparency electrode pattern, And at least a portion of the coating described film being made up of organic material.
11. touch screens as claimed in claim 10 are it is characterised in that described first transparent electrode pattern and described second transparent The lap of electrode pattern exists multiple in the operating area of described substrate, is each configured with these multiple laps The film being made up of organic material described in area is bigger than the area of described lap.
CN201280013782.1A 2011-01-20 2012-01-20 Coating composition for touch panels, coating film, and touch panel Active CN103443750B (en)

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