CN103398666B - A kind of dislocation of the interlayer for double-deck periodic micro structure method of testing - Google Patents
A kind of dislocation of the interlayer for double-deck periodic micro structure method of testing Download PDFInfo
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Abstract
For an interlayer dislocation method of testing for double-deck periodic micro structure, for testing the fault column pitch of double-layer grating structure
, comprise fault column pitch-diffraction light equation F fit procedure, measure fixed bed dislocation spacing
under the zero order diffracted light of grating pay close attention to parameter and obtain and pay close attention to the wavelength curve of parameter; Obtain fault column pitch value (δ 0, δ 1, the δ 2 of one group of equal difference discrete series definition further ...) corresponding to the wavelength curve group of concern parameter; Select in curve group with
change, pays close attention to the range of wavelengths FQ that Parameters variation is the most responsive, simulates the average layer dislocation spacing-diffraction light equation F2 in particular range of wavelengths; After obtaining F2, when measuring fault column pitch, use the narrow spectrum polarized light source be in FQ interval to measure the average concern parameter value of zero order diffracted light, double-deck fault column pitch to be measured can be drawn.
Description
Technical field
The invention belongs to optical engineering field, relate to a kind of interlayer for double-deck periodic micro structure dislocation method of testing.
Background technology
In semiconductor and other microelectronic industrys, sandwich construction is extensively used.In such an embodiment, no matter in plate-making, photoetching, still process in later chip, the test of interlayer dislocation is all very main, and the magnitude of interlayer dislocation is at micron, sub-micron even Nano grade.The method of micron level test has multiple, comprises image and non-image method.Wherein image method is the simplest, judges the distance between double-layer structure lines from the multiple of the image directly observed and amplification.But such method has the weakness of himself: first, need complicated equipment and test wrapper----electron microscope and vacuum environment; Secondly, the vibrations of the test platform impact on test is also larger, and especially the microelectric technique development such as modern semiconductors integrated circuit very soon, and line size is more and more less, more and more higher to the requirement of interlayer dislocation, the method adopting image viewing to realize test is also difficult to satisfy the demands in precision.
Test non-image is at present the main method realizing interlayer dislocation test, the method is also through development for many years, for convenience of measuring, usually on tested interlamellar spacing misplaces the two-ply that relates to, construct the periodicity grating of same period length, periodically grating is as shown in Fig. 1 to 2, arranged by 2 kinds of different light transmissive material cycle staggerings, by a parallel incident light being projected at a certain angle the sample surface with two-layer periodic structure, make it to reflect, diffraction, its intensity can be drawn by the analog computation of optical electric field, test in conjunction with spectrum can realize the test/analysis of some structural parameters.And zero order reflection spectral intensity misplaces relevant with interlayer, therefore can be used for realizing the test of interlayer dislocation.Various test based on this principle realizes, and as in US Patent No. Patent4757207, the people such as Chappelow have used a kind of non-diffraction method to achieve non-image test, can realize to cycle size and wavelength quite or smaller time test.Along with the size achieved by microelectric technique is more and more less, this method is also more and more difficult to practical requirement in precision etc.Take into full account diffraction effect, and the test/analytical approach combined with the strict analog computation of light wave electric field becomes main method.But the method for direct-detection is owing to lacking comparison and the calibration of the reflectivity (normalized reflection strength) of different magnitude of misalignment δ situation, therefore in US Patent No. Patent6699624, Niu etc. adopt the spectral intensity test macro of the plane of incidence in one-dimensional grating vertical plane of incident light, because this system just cannot distinguished, negative dislocation, they first make the anti-version of chip under test (or mask plate), then the grating corresponding with positive and negative version is made, by the compare test with tested grating, determine that interlayer misplaces, the method achieve the interlayer dislocation test of degree of precision.In US Patent No. Patent7289214B1, the method that Li etc. adopt space cone angle incident light to realize diffraction realizes the test of interlayer dislocation, optical system has no change, just change the angle of incident light, make the plane of incidence of light not in the plane vertical with grating, it makes the calculating of electric field more complicated, but such optical system just can realize aligning, the differentiation that misplaces between negative layer.Although measuring accuracy is slightly low compared with the method in the patent of Niu etc. as a rule, does not need to make anti-version, simplify test process.Bischoff etc. propose a new method in US Patent No. Patent6772084, and make in interlayer dislocation about 1/4 cycle, Zero-order diffractive increases the susceptibility that interlayer misplaces, and is conducive to the sensitivity improving test.Similar method is also described in " Anoveldiffractionbasedspectroscopicmethodforoverlaymetro logy, Proc.SPIEv5038, pp.200-207 " literary composition of Yang etc.
At present, these methods have all been widely applied in the application of engineering reality, but along with the development of SIC (semiconductor integrated circuit) and other microelectric techniques, more and more higher to the requirement of measuring accuracy.Therefore, seek new test, analytical approach, the needs meeting future technical advances are very important.
Summary of the invention
For overcoming the technological deficiency that conventional art exists, the invention discloses a kind of interlayer for double-deck periodic micro structure dislocation method of testing.
A kind of dislocation of the interlayer for double-deck periodic micro structure method of testing of the present invention, for testing the fault column pitch δ of double-layer grating structure, comprise fault column pitch-diffraction light equation F fit procedure, described fault column pitch-diffraction light equation model process comprises the steps:
Step 101. along certain angle double-decker surface incident to be measured, measures the concern parameter F of zero order diffracted light with the directional light of monochromatic polarization; Monochromatic polarized light frequency sweep exports, and obtains the wavelength curve of the concern parameter under fixed bed dislocation spacing δ;
Fault column pitch δ in the change step 101 of step 102. only equal difference, repeatedly repeats step 101, obtains one group of wavelength curve group F1 (λ, δ) by concern parameter F corresponding to the fault column pitch value δ of equal difference discrete series; Wherein λ is wavelength;
Step 103. is at curve group F1 (λ, select δ) to change with δ, pay close attention to the range of wavelengths FQ that Parameters variation is the most responsive, to the arbitrary fixed wave length be in FQ, the value of several concerns parameter F utilizing different layers dislocation spacing corresponding, simulates the function that the concern parameter under this wavelength changes with fault column pitch; Change wavelength and repeat matching, obtain the function F 2 (δ) that the concern parameter under each wavelength in FQ interval changes with fault column pitch;
The described dislocation of the interlayer for double-deck periodic micro structure method of testing is after obtaining F2 (δ), when measuring fault column pitch, use the incident double-decker to be measured of incident angle that any monochromatic polarized light edge be in FQ interval is same with step 101, measure the concern parameter of zero order diffracted light, according to concern parameter value and the wavelength value of correspondence, double-deck fault column pitch to be measured can be drawn.
Preferably, described concern parameter is the ellipsometric parameter in ellipsometric measurement, namely plane of incidence tangentially with amplitude, ao and/or the argument Ψ of the ratio of the Zero-order diffractive optical electric field of normal direction two polarization directions.
Preferably, the incident direction of described monochromatic polarized light is: θ=φ=45 degree, or θ=60 degree, φ=90 degree; θ is the angle between incident direction and the vertical direction of incidence surface, and φ is the angle that monochromatic diffraction light plane of incidence and grating periodic arrange between bearing of trend.
Preferably, in described step 101 to 102, to each fault column pitch, get positive and negative values respectively and measure, as the corresponding measured value of this fault column pitch after two values obtained are average.
Preferably, in described step 103 to suppose that F2 (δ) carries out matching for once linear or quadratic nonlinearity equation.
Preferably, in step 101, when measuring the concern parameter of zero order diffracted light, within the scope of the wavelength width of the Δ λ being wavelengths centered with tested wavelength, average to the concern parameter of zero order diffracted light, wherein Δ λ is the bandwidth of incident monochromatic polarized light.
Preferably, measurement mechanism is made up of spectroscopic ellipsometers and the data processor that is connected with spectroscopic ellipsometers.
A kind of dislocation of the interlayer for double-deck periodic micro structure method of testing, for testing the fault column pitch of two-dimension periodic grating, the same position of every Rotating fields all makes orthogonal two groups of one-dimensional gratings as graticule, adopt the method as described in front any one, by testing out the fault column pitch of the one-dimensional grating graticule of two mutually perpendicular directions, obtain the interlayer dislocation of two-dimensional grating structure in orthogonal both direction.
Adopt the interlayer for double-deck periodic micro structure of the present invention dislocation method of testing, by testing the correlation parameter of the optical diffraction ripple electric field of different polarization states, replace traditional test to light intensity, by testing the wave spectrum of different angles, different parameters, select the interlayer the most responsive space angle of dislocation and diffraction light parameter, in conjunction with the analog computation analysis to optical diffraction ripple electric field, realize high-precision interlayer dislocation test.
Accompanying drawing explanation
Fig. 1 illustrates interlayer misconstruction of the present invention and the incident coordinate system schematic diagram of measuring beam;
Fig. 2 illustrates fault column pitch correlation parameter schematic diagram of the present invention;
Fig. 3 illustrates all parts sequential schematic in the optical path of a kind of embodiment of the present invention;
Fig. 4 illustrates each bar curve waveform figure that the zero order diffracted light amplitude that embodiments of the invention 1 middle level dislocation spacing is different changes with lambda1-wavelength;
Fig. 5 illustrates each bar curve waveform figure that the zero order diffracted light argument that embodiments of the invention 1 middle level dislocation spacing is different changes with lambda1-wavelength;
Fig. 6 illustrates each bar curve waveform figure that the zero order diffracted light amplitude that embodiments of the invention 1 middle level dislocation spacing is different changes with lambda1-wavelength;
In each figure, Reference numeral name is called: 1. light source 2. polarizer 3. first rotatable phase compensator 4. second rotatable phase compensator 5. analyzer 6. receiving spectrum instrument 7. grating tunable wave filter.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in further detail.
A kind of dislocation of the interlayer for double-deck periodic micro structure method of testing of the present invention, for testing the fault column pitch δ of double-deck periodic structure, comprise fault column pitch-diffraction light equation F fit procedure, described fault column pitch-diffraction light equation model process comprises the steps:
Step 101. along certain angle double-decker surface incident to be measured, measures the concern parameter F of zero order diffracted light with the directional light of monochromatic polarization; Monochromatic polarized light frequency sweep exports, and obtains the wavelength curve of the concern parameter under fixed bed dislocation spacing δ;
Fault column pitch δ in the change step 101 of step 102. only equal difference, repeatedly repeats step 101, obtains one group of wavelength curve group F1 (λ, δ) by concern parameter F corresponding to the fault column pitch value δ of equal difference discrete series;
Step 103. is at curve group F1 (λ, select δ) to change with δ, pay close attention to the range of wavelengths FQ that Parameters variation is the most responsive, to the arbitrary fixed wave length be in FQ, the value of several concerns parameter F utilizing different layers dislocation spacing corresponding, simulates the function that the concern parameter under this wavelength changes with fault column pitch; Change wavelength and repeat matching, obtain the function F 2 (δ) that the concern parameter under each wavelength in FQ interval changes with fault column pitch;
The described dislocation of the interlayer for double-deck periodic micro structure method of testing is after obtaining F2 (δ), when measuring fault column pitch, use the incident double-decker to be measured of incident angle that any monochromatic polarized light edge be in FQ interval is same with step 101, measure the concern parameter of zero order diffracted light, according to concern parameter value and the wavelength value of correspondence, double-deck fault column pitch to be measured can be drawn.
To different fault column pitch, the correlation parameter of its zero order diffracted light is different with the Changing Pattern of lambda1-wavelength, substantially the thought that realizes of the present invention is at double layer surface by monochromatic polarized light oblique fire, to different fault column pitch, measure the Changing Pattern of zero order diffracted light correlation parameter with lambda1-wavelength, subsequently to each wavelength, simulate the fault column pitch-diffraction light equation F2 (δ) under this wavelength, subsequently to random layer dislocation spacing, only need incident identical, i.e. optical wavelength, frequency, polarization state, the monochromatic polarized light that incident angle etc. are all identical, measure the correlation parameter of its zero order diffracted light, equation F2 (δ) can be brought into and draw fault column pitch, described equation F2 (δ) for use record under fixed wave length, multiple data points of the different diffraction optical parameter that different layers dislocation spacing is corresponding are carried out mathematical method matching and are drawn.Diffraction light parameter should be selected with the range of wavelengths FQ of fault column pitch sensitive, realize high measurement accuracy.
The wavelength curve of the concern parameter under fault column pitch δ is fixed in step 101; In step 102, modification layer dislocation spacing, repeatedly repeats step 101, by the wavelength curve group F1 (λ, δ) of concern parameter F corresponding to the fault column pitch value δ of equal difference discrete series; Select wavelength sensitive interval in step 103 and simulate equation F2 (δ).
Step 101 preferably can adopt software simulation, to reduce experimental cost.Before simulation, usually obtained the nk table of the various materials forming grating by test or additive method, namely the curve that changes with wavelength X of complex index, based on the nk of various material table, utilizes analogue to simulate.
In step 101 is to 102, to each fault column pitch, get positive and negative values respectively and measure, as the corresponding measured value of this fault column pitch after two values obtained are average.To reduce measuring error, for changing direction easily to fault column pitch, when testing, the test platform placing sample can be horizontally rotated 180 degree, can realize.
After simulating equation F corresponding to each wavelength, when measuring fault column pitch, re-use the incident double-decker to be measured of any monochromatic polarized light in the FQ interval incident angle same with step 101, measure the concern parameter of zero order diffracted light, double-deck fault column pitch to be measured can be drawn.Paying close attention to the intensity that parameter can be zero order diffracted light, also can be the ellipsometric parameter in ellipsometric measurement, the amplitude, ao of the such as ratio of two kinds of incident light reflectance of different polarization states or argument Ψ.
First suppose in fit procedure that F2 (δ) equation is the continuity or the noncontinuity equation that possess certain forms, preferably suppose in the present invention that F2 (δ) equation is continuity equation in FQ interval, in a step 102 to fixed wave length, after obtaining the point set of the Zero-order diffractive optical parameter-fault column pitch comprising multiple correspondence, by the undetermined coefficient in adjustment F2 (δ) equation, make the difference of this F equation and point set minimum.F2 (δ) the Representation Equation can be linear function W=P δ+a or quadratic nonlinearity function W=Q δ by generally fault column pitch δ very little (in several to dozens of nanometer scale, much smaller than optical wavelength)
2+ P δ+a, to reduce calculated amount.Wherein W is Zero-order diffractive optical parameter, and Q, P and a are coefficient undetermined, in follow-up fit procedure, according to multiple (W, δ) point, simulates the occurrence of P, a or Q, P, a.
Be the double-decker of formation interlayer of the present invention dislocation as shown in fig. 1, the One Dimension Periodic structure fringe that between two-layer time, tangible shape is identical.Incident light incides on grating from light source at a certain angle, obtains diffraction light.Specular light (i.e. zero order light reflected), non-secular reflected light (i.e. +/-n level reflected light is included in diffraction light, n>0), specular transmission light (i.e. zero level transmitted light), non-specular surface transmitted light (i.e. +/-n level transmitted light, n>0).For convenience of describing, set up three-dimensional cartesian coordinate system in FIG, x-axis is as periodicity grating bearing of trend, and perpendicular to grid stroke, y-axis is parallel to grid stroke, and z-axis is perpendicular to each layer surface.Periodically parallel gratings is in x-y plane.
Fig. 2 is the sectional view of double-deck One Dimension Periodic grating, and between this grating layer, dislocation is of a size of δ.In Fig. 2, upper and lower layer grating defines first and second layer respectively, and in every layer, the first material width is defined as dutycycle with the ratio in whole cycle, and first and second layer of dutycycle is respectively: f
1, f
2.Two-layer grating thickness is respectively d
1, d
2.Two screen periods are Λ, and the refractive index of base material is n
s.According to these Grating Properties, analytical calculation is carried out to the parameter of zero order diffracted light.
For being described clearly, regulation upper strata is relative to lower floor along the dislocation of x-axis forward, and namely in Fig. 2, right direction has misplaced δ, then δ be on the occasion of; If negative value, then misplace along x-axis left direction.
In aforesaid step 101 is to 102, to each fault column pitch, get positive and negative values respectively and measure, as the corresponding measured value of this fault column pitch after two values obtained are average.To reduce measuring error, for changing direction easily to fault column pitch, when testing, the test platform placing sample can be horizontally rotated 180 degree, can realize.
In step 101, when measuring the concern parameter of zero order diffracted light, in the wavelength coverage of a Δ λ centered by tested wavelength, average to the concern parameter of zero order diffracted light, wherein Δ λ is the bandwidth of incident monochromatic polarized light.
Fig. 3 illustrates and utilizes spectroscopic ellipsometers to carry out the light path principle schematic diagram measured, measurement mechanism is made up of spectroscopic ellipsometers and the data processor that is connected with spectroscopic ellipsometers, comprises light source 1, grating tunable wave filter 7, the polarizer 2, first rotatable phase compensator 3, second rotatable phase compensator 4, analyzer 5 and receiving spectrum instrument 6 and form in spectroscopic ellipsometers.
As shown in Figure 3, light source 1 luminescence becomes the monochromatic light of single-frequency after grating tunable wave filter, polarized light is become by the polarizer 2, first rotatable phase compensator 3 is for carrying out phase compensation to obtain the specific polarization light needed to polarized light, monochromatic polarized light after compensation is incident on double-decker surface, on the diffraction path of zero order diffracted light, second rotatable phase compensator 4 pairs reflective phase adjusts, detected by analyzer 5, receiving spectrum instrument 6, by detecting the light intensity of different angles, indirectly measure parameter Δ and ψ.
For the double-deck periodic structure (grating) shown in Fig. 2, between this grating layer, dislocation is of a size of δ.In Fig. 2, grating layer dielectric is silicon dioxide (SiO2) grid stroke and polysilicon (Poly-Si) interval, and their dutycycles are 6:4, and namely silicon dioxide grid stroke accounts for the ratio of length of periodicity is 60%, and thickness is d
2=300nm.Upper strata grating is air (Air) and polysilicon (Poly-Si), and their dutycycles are 6:4, and namely air part accounts for the ratio of length of periodicity is 60%, and thickness is d
1=500nm.Periods lambda is 500nm.Substrate layer medium is silicon (Si).
For said structure, provide two embodiments:
Incident angle when embodiment 1. is measured is θ=60 °, φ=90 °, and as shown in Figure 1, θ is the angle between incident direction and the vertical direction of incidence surface, and φ is the angle that monochromatic diffraction light plane of incidence and grating periodic arrange between bearing of trend.The incident light being incident on double-decker surface is s polarization.Fault column pitch δ gets-50 ,-40 ,-30 ,-20 ,-10,0nm respectively, the wave spectrum that the amplitude of calculating changes along with incident light wave length, obtains Fig. 4; Fault column pitch δ gets-50 ,-40 ,-30 ,-20 ,-10,10,20,30,40,50nm respectively, calculates argument and obtains Fig. 5 along with incident wavelength changes wave spectrum.
As can be seen from Figure 4, amplitude is sensitive to interlayer dislocation spacing δ at wavelength coverage 590-640 nanometer range place.In this range of wavelengths, the range value of the corresponding different curve of phase co-wavelength changes greatly and more regular.Therefore, above-mentioned 590-640 nanometer can be selected to be range of wavelengths FQ when concern parameter is amplitude.As can be seen from Figure 5, argument is sensitive and more regular to interlayer dislocation spacing δ change at wavelength coverage 940-970 nanometer range place.Therefore, above-mentioned 940-970 nanometer can be selected to be range of wavelengths FQ when concern parameter is argument.
In embodiment 1, when concern parameter is amplitude, the wavelength curve that in this embodiment, interlayer dislocation spacing-δ is corresponding with+δ overlaps (during δ=0, amplitude is zero), cannot characterize interlayer dislocation direction.When concern parameter is argument, the wavelength curve change of interlayer dislocation spacing δ → 0 place lacks rule, but the wavelength curve difference phase place π that-δ is corresponding with+δ, interlayer dislocation direction can be characterized.
After selecting range of wavelengths, from each curve, extract amplitude or the argument mean value in corresponding Same Wavelength interval, simulate the F equation paying close attention to parameter in range of wavelengths.According to the amplitude recorded or argument during measurement, fault column pitch can be drawn according to F equation.
Embodiment 2 and embodiment 1 be distinguished as measurement time incident angle be θ=45 °, φ=45 °.Measure and the wave spectrum that changes along with incident light wave length of the amplitude that calculates, obtain Fig. 6.As can be seen from Figure 6, in 560-580 nanometer range, the range value of the corresponding different curve of phase co-wavelength changes greatly, and therefore frequency separation FQ can be chosen as 560-580 nanometer.
As can be seen from embodiment 1 and 2 and Fig. 4 to 6, choose θ=45 °, during ° incident angle of φ=45, range value, to the change numerical stability of angle θ, φ, is not very sensitive.But from real operation angle, choose θ=45 °, it is lower that φ=45 ° realize difficulty, be easy to realize in concrete measurement procedure, and choose θ=60 °, during φ=90 °, because the parameter of zero order diffracted light is under this incident angle, more responsive to the change of fault column pitch, the interlayer dislocation δ value of the symmetric periodic optical grating construction therefore can measured is wider.
Described above is to being that spacing is measured to fault at one-dimensional square, if carry out the fault column pitch of two-dimensional directional, need all to construct two-dimensional and periodic optical grating construction the two-layer of formation fault column pitch, embodiment is: in the same position of every Rotating fields, all make orthogonal two groups of one-dimensional gratings as graticule, adopt foregoing method, by testing out the fault column pitch of the one-dimensional grating graticule of two mutually perpendicular directions, obtain the interlayer dislocation of two-dimensional grating structure in orthogonal both direction.
Such as at the One Dimension Periodic grating of the upper left corner of laminate printing X-direction, and Y-direction One Dimension Periodic grating vertical with it can be printed in the upper right corner.Just can respectively x, y two direction realize the technique of aiming at, ensure that the processing of sandwich construction product realizes.Adopt the method for aforesaid measurement one dimension fault column pitch to misplace each measurement once to the interlayer in x, y direction respectively during measurement, test out two one dimension fault column pitch, the fault column pitch of two-dimentional both direction can be drawn.
Adopt the interlayer for double-deck periodic micro structure of the present invention dislocation method of testing, by testing the correlation parameter of the optical diffraction ripple electric field of different polarization states, replace traditional test to light intensity, by the spectrum measurement to different angles, different parameters, select the interlayer the most responsive space angle of dislocation and diffraction light parameter, in conjunction with the analog computation analysis to optical diffraction ripple electric field, realize high-precision interlayer dislocation test.
In above-mentioned measuring method, can better realize larger susceptibility, to reach better measurement effect to the selection of incident angle; Adopt the positive and negative values of fault column pitch on average can reduce measuring error as measured value during measurement, situation less to fault column pitch value during matching, can be assumed to be linear function to F2 (δ) equation or quadratic equation carries out matching to reduce calculating strength.
The method that in the present invention, the disclosed embodiments describe or the software module that the step of algorithm can directly use hardware, processor to perform, or the combination of the two is implemented.Software module can be placed in the storage medium of other form any known in random access memory (RAM), internal memory, ROM (read-only memory) (ROM), electrically programmable ROM, electrically erasable ROM, register, hard disk, moveable magnetic disc, CD-ROM or technical field.
Previously described is each preferred embodiment of the present invention, preferred implementation in each preferred embodiment is if not obviously contradictory or premised on a certain preferred implementation, each preferred implementation can stack combinations use arbitrarily, design parameter in described embodiment and embodiment is only the invention proof procedure in order to clear statement inventor, and be not used to limit scope of patent protection of the present invention, scope of patent protection of the present invention is still as the criterion with its claims, the equivalent structure change that every utilization instructions of the present invention and accompanying drawing content are done, in like manner all should be included in protection scope of the present invention.
Claims (8)
1. the dislocation of the interlayer for a double-deck periodic micro structure method of testing, for testing the fault column pitch δ of double-layer grating structure, comprise fault column pitch-diffraction light equation F fit procedure, described fault column pitch-diffraction light equation model process comprises the steps:
Step 101. along certain angle double-decker surface incident to be measured, measures the concern parameter F of zero order diffracted light with the directional light of monochromatic polarization; Monochromatic polarized light frequency sweep exports, and obtains the wavelength curve of the concern parameter under fixed bed dislocation spacing δ;
Fault column pitch δ in the change step 101 of step 102. only equal difference, repeatedly repeats step 101, obtains one group of wavelength curve group F1 (λ, δ) by concern parameter F corresponding to the fault column pitch value δ of equal difference discrete series; Wherein λ is wavelength;
Step 103. is at curve group F1 (λ, select δ) to change with δ, pay close attention to the range of wavelengths FQ that Parameters variation is the most responsive, to the arbitrary fixed wave length be in FQ, the value of several concerns parameter F utilizing different layers dislocation spacing corresponding, simulates the function that the concern parameter under this wavelength changes with fault column pitch; Change wavelength and repeat matching, obtain the function F 2 (δ) that the concern parameter under each wavelength in FQ interval changes with fault column pitch, as fault column pitch-diffraction light equation F;
The described dislocation of the interlayer for double-deck periodic micro structure method of testing is after obtaining F2 (δ), when measuring fault column pitch, use the incident double-decker to be measured of incident angle that any monochromatic polarized light edge be in FQ interval is same with step 101, measure the concern parameter of zero order diffracted light, according to concern parameter value and the wavelength value of correspondence, double-deck fault column pitch to be measured can be drawn.
2. as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that: described concern parameter is the ellipsometric parameter in ellipsometric measurement, namely plane of incidence tangentially with amplitude, ao and/or the argument Ψ of the ratio of the Zero-order diffractive optical electric field of normal direction two polarization directions.
3., as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that: the incident direction of described monochromatic polarized light is: θ=φ=45 degree, or θ=60 degree, φ=90 degree;
θ is the angle between incident direction and the vertical direction of incidence surface, and φ is the angle that monochromatic diffraction light plane of incidence and grating periodic arrange between bearing of trend.
4. as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that: in described step 101 to 102, to each fault column pitch, get positive and negative values respectively and measure, as the corresponding measured value of this fault column pitch after two values obtained are average.
5., as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that: to suppose that F2 (δ) carries out matching for once linear or quadratic nonlinearity equation in described step 103.
6., as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that:
In step 101, when measuring the concern parameter of zero order diffracted light, within the scope of the wavelength width of the △ λ being wavelengths centered with tested wavelength, average to the concern parameter of zero order diffracted light, wherein △ λ is the bandwidth of incident monochromatic polarized light.
7., as claimed in claim 1 for the interlayer dislocation method of testing of double-deck periodic micro structure, it is characterized in that: measurement mechanism is made up of spectroscopic ellipsometers and the data processor that is connected with spectroscopic ellipsometers.
8. the dislocation of the interlayer for a double-deck periodic micro structure method of testing, for testing the fault column pitch of two-dimension periodic grating, it is characterized in that: in the same position of every Rotating fields, all make orthogonal two groups of one-dimensional gratings as graticule, adopt as the method in claim 1 to 6 as described in any one, by testing out the fault column pitch of the one-dimensional grating graticule of two mutually perpendicular directions, obtain the interlayer dislocation of two-dimensional grating structure in orthogonal both direction.
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| WO2002069390A2 (en) * | 2001-02-27 | 2002-09-06 | Timbre Technologies, Inc. | Grating test patterns and methods for overlay metrology |
| TW200302538A (en) * | 2002-01-31 | 2003-08-01 | Timbre Tech Inc | Overlay measurements using periodic gratings |
| CN101393303A (en) * | 2008-09-26 | 2009-03-25 | 苏州大学 | Method for making near infrared band three-dimensional photon crystal |
| CN103048047A (en) * | 2011-10-11 | 2013-04-17 | 中国科学院微电子研究所 | Phase element containing normal incident broadband polarized spectrometer and optical measurement system |
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