CN103376673A - Pre-alignment device and pre-alignment method - Google Patents
Pre-alignment device and pre-alignment method Download PDFInfo
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- CN103376673A CN103376673A CN2012101187798A CN201210118779A CN103376673A CN 103376673 A CN103376673 A CN 103376673A CN 2012101187798 A CN2012101187798 A CN 2012101187798A CN 201210118779 A CN201210118779 A CN 201210118779A CN 103376673 A CN103376673 A CN 103376673A
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Abstract
The invention discloses a pre-alignment device and a pre-alignment method, used for realizing centering and orienting of substrates with different sizes. The pre-alignment device comprises a sucker, a pair of chucks and a photoelectric detecting device, wherein the sucker is used for bearing and fixing a substrate, and driving the substrate to rotate, the pair of chucks has the size matched with that of the substrate, the substrate is tightly clamped through the pair of chucks, the center of the pair of chucks coincides with the center of the sucker to realize the centering of the substrate, the position of the photoelectric detecting device is adjustable, so that the edge of the substrate is located in the field range of the photoelectric detecting device, the position of a notch or a flat edge on the substrate is detected through the photoelectric detecting device, and the notch or the flat edge is parallelly rotated to a pointed position to realize orientation of the substrate. The pre-alignment device locates the substrate through two modes including mechanical clamping and photoelectric detection, mechanically clamps the substrate to realize centering of the substrate, and detects and identifies the notch or the flat edge on the substrate by utilizing photoelectric detection so as to realize orientation for the substrate.
Description
Technical field
The present invention relates to integrated circuit and make the field, particularly relate to a kind of prealignment device and pre-alignment method.
Background technology
Prealignment device is applied in numerous chip manufacturing equipment such as litho machine, is the important device that substrate such as silicon chip etc. is positioned.Along with constantly reducing of semi-conductor chip characteristic dimension, and the continuous increase of size of foundation base, more and more higher to the alignment precision requirement of prealignment device.
Prealignment device is used for substrate is positioned, and comprises substrate is felt relieved and orientation.Arrive work stage by the substrate behind the prealignment and need to satisfy certain accuracy requirement, litho machine can find suprabasil mark fast like this, thereby exposes, and improves production efficiency of equipment.
At present, by the difference of bearing accuracy, prealignment device generally is divided into two kinds of mechanical grip mode and Photoelectric Detection modes.The mechanical grip mode generally is applied to 8 " in the middle of the not high equipment of following substrate and accuracy requirement, simple in structure, be easy to realize; 8 " above substrate is in the Photoelectric Detection mode as main, and structure is comparatively complicated, adopts motor-driven more, cooperates image processing algorithm to finish.No matter the prealignment device generalized case of which kind of mode can only be processed the substrate of a certain size, minority can be accomplished compatible two kinds of sizes.
Therefore, how to provide a kind of simple in structure and precision is high, prealignment device that simultaneously can compatible sizes substrate, be still urgent problem in the present technical development.
Summary of the invention
Technical matters to be solved by this invention provides a kind of prealignment device and pre-alignment method, to simplify the prealignment device structure, improves precision, and improves the compatibility of prealignment device.
For addressing the above problem, the invention provides a kind of prealignment device, be used for realizing centering and the orientation of different size substrate, described substrate has breach or flat limit, and described device comprises:
Sucker is used for carrying and fixing described substrate, and can drives the substrate rotation;
A pair of chuck has the size that is complementary with substrate, is symmetricly set in the both sides of sucker, and corresponding with the height and position of substrate, clamps substrate and makes the center of a pair of chuck and the centering of the center superposition realization substrate of sucker by described a pair of chuck;
Photoelectric detection system (CCD, Charge Couple Device), be positioned at the top of sucker, and the position capable of regulating of described photoelectric detection system turns to the orientation that assigned address is realized substrate so that basal edge is positioned at the field range of photoelectric detection system by the position on breach or flat limit in the photoelectric detection system detection substrate and with breach or flat limit.
Preferably, be respectively equipped with two alignment bearings on each chuck, so that when described a pair of chuck clamped substrate, four alignment bearings contacted with basal edge simultaneously, by making the centering of center that four alignment bearings consist of and the center superposition realization substrate of sucker.
Preferably, described prealignment device also comprises a drive unit that links to each other with photoelectric detection system, and described drive unit is used for adjusting the position of described photoelectric detection system so that basal edge is positioned at the field range of photoelectric detection system.
Optionally, described drive unit comprises the photoelectric detection system fixed mechanism, guide rail and latch mechanism, one end of described photoelectric detection system fixed mechanism is fixedly connected with photoelectric detection system, the other end can move along described guide rail, and described latch mechanism is used for locking the position of described photoelectric detection system fixed mechanism.
Optionally, described prealignment device comprises that also a universal stage is used for carrying described sucker, and described sucker is realized rotation under the drive of universal stage.
Optionally, described prealignment device also comprises micromotion platform, and described micromotion platform is positioned at the below of described universal stage; The height-adjustable of described micromotion platform is so that basal edge is positioned at the field depth of described photoelectric detection system.
For addressing the above problem, the present invention also provides a kind of pre-alignment method that utilizes described prealignment device, may further comprise the steps:
Step 3 judges whether substrate is in the position of focal plane of photoelectric detection system; If then execution in step 4; If not, then adjust the height of sucker, then repeating step 3;
Step 4, chuck clamp substrate so that substrate is felt relieved;
Step 5, chuck is retracted, and substrate is fixed on the sucker;
Step 6, sucker drive substrate is revolved and is turned around, and in the time of rotation, photoelectric detection system gathers quantity and the position on basal edge data and gap position or flat limit;
Step 7 makes chuck avoid the position on breach or flat limit, and makes chuck again clamp substrate so that substrate is felt relieved;
Step 8, photoelectric detection system carries out orientation to substrate.
Optionally, also comprise step after the step 6 before the step 7: calculate the deviation at substrate center and sucker center, if deviation within allowed band, then execution in step 7; If deviation surpasses error range, then readjust chuck position, then repeating step 3.
Optionally, step 7 specifically comprises:
Step 7.1 judges whether substrate has the quantity on breach or flat limit and flat limit;
If substrate has breach or single flat limit, then make chuck avoid the position on breach or flat limit, and make chuck clamp substrate so that substrate is felt relieved, then execution in step 8;
If substrate has two flat limits, then execution in step 7.2;
Step 7.2 is revolved in the process that turns around in substrate, and be identified at edge, substrate the first flat limit by photoelectric detection system first is the M point, and the second point at edge, substrate the second flat limit is the N point, and the center of substrate is the O point;
Step 7.3, according to the size of ∠ MON, the first flat limit that substrate is positioned at M point place rotates to the photoelectric detection system below or the angular bisector of ∠ MON and the intersection point of basal edge is rotated to the photoelectric detection system below, so that chuck is avoided the position on flat limit;
Step 7.4, chuck clamp substrate so that substrate is felt relieved, and then execution in step 8.
Prealignment device proposed by the invention adopts mechanical grip (being that chuck clamps) and Photoelectric Detection dual mode that substrate is positioned simultaneously, by mechanical grip substrate is felt relieved, and uses breach or the flat limit of Photoelectric Detection identification substrate.This method combines the advantage of two kinds of prealignment modes of tradition, both so that simple in structure, has improved again precision.And this prealignment device also is applicable to the substrate of different size, and greatly degree has improved compatibility, also reduced the cost that needs the different prealignment devices of configuration when bringing convenience to the user.
Description of drawings
Figure 1A～1C is the synoptic diagram of the prealignment device of the embodiment of the invention;
Fig. 2 is the process flow diagram of the pre-alignment method of the embodiment of the invention;
Fig. 3 A～3E is several forms of the two flat limit substrate of the embodiment of the invention.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.
The invention provides a kind of prealignment device, be used for realizing centering and the orientation of different size substrate, described substrate has breach or flat limit.Please refer to Figure 1A～1C, described prealignment device comprises:
Sucker 102 is used for carrying and fixing described substrate 101, and can drive substrate 101 rotations.
A pair of chuck 103, has the size that is complementary with substrate 101, be symmetricly set in the both sides of sucker 102, and corresponding with the height and position of substrate 101, clamp substrates 101 and make the center of a pair of chuck 103 and the centering of the center superposition realization substrate 101 of sucker 102 by described a pair of chuck 103.As shown in Figure 1B, be respectively equipped with two alignment bearings 108 on each chuck 103, so that when described a pair of chuck 103 clamps substrate 101, four alignment bearings 108 touch with substrate 101 side edge simultaneously, realize the centering of substrate 101 by center (being the center of a pair of chuck 103) and the center superposition of sucker 102 that makes four alignment bearings, 108 formations.According to one preferred embodiment of the present invention, described prealignment device has the chuck 103 of five kinds of different sizes, corresponds respectively to 2 ", 3 ", 4 ", 5 ", 6 " substrate of five kinds of different sizes.
Photoelectric detection system 104 (CCD, Charge Couple Device), be positioned at the top of sucker 102, and the position capable of regulating of described photoelectric detection system 104 turns to the orientation that assigned address is realized substrate 101 so that substrate 101 edges are positioned at the field range of photoelectric detection system 104 by the position on breach or flat limit in the photoelectric detection system 104 detection substrates 101 and with breach or flat limit.Preferably, photoelectric detection system 104 projects on the axis of symmetry that position in the plane, a pair of chuck 103 place is positioned at a pair of chuck 103 (being the perpendicular bisector of chuck hub line).
Described prealignment device can also comprise a drive unit that links to each other with photoelectric detection system 104, and described drive unit is used for adjusting the position of described photoelectric detection system 104 so that substrate 101 edges are positioned at the field range of photoelectric detection system 104.Shown in Fig. 1 C, described drive unit comprises photoelectric detection system fixed mechanism 109, guide rail 110 and latch mechanism 111, one end of described photoelectric detection system fixed mechanism 109 is fixedly connected with photoelectric detection system 104, the other end can move along described guide rail 110, and described latch mechanism 111 is used for locking the position of described photoelectric detection system fixed mechanism 109.The adjustment of photoelectric detection system 104 positions can be by unclamping latch mechanism 111, then along guide rail 110 moving photoconductor pick-up unit fixed mechanisms 109 and then drive the position that photoelectric detection system 104 moves to corresponding size of foundation base, thereby so that basal edge enters the field range of photoelectric detection system 104.According to one preferred embodiment of the present invention, latch mechanism 111 can be locked in photoelectric detection system fixed mechanism 109 five positions, namely can make photoelectric detection system 104 lay respectively at 2 ", 3 ", 4 ", 5 ", 6 " top, edge of the substrate of five kinds of different sizes.
Described prealignment device can also comprise that a universal stage 105 is used for carrying described sucker 102, and described sucker 102 is realized rotation under the drive of universal stage 105.
Described prealignment device can also comprise micromotion platform 106, and described micromotion platform 106 is positioned at the below of described universal stage 105.The effect of micromotion platform 106 is to carry out elevating movement with universal stage 105.Owing to there is the substrate of various different-thickness, the sensing range that make these substrates can both enter photoelectric detection system 104 then needs basal edge is adjusted within the field depth of photoelectric detection system 104.The height-adjustable of described micromotion platform 106 is so that substrate 101 edges are positioned at the field depth of described photoelectric detection system 104.
Described prealignment device can also comprise a pair of chuck adjusting mechanism 107, and each chuck adjusting mechanism 107 is connected with a chuck 103 respectively.In the time of need to switching to the different size substrate, first corresponding chuck 103 is installed on the chuck adjusting mechanism 107 the corresponding a kind of size substrate of every cover chuck.Be respectively arranged with a sensor in each chuck adjusting mechanism 107, whether be complementary with substrate 101 sizes for detection of chuck 103 sizes.
The present invention also provides a kind of pre-alignment method that utilizes described prealignment device.
Before prealignment is carried out in substrate 101, select first and chuck 103 that substrate 101 sizes are complementary, and described chuck 103 is installed on the chuck adjusting mechanism 107.The effect of chuck 103 is that substrate 101 is felt relieved, and makes the center superposition at alignment bearing 108 determined centers and sucker 102 on the chuck 103 by frock and chuck adjusting mechanism 107, guarantees thus clamp precision.When the sensor on the chuck adjusting mechanism 107 detects chuck 103 sizes and is complementary with substrate 101 sizes of software setting, then can carry out the prealignment operation, otherwise report an error.
Please refer to Fig. 2, for the present invention utilizes described prealignment device the process flow diagram of prealignment is carried out in substrate 101, detailed process is as follows:
At first execution in step S10 judges whether chuck 103 sizes are corresponding with substrate 101 sizes with photoelectric detection system 104 positions; If, execution in step S12 then; If not, execution in step S11 then reports an error whether detect configuration correct, and prealignment finishes.
Then execution in step S12 judges whether substrate 101 is in the position of focal plane of photoelectric detection system 104; If, execution in step S14 then; If not, then adjust the height (step S13) of micromotion platform 106, make substrate 101 be in the position of focal plane of photoelectric detection system 104, then repeating step S12.
In step S14, clamp substrate 101 centering by chuck 103, then chuck 103 is retracted, and chuck 103 is retracted and is used vacuum reservoir to drive, and chuck 103 to reference position, guaranteed the repeatable accuracy of clamping by springs return thus after vacuum discharged.
Then execution in step S15, sucker 102 open vacuum so that substrate 101 is fixed on the sucker 102, and drive substrate 101 and revolve and turn around, and in the time of rotation, photoelectric detection system 104 gathers the position on substrate 101 marginal date and breach or flat limit.
Follow execution in step S16, photoelectric detection system 104 detects the breach at substrates 101 edges or the quantity on flat limit;
If substrate 101 has breach or single flat limit, then make chuck 103 avoid the position on breach or flat limit (for example breach or flat limit can be rotated to photoelectric detection system 104 belows) and make chuck 103 again clamp substrate 101 centering (step S17); Then execution in step S18 makes substrate breach or flat limit move to assigned address by rotation, and the prealignment action is finished;
If substrate 101 has two flat limits, execution in step S19 then, revolve in the process that turns around in substrate 101, be the M point by photoelectric detection system 104 with first point identification at the edge, the flat limit of article one in its substrate that detects 101, the second point at the edge, the flat limit of second in its substrate that detects 101 is denoted as the N point, and the center of substrate 101 is denoted as the O point, adopt ∠ MON to represent two angles between the flat limit.Need to prove that described prealignment device is to be relatively easy to the processing of breach and single flat limit substrate, the processing of two flat limit substrates is then needed auxiliary certain algorithm.Fig. 3 A～3E is depicted as the two flat limit substrate of several forms.In Fig. 3 A～3E, multi-form two flat limit substrate, the angle between its two flat limits is different, the angle numerical value that marks among the figure is the exact value of angle, i.e. angle numerical value between the vertical line on substrate center O to two a flat limit.Owing to suprabasil flat limit very short (exaggerating for illustrative purpose among the figure), therefore adopt ∠ MON to come the angle between two flat limits of approximate representation can't cause very large error, also can not affect the precision of prealignment.If think that herein the size of ∠ MON is two corner dimensions between the flat limit, then as shown in Figure 3A ∠ MON is 45 °, ∠ MON is 90 ° among Fig. 3 B, ∠ MON is 135 ° among Fig. 3 C, ∠ MON is 180 ° among Fig. 3 D, with ∠ MON among Fig. 3 E be 225 °, how the below will rotate substrate so that chuck is dodged described flat limit with the explanation of minute situation for different ∠ MON.
Follow execution in step S20, size according to ∠ MON, the the first flat limit that substrate 101 is positioned at M point place rotates to photoelectric detection system 104 belows or the angular bisector of ∠ MON and the intersection point at substrate 101 edges is rotated to photoelectric detection system 104 belows, so that chuck 103 is avoided the position on flat limit, can guarantee that so follow-up chuck 103 folded positions just in time are the circular arc portions of substrate 104.When the size of ∠ MON is in 0 °～120 ° and 240 °～360 ° intervals, namely for the situation shown in Fig. 3 A, the 3B, the angular bisector of ∠ MON and the intersection point at substrate 101 edges are rotated to photoelectric detection system 104 belows, can make chuck 103 effectively avoid the position on flat limit (S21); When the size of ∠ MON was in 120 °～240 ° intervals, namely for the situation shown in Fig. 3 C～3E, the first flat limit that substrate 101 is positioned at M point place rotated to photoelectric detection system 104 belows, can make chuck 103 effectively avoid the position on flat limit (S22).Certainly, the division of above-mentioned angular interval can be adjusted with the practical factors such as relative position of chuck 103 according to the corresponding central angle size in flat limit, photoelectric detection system 104, as long as so that chuck 103 can be avoided the position on flat limit by rotation.
Execution in step S23 uses chuck 103 to clamp substrate 101 centering subsequently.
Last execution in step S24, orientation is carried out in 104 pairs of substrates of photoelectric detection system 101, makes the flat limit of substrate move to assigned address by rotation, and the prealignment action is finished.
According to one preferred embodiment of the present invention, after step S18 and step S24, also can comprise: the deviation of calculating substrate 101 centers and sucker 102 centers; If deviation is within allowed band, then prealignment finishes; If deviation surpasses error range, then readjust chuck 103 positions, then repeating step S12.
The present invention is when utilizing synoptic diagram that the embodiment of the invention is described in detail in detail, and for convenience of explanation, the sectional view of expression device architecture is disobeyed general ratio and done local the amplification, should be with this as limitation of the invention.In addition, those skilled in the art can carry out various changes and modification to the present invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.
Claims (9)
1. prealignment device is used for realizing centering and the orientation of different size substrate, and described substrate has breach or flat limit, it is characterized in that, described prealignment device comprises:
Sucker is used for carrying and fixing described substrate, and can drives the substrate rotation;
A pair of chuck has the size that is complementary with substrate, is symmetricly set in the both sides of sucker, and corresponding with the height and position of substrate, clamps substrate and makes the center of a pair of chuck and the centering of the center superposition realization substrate of sucker by described a pair of chuck;
Photoelectric detection system, be positioned at the top of sucker, and the position capable of regulating of described photoelectric detection system turns to the orientation that assigned address is realized substrate so that basal edge is positioned at the field range of photoelectric detection system by the position on breach or flat limit in the photoelectric detection system detection substrate and with breach or flat limit.
2. prealignment device as claimed in claim 1, it is characterized in that, be respectively equipped with two alignment bearings on each chuck, so that when described a pair of chuck clamps substrate, four alignment bearings contact with basal edge simultaneously, by making the centering of center that four alignment bearings consist of and the center superposition realization substrate of sucker.
3. prealignment device as claimed in claim 1, it is characterized in that, described prealignment device also comprises a drive unit that links to each other with photoelectric detection system, and described drive unit is used for adjusting the position of described photoelectric detection system so that basal edge is positioned at the field range of photoelectric detection system.
4. prealignment device as claimed in claim 3, it is characterized in that, described drive unit comprises the photoelectric detection system fixed mechanism, guide rail and latch mechanism, one end of described photoelectric detection system fixed mechanism is fixedly connected with photoelectric detection system, the other end can move along described guide rail, and described latch mechanism is used for locking the position of described photoelectric detection system fixed mechanism.
5. prealignment device as claimed in claim 1 is characterized in that, described prealignment device comprises that also a universal stage is used for carrying described sucker, and described sucker is realized rotation under the drive of universal stage.
6. prealignment device as claimed in claim 5 is characterized in that, described prealignment device also comprises micromotion platform, and described micromotion platform is positioned at the below of described universal stage; The height-adjustable of described micromotion platform is so that basal edge is positioned at the field depth of described photoelectric detection system.
7. the pre-alignment method of each described prealignment device in a utilization such as the claim 1 to 6 is characterized in that, may further comprise the steps:
Step 1 places substrate on the sucker, and the chuck that is complementary with size of foundation base is installed at prealignment device;
Step 2 judges whether the position of the size of chuck and photoelectric detection system is corresponding with size of foundation base; If then execution in step 3; If not, whether the detection configuration that then reports an error is correct, and prealignment finishes;
Step 3 judges whether substrate is in the position of focal plane of photoelectric detection system; If then execution in step 4; If not, then adjust the height of sucker, then repeating step 3;
Step 4, chuck clamp substrate so that substrate is felt relieved;
Step 5, chuck is retracted, and substrate is fixed on the sucker;
Step 6, sucker drive substrate is revolved and is turned around, and in the time of rotation, photoelectric detection system gathers quantity and the position on basal edge data and gap position or flat limit;
Step 7 makes chuck avoid the position on breach or flat limit, and makes chuck again clamp substrate so that substrate is felt relieved;
Step 8, photoelectric detection system carries out orientation to substrate.
8. pre-alignment method as claimed in claim 7 is characterized in that, step 7 specifically comprises:
Step 7.1 judges whether substrate has the quantity on breach or flat limit and flat limit;
If substrate has breach or single flat limit, then make chuck avoid the position on breach or flat limit, and make chuck clamp substrate so that substrate is felt relieved, then execution in step 8;
If substrate has two flat limits, then execution in step 7.2;
Step 7.2 is revolved in the process that turns around in substrate, and be identified at edge, substrate the first flat limit by photoelectric detection system first is the M point, and the second point at edge, substrate the second flat limit is the N point, and the center of substrate is the O point;
Step 7.3, according to the size of ∠ MON, the first flat limit that substrate is positioned at M point place rotates to the photoelectric detection system below or the angular bisector of ∠ MON and the intersection point of basal edge is rotated to the photoelectric detection system below, so that chuck is avoided the position on flat limit;
Step 7.4, chuck clamp substrate so that substrate is felt relieved, and then execution in step 8.
9. pre-alignment method as claimed in claim 7 is characterized in that, also comprises step after the step 8: calculate the deviation at substrate center and sucker center, if deviation within allowed band, then the prealignment action is finished; If deviation surpasses error range, then readjust chuck position, then repeating step 3.
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| CN109283807A (en) * | 2018-09-20 | 2019-01-29 | 深圳市矽电半导体设备有限公司 | Wafer calibration device and the litho machine for applying it |
| CN109434405A (en) * | 2018-12-07 | 2019-03-08 | 常州利腾机械有限公司 | A kind of multi-diameter shaft assembled orientation feeding detection device |
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| CN112230524B (en) * | 2020-10-26 | 2023-04-07 | 上海华力集成电路制造有限公司 | System for adjusting pre-alignment height before wafer exposure and using method thereof |
| CN113305596A (en) * | 2021-05-28 | 2021-08-27 | 深圳大学 | Ultra-precision machining centering mechanism |
| CN116072583A (en) * | 2023-02-13 | 2023-05-05 | 无锡星微科技有限公司 | Wafer pre-alignment platform and alignment method based on vision |
| CN116072583B (en) * | 2023-02-13 | 2024-01-30 | 无锡星微科技有限公司 | Wafer pre-alignment platform and alignment method based on vision |
| CN117293077A (en) * | 2023-11-22 | 2023-12-26 | 北京锐洁机器人科技有限公司 | Graphite disc positioning device for loading wafer |
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| CN103376673B (en) | 2015-06-17 |
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