Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement in the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public implementation.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have simultaneously centering elements.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to the common understanding of those skilled in the art of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
A kind of polarisation optical filtering module as depicted in figs. 1 and 2, comprises polaroid assembly 100 and optical filter box 200.
Polaroid assembly 100 comprises polaroid 110 and is arranged at the first conductive layer 120 of polaroid 110 1 sides, the first conductive layer 120 comprises a plurality of the first conductive units 122 that arrange along the first direction parallel interval, each first conductive unit 122 is intersected to form mutually by electric silk thread, and conductive thread intersects to form grid node mutually.The first conductive unit 122 can be processed by broken string and obtain, and perhaps directly recharges conductive material by the groove that impresses predetermined pattern and obtains.
Optical filter box 200 comprises transparent substrates 210, and be positioned at filter layer 220 and second conductive layer 230 of transparent substrates 210 the same sides, filter layer 220 comprises light shielding part 222 and optical filtering section 224, and light shielding part 222 is intersected to form mutually by gridline, and gridline intersects to form a plurality of grid cells 223 mutually; Optical filtering section 224 comprises a plurality of filter units 225, and each filter unit 225 is contained in the corresponding grid cell 223; The second conductive layer 230 comprises a plurality of the second conductive units 232 that arrange along the second direction parallel interval, and each second conductive unit 232 is intersected to form mutually by conductive thread, and the second conductive unit 232 can be processed by broken string equally and obtain.
First direction and second direction are not parallel to each other, and the first conductive unit 122 and the second conductive unit 232 form Inductance and Capacitance in the thickness direction insulation.The interval width of two adjacent the first conductive units 122 can be 0.5 micron to 50 microns, and the interval width of two adjacent the second conductive units 232 also can be 0.5 micron to 50 microns.The conductive thread live width of the first conductive layer 120 is 0.2 micron~5 microns, and the distance of adjacent two grid nodes is 50 microns~500 microns, to guarantee the first conductive layer 120 visually-clear.The conductive thread of the second conductive layer 230 falls within on the gridline in the projection of filter layer 220, avoids conductive thread to be exposed to optical filtering section 224 and affects bright dipping and the appearance effect of optical filtering section 224.
Transparent substrates 210 can be the optically transparent materials such as glass, polymethylmethacrylate (PMMA) or polyethylene terephthalate (PET) and makes.Transparent substrates 210 is substrate of glass in the present embodiment, can reduce production costs.Light shielding part 222 is the photoresist with black dyes, and it can adopt exposure, develop and make.Optical filtering section 224 is the photoresist with coloured dye, can adopt equally exposure, develop and make.Filter unit 225 is generally red (red, R) light unit, green (green, G) light unit or indigo plant (blue, B) light unit, is used for making incident light be transformed into monochromatic light, realizes filtering functions.
The conductive thread of the first conductive layer 120 and the second conductive layer 230 can be in metal simple-substance line, metal alloy wire, carbon nano tube line, Graphene line, organic conductive macromolecule line or tin indium oxide (ITO) line at least a.In the present embodiment, the conductive thread of the first conductive layer 120 and the second conductive layer 230 is the metal simple-substance line, and for example silver-colored line can improve electric conductivity.
Therein among embodiment, such as Fig. 1, Fig. 3, Fig. 6, Fig. 7 and shown in Figure 8, polaroid 110 comprises polaroid body 112, also can comprise impression glue-line 114, impression glue-line 114 is arranged at polaroid body 112 1 sides, the first conductive layer 120 can adopt the impression mode to be formed at polaroid 110, specifically can print off groove with the conductive pattern structural correspondence of the first conductive layer 120 away from a side pressure of polaroid body 112 at impression glue-line 114, filled conductive material and solidify and make the first conductive layer 120 in the groove again, namely the first conductive layer 120 is contained in groove.
Impression glue-line 114 is transparence, does not affect whole transmitance.The material of impression glue-line 114 specifically can be solvent-free ultra-violet curing acrylic resin, can also be On Visible Light Cured Resin or heat reactive resin.The thickness of impression glue-line 114 can be 2 μ m~10 μ m, both can avoid because the impression glue-line 114 excessively thin groove that makes is excessively shallow, and affect the integrality of groove, and it is blocked up and cause polaroid assembly 100 blocked up also can to avoid impressing glue-line 114.The present embodiment further groove degree of depth is less than the thickness of impression glue-line 114, and the conductive thread thickness of the first conductive layer 120 is not more than the degree of depth of groove, can avoid the first conductive layer 120 exposed and in subsequent technique by scratch.
In another embodiment, such as Fig. 4, Fig. 5 and shown in Figure 9, polaroid 110 also can include only polaroid body 112, do not comprise impression glue-line 114, the first conductive layer 120 directly is arranged at polaroid body 112 1 sides, the first conductive layer 120 specifically can be by being coated with or plating conductive layer at polaroid body 112, and etched mode prepares again.
The second conductive layer 230 also can be by being coated with or plating conductive layer, and etched mode prepares again.The second conductive layer 230 can be arranged at light shielding part 222 away from a side of transparent substrates 210, such as Fig. 1, Fig. 4, Fig. 6, Fig. 8 and shown in Figure 9.The second conductive layer 230 also can be arranged between light shielding part 222 and the transparent substrates 210, such as Fig. 3, Fig. 5 and shown in Figure 7.
The conductive thread live width of the second conductive layer 230 can be set to be less than or equal to the gridline live width of light shielding part 222, avoids conductive thread to be exposed to the gridline side direction and affects bright dipping and the appearance effect of optical filtering section 224.Particularly, the conductive thread of the second conductive layer 230 can equal the gridline live width of light shielding part 222, such as Fig. 1, Fig. 3, Fig. 4, Fig. 5, Fig. 8 and shown in Figure 9, to reduce the manufacture difficulty of conductive thread.The conductive thread live width of the second conductive layer 230 also can less than the gridline live width of light shielding part 222, as shown in Figure 6 and Figure 7, be exposed to the risk of gridline side direction with further reduction conductive thread.In other embodiments, the conductive thread live width of the second conductive layer 230 also can be greater than the gridline live width of light shielding part 222, but need to conductive thread and the non-parallel setting of gridline, fall within on the gridline in the projection of filter layer 220 to guarantee conductive thread.
Among embodiment, polarisation optical filtering module also can comprise substratum transparent (not shown in the accompanying drawing) therein, and transparent substrates 210 is bonding by substratum transparent and polaroid assembly 100 away from a side of filter layer 220 and the second conductive layer 230.Particularly, transparent substrates 210 can be by substratum transparent and polaroid 110 side bonds away from the first conductive layer 120, extremely shown in Figure 7 such as Fig. 3, also can be the side bonds that the first conductive layer 120 is set by substratum transparent and polaroid 110, such as Fig. 8 and shown in Figure 9.Be appreciated that in other embodiments polarisation optical filtering module also can not comprise substratum transparent, transparent substrates 210 is connected with polaroid assembly 100 by other means.
Figure 10 shows that the structural drawing of polarisation optical filtering module and conductive thread, the conductive thread of the first conductive layer 120 intersects to form a plurality of the first conductive grids, the first conductive grid can be the regular polygon grid, such as square, rhombus, regular hexagon etc., also can be random grid.The conductive thread of the second conductive layer 230 all falls within on the gridline of light shielding part 222 in the projection of filter layer 220, and the conductive thread of the second conductive layer 230 can be straight line, curve, also can be broken line.The concrete shape of the first conductive grid, and the concrete shape of the conductive thread of the second conductive layer 230 can be selected according to design requirements such as transmittance, Moire fringe problems.
The conductive thread of the second conductive layer 230 intersects to form a plurality of the second conductive grids mutually, the projection of the second conductive grid on filter layer 220 accommodates at least one filter unit 225, can decide filter unit 225 quantity of holding according to the design requirements such as resistance requirement to conductive layer.
Figure 11 to Figure 14 is the embodiment that different number filter units 225 are held in the projection of the second conductive grid on filter layer 220, is appreciated that conductive thread a is the conductive thread of the second conductive layer 230.
In embodiment as shown in figure 11, a filter unit 225 is held in the projection of conductive grid on light shielding part 222 that conductive thread a forms, be each grid cell 223 to a conductive grid should be arranged, so the density of conductive grid is larger, electric conductivity is better.
In embodiment as shown in figure 12, only on first axial (for example transverse axis), a plurality of filter units 225 are held in the projection of conductive grid on light shielding part 222 that conductive thread a forms.
In embodiment as shown in figure 13, only on second axial (for example longitudinal axis), a plurality of filter units 225 are held in the projection of conductive grid on light shielding part 222 that conductive thread a forms.
In embodiment as shown in figure 14, on first axial (transverse axis) and second axial (longitudinal axis), a plurality of filter units 225 are all held in the projection of conductive grid on light shielding part 222 that conductive thread a forms.
The below is elaborated to wherein several embodiment of polarisation optical filtering module making method.
Such as Fig. 1, Fig. 6 and the polarisation optical filtering module with touch control operation function shown in Figure 8, when adopting the impression modes, the first conductive layer 120 prepares, and the second conductive layer 230 is arranged at light shielding part 222 away from a side of transparent substrates 210, and its manufacturing process is as follows:
(1) surface-coated at polaroid body 112 impresses glue-line 114, can adopt PMMA(polymethylmethacrylate in the present embodiment, polymethylmethacrylate) UV cured resin, and the impression block of using the conductive pattern with the first conductive layer 120 to be nested impresses on impression glue-line 114 surfaces and solidifies, and obtains be used to the groove of accommodating the first conductive layer 120.
(2) filled conductive material and solidifying in the groove, (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to obtain the first conductive unit of space, be preferably metal, such as nanometer silver paste), just obtain polaroid assembly 100 with the first conductive layer 120.
(3) at first carry out the Plasma(plasma process on a surface of transparent substrates 210) process, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(4) be coated with/plate photoresist with black dyes at the whole face in transparent substrates 210 above-mentioned treated surfaces.
(5) adopt exposure-developing technique, the photoresist of optical filtering section 224 is removed, form light shielding part 222.
(6) whole plating conductive material or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, and present embodiment is argent) again obtains conductive layer.
(7) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the second conductive layer 230, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(8) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the second conductive unit of space.
(9) plate/coat R/G/B light unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(10) will bond by transparent adhesive and solidify with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, obtain having the polarisation optical filtering module of touch control operation function.
Such as Fig. 3 and the polarisation optical filtering module with touch control operation function shown in Figure 7, when the first conductive layer 120 adopt that the impression modes prepare, the second conductive layer is covered in light shielding part 222 and transparent substrates 210 between, its manufacturing process is as follows:
(1) a surface-coated impression glue-line 114(present embodiment at polaroid body 112 adopts the PMMAUV cured resin), and the impression block of using the conductive pattern with the first conductive layer 120 to be nested impresses on impression glue-line 114 surfaces and solidifies, and obtains be used to the groove of accommodating the first conductive layer 120.
(2) filled conductive material and solidifying in the groove, (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to obtain the first conductive unit of space, be preferably metal, such as nanometer silver paste), just obtain polaroid assembly 100 with the first conductive layer 120.
(3) at first carry out Plasma on a surface of transparent substrates 210 and process, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(4) whole the plating conductive material or be coated with one deck conductive ink and solidify that (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on transparent substrates 210 above-mentioned treated surfaces, present embodiment is the Nano Silver ink), obtain conductive layer.
(5) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the second conductive layer 230, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(6) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the second conductive unit of space.
(7) be coated with/plate photoresist with black dyes at the whole face of above-mentioned conductive layer surface.
(8) adopt exposure-developing technique, the photoresist of optical filtering section 224 is removed, form light shielding part 222.
(9) plate/coat R/G/B light unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(10) will bond by transparent adhesive and solidify with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, obtain having the polarisation optical filtering module of touch control operation function.
Such as Fig. 4 and the polarisation optical filtering module with touch control operation function shown in Figure 9, when the first conductive layer 120, the second conductive layer 230 all by being coated with/plating a conductive layer, prepare through etching again, and the second conductive layer 230 is covered in light shielding part 222 away from the surface of transparent substrates 210 1 sides, and its manufacturing process is as follows:
(1) whole the plating conductive material or be coated with one deck conductive ink and solidify that (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on a surface of polaroid body 112, present embodiment is the Nano Silver ink), obtain conductive layer.
(2) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the first conductive layer 120, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(3) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the first conductive unit of space, thereby obtain the polaroid assembly 100 with the first conductive layer 120.
(4) at first carry out Plasma on a surface of transparent substrates 210 and process, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(5) be coated with/plate photoresist with black dyes at the whole face in transparent substrates 210 above-mentioned treated surfaces.
(6) adopt exposure-developing technique, the photoresist of optical filtering section 224 is removed, form light shielding part 222.
(7) whole plating conductive material or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, and present embodiment is argent) again obtains conductive layer.
(8) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the second conductive layer 230, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(9) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the second conductive unit of space.
(10) plate/coat R/G/B light unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(11) will bond by transparent adhesive and solidify with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, obtain having the polarisation optical filtering module of touch control operation function.
The polarisation optical filtering module that has as shown in Figure 5 the touch control operation function, when the first conductive layer 120, the second conductive layer 230 all by being coated with/plating a conductive layer, again through etching preparation, and the second conductive layer 230 is covered between light shielding part 222 and the transparent substrates 210, and its manufacturing process is as follows:
(1) whole the plating conductive material or be coated with one deck conductive ink and solidify that (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on a surface of polaroid body 112; Present embodiment is the Nano Silver ink), obtain conductive layer.
(2) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the first conductive layer 120, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(3) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the first conductive unit of space, thereby obtain the polaroid assembly 100 with the first conductive layer 120.
(4) at first carry out Plasma on a surface of transparent substrates 210 and process, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(5) whole plating conductive material or be coated with one deck conductive ink and solidify that (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, present embodiment is the Nano Silver ink), obtain conductive layer.
(6) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers the second conductive layer 230, and the photoresist in all the other places (comprising needs broken string zone) is removed.
(7) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain the second conductive unit of space.
(8) be coated with/plate photoresist with black dyes at the whole face of above-mentioned conductive layer surface.
(9) adopt exposure-developing technique, the photoresist of optical filtering section 224 is removed, form light shielding part 222.
(10) plate/coat R/G/B light unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(11) will bond by transparent adhesive and solidify with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, obtain having the polarisation optical filtering module of touch control operation function.
Above-mentioned polarisation optical filtering module, can realize simultaneously touch operation, polarized light function and filtering functions, as an indispensable assembly in the display screen, when above-mentioned polarisation optical filtering module is used for display screen, can directly make display screen have touch controllable function, need not to assemble touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also greatly saved simultaneously material and assembly cost.The material that the first conductive layer 120 and the second conductive layer 230 are selected only expands all suitable conductive materials to transparent material by tradition; When conductive material is selected metal material, the energy consumption that can greatly reduce resistance and reduce touch-screen.
Above-mentioned polarisation optical filtering module with touch controllable function is double-deck conductive structure, and the design that need not to put up a bridge reduces task difficulty greatly.Adopt above-mentioned polarisation optical filtering module, can reduce liquid crystal display (Liquid Crystal Display, LCD) to the signal interference of touch-control effect.
In addition, the present invention also provides a kind of touch display screen, can be the LCDs of straight-down negative or side entering type light source.Touch display screen comprises TFT electrode, Liquid Crystal Module and the above-mentioned polarisation optical filtering module that stacks gradually.Because polarisation optical filtering module has touch operation, polarized light function and filtering functions simultaneously, makes touch display screen have the touch Presentation Function.Not only be conducive to reduce the thickness of electronic product, also greatly saved simultaneously material and assembly cost.Be appreciated that for using backlight as polarized light source, such as OLED(Organic Light-Emitting Diode, Organic Light Emitting Diode) polarized light source, then need not lower polaroid, only need the polarisation module in the above-mentioned polarisation optical filtering module to get final product.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.