CN103353626B - Three dimensional grating anti-reflection structure and components and parts - Google Patents
Three dimensional grating anti-reflection structure and components and parts Download PDFInfo
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract
This application discloses a kind of three dimensional grating anti-reflection structure and components and parts, comprise and there is the first lateral base and a solid matter optical grating construction, grating elementary cell is divided into two parts, Part I exposes in external environment, Part II imbeds substrate from the first side of substrate, multiple elementary cell close-packed arrays becomes micro-nano structure array, the area being parallel to the cross section of the first side of the Part I of elementary cell reduces to the increase gradually of the distance of the first side gradually with cross section, the area being parallel to the cross section of the first side of the Part II of elementary cell also reduces to the increase gradually of the distance of the first side gradually with cross section, the refractive index of grating material is between external environment and the refractive index of base material.The application imbeds by the illumination layer surface at micro-nano photoelectric component the three dimensional grating that close-packed arrays becomes micro-nano structure array, forms three dimensional grating anti-reflection structure functional coating, can improve the transmissivity of micro-nano photoelectric component to particular range of wavelengths incident light.
Description
Technical field
The application relates to micro-nano anti-reflection structure, is specifically related to a kind of three dimensional grating anti-reflection structure and components and parts.
Background technology
At present, the research of micro-nano anti-reflection structure has become a brand-new important topic, obtains develop rapidly in nearly ten years.Micro-nano anti-reflection structure, at numerous areas, comprises the application of daily lens, there is very strong potential using value thin-film solar cells, micro-nano sensor aspect.Such as, the photoelectric transformation efficiency of solar cells made of crystalline silicon is about 18%, but wherein silicon has reflectivity up to 37.5% for sunshine, and this high reflectance is the one of the main reasons causing solar battery efficiency low.In view of this, in order to overcome the high reflectance problem that prior art faces, the research of antireflection technology seems very important.Micro-nano anti-reflection structure can reduce component surface to external world light source reflection cause dazzle light or ghost phenomenon, and improve the utilization ratio of luminous energy.
At present, main antireflection technology forms the film of multilayer different refractivity to reduce light reflectance at component surface, and this multi-layer film structure is obtained by the repetitive structure of the high refractive index layer formed based on transparent materials such as metal oxides and low-index layer.But the anti-reflection structure due to conventional multilayer film has and uses wavelength coverage narrow, responsive and to Polarization-Sensitive problem to incident direction, fails to reach good anti-reflection effect.
Summary of the invention
The application provides a kind of the three dimensional grating anti-reflection structure and the components and parts that improve the incident light transmissivity of particular range of wavelengths.
According to the first aspect of the application, the application provides a kind of three dimensional grating anti-reflection structure, comprising:
Substrate, described substrate has the first side;
Close-packed arrays becomes multiple grating elementary cells of micro-nano structure array, each unit at least comprises Part I, the first side that the Part I of grating is formed at substrate is exposed in external environment, Part II imbeds substrate from the first side of substrate, the area being parallel to the cross section of the first side of the Part I of grating reduces to the increase gradually of the distance of the first side gradually with cross section, and the refractive index of described grating material is between external environment and the refractive index of base material or equal the refractive index of base material.
In one embodiment, each grating elementary cell also comprises the Part II extended from the basad inside, bottom of Part I and substrate first contacts side surfaces, and the area being parallel to the cross section of the first side of Part II also reduces to the increase gradually of the distance of the first side gradually with cross section.
First side of described substrate is manufactured with the groove that greatly, then opening zooms in gradually, described groove close-packed arrays becomes micro-nano structure array, and the Part II of described grating closely embeds in the groove of the first side.
Described substrate is semiconductor material, and the material of described grating is the on-dispersive dielectric substance of refractive index between 1 ~ 5.
Described grating is the dipyramid of bottom docking or two prismoid.
The interface of described grating Part I and Part II is square, the pass of the size of grating Part I and Part II and the wavelength of incident light is: d < λ < 2.5h, wherein, λ is the wavelength of incident light, d is the length of side of interface, and h is the height of grating Part I and Part II.
The Part I of described grating is identical with Part II material and interfaces along both are symmetrical.
According to the second aspect of the application, the application provides a kind of anti-light reflector device, comprising:
Illumination layer, described illumination layer has the first side for receiving light incidence;
The grating becoming micro-nano structure array to be formed by grating elementary cell close-packed arrays, each unit at least comprises Part I, the first side that the Part I of grating is formed at substrate is exposed in external environment, Part II imbeds substrate from the first side of substrate, the area being parallel to the cross section of the first side of the Part I of grating reduces to the increase gradually of the distance of the first side gradually with cross section, and the refractive index of described grating material is between external environment and the refractive index of illumination layer material or equal the refractive index of illumination layer material.
In one embodiment, each grating elementary cell also comprises the Part II that inside extends from the bottom of Part I and illumination layer first contacts side surfaces to illumination layer, first side of described illumination layer is manufactured with the groove that greatly, then opening zooms in gradually, described groove close-packed arrays becomes micro-nano structure array, the Part II of described grating closely embeds in the groove of the first side, and the area being parallel to the cross section of the first side of grating Part II reduces to the increase gradually of the distance of the first side gradually with cross section.
The application imbeds by the illumination layer surface at micro-nano photoelectric component the three dimensional grating that close-packed arrays becomes micro-nano structure array, forms three dimensional grating anti-reflection structure functional coating, can improve the transmissivity of micro-nano photoelectric component to particular range of wavelengths incident light.
Accompanying drawing explanation
Fig. 1 is the schematic diagram partly burying two pyramid grating anti-reflection structure in a kind of embodiment of the application;
Fig. 2 is the sectional view of Fig. 1;
Fig. 3 is from external environment to the curve map of basalis graded index in a kind of embodiment of the application;
Fig. 4 be in a kind of embodiment of the application incident light at the transmissivity comparison diagram with or without anti-reflection structure.
Embodiment
The content disclosed to make the application is more detailed and complete, is also described in further detail the application by reference to the accompanying drawings below by embodiment.It will be understood by those of skill in the art that this not implements or uses the unique forms of the application, but only in order to explain the application, not in order to limit the protection domain of the application.
By observing, researchist finds that some organ of some biologies (as moth, butterfly etc.) has the extraordinary antireflection effect of light.Such as, the moth eye surface layer structure of moth has the little kick of some solid matters, can form good anti-reflecting layer, and the three-dimensional pore space structure on butterfly's wing surface, then can obtain colorful wing color by modulating the incident light.Researchist once attempted the anti-reflection structure in some biologic-organs to be applied in actual components and parts, but was limited to technology, and the surface layer structure of these micro/nano-scales can not create always in actual applications.In recent years, along with the rise of nanosecond science and technology, the manufacturing capacity of micro/nano-scale minor structure also develops perfect gradually, so the research of related device and manufacture also become possibility.
The application's " micro-nano " structure used refers to have characteristic dimension at 100 nanometers (nm) micro-structure below, and the example of this class formation comprises nano dot, nano wire, nanometer rods, nanotube, nanocrystal etc.The application's " micro-nano photoelectric component " used utilizes photoelectric elements and technology of preparing processing preparation to have nanoscale (1-100nm) yardstick and have the photoelectric component of certain function.
The application's " antireflection " character used refer to reduce the reflection of optical surface light coating, layer or surface character.Antireflection character can be depending on various parameter, as the structure etc. on the thickness of the refractive index of material, layer, layer or surface.
In general, the refractive index of medium is defined as the ratio of the light velocity and Light in Medium speed in vacuum.The refractive index of the micro-nano structure that the application is used refers to the effective refractive index of three dimensional grating anti-reflection structure.Graded index refers to that the change along preferential direction refractive index is gradual change.Transmissivity refer to incident flux with through after the ratio of luminous flux.Optical dispersion refers to that polychromatic light is decomposed into monochromatic light and forms the phenomenon of spectrum.
In grating anti-reflection structure in the application, form grating layer in the first side of the substrate accepting light incidence, realized the refractive index of gradual change by grating layer.Grating layer comprises multiple grating elementary cells that close-packed arrays becomes micro-nano structure array, each unit at least comprises Part I, the first side that the Part I of grating is formed at substrate is exposed in external environment, Part II imbeds substrate from the first side of substrate, the area being parallel to the cross section of the first side of the Part I of grating reduces to the increase gradually of the distance of the first side gradually with cross section, and the refractive index of described grating material is between external environment and the refractive index of base material or equal the refractive index of base material.
In a kind of embodiment of the application, as depicted in figs. 1 and 2, a kind of two pyramid grating anti-reflection structures partly imbedded in substrate, comprise compact arranged pair of pyramid grating 1 and substrate 2 from top to bottom, substrate 2 has the groove array the first side 21, side 21, first being manufactured with inverted pyramid type.Grating 1 is divided into two parts, Part I is top grating layer 101, and it is formed on the first side 21 of substrate 2, exposes in external environment (normally air), Part II is bottom grating layer 102, and it embeds in the groove of substrate 2 from the first side of substrate.
For substrate 2, its material is not limit, but should have the character adapted with its special-purpose, and such as, if substrate 2 is solar cell, then its material should have the good receptivity of light (as monocrystalline silicon, amorphous silicon, gallium arsenide etc.); If substrate 2 is lens, then its material should have better light transmission (as glass, organic glass, crystal etc.).Grating 1 is low-refraction on-dispersive material, as indium tin oxide, silicon dioxide etc.The refractive index of grating 1 between external environment and substrate 2, or equals the refractive index of substrate 2.When the refractive index of grating 1 equals the refractive index of substrate 2, be equivalent to grating 1 and only have top grating layer 101.
The elementary cell of the grating 1 in the present embodiment is the dipyramid (i.e. two pyramid structure) of bottom docking, and in other embodiments, the elementary cell of grating 1 can also be two prismoids that bottom is docked, or hemisphere or spheroid.As long as make the area being parallel to the cross section of the first side of the Part I of grating reduce gradually to the increase gradually of the distance of the first side with cross section, the area being parallel to the cross section of the first side of the Part II of grating also reduces to the increase gradually of the distance of the first side gradually with cross section.
In the present embodiment, in order to the Part II of grating being embedded in the groove of substrate first side, palpus is etched recesses in substrate first, and the size and shape of the size and shape of groove and the Part II of grating matches, and the Part II of grating is closely embedded in the groove of substrate.In other instantiation, the Part II of grating also can be formed directly in substrate.
In a kind of specific embodiment, the top grating layer 101 of grating 1 is identical with the material of bottom grating layer 102, and interface along both is symmetrical.
In preferably embodiment, the size of raster unit can be determined according to the spectral band of its incidence.In a kind of specific embodiment, as shown in Figure 2, if the length of side is W bottom pyramidal grating, the height of grating is h
0, the wavelength of its corresponding incident light is λ, has following relation between three, that is: W< λ <2.5h
0. such as, to make anti-reflection structure have obvious antireflection effect to visible ray and infrared band, then the height of pyramid raster unit should between 700 to 1100nm, and the bottom length of side should between 100 to 240nm.
According to Fresnel reflection formula:
R=[(n
1-n
2)/(n
1+n
2)]
2,(1)
Wherein, R is the reflectivity of light at adjacent media (i.e. medium 1 and medium 2) interface, n
1and n
2be respectively the refractive index of adjacent media.As shown from the above formula, light is when by adjacent media, and medium refraction index is more close, and reflectivity is less.Therefore, if light is on the whole light path from medium 1 transition medium 2, the change of refractive index is all gradual change, then greatly can increase light from medium 1 to the transmissivity of medium 2.
Graded index is not the attribute of material, but the optical properties of whole grating layer.In the present embodiment, the refractive index of grating 1 is fixing, in the layer just residing for grating 1 or comprise air, or comprises base material, the cross-sectional area that grating has gradual change can ensure grating material proportion longitudinally consecutive variations, and therefore the effective refractive index of grating 1 is gradual change.Due to the raster unit size of grating 1 and lambda1-wavelength quite even less, under this yardstick, incident light can not recognize the concrete structure of grating 1, thus the effect such as reflection, diffraction of geometrical optics can not be realized, but whole grating 1 is regarded as the dielectric layer of a homogenize material, its equivalent refractive index is depending on the ratio of two media in this layer.Such as, in the present embodiment, whole grating layer is divided into the first grating layer and the second grating layer by us, first grating layer is the layer at the Part I place be exposed at outside substrate 2, first grating layer is made up of grating and external environment condition (such as air), more close to the first side, the proportion of composing of grating is larger, and the proportion of composing of air is less.Second grating layer is made up of grating and substrate, and more away from the first side, the proportion of composing of grating is less, and the proportion of composing of substrate is larger.Because the refractive index of air, grating material and base material three kinds presents ascending arrangement, therefore the refractive index of whole grating layer from outside to inside (namely along the incident direction of light) be increasing, thus form the refractive index of gradual change.As shown in Figure 3, the longitudinal axis represents refractive index, and transverse axis represents the height of grating, and the height of the part that grating is positioned at below substrate first side is negative value, the height that grating is positioned at the part above substrate first side on the occasion of, as seen from the figure, highly larger refractive index is less.Therefore this grating layer structure of the present embodiment can reduce light and incided reflectivity in substrate by environment, increases transmissivity.Need to illustrate at this, the incident angle of incident light does not limit, as long as incident from the front of anti-reflection structure.
In a kind of specific embodiment, as shown in Figure 2, the material of substrate 2 is Si, and the material of grating 1 is SiO
2.At the layer place, pinnacle, top of grating 1, the composition of this layer is the air of 100% and the SiO of 0%
2, therefore refractive index is equivalent to the refractive index (equaling 1) of air; Along this layer down, refractive index increases gradually, and at the intersection of grating 1 and substrate 2, the composition of this layer is the air of 0% and the SiO of 100%
2, therefore refractive index is equivalent to SiO
2refractive index (being approximately equal to 1.5); Along the down refractive index continuation increase again of this layer, to the layer place, pinnacle, bottom of grating 1, the composition of this layer is the Si of the 100% and SiO of 0%
2, therefore refractive index is equivalent to Si refractive index (being approximately equal to 5).In whole anti-reflection structure, the cross-sectional area due to raster unit is all gradual change, and therefore effective refractive index is also gradual change.
In a kind of specific embodiment, anti-reflection structure as shown in Figure 1, the refractive index of whole anti-reflection structure is graded index as shown in Figure 3, lambda1-wavelength scope is that 300-2000nm(contains visible ray to infrared band), having anti-reflection structure and the flat board without anti-reflection structure with in material substrate two kinds of situations, the correlation curve of incident light transmissivity as shown in Figure 4.As can be seen here, the incident light of three dimensional grating anti-reflection structure to broadband, omnirange and various polarization with graded index has excellent transmission humidification, and its spectral coverage can from visible ray to infrared band.
The grating anti-reflection structure of the application can be widely used in numerous areas, as lens, CD, computer screen, digital camera, PDA, GPS and mobile telephone display, vehicle glass, aircraft and fascia, the surface of solar panel, the common ground of this device all has transparent plane of illumination, plane of illumination has the first side of light incidence, in order to improve the anti-light reflecting properties of plane of illumination, the grating layer in above-described embodiment can be formed on the first side of the light incidence of plane of illumination, Part II by the grating in above-described embodiment is embedded into plane of illumination inside from the first side, thus significantly can improve the Findings of product or improve the efficiency of light energy utilization.
Above content is in conjunction with concrete embodiment further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.For general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, some simple deduction or replace can also be made, all should be considered as the protection domain belonging to the application.
Claims (7)
1. a three dimensional grating anti-reflection structure, is characterized in that comprising:
Substrate, described substrate has the first side;
Close-packed arrays becomes multiple grating elementary cells of micro-nano structure array, each unit at least comprises Part I, the first side that the Part I of grating is formed at substrate is exposed in external environment, Part II imbeds substrate from the first side of substrate, the area being parallel to the cross section of the first side of the Part I of grating reduces to the increase gradually of the distance of the first side gradually with cross section, and the refractive index of the material of described grating is between external environment and the refractive index of base material or equal the refractive index of base material;
Each grating elementary cell also comprises the Part II extended from the basad inside, bottom of Part I and substrate first contacts side surfaces, and the area being parallel to the cross section of the first side of Part II also reduces to the increase gradually of the distance of the first side gradually with cross section;
First side of described substrate is manufactured with the groove that greatly, then opening zooms in gradually, described groove close-packed arrays becomes micro-nano structure array, and the Part II of described grating closely embeds in the groove of the first side.
2. three dimensional grating anti-reflection structure as claimed in claim 1, it is characterized in that, described substrate is semiconductor material, and the material of described grating is the on-dispersive dielectric substance of refractive index between 1 ~ 5.
3. three dimensional grating anti-reflection structure as claimed in claim 1, is characterized in that, described grating is the dipyramid of bottom docking or two prismoid.
4. three dimensional grating anti-reflection structure as claimed in claim 1, it is characterized in that, the interface of described grating Part I and Part II is square, the pass of the size of grating Part I or Part II and the wavelength of incident light is: d < λ < 2.5h, wherein, λ is the wavelength of incident light, and d is the length of side of interface, and h is the height of grating Part I or Part II.
5. the three dimensional grating anti-reflection structure according to any one of claim 1-4, is characterized in that, the Part I of described grating is identical with Part II material and interfaces along both are symmetrical.
6. an anti-light reflector device, is characterized in that comprising:
Illumination layer, described illumination layer has the first side for receiving light incidence;
The grating becoming micro-nano structure array to be formed by grating elementary cell close-packed arrays, each unit at least comprises Part I, the first side that the Part I of grating is formed at substrate is exposed in external environment, Part II imbeds substrate from the first side of substrate, the area being parallel to the cross section of the first side of the Part I of grating reduces to the increase gradually of the distance of the first side gradually with cross section, and the refractive index of the material of described grating is between external environment and the refractive index of illumination layer material or equal the refractive index of illumination layer material;
Each grating elementary cell also comprises the Part II that inside extends from the bottom of Part I and illumination layer first contacts side surfaces to illumination layer, first side of described illumination layer is manufactured with the groove that greatly, then opening zooms in gradually, described groove close-packed arrays becomes micro-nano structure array, the Part II of described grating closely embeds in the groove of the first side, and the area being parallel to the cross section of the first side of grating Part II reduces to the increase gradually of the distance of the first side gradually with cross section.
7. anti-light reflector device as claimed in claim 6, it is characterized in that, the Part I of described grating is identical with Part II material and interfaces along both are symmetrical, the Part I of described grating and Part II are the dipyramid of bottom docking or two prismoid, described interface is square, the pass of the size of grating Part I or Part II and the wavelength of incident light is: d < λ < 2.5h, wherein, λ is the wavelength of incident light, d is the length of side of interface, h is the height of grating Part I or Part II.
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| CN201310233914.8A CN103353626B (en) | 2013-06-13 | 2013-06-13 | Three dimensional grating anti-reflection structure and components and parts |
| PCT/CN2014/079335 WO2014198198A1 (en) | 2013-06-13 | 2014-06-06 | Three-dimensional grating anti-reflection structure and component |
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| CN103353626B (en) * | 2013-06-13 | 2016-04-20 | 北京大学深圳研究生院 | Three dimensional grating anti-reflection structure and components and parts |
| CN103646998B (en) * | 2013-12-16 | 2016-08-17 | 陕西师范大学 | Strengthen the texture transversion malposition method that silicon-film solar-cell light absorbs |
| CN104465821B (en) * | 2014-12-25 | 2017-11-24 | 胡明建 | A kind of design method of conical isometric matrix arranged solar plate |
| TWI737720B (en) | 2017-04-28 | 2021-09-01 | 揚明光學股份有限公司 | Lens |
| CN113866997B (en) * | 2021-09-17 | 2023-10-24 | 深圳技术大学 | Display system |
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| WO2014198198A1 (en) | 2014-12-18 |
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