CN103336390A - Spacer and manufacturing method thereof, substrate and display device - Google Patents
Spacer and manufacturing method thereof, substrate and display device Download PDFInfo
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- CN103336390A CN103336390A CN2013102501931A CN201310250193A CN103336390A CN 103336390 A CN103336390 A CN 103336390A CN 2013102501931 A CN2013102501931 A CN 2013102501931A CN 201310250193 A CN201310250193 A CN 201310250193A CN 103336390 A CN103336390 A CN 103336390A
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- chock insulator
- insulator matter
- substrate
- making
- photosensitive material
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
Abstract
The invention provides a spacer and a manufacturing method thereof, a substrate and a display device and belongs to the technical field of display. The manufacturing method of the spacer comprises the following steps of forming a photosensitive material thin film used for manufacturing the spacer on the substrate, wherein a photosensitive material contains a first transparent polymer or a monomer thereof, the first transparent polymer does not infiltrate the substrate; exposing and developing the photosensitive material thin film, and forming a plurality of spacer graphs with different dimensions on the substrate; and heating the substrate on which the spacer graphs are formed under preset temperature, and then, cooling to enable the spacer graphs to protrude to form the spacers, wherein the spacer graphs with different dimensions form the spacers with different heights. According to the technical scheme provided by the invention, the aperture opening ratio of the display device can be increased, and the production cost can be reduced.
Description
Technical field
The present invention relates to the display technique field, be specifically related to a kind of chock insulator matter and preparation method thereof, substrate and display device.
Background technology
TFT LCD(Thin Film Transistor Liquid Crystal Display, Thin Film Transistor-LCD) display panel is made of array base palte, liquid crystal layer and color membrane substrates usually, for thickness and the homogeneity thereof of controlling liquid crystal layer, usually (Post Spacer is PS) to guarantee that liquid crystal cell is thick to form chock insulator matter at color membrane substrates or array base palte.
The normal crylic acid resin mixture solution that adopts prepares chock insulator matter in the prior art, the principal ingredient of crylic acid resin mixture solution is acryl resin or acryl resin monomer and light trigger etc., the crylic acid resin mixture solution is light sensitive material, the crylic acid resin mixture solution is coated on the substrate, can form chock insulator matter through technologies such as exposure imagings, chock insulator matter preferably is formed with multiple height to realize better support effect.
In order to form the chock insulator matter of multiple height, need to use intermediate tone mask plate or gray tone mask plate (Half-tone mask) to expose.Be example to adopt intermediate tone mask plate or gray tone mask board to explosure, shown in Fig. 1 (a), be coated with crylic acid resin mixture solution 2 on the substrate 3, Half-tone mask1 includes lightproof part, part light transmission part and full impregnated light part, after utilizing this mask plate exposure, shown in Fig. 1 (b), because illumination difference, and it is poor to cause occurring on the crylic acid resin potpourri section, then shown in Fig. 1 (c), the place of being blocked by lightproof part on the substrate 3 is not owing to penetrated by illumination, and top crylic acid resin potpourri is removed after development; On the substrate 3 by light-struck place, because the light intensity of the beam intensity ratio part light transmission part of full impregnated light part is big, the thickness of the crylic acid resin potpourri that keeps after therefore developing is bigger, can form highly bigger main chock insulator matter 4 at the substrate of corresponding full impregnated light part, the substrate in the counterpart light transmission part forms highly less auxilliary chock insulator matter 5.
The method for making of existing chock insulator matter need utilize intermediate tone mask plate or gray tone mask plate to expose, and has increased the complicacy of technology, has improved production cost; And be subjected to the influence of exposure accuracy, the size of chock insulator matter is all bigger, causes the aperture opening ratio of display panel less, has increased cost backlight.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of chock insulator matter and preparation method thereof, substrate and display device, can increase the aperture opening ratio of display device, and can reduce production costs.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme as follows:
On the one hand, provide a kind of method for making of chock insulator matter, comprising:
Be formed for making the photosensitive material film of chock insulator matter at substrate, include in the described photosensitive material and nonwettable first transparent polymer of described substrate or monomer whose;
Described photosensitive material film is carried out exposure imaging, form the chock insulator matter figure of a plurality of different sizes at described substrate;
The substrate that is formed with the chock insulator matter figure is heated under preset temperature, and cooling makes described chock insulator matter figure convex to form chock insulator matter then, and wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
Further, in the above-mentioned method for making, the described photosensitive material film that is formed for making chock insulator matter at substrate comprises:
Form described photosensitive material film at substrate coating photosensitive material solution, include light trigger, first transparent polymer or monomer whose in the described photosensitive material solution.
Further, in the above-mentioned method for making, also include in the described photosensitive material solution with described first transparent polymer and have not wellability and have infiltrating second transparent polymer or monomer whose with described substrate.
Further, in the above-mentioned method for making, described second transparent polymer is acrylic resin.
Further, in the above-mentioned method for making, described preset temperature is greater than the glass transition temperature of described first transparent polymer.
Further, in the above-mentioned method for making, the surface of described first transparent polymer and monomer whose can be 5-50dynes/cm.
Further, in the above-mentioned method for making, described first transparent polymer is styrene resin.
Further, in the above-mentioned method for making, described the substrate that is formed with the chock insulator matter figure is heated, makes described chock insulator matter figure convex to form chock insulator matter and comprise:
The substrate that will be formed with the chock insulator matter figure heats 10s-1800s in 150-300 degree centigrade temperature.
Preferably, can under vacuum environment, heat described substrate.
The embodiment of the invention also provides a kind of chock insulator matter, makes for adopting above-mentioned method for making.
The embodiment of the invention also provides a kind of substrate, has the chock insulator matter that adopts above-mentioned method for making to make.
The embodiment of the invention also provides a kind of display device, comprises aforesaid substrate.
Embodiments of the invention have following beneficial effect:
In the such scheme, the photosensitive material film is carried out exposure imaging forms different size at substrate chock insulator matter figure, afterwards substrate is heated, the molecule setting in motion of first transparent polymer or monomer whose at high temperature, because first transparent polymer and monomer whose and substrate do not soak into, according to surface energy minimum principle, in order to form stable structure, the chock insulator matter figure will convex to form chock insulator matter, can reduce chock insulator matter size in the horizontal direction like this, thereby be conducive to increase the aperture opening ratio of display device; And technical scheme of the present invention can realize forming the chock insulator matter of differing heights by the chock insulator matter figure that forms different size, needn't adopt intermediate tone mask plate or gray tone mask plate to expose, and has reduced the complicacy of technology, can reduce production cost.
Description of drawings
Fig. 1 forms the synoptic diagram of main chock insulator matter and auxilliary chock insulator matter for available technology adopting intermediate tone mask board to explosure;
Fig. 2 is the synoptic diagram of the method for making of embodiment of the invention chock insulator matter.
Reference numeral
1 intermediate tone mask plate, 2 crylic acid resin mixture solutions, 3 substrates
4 main chock insulator matter 5 auxilliary chock insulator matter 6 photosensitive material films
7 styrene resin chock insulator matters, 8 chock insulator matter figures
Embodiment
For technical matters, technical scheme and advantage that embodiments of the invention will be solved is clearer, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
There is following problems in the method for making of existing chock insulator matter: need utilize intermediate tone mask plate or gray tone mask plate to expose, increase the complicacy of technology, improve production cost; And be subjected to the influence of exposure accuracy, the size of chock insulator matter is all bigger, causes the aperture opening ratio of display panel less, has increased cost backlight.Embodiments of the invention provide a kind of chock insulator matter and preparation method thereof, substrate and display device at the problems referred to above in the method for making of existing chock insulator matter, can increase the aperture opening ratio of display device, and can reduce production costs.
The embodiment of the invention provides a kind of method for making of chock insulator matter, comprising:
Be formed for making the photosensitive material film of chock insulator matter at substrate, include in the described photosensitive material and nonwettable first transparent polymer of described substrate or monomer whose;
Described photosensitive material film is carried out exposure imaging, form the chock insulator matter figure of a plurality of different sizes at described substrate;
The substrate that is formed with the chock insulator matter figure is heated under preset temperature, and cooling makes described chock insulator matter figure convex to form chock insulator matter then, and wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
The method for making of chock insulator matter of the present invention, the photosensitive material film is carried out exposure imaging forms different size at substrate chock insulator matter figure, afterwards substrate is heated, the molecule setting in motion of first transparent polymer or monomer whose at high temperature, because first transparent polymer and monomer whose and substrate do not soak into, according to surface energy minimum principle, in order to form stable structure, the chock insulator matter figure will convex to form chock insulator matter, can reduce chock insulator matter size in the horizontal direction like this, thereby be conducive to increase the aperture opening ratio of display device; And technical scheme of the present invention can realize forming the chock insulator matter of differing heights by the chock insulator matter figure that forms different size, needn't adopt intermediate tone mask plate or gray tone mask plate to expose, and has reduced the complicacy of technology, can reduce production cost.
Particularly, in the above-mentioned method for making, the described photosensitive material film that is formed for making chock insulator matter at substrate comprises:
Form described photosensitive material film at substrate coating (spin coating or blade coating) one deck photosensitive material solution, include light trigger in the described photosensitive material solution, and include first transparent polymer or monomer whose.
Further, also can include in the described photosensitive material solution with described first transparent polymer and have not wellability and have infiltrating second transparent polymer or monomer whose with described substrate, the chock insulator matter figure of Xing Chenging is by first transparent polymer or monomer whose like this, second transparent polymer or monomer whose are formed, the molecule setting in motion of first transparent polymer or monomer whose at high temperature, because first transparent polymer and monomer whose and second transparent polymer and monomer whose have not wellability, according to surface energy minimum principle, in order to form stable structure, first transparent polymer wherein or monomer whose will be protruding, also can drive second transparent polymer or monomer whose certain projection is arranged, can reduce chock insulator matter size in the horizontal direction like this, thereby be conducive to increase the aperture opening ratio of display device.
Wherein, described preset temperature need so just can impel the molecule setting in motion of first transparent polymer or monomer whose greater than the glass transition temperature of described first transparent polymer.In order to guarantee that first transparent polymer or monomer whose can form the chock insulator matter of projection, the surface of described first transparent polymer and monomer whose can be 5-50dynes/cm.
Particularly, described second transparent polymer can be the existing acryl resin that is commonly used to make chock insulator matter, described first transparent polymer can be for having not infiltrating styrene resin with acryl resin, described the substrate that is formed with the chock insulator matter figure is heated, makes described chock insulator matter figure convex to form chock insulator matter and be specially:
The substrate that will be formed with the chock insulator matter figure heats 10s-1800s in 150-300 degree centigrade temperature, preferably heat in a vacuum, and after heating, the substrate that will be formed with chock insulator matter is cooled to room temperature, can finish the making of chock insulator matter on the substrate.
The embodiment of the invention also provides a kind of chock insulator matter, makes for adopting above-mentioned method for making.
The embodiment of the invention also provides a kind of substrate, has the chock insulator matter that adopts above-mentioned method for making to make.Described substrate can but be not limited to array base palte, color membrane substrates etc.
The embodiment of the invention also provides a kind of display device, comprises aforesaid substrate.The structure of other parts of display device can be not described in detail this this paper with reference to prior art.This display device can be display panels, Electronic Paper, OLED(Organic Light Emitting Diode, Organic Light Emitting Diode) panel, LCD TV, LCD, digital album (digital photo frame), mobile phone, panel computer etc. have product or the parts of any Presentation Function, as long as need to arrange chock insulator matter on the substrate of display device.
Describe in detail below in conjunction with accompanying drawing and the specific embodiment method for making to chock insulator matter of the present invention:
Embodiment one
Present embodiment can be implemented in the chock insulator matter that forms multiple differing heights on the substrate, and wherein substrate can be array base palte or color membrane substrates.Present embodiment specifically may further comprise the steps:
Step a1: form photosensitive material solution, the principal ingredient of photosensitive material solution is first transparent polymer or monomer whose, light trigger, wherein, first transparent polymer and monomer whose and substrate do not soak into, the molecular weight ranges of first transparent polymer can be several thousand to 1,000,000, particularly, first transparent polymer can be selected styrene resin for use;
Step a2: the spin coating of photosensitive material solution or blade coating are formed one deck photosensitive material film at substrate, wherein, can realize reducing the size of chock insulator matter by the thickness of control photosensitive material film, the thickness of photosensitive material film is more little, and the size of the chock insulator matter of Xing Chenging is also more little at last;
Step a3: the photosensitive material film on the substrate is carried out exposure imaging, at the chock insulator matter figure of a plurality of different sizes of substrate formation, in this step, adopt monotone mask board to explosure to get final product, reduced the complicacy of technology, can reduce production cost.Wherein, the size of chock insulator matter figure is determined by the resolution of exposure machine, does not wait by several microns to tens of microns;
Step a4: the substrate that is formed with the chock insulator matter figure is carried out heat treated, heating-up temperature needs the glass transition temperature greater than styrene resin, particularly, can under 150-300 ℃ temperature, heat 10s-1800s, preferably in a vacuum substrate is heated, can avoid the influence of outer bound pair chock insulator matter like this, reduce the impurity in the chock insulator matter.At high temperature, the molecular motion of styrene resin begins, because styrene resin and substrate do not soak into, interfacial energy each other is bigger, according to surface energy minimum principle, in order to form stable structure, the chock insulator matter figure will convex to form chock insulator matter, the chock insulator matter figure of different size will form the chock insulator matter of differing heights, and the size of chock insulator matter figure is more big, and the height of the chock insulator matter of formation is more big;
Step a5: the substrate that is formed with chock insulator matter is cooled off, preferably be cooled to room temperature in a vacuum, can finish the making of chock insulator matter, obtain being formed with the substrate of chock insulator matter.
Because the principle of mass conservation, the increase of chock insulator matter figure height will cause reducing of size on its horizontal direction, can reduce the size of the last chock insulator matter that forms greatly, thereby be conducive to increase the aperture opening ratio of display device.Present embodiment can be controlled the height of chock insulator matter by the size of control chock insulator matter figure, can form the chock insulator matter of multiple height at substrate, and only need adopt monotone mask board to explosure can realize the making of chock insulator matter, can reduce the complicacy of technology, reduce production cost.
Embodiment two
Present embodiment can be implemented in the chock insulator matter that forms multiple differing heights on the substrate, and wherein substrate can be array base palte or color membrane substrates.Present embodiment specifically may further comprise the steps:
Step b1: form photosensitive material solution, in the existing crylic acid resin mixture solution that is used for preparing chock insulator matter, add first transparent polymer or monomer whose forms photosensitive material solution, wherein, first transparent polymer and acryl resin do not soak into mutually, the molecular weight ranges of first transparent polymer can be several thousand to 1,000,000, particularly, first transparent polymer can be selected styrene resin for use;
Step b2: shown in Fig. 2 (a), the spin coating of photosensitive material solution or blade coating are formed one deck photosensitive material film 6 at substrate 3, wherein, can realize reducing the size of chock insulator matter by the thickness of control photosensitive material film, the thickness of photosensitive material film is more little, and the size of the chock insulator matter of Xing Chenging is also more little at last;
Step b3: shown in Fig. 2 (b), the photosensitive material film 6 on the substrate 3 is carried out exposure imaging, form the chock insulator matter figure 8 of a plurality of different sizes at substrate, in this step, adopt monotone mask board to explosure to get final product, reduced the complicacy of technology, can reduce production cost.Wherein, the size of chock insulator matter figure 8 is determined by the resolution of exposure machine, does not wait by several microns to tens of microns;
Step b4: the substrate 3 that is formed with chock insulator matter figure 8 is carried out heat treated, heating-up temperature needs the glass transition temperature greater than styrene resin, particularly, can under 150-300 ℃ temperature, heat 10s-1800s, preferably in a vacuum substrate is heated, can avoid the influence of outer bound pair chock insulator matter like this, reduce the impurity in the chock insulator matter.At high temperature, the molecular motion of styrene resin and monomer whose begins, because styrene resin and acryl resin have not wellability, interfacial energy each other is bigger, according to surface energy minimum principle, in order to form stable structure, styrene resin in the chock insulator matter figure 8 and monomer whose will be protruding, and acryl resin and substrate have wellability, the styrene resin chock insulator matter 7 of Xing Chenging is shown in Fig. 2 (c) at last, the chock insulator matter figure of different size will form the chock insulator matter of differing heights, and the size of chock insulator matter figure is more big, and the height of the chock insulator matter of formation is more big;
Step b5: the substrate that is formed with chock insulator matter is cooled off, preferably be cooled to room temperature in a vacuum, can finish the making of chock insulator matter, obtain being formed with the substrate of chock insulator matter.
The projection of styrene resin and monomer whose, also can drive acryl resin and monomer whose certain projection is arranged, because the principle of mass conservation, the increase of chock insulator matter figure height will cause reducing of size on its horizontal direction, can reduce the last chock insulator matter size in the horizontal direction that forms like this, thereby be conducive to increase the aperture opening ratio of display device.Present embodiment can be controlled the height of chock insulator matter by the size of control chock insulator matter figure, can form the chock insulator matter of multiple height at substrate, and only need adopt monotone mask board to explosure can realize the making of chock insulator matter, can reduce the complicacy of technology, reduce production cost.
In above-described embodiment, include one or both transparent polymers in the photosensitive material solution, further, can also include two or more transparent polymers in the photosensitive material solution, as long as a kind of transparent polymer and other transparent polymers and the substrate that satisfy wherein do not soak into, in the actual production process, in order to reduce the complicacy of technology, generally speaking, comprise in the photosensitive material solution that one or both transparent polymers get final product.
The above is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (12)
1. the method for making of a chock insulator matter is characterized in that, comprising:
Be formed for making the photosensitive material film of chock insulator matter at substrate, include in the described photosensitive material and nonwettable first transparent polymer of described substrate or monomer whose;
Described photosensitive material film is carried out exposure imaging, form the chock insulator matter figure of a plurality of different sizes at described substrate;
The substrate that is formed with the chock insulator matter figure is heated under preset temperature, and cooling makes described chock insulator matter figure convex to form chock insulator matter then, and wherein, the chock insulator matter figure of different size forms the chock insulator matter of differing heights.
2. the method for making of chock insulator matter according to claim 1 is characterized in that, the described photosensitive material film that is formed for making chock insulator matter at substrate comprises:
Form described photosensitive material film at substrate coating photosensitive material solution, include light trigger in the described photosensitive material solution, and include first transparent polymer or monomer whose.
3. the method for making of chock insulator matter according to claim 2 is characterized in that, also includes in the described photosensitive material solution with described first transparent polymer to have not wellability and have infiltrating second transparent polymer or monomer whose with described substrate.
4. the method for making of chock insulator matter according to claim 3 is characterized in that, described second transparent polymer is acrylic resin.
5. the method for making of chock insulator matter according to claim 1 is characterized in that, described preset temperature is greater than the glass transition temperature of described first transparent polymer.
6. the method for making of chock insulator matter according to claim 1 is characterized in that, the surface of described first transparent polymer and monomer whose can be 5-50dynes/cm.
7. the method for making of chock insulator matter according to claim 1 is characterized in that, described first transparent polymer is styrene resin.
8. the method for making of chock insulator matter according to claim 7 is characterized in that, described the substrate that is formed with the chock insulator matter figure is heated, and makes described chock insulator matter figure convex to form chock insulator matter and comprises:
The substrate that will be formed with the chock insulator matter figure heats 10s-1800s in 150-300 degree centigrade temperature.
9. the method for making of chock insulator matter according to claim 8 is characterized in that, under vacuum environment described substrate is heated.
10. a chock insulator matter is characterized in that, makes as each described method for making among the claim 1-9 for adopting.
11. a substrate is characterized in that, has the chock insulator matter that adopts each described method for making of claim 1-9 to make.
12. a display device is characterized in that, comprises substrate as claimed in claim 11.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310250193.1A CN103336390B (en) | 2013-06-21 | 2013-06-21 | Chock insulator matter and preparation method thereof, substrate and display device |
| PCT/CN2013/080790 WO2014201754A1 (en) | 2013-06-21 | 2013-08-05 | Spacer manufacturing method, substrate, display apparatus, and electronic product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310250193.1A CN103336390B (en) | 2013-06-21 | 2013-06-21 | Chock insulator matter and preparation method thereof, substrate and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103336390A true CN103336390A (en) | 2013-10-02 |
| CN103336390B CN103336390B (en) | 2015-09-09 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310250193.1A Active CN103336390B (en) | 2013-06-21 | 2013-06-21 | Chock insulator matter and preparation method thereof, substrate and display device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103336390B (en) |
| WO (1) | WO2014201754A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105549273A (en) * | 2016-02-03 | 2016-05-04 | 京东方科技集团股份有限公司 | Spacer making method, substrate, display panel and display device |
| CN108983504A (en) * | 2017-05-31 | 2018-12-11 | 京东方科技集团股份有限公司 | Liquid crystal display panel and its manufacturing method, liquid crystal display |
| CN109243304A (en) * | 2018-08-07 | 2019-01-18 | 苏州星烁纳米科技有限公司 | display panel and preparation method thereof |
| CN111065973A (en) * | 2017-09-29 | 2020-04-24 | 富士胶片株式会社 | Method for manufacturing circuit wiring and method for manufacturing touch panel |
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| CN1841193A (en) * | 2005-03-15 | 2006-10-04 | Jsr株式会社 | X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same |
| JP2006284976A (en) * | 2005-04-01 | 2006-10-19 | Jsr Corp | Radiation-sensitive resin composition, protrusion and spacer formed of the same, and liquid crystal display element equipped with them |
| CN1950751A (en) * | 2004-05-06 | 2007-04-18 | Jsr株式会社 | Radiation-sensitive resin composition, spacer, and method of forming the same |
| CN101416103A (en) * | 2006-04-06 | 2009-04-22 | 日立化成工业株式会社 | Ink for forming liquid crystal spacer and liquid crystal display device using such ink |
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- 2013-06-21 CN CN201310250193.1A patent/CN103336390B/en active Active
- 2013-08-05 WO PCT/CN2013/080790 patent/WO2014201754A1/en active Application Filing
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| CN1950751A (en) * | 2004-05-06 | 2007-04-18 | Jsr株式会社 | Radiation-sensitive resin composition, spacer, and method of forming the same |
| CN1841193A (en) * | 2005-03-15 | 2006-10-04 | Jsr株式会社 | X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display member containing the same |
| JP2006284976A (en) * | 2005-04-01 | 2006-10-19 | Jsr Corp | Radiation-sensitive resin composition, protrusion and spacer formed of the same, and liquid crystal display element equipped with them |
| CN101416103A (en) * | 2006-04-06 | 2009-04-22 | 日立化成工业株式会社 | Ink for forming liquid crystal spacer and liquid crystal display device using such ink |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105549273A (en) * | 2016-02-03 | 2016-05-04 | 京东方科技集团股份有限公司 | Spacer making method, substrate, display panel and display device |
| CN108983504A (en) * | 2017-05-31 | 2018-12-11 | 京东方科技集团股份有限公司 | Liquid crystal display panel and its manufacturing method, liquid crystal display |
| US11326101B2 (en) | 2017-05-31 | 2022-05-10 | Boe Technology Group Co., Ltd. | Liquid crystal panel and manufacture method thereof, liquid crystal display device |
| CN111065973A (en) * | 2017-09-29 | 2020-04-24 | 富士胶片株式会社 | Method for manufacturing circuit wiring and method for manufacturing touch panel |
| CN109243304A (en) * | 2018-08-07 | 2019-01-18 | 苏州星烁纳米科技有限公司 | display panel and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103336390B (en) | 2015-09-09 |
| WO2014201754A1 (en) | 2014-12-24 |
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