CN103253870A - Anti-reflection and self-cleaning glass and manufacturing method thereof - Google Patents
Anti-reflection and self-cleaning glass and manufacturing method thereof Download PDFInfo
- Publication number
- CN103253870A CN103253870A CN2013101776706A CN201310177670A CN103253870A CN 103253870 A CN103253870 A CN 103253870A CN 2013101776706 A CN2013101776706 A CN 2013101776706A CN 201310177670 A CN201310177670 A CN 201310177670A CN 103253870 A CN103253870 A CN 103253870A
- Authority
- CN
- China
- Prior art keywords
- glass
- self
- band shape
- soft mold
- impression materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses anti-reflection and self-cleaning glass and a manufacturing method of the glass. A nanocone array structure with sub-wavelength is formed on an impressing material on the glass surface by a nanometer impressing process based on a band soft mould or a nanocone array structure with sub-wavelength is etched on the glass surface by a hard mask, a nanometer impressing with an impressing material based on a band soft mould and a hard mask transferring etching process. The anti-reflection and self-cleaning glass can be applied to the fields of solar battery panels, glass curtain walls, automobile windshields, optical elements and instruments, large-size high-definition panel displays, infrared detectors and the like. The anti-reflection and self-cleaning glass disclosed by the invention has the advantages of high anti-reflection and self-cleaning performance, good durability, high stability, strong severe environment adaptation and low cost, and in particular, the efficient and low-cost mass production of the anti-reflection and self-cleaning glass with extra-large area can be realized.
Description
Technical field
The invention belongs to glass surface processing and technical field of micro-nano manufacture, relate in particular to a kind of antireflection and self-cleaning glass and manufacture method thereof.
Background technology
Antireflection (antireflective) and self-cleaning glass can be subdued the reflection of glass itself effectively, and the transmitance that has increased glass (namely reduces the entire spectrum reflection of incident light, increases transmission, enhance the transparency; Reduce the mirror effect of glass surface, has anti-dazzle function), and having antipollution and self-cleaning advantage, it can effectively improve performance and the quality of solar panel, glass curtain wall, windshield, optical element (lens, micro-eyeglass, camera gun etc.), flat pannel display products such as (touch-screen, televisor screen, smart mobile phone screens etc.).For example, solar panel uses antireflection and self-cleaning glass not only can effectively improve photoelectric transformation efficiency (minimizing reflection, increase the absorption of light), and light efficiency loss (though the solar panel process hydrophobic coating processing that can avoid dirt accumulation to cause, but the solar battery panel surface still accumulates dust and dirt easily, and the light efficiency loss in efficiency can reach 40% after 6 months).The glass curtain wall of Highrise buildings adopts antireflection and self-cleaning glass not only can solve the difficult problem of cleaning glass, but also can solve the light pollution problem that causes owing to glass-reflected.Out of doors or in the bright environment, touch-screen, mobile phone screen, computer monitor screen, digital camera screen etc. all can cause use inconvenience owing to the reflection of glass interface, and (picture is unintelligible, the projection of exterior circumferential environment is arranged, contrast gradient reduction etc.), adopt antireflection and self-cleaning glass not only can effectively eliminate reflection, improve contrast gradient, obtain picture clearly, and its self-cleaning function that has can also effectively be kept out dust, sweat stain stains.Antireflection and self-cleaning glass are used for the front windshield of automobile, outside surface dirt and gravel that not only can the automatically cleaning window, and can eliminate dazzle, strengthen visibility meter, and prevent the internal surface atomizing.Therefore, antireflection and self-cleaning glass have very extensive and huge commercial applications prospect.
Make glass have antireflection at present and/or self-cleaning performance mainly adopts following method: (1) multicoating; (2) anti-reflection film is pasted on the surface; (3) self-assembling antireflective is coated with or/and automatic cleaning coating.But these structures and method make glass only have antireflection or the single function of automatically cleaning usually, are difficult to have simultaneously antireflection and self-cleaning function on the one hand.But also there are many defectives and deficiency.For example multicoating faces following problems: 1. because the introducing of differing materials causes thermodynamics not match or problem such as poor adhesive force has reduced its stability; Although 2. the antireflective property in certain wave band is better usually for this film, can not in than the wide band scope, reduce catoptrical loss; 3. natural material category is limited, can not satisfy actual needs, and particularly continuously this requirement of specific refraction all near 1.4, and does not almost have specific refraction to be in material between 1 and 1.2 as: the specific refraction of magnesium fluoride, silicon nitride, silicon-dioxide; 4. the two kinds of major technique-physical vapor deposition (PVD)s and the chemical vapor deposition (CVD) production cost height that prepare anti-reflection film.The surface paste anti-reflection film have poor adhesive force, poor in timeliness equally, for problems such as environmental compatibility differences.Therefore, the following many problems of method existence such as anti-reflection film are pasted on traditional multicoating and surface: rete is to the tack of substrate surface and the tack problem between the rete; The resist chemical of rete and weather resistance, stability problem; Owing to different expansion mismatch and the condensation lamination problems that cause of thermal expansivity; Between rete and rete and the component between rete and substrate infiltration and diffusion problem; Can not find the suitable membrane layer material; Can't reduce the short-wave band reflectivity; For envrionment temperature and humidity bad adaptability, exist easily to come off and problem such as heat affecting.
Therefore; existing scheme and manufacture method also are difficult to satisfy antireflection and self-cleaning glass performance and requirements of actual production; this has become the bottleneck of restriction antireflection and the extensive promotion and application of self-cleaning glass, how to develop new antireflection and self-cleaning glass structure and method efficient, low-cost large-scale production becomes current pressing for.
Summary of the invention
The objective of the invention is provides a kind of antireflection and self-cleaning glass and manufacture method thereof for overcoming above-mentioned the deficiencies in the prior art, and it is efficient, low-cost, and can be applied to scale operation.
For achieving the above object, the present invention adopts following technical proposals:
A kind of antireflection and self-cleaning glass utilize nano-imprint process based on band shape soft mold to form the nano-cone array structure of sub-wavelength or adopt hard mask and impression materials and shift the nano-cone array structure that etching technics etches sub-wavelength based on nano impression and the hard mask of band shape soft mold at glass surface at the impression materials of glass surface.
Described nanocone is circular cone or pyramid knot or pyramid-like structure, and nanocone bottom surface diameter is 100～300nm, and depth-to-width ratio is 3～12, and the distance between the nanocone bottom center is 100～300nm.
Described band shape soft mold has the circular square or conical characteristic pattern of array depression.
Described impression materials is ultraviolet photochemical polymer materials or sol-gel material or titanic oxide material or earth silicon material.
The manufacture method of a kind of antireflection and self-cleaning glass, it comprises the steps: based on the nano-cone array structure of band shape soft mold nano-imprint process at glass surface formation sub-wavelength
Step (1): pre-treatment, deposit one or more layers hard mask layer at glass surface, form glass substrate;
Step (2): liquid impression materials is coated on the glass substrate;
Step (3): imprinting moulding:
(3-1) at first, the band shape soft mold that utilizes the impression mode will have circular or square recess feature is pressed and is attached on the glass substrate, makes the liquid impression materials extrusion packing that is coated with on the glass substrate in the recess feature of band shape soft mold;
(3-2) liquid impression materials is filled in the recess feature of band shape soft mold fully, and the band shape soft mold after guaranteeing to fill fully remains conformal the contact with impression materials on the glass substrate, utilize the UV curing mode to solidify liquid impression materials, realize the complete curing molding of stamping structure;
(3-3) last, the feature structure of impression curing molding is separated with band shape soft mold, finish the demoulding;
Step (4): utilize etching technics to carry out coining pattern and shift, the etch rate of hard mask material is lower than glass substrate during etching, to obtain the nano-cone array structure of sub-wavelength;
Step (5): aftertreatment.
The etching technics of described step (4) adopts reactive ion etching or inductively coupled plasma etching or wet etching.
The height of nanocone depends on material and the thickness of hard mask in the described step (4).
The manufacture method of a kind of antireflection and self-cleaning glass, it comprises the steps: based on the nano-cone array structure of band shape soft mold nano-imprint process at glass formation sub-wavelength
Step (1): pre-treatment, the adhesion characteristics of increase glass substrate surface;
Step (2): liquid impression materials is coated on glass, and described liquid impression materials is the coated material of glass substrate;
Step (3): imprinting moulding:
(3-1) at first, the band shape soft mold that utilizes the impression mode will have conical shaped depression shape feature is pressed and is attached on the glass substrate, makes the liquid impression materials extrusion packing that is coated with on the glass substrate in the feature pattern of depression;
(3-2) liquid impression materials is filled in the band shape soft mold fully, and the band shape soft mold after guaranteeing to fill fully remains conformal the contact with liquid impression materials on the glass, utilize the UV curing mode to solidify liquid impression materials, realize the complete curing molding of stamping structure;
(3-3) last, the feature structure of impression curing molding is separated with band shape soft mold, finish the demoulding;
Step (4): aftertreatment.
Beneficial effect of the present invention:
The present invention utilizes nano impression and etching to produce the nanocone of sub-wavelength at exposed glass substrate surface, perhaps directly impresses out the nanocone of sub-wavelength at the liquid impression materials (coated material) of glass substrate surface.The nanocone depth-to-width ratio of sub-wavelength is more big, and antireflection and self-cleaning performance are more good.
The present invention adopts the nano-imprint process based on band shape soft mold, it has the efficient height, production cost is low, the coining pattern area big (realizing that rigid substrate meter level scale nanometer is graphical), good demolding performace, die life is long and easy to maintenance, coining pattern high conformity and resolving power height, for the good significant advantage of non-smooth glass substrate adaptability.Overcome classic flat-plate type nano impression efficient low, the impression area little, die life short and defective difficult in maintenance and that can't realize row graphization.Overcome the contour roll forming nano impression and be used for glass substrate (rigid substrate) impression efficient low (ultra-violet curing line contact need is long set time), non-shortcoming for the conformal engagement capacity difference of smooth glass substrate.Solution for the manufacturing of overlarge area antireflection and self-cleaning glass provides a kind of efficient, low-cost mass to make can realize the efficient and low-cost mass production of overlarge area antireflection and self-cleaning glass.
Significant advantage of the present invention is:
(1) realizes wide band, the interior antireflective of big ranges of incidence angles, has good antireflective properties in the wide band scope, because the nanocone body structure provides an aspect ratio (height/diameter of nanocone) that strengthens the photoabsorption optimum shape, it can all play a role to the antireflection of short wavelength light and long wavelength's scattering of light simultaneously;
(2) higher antireflective property shows as reflection that zero level is only arranged (when the characteristic dimension of optical element during much smaller than incident light wave, will only have the Zero-order diffractive ripple) or transmitted light when light wave acts on the sub-wavelength nanostructure;
(3) stable performance, anti-reflective effect is good, especially severe environment adaptability is strong (avoids that the difference owing to shrinkage coefficient causes coming off between multilayer film, defectives such as anti-reflection film poor adhesive force, poor in timeliness are pasted on the surface), be specially adapted to be subjected to bigger visible light and the infrared antireflection devices of such environmental effects such as temperature and humidity;
(4) have good antireflection and self-cleaning performance simultaneously;
(5) can realize graded index;
(6) production cost is low;
(7) production efficiency height can be realized continuous production;
(8) can realize the manufacturing of overlarge area antireflection and self-cleaning glass.
The present invention has overcome the deficiency of methods such as traditional multicoating and surface stickup anti-reflection film, a kind of antireflection and self-cleaning glass of high performance-price ratio is provided, and a kind of production method of technical grade is provided for the manufacturing of overlarge area antireflection and self-cleaning glass.The present invention can be used for solar panel, glass curtain wall, windshield, optical element and instrument (lens, microscope, photographic camera, optical mirror slip etc.), flat pannel display fields such as (touch-screen, televisor screen, smart mobile phone screens etc.).Be particularly suitable for solar panel, glass curtain wall, large size high definition flat pannel display field, and be subjected to fields such as the bigger infrared eye of such environmental effects such as temperature and humidity, high-efficiency solar photovoltaic battery, outdoor and portable demonstration.
Description of drawings
Fig. 1 is antireflection and the self-cleaning glass structural representation that the present invention is based on the glass sheet surface nano patterning;
Fig. 2 is antireflection and the self-cleaning glass structure manufacturing process flow diagram that the present invention is based on the glass sheet surface nano patterning;
Fig. 3 is antireflection and the self-cleaning glass structure manufacturing processed synoptic diagram that the present invention is based on the glass sheet surface nano patterning;
Fig. 4 is the used structural representation based on band shape mould nano-imprinting device of imprinting moulding;
Fig. 5 is antireflection and the self-cleaning glass structural representation that the present invention is based on glass sheet surface coating nano patterning;
Fig. 6 is antireflection and the self-cleaning glass structure manufacturing process flow diagram that the present invention is based on glass sheet surface coating nano patterning;
Fig. 7 is that the antireflection and the self-cleaning glass structure that the present invention is based on glass sheet surface coating nano patterning are made synoptic diagram;
1. wafer-supporting platforms wherein, 2. glass substrate, 3. liquid impression materials, 4. apparatus for coating, 5. impression mechanism, 501. roller platen, 502. demoulding rollers, 503. feeding device I, 504. feeding device II, 6. be with shape soft mold, 7. ultra-violet curing device, 8. feature structure, 9. conformal roller.
Embodiment
The present invention will be further elaborated below in conjunction with drawings and Examples, should be noted that following explanation only is in order to explain the present invention, its content not to be limited.
The present invention can utilize imprinting apparatus shown in Figure 4 to realize.It comprises wafer-supporting platform 1, and glass substrate 2 places on the wafer-supporting platform 1 and synchronous operation with it; Apparatus for coating 4 is uniformly coated on liquid impression materials 3 on the glass substrate 2; Band shape soft mold 6 is connected with feeding device I503, feeding device II504, roller platen 501 and demoulding roller 502 and auxiliary imprinting apparatus running roller separately, and roller platen 501 will be pressed with shape soft mold 6 and is attached on the liquid impression materials 3 of glass substrate 2; Consolidation zone between roller platen 501 and demoulding roller 502 arranges ultra-violet curing device 7, and is positioned at the top of auxiliary imprinting apparatus; Auxiliary imprinting apparatus comprises that at least one impels band shape soft mold 6 and the conformal conformal roller 9 that contacts of substrate.
During use, glass substrate 2 is placed on the wafer-supporting platform 1, utilize apparatus for coating 4 coating impression materials 3 at the glass substrate of handling 2 afterwards, impression gets final product.
Embodiment 1
Form the nanometer conical array array structure of sub-wavelength in exposed glass sheet surface.
As shown in Figure 1, etch the nanometer conical array array structure of sub-wavelength in exposed glass sheet surface, nanocone be shaped as taper shape, bottom surface diameter 180nm, depth-to-width ratio is that the height of 4(nanocone is 880nm), the spacing between the nanocone bottom center (cycle) is 220nm.
Concrete preparation process following (Fig. 2～3):
(1) pre-treatment
1. glass substrate 2 cleans, and uses acetone, ethanol, deionized water ultrasonic cleaning sheet glass respectively 5 minutes, and nitrogen dries up, and oven dry is as Fig. 3 a;
2. the deposited hard mask layer deposits the silicon-dioxide of 300nm as hard mask layer, as Fig. 3 b at glass substrate 2.
(2) liquid impression materials 3 coatings
Adopt bar seam coating process that the uv curable polymers material evenly is coated with and be layered on the silicon-dioxide, thickness is 800nm.
(3) imprinting moulding
1. impress mechanism 5 and exert pressure by 501 pairs of roller platens band shape soft mold 6, under the effect of online contact printing power with liquid impression materials 3 extrusion packings of the ultra-violet curing of coating on the glass substrate 2 in the concave character of band shape soft mold 6;
2. feeding device I503 and feeding device II504 drive band shape soft mold 6 moves to demoulding roller 502 directions, wafer-supporting platform 1 carries sheet glass and the 6 equidirectional motions of band shape soft mold simultaneously, realize 3 pairs of filling fully and uniform spreading of being with shape soft mold 6 concave character of the liquid impression materials of ultra-violet curing by the conformal roller 9 of auxiliary imprinting apparatus, guarantee to fill fully back band shape soft mold 6 and remain good conformal the contact with the liquid impression materials 3 of the ultra-violet curing on the sheet glass.And utilize ultra-violet curing device 7 to solidify the liquid impression materials 3 of liquid ultra-violet curing, realize the curing molding cmpletely of stamping structure;
3. the feature structure 8 of utilizing demoulding roller 502 will impress curing molding is separated from each other with band shape soft mold 6, finishes the demoulding.
As Fig. 3 c.
(4) figure shifts
1. adopt reactive ion etching process, remove the residual layer of coining pattern;
2. the figure with impression is mask, and the feature pattern that adopts the inductively coupled plasma etching technics will be stamped on the ultra-violet curing organic polymer material is transferred on the silicon-dioxide hard mask layer, as Fig. 3 d.
3. be mask with the silicon-dioxide hard mask layer behind the transition diagram, adopt the inductively coupled plasma etching technics to etch the nano-cone array structure at glass surface, as Fig. 3 e.Because the etch rate of hard mask layer is lower than sheet glass, thus etch nanocone at sheet glass, and, being accompanied by the formation of nanocone, hard mask layer is removed simultaneously, and the height of nanocone depends on material and the thickness of hard mask layer.
(5) aftertreatment
1. remove residual silicon-dioxide;
2. clean glass, remove glass surface residue and dirt.
The feature pattern of the described band of present embodiment shape soft mold 6 is the circular port structure.
The described imprinting apparatus of present embodiment is 1MPa to the roller platen applied pressure, and the translational speed of band shape soft mold 6 is 1m/min, and the translational speed of glass substrate is 1m/min.
On the liquid impression materials coating of glass substrate, directly impress out the nanometer conical array array structure of sub-wavelength.
As shown in Figure 5, scribble liquid impression materials coating on sheet glass substrate 2 surfaces, and on coating, directly impress out the nanometer conical array array structure of sub-wavelength, figure be shaped as taper shape, bottom surface diameter 200nm, the depth-to-width ratio of nanocone is that the height of 5(nanocone is 1000nm), the spacing between the nanocone bottom center (cycle) is 260nm.
The described coating of present embodiment is nm TiO 2-base ultra-violet curing transparent liquid impression materials (as add the impression materials that titanium dioxide nano-particle forms in epoxy polymer matrix KATIONBOND OMVE 110707).
Concrete steps following (Fig. 6～7):
(1) pre-treatment
1. glass substrate 2 cleans, and uses acetone, ethanol, deionized water ultrasonic cleaning sheet glass respectively 5 minutes, and nitrogen dries up, oven dry;
2. be coated with the shop silane coupling agent, using silane coupling agent is in order to improve the bonding force of transparent polymer and glass substrate 2, its mechanism of action is that coupling agent at first is hydrolyzed into silanol with the water reaction, the silanol dehydrating condensation becomes behind the oligopolymer hydroxyl with glass surface to form hydrogen bond, the heat treated formation covalent linkage that then dewaters, it should be noted that Heating temperature can not be too high, in order to avoid destroy the organic group on the Siliciumatom.It is 0.5～1% dilute solution that silane coupling agent is made into mass concentration, is coated very thin one deck, thickness 200nm by maxxaedium in cleaning.
(2) liquid impression materials coating
Adopt the roller coat coating process that nm TiO 2-base ultra-violet curing transparent liquid impression materials evenly is coated with and be layered on the glass substrate 2 as coating, thickness is 5 μ m, as Fig. 7 b.
(3) imprinting moulding
1. exert pressure by 501 pairs of roller platens band shape soft mold 6, under the effect of online contact printing power with liquid impression materials 3 extrusion packings of the ultra-violet curing of coating on the glass substrate 2 in the concave character of band shape soft mold 6;
2. feeding device I503 and feeding device II504 drive band shape soft mold 6 moves to demoulding roller 502 directions, wafer-supporting platform 1 carries glass substrate 2 and the 6 equidirectional motions of band shape soft mold simultaneously, realize 3 pairs of filling fully and uniform spreading of being with shape soft mold 6 concave character of the liquid impression materials of ultra-violet curing by auxiliary imprinting apparatus conformal roller, guarantee to fill fully back band shape soft mold 6 and remain good conformal the contact with the liquid impression materials 3 of the ultra-violet curing on the glass substrate 2.And utilize ultra-violet curing device 7 to solidify the liquid impression materials 3 of liquid ultra-violet curing, realize the curing molding cmpletely of stamping structure;
3. the feature structure 8 of utilizing demoulding roller 502 will impress curing molding is separated from each other with band shape soft mold 6, finishes the demoulding.
As Fig. 7 c.
(4) aftertreatment
Structure behind the impression is carried out post curing treatment, guarantees to solidify fully.
The feature pattern of the described band of present embodiment shape soft mold 6 is conical structure.
The described imprinting apparatus of present embodiment is 1.3MPa to the roller platen applied pressure, and the translational speed of band shape soft mold 6 is 1m/min, and the translational speed of glass substrate is 1m/min.
Present embodiment also can adopt following method to carry out surface treatment for the adhesivity between the liquid impression materials 3 of the ultra-violet curing that improves glass substrate 2 and liquid state for glass substrate 2.At first carry out the oxygen gas plasma surface treatment, processing parameter: 100w, 250mTorr, 10min; Heat deposition adhesion promotor Sliquest 187 (GE) subsequently, processing parameter: 140 ℃, 10 minutes.
Though above-mentionedly by reference to the accompanying drawings the specific embodiment of the present invention is described; but be not limiting the scope of the invention; on the basis of technical scheme of the present invention, those skilled in the art do not need to pay various modifications that creative work can make or distortion still in protection scope of the present invention.
Claims (8)
1. an antireflection and self-cleaning glass, it is characterized in that, utilize nano-imprint process based on band shape soft mold to form the nano-cone array structure of sub-wavelength or adopt hard mask and impression materials and shift the nano-cone array structure that etching technics etches sub-wavelength based on nano impression and the hard mask of band shape soft mold at glass surface at the impression materials of glass surface.
2. antireflection as claimed in claim 1 and self-cleaning glass, it is characterized in that described nanocone is circular cone or pyramid knot or pyramid-like structure, nanocone bottom surface diameter is 100～300nm, depth-to-width ratio is 3～12, and the distance between the nanocone bottom center is 100～300nm.
3. antireflection as claimed in claim 1 and self-cleaning glass is characterized in that, described band shape soft mold has the circular square or conical characteristic pattern of array depression.
4. antireflection as claimed in claim 1 and self-cleaning glass is characterized in that, described impression materials is ultraviolet photochemical polymer materials or sol-gel material or titanic oxide material or earth silicon material.
5. the manufacture method of the described antireflection of claim 1 and self-cleaning glass is characterized in that, it forms the nano-cone array structure of sub-wavelength based on band shape soft mold nano-imprint process at glass surface, comprises the steps:
Step (1): pre-treatment, deposit one or more layers hard mask layer at glass surface, form glass substrate;
Step (2): liquid impression materials is coated on the glass substrate;
Step (3): imprinting moulding:
(3-1) at first, the band shape soft mold that utilizes the impression mode will have circular or square recess feature is pressed and is attached on the glass substrate, makes the liquid impression materials extrusion packing that is coated with on the glass substrate in the recess feature of band shape soft mold;
(3-2) liquid impression materials is filled in the recess feature of band shape soft mold fully, and the band shape soft mold after guaranteeing to fill fully remains conformal the contact with impression materials on the glass substrate, utilize the UV curing mode to solidify liquid impression materials, realize the complete curing molding of stamping structure;
(3-3) last, the feature structure of impression curing molding is separated with band shape soft mold, finish the demoulding;
Step (4): utilize etching technics to carry out coining pattern and shift, the etch rate of hard mask material is lower than glass substrate during etching, to obtain the nano-cone array structure of sub-wavelength;
Step (5): aftertreatment.
6. the manufacture method of antireflection as claimed in claim 5 and self-cleaning glass is characterized in that, the etching technics of described step (4) adopts reactive ion etching or inductively coupled plasma etching or wet etching.
7. antireflection as claimed in claim 5 and self-cleaning glass and manufacture method thereof is characterized in that, the height of nanocone depends on material and the thickness of hard mask in the described step (4).
8. the manufacture method of a claim 1 or 4 described antireflections and self-cleaning glass is characterized in that, it forms the nano-cone array structure of sub-wavelength based on band shape soft mold nano-imprint process at glass, comprises the steps:
Step (1): pre-treatment, the adhesion characteristics of increase glass substrate surface;
Step (2): liquid impression materials is coated on glass, and described liquid impression materials is the coated material of glass substrate;
Step (3): imprinting moulding:
(3-1) at first, the band shape soft mold that utilizes the impression mode will have conical shaped depression shape feature is pressed and is attached on the glass substrate, makes the liquid impression materials extrusion packing that is coated with on the glass substrate in the feature pattern of depression;
(3-2) liquid impression materials is filled in the band shape soft mold fully, and the band shape soft mold after guaranteeing to fill fully remains conformal the contact with liquid impression materials on the glass, utilize the UV curing mode to solidify liquid impression materials, realize the complete curing molding of stamping structure;
(3-3) last, the feature structure of impression curing molding is separated with band shape soft mold, finish the demoulding;
Step (4): aftertreatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310177670.6A CN103253870B (en) | 2013-05-14 | 2013-05-14 | A kind of antireflection and self-cleaning glass and manufacture method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310177670.6A CN103253870B (en) | 2013-05-14 | 2013-05-14 | A kind of antireflection and self-cleaning glass and manufacture method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103253870A true CN103253870A (en) | 2013-08-21 |
| CN103253870B CN103253870B (en) | 2016-03-02 |
Family
ID=48958148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310177670.6A Active CN103253870B (en) | 2013-05-14 | 2013-05-14 | A kind of antireflection and self-cleaning glass and manufacture method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103253870B (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465821A (en) * | 2014-12-25 | 2015-03-25 | 胡明建 | Designing method of conical isometric matrix arrangement solar panel |
| CN104600129A (en) * | 2014-12-26 | 2015-05-06 | 上海科慧太阳能技术有限公司 | Antireflection film and preparation method thereof and solar cell with antireflection film |
| CN106966602A (en) * | 2017-04-14 | 2017-07-21 | 信利光电股份有限公司 | Glare proof glass process of preparing and glare proof glass |
| CN107445477A (en) * | 2016-05-23 | 2017-12-08 | 陈玉彬 | Energy-saving glass and manufacturing method thereof |
| CN108751730A (en) * | 2018-08-24 | 2018-11-06 | 福建成达玻璃有限公司 | A kind of production technology of AG glass |
| CN109058933A (en) * | 2018-08-23 | 2018-12-21 | 中山驰马灯饰照明设计工程有限公司 | A kind of antifog compound lampshade of anti-blue light |
| CN109461788A (en) * | 2018-10-22 | 2019-03-12 | 中国科学院上海技术物理研究所 | A kind of visible and short-wave infrared wide spectrum InGaAs detector of back-illuminated emitting |
| CN111472501A (en) * | 2020-04-29 | 2020-07-31 | 青岛鸿志道防水工程技术有限责任公司 | Photovoltaic waterproofing membrane |
| CN111485681A (en) * | 2020-04-29 | 2020-08-04 | 青岛鸿志道防水工程技术有限责任公司 | Building integrated photovoltaic waterproof roll |
| CN112802913A (en) * | 2021-01-11 | 2021-05-14 | 浙江师范大学 | Surface-textured solar glass self-cleaning anti-reflection structure and method |
| CN113156551A (en) * | 2021-04-22 | 2021-07-23 | 西北农林科技大学 | Method for manufacturing stable self-cleaning fly-eye lens |
| CN113740940A (en) * | 2021-09-06 | 2021-12-03 | 长春理工大学 | Wide-bandwidth angle anti-reflection composite micro-nano structure surface and preparation method thereof |
| CN114114474A (en) * | 2021-09-06 | 2022-03-01 | 长春理工大学 | Damage-resistant wide-angle antireflection composite micro-nano structure and preparation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060245062A1 (en) * | 2005-04-28 | 2006-11-02 | Hewlett-Packard Development Co., L.P. | Optical system with nanoscale projection antireflection layer/embossing |
| CN101858995A (en) * | 2009-04-09 | 2010-10-13 | 通用电气公司 | Nanostructured anti-reflection coatings and correlation technique and device |
| WO2012088209A2 (en) * | 2010-12-20 | 2012-06-28 | The Regents Of The University Of California | Superhydrophobic and superoleophobic nanosurfaces |
| CN102866582A (en) * | 2012-09-29 | 2013-01-09 | 兰红波 | Nanometer impression device and nanometer impression method for high-brightness light-emitting diode (LED) graphics |
| WO2013012466A2 (en) * | 2011-04-21 | 2013-01-24 | Massachusetts Institute Of Technology | Process for making nanocone structures and using the structures to manufacture nanostructured glass |
| CN203256144U (en) * | 2013-05-14 | 2013-10-30 | 青岛博纳光电装备有限公司 | Anti-reflection and seal-cleaning glass |
-
2013
- 2013-05-14 CN CN201310177670.6A patent/CN103253870B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060245062A1 (en) * | 2005-04-28 | 2006-11-02 | Hewlett-Packard Development Co., L.P. | Optical system with nanoscale projection antireflection layer/embossing |
| CN101858995A (en) * | 2009-04-09 | 2010-10-13 | 通用电气公司 | Nanostructured anti-reflection coatings and correlation technique and device |
| WO2012088209A2 (en) * | 2010-12-20 | 2012-06-28 | The Regents Of The University Of California | Superhydrophobic and superoleophobic nanosurfaces |
| WO2013012466A2 (en) * | 2011-04-21 | 2013-01-24 | Massachusetts Institute Of Technology | Process for making nanocone structures and using the structures to manufacture nanostructured glass |
| CN102866582A (en) * | 2012-09-29 | 2013-01-09 | 兰红波 | Nanometer impression device and nanometer impression method for high-brightness light-emitting diode (LED) graphics |
| CN203256144U (en) * | 2013-05-14 | 2013-10-30 | 青岛博纳光电装备有限公司 | Anti-reflection and seal-cleaning glass |
Non-Patent Citations (1)
| Title |
|---|
| 兰洪波等: "常温纳米压印软模具变形机理研究", 《中国科学 E辑：技术科学》 * |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465821B (en) * | 2014-12-25 | 2017-11-24 | 胡明建 | A kind of design method of conical isometric matrix arranged solar plate |
| CN104465821A (en) * | 2014-12-25 | 2015-03-25 | 胡明建 | Designing method of conical isometric matrix arrangement solar panel |
| CN104600129A (en) * | 2014-12-26 | 2015-05-06 | 上海科慧太阳能技术有限公司 | Antireflection film and preparation method thereof and solar cell with antireflection film |
| CN107445477B (en) * | 2016-05-23 | 2019-12-03 | 陈玉彬 | Method for manufacturing energy-saving glass |
| CN107445477A (en) * | 2016-05-23 | 2017-12-08 | 陈玉彬 | Energy-saving glass and manufacturing method thereof |
| CN106966602A (en) * | 2017-04-14 | 2017-07-21 | 信利光电股份有限公司 | Glare proof glass process of preparing and glare proof glass |
| CN109058933A (en) * | 2018-08-23 | 2018-12-21 | 中山驰马灯饰照明设计工程有限公司 | A kind of antifog compound lampshade of anti-blue light |
| CN109058933B (en) * | 2018-08-23 | 2022-04-15 | 中山驰马灯饰照明设计工程有限公司 | Prevent antifog compound lamp shade of blue light |
| CN108751730B (en) * | 2018-08-24 | 2021-08-03 | 福建成达玻璃有限公司 | Production process of AG glass |
| CN108751730A (en) * | 2018-08-24 | 2018-11-06 | 福建成达玻璃有限公司 | A kind of production technology of AG glass |
| CN109461788A (en) * | 2018-10-22 | 2019-03-12 | 中国科学院上海技术物理研究所 | A kind of visible and short-wave infrared wide spectrum InGaAs detector of back-illuminated emitting |
| CN111485681A (en) * | 2020-04-29 | 2020-08-04 | 青岛鸿志道防水工程技术有限责任公司 | Building integrated photovoltaic waterproof roll |
| CN111472501A (en) * | 2020-04-29 | 2020-07-31 | 青岛鸿志道防水工程技术有限责任公司 | Photovoltaic waterproofing membrane |
| CN112802913A (en) * | 2021-01-11 | 2021-05-14 | 浙江师范大学 | Surface-textured solar glass self-cleaning anti-reflection structure and method |
| CN113156551A (en) * | 2021-04-22 | 2021-07-23 | 西北农林科技大学 | Method for manufacturing stable self-cleaning fly-eye lens |
| CN113740940A (en) * | 2021-09-06 | 2021-12-03 | 长春理工大学 | Wide-bandwidth angle anti-reflection composite micro-nano structure surface and preparation method thereof |
| CN114114474A (en) * | 2021-09-06 | 2022-03-01 | 长春理工大学 | Damage-resistant wide-angle antireflection composite micro-nano structure and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103253870B (en) | 2016-03-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103253870B (en) | A kind of antireflection and self-cleaning glass and manufacture method thereof | |
| CN105514188B (en) | A kind of antireflective self-cleaning film and preparation method thereof | |
| US11127870B2 (en) | Wear-resistant self-cleaning solar cell panel having inverted microstructure filled with superhydrophobic nanomaterial | |
| TWI615641B (en) | Solar battery module and manufacturing method thereof | |
| US9469083B2 (en) | Inverted nanocone structures for multifunctional surface and its fabrication process | |
| CN104681645A (en) | Method for preparing composite transparent conductive electrode based on metal grid and metal nano-wire | |
| JP2015106712A (en) | Method for manufacturing solar cell, and solar cell produced by the same | |
| CN103235483A (en) | Large-area nanometer imaging device and large-area nanometer imaging method | |
| CN102617045A (en) | SiO2 antireflection thin film and preparation method thereof | |
| WO2008120783A1 (en) | Water-and-oil-repellent antifouling antireflection film, process for producing the same, lens, glass plate, and glass each having the same, and optical device, apparatus for utilizing solar energy, and display each employing these | |
| US20140174521A1 (en) | Surface-textured conductive glass for solar cells, and preparation method and application thereof | |
| CN103762272B (en) | Porous silicon is the method for the flexible antireflection layer of template preparation | |
| Liu et al. | Self-cleaning antireflective coating with a hierarchical texture for light trapping in micromorph solar cells | |
| Khan et al. | A mini review: Antireflective coatings processing techniques, applications and future perspective | |
| CN106966603A (en) | A kind of preparation method of high transmission rate photovoltaic coated glass | |
| CN103594555B (en) | A kind of preparation method with the black silicon material of self-cleaning function | |
| CN105399340A (en) | Super-hydrophobic high-transmittance SiO2 anti-reflecting thin film and preparation method thereof | |
| CN203256144U (en) | Anti-reflection and seal-cleaning glass | |
| CN103048707A (en) | Method for producing sub-wavelength antireflection structure and compression moulding method of sub-wavelength antireflection structure | |
| WO2008120782A1 (en) | Water-and-oil-repellent antifouling antireflection film, process for producing the same, and lens, glass plate, glass, optical device, apparatus for utilizing solar energy, and display | |
| CN107827367A (en) | A kind of preparation method with anti-dazzle anti-reflection function plate glass | |
| JP2009087912A (en) | Manufacturing method of colorless and transparent fto membrane utilizing polymer aftertreatment process | |
| US20230365457A1 (en) | High transparency, high haze nanostructured structures | |
| CN1817812A (en) | Production of self-cleaning glass | |
| CN104143582A (en) | Method for manufacturing hydrophobic component, hydrophobic component and photovoltaic device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |