CN103186058B - Mask platform system with six-degree-of-freedom coarse drive platform - Google Patents
Mask platform system with six-degree-of-freedom coarse drive platform Download PDFInfo
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- CN103186058B CN103186058B CN201310048778.5A CN201310048778A CN103186058B CN 103186058 B CN103186058 B CN 103186058B CN 201310048778 A CN201310048778 A CN 201310048778A CN 103186058 B CN103186058 B CN 103186058B
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Abstract
A mask platform system with a six-degree-of-freedom coarse drive platform is mainly used in a photoetching system. The system comprises the coarse drive platform, a fine drive platform and a rack, wherein the coarse drive platform comprises a coarse drive platform body, a drive device and a coarse drive platform gravity balance component, the coarse drive platform body is arranged at the outer part of the fine drive platform to surround the fine drive platform in the middle, and the drive device comprises two groups of X-direction linear motors distributed symmetrically around the direction of an X-axis and four groups of two-degree-of-freedom linear motors driving a Y-direction and a Z-direction to achieve the six-degree-of-freedom motion of the coarse drive platform. The six-degree-of-freedom coarse drive platform and the six-degree-of-freedom fine drive platform are matched, so that the speed, acceleration and control bandwidth of a mask platform are increased and the requirements of high motion precision and location precision are met while the posture of the mask platform is regulated, and furthermore, the production rate, the alignment precision and the resolution ratio of a photoetching machine are improved.
Description
Technical field
The present invention relates to mask aligner mask platform system, this system is mainly used in semiconductor lithography machine, belongs to semiconductor manufacturing equipment technical field.
Background technology
In the production run of integrated circuit (IC) chip, the exposure transfer printing (photoetching) of design configuration on silicon chip surface photoresist of chip is wherein one of most important operation, and this operation equipment used is called litho machine (exposure machine).The resolution of litho machine and exposure efficiency affect characteristic line breadth (resolution) and the throughput rate of integrated circuit (IC) chip greatly.And as the kinematic accuracy of the reticle stage system of litho machine critical system and work efficiency, determine again resolution and the exposure efficiency of litho machine to a great extent.
Advanced scanning projecting photoetching machine ultimate principle is: from light source deep UV (ultraviolet light) through the mask in mask platform, lens combination by a part of pattern imaging on mask on certain Chip of silicon chip.For carrying out the exposure of a chip on silicon chip, mask platform and silicon wafer stage need carry out accelerated motion respectively, and reach the speed of the 4:1 required by scan exposure when moving to exposure reference position simultaneously.After this, silicon wafer stage moves to scanning motion direction with uniform speed, mask platform does scanning motion with the speed being four times in silicon wafer stage sweep velocity to the opposite direction with silicon wafer stage scanning motion, both movement needs reach synchronously split hair, and the whole pattern imagings the most at last on mask are in the certain chip (Chip) of silicon chip.When after a chip end of scan, mask platform and silicon wafer stage carry out retarded motion respectively, and silicon wafer stage carries out step motion simultaneously, is moved to below projection objective by the chip that the next one will expose.After this, mask platform is accelerated to the direction contrary with last scan direction of motion, scan, slow down, and silicon wafer stage then accelerates according to the direction of planning, scanning, slow down, and completes the exposure of a chip in synchronous scanning process.So constantly repeat, mask platform comes and goes the rectilinear motion carrying out accelerating, scanning, slow down, and silicon wafer stage carries out stepping and scanning motion according to the track of planning, completes the exposure of whole silicon chip.
According to the movement needs to mask platform, mask platform mainly provides the function coming and going ultraprecise high-speed straight-line along direction of scanning and move.Its stroke should meet 4 times of chip length and add the distance of acceleration and deceleration; Its sweep velocity should be 4 times of silicon wafer stage sweep velocity, and most high acceleration also accordingly can higher than the most high acceleration of silicon wafer stage.According to the technical indicator of external typical litho machine commodity, the stroke of mask platform is more than 100mm (type had reaches 200mm), and sweep velocity reaches 1000mm/s, and most high acceleration reaches 20m/s
2, i.e. 2g.Improve sweep velocity and the acceleration (silicon wafer stage also synchronously improves) of mask platform, effectively can improve the throughput rate of litho machine.
Most importantly, mask platform must be able to realize and being synchronized with the movement of the superhigh precision of silicon wafer stage scanning motion, for 45nm litho machine, its synchronization accuracy requires that MA (moving average deviation) is less than 2.25nm, and MSD (mobile standard deviation) is less than 5.4nm.Wherein, the alignment precision of MA major effect exposure, MSD major effect exposure resolution ratio.
In order to meet mask platform Long Distances and at a high speed, high-precision rigors, traditional reticle stage system adopts slightly usually-drives structure of smart fold layer.Reticle stage system is moved platform by coarse motion platform and superposition essence thereon and is formed.Wherein, coarse motion platform adopts the two-sided driving system of the high speed and large stroke of left linear electric motors and right linear electric motors composition to drive, and air-float guide rail supports; The dynamic platform of essence is then driven by the voice coil motor of X-direction and the voice coil motor of Y-direction, mask platform is carried out to the fine setting of real-time high-precision, meets the requirement of its kinematic accuracy.This lamination drives structure is when moving, and the bilateral drive structure of the reciprocating bottom linear electric motors of single-degree-of-freedom, adopts air-float guide rail supporting, complex structure, assembly precision requires high, thus limits the kinematic accuracy of mask platform, hampers the raising of its acceleration.
Summary of the invention
In order to improve the acceleration of mask aligner mask platform, speed and positioning precision, and then the raising of the throughput rate of promotion litho machine, alignment precision and resolution, reduce assembly precision requirement, the object of this invention is to provide a kind of reticle stage system with six-degree-of-freedom coarse platform.
Technical scheme of the present invention is as follows:
A kind of reticle stage system with six-degree-of-freedom coarse platform, this system comprises essence dynamic platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body and drive unit, it is characterized in that: described coarse motion platform stage body is arranged on the outside of the dynamic platform of essence, essence is moved platform and is enclosed in centre; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, Long Distances driver module is made up of the X-direction linear electric motors that two groups are arranged symmetrically in coarse motion platform stage body both sides about X-direction, little stroke driver module drives the two-freedom linear electric motors of Y-direction and Z-direction to form by four groups simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body both sides about X-direction between two, and are positioned at below Long Distances driver module;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, two described coarse motion platform gravitational equilibrium arrangement of components are above coarse motion platform stage body, coarse motion platform stage body both sides are arranged symmetrically in along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board and two coarse motion platform gravitational equilibrium permanent magnets, the permanent magnet array of coarse motion platform gravitational equilibrium magnetic conductive board and X-direction linear electric motors links together, coarse motion platform gravitational equilibrium permanent magnet is arranged in coarse motion platform stage body upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave gap with coarse motion platform gravitational equilibrium magnetic conductive board.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention, is characterized in that: described each X-direction linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and two two-freedom linear electric motors of homonymy share one group of permanent magnet array in X direction; Four groups of permanent magnet arrays of X-direction linear electric motors and two groups of permanent magnet arrays of two-freedom linear electric motors are all fixed on the surface level in frame; Two groups of coil arrays of X-direction linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body respectively.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention, is characterized in that: described essence is moved platform and comprised essence dynamic platform stage body, Lorentz motors and essence and move platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention, it is characterized in that: described essence is moved platform gravity compensation assembly and comprised four essences and move platform gravity compensation unit, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board and an essence by an essence and moves platform gravitational equilibrium permanent magnet and form, four described essences are moved platform gravity compensation unit and are distributed on four angles of the dynamic platform stage body of essence respectively, and wherein four essences are moved platform gravitational equilibrium magnetic conductive board and are separately fixed on coarse motion platform stage body; Four essences are moved platform gravitational equilibrium permanent magnet and are separately fixed on the dynamic platform stage body of essence, and to move the position of platform gravitational equilibrium magnetic conductive board corresponding with essence, simultaneously and essence move between platform gravitational equilibrium magnetic conductive board and leave gap.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention, is characterized in that: described coarse motion platform stage body is thin-wall case, is made up of thyrite.It is thin-wall case that described essence moves platform stage body, is made up of thyrite.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention, is characterized in that: the one-dimensional array that the coil array of two groups of described X-direction linear electric motors and the coil array of four groups of two-freedom linear electric motors are all made up of iron-core-free square coil; The permanent magnet array of described two groups of X-direction linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
A kind of reticle stage system with six-degree-of-freedom coarse platform of the present invention has the following advantages and high-lighting effect: 1. compared with the traditional masks platform adopting air-float guide rail to support, mask platform of the present invention adopts magnetic suspension bearing, simplify system architecture, avoid the vibration & noise that air supporting is introduced, and the condition of high vacuum degree environment that can meet needed for extreme ultraviolet photolithographic, and the attractive force of magnetic levitation system balances mask platform and appendicular most gravity thereof.2. compared with the bilateral driving junction structure of traditional single-degree-of-freedom coarse motion platform, the structure of six-degree-of-freedom coarse platform of the present invention, add the flexibility of mover in system, both the matching requirements of system had been reduced, also improve the response speed of mask platform, acceleration and motion positions precision, thus improve the throughput rate of litho machine, alignment precision and resolution.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation with the reticle stage system of six-degree-of-freedom coarse platform of the present invention.
Fig. 2 is the structural representation of the dynamic platform gravitational equilibrium assembly of coarse motion platform gravitational equilibrium assembly of the present invention and essence.
Fig. 3 is the structural representation after a kind of reticle stage system X-direction linear electric motors with six-degree-of-freedom coarse platform of the present invention remove the first permanent magnet array.
Fig. 4 is the structural representation after a kind of coil with the reticle stage system two-freedom linear electric motors of six-degree-of-freedom coarse platform of the present invention removes side the 3rd permanent magnet array.
Fig. 5 is a kind of schematic three dimensional views with the iron-less core coil adopted in the reticle stage system of six-degree-of-freedom coarse platform of the present invention.
Fig. 6 is a kind of schematic diagram with X-direction line motor permanent magnet array magnetizing direction in the reticle stage system of six-degree-of-freedom coarse platform of the present invention.
Fig. 7 is a kind of schematic diagram with two-freedom line motor permanent magnet array magnetizing direction in the reticle stage system of six-degree-of-freedom coarse platform of the present invention.
In figure: the dynamic platform stage body of 1-essence; 2-coarse motion platform stage body; 3-the first X-direction linear electric motors; 4-the second X-direction linear electric motors; 5-the first two-freedom linear electric motors; 6-the second two-freedom linear electric motors; 7-the three two-freedom linear electric motors; 8-the four two-freedom linear electric motors; 11-coarse motion platform gravitational equilibrium magnetic conductive board; 12-coarse motion platform gravitational equilibrium permanent magnet; 13-first coil array; 14-second largest coil array; 15-the first small coil array; 16-the second small coil array; 17-the three small coil array; 18-the four small coil array; 21-the first permanent magnet array; 22-the second permanent magnet array; 23-the three permanent magnet array; The dynamic platform gravitational equilibrium magnetic conductive board of 31-essence; The dynamic platform gravitational equilibrium permanent magnet of 32-essence.
Embodiment
Below in conjunction with accompanying drawing, concrete structure of the present invention, mechanism and the course of work are further described.
A kind of reticle stage system with six-degree-of-freedom coarse platform provided by the invention, as depicted in figs. 1 and 2, this system comprises coarse motion platform, the dynamic platform of essence and frame, and coarse motion platform contains a coarse motion platform stage body 2, drive unit and two coarse motion platform gravitational equilibrium assemblies; Coarse motion platform stage body 2 is enclosed within the outside of the dynamic platform of essence, is thin-wall case, is sintered make by thyrite; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, as shown in figures 4 a and 4b.Long Distances driver module is arranged symmetrically in the first X-direction linear electric motors 3 of coarse motion platform stage body 2 both sides by two groups about X-direction and the second X-direction linear electric motors 4 form, and is responsible for driving mask platform coarse motion platform to do Long Distances linear reciprocating motion in the X direction, little stroke driver module is then the first two-freedom linear electric motors 5 simultaneously driving Y-direction and Z-direction by four groups, second two-freedom linear electric motors 6, 3rd two-freedom linear electric motors 7 and the 4th two-freedom linear electric motors 8 form, these four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body 2 both sides between two about X-direction, and be positioned at below Long Distances driver module, four groups of described two-freedom linear electric motors are responsible for regulating mask platform coarse motion platform in the little travel displacement of Y-axis and Z-direction, and around X-axis, the rotation among a small circle of the anglec of rotation of the three degree of freedom that Y-axis and Z axis rotate, adopt the control algolithm of decomposing based on d-q, X-direction linear electric motors can be made only to provide the thrust of X-direction, and the thrust of Y and Z-direction is close to zero, Y and Z-direction linear electric motors only produce the thrust of Y-direction and Z-direction, and the thrust of X-direction is close to zero,
Two described coarse motion platform gravitational equilibrium assemblies are arranged symmetrically in coarse motion platform stage body both sides about X-direction, and each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board 11 and two coarse motion platform gravitational equilibrium permanent magnets 12.Each coarse motion platform gravitational equilibrium magnetic conductive board 11 links together with the stationary part of the X-direction linear electric motors of the same side, two coarse motion platform gravitational equilibrium permanent magnets 12 are arranged on coarse motion platform stage body 2 respectively along on side two angles of X-direction, and retain certain gap with coarse motion platform gravitational equilibrium magnetic conductive board 11;
Each X-direction linear electric motors is by first permanent magnet array 21, second permanent magnet array 22 and one group of large coil array composition; Each two-freedom linear electric motors is made up of the 3rd permanent magnet array 23 and one group of small coil array, and two two-freedom linear electric motors of homonymy share one group of the 3rd permanent magnet array 23 in X direction; Described all X-direction linear electric motors first permanent magnet arrays 21 and the 3rd permanent magnet array 23 of the second permanent magnet array 22 and all two-freedom linear electric motors are all fixed on the surface level in litho machine frame; Described all large coil array and small coil array are separately fixed on coarse motion platform stage body 2;
The large coil array of the X-direction linear electric motors of coarse motion of the present invention and the small coil array of two-freedom linear electric motors are all by the one-dimensional array adopting the iron-core-free square coil (as shown in Figure 5) of the concentric coiling of copper cash to form, and the support of coil adopts nonferromagnetic parts (as aluminium alloy) to make;
First permanent magnet array 21 of the X-direction linear electric motors of coarse motion of the present invention and the second permanent magnet array 22 are bonding one group of one dimension halbach type permanent magnet arrays adopting rectangular parallelepiped rare-earth permanent magnet to arrange on the square thin yoke of a block length, the volume of the permanent magnet that the first permanent magnet array 21 is parallel with array direction with magnetizing direction in the second permanent magnet array 22 is less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 6, " N " in figure, " S " represents N pole and the S pole of permanent magnet, and now the magnetizing direction of permanent magnet is perpendicular to paper.3rd permanent magnet array 23 of described two-freedom linear electric motors is also bonding one group of plane halbach type permanent magnet array adopting rectangular parallelepiped rare-earth permanent magnet to arrange on the square thin yoke of a block length, and in the 3rd permanent magnet array 23, the volume of the permanent magnet that magnetizing direction is parallel with array direction is also less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 7).
The dynamic platform of essence is six-freedom micro displacement worktable, comprises essence dynamic platform stage body 1, Lorentz motors and essence and moves platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body 1 of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body 1 of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body 1 of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously;
The dynamic platform gravity compensation assembly of essence comprises four groups of dynamic platform gravity compensation unit of essence, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board 31 and an essence by an essence and moves platform gravitational equilibrium permanent magnet 32 and form, the described dynamic platform gravity compensation cell distribution of four groups of essences is moved on four angles of platform stage body 1 in essence, wherein all essences are moved platform gravitational equilibrium magnetic conductive board 31 and are fixed on coarse motion platform stage body 2, all essences are moved platform gravitational equilibrium permanent magnet 32 and are fixed on the position that the smart each essence moving correspondence on platform stage body 1 moves platform gravitational equilibrium magnetic conductive board 31, and move platform gravitational equilibrium magnetic conductive board with essence there is certain gap, the dynamic platform stage body 1 of essence is thin-wall case, be made up of thyrite,
A kind of reticle stage system of the present invention, the unloading phase that its working stage being divided into, normal work stage and stop phase, altogether three phases.Unloading phase principle of work as follows: system electrification start before, the attractive force of gravity balance device is less than the gravity of mask platform coarse motion platform and the dynamic platform of essence, and mask platform stops at a little more than on the fixing station in the litho machine frame of the second permanent magnet array 22 upper surface.After system electrification starts, four two-freedom linear electric motors provide Z-direction thrust upwards, promote coarse motion platform subpart and move upward to working position, then in the mask platform course of work, regulate coarse motion platform subpart along the position of Z-direction on the one hand, and the attitude of the rotation around X-direction and these two degree of freedom of the rotation around Y-direction, coordinate gravity balance device balance coarse motion platform subpart to be also mask platform and appendicular gravity thereof on the other hand, make coarse motion platform subpart and the dynamic platform of essence be in suspended state all the time.Meanwhile, four two-freedom linear electric motors provide the thrust of Y-direction, the attitude of adjustment coarse motion platform subpart and the dynamic translation of platform along Y-axis of essence and two degree of freedom of the rotation around Z axis, make coarse motion platform subpart and the dynamic position required by Delta to work of essence and attitude, and aforementioned five degree of freedom are regulated in real time in the whole course of work, meet the positioning requirements of system to these five degree of freedom.Then, two X-direction linear electric motors adopt bilateral type of drive, drive coarse motion platform subpart to be also that coarse motion platform subpart and the dynamic platform of essence carry out acceleration, deceleration and at the uniform velocity to-and-fro movement in X direction, reach the operating rate of system requirements, the work unloading phase of completing.
After this, system enters normal work stage, and drive unit is finely tuned the speed of coarse motion platform subpart and the dynamic platform of essence and attitude in X-direction linear electric motors perform region, meets the speed of system to it and the requirement of position, simultaneously the energy dissipation of bucking-out system.When coarse motion platform subpart and the dynamic platform of essence move to the+latter end of X-direction stroke, X-direction linear electric motors decelerating operation is to stopping, then oppositely accelerate again, coarse motion platform subpart and the dynamic platform of essence is made to move to the latter end of the trip to-X-direction, X-direction linear electric motors decelerating operation, to stopping, circulating and so forth.
At stop phase, above coarse motion platform subpart and the dynamic static station of platform low-speed motion of essence, then all drive units coordinate deceleration to be parked on static station.
Reticle stage system of the present invention adopts magnetic suspension bearing, does not need air-flotation system, simplifies system architecture, avoids the vibration & noise that air supporting is introduced, and can meet the condition of high vacuum degree environment needed for extreme ultraviolet photolithographic.
On the other hand, compared with traditional thick smart fold Rotating fields, reticle stage system of the present invention provides a kind of coarse motion platform structure with six-freedom motion function, both ensure that the thrust of scanning motion and improve kinematic accuracy, again reduce the high precision matching requirements of coarse motion platform, under the condition not changing kinematic accuracy, enormously simplify the accuracy requirement of parts design and manufacture, improve the throughput rate of litho machine, alignment precision and resolution.
Claims (7)
1. one kind has the reticle stage system of six-degree-of-freedom coarse platform, this system comprises essence dynamic platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body (2) and drive unit, it is characterized in that: described coarse motion platform stage body (2) is arranged on the outside of the dynamic platform of essence, essence is moved platform and is enclosed in centre; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, Long Distances driver module is made up of the X-direction linear electric motors that two groups are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction, little stroke driver module drives the two-freedom linear electric motors of Y-direction and Z-direction to form by four groups simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction between two, and are positioned at below Long Distances driver module;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, two described coarse motion platform gravitational equilibrium arrangement of components are in coarse motion platform stage body (2) top, coarse motion platform stage body (2) both sides are arranged symmetrically in along X-direction, each coarse motion platform gravitational equilibrium assembly comprises coarse motion platform gravitational equilibrium magnetic conductive board (11) and two coarse motion platform gravitational equilibriums permanent magnet (12), coarse motion platform gravitational equilibrium magnetic conductive board (11) links together with the permanent magnet array of X-direction linear electric motors, coarse motion platform gravitational equilibrium permanent magnet (12) is arranged in coarse motion platform stage body (2) upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave gap with coarse motion platform gravitational equilibrium magnetic conductive board (11).
2. according to a kind of reticle stage system with six-degree-of-freedom coarse platform according to claim 1, it is characterized in that: described each X-direction linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and two two-freedom linear electric motors of homonymy share one group of permanent magnet array in X direction; Four groups of permanent magnet arrays of X-direction linear electric motors and two groups of permanent magnet arrays of two-freedom linear electric motors are all fixed on the surface level in frame; Two groups of coil arrays of X-direction linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body (2) respectively.
3. according to a kind of reticle stage system with six-degree-of-freedom coarse platform described in claim 1 or 2, it is characterized in that: described essence is moved platform and comprised essence dynamic platform stage body (1), Lorentz motors and essence and move platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body (1) of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body (1) of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body (1) of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously.
4. according to a kind of reticle stage system with six-degree-of-freedom coarse platform according to claim 3, it is characterized in that: described essence is moved platform gravity compensation assembly and comprised four essences and move platform gravity compensation unit, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board (31) and an essence by an essence and moves platform gravitational equilibrium permanent magnet (32) and form, four described essences are moved platform gravity compensation unit and are distributed on four angles of the dynamic platform stage body (1) of essence respectively, wherein four essences are moved platform gravitational equilibrium magnetic conductive board (31) and are separately fixed on coarse motion platform stage body (2), four essences are moved platform gravitational equilibrium permanent magnet (32) and are separately fixed on the dynamic platform stage body (1) of essence, and with essence, to move the position of platform gravitational equilibrium magnetic conductive board (31) corresponding, simultaneously and essence move between platform gravitational equilibrium magnetic conductive board and leave gap.
5. according to a kind of reticle stage system with six-degree-of-freedom coarse platform according to claim 1, it is characterized in that: described coarse motion platform stage body (2) is thin-wall case, is made up of thyrite.
6. according to a kind of reticle stage system with six-degree-of-freedom coarse platform according to claim 3, it is characterized in that: it is thin-wall case that described essence moves platform stage body (1), is made up of thyrite.
7. according to a kind of reticle stage system with six-degree-of-freedom coarse platform according to claim 2, it is characterized in that: the one-dimensional array that the coil array of two groups of described X-direction linear electric motors and the coil array of four groups of two-freedom linear electric motors are all made up of iron-core-free square coil; The permanent magnet array of described two groups of X-direction linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
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| CN105024519B (en) * | 2014-04-25 | 2018-06-01 | 上海微电子装备（集团）股份有限公司 | A kind of ironless linear motors |
| CN103926805A (en) * | 2014-04-28 | 2014-07-16 | 清华大学 | Planar motor-driven coarse motion and fine motion integrated mask platform |
| CN103929097A (en) * | 2014-04-30 | 2014-07-16 | 清华大学 | Six-degree-of-freedom magnetic suspension movement platform |
| CN104049472B (en) * | 2014-06-30 | 2016-03-30 | 清华大学 | A kind of electromagnetic launch starts formula reticle stage system |
| CN105319989B (en) * | 2015-11-19 | 2018-06-15 | 清华大学 | A kind of minimum method for planning track of permanent magnetism ejection mask platform ejection zone motor output |
| CN113885298B (en) * | 2021-09-22 | 2022-06-17 | 哈尔滨工业大学 | Magnetic suspension type mask table of photoetching machine |
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