CN103165395B - A kind of adjusting device of movement section of ion beam - Google Patents
A kind of adjusting device of movement section of ion beam Download PDFInfo
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- CN103165395B CN103165395B CN201110428208.XA CN201110428208A CN103165395B CN 103165395 B CN103165395 B CN 103165395B CN 201110428208 A CN201110428208 A CN 201110428208A CN 103165395 B CN103165395 B CN 103165395B
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- electrode
- preposition
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- rearmounted
- ion beam
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Abstract
The invention discloses a kind of adjusting device of movement section of ion beam, primarily of preposition electrode, to electrode a and b, rearmounted electrode composition.Preposition and rearmounted electrode is for reducing the electric field of electrode a, b to exosmosis.With on electrode b, different voltage is added to electrode a.When ion beam is in the process of moving to electrode a, b, the distance of each ion process is identical, but because different to the voltage of electrode a, b, ion, different to the run duration of electrode a with b, cause ion beam to leave and changes to cross section during electrode b.By changing the Interface Shape of electrode a and b and voltage, make ion beam can form specific shape to during electrode b leaving.In addition, can use by plural serial stage as required, various dimensions adjustment is carried out to ion beam.
Description
Technical field
The present invention relates generally to field of mass spectrometry, especially flight time mass spectrum.
A kind of adjusting device of movement section of ion beam is provided, is placed in the field-free flight district of flight time mass spectrum, weakens the rigging error of instrument, make ion can arrive detector as far as possible simultaneously, improve mass spectrographic resolution.
Background technology
Mass spectrum is a kind of a kind of analysis tool very important in modern physics, biological and chemical field.Be applied in the industries such as elementary analysis, food security, petrochemical industry, medicine, vacuum exploration widely at present.Flight time mass spectrum flight time mass spectrum has that structure is simple, analysis speed is fast, the quality testing upper limit only by advantages such as ion detector restrictions, makes it to become one of promising mass spectrum of current most.
This mass spectrometric mass analyzer is an ion drift tube.The ion produced by ion source enters field-free drift pipe after accelerating, and flies to ion acceptor with constant speed.Mass of ion is larger, and arrive the receiver time used longer, mass of ion is less, arrives the receiver time used shorter, according to this principle, the ion of different quality can be separated by m/z value size.The major defect of this time-of-flight mass spectrometer is that resolution is lower, because ion primary power when leaving at ion source is different, there is certain distribution the time making the ion with identical mass-to-charge ratio reach detector, causes resolution capability to decline.
Simultaneously in field of mass spectrometry, the existence of instrument rigging error, especially the manufacturing and positioning errors of detector, the ion of identical mass-to-charge ratio can be caused can not to arrive detector simultaneously, cause the broadening of spectrogram and the reduction of resolution, and high-resolution mass spectrum, the impact of rigging error on resolution is more obvious.Therefore need to modulate ion beam, make ion can arrive detector as far as possible simultaneously, improve mass spectrographic resolution.In order to make ion arrive detector simultaneously, traditional method carries out high accuracy processing to the vitals of instrument, reduces error.But there is certain deficiency, first high-precision device fabrication, have very high requirement to process technology, the course of processing wastes time and energy, and the wasting of resources easily causing precision not up to standard; Secondly, simple high-precision device can not ensure the resolution of instrument, also needs high-precision assembling, and this installs traditional craft is again a huge challenge.
Summary of the invention
The object of this invention is to provide a kind of adjusting device of movement section of ion beam.
For achieving the above object, the technical solution used in the present invention is:
An adjusting device for movement section of ion beam, comprises preposition electrode, to electrode a, to electrode b and rearmounted electrode;
Described preposition electrode and rearmounted electrode are metal plate-like electrode that is parallel, that be oppositely arranged, are provided with the through hole of penetrating electrode plate body in the middle part of metal plate-like electrode; Be coaxial round metal tubular electrodes that arrange, two end openings to electrode a with to electrode b, be placed between preposition electrode and rearmounted electrode to electrode a with to electrode b, and to electrode a and coaxial with the through hole on preposition electrode and rearmounted electrode to electrode b;
The end face to electrode a of described close preposition electrode and the plane end face of electrode b being parallel to preposition electrode near rearmounted electrode; To electrode a with to electrode b equal diameters, spaced setting, to electrode a be ellipsoid to end face mutually close between electrode b, their ellipsoid parallels, the plane residing for ellipsoid and the Plane intersects residing for preposition electrode.To electrode a with equal to the corresponding points spacing of end face mutually close between electrode b;
Described rearmounted electrode is provided with ion detector away to the side of electrode b, and ion detector is connected with outside signal analyzer by wire;
Described preposition electrode is provided with ion source away to the side of electrode a, and the ion that ion source produces passes from the hole preposition electrode.Be applied with different electromotive forces to electrode a with to electrode b, the electromotive force of applying is not all higher than the energy of ion self; Preposition electrode applies identical or close electromotive force with rearmounted electrode, and the electromotive force of applying is relevant to the electromotive force outside two electrodes;
Describedly to be parallel to each other to electrode a with to two ellipsoids of the intermediary interface of electrode b; The spacing of both upper corresponding points is at 0.1mm ~ 100mm;
Described is arranged to electrode a with to electrode b is coaxial in pairs between preposition electrode and rearmounted electrode, and the coaxial logarithm arranged is 1, more than 2 or 3; Their plural serial stages of more than 2, realize ion beam multidimensional regulate;
The advantage of this practicality invention is:
1. reduce the requirement to high accuracy processing and assembling.
2. adopt without wire-grid structure, losses of ions is few.
3. structure is simple, convenient disassembly.
4. plural serial stage uses, and carries out multiple adjustment to ion beam.
Accompanying drawing explanation
The schematic diagram of the adjusting device of a kind of movement section of ion beam of Fig. 1: the preposition electrode of 1-; 2-is to electrode a; 3-is to electrode b; The rearmounted electrode of 4-;
Fig. 2 said apparatus is positioned over the schematic diagram before detector: 5-detector;
Fig. 3 said apparatus not making alive time ion arrive the schematic diagram before detector: 6-ion source;
Schematic diagram during Fig. 4 said apparatus making alive before ion arrival detector.
Embodiment
The present invention is used for the adjustment of a certain moment movement section of ion beam, and ion enters from preposition electrode (1), through to electrode a2 with to after electrode b3, leaves from rearmounted electrode 4.
Preposition electrode 1 and rearmounted electrode 4 for reduce to electrode a2 and to electrode b3 electric field to exosmosis.The end face to electrode a2 near preposition electrode 1 and the plane end face of electrode b3 being parallel to preposition electrode 1 near rearmounted electrode 4; To electrode a2 with to electrode b3 equal diameters, spaced setting, to electrode a2 be ellipsoid to end face mutually close between electrode b3, their ellipsoid parallels, the plane residing for ellipsoid and the Plane intersects residing for preposition electrode 1.To electrode a2 with equal to the corresponding points spacing of end face mutually close between electrode b3.The spacing of interface is at 0.1mm ~ 100mm.In addition, can being given shape to electrode a2 with to the interface of electrode b 3, forming specific shape for making ion beam.
Ion is by electrode a2 and the time used to electrode b3 being:
t＝L
a/V
a+L
b/V
b
L
a+ L
b=definite value
To electrode a 2 with to voltage different added by electrode b 3, for regulating ion in the speed to the motion in electrode.Although ion is all enter from preposition electrode 1, leave from rearmounted electrode 4, the distance of experience is identical, and because ion is different with to the movement velocity of electrode b3 to electrode a2, ion is passed by different to the time that electrode is used.The ion of the identical mass-to-charge ratio of synchronization diverse location access to plant, it passes through electrode a2 with not identical to the time needed for electrode b3, by changing the voltage to electrode a2, b3, the flight time of the ion of diverse location can be regulated, make it leave electrode b3 with specified time interval.Make the ion of different tracks different to the run duration in electrode a2 with b3 by changing to the shape of electrode, thus ion beam is reached to the object carrying out adjusting shape to ion beam.
Arrange to electrode a2 with to electrode b3 is coaxial in pairs between preposition electrode 1 and rearmounted electrode 4, the coaxial logarithm arranged is 1, more than 2 or 3; Their plural serial stages of more than 2, realize ion beam multidimensional regulate.
Embodiment 1
The position of MCP detector reality and desirable position is caused to there are some deviations, before adjusting device being positioned over the detector of flight time, for correcting the impact of rigging error because MCP detector produces error in assembling process.Overall instrument is as shown in Figure 2: when not adding any voltage to adjusting device, a branch of speed is that the ion of 200eV flies to detector, as shown in Figure 3, although ion flies to detector at grade, but due to the rigging error of MCP detector, cause ion to arrive detector successively, thus make the signal peak broadening of generation flight time mass spectrum, the decline of resolution.
Suppose that detector causes itself and horizontal over glaze x to have 0.2 ° of angle due to rigging error, the ellipsoid of electrode is paralleled with the x-axis of the cross surface of detector with the face of level.The diameter of detector is 50mm, then the time interval that error can cause detector the top and nethermost ion to produce is Δ t=Δ about S/V=2 ~ 5ns.This is very large concerning impact high resolution mass spectrum.To positive voltage electrode b adding 25V, can be found out by Simion simulation, cross sectional shape during ion beam arrival detector there occurs change, and ion can reach detector simultaneously.As shown in Figure 4, after to positive voltage electrode b adding 25V, locus schematic diagram when ion is about to arrive detector residing for a certain moment ion, although MCP assembling there is error but ion reaches detector simultaneously, thus efficiently reduce originally due to the rigging error impact caused that causes ion can not arrive detector simultaneously, improve the resolution of instrument.
Same reason, supposes that detector causes itself and vertical plane axle y to have angle, if paralleled with the y-axis of vertical plane with the cross surface of detector the ellipsoid of electrode due to rigging error.Then produce vertical direction error in tunable detector assembling process.
Embodiment 2
Position and its direction of detector can with the angles with x-axis, the angle of y-axis, and apart from ionogenic positional representation.When three amounts are determined, position and the direction of detector are just determined.The direction of detector and desirable there is error initial conplane ion can be caused simultaneously can not to arrive detector.
That the deflection error of detector can be decomposed into horizontal plane and vertical plane.When coaxially arranging during to electrode a with to electrode b two couples between preposition electrode 1 and rearmounted electrode 4, regulate detector horizontal plane respectively with vertical plane error, just can realize the error of any direction of generation during calibration detector assembling.
Claims (7)
1. an adjusting device for movement section of ion beam, is characterized in that: comprise preposition electrode (1), to electrode a (2), to electrode b (3) and rearmounted electrode (4);
Preposition electrode (1) is metal plate-like electrode that is parallel, that be oppositely arranged with rearmounted electrode (4), is provided with the through hole of penetrating electrode plate body in the middle part of metal plate-like electrode;
Be coaxial round metal tubular electrodes that arrange, two end openings to electrode a (2) with to electrode b (3), be placed between preposition electrode (1) and rearmounted electrode (4) to electrode a (2) with to electrode b (3), and to electrode a (2) and coaxial with the through hole on preposition electrode (1) and rearmounted electrode (4) to electrode b (3);
The end face to electrode a (2) near preposition electrode (1) and the plane end face of electrode b (3) being parallel to preposition electrode (1) near rearmounted electrode (4);
To electrode a (2) with to electrode b (3) equal diameters, spaced setting, to electrode a (2) be ellipsoid to end face mutually close between electrode b (3), their ellipsoid parallels, the plane residing for ellipsoid and the Plane intersects residing for preposition electrode (1).
2. device according to claim 1, is characterized in that: to electrode a (2) with equal to the corresponding points spacing of end face mutually close between electrode b (3).
3. device according to claim 1 and 2, is characterized in that: rearmounted electrode (4) is provided with ion detector away to the side of electrode b (3), and ion detector is connected with outside signal analyzer by wire.
4. device according to claim 1 and 2, is characterized in that: preposition electrode (1) is provided with ion source away to the side of electrode a (2), and the ion that ion source produces passes from the hole preposition electrode (1).
5. device according to claim 1, is characterized in that: be applied with different electromotive forces to electrode a (2) with to electrode b (3), and the electromotive force of applying is not all higher than the energy of ion self;
Preposition electrode (1) and rearmounted electrode (4) apply identical or close electromotive force, and the electromotive force of applying is relevant to the electromotive force outside two electrodes.
6. device according to claim 1, is characterized in that: be parallel to each other to electrode a (2) with to two ellipsoids of the intermediary interface of electrode b (3); The spacing of both upper corresponding points is at 0.1mm ~ 100mm.
7. device according to claim 1, is characterized in that:
Described forms coaxial setting to electrode a (2) with to electrode b (3) in pairs between preposition electrode (1) and rearmounted electrode (4), and the coaxial logarithm arranged is 1, more than 2 or 3; Their plural serial stages of more than 2, realize ion beam multidimensional regulate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110428208.XA CN103165395B (en) | 2011-12-19 | 2011-12-19 | A kind of adjusting device of movement section of ion beam |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110428208.XA CN103165395B (en) | 2011-12-19 | 2011-12-19 | A kind of adjusting device of movement section of ion beam |
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| CN103165395A CN103165395A (en) | 2013-06-19 |
| CN103165395B true CN103165395B (en) | 2015-08-05 |
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| CN201110428208.XA Expired - Fee Related CN103165395B (en) | 2011-12-19 | 2011-12-19 | A kind of adjusting device of movement section of ion beam |
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| GB201808459D0 (en) * | 2018-05-23 | 2018-07-11 | Thermo Fisher Scient Bremen Gmbh | Ion front tilt correction for time of flight(tof) mass spectrometer |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737538A (en) * | 1993-07-19 | 1995-02-07 | Jeol Ltd | Compound charged particle beam device |
| JPH088187A (en) * | 1995-05-16 | 1996-01-12 | Shimadzu Corp | Semiconductor element fabricating apparatus |
| CN101118833A (en) * | 2007-09-29 | 2008-02-06 | 宁波大学 | Four prismoids shaped four-grade mass spectrometer |
| CN102047391A (en) * | 2008-03-28 | 2011-05-04 | 瓦里安半导体设备公司 | Techniques for improved uniformity tuning in an ion implanter system |
| CN202352612U (en) * | 2011-12-19 | 2012-07-25 | 中国科学院大连化学物理研究所 | Regulation device for ion beam movement section |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4690641B2 (en) * | 2003-07-28 | 2011-06-01 | 株式会社日立ハイテクノロジーズ | Mass spectrometer |
| US7372042B2 (en) * | 2005-08-31 | 2008-05-13 | Agilent Technologies, Inc. | Lens device for introducing a second ion beam into a primary ion path |
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2011
- 2011-12-19 CN CN201110428208.XA patent/CN103165395B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737538A (en) * | 1993-07-19 | 1995-02-07 | Jeol Ltd | Compound charged particle beam device |
| JPH088187A (en) * | 1995-05-16 | 1996-01-12 | Shimadzu Corp | Semiconductor element fabricating apparatus |
| CN101118833A (en) * | 2007-09-29 | 2008-02-06 | 宁波大学 | Four prismoids shaped four-grade mass spectrometer |
| CN102047391A (en) * | 2008-03-28 | 2011-05-04 | 瓦里安半导体设备公司 | Techniques for improved uniformity tuning in an ion implanter system |
| CN202352612U (en) * | 2011-12-19 | 2012-07-25 | 中国科学院大连化学物理研究所 | Regulation device for ion beam movement section |
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