CN103080254A - 无机氧化物涂层 - Google Patents
无机氧化物涂层 Download PDFInfo
- Publication number
- CN103080254A CN103080254A CN2011800400085A CN201180040008A CN103080254A CN 103080254 A CN103080254 A CN 103080254A CN 2011800400085 A CN2011800400085 A CN 2011800400085A CN 201180040008 A CN201180040008 A CN 201180040008A CN 103080254 A CN103080254 A CN 103080254A
- Authority
- CN
- China
- Prior art keywords
- coating
- mox
- inorganic
- coating composition
- precursors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 135
- 239000011248 coating agent Substances 0.000 title claims abstract description 127
- 229910052809 inorganic oxide Inorganic materials 0.000 title claims abstract description 89
- 239000008199 coating composition Substances 0.000 claims abstract description 88
- 239000002243 precursor Substances 0.000 claims abstract description 77
- 239000000203 mixture Substances 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims abstract description 41
- 239000007788 liquid Substances 0.000 claims abstract description 20
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 18
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010936 titanium Substances 0.000 claims abstract description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052706 scandium Inorganic materials 0.000 claims abstract description 9
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 9
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 8
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000010955 niobium Substances 0.000 claims abstract description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 7
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052738 indium Inorganic materials 0.000 claims abstract description 7
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 7
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052718 tin Inorganic materials 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 53
- 239000002105 nanoparticle Substances 0.000 claims description 23
- 239000011258 core-shell material Substances 0.000 claims description 22
- 239000002904 solvent Substances 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- 239000011148 porous material Substances 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 11
- 239000004411 aluminium Substances 0.000 claims description 10
- 229910052765 Lutetium Inorganic materials 0.000 claims description 7
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 claims description 7
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 6
- 229910052775 Thulium Inorganic materials 0.000 claims description 6
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims description 6
- 230000003667 anti-reflective effect Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 18
- 230000007062 hydrolysis Effects 0.000 abstract description 17
- 230000008569 process Effects 0.000 abstract description 9
- 239000006117 anti-reflective coating Substances 0.000 abstract 1
- 229910052747 lanthanoid Inorganic materials 0.000 abstract 1
- 150000002602 lanthanoids Chemical class 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 63
- 239000002585 base Substances 0.000 description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 30
- 150000001875 compounds Chemical class 0.000 description 24
- 239000010410 layer Substances 0.000 description 20
- 239000011257 shell material Substances 0.000 description 18
- 239000007787 solid Substances 0.000 description 16
- 239000000126 substance Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 11
- 238000001723 curing Methods 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- 229920000620 organic polymer Polymers 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 239000005357 flat glass Substances 0.000 description 7
- 239000003352 sequestering agent Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- -1 alkoxide compound Chemical class 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- 150000004703 alkoxides Chemical class 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000002296 dynamic light scattering Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000084 colloidal system Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 229960001866 silicon dioxide Drugs 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000000469 dry deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 238000009998 heat setting Methods 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000642 polymer Chemical class 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ROGIWVXWXZRRMZ-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1 ROGIWVXWXZRRMZ-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 150000000914 Dysprosium Chemical class 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052773 Promethium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 159000000013 aluminium salts Chemical class 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229920006125 amorphous polymer Polymers 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000002051 biphasic effect Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000003421 catalytic decomposition reaction Methods 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- VYQRBKCKQCRYEE-UHFFFAOYSA-N ctk1a7239 Chemical compound C12=CC=CC=C2N2CC=CC3=NC=CC1=C32 VYQRBKCKQCRYEE-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000011415 microwave curing Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000013110 organic ligand Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- 239000006069 physical mixture Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000000371 solid-state nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Sustainable Development (AREA)
- Inorganic Chemistry (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Geochemistry & Mineralogy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Composite Materials (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Sustainable Energy (AREA)
- Dispersion Chemistry (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
实验 | 硝酸盐 | 2天 | 33天 | 51天 |
A | - | 0% | 6% | 12% |
B | 铝 | 2% | 23% | 26% |
1 | 铥 | 2% | 6% | 14% |
2 | 钇 | 2% | 10% | 12% |
3 | 镝 | 1% | 9% | 11% |
4 | 钆 | 0% | 10% | 14% |
5 | 钕 | 2% | 12% | 16% |
6 | 镥 | 0% | 10% | 12% |
Claims (18)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10166452.2 | 2010-06-18 | ||
EP10166452 | 2010-06-18 | ||
PCT/EP2011/060106 WO2011157820A1 (en) | 2010-06-18 | 2011-06-17 | Inorganic oxide coating |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103080254A true CN103080254A (zh) | 2013-05-01 |
CN103080254B CN103080254B (zh) | 2016-08-03 |
Family
ID=43064730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180040008.5A Active CN103080254B (zh) | 2010-06-18 | 2011-06-17 | 无机氧化物涂层 |
Country Status (14)
Country | Link |
---|---|
US (1) | US9605156B2 (zh) |
EP (1) | EP2582764B1 (zh) |
JP (3) | JP2013533909A (zh) |
KR (1) | KR101887245B1 (zh) |
CN (1) | CN103080254B (zh) |
AU (1) | AU2011267007B2 (zh) |
BR (1) | BR112012032375A2 (zh) |
CA (1) | CA2800928A1 (zh) |
ES (1) | ES2538660T3 (zh) |
MY (1) | MY160973A (zh) |
PL (1) | PL2582764T3 (zh) |
SI (1) | SI2582764T1 (zh) |
TW (1) | TWI565757B (zh) |
WO (1) | WO2011157820A1 (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106497162A (zh) * | 2016-10-25 | 2017-03-15 | 嘉善蓝欣涂料有限公司 | 一种用于钢铁工件表面的保护性涂料 |
CN107567430A (zh) * | 2015-05-04 | 2018-01-09 | 里奥玻璃太阳能有限公司 | 用于太阳能反射器的涂层玻璃 |
CN109575649A (zh) * | 2018-11-14 | 2019-04-05 | 东莞南玻太阳能玻璃有限公司 | 一种具备抗灰功能的太阳能玻璃减反射涂料及其制备方法及抗灰高增透太阳能玻璃 |
CN109852105A (zh) * | 2013-11-22 | 2019-06-07 | 帝斯曼知识产权资产管理有限公司 | 制备抗反射涂料组合物的方法和由其制备的多孔涂层 |
CN110099880A (zh) * | 2016-08-19 | 2019-08-06 | 吉凯恩航空透明系统有限公司 | 透明的疏水性混合氧化物涂料和方法 |
CN110520484A (zh) * | 2017-04-18 | 2019-11-29 | 帝斯曼知识产权资产管理有限公司 | 涂料和涂料配方 |
CN111849219A (zh) * | 2019-09-23 | 2020-10-30 | 法国圣戈班玻璃公司 | 一种涂料分散液,其制备方法、由其获得的产品 |
CN112480712A (zh) * | 2020-12-01 | 2021-03-12 | 佛山市东鹏陶瓷有限公司 | 一种白色防静电粉料和防静电涂料及其制备方法 |
CN112789251A (zh) * | 2018-10-16 | 2021-05-11 | 帝斯曼知识产权资产管理有限公司 | 涂层和涂层制剂 |
CN112840000A (zh) * | 2018-10-16 | 2021-05-25 | 帝斯曼知识产权资产管理有限公司 | 涂料和涂料配方产品 |
US11053163B2 (en) | 2016-08-19 | 2021-07-06 | GKN Aerospace Transparency Systems, Inc. | Transparent hydrophobic mixed oxide coatings and methods |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2761202T3 (es) | 2012-05-22 | 2020-05-19 | Dsm Ip Assets Bv | Nanopartículas orgánicas-inorgánicas híbridas |
EP2882540B1 (en) | 2012-08-09 | 2017-12-27 | DSM IP Assets B.V. | Roll coating process |
US20140161989A1 (en) * | 2012-12-12 | 2014-06-12 | Intermolecular, Inc. | Anti-Glare Using a Two-Step Texturing Process |
US20140186613A1 (en) * | 2012-12-27 | 2014-07-03 | Guardian Industries Corp. | Anti-reflection coatings with self-cleaning properties, substrates including such coatings, and related methods |
RU2518612C1 (ru) * | 2013-03-12 | 2014-06-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Российский химико-технологический университете им. Д.И. Менделеева (РХТУ им. Д.И. Менделеева) | Способ получения покрытий на основе диоксида кремния |
JP6826985B2 (ja) * | 2015-10-01 | 2021-02-10 | 日本板硝子株式会社 | コーティング膜付きガラス板及びその製造方法 |
EP3387413A1 (en) | 2015-12-11 | 2018-10-17 | DSM IP Assets B.V. | System and method for optical measurements on a transparent sheet |
EP3211122A1 (en) | 2016-02-23 | 2017-08-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | A method of sintering, crystallizing and/or crosslinking of a coating material on a substrate |
JP2018058914A (ja) * | 2016-09-30 | 2018-04-12 | 富士フイルム株式会社 | 多孔質膜形成用組成物、多孔質膜形成用組成物の製造方法、多孔質膜の製造方法、積層体、及び太陽電池モジュール |
WO2018105243A1 (ja) * | 2016-12-07 | 2018-06-14 | 日本電気株式会社 | 塗料および塗料の固化物 |
US20190256720A1 (en) * | 2018-02-22 | 2019-08-22 | Ppg Industries Ohio, Inc. | Anti-fouling, multi-layer coated sapphire articles |
EP3640303A1 (en) | 2018-10-16 | 2020-04-22 | DSM IP Assets B.V. | Coating and coating formulation |
KR102638489B1 (ko) * | 2019-12-24 | 2024-02-21 | 내셔날 인스티튜트 오브 어드밴스드 인더스트리얼 사이언스 앤드 테크놀로지 | 유기 수식 금속 산화물 나노 입자, 그 제조 방법, euv 포토레지스트 재료 및 에칭 마스크의 제조 방법 |
TW202205433A (zh) * | 2020-06-19 | 2022-02-01 | 日商東京威力科創股份有限公司 | 蝕刻方法、基板處理裝置及基板處理系統 |
CN115812068A (zh) | 2021-06-29 | 2023-03-17 | 法国圣戈班玻璃厂 | 具有包含纳米嵌入物的溶胶-凝胶涂层的玻璃板 |
FR3138031A1 (fr) * | 2022-07-19 | 2024-01-26 | Lvmh Recherche | Procédé de synthèse de nanocapsules, composition cosmétique et procédé cosmétique |
CN115228434B (zh) * | 2022-07-21 | 2023-09-01 | 南京信息工程大学 | 一种表面包裹γ-Al2O3:Dy3+颗粒的碳纳米管吸附剂及其制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5585186A (en) * | 1994-12-12 | 1996-12-17 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective, and anti-fogging properties |
EP1077236A1 (en) * | 1999-08-16 | 2001-02-21 | Nissan Chemical Industries Ltd. | Modified metal oxide sol, coating composition and optical element |
EP0934912B1 (en) * | 1998-02-06 | 2006-06-28 | Libbey-Owens-Ford Co. | Anti-reflective films |
CN101421022A (zh) * | 2006-01-16 | 2009-04-29 | 荷兰能源建设基金中心 | 具有高水热稳定性的微孔分子分离膜 |
WO2010043653A1 (en) * | 2008-10-14 | 2010-04-22 | Dsm Ip Assets B.V. | Stain resistant particles |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2432484A (en) | 1943-03-12 | 1947-12-09 | American Optical Corp | Reflection reducing coating having a gradually increasing index of refraction |
US4446171A (en) | 1982-02-12 | 1984-05-01 | Owens-Illinois, Inc. | Process of making glass articles having antireflective coating |
US4830879A (en) | 1986-09-25 | 1989-05-16 | Battelle Memorial Institute | Broadband antireflective coating composition and method |
JP2802435B2 (ja) * | 1989-03-24 | 1998-09-24 | 品川燃料株式会社 | コーテイング用組成物 |
US5100471A (en) | 1990-06-27 | 1992-03-31 | Xerox Corporation | Liquid ink compositions |
JP3212124B2 (ja) * | 1991-04-04 | 2001-09-25 | 川崎製鉄株式会社 | 高融点金属鋳造用のロストワックス鋳型フェースコート材料およびそれを用いた鋳型による鋳造品の製造方法 |
JP2716330B2 (ja) | 1992-11-13 | 1998-02-18 | セントラル硝子株式会社 | 低反射ガラスおよびその製法 |
JP3635692B2 (ja) | 1994-10-20 | 2005-04-06 | 日産化学工業株式会社 | 低屈折率反射防止膜 |
US5858462A (en) | 1995-08-14 | 1999-01-12 | Central Glass Company, Limited | Porous metal-oxide thin film and method of forming same on glass substrate |
DE19642419A1 (de) | 1996-10-14 | 1998-04-16 | Fraunhofer Ges Forschung | Verfahren und Beschichtungszusammensetzung zur Herstellung einer Antireflexionsbeschichtung |
FR2774994B1 (fr) | 1998-02-13 | 2000-05-05 | Rhodia Chimie Sa | Particules composites comprenant un coeur a base d'un polymere organique contenant une matiere active et un revetement externe a base d'au moins un oxyde et/ou un hydroxyde, leur procede de preparation et leurs utilisations |
DE19918811A1 (de) | 1999-04-26 | 2000-11-02 | Fraunhofer Ges Forschung | Vorgespanntes, mit einer wischfesten, porösen SiO¶2¶-Antireflex-Schicht versehenes Sicherheitsglas u. Verfahren z. d. Herstellung |
JP2000351917A (ja) * | 1999-06-09 | 2000-12-19 | Asahi Glass Co Ltd | 酸化物膜形成用塗布液、酸化物膜形成方法および酸化物膜付き基体 |
JP2001072926A (ja) * | 1999-06-28 | 2001-03-21 | Mitsubishi Materials Corp | ペロブスカイト型酸化物薄膜形成用原料溶液 |
DE19933098A1 (de) * | 1999-07-15 | 2001-01-18 | Herberts Gmbh & Co Kg | Mit Nanopartikeln modifizierte Bindemittel für Überzugsmittel und deren Verwendung |
JP3865589B2 (ja) * | 2000-02-16 | 2007-01-10 | セントラル硝子株式会社 | 着色膜の形成方法 |
YU64902A (sh) * | 2000-02-28 | 2006-01-16 | Adsil Lc. | Preparati za prevlačenje bazirani na silanima, proizvodi obloženi na taj način i postupci za njihovo korišćenje |
CN1462300A (zh) * | 2000-09-22 | 2003-12-17 | 焊接研究院 | 涂料组合物 |
JP2002146286A (ja) * | 2000-11-10 | 2002-05-22 | Toray Ind Inc | 金属酸化物薄膜形成用塗液およびこれを用いた金属酸化物薄膜の製造方法 |
JP2003026999A (ja) * | 2001-07-17 | 2003-01-29 | Central Glass Co Ltd | 着色膜形成用塗布液 |
DE10146687C1 (de) | 2001-09-21 | 2003-06-26 | Flabeg Solarglas Gmbh & Co Kg | Glas mit einer porösen Antireflex-Oberflächenbeschichtung sowie Verfahren zur Herstellung des Glases und Verwendung eines derartigen Glases |
CN1156336C (zh) * | 2002-07-12 | 2004-07-07 | 清华大学 | 柔性基底材料表面负载二氧化钛薄膜光催化剂的制备方法 |
FR2871243B1 (fr) | 2004-06-02 | 2006-09-08 | Commissariat Energie Atomique | Revetements anti-reflechissants pour piles solaires et procede pour les fabriquer |
EP1674891A1 (en) | 2004-12-23 | 2006-06-28 | DSM IP Assets B.V. | Antireflection coating, process for its preparation and articles comprising same |
JP4941302B2 (ja) * | 2005-08-19 | 2012-05-30 | 日産化学工業株式会社 | 被膜形成用塗布液の製造方法 |
EP1818694A1 (en) | 2006-02-14 | 2007-08-15 | DSMIP Assets B.V. | Picture frame with an anti reflective glass plate |
GB0617480D0 (en) * | 2006-09-06 | 2006-10-18 | Univ Sheffield | Novel nanoparticles |
US7879395B2 (en) * | 2006-10-17 | 2011-02-01 | Qimonda Ag | Method of preparing a coating solution and a corresponding use of the coating solution for coating a substrate |
ES2384126T3 (es) * | 2007-03-16 | 2012-06-29 | Asahi Glass Company, Limited | Micropartículas huecas, método para la producción de las mismas, composición de revestimiento y artículo sobre el que se ha formado una película de revestimiento |
TW200900354A (en) * | 2007-03-16 | 2009-01-01 | Asahi Glass Co Ltd | Hollow micro particle, method for production thereof, coating composition, and article having coating film formed thereon |
CN101117525B (zh) * | 2007-07-17 | 2011-02-23 | 陈志君 | 智能涂膜材料及其制备方法 |
WO2009030703A2 (en) | 2007-09-05 | 2009-03-12 | Dsm Ip Assets B.V. | Novel nanoparticles |
JP5330895B2 (ja) * | 2008-05-19 | 2013-10-30 | 克紀 綾野 | モルタル又はコンクリート用組成物を成形してなる成形品 |
-
2011
- 2011-06-17 US US13/805,159 patent/US9605156B2/en active Active
- 2011-06-17 KR KR1020137001048A patent/KR101887245B1/ko active IP Right Grant
- 2011-06-17 CA CA2800928A patent/CA2800928A1/en not_active Abandoned
- 2011-06-17 MY MYPI2012701080A patent/MY160973A/en unknown
- 2011-06-17 ES ES11725474.8T patent/ES2538660T3/es active Active
- 2011-06-17 WO PCT/EP2011/060106 patent/WO2011157820A1/en active Application Filing
- 2011-06-17 JP JP2013514732A patent/JP2013533909A/ja active Pending
- 2011-06-17 AU AU2011267007A patent/AU2011267007B2/en not_active Ceased
- 2011-06-17 EP EP11725474.8A patent/EP2582764B1/en active Active
- 2011-06-17 SI SI201130510T patent/SI2582764T1/sl unknown
- 2011-06-17 TW TW100121218A patent/TWI565757B/zh active
- 2011-06-17 PL PL11725474T patent/PL2582764T3/pl unknown
- 2011-06-17 CN CN201180040008.5A patent/CN103080254B/zh active Active
- 2011-06-17 BR BR112012032375A patent/BR112012032375A2/pt not_active IP Right Cessation
-
2016
- 2016-09-12 JP JP2016177719A patent/JP6319732B2/ja active Active
-
2018
- 2018-02-05 JP JP2018018338A patent/JP6603916B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5585186A (en) * | 1994-12-12 | 1996-12-17 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective, and anti-fogging properties |
EP0934912B1 (en) * | 1998-02-06 | 2006-06-28 | Libbey-Owens-Ford Co. | Anti-reflective films |
EP1077236A1 (en) * | 1999-08-16 | 2001-02-21 | Nissan Chemical Industries Ltd. | Modified metal oxide sol, coating composition and optical element |
CN101421022A (zh) * | 2006-01-16 | 2009-04-29 | 荷兰能源建设基金中心 | 具有高水热稳定性的微孔分子分离膜 |
WO2010043653A1 (en) * | 2008-10-14 | 2010-04-22 | Dsm Ip Assets B.V. | Stain resistant particles |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109852105A (zh) * | 2013-11-22 | 2019-06-07 | 帝斯曼知识产权资产管理有限公司 | 制备抗反射涂料组合物的方法和由其制备的多孔涂层 |
CN107567430A (zh) * | 2015-05-04 | 2018-01-09 | 里奥玻璃太阳能有限公司 | 用于太阳能反射器的涂层玻璃 |
US11053163B2 (en) | 2016-08-19 | 2021-07-06 | GKN Aerospace Transparency Systems, Inc. | Transparent hydrophobic mixed oxide coatings and methods |
CN110099880A (zh) * | 2016-08-19 | 2019-08-06 | 吉凯恩航空透明系统有限公司 | 透明的疏水性混合氧化物涂料和方法 |
CN106497162A (zh) * | 2016-10-25 | 2017-03-15 | 嘉善蓝欣涂料有限公司 | 一种用于钢铁工件表面的保护性涂料 |
CN106497162B (zh) * | 2016-10-25 | 2018-06-22 | 嘉善蓝欣涂料有限公司 | 一种用于钢铁工件表面的保护性涂料 |
CN110520484A (zh) * | 2017-04-18 | 2019-11-29 | 帝斯曼知识产权资产管理有限公司 | 涂料和涂料配方 |
TWI753154B (zh) * | 2017-04-18 | 2022-01-21 | 荷蘭商科思創荷蘭有限公司 | 塗層及塗料調配物 |
CN110520484B (zh) * | 2017-04-18 | 2023-01-31 | 科思创(荷兰)有限公司 | 涂料和涂料配方 |
CN112789251A (zh) * | 2018-10-16 | 2021-05-11 | 帝斯曼知识产权资产管理有限公司 | 涂层和涂层制剂 |
CN112840000A (zh) * | 2018-10-16 | 2021-05-25 | 帝斯曼知识产权资产管理有限公司 | 涂料和涂料配方产品 |
CN112840000B (zh) * | 2018-10-16 | 2023-02-24 | 科思创(荷兰)有限公司 | 涂料和涂料配方产品 |
CN109575649B (zh) * | 2018-11-14 | 2021-02-05 | 东莞南玻太阳能玻璃有限公司 | 一种具备抗灰功能的太阳能玻璃减反射涂料及其制备方法及抗灰高增透太阳能玻璃 |
CN109575649A (zh) * | 2018-11-14 | 2019-04-05 | 东莞南玻太阳能玻璃有限公司 | 一种具备抗灰功能的太阳能玻璃减反射涂料及其制备方法及抗灰高增透太阳能玻璃 |
CN111849219A (zh) * | 2019-09-23 | 2020-10-30 | 法国圣戈班玻璃公司 | 一种涂料分散液,其制备方法、由其获得的产品 |
CN112480712A (zh) * | 2020-12-01 | 2021-03-12 | 佛山市东鹏陶瓷有限公司 | 一种白色防静电粉料和防静电涂料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101887245B1 (ko) | 2018-08-09 |
JP2017025330A (ja) | 2017-02-02 |
TW201202347A (en) | 2012-01-16 |
EP2582764B1 (en) | 2015-03-18 |
AU2011267007B2 (en) | 2014-01-16 |
CA2800928A1 (en) | 2011-12-22 |
US20130202895A1 (en) | 2013-08-08 |
WO2011157820A1 (en) | 2011-12-22 |
MY160973A (en) | 2017-03-31 |
CN103080254B (zh) | 2016-08-03 |
TWI565757B (zh) | 2017-01-11 |
PL2582764T3 (pl) | 2015-08-31 |
JP2018087346A (ja) | 2018-06-07 |
JP2013533909A (ja) | 2013-08-29 |
BR112012032375A2 (pt) | 2016-11-08 |
US9605156B2 (en) | 2017-03-28 |
ES2538660T3 (es) | 2015-06-23 |
JP6603916B2 (ja) | 2019-11-13 |
KR20130096219A (ko) | 2013-08-29 |
JP6319732B2 (ja) | 2018-05-09 |
AU2011267007A1 (en) | 2013-01-10 |
SI2582764T1 (sl) | 2015-10-30 |
EP2582764A1 (en) | 2013-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103080254A (zh) | 无机氧化物涂层 | |
CN104334269B (zh) | 杂化有机‑无机纳米颗粒 | |
EP1734016B1 (en) | Silica and silica-like films and method of production | |
CN101384926B (zh) | 涂层系统 | |
US8883252B2 (en) | Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties | |
WO2010018852A1 (ja) | 塗料組成物および塗膜が形成された物品 | |
CN102245693B (zh) | 耐污粒子 | |
CN109852105B (zh) | 制备抗反射涂料组合物的方法和由其制备的多孔涂层 | |
JP2010209337A (ja) | 均一分散性光触媒コーティング液及びその製造方法並びにこれを用いて得られる光触媒活性複合材 | |
TW201423142A (zh) | 防污性抗反射膜、物品及其製造方法 | |
JPH11181336A (ja) | 選択透過膜用塗布液、選択透過膜および選択透過多層膜 | |
EP3612602A2 (en) | Process for making an anti-soiling coating composition and a coating made therefrom | |
JP5471825B2 (ja) | 熱線反射積層体及び熱線反射層形成用塗布液 | |
JP2001146573A (ja) | コーティング膜の形成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Newhagen, the Netherlands Patentee after: Kostron (Netherlands) Co.,Ltd. Address before: Newhagen, the Netherlands Patentee before: MS Holdings Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20211209 Address after: Newhagen, the Netherlands Patentee after: MS Holdings Ltd. Address before: Holland Heerlen Patentee before: DSM IP ASSETS B.V. |
|
CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: Geleen Patentee after: Kostron (Netherlands) Co.,Ltd. Address before: Newhagen, the Netherlands Patentee before: Kostron (Netherlands) Co.,Ltd. |