CN102929418A - Decorative film, image display system and method for manufacturing touch sensing device - Google Patents

Decorative film, image display system and method for manufacturing touch sensing device Download PDF

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Publication number
CN102929418A
CN102929418A CN2011102271767A CN201110227176A CN102929418A CN 102929418 A CN102929418 A CN 102929418A CN 2011102271767 A CN2011102271767 A CN 2011102271767A CN 201110227176 A CN201110227176 A CN 201110227176A CN 102929418 A CN102929418 A CN 102929418A
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China
Prior art keywords
layer
transparent
protective seam
transparent substrates
sensing device
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Pending
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CN2011102271767A
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Chinese (zh)
Inventor
林俗伻
谷祖贤
凃致道
赖思维
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Innocom Technology Shenzhen Co Ltd
Innolux Shenzhen Co Ltd
Chi Mei Optoelectronics Corp
Original Assignee
Innolux Shenzhen Co Ltd
Chi Mei Optoelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Innolux Shenzhen Co Ltd, Chi Mei Optoelectronics Corp filed Critical Innolux Shenzhen Co Ltd
Priority to CN2011102271767A priority Critical patent/CN102929418A/en
Publication of CN102929418A publication Critical patent/CN102929418A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a decorative film, an image display system and a method for manufacturing a touch sensing device. The decorative film comprises a colorized transparent layer, a reflecting layer and a protecting layer, wherein the colorized transparent layer is positioned on a surface of a transparent substrate; the reflecting layer is arranged on the colorized transparent layer; and the protecting layer is arranged on the reflecting layer. The invention also discloses the image display system and the method for manufacturing the touch sensing device.

Description

The manufacture method of decorating film, image display system and touch sensing device
Technical field
The present invention relates to a kind of decoration technique of electronic product, particularly relate to a kind of decorating film for touch sensing device.
Background technology
In the electronic product with touch sensing device miscellaneous; such as laptop computer, personal digital assistant (personal digital assistants; PDA), e-book (electronic books), projector, and mobile phone etc., to the hobby of this product whether the appearance design of product can directly affect the consumer usually.Therefore, industry is made decorating film in the electronic product of being everlasting, to increase its surcharge.
At present, industry generally is to adopt traditional colored ink or metal ink (metallic printing ink) to make decorating film, wherein metal ink (for example, the gold China ink (gold printing ink) of cupric or zinc thin slice or contain the Yin Mo (silver printing ink) of aluminum slice) be to utilize tiny sheet metal (particle) to replace pigment or stain in traditional colored ink, make decorating film have metallic luster (metallic gloss).The metal luster of metal ink is relevant with the size of sheet metal.The reflection potential of large sheet metal is better than the reflection potential of little sheet metal, and the sheet metal size that therefore increases in the metal ink helps to promote metal luster.
Yet, in screen painting, if sheet metal is oversize, be not easy China ink.If increase mesh (mesh) size of half tone, then be unfavorable for press quality.That is to say, when using metal ink to carry out screen painting, can be subject to the sheet metal size in the metal ink.Moreover because the metal ink price is higher than traditional printing ink, therefore can increase manufacturing cost maybe can't be applied to large-area decorating film.
Therefore, be necessary to seek a kind of new decorating film, it can improve or address the above problem.
Summary of the invention
The object of the present invention is to provide the manufacture method of a kind of decorating film, image display system and touch sensing device, can address the above problem.
The object of the present invention is achieved like this, and the decorating film on a kind of transparent substrates namely is provided, and it comprises: a colourful transparent layer is positioned on the surface of a transparent substrates; One reflection horizon is arranged on the colourful transparent layer; And a protective seam, be arranged on the reflection horizon.
Another embodiment of the present invention provides a kind of image display system, and it comprises a touch sensing device, comprising: a transparent substrates has a sensing area and a non-sensing area, and has a first surface and a second surface relative with it; One sensed layer is positioned on the first surface of transparent substrates, and corresponding to sensing area; One colourful transparent layer is positioned on the first surface of transparent substrates, and corresponding to non-sensing area; One reflection horizon is arranged on the colourful transparent layer, and covers the colourful transparent layer; And a protective seam, be arranged on the colourful transparent layer, and cover the reflection horizon.
Further embodiment of this invention provides a kind of manufacture method of touch sensing device, comprising: a transparent substrates is provided, and it has a sensing area and a non-sensing area, and has a first surface and a second surface relative with it; Form a sensor electrode array on the first surface of transparent substrates, wherein sensor electrode array is corresponding to non-sensing area; Form a colourful transparent layer on the first surface of transparent substrates, wherein the colourful transparent layer is corresponding to non-sensing area; And form a reflection horizon on the colourful transparent layer.
Description of drawings
Figure 1A to Fig. 1 D is the manufacture method diagrammatic cross-section of touch sensing device in the image display system of one embodiment of the invention;
Fig. 2 A is the floor map of an embodiment of sensed layer among Fig. 1 D;
Fig. 2 B is the diagrammatic cross-section that along 2B-2B ' line among Fig. 2 A;
Fig. 3 A is the floor map of another embodiment of sensed layer among Fig. 1 D;
Fig. 3 B is the diagrammatic cross-section along 3B-3B ' line among Fig. 3 A; And
Fig. 4 is the image display system block schematic diagram of another embodiment of the present invention.
The main element symbol description
10~sensing area;
20~non-sensing area;
100~transparent substrates;
100a~first surface;
100b~second surface;
102~sensor electrode array;
102a~the first sense electrode groups;
102b~the second sense electrode groups;
102c~electric connection position;
104~separation layer;
105~colourful transparent layer;
106~conductor layer;
107~reflection horizon;
108~the first protective seams;
109~the second protective seams;
110~anti-reflecting layer;
120~sensed layer;
200~touch sensing device;
300~contact panel display;
400~input block;
500~electronic installation;
X~first is axial; And
Y~second is axial.
Embodiment
The image display system of the embodiment of the invention below is described.Yet, can understand easily embodiment provided by the present invention and only be used for explanation with the ad hoc approach making and use the present invention, be not to limit to scope of the present invention.
The image display system of different embodiments of the invention below is provided.Please refer to Fig. 1 D, it shows sensing cell 100 floor map of touch sensing device 200 in the image display system according to an embodiment of the invention.In the present embodiment, touch sensing device 200 comprises: a transparent substrates 100, a colourful transparent layer 105, a reflection horizon 107, one first protective seam 109 and a sensed layer 120 (it comprises: a sensor electrode array 102, a separation layer 104, a conductor layer 106 and one second protective seam 108).In one embodiment, transparent substrates 100 is made of glass, in order to as sensing glass and upper cover glass.In other embodiments, transparent substrates 100 also can be made of quartzy or other elasticity or non-resilient macromolecule transparent material.In the present embodiment, transparent substrates 100 has a sensing area 10 and a non-sensing area 20.Usually sensing area 10 is positioned at the center of transparent substrates 100, but not sensing area 20 is positioned at the peripheral region of transparent substrates 100 and centers on sensing area 10.Moreover transparent substrates 100 has a first surface 100a and with respect to the second surface 100b of first surface 100a.In the present embodiment, first surface 100a can be a non-face of watching, and second surface 100b is then for watching face.One black matrix" (black matrix, BM) patterned layer (not illustrating) is arranged on the first surface 100a of transparent substrates 100 usually, and corresponding to sensing area 10 and non-sensing area 20, wherein the black matrix pattern series of strata corresponding to sensing area 10 are used to form shading region, and are used for making decorative pattern corresponding to the black matrix pattern series of strata of non-sensing area 20.
Sensed layer 120 is positioned on the first surface 100a of transparent substrates 100, and corresponding to sensing area 10.Sensor electrode array 102 in the sensed layer 120 is arranged on the first surface 100a of transparent substrates 100, and corresponding to sensing area 10.Sensor electrode array 102 can be by the transparent conductive patterns layer (for example, indium tin oxide (indium tin oxide, ITO) or indium-zinc oxide (indium zinc oxide, IZO) layer) consist of, and generally include two sense electrode groups that are arranged in array.For simplicity of illustration, only represent it with single levelling blanket herein.
Separation layer 104 in the sensed layer 120 is positioned on the first surface 100b of transparent substrates 100, and corresponding to sensing area 10, makes sensor electrode array 102 between transparent substrates 100 and separation layer 104.In the present embodiment, separation layer 104 can comprise dielectric material and be an individual layer (for example, one silica layer, a silicon nitride layer or other transparent insulating polymer layers) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or other transparent insulating polymer layer or its combination).
Conductor layer 106 in the sensed layer 120 is arranged on the separation layer 104 of sensing area 10, and is electrically connected the sensor electrode array 102 of (not illustrating) separation layer 104 belows.Conductor layer 106 can be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or is sandwich construction (aluminium that for example, stacks, chromium, tin, zirconium or its alloy or its combination).
Colourful transparent layer 105 is positioned on the first surface 100b of transparent substrates 100, and corresponding to non-sensing area 20, in order to the first as decorating film.In one embodiment, colourful transparent layer 105 can comprise the printing ink that is made of transparent resin and at least a stain, and wherein the percentage by weight of stain is in 1% to 10% scope.In the above-described embodiments, can by adopting various stain, make colourful transparent layer 105 present required color.In other embodiments, colourful transparent layer 105 can comprise dielectric material and be an individual layer (for example, one silica layer, a silicon nitride layer or other transparent insulating polymer layers) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or other transparent insulating polymer layer or its combination).For instance, colourful transparent layer 105 can comprise same dielectric material with separation layer 104, and the thickness of colourful transparent layer 105 can be controlled in 20 nanometers (nm) to the scope of 90 nanometers.In the above-described embodiments, can by changing the thickness of colourful transparent layer 105, make colourful transparent layer 105 present required color.
Reflection horizon 107 is arranged on the colourful transparent layer 105 of non-sensing area 20, in order to the second portion as decorating film, makes decorating film can present metallic luster.The thickness in reflection horizon 107 can be in the scope of 15 nanometer to 100 nanometers.In one embodiment, reflection horizon 107 can be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or is sandwich construction (aluminium that for example, stacks, chromium, tin, zirconium or its alloy or its combination).For instance, reflection horizon 107 and conductor layer 106 are made of same metal level.In other embodiments, conductor layer 106 can be metal level, and reflection horizon 107 can be discontinuous phase metal (the discontinuous phase of metal) layer of non-conductive single or multiple lift structure, and it comprises: aluminium, chromium, tin, zirconium or its alloy or its combination.
The first protective seam 109 is arranged on the colourful transparent layer 105 of non-sensing area 20, and covers reflection horizon 107, in order to the third part as decorating film.The first protective seam 109 can comprise the printing ink that is made of transparent resin and at least a stain or pigment or its combination, and its thickness at 3 microns (μ m) to 12 microns scopes.In one embodiment, the first protective seam 109 also can comprise the printing ink that is made of organic photo anti-corrosion agent material, Inorganic Dielectric Material or transparent resin.
The second protective seam 108 in the sensed layer 120 is arranged on the separation layer 104 of sensing area 10, and covers conductor layer 106.The second protective seam 108 can comprise Inorganic Dielectric Material and be an individual layer (for example, one silica layer, a silicon nitride layer or a silicon oxynitride layer) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or silicon oxynitride layer or its combination).In one embodiment, the second protective seam 108 also can comprise organic photo anti-corrosion agent material.
Again in one embodiment; the first protective seam 109 can comprise Inorganic Dielectric Material and be an individual layer (for example; one silica layer, a silicon nitride layer or a silicon oxynitride layer) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or silicon oxynitride layer or its combination).For instance, the second protective seam 108 and the first protective seam 109 can comprise same Inorganic Dielectric Material.
Please refer to Fig. 2 A and Fig. 2 B, wherein Fig. 2 A shows the floor map of an embodiment of sensed layer among Fig. 1 D, and Fig. 2 B shows along the diagrammatic cross-section of 2B-2B ' line among Fig. 2 A.In Fig. 2 A and Fig. 2 B, be same as the parts among Fig. 1 D, use identical label and the description thereof will be omitted.In the present embodiment, sensed layer 120 comprises a sensor electrode array 102, a separation layer 104, a conductor layer 106 and the second protective seam 108.Sensor electrode array 102 is positioned on the first surface 100a of transparent substrates 100, has the one first sense electrode groups 102a and the one second sense electrode groups 102b that are crisscross arranged.The first sense electrode groups 102a is electrically connected position 102c (shown in 2B figure) via one and is electrically connected at one first axial X.Separation layer 104 covers the electric connection position 102c of the first sense electrode groups 102a on the first axial X.Conductor layer 106 is arranged on the separation layer 104, and is electrically connected at the second axial Y with the second sense electrode groups 102b.The second protective seam 108 covers sensor electrode array 102, separation layer 104 and conductive layer 106.
Please refer to Fig. 3 A and Fig. 3 B, wherein Fig. 3 A shows the floor map of another embodiment of sensed layer among Fig. 1 D, and Fig. 3 B shows along the diagrammatic cross-section of 3B-3B ' line among Fig. 3 A.In Fig. 3 A and Fig. 3 B, be same as the parts among Fig. 1 D, use identical label and the description thereof will be omitted.In the present embodiment, sensed layer 120 comprises a sensor electrode array 102 and one second protective seam 108.The sensed layer 120 that is different from Fig. 2 A and Fig. 2 B, the sensor electrode array 102 that is positioned on the first surface 100a of transparent substrates 100 has one first sense electrode groups 102a and the one second sense electrode groups 102b that is arranged alternately, and the first sense electrode groups 102a and the second sense electrode groups 102b axially are electrically connected same.Moreover the second protective seam 108 covers sensor electrode array 102.
Referring again to Fig. 1 D, in the present embodiment, touch sensing device 200 also comprises an anti-reflecting layer 110, its second surface 100b that optionally is arranged at transparent substrates 100 (namely, watch the surface) on, and corresponding to sensing area 10 and non-sensing area 20, in order to one the 4th part as decorating film.Anti-reflecting layer 110 can improve the penetrance of transparent substrates 100, with the reflectivity in increase reflection horizon 107, and then the metal luster of lifting decorating film.In one embodiment, the first protective seam 109, the second protective seam 108 and anti-reflecting layer 110 can be made of same Inorganic Dielectric Material layer, and are an individual layer (for example, one silica layer) or are sandwich construction (silicon oxide layer that for example, stacks).
Please refer to Figure 1A to Fig. 1 D, it shows the according to an embodiment of the invention manufacture method diagrammatic cross-section of touch sensing device.Please refer to Figure 1A, a transparent substrates 100 is provided, a substrate of glass for example is in order to as sensing glass and upper cover glass.In other embodiments, transparent substrates 100 also can be made of quartzy or other elasticity or non-resilient macromolecule transparent material.Transparent substrates 100 has a sensing area 10 and a non-sensing area 20.Moreover transparent substrates 100 has a first surface 100a (that is, the non-face of watching) and with respect to the second surface 100b (that is, watching face) of first surface 100a.
Then, on the first surface 100a of transparent substrates 100, and corresponding to sensing area 10 and non-sensing area 20 formation one black matrix pattern layer (not illustrating).Afterwards, on the first surface 100a of transparent substrates 100, and corresponding to sensing area 10 formation one sensor electrode array 102.Sensor electrode array 102 can come the same transparency conducting layer of patterning (for example, ITO or IZO layer) and forms by photoetching and etching process.For simplicity of illustration, only represent it with single levelling blanket herein.In one embodiment, sensor electrode array 102 can have one first sense electrode groups 102a and the one second sense electrode groups 102b that is crisscross arranged, and the first sense electrode groups 102a is electrically connected at one first axial X, shown in Fig. 2 A and Fig. 2 B.
Please refer to Figure 1B, form a separation layer 104 and a colourful transparent layer 105 at the first surface 100a of transparent substrates 100, wherein separation layer 104 is corresponding to sensing area 10, and colourful transparent layer 105 is corresponding to non-sensing area 20.In one embodiment, separation layer 104 can comprise same dielectric material with colourful transparent layer 105 and be an individual layer (for example, one silica layer, a silicon nitride layer or other transparent insulating polymer layers) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or other transparent insulating polymer layer or its combination).In this case, can utilize existing deposition technique, for example chemical vapor deposition (chemical vapor deposition, CVD), form a dielectric materials layer (not illustrating), come this dielectric materials layer of patterning by existing photoetching and etching process again, and form respectively separation layer 104 and colourful transparent layer 105 at sensing area 10 and non-sensing area 20, wherein the thickness of colourful transparent layer 105 can be controlled in the scope of 20 nanometer to 90 nanometers.By changing the thickness of colourful transparent layer 105, colourful transparent layer 105 can present required color.
In other embodiments, can after forming separation layer 104, by existing screen painting manufacture craft, form the colourful transparent layer 105 that is consisted of by printing ink at non-sensing area 20.In this case, colourful transparent layer 105 can comprise the printing ink that is made of transparent resin and at least a stain, and wherein the percentage by weight of stain is in 1% to 10% scope.By adopting different stains, colourful transparent layer 105 can present required color.
Again in other embodiments, the separation layer 104 that is formed at sensing area 10 covers the electric connection position 102c of the first sense electrode groups 102a on one first axial X, shown in 2A and 2B figure.
Please refer to Fig. 1 C, at separation layer 104 formation one conductor layer 106 of sensing area 10, and the sensor electrode array 102 of electric connection (not illustrating) separation layer 104 belows.In one embodiment, conductor layer 106 is electrically connected the second sense electrode groups 102b, the second sense electrode groups 102b is electrically connected, shown in Fig. 2 A and Fig. 2 B at one second axial Y.
Moreover, in colourful transparent layer 105 formation one reflection horizon 107 of non-sensing area 20.In one embodiment, conductor layer 106 can be made of same metal level with reflection horizon 107, and be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or be sandwich construction (aluminium that for example, stacks, chromium, tin, zirconium or its alloy or its combination).In this case, can utilize existing deposition technique, physical vapour deposition (PVD) (physical vapor deposition for example, PVD), form a metal level (not illustrating), come this metal level of patterning by existing photoetching and etching process again, and form respectively conductor layer 106 and reflection horizon 107 at sensing area 10 and non-sensing area 20, wherein conductor layer 106 can be in the scope of 15 nanometer to 100 nanometers with the thickness in reflection horizon 107.
In other embodiments, can be before or after forming the conductor layer 106 that is consisted of by metal, electroplate (non-conductive vacuum metallization by the metal non-conducting vacuum, NCVM) manufacture craft, form a non-conductive discontinuous phase metal level at non-sensing area 20, with as reflection horizon 107.
Please refer to Fig. 1 D, at colourful transparent layer 105 formation one first protective seam 109 of non-sensing area 20, and cover reflection horizon 107.Moreover, at separation layer 104 formation one second protective seam 108 of sensing area 10, and cover sensor electrode array 102, separation layer 104 and conductor layer 106.
In one embodiment; the first protective seam 109 and the second protective seam 108 can be made of same Inorganic Dielectric Material layer; and be an individual layer (for example; one silica layer, a silicon nitride layer or a silicon oxynitride layer) or be sandwich construction (silicon oxide layer that for example, stacks, silicon nitride layer or silicon oxynitride layer or its combination).In this case, can utilize existing deposition technique, for example CVD forms an Inorganic Dielectric Material layer (not illustrating), with as the first protective seam 109 and the second protective seam 108.In addition, during forming the first protective seam 109 and the second protective seam 108 or afterwards, can form an anti-reflecting layer 110 at the second surface 100 of transparent substrates 100.In one embodiment; the first protective seam 109, the second protective seam 108 and anti-reflecting layer 110 can consist of by deposit simultaneously an Inorganic Dielectric Material layer on the first surface 100a of transparent substrates 100 and second surface 100b; and be an individual layer (for example; one silica layer) or be sandwich construction (for example, stacking silicon oxide layer).
In other embodiments, can after forming the first protective seam 109 that is consisted of by Inorganic Dielectric Material, by existing screen painting manufacture craft, form the second protective seam 108 that is consisted of by printing ink in the reflection horizon 107 of non-sensing area 20.In this case, the second protective seam 108 can comprise the printing ink that is made of transparent resin and at least a stain, and its thickness is 3 microns to 12 microns scope.
Again in other embodiments, the first protective seam 109 also can comprise the printing ink that is made of organic photo anti-corrosion agent material, Inorganic Dielectric Material or transparent resin, and the second protective seam 108 can comprise organic photo anti-corrosion agent material or Inorganic Dielectric Material.
According to above-described embodiment, the colourful transparent layer that is made of printing ink in the decorating film is the containing metal thin slice not, compared to existing metal ink, can get rid of the problem that is subject to the sheet metal size, and then reduces manufacturing cost or be applied to large-area decorating film.Moreover, because decorating film can present metallic luster by the reflection horizon, therefore can possess the function that is same as the decorating film that is consisted of by metal ink.In addition; because the material of colourful transparent layer, reflection horizon and protective seam in the decorating film can adopt respectively the material of the separation layer, conductor layer and the protective seam that are same as touch sensing device; therefore the making of decorating film can be integrated into the manufacturing of touch sensing device, and then simplifies manufacture craft.
Fig. 4 shows according to another embodiment of the present invention image display system block schematic diagram, it may be implemented in contact panel display 300 or electronic installation 500, for example: panel computer (tablet personal computer), projector, e-book, notebook computer, mobile phone, digital camera, personal digital assistant (PDA), desktop computer, televisor, vehicle display or portable DVD player.Touch sensing device 200 according to the present invention can be arranged at contact panel display 300.In other embodiments, touch sensing device 200 can be arranged at electronic installation 500.As shown in Figure 4, electronic installation 500 comprises: contact panel display 300 and input block 400.Input block 400 is coupled to contact panel display 300, in order to provide input signal (for example, signal of video signal) to contact panel display 300, makes contact panel display 300 show images.
Although disclosed the present invention in conjunction with above preferred embodiment; yet it is not to limit the present invention; have in the technical field under any and usually know the knowledgeable; without departing from the spirit and scope of the present invention; when can doing to change and retouching, thus protection scope of the present invention should with enclose claim was defined is as the criterion.

Claims (32)

1. the decorating film on the transparent substrates comprises:
The colourful transparent layer is positioned on the first surface of a transparent substrates;
The reflection horizon is arranged on this colourful transparent layer; And
Protective seam is arranged on this reflection horizon.
2. the decorating film on the transparent substrates as claimed in claim 1, wherein this colourful transparent layer comprises the printing ink that is made of transparent resin and at least a stain, and the percentage by weight of this stain is in 1% to 10% scope.
3. the decorating film on the transparent substrates as claimed in claim 1, wherein this reflection horizon is metal level.
4. the decorating film on the transparent substrates as claimed in claim 3, wherein this reflection horizon is the discontinuous phase metal level.
5. the decorating film on the transparent substrates as claimed in claim 1, wherein this colourful transparent layer comprises dielectric material.
6. the decorating film on the transparent substrates as claimed in claim 1 also comprises an anti-reflecting layer, is positioned on the second surface of this transparent substrates, and wherein this second surface is relative with this first surface.
7. an image display system comprises touch sensing device, and it comprises:
Transparent substrates has sensing area and non-sensing area, and has first surface and the second surface relative with it;
Sensed layer is positioned on this first surface of this transparent substrates, and corresponding to this sensing area;
The colourful transparent layer is positioned on this first surface of this transparent substrates, and corresponding to this non-sensing area;
The reflection horizon is arranged on this colourful transparent layer, and covers this colourful transparent layer; And
The first protective seam is arranged on this colourful transparent layer, and covers this reflection horizon.
8. image display system as claimed in claim 7, wherein this sensed layer comprises:
Sensor electrode array is positioned on this first surface of this transparent substrates, has one first sense electrode groups and one second sense electrode groups that are crisscross arranged, and this first sense electrode groups axially is electrically connected one first;
Separation layer covers this first sense electrode groups and is electrically connected the position in the first one on axially;
Conductor layer is arranged on this separation layer, and axially is electrically connected second with this second sense electrode groups; And
The second protective seam covers this sensor electrode array, this separation layer and this conductive layer.
9. image display system as claimed in claim 8, wherein this separation layer and this colourful transparent layer comprise same dielectric material.
10. image display system as claimed in claim 8, wherein this reflection horizon and this conductor layer are made of same metal level.
11. image display system as claimed in claim 8, wherein this reflection horizon is a discontinuous phase metal level, and this conductor layer is a metal level.
12. image display system as claimed in claim 8; wherein this first protective seam comprises the printing ink that is made of organic photo anti-corrosion agent material, Inorganic Dielectric Material or transparent resin, and this second protective seam comprises Inorganic Dielectric Material or organic photo anti-corrosion agent material.
13. image display system as claimed in claim 8, wherein this first protective seam and this second protective seam are made of same Inorganic Dielectric Material layer.
14. image display system as claimed in claim 8, wherein this touch sensing device also comprises anti-reflecting layer, is positioned on this second surface of this transparent substrates.
15. image display system as claimed in claim 7, wherein this sensed layer comprises:
Sensor electrode array is positioned on this first surface of this transparent substrates, has one first sense electrode groups and one second sense electrode groups that are arranged alternately, and this first sense electrode groups and this second sense electrode groups axially are electrically connected same; And
The second protective seam covers this sensor electrode array.
16. image display system as claimed in claim 7, wherein this colourful transparent layer comprises the printing ink that is made of transparent resin and at least a stain, and the percentage by weight of this stain is in 1% to 10% scope.
17. image display system as claimed in claim 7, wherein this touch sensing device also comprises anti-reflecting layer, and it is positioned on this second surface of this transparent substrates.
18. image display system as claimed in claim 17, wherein this first protective seam, this second protective seam and this anti-reflecting layer are made of identical material.
19. image display system as claimed in claim 7 also comprises a contact panel display, it comprises this touch sensing device.
20. image display system as claimed in claim 19, also comprise the electronic installation with this contact panel display, this electronic installation comprises: panel computer, projector, e-book, notebook computer, mobile phone, digital camera, personal digital assistant, desktop computer, televisor, vehicle display or portable DVD player.
21. the manufacture method of a touch sensing device comprises:
One transparent substrates is provided, and it has sensing area and non-sensing area, and has first surface and the second surface relative with it;
Form a sensor electrode array on this first surface of this transparent substrates, wherein this sensor electrode array is corresponding to this non-sensing area;
Form a colourful transparent layer on this first surface of this transparent substrates, wherein this colourful transparent layer is corresponding to this non-sensing area; And
Form a reflection horizon on this colourful transparent layer.
22. the manufacture method of touch sensing device as claimed in claim 21, wherein this sensor electrode array has the first sense electrode groups and the second sense electrode groups that is crisscross arranged, and this first sense electrode groups axially is electrically connected one first.
23. the manufacture method of touch sensing device as claimed in claim 22 also comprises:
Form a separation layer in this sensing area, and cover this first sense electrode groups at the first electric connection position on axially; And
Form a conductor layer on this separation layer, and be electrically connected this second sense electrode groups, this second sense electrode groups axially is electrically connected second.
24. the manufacture method of touch sensing device as claimed in claim 23 also comprises:
Form one first protective seam on this colourful transparent layer, and cover this reflection horizon; And
Form one second protective seam and be covered in sensor electrode array, this separation layer and this conductor layer.
25. the manufacture method of touch sensing device as claimed in claim 24; wherein this first protective seam comprises the printing ink that organic photo anti-corrosion agent material, Inorganic Dielectric Material or transparent resin consist of, and this second protective seam comprises organic photo anti-corrosion agent material or Inorganic Dielectric Material.
26. the manufacture method of touch sensing device as claimed in claim 24, wherein this first protective seam and this second protective seam form by depositing same Inorganic Dielectric Material layer.
27. the manufacture method of touch sensing device as claimed in claim 24 also comprises:
Form an anti-reflecting layer on this second surface of this transparent substrates, wherein this first protective seam, this second protective seam and this anti-reflecting layer form by deposit simultaneously a material layer on this first surface of this transparent substrates and this second surface.
28. the manufacture method of touch sensing device as claimed in claim 23, wherein this separation layer and this colourful transparent layer form by depositing same dielectric materials layer.
29. the manufacture method of touch sensing device as claimed in claim 23, the step that wherein forms this reflection horizon and this conductor layer comprises the same metal level of patterning.
30. the manufacture method of touch sensing device as claimed in claim 23, wherein this reflection horizon is a discontinuous phase metal level, and this conductor layer is a metal level.
31. the manufacture method of touch sensing device as claimed in claim 21, wherein this colourful transparent layer comprises the printing ink that is made of transparent resin and at least a stain, and the percentage by weight of this stain is in 1% to 10% scope.
32. the manufacture method of touch sensing device as claimed in claim 21 also comprises:
Form an anti-reflecting layer on this second surface of this transparent substrates.
CN2011102271767A 2011-08-09 2011-08-09 Decorative film, image display system and method for manufacturing touch sensing device Pending CN102929418A (en)

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
WO2014194776A1 (en) * 2013-06-04 2014-12-11 宸鸿科技(厦门)有限公司 Touch control panel and manufacturing method therefor
CN111812753A (en) * 2020-06-01 2020-10-23 湖南大学 Silicon substrate 3-6 μm infrared window sheet
CN114501882A (en) * 2022-01-12 2022-05-13 Oppo广东移动通信有限公司 Preparation method of decorative part, decorative part and electronic equipment

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN200984924Y (en) * 2006-09-26 2007-12-05 闳硕科技有限公司 Reflecting decoration piece with stereo moulded substrate plate
US20080309633A1 (en) * 2007-06-13 2008-12-18 Apple Inc. Touch-sensitive display
CN101556389A (en) * 2008-04-09 2009-10-14 胜华科技股份有限公司 Transparent capacitance type touch panel
CN101581996A (en) * 2008-05-16 2009-11-18 松下电器产业株式会社 Touch panel and input device using same
CN101639580A (en) * 2008-07-31 2010-02-03 株式会社日立显示器 Display device
CN101688979A (en) * 2007-05-17 2010-03-31 博达公司 The multilayer screen that is used for scanning beam display systems with luminous zone
CN101764147A (en) * 2008-12-24 2010-06-30 索尼株式会社 Display device
CN101920586A (en) * 2009-06-16 2010-12-22 株式会社尼德克 The manufacture method of decoration sheet, decoration sheet formed body and decoration sheet
US20110030879A1 (en) * 2009-08-07 2011-02-10 Guardian Industries Corp., Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same
TW201116612A (en) * 2009-06-04 2011-05-16 Merck Patent Gmbh Two component etching

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN200984924Y (en) * 2006-09-26 2007-12-05 闳硕科技有限公司 Reflecting decoration piece with stereo moulded substrate plate
CN101688979A (en) * 2007-05-17 2010-03-31 博达公司 The multilayer screen that is used for scanning beam display systems with luminous zone
US20080309633A1 (en) * 2007-06-13 2008-12-18 Apple Inc. Touch-sensitive display
CN101556389A (en) * 2008-04-09 2009-10-14 胜华科技股份有限公司 Transparent capacitance type touch panel
CN101581996A (en) * 2008-05-16 2009-11-18 松下电器产业株式会社 Touch panel and input device using same
CN101639580A (en) * 2008-07-31 2010-02-03 株式会社日立显示器 Display device
CN101764147A (en) * 2008-12-24 2010-06-30 索尼株式会社 Display device
TW201116612A (en) * 2009-06-04 2011-05-16 Merck Patent Gmbh Two component etching
CN101920586A (en) * 2009-06-16 2010-12-22 株式会社尼德克 The manufacture method of decoration sheet, decoration sheet formed body and decoration sheet
US20110030879A1 (en) * 2009-08-07 2011-02-10 Guardian Industries Corp., Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
程杰铭等: "《色彩学》", 30 September 2006 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014194776A1 (en) * 2013-06-04 2014-12-11 宸鸿科技(厦门)有限公司 Touch control panel and manufacturing method therefor
CN104216547A (en) * 2013-06-04 2014-12-17 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
CN104216547B (en) * 2013-06-04 2017-12-01 宸鸿科技(厦门)有限公司 A kind of contact panel and its manufacture method
CN111812753A (en) * 2020-06-01 2020-10-23 湖南大学 Silicon substrate 3-6 μm infrared window sheet
CN114501882A (en) * 2022-01-12 2022-05-13 Oppo广东移动通信有限公司 Preparation method of decorative part, decorative part and electronic equipment

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