CN102854753A - Exposure device and exposure method - Google Patents
Exposure device and exposure method Download PDFInfo
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- CN102854753A CN102854753A CN2012101823399A CN201210182339A CN102854753A CN 102854753 A CN102854753 A CN 102854753A CN 2012101823399 A CN2012101823399 A CN 2012101823399A CN 201210182339 A CN201210182339 A CN 201210182339A CN 102854753 A CN102854753 A CN 102854753A
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Abstract
The invention relates to an exposure device and an exposure method, capable of exposing and transferring a microfine exposure pattern on a substrate by using a micro lens array with high resolution at relatively short production takt interval. The exposure device of the invention comprises a mask loading platform (10); a substrate loading platform (20); an illuminating optical system (3) for irradiating lights for pattern exposure; a micro lens carrying plate (62), which has a micro lens array (41) that is formed by directional configuration of multiple micro lenses (42) on a plane and is extended in a linear manner along the Y direction, and is configured between a mask (M) and the substrate (W); and a micro lens driving mechanism (60) for enabling the micro lens carrying plate (62) to move along the X direction. When the micro lens carrying plate (62) moves along the X direction, lights for pattern exposure are irradiated to expose and transfer the mask pattern on the substrate (W) with the help of the micro lens (42).
Description
Technical field
The present invention relates to a kind of exposure device and exposure method, more specifically, relate to whole lip-deep exposure device and the exposure method that fine exposing patterns can be transferred to substrate with the high resolving power exposure.
Background technology
Existing exposure device by with mask and substrate across minim gap and near each other, use up from the pattern exposure of lamp optical system via the mask irradiation, the pattern exposure that is formed on the mask is transferred on the substrate.But, in such exposure device, owing to being to be transferred on the substrate by the mask pattern former state that the vertical exposure light that sees through mask will be formed on the mask, therefore, might be because the refraction of light, and so that image blurring unclear, the resolution of the pattern on the substrate descend, consequently can not fine pattern be exposed.
In order to tackle such problem, a kind of exposure device and photomask are disclosed, its each opening of mask respectively correspondence lenticule is set, utilize shutter intermittent irradiation exposure light, with high resolving power the image imaging of each opening is being exposed (for example, with reference to patent documentation 1) on the body.
In addition, known also have a kind of exposure device and exposure method, it has the spatial optical modulation element that is divided into the stick zone, with the different microlens array of divided focal length according to each stick zone of this spatial optical modulation element, the at least a portion in the stick zone by selecting microlens array is exposed, just realization high-precision focus control (for example, with reference to patent documentation 2) under the complicated structure can not needed to adopt.
And then, a kind of exposure device is also disclosed, it has: a plurality of mask patterns row that form a plurality of mask patterns in the direction with the direction of transfer approximate vertical of substrate, with a plurality of lenticules that form in the substrate-side of mask corresponding to each mask pattern, by adopt follow-up mask pattern row and each lenticule only to stagger mask that the size of regulation forms, transmit substrate to a direction on one side, one side intermittent irradiation exposure light, and in the substrate transfer printing that exposes, in order to be listed as formed a plurality of exposing patterns to supplying exposure between a plurality of exposing patterns that formed by the mask pattern row at the direction of transfer origination side of substrate by follow-up mask pattern, thereby form fine exposing patterns (for example, with reference to patent documentation 3) with high resolving power and high density on the whole surface of substrate.
In addition, a kind of substrate board treatment is also disclosed, it is the cleaning treatment as substrate, transmits the mode that substrate cleans while have transfer roller or travelling belt along continuous straight runs are laid on the Transfer pipe that forms, i.e. the substrate board treatment of so-called advection mode.(for example, with reference to patent documentation 4).
In addition, a kind of exposure device is also disclosed, it is characterized in that: have for high resolving power and high density the exposing patterns exposure being transferred to substrate, the mask holder (maskholder) of the liner of the light transmission upper plate that is consisted of by photomask and glass plate etc. and the frame shape that consisted of by metal or resin etc., by to the airtight processing of this mask holder internal implementation, the mask pattern exposure that is formed on the photomask is transferred to (for example, with reference to patent documentation 5) on the glass substrate.
And then, in possessing the exposure device of microlens array, with line slideway microlens array is guided (for example, with reference to patent documentation 6).
In addition, as the existing exposure device that suppresses vibration, a kind of exposure device of maskless optical modulations is also disclosed, when its path at light beam is provided with mechanical shutter, shock-absorbing mechanism or damping are set, the vibration that causes with the shutter action that prevents by mechanical shutter causes harmful effect (for example, with reference to patent documentation 7) to being configured in the optical elements such as lens around the shutter or catoptron.In addition, knownly will be configured in by the exposure device on the pedestal of vibration isolators supporting, to avoid that the vibration from the outside is passed to exposure device (for example, with reference to patent documentation 8) for the sheet material loading stage that mounting is exposed body (plate) in addition.
Patent documentation 1: JP 2009-277900 communique
Patent documentation 2: JP 2007-78764 communique
Patent documentation 3: JP 2010-48986 communique
Patent documentation 4: JP 2003-229404 communique
Patent documentation 5: JP 2003-15310 communique
Patent documentation 6: JP 2003-266258 communique
Patent documentation 7: JP 2006-301591 communique
Patent documentation 8: the international communique that discloses No. 2006/080285
Summary of the invention
The problem that invention will solve
Yet, in the exposure device of patent documentation 1, for corresponding to the substrate that has in recent years the tendency of maximizing, the substrate loading stage also needs to maximize, exposure device maximizes so that cost of equipment when increasing, also might be because the flexure effects exposure accuracy of large-scale mask.
In addition, in the exposure device of patent documentation 2, owing to selecting at least a portion in the stick zone of microlens array to expose, therefore there is the problem of productive temp prolongation interval time.
And then, in the exposure device of patent documentation 3, owing to being in the larger substrate of moving mass and substrate loading stage, to expose, therefore, and easy vibration-generating, this vibration might be delivered to mask, so that exposure accuracy is impacted.In addition, need also respectively that corresponding a plurality of mask pattern is formed on lenticule on the whole surface of mask, the problem that therefore exists the manufacturing cost of mask to increase.And, also exist in response to the transporting velocity of the substrate problem with the control complicated during the interrupted illuminating exposure light on predetermined opportunity.
And then in the substrate board treatment of patent documentation 4, when the impurity that utilizes air to remove to be attached on the substrate, impurity might be attached on the follow-up substrate.As its result, owing to need to stopping exposure device and substrate being cleaned, therefore exist productive temp elongated problem interval time of exposure device.
In addition, in the exposure device of patent documentation 5, when the upper plate with the transparency was arranged on the liner of frame shape, upper plate contacted with liner, therefore breakage might occur.For this reason, when upper plate damages, need to change the time of upper plate, therefore exist productive temp elongated problem interval time.
In addition, to the cable of the lenticule driving mechanism power supply that is used for driving the lenticule mounting plate that loads microlens array, mobile with lenticule mounting plate.Therefore, follow the vibration of this cable that moves generation will be delivered to lenticule with framework or mask framework, thereby might impact exposure accuracy.
In addition, in the line slideway of the supporting microlens array of patent documentation 6, there is not the record about the packoff with the maze-type structure that does not contact with guide rail.
Patent documentation 7 and 8 exposure device are provided with shock-absorbing mechanism, damping or vibrationproof platform, the vibration that causes with the shutter action that prevents by mechanical shutter or from the vibration of the outside impact on exposure accuracy, but all do not have record about the vibrationproof of lenticule loading stage or mask loading stage in arbitrary document.
The present invention makes in view of above-mentioned problem, and its purpose is, a kind of microlens array that can use is provided, high resolving power and shorter productive temp interval time fine exposing patterns exposure is transferred to exposure device and exposure method on the substrate.
Solve the means of problem
Above-mentioned purpose of the present invention is achieved by following structure.
(1) a kind of exposure device is characterized in that: have:
The substrate loading stage, it is used for mounting as the substrate that is exposed part;
The mask loading stage, the top that it is configured in the aforesaid substrate loading stage has for the mask holding frame that keeps mask;
The lenticule loading stage, it is configured between aforesaid substrate loading stage and the aforementioned mask loading stage, have for mounting by a plurality of lenticules lenticule mounting plate of the microlens array that forms of orientation arrangement in the plane, and the lenticule driving mechanism that above-mentioned lenticule mounting plate is moved along predetermined direction; With
Lamp optical system, its via aforementioned mask and above-mentioned microlens array to aforesaid substrate irradiation pattern exposure light,
Under the state that above-mentioned lenticule mounting plate is moved along above-mentioned predetermined direction, shine above-mentioned pattern exposure by above-mentioned lamp optical system and use up, via above-mentioned a plurality of lenticules, the mask pattern exposure that is formed on the aforementioned mask is transferred on the aforesaid substrate.
(2) according to (1) described exposure device, it is characterized in that:
Make above-mentioned lenticule mounting plate and above-mentioned lamp optical system along under the synchronization-moving state of above-mentioned predetermined direction, shining above-mentioned pattern exposure by above-mentioned lamp optical system uses up, by above-mentioned a plurality of lenticules, the mask pattern exposure that is formed on the aforementioned mask is transferred on the aforesaid substrate.
(3) according to (1) or (2) described exposure device, it is characterized in that:
Above-mentioned lenticule mounting plate is become by shading so that light can not see through above-mentioned microlens array zone in addition.
(4) according to each described exposure device in (1)～(3), it is characterized in that:
Also have a plurality of sensor brackets, in its alignment cameras that is keeping to measure the gap sensor in the gap between aforesaid substrate and the aforementioned mask and can detecting the relative position between aforesaid substrate and the aforementioned mask at least one, it is above the aforementioned mask loading stage, for respectively configuring one group along each of above-mentioned predetermined direction a plurality of masks arranged side by side, and can move along above-mentioned predetermined direction
When under the state that above-mentioned lenticule mounting plate is moved along above-mentioned predetermined direction, being transferred to the aforementioned mask pattern exposure on the aforesaid substrate, with and be listed in the adjacent the sensor carriage of each mask on the above-mentioned predetermined direction and move along the direction identical with above-mentioned lenticule mounting plate respectively.
(5) according to each described exposure device of (1)～(3), it is characterized in that:
Also have a plurality of sensor brackets, in its alignment cameras that is keeping to measure the gap sensor in the gap between aforesaid substrate and the aforementioned mask and can detecting the relative position between aforesaid substrate and the aforementioned mask at least one, it is above the aforementioned mask loading stage, for respectively configuring one group along each of above-mentioned predetermined direction a plurality of masks arranged side by side, and can move along above-mentioned predetermined direction
Above-mentioned each group sensor bracket, when under the state that above-mentioned lenticule mounting plate is moved along above-mentioned predetermined direction, being transferred to the aforementioned mask pattern exposure on the aforesaid substrate, under the state in the zone beyond above-mentioned predetermined direction covers above-mentioned microlens array, load the plate synchronizing moving to consist of the shading hole with above-mentioned lenticule.
(6) according to each described exposure device of (1)～(5), it is characterized in that:
Above-mentioned lenticule mounting plate has for the nozzle that sprays or aspirate air on one of them surface of surface and lower surface thereon.
(7) according to each described exposure device of (1)～(6), it is characterized in that:
Above-mentioned lenticule mounting plate has for the nozzle that sprays air on one of them surface in surface, lower surface and the side thereon.
(8) according to (7) described exposure device, it is characterized in that:
Be more than 4L/ divides from the spray volume of the air of said nozzle ejection.
(9) according to (7) or (8) described exposure device, it is characterized in that:
Above-mentioned air is nitrogen.
(10) according to (7) or (8) described exposure device, it is characterized in that:
Above-mentioned air is clean dry air.
(11) according to each described exposure device of (1)～(10), it is characterized in that: on the aforementioned mask holding frame, be provided with cover glass, form the high space of impermeability to cooperate with aforementioned mask,
On above-mentioned cover glass, be provided with for covering its coated member on every side.
(12) according to (11) described exposure device, it is characterized in that:
Above-mentioned coated member is resin-made membrane.
(13) according to (11) described exposure device, it is characterized in that:
Above-mentioned coated member is the metal-made net.
(14) according to (1) described exposure device, it is characterized in that:
Aforementioned mask loading stage and above-mentioned lenticule loading stage be by the pillar supporting that shares,
Above-mentioned lenticule loading stage also has:
Support the lenticule framework that above-mentioned lenticule mounting plate can move;
One end is connected with above-mentioned lenticule mounting plate, be used for cable that guiding powers to above-mentioned lenticule driving mechanism can free bend cable guide; With
Be located at the other end of above-mentioned cable guide, be bearing in separately cable guide pallet on the above-mentioned pillar with above-mentioned lenticule with framework.
(15) according to (14) described exposure device, it is characterized in that:
Above-mentioned lenticule mounting plate has: by the driving side member of above-mentioned lenticule driving mechanism driving; Be connected clamp structure and be connected with above-mentioned driving side member, and connecting the slave end member of an end of above-mentioned cable guide,
Above-mentioned lenticule loading stage has the guide be used to the driving that guides above-mentioned slave end member.
(16) according to (15) described exposure device, it is characterized in that: above-mentioned clamp structure is linear bushings.
(17) according to (14) described exposure device, it is characterized in that:
Above-mentioned lenticule mounting plate has: by the driving side member of above-mentioned lenticule driving mechanism driving; Be connected with above-mentioned driving side member, and connecting the slave end member of an end of above-mentioned cable guide, above-mentioned slave end member is made of leaf spring,
Above-mentioned lenticule loading stage has the guide be used to the driving that guides above-mentioned slave end member.
(18) according to each described exposure device of (14)～(17), it is characterized in that:
Above-mentioned cable guide pallet also has and is arranged on the upper surface that disposes above-mentioned cable guide, is used for absorbing the movement of following above-mentioned lenticule mounting plate and the shock absorbent member that is delivered to the vibration of above-mentioned cable guide pallet from above-mentioned cable guide.
(19) according to (18) described exposure device, it is characterized in that:
Above-mentioned shock absorbent member is engaged by sheet metal and elastic component and forms, above-mentioned elastic component and above-mentioned cable guide pallet butt, and be installed on the above-mentioned cable guide pallet.
(20) according to (19) described exposure device, it is characterized in that:
Above-mentioned lenticule loading stage has line slideway, and this line slideway has: be arranged on above-mentioned lenticule with the guide rail on the opposed inwall side of framework, and be crossed on the slide block that can be free to slide on the above-mentioned guide rail,
Above-mentioned line slideway possesses packoff, and the sealing device has the maze-type structure that does not contact with above-mentioned line slideway.
(21) a kind of exposure method is used for exposure device, it is characterized in that, this exposure device has:
The substrate loading stage, it is used for mounting as the substrate that is exposed part;
The mask loading stage, the top that it is configured in the aforesaid substrate loading stage has for the mask holding frame that keeps mask;
The lenticule loading stage, it is configured between aforesaid substrate loading stage and the aforementioned mask loading stage, have for mounting by a plurality of lenticules lenticule mounting plate of the microlens array that forms of orientation arrangement in the plane, and the lenticule driving mechanism that above-mentioned lenticule mounting plate is moved along predetermined direction; With
Lamp optical system, its via aforementioned mask and above-mentioned microlens array to aforesaid substrate irradiation pattern exposure light,
Under the state that above-mentioned lenticule mounting plate is moved along above-mentioned predetermined direction, shine above-mentioned pattern exposure by above-mentioned lamp optical system and use up, via above-mentioned a plurality of lenticules, the mask pattern exposure that is formed on the aforementioned mask is transferred on the aforesaid substrate.
(22) according to (21) described exposure method, it is characterized in that:
Make above-mentioned lenticule mounting plate and above-mentioned lamp optical system along under the synchronization-moving state of above-mentioned predetermined direction, shining above-mentioned pattern exposure by above-mentioned lamp optical system uses up, by above-mentioned a plurality of lenticules, the mask pattern exposure that is formed on the aforementioned mask is transferred on the aforesaid substrate.
(23) according to (21) described exposure method, it is characterized in that:
Also have a plurality of sensor brackets, in its alignment cameras that is keeping to measure the gap sensor in the gap between aforesaid substrate and the aforementioned mask and can detecting the relative position between aforesaid substrate and the aforementioned mask at least one, it is above the aforementioned mask loading stage, respectively configure one group for each of a plurality of masks of arranging along above-mentioned predetermined direction, and can move along above-mentioned predetermined direction
When being transferred to the aforementioned mask pattern exposure on the aforesaid substrate under the state that above-mentioned lenticule mounting plate is moved along above-mentioned predetermined direction, the sensor carriage adjacent with each mask on being arranged in above-mentioned predetermined direction moves along the direction identical with above-mentioned lenticule mounting plate respectively.
(24) according to (21) described exposure method, it is characterized in that:
Also have a plurality of sensor brackets, in its alignment cameras that is keeping to measure the gap sensor in the gap between aforesaid substrate and the aforementioned mask and can detecting the relative position between aforesaid substrate and the aforementioned mask at least one, it is above the aforementioned mask loading stage, respectively configure one group for each of a plurality of masks of arranging along above-mentioned predetermined direction, and can move along above-mentioned predetermined direction
When above-mentioned each group sensor bracket is transferred to the aforementioned mask pattern exposure on the aforesaid substrate under the state that above-mentioned lenticule mounting plate moves along above-mentioned predetermined direction, under the state in the zone beyond above-mentioned predetermined direction covers above-mentioned microlens array, with above-mentioned lenticule mounting plate synchronizing moving.
The effect of invention
According to exposure device of the present invention and exposure method, have: be used for mounting as the substrate loading stage that is exposed the substrate of part; Be configured in the top of substrate loading stage, have the mask loading stage for the mask holding frame that keeps mask; Have for mounting by a plurality of lenticules in the plane the microlens array that forms of orientation arrangement lenticule mounting plate and be used for making lenticule mounting plate with respect to lenticule with framework along the lenticule driving mechanism that predetermined direction moves, be configured in the lenticule loading stage between aforesaid substrate loading stage and the aforementioned mask loading stage; With by aforementioned mask and the microlens array lamp optical system to substrate irradiation pattern exposure light.And, by under the state that lenticule mounting plate is moved to predetermined direction, by lamp optical system irradiation pattern exposure light, so that the mask pattern exposure that will be formed on the mask via a plurality of lenticules is transferred on the substrate.Thus, just can pass through simple mechanism, fine exposing patterns is transferred on the substrate with high resolving power and shorter productive temp exposure interval time.
In addition, because lenticule mounting plate has for the nozzle that sprays air on one of them surface in surface, lower surface and the side, therefore, can remove the impurity on the substrate thereon.
And then, owing to being provided with cover glass in the mask holding frame, form the high space of impermeability to cooperate with mask, be provided with for the coated member that covers around it outer cover is on glass, therefore, can prevent the damage of cover glass, can the distortion of mask be compensated simultaneously.
In addition, mask loading stage and lenticule loading stage are supported by the pillar that shares, and therefore, can design supporting construction compact, realize the miniaturization of exposure device, and are easy to assembling.In addition, because also having an end, the lenticule loading stage is connected with lenticule mounting plate, be used for guiding to the cable of lenticule driving mechanism power supply can free bend cable guide, with the other end that is located at cable guide, be bearing in separately cable guide pallet on the pillar with lenticule with framework, therefore, can prevent from following the movement of cable guide and the vibration that produces is delivered to the lenticule framework, thereby prevent the microlens array vibration-generating.Thus, can fine exposing patterns exposure be transferred on the substrate with high precision.
And lenticule mounting plate has: by the driving side member of lenticule driving mechanism driving; Be connected clamp structure and be connected with the driving side member, and connecting the slave end member of an end of cable guide, the lenticule loading stage has the guide for the driving of guiding slave end member, therefore, the vibration of slave end member has realized inhibition by guide, simultaneously, can be absorbed by clamp structure via the vibration that the slave end member is delivered to the driving side member from cable guide, thereby can prevent the microlens array vibration-generating.
In addition, the cable guide pallet also has and is arranged on the upper surface that disposes cable guide, be used for absorbing the movement of following lenticule mounting plate and the shock absorbent member that is delivered to the vibration of cable guide pallet from cable guide, the vibration that therefore, can prevent cable guide is delivered to the mask loading stage via the cable guide pallet.
And because line slideway possesses packoff, the sealing device has the maze-type structure that does not contact with line slideway, therefore can invade line slideway and can not apply load to line slideway by inhibition of impurities.
Description of drawings
Fig. 1 is the front view of the exposure device of first embodiment of the invention.
Fig. 2 is the side view of exposure device shown in Figure 1.
Fig. 3 is the mask loading stage of exposure device shown in Figure 1 and the vertical view of lenticule mounting plate.
Fig. 4 (a) is the vertical view that is formed with the lenticule mounting plate of a plurality of microlens arrays, (b) be among the round IV of (a) along the amplification view of the microlens array of Z direction, (c) be the enlarged drawing of microlens array among the round IV of (a).
Fig. 5 (a) is the schematic diagram of hexagon field stop, (b) is the schematic diagram of aperture diaphragm, (c) is the schematic diagram for the configuration of explanation hexagon field stop.
Fig. 6 is the vertical view of the position relationship of the front mask of expression exposure transfer printing and microlens array.
The vertical view of the mask when Fig. 7 is expression exposure transfer printing and the position relationship of microlens array.
Fig. 8 is the vertical view of the position relationship of mask after the expression exposure transfer printing and microlens array.
Fig. 9 is for the vertical view of explanation as the action of the sensor bracket that is also used as the shading hole of the variation of the first embodiment.
Figure 10 represents the exposure device of second embodiment of the invention, (a) is the vertical view with lenticule mounting plate of nozzle, (b) is the cut-open view along the X-X line in (a).
Figure 11 represents the variation of the second embodiment, (a) be the vertical view with lenticule mounting plate of nozzle, (b) being the side view with lenticule mounting plate of nozzle, (c) is the cut-open view along the XI-XI line in (a), (d) is the cut-open view along the XI ' in (a)-XI ' line.
Figure 12 is the front view of the exposure device of third embodiment of the invention.
Figure 13 is the side view of exposure device shown in Figure 12.
The cover glass that Figure 14 (a) expression is covered by coated member, (b) cover glass that covered by coated member of expression is configured in the cut-open view on the mask loading stage.
Figure 15 is the front view of the exposure device of four embodiment of the invention.
Figure 16 is the side view of exposure device shown in Figure 15.
Figure 17 is the mask loading stage of exposure device shown in Figure 15 and the vertical view of lenticule mounting plate.
Figure 18 is the schematic top plan view that is formed with the lenticule mounting plate of microlens array.
Figure 19 is the stereographic map of lenticule loading stage.
Figure 20 is the sectional stereogram of cutting open along the XX-XX line of Figure 19.
Figure 21 is as the stereographic map of the packoff with the maze-type structure that has for the line slideway that guides the driving side member of the variation of the 4th embodiment.
Figure 22 is the stereographic map with packoff of the maze-type structure that has for the line slideway that guides the slave end member.
Figure 23 be as the use of another variation of the 4th embodiment leaf spring the lenticule loading stage with the corresponding sectional stereogram of Figure 20.
Symbol description
10: the mask loading stage
12: the mask holding frame
15: gap sensor
16: alignment cameras
17,17a, 17b, 17c, 17d: sensor bracket (shading hole)
20: the substrate loading stage
30: lamp optical system
40: the lenticule loading stage
41: microlens array
42: lenticule
45: nozzle
51: the driving side member
52: the slave end member
53: linear bushings (clamp structure)
55: line slideway (guide)
60: the lenticule driving mechanism
62: lenticule mounting plate
63: the lenticule framework
68: linear motor (lenticule driving mechanism)
77: pillar
81: cable guide
81a a: end
81b: the other end
82: the cable guide pallet
83: shock absorbent member
83a: sheet metal
83b: elastic component
93: leaf spring
M: mask
PE: exposure device
W: glass substrate (being exposed part, substrate)
Embodiment
The first embodiment
Below, be elaborated based on the embodiment of accompanying drawing to the exposure device of first embodiment of the invention.
Fig. 1 is the front view of exposure device of the present invention, and Fig. 2 is its side view.As depicted in figs. 1 and 2, the exposure device PE of present embodiment has: the mask loading stage 10 that keeps mask M; The substrate loading stage 20 of mounting glass substrate (being exposed part) W; Having the substrate of making loading stage 20 moves along X-axis, Y-axis, Z-direction, and substrate loading stage travel mechanism 50 and microlens array 41 that the degree of tilt of substrate loading stage 20 is regulated, and be configured in lenticule loading stage 40 between substrate loading stage 20 and the mask loading stage 10; And via mask M and microlens array 41 lamp optical system 30 to substrate W irradiation pattern exposure light.
Need to prove, below the glass substrate W(, referred to as " substrate W ") with mask M subtend configuration, on the mask pattern that needs are described on this mask M exposes the surface (the opposite face side of mask M) of transfer printing, scribble emulsion.
Shown in Fig. 1～3, mask loading stage 10 has: the mask framework 11 that is formed with 4 rectangular aperture 11a; Be installed in mask with on each opening 11a of framework 11,4 mask holding frames 12 that can move along X-axis, Y-axis and θ direction respectively.
Mask by pillar 71 supportings that are erected on the device pedestal 70, is configured in the top of substrate loading stage 20 with framework 11.Each mask holding frame 12 is inserted the opening 11a that mask is used framework 11, and the gap that midfeather is predetermined makes it can move the distance in this gap on X-axis, Y-axis and θ direction.Mask holding frame 12 in the central section has the rectangular aperture that passes through be used to pattern exposure is used up, and mask M is adsorbed and remains on its underpart.
In addition,, be provided with each mask holding frame 12 is moved along X-axis, Y-axis, θ direction with the upper surface of framework 11 at mask, and regulate the not shown mask position governor motion of the position that remains on the mask M on this mask holding frame 12.
The mask position governor motion has: be installed in mask holding frame 12 along 1 Y direction drive unit on the side of X-direction; Be installed in mask holding frame 12 along 2 X-direction drive units on the side of Y direction, combination or the linear motor by motor and ball screw framework consists of respectively.And by driving 1 Y direction drive unit, mask holding frame 12 is moved along Y direction, by 2 X-direction drive units of equal driving, mask holding frame 12 is moved along X-direction.In addition, by driving the arbitrary device in 2 X-direction drive units, can make mask holding frame 12 move (around the Z axis rotation) along the θ direction.
Need to prove, on mask loading stage 10, the Z-direction that can regulate mask holding frame 12 also can be set move Z axis-tilt adjustment mechanism with degree of tilt.
And then, as shown in Figure 3, at the upper surface of mask with framework 11, be provided with gap sensor 15 and the alignment cameras 16 that can detect the relative position of substrate W and mask M for the gap between the opposing surface of measuring mask M and substrate W.This gap sensor 15 and alignment cameras 16 remain on the sensor bracket 17 that drivings such as linear motor by being located at the Y-direction both sides can move along X-direction with actuator 18, mask with framework 11 above, be configured in the mask holding frame 12.For along each of directions X a plurality of mask M arranged side by side, each configures one group of sensor bracket 17( sensor bracket 17a, 17b and 17c, 17d), can be independently mobile along directions X separately.
As depicted in figs. 1 and 2, substrate loading stage 20 is arranged in the substrate loading stage travel mechanism 50, has to have configured the Z loading stage 21 that above adsorption keeps the not shown workpiece chuck of substrate W.
Substrate loading stage travel mechanism 50 has: the X-axis feed mechanism 22 that substrate loading stage 20 is moved along X-direction; The Y-axis feed mechanism 23 that substrate loading stage 20 is moved along Y direction; With the degree of tilt of substrate loading stage 20 is regulated, and make substrate loading stage 20 along the Z-tilt adjustment mechanism 24 of Z-direction fine motion.
Y-axis feed mechanism 23 has: at the upper surface of X-axis worktable 26, along a pair of line slideway 28 of Y direction setting; By the Y-axis worktable 29 of line slideway 28 supporting for moving along Y direction; With the Y-axis feed drive unit 35 that Y-axis worktable 29 is moved along Y direction.Y-axis feed drive unit 35 has: the ball-screw nut 35a that is fixed on the lower surface of Y-axis worktable 29; The ballscrew shaft 35b that screws togather with this ball-screw nut; Be arranged on the X-axis worktable 26, drive the motor 35c of ballscrew shaft 35b rotation, make ballscrew shaft 35b rotation by the motor 35c that drives Y-axis feed drive unit 35, Y-axis worktable 29 is moved along line slideway 28 with ball-screw nut 35a, thereby substrate loading stage 20 is moved along Y direction.
Z-tilt adjustment mechanism 24 has: be arranged on the motor 24a on the Y-axis worktable 29; Driven the ballscrew shaft 24b of rotation by motor 24a; The wedge nut 24c that screws togather with ballscrew shaft 24b that is wedge shape; Give prominence to the wedge-shaped part 24d that is set to wedge shape and cooperates with the dip plane of wedge nut 24c with the lower surface at substrate loading stage 20.And in the present embodiment, Z-tilt adjustment mechanism 24 is provided with three altogether, wherein the end (the nearly body side of Fig. 1) in the Y direction of Y-axis worktable 29 is provided with two, the other end (the body side far away of Fig. 1 is with reference to Fig. 2) is provided with one, is controlled by drive respectively.Need to prove, the magnitude setting of Z-tilt adjustment mechanism 24 is for arbitrarily.
And, in Z-tilt adjustment mechanism 24, drive ballscrew shaft 24b rotation by motor 24a, thus, wedge nut 24c is moved horizontally along Y direction, this moves horizontally the ramp effect that moves through wedge nut 24c and wedge-shaped part 24d and is converted into high-precision up and down fine motion campaign, makes wedge-shaped part 24d along the fine motion of Z direction.Therefore, just move identical amount by driving three Z-tilt adjustment mechanism 24, just can make substrate loading stage 20 along the Z-direction fine motion, in addition, by three Z-tilt adjustment mechanism 24 of drive, just can carry out the degree of tilt of substrate loading stage 20 and regulate.Thus, the Z axis of substrate loading stage 20 and the position of vergence direction are finely tuned, can make between mask M and the substrate W parallel relative in the mode that exists predetermined space.
Need to prove, consist of X-axis feed mechanism 22, Y-axis feed mechanism 23 and the ball-screw axis mechanism of Z-tilt adjustment mechanism 24 and the combination of motor and also can be replaced by linear motor.
In addition, as depicted in figs. 1 and 2, among the exposure device PE of present embodiment, the position-measurement device as the position of detecting substrate loading stage 20 is provided with laser length measuring machine 36.This laser length measuring machine 36 is the devices for the displacement of measuring the substrate loading stage 20 that produces when substrate loading stage travel mechanism 50 drives.
Laser length measuring machine 36 has: be provided in X-axis catoptron 72 and Y-axis catoptron 74 on the substrate loading stage 20; Be provided on the device pedestal 70, with catoptron 72 irradiating lasers (measurement light), receive by the laser of X-axis with catoptron 72 reflections the position of the X-direction of measurement substrate loading stage 20 and two X-axis horizontal metroscopes 73 of deflection to X-axis; And, receive by the laser of Y-axis with catoptron 74 reflections a Y-axis horizontal metroscope (length-measuring appliance) 76 of the position of the Y direction of measurement substrate loading stage 20 to Y-axis catoptron 74 irradiating lasers.Then, the position detection signal with the XY direction of substrate loading stage 20 is input to control device.
Lamp optical system 30 corresponds respectively to a plurality of (in the embodiment shown in Figure 3 being 4) the mask M that remains on the mask loading stage 10, by lamp base 31 supportings of being fixed on the pillar 71, is configured in the top of mask loading stage 10.Lamp optical system 30 has such as high-pressure mercury-vapor lamp, concave mirror, optical integrator, plane and spherical reflector and exposure to be controlled with (all not shown) such as shutters, uses up the irradiation area that shines the microlens array 41 that comprises aftermentioned lenticule mounting plate 62 via mask M from the pattern exposure of high-pressure mercury light irradiation.
As described later, the transfer printing owing under the state that lenticule mounting plate 62 is moved along directions X, exposing, therefore, lamp optical system 30 is driven by not shown driving mechanism, it is moved along lamp base 31, can be along directions X and lenticule mounting plate 62 synchronizing movings, with to comprising the irradiation area irradiation pattern exposure light of microlens array 41.
Need to prove, also the above-mentioned movement that makes lamp optical system 30 can be replaced by with the angle of the built-in plane mirror of mobile synchronous change of lenticule mounting plate 62 etc. or position or the two, pattern exposure used up shines the irradiation area that comprises microlens array 41.In the case, can reduce the moving-mass of lamp optical system 30, suppress the generation of vibration or noise.
As shown in Figures 2 and 3, the two ends of the Y-direction of lenticule mounting plate 62 are held and are configured between mask M and the substrate W.Lenticule mounting plate 62 is by such as having the stator (not shown) that is fixed in pillar 77 and drive with this stator subtend and the lenticule driving mechanisms such as linear motor 60 that are fixed in the rotor (not shown) on the lenticule mounting plate 62, thereby can move along directions X.
Expose by irradiating illumination optical system 30 under the state of mobile lenticule mounting plate 62, can shorten productive temp interval time, realize reliably exposure transfer printing.
Shown in Fig. 4 (a), a plurality of microlens arrays 41 of setting corresponding to each mask M are arranged on the lenticule mounting plate 62 in the mode along the linearly extension of Y-direction.In addition, in the lenticule mounting plate 62, the zone beyond the microlens array 41 is blocked, and is mapped to substrate W to prevent unnecessary illumination.Shown in Fig. 4 (b), each microlens array 41 consists of by 4 layers of microlens array substrate 41a～41d is superimposed, and among each microlens array substrate 41a～41d, a plurality of lenticule 42 orientation arrangement in the plane.Particularly, shown in Fig. 4 (c), each microlens array substrate 41a～41d consists of the lenticule row of multiple row by configuring a plurality of lenticules 42 with predetermined space along Y-direction, each row lenticule 42 is along the Y-direction configuration of staggering, so that it is not arranged with linearity on directions X.
Need to prove, also can arrange in the lenticule loading stage 40 and can load lenticule Z axis-tilt adjustment mechanism that plate 62 carries out Z-direction and degree of tilt adjusting to lenticule.
In addition, shading is implemented by opaque chromium (Cr) film 47 in the zone beyond the lenticule 42 of each microlens array substrate 41a～41d.In other words, use up from the pattern exposure of lamp optical system 30 irradiation, by lenticule 42, the regional exposure of mask pattern that will be corresponding with microlens array 41 is transferred on the substrate W.
In addition, from between microlens array substrate 41b, the 41c of the number second layers and the 3rd layer, corresponding to each lenticule 42, configured have hexagonal apertures hexagon field stop 43(with reference to Fig. 5 (a)), from between microlens array substrate 41c, the 41d of several the 3rd layer and the 4th layers, dispose corresponding to each lenticule 42 have circular open aperture diaphragm 44(with reference to Fig. 5 (b)).Thus, use up by appropriate optically focused from the pattern exposure that lamp optical system 30 is shone via mask M, thereby be imaged as distinct image at substrate W.
And then shown in Fig. 5 (c), each lenticule 42 is configured to, in the hexagon field stop 43 of each lenticule 42 overlapping along directions X, the A/F summation of the directions X of each hexagon field stop 43 on whole Y-direction about equally.Thus, the inhomogeneous of junction of the lenticule 42 during the exposure transfer printing is compensated, and in the whole zone of microlens array 41, the pattern exposure of same light quantity is used up and is irradiated on the substrate W.
Below, based on Fig. 6～Fig. 8, the exposure actions of using above-mentioned exposure device PE is described.Need to prove, in following explanation, to use 4 mask M, carry out 4 steppings exposure, the situation of 16 patterns of transfer printing that expose altogether on substrate W is that example describes.
At first, in for the first time exposure, the location is positioned in first of substrate W on the precalculated position of substrate loading stage 20 and is exposed zone (for example, the right regions of substrate W) and orientates as with mask loading stage 10 opposed.At this moment, as shown in Figure 6, the microlens array 41 of lenticule mounting plate 62 lays respectively at the mask M(mask pattern of corresponding difference correspondence) the side (right side) of directions X.In addition, respectively one group of sensor bracket 17(17a, 17b, 17c, the 17d of configuration on each a plurality of mask M arranged side by side along directions X), be positioned at the left and right sides of the mask pattern P of each mask M.
And by being equipped on the gap sensor 15 on the sensor bracket 17, the gap between the opposing surface of measurement mask M and substrate W drives Z-tilt adjustment mechanism 24, so that mask M is relative with predetermined spaced and parallel with substrate W.Need to prove, when carrying out the later exposure transfer printing of the second layer, when the gap between the opposing surface that utilizes 15 couples of mask M of gap sensor and substrate W is regulated, utilize alignment cameras 16 to detect substrate W and the upper formed alignment mark of mask M, the relative position of substrate W and mask M is regulated.
Then, make in the direction of arrow A (directions X) synchronizing moving of lenticule mounting plate 62 and lamp optical system 30, will use up from the pattern exposure of lamp optical system 30 and shine the zone corresponding with microlens array 41.At this moment, as shown in Figure 6, two sensor bracket 17a, the 17d in the outside are in advance respectively along the direction of arrow A, B(and A opposite direction) movement, thus move to the retreating position that separates with mask M.
Need to prove, in four lamp optical systems 30 corresponding with each microlens array 41, can adopt two lamp optical systems 30 to make two lamp optical system 30 synchronizing movings by common not shown driving mechanism, also can adopt four lamp optical systems 30 to make four lamp optical system 30 synchronizing movings by common not shown driving mechanism.
On the other hand, sensor bracket 17b is along with the movement of lenticule mounting plate 62, the 62 equidirectional left side mask M that cross move (direction of arrow A) with lenticule mounting plate, in addition, sensor bracket 17c moves in the direction of arrow A between two mask M arranged side by side on the directions X (with reference to Fig. 7).Thus, when the exposure transfer printing, need not that both all keep out of the way between two mask M arranged side by side on the directions X with two sensor bracket 17b, 17c of inboard, can so that on directions X two mask M arranged side by side approach configuration, be transferred on the substrate W thereby a plurality of patterns can be exposed efficiently.
Thus, be formed in the mask pattern on the mask M, corresponding to the mask pattern in the zone of microlens array 41, the right side is divided to be exposed via a plurality of lenticules 42 successively to left part and is transferred on the substrate W from figure.Thus, carry out the transfer printing that exposes for the first time by 4 mask M.
Need to prove, although pattern exposure is used up the zone that only shines corresponding to microlens array 41,, also can use as required not shown shading hole.In addition, when use is implemented the lenticule mounting plate 62 of shading to the zone beyond the microlens array 41, pattern exposure is used up and can only be shone the zone corresponding with microlens array 41, perhaps, also can shine the zone beyond the microlens array 41 of lenticule mounting plate 62.
When the first exposure transfer printing finished, as shown in Figure 8, sensor bracket 17a, 17b were positioned at the left side of the mask M in left side, and sensor bracket 17c is positioned at the centre of two mask M, and sensor bracket 17d is positioned at the right side of the mask M on right side.
Then, when carrying out exposing the second time, substrate loading stage 20 is moved along the right stepping among the figure, when second of substrate W is exposed zone (top left region of substrate W) and is positioned at mask M subtend, sensor bracket 17a, 17b, 17c, 17d return original position, regulate the gap between the opposing surface of mask M and substrate W by gap sensor 15.
And, make under the lenticule mounting plate 62 and the synchronization-moving in the direction of arrow B state of lamp optical system 30 that is positioned at the transfer printing end position that exposes for the first time, pattern exposure is used up the zone that shines corresponding to microlens array 41, will corresponding to the exposing patterns in the zone of microlens array 41 successively from figure left part to right side divide via a plurality of lenticules 42 exposures and be transferred on the substrate W.
Need to prove, in this case, sensor bracket 17a, 17d also are under the state that moves to the retreating position that separates with mask M, movement (direction of arrow B) along with lenticule mounting plate 62, cross the mask M on right side and move along the B direction, in addition, sensor bracket 17b also is the centre position that moves to two mask M along the B direction.
Afterwards, substrate loading stage 20 is moved along top direction (Y-direction) stepping among the figure, make the 3rd of substrate W (for example be exposed the zone, the zone, lower-left of substrate W) relative with mask M, with the first exposure transfer printing mobile lenticule mounting plate 62, lamp optical system 30 and sensor bracket 17 similarly, to carry out the 3rd exposure transfer printing.In addition, substrate loading stage 20 is moved to (directions X) stepping along the left among the figure, make the 4th of substrate W (for example be exposed the zone, the lower right area of substrate W) relative with mask M, with the second exposure transfer printing mobile lenticule mounting plate 62, lamp optical system 30 and sensor bracket 17 similarly, to carry out the 4th exposure transfer printing.
As mentioned above, according to the exposure device PE of present embodiment, it has: the substrate loading stage 20 of mounting substrate W; Be configured in the top of substrate loading stage 20, have the mask loading stage 10 for the mask holding frame 12 that keeps mask M; Have for mounting by a plurality of lenticules 42 lenticule mounting plate 62 of the microlens array 41 that forms of orientation arrangement in the plane, make lenticule load the lenticule driving mechanism 60 that plate 62 moves along predetermined direction with being used for, and be configured in the lenticule loading stage 40 between substrate loading stage 20 and the mask loading stage 10; And via mask M and microlens array 41 lamp optical system 30 to substrate W irradiation pattern exposure light.And, owing to utilizing lenticule driving mechanism 60 to make irradiation pattern exposure light under the state that lenticule mounting plate 62 moves to directions X, be transferred on the substrate W via the mask pattern exposure of a plurality of lenticules 42 with mask M, therefore, can pass through simple mechanism, fine exposing patterns is transferred on the whole surface of substrate W with high resolving power and shorter productive temp exposure interval time.
In addition, since be make lenticule mounting plate 62 and lamp optical system 30 along directions X irradiation pattern exposure light under the synchronization-moving state, via a plurality of lenticules 42 the mask pattern exposure is transferred on the substrate W, therefore, can use up realization exposure transfer printing under the state that shines the narrow zone that comprises microlens array 41 at pattern exposure.
And then, because lenticule mounting plate 62 by shading, so that light can not see through the zone outside the microlens array 41, has therefore prevented that unnecessary illumination is mapped on the substrate W.At this moment, pattern exposure is used up beyond the narrow zone of the microlens array 41 that also can shine lenticule mounting plate 62.Therefore, use up the irradiation area that shines by preseting wider pattern exposure, even in the situation that is replaced by the different mask M of size, also need not to change the irradiation area of lamp optical system 30, thereby can shorten productive temp interval time, realize reliably exposure.
In addition, keep in gap sensor 15 and the alignment cameras 16 at least one with adjacent a plurality of sensor bracket 17b along predetermined direction (directions X) each mask M arranged side by side, 17c, under the state that lenticule mounting plate 62 moves, when being transferred to the mask pattern exposure on the substrate W, mobile separately with lenticule mounting plate 62 equidirectional ground, therefore when the exposure transfer printing, do not need two sensor bracket 17b with the inboard, 17c keeps out of the way between directions X two mask M arranged side by side, can be so that two mask M that arrange at directions X approach configuration, thus can efficiently a plurality of pattern exposures be transferred on the substrate W.
Need to prove, in the present embodiment, can be by single four microlens arrays 41 of lenticule mounting plate 62 synchronizing movings.In addition, also can make at least two synchronizing movings among four sensor bracket 17a～17d.And, also can make per at least two synchronizing movings in four lamp optical systems 30.Like this, by making at least two synchronizing movings in a plurality of sensor bracket 17a～17d, a plurality of microlens array 41, a plurality of lamp optical system 30, compare with the situation of independent movement, can reduce to move caused vibration by these.
In addition, to sensor bracket 17a～17d, except the control of moving direction, mutually stagger with mobile end by controlling it as mobile beginning, can suppress their vibration to the impact of exposure.
Need to prove, sensor bracket 17a～17d, lenticule mounting plate 62 and lamp optical system 30 can change according to the size of substrate W mobile starting position and mobile end position.
In addition, the translational speed of the illumination of lamp optical system 30 and sensor bracket 17a～17d can be set according to the exposure combination in any.
Below, with reference to Fig. 9, the variation that sensor bracket is also used as first embodiment in shading hole describes.Fig. 9 is the schematic top plan view of action that is also used as the sensor bracket in shading hole, after gap sensor 15 has been measured the gap between the opposing surface of mask M and substrate W and the gap has been regulated (in the exposure transfer printing of the second layer, carried out gap adjustment by gap sensor 15 and undertaken by alignment cameras 16 aiming at regulate after), make sensor bracket 17a, 17b, 17c, 17d and microlens array 41 synchronizing movings, so that sensor bracket 17a, between the 17b and 17c, gap L between the 17d under the width identical with the width of microlens array 41, is positioned at the top of microlens array 41 respectively.That is, when overlooking, the gap L between pair of sensors carriage 17a, 17b and 17c, the 17d is consistent with the width of microlens array 41, covers the zone except microlens array 41.
And, under the state that lenticule mounting plate 62 moves along the A direction, when being transferred to the mask pattern exposure on the substrate W, each becomes one group sensor bracket 17a, 17b and 17c, 17d under the state of keeping the gap L between each sensor bracket 17, namely in the zone beyond blocking microlens array 41, synchronously move along the arrow A direction with lenticule mounting plate 62.Thus, sensor bracket 17 has also played the function in shading hole.At this moment, the gap sensor 15 on the sensor bracket 17 and alignment cameras 16 are kept out of the way on the sensor bracket 17 in advance.
As mentioned above, exposure device PE according to present embodiment, when being transferred to the mask pattern exposure on the substrate W, each becomes one group sensor bracket 17 under the state that is blocking microlens array 41 zone in addition, synchronously move along directions X with the lenticule mounting plate 62 that moves along directions X, therefore, can be also used as the shading hole, realize the simplification of mechanism.
The second embodiment
Figure 10 (a) and (b) expression be vertical view and cut-open view as the lenticule mounting plate that possesses nozzle of the exposure device of the second embodiment.As shown in figure 10, load the both sides of plate 62 at the lenticule along the Y-direction extension that is not kept by lenticule mounting plate 62, surface and lower surface are formed with a plurality of nozzles 45 thereon.A plurality of nozzles 45 are communicated with air vent 46 in being formed at lenticule mounting plate 62.The air that a plurality of nozzles 45 will be supplied with by not shown air feeder, through air vent 46 upward with at least one direction ejection of below.
Thus, as shown in phantom in FIG., can correct the deflection that causes the lenticule mounting plate 62 of deflection because of deadweight, thereby can prevent that the exposure that the deflection because of lenticule mounting plate 62 causes is inhomogeneous.Need to prove, also can be by connecting vacuum plant at air vent 46, prevent the deflection of lenticule mounting plate 62 near the air the upper and lower surface of nozzle 45 suction lenticule mounting plates 62, make the distance of substrate W and lenticule mounting plate 62 keep certain.
As mentioned above, the lenticule mounting plate 62 of present embodiment, because thereon, at least one side of lower surface is provided with the nozzle 45 for ejection or suction air, therefore, by spraying or the suction air from nozzle 45, the lenticule that can suppress to cause because of deadweight loads the deflection of plate 62, makes it to keep certain with the distance of substrate W, thereby prevents the inhomogeneous generation that exposes.And then, have suitable curvature by making lenticule mounting plate 62 and lenticule 42, can revise the multiplying power of lenticule 42.
In addition, a plurality of nozzles 45 can also be designed to be able to the amount from the air of 45 ejections of each nozzle or suction is regulated.
Figure 11 (a) and (b) are in the exposure device of variation of the second embodiment, possess vertical view and the side view of the lenticule mounting plate of nozzle.Shown in Figure 11 (a), load the both sides of the directions X of plate 62 at lenticule, a plurality of nozzles 45 are formed on its upper surface and lower surface.In addition, shown in Figure 11 (b), load the two sides of the directions X of plate 62 at lenticule, also be formed with a plurality of nozzles 45.A plurality of nozzles 45 are connected with air vent 46 in being formed on lenticule mounting plate 62.Such as Figure 11 (c) with (d), the air that a plurality of nozzles 45 will be supplied with by not shown air feeder, by air vent 46 obliquely upward, tiltedly at least one direction ejection in below and the directions X side.
Need to prove, be preferably more than 4L/ divides from the spray volume of the air of nozzle 45 ejection.In addition, the air from nozzle 45 ejections is preferably nitrogen.And then, preferably air is obtained the air of dried and clean by filtrator, to avoid in the air impurities and moisture to substrate and to cause harmful effect on every side.
Thus, the deflection of the lenticule mounting plate 62 that can suppress to cause because of deadweight makes its distance with substrate W keep necessarily preventing the inhomogeneous generation that exposes, and can removing the impurity C that is attached on substrate W or the mask M.Therefore, fine exposing patterns can be transferred on the substrate with high resolving power and shorter productive temp exposure interval time.
In addition, be not limited to this, air also has the cooling effect to substrate.
The 3rd embodiment
Below, with reference to Figure 12～Figure 14 the exposure device of third embodiment of the invention is described.In addition, the part identical or equal with the first embodiment given identical symbol and omitted or simplify its explanation.
Such as Figure 12 and shown in Figure 13, in the present embodiment, mask loading stage 10 is provided with the cover glass 90 of being made by glass or resin on the top of mask holding frame 12, form the high-air-tightness space by mask M, mask holding frame 12 and cover glass 90, by not shown pressure control mechanism the pressure in high-air-tightness space is regulated, with the distortion of compensate mask.
In addition, as shown in figure 14, on the face relative with the mask holding frame 12 around the cover glass 90, as coated member, be pasted with the resinous films 91 such as polyacetal, polyamide or ABS resin.Thus, in the time of in the groove 12a that cover glass 90 is remained on mask holding frame 12, clamping has film 91 between cover glass 90 and mask holding frame 12, when remaining on cover glass 90 in the mask holding frame 12, has prevented the damage of cover glass 90.Therefore, fine exposing patterns can be transferred on the substrate W with high resolving power and shorter productive temp exposure interval time.In addition, as coated member, except film 91, also can use metal net.
Need to prove, the cover glass 90 of present embodiment also can be provided in the below of mask M or the below of microlens array 41.
The 4th embodiment
Below, with reference to Figure 15～Figure 20 the exposure device of four embodiment of the invention is elaborated.In addition, the part identical or equal with the first embodiment given identical symbol and omitted or simplify its explanation.
In the present embodiment, identical with the first embodiment, exposure device PE also has: the mask loading stage 10 that is used for keeping mask M; The substrate loading stage 20 that is used for mounting glass substrate (being exposed part) W; Have be used to making substrate loading stage 20 move and carry out substrate loading stage travel mechanism 50 and the microlens array 41 that the degree of tilt of substrate loading stage 20 is regulated along X-axis, Y-axis and Z-direction, and be configured in the lenticule loading stage 40 between substrate loading stage 20 and the mask loading stage 10; And via mask M and microlens array 41 lamp optical system 30 to substrate W irradiation pattern exposure light.
On the other hand, such as Figure 15 and shown in Figure 16, the mask of mask loading stage 10 is supported by the pillar 77 that is erected on the device pedestal 70, and is configured in the top of substrate loading stage 20 with framework 11.
In addition, with reference to Figure 17, Figure 18 and Figure 19, in the lenticule loading stage 40, corresponding with four mask holding frames 12, four lenticule mounting plates 62 with microlens array 41 are configured between mask M and the substrate W, and supported potential energy is enough to be moved freely with framework 63 with respect to lenticule.
As shown in figure 19, lenticule has with the both sides of framework 63 in the Y-direction of lenticule mounting plate 62: along a pair of directions X framework 64,65 of directions X extension; To be connected to along two groups of each a pair of directions X frameworks 64,65 that Y-direction configures side by side the Y-direction framework 66 of the end of directions X; Be configured in the directions X two ends of directions X framework 64, and the fixed component 67 that is connected with Y-direction framework 66.And lenticule is supported on the pillar 77 that shares with mask usefulness framework 11 via fixed component 67 with framework 63.
Need to prove, lenticule is not subject to the above restrictions with the formation of framework 63, so long as the structure that is supported by pillar 77, can be designed as arbitrarily and consists of.
In addition, each in four zones corresponding with each mask holding frame 12 of lenticule loading stage 40, be equipped with respectively lenticule mounting plate 62, make this lenticule mounting plate 62 along directions X move as the linear motor 68 of lenticule driving mechanism and cable guide member 81 etc.In addition, because four zones have in fact identical structure, therefore, in following explanation, only a zone is described.
With reference to Figure 20, with the madial wall of directions X framework 64,65 subtends on, be respectively equipped with by guide rail 49a, 56a and be crossed on the upper and slide block 49b that can be free to slide of this guide rail 49a, 56a, the line slideway 49,56 that 56b consists of.
Be connected to the cable (not shown) of the splicing ear (not shown) of being located on the pillar 77 to linear motor 68 power supplies.Be used for this cable of guiding can free bend cable guide 81 be bent to and roughly be U-shaped, one end 81a is connected with slave end member 52, simultaneously, other end 81b is configured in the upper surface of the cable guide pallet 82 that is supported by pillar 77 at two ends.Cable guide 81 makes being accompanied by moving of plate 62 of lenticule mounting under the state of position movement of the bend that roughly is U-shaped, moves at the upper surface of cable guide pallet 82.
At the upper surface of cable guide pallet 82, be equipped with by elastic component 83b such as sheet metal 83a and rubber and engage the shock absorbent member 83 that forms.Need to prove, elastic component 83b is installed in the upper surface of cable guide pallet 82 by butt, absorbs the vibration that is delivered to cable guide pallet 82 along with the movement of lenticule mounting plate 62 by cable guide 81.
As shown in figure 18, a plurality of microlens arrays 41 corresponding to each mask M arranges are configured on the lenticule mounting plate 62 along the direction vertical with predetermined direction (Y-direction) with being in line the shape extension.In addition, in lenticule mounting plate 62, the zone beyond the microlens array 41 is blocked, and is mapped on the substrate W to prevent unnecessary illumination.
In the exposure device PE that so consists of, also use four mask M, repeatedly carry out the operation that is exposed the regional transfer printing that exposes simultaneously everywhere, mask pattern P exposure is transferred on the substrate W.In addition, by carrying the gap sensor 15 on sensor bracket 17, the gap between the opposing surface of measurement mask M and substrate W drives Z-tilt adjustment mechanism 24, makes mask M and substrate W opposed with predetermined spaced and parallel.Need to prove, during exposure transfer printing after carrying out the second layer, utilize gap sensor 15 to regulate gap between the opposing surface of mask M and substrate W, and the alignment mark that utilizes 16 pairs of alignment cameras to be formed on substrate W and the mask M detects, and the relative position of substrate W and mask M is regulated.
Then, make the linear motor 68 of lenticule loading stage 40 and the driving mechanism work of not shown lamp optical system 30, so that lenticule mounting plate 62 and lamp optical system 30 are used up from the pattern exposure of lamp optical system 30 to the area illumination corresponding to microlens array 41 along the left direction synchronizing moving among Fig. 3.
Owing to slave end member 52 along with the movement of lenticule mounting plate 62 move, therefore, cable guide 81 moves at the upper surface of cable guide pallet 82 when change roughly is the position of U-shaped bend.At this moment, the vibration that is produced by cable guide 81 is delivered to slave end member 52, might cause slave end member 52 vibration-generatings.
But in the present embodiment, owing to slave end member 52 is guided by line slideway 55, so the vibration of slave end member 52 is suppressed.In addition, because the vibration of slave end member 52 is absorbed by linear bushings 53, therefore can reduce the vibration that is delivered to driving side member 51 by slave end member 52.Thus, can prevent lenticule mounting plate 62, i.e. the vibration of microlens array 41 realizes high-precision exposure transfer printing.In addition, linear bushings 53 has the effect by the deflection error that moves to absorb line slideway 49 and line slideway 55 along Z-direction.
Need to prove, between an end 81a and slave end member 52 of cable guide 81, in order to suppress vibration, also can clamping resin or rubber.
In addition, because the upper surface at the cable guide pallet 82 that disposes cable guide 81, the elastic component 83b that is equipped with by sheet metal 83a and rubber etc. engages the shock absorbent member 83 that forms, therefore cable guide 81 and cable guide pallet 82 against the time vibration absorbed by shock absorbent member 83, prevent from being delivered to cable guide pallet 82.Thus, the vibration of mask loading stage 10 can be prevented from being delivered to via cable guide pallet 82, pillar 77, thereby high-precision exposure transfer printing can be realized.
In addition, as shock absorbent member 83, can be formed by rubber, resin, metal appropriate combination.As rubber, applicable chloropropene rubber, styrene butadiene rubbers etc.; As resin, applicable ABS resin, polyamide, polyacetal resin etc.; As sheet metal, applicable carbon steel, cast iron (flake graphite cast iron), cast steel, magnesium alloy, Silent alloy (Silentalloy), Ni-Ti alloy, Mn-Cu alloy, stainless steel alloy etc.
As mentioned above, according to the exposure device PE of present embodiment, support with framework 63 with framework 11 and lenticule by the 77 pairs of masks of pillar that share, can design supporting structure compacter, realize the miniaturization of exposure device PE, and, also be easy to assembling.In addition, because lenticule loading stage 40 has an end 81a and lenticule mounting plate 62(slave end member 52) is connected, for power to linear motor 68 can free bend cable guide 81; And the other end 81b that is configured in cable guide 81, separate with framework 63 with lenticule and by cable guide pallet 82 or the L-type member 84 of pillar 77 supportings, the vibration that therefore can prevent from following the movement of cable guide 81 and produce is delivered to lenticule framework 63, thereby prevents microlens array 41 vibration-generatings.Thus, just fine exposing patterns can be transferred on the substrate W with high-precision exposure.
In addition, because lenticule mounting plate 62 has the driving side member 51 that is driven by linear motor 68, with be connected linear bushings 53 and be connected with driving side member 51, and be connected with the slave end member 52 of an end 81a of cable guide 81, and the driving by line slideway 55 guiding slave end members 52, therefore, the vibration of slave end member 52 is suppressed by line slideway 55, simultaneously, can prevent that by the linear bushings 53 as clamp structure vibration is delivered to driving side member 51 from cable guide 81 via slave end member 52, thereby can prevent microlens array 41 vibration-generatings.In addition, move along Z-direction by making linear bushings 53, can absorb the deflection error of line slideway 55 and lenticule mounting plate 62, make lenticule mounting plate 62 smoothly mobile.
Because cable guide pallet 82 has shock absorbent member 83 at the upper surface that disposes cable guide 81, therefore can prevent that the vibration of cable guide 81 is delivered to mask loading stage 10 via cable guide pallet 82.
Because shock absorbent member 83 joint by sheet metal 83a and elastic component 83b that is installed on the cable guide pallet 82 consists of, elastic component 83b and cable guide pallet 82 butts are installed, and therefore can absorb the vibration that is delivered to cable guide pallet 82 from cable guide 81.
Need to prove, variation as the 4th embodiment, such as Figure 21 or shown in Figure 22, line slideway 49,56,55 has between slide block 49b, 56b, 55b and is and guide rail 49a, 56a, packoff 49c, the 56c of the discontiguous maze-type structure of 55a, 55c.Therefore, suppressed the intrusion of impurity to line slideway 49,56,55 inside.In addition, packoff 49c, 56c, 55c have suppressed lubricating oil splashing to line slideway 49,56,55 outsides.And packoff 49c, 56c, 55c reduce with comparing with the contacted packoff of guide rail of using, load in the past.Therefore, reduce as the whole employed electric power of exposure device, can save the energy and realize densification.
In addition, as clamp structure, both can use other clamp structure beyond the linear bushings 53 of above-mentioned embodiment, in addition, except clamp structure, can also use the leaf spring 93 shown in other variation of Figure 23.Particularly, consist of slave end member 52 by leaf spring 93, by lining 94 driving side member 51 is connected connection with the slave end member.As the material of leaf spring 93, can enumerate: cold-rolled steel sheet, electrolytic zinc-coated steel sheet, hot-dip galvanized steel sheet, stainless-steel sheet, brass sheet, copper coin, phosphor bronze sheet, band steel plate, bainite steel plate, beryllium steel plate etc.In addition, except these materials, carbon steel, cast iron (flake graphite cast iron), cast steel, magnesium alloy, Silent alloy (Silentalloy), Ni-Ti alloy, Mn-Cu alloy can also be made tabularly, sandwich these sheet materials with resin or rubber and use as leaf spring.In the case, as resin, applicable ABS resin, polyamide, polyacetal resin etc., as rubber, applicable chloropropene rubber, styrene butadiene rubbers etc.
Because in other variation, the mobile vibration that produces by lenticule mounting plate 62 is also absorbed by leaf spring 93, therefore, the vibration of mask loading stage 10 can be prevented from being delivered to via cable guide pallet 82, pillar 77, thereby high-precision exposure transfer printing can be realized.Need to prove, since lenticule with framework 63 by making leaf spring 93 along the deflection of Z direction, therefore absorb the deflection of line slideway 49 and line slideway 55, be not vulnerable to the impact in the gap of the gap of substrate W and microlens array 41 or mask M and microlens array 41.
In addition, the present invention is not limited to above-mentioned embodiment, can carry out suitable distortion and improvement etc.In addition, the present invention can make up above-mentioned embodiment in the scope that can implement.
For example, as exposure device of the present invention, also comprise and use a mask, by a lenticule mounting plate is driven the situation that realizes the exposure transfer printing.
Claims (24)
1. exposure device is characterized in that having:
The substrate loading stage, it is used for mounting as the substrate that is exposed part;
The mask loading stage, it has for the mask holding frame that keeps mask, and is configured in the top of described substrate loading stage;
The lenticule loading stage, it has for mounting by a plurality of lenticules lenticule mounting plate of the microlens array that forms of orientation arrangement in the plane, with the lenticule driving mechanism that is used for described lenticule mounting plate is moved along predetermined direction, described lenticule loading stage is configured between described substrate loading stage and the described mask loading stage; With
Lamp optical system, its via described mask and described microlens array to described substrate irradiation pattern exposure light,
Under the state that described lenticule mounting plate is moved along described predetermined direction, shine described pattern exposure by described lamp optical system and use up, via a plurality of described lenticules, the mask pattern exposure that is formed on the described mask is transferred on the described substrate.
2. exposure device according to claim 1 is characterized in that:
Make described lenticule mounting plate and described lamp optical system along under the synchronization-moving state of described predetermined direction, shining described pattern exposure by described lamp optical system uses up, via described a plurality of lenticules, the mask pattern exposure that is formed on the described mask is transferred on the described substrate.
3. exposure device according to claim 1 and 2 is characterized in that:
Described lenticule mounting plate is become by shading so that light can not see through described microlens array zone in addition.
4. each described exposure device according to claim 1～3 is characterized in that:
Also have a plurality of sensor brackets, its keeping measuring the gap sensor in the gap between described substrate and the described mask and can detect described substrate and described mask between the alignment cameras of relative position at least one, it is above described mask loading stage, with respect to respectively configuring one group along each of described predetermined direction a plurality of masks arranged side by side, and can move along described predetermined direction
When under the state that described lenticule mounting plate is moved along described predetermined direction, being transferred to described mask pattern exposure on the described substrate, with and be listed in the adjacent described sensor bracket of each mask on the described predetermined direction and move along the direction identical with described lenticule mounting plate respectively.
5. each described exposure device according to claim 1～3 is characterized in that:
Also have a plurality of sensor brackets, its keeping measuring the gap sensor in the gap between described substrate and the described mask and can detect described substrate and described mask between the alignment cameras of relative position at least one, it is above described mask loading stage, with respect to respectively configuring one group along each of described predetermined direction a plurality of masks arranged side by side, and can move along described predetermined direction
Each organizes described sensor bracket, when under the state that described lenticule mounting plate is moved along described predetermined direction, being transferred to described mask pattern exposure on the described substrate, under the state in the zone beyond described predetermined direction covers described microlens array, load the plate synchronizing moving to consist of the shading hole with described lenticule.
6. each described exposure device according to claim 1～5 is characterized in that:
Described lenticule mounting plate has for the nozzle that sprays or aspirate air on one of them surface of surface and lower surface thereon.
7. each described exposure device according to claim 1～6 is characterized in that:
Described lenticule mounting plate has for the nozzle that sprays air on one of them surface in surface, lower surface and the side thereon.
8. exposure device according to claim 7 is characterized in that:
Be more than 4L/ divides from the spray volume of the air of described nozzle ejection.
9. it is characterized in that according to claim 7 or 8 described exposure devices:
Described air is nitrogen.
10. it is characterized in that according to claim 7 or 8 described exposure devices:
Described air is clean dry air.
11. each described exposure device according to claim 1～10 is characterized in that:
On described mask holding frame, be provided with cover glass, form the high space of impermeability to cooperate with described mask,
On described cover glass, be provided with for covering its coated member on every side.
12. exposure device according to claim 11 is characterized in that:
Described coated member is resin-made membrane.
13. exposure device according to claim 11 is characterized in that:
Described coated member is the metal-made net.
14. exposure device according to claim 1 is characterized in that:
Described mask loading stage and described lenticule loading stage be by the pillar supporting that shares,
Described lenticule loading stage also has:
Support the lenticule framework that described lenticule mounting plate can move;
One end is connected with described lenticule mounting plate, be used for cable that guiding powers to described lenticule driving mechanism can free bend cable guide; With
Be located at the other end of described cable guide, be bearing in separately cable guide pallet on the described pillar with described lenticule with framework.
15. exposure device according to claim 14 is characterized in that:
Described lenticule mounting plate has:
Driving side member by described lenticule driving mechanism driving; With
Be connected with described driving side member by clamp structure, and connecting the slave end member of an end of described cable guide,
Described lenticule loading stage has the guide be used to the driving that guides described slave end member.
16. exposure device according to claim 15 is characterized in that:
Described clamp structure is linear bushings.
17. exposure device according to claim 14 is characterized in that:
Described lenticule mounting plate has:
Driving side member by described lenticule driving mechanism driving; With
Be connected with described driving side member, and connecting the slave end member of an end of described cable guide,
Described slave end member is made of leaf spring,
Described lenticule loading stage has the guide be used to the driving that guides described slave end member.
18. each described exposure device according to claim 14～17 is characterized in that:
Described cable guide pallet also has shock absorbent member, and it is arranged on the upper surface that disposes described cable guide, is used for absorbing the movement of following described lenticule mounting plate and the vibration that is delivered to described cable guide pallet from described cable guide.
19. exposure device according to claim 18 is characterized in that:
Described shock absorbent member is engaged by sheet metal and elastic component and forms, described elastic component and described cable guide pallet butt, and be installed on the described cable guide pallet.
20. exposure device according to claim 14 is characterized in that:
Described lenticule loading stage has line slideway, and described line slideway has: be arranged on described lenticule with the guide rail on the opposed inwall side of framework, and be crossed on the slide block that can be free to slide on the described guide rail,
Described line slideway has packoff, and described packoff has the maze-type structure that does not contact with described line slideway.
21. an exposure method is used for exposure device, it is characterized in that, described exposure device has:
The substrate loading stage, it is used for mounting as the substrate that is exposed part;
The mask loading stage, it has for the mask holding frame that keeps mask, and is configured in the top of described substrate loading stage;
The lenticule loading stage, it has for mounting by a plurality of lenticules lenticule mounting plate of the microlens array that forms of orientation arrangement in the plane, with the lenticule driving mechanism that is used for described lenticule mounting plate is moved along predetermined direction, described lenticule loading stage is configured between described substrate loading stage and the described mask loading stage; With
Lamp optical system, its via described mask and described microlens array to described substrate irradiation pattern exposure light,
It is characterized in that:
Under the state that described lenticule mounting plate is moved along described predetermined direction, shine described pattern exposure by described lamp optical system and use up, via described a plurality of lenticules, the mask pattern exposure that is formed on the described mask is transferred on the described substrate.
22. exposure method according to claim 21 is characterized in that:
Make described lenticule mounting plate and described lamp optical system along under the synchronization-moving state of described predetermined direction, shining described pattern exposure by described lamp optical system uses up, by described a plurality of lenticules, the mask pattern exposure that is formed on the described mask is transferred on the described substrate.
23. exposure method according to claim 21 is characterized in that:
Also have a plurality of sensor brackets, with respect to each of a plurality of masks of arranging along described predetermined direction, above described mask loading stage, respectively configure one group of sensor bracket that can move at described predetermined direction, it is used for maintenance gap sensor and alignment cameras at least one, described gap sensor can be measured the gap between described substrate and the described mask, described alignment cameras can detect the relative position between described substrate and the described mask
While described lenticule mounting plate is moved to described predetermined direction described mask pattern is being exposed when being transferred on the described substrate, the described sensor bracket adjacent with each mask of arranging on the described predetermined direction moves along the direction identical with described lenticule mounting plate respectively.
24. exposure method according to claim 21 is characterized in that:
Also have a plurality of sensor brackets, its keeping measuring the gap sensor in the gap between described substrate and the described mask and can detect described substrate and described mask between the alignment cameras of relative position at least one, described a plurality of sensor bracket is above described mask loading stage, with respect to respectively configuring one group along each of described predetermined direction a plurality of masks arranged side by side, and can move along described predetermined direction
When under the state that described lenticule mounting plate is moved along described predetermined direction, being transferred to described mask pattern exposure on the described substrate, each organizes described sensor bracket, under the state in the zone beyond described predetermined direction covers described microlens array, with described lenticule mounting plate synchronizing moving.
Applications Claiming Priority (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-124405 | 2011-06-02 | ||
| JP2011124405 | 2011-06-02 | ||
| JP2012039104A JP2013174727A (en) | 2012-02-24 | 2012-02-24 | Exposure device |
| JP2012-039104 | 2012-02-24 | ||
| JP2012075123 | 2012-03-28 | ||
| JP2012075152 | 2012-03-28 | ||
| JP2012-075055 | 2012-03-28 | ||
| JP2012-075152 | 2012-03-28 | ||
| JP2012-075123 | 2012-03-28 | ||
| JP2012075055 | 2012-03-28 | ||
| JP2012113236A JP6037199B2 (en) | 2011-06-02 | 2012-05-17 | Exposure apparatus and exposure method |
| JP2012-113236 | 2012-05-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102854753A true CN102854753A (en) | 2013-01-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012101823399A Pending CN102854753A (en) | 2011-06-02 | 2012-06-04 | Exposure device and exposure method |
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| Country | Link |
|---|---|
| CN (1) | CN102854753A (en) |
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| CN106488148A (en) * | 2016-11-01 | 2017-03-08 | 首都师范大学 | A kind of super-resolution image sensor and its building method |
| CN111856822A (en) * | 2020-06-29 | 2020-10-30 | 南京中电熊猫平板显示科技有限公司 | Double-layer mask plate, use method thereof and method for improving light leakage of double-layer mask plate |
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